CN115499995A - Compact multi-ion synchrotron - Google Patents
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- CN115499995A CN115499995A CN202211331886.9A CN202211331886A CN115499995A CN 115499995 A CN115499995 A CN 115499995A CN 202211331886 A CN202211331886 A CN 202211331886A CN 115499995 A CN115499995 A CN 115499995A
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Abstract
The invention relates to a compact multi-ion synchrotron which comprises a symmetrical optical structure, wherein the symmetrical optical structure comprises a plurality of linear ion beam sections and a plurality of arc ion beam sections, the linear ion beam sections are divided into long straight sections and short straight sections, quadrupole magnet assemblies are arranged on the long straight sections, single quadrupole magnets are arranged on the short straight sections, dipolar magnets are arranged on the arc ion beam sections, and the quadrupole magnets and the dipolar magnets form an octagonal structure with four-fold mirror symmetry along the clockwise direction. According to the invention, the octagonal structure with four-fold mirror symmetry is adopted optically, so that the perimeter and the floor area of the ion therapy synchrotron can be greatly reduced, and the sizes of a synchrotron magnet and a beam diagnosis element can be further compressed through optimized optics to form small beam envelope, thereby realizing the miniaturization of the synchrotron.
Description
Technical Field
The invention relates to the technical field of synchrotrons, in particular to a compact multi-ion synchrotron.
Background
Because the irradiation of the ion beam to the organism has reversed depth dose distribution and higher relative biological effect, the damage to normal cells can be better avoided while tumor cells are killed, so that the ion cancer therapy becomes an international advanced and effective cancer radiotherapy method. At present, the most commonly used ions for ion therapy of cancer are protons and carbon ions, and the two ions have great difference in indication and cost.
The carbon ion linear energy density, the relative biological effect and the side scattering have more remarkable advantages, can generate DNA Double Strand Break (DSB) which is difficult to repair, has excellent killing capacity on the most common hypoxic tumor cells in tumors, and is usually used as the optimal choice for cancer treatment, but because the energy of a carbon ion accelerator is required to be 430MeV/u or more, the magnetic rigidity is larger, the occupied area of the device is large, and the investment scale is higher; the proton treatment device needs low magnetic rigidity, generally adopts a fixed Energy accelerator, has low cost, relatively mature technology, small occupied area and low market popularization difficulty, but has low Linear Energy Transfer (LET) of proton beams, can only break DNA single chains, has no killing effect on tumor cells as compared with carbon ions, and has small damage to normal tissues due to a small trailing effect behind a Bragg peak. The treatment periods of carbon ion and proton are also greatly different, in the case of liver cancer, thirty days are required for full dose proton radiotherapy, and if heavy ions are combined, the radiotherapy time can be shortened to four days. Therefore, if a plurality of ions with different biological effects, such as protons to carbon, can be provided within the same accelerator scale and acceleration capability range, the ion therapy system can be used for treating conventional protons and carbon ions which are conventionally adapted to cancer types, and can help radiotherapy personnel to select a more flexible and scientific treatment plan according to the specificity of the tumor types and positions of patients, so that the accuracy and efficiency of ion therapy are greatly improved.
One difficulty with treatment devices in the application process is the device footprint. At present, mature high-quality hospitals are mostly located in busy areas of urban centers, large-area land for device construction is difficult to provide in courtyard areas, and the difficulty of land expropriation around the hospitals is also large. The traditional accelerator heavy ion cancer treatment device has large scale, for example, the first Wuwei heavy ion treatment device with completely independent intellectual property rights in China occupies a floor area of 5000 square meters, which far exceeds the available floor area of a general hospital, and becomes one of the main obstacles restricting the application and popularization of the accelerator treatment device. Another difficulty is the cost of plant construction. The construction cost of the accelerator treatment device is one-time investment, different prices are different according to the configuration of the device, for example, the price of the heavy ion cancer treatment device in China is 6-8 billion yuan, far exceeds the price of general medical equipment, and exceeds the bearing capacity of most hospitals, so the construction of the accelerator treatment device is in units of provinces at present. The construction cost of the device is reduced, the accelerator treatment device can be accepted by more hospitals, the hope of rehabilitation is brought to more cancer patients, the treatment cost of the cancer patients can be reduced, and the advanced technology is converted into a model of the national popularization.
The key to reducing the footprint and construction costs of the plant is to reduce the scale of the plant. The accelerator treatment device consists of an ion source, a low-energy beam transport line, a linear injector, an intermediate-energy beam transport line, a synchrotron, a high-energy beam transport line and a treatment terminal. The synchrotron is the core of the whole device, and has the highest ratio in terms of area and construction cost, so that the miniaturization of the synchrotron, namely the reduction of the perimeter of the synchrotron, is always a hot spot direction for designing the synchrotron internationally.
Chinese patent application No. CN202210674413.2 discloses a compact multi-ion accelerator treatment device and its application, which includes the optical design of synchrotron, but the design has the problems of insufficient compactness, high strength required by the slow-extraction electrostatic deflection plate, etc.
Disclosure of Invention
The invention aims to provide a compact multi-ion synchrotron, which aims to solve the problems of large occupied area and high construction cost of an ion accelerator treatment device in the prior art.
In order to realize the purpose, the invention adopts the following technical scheme:
the invention provides a compact multi-ion synchrotron which comprises a symmetrical optical structure, wherein the symmetrical optical structure comprises a plurality of linear ion beam sections and a plurality of arc ion beam sections, the plurality of linear ion beam sections and the plurality of arc ion beam sections are alternately arranged, and the plurality of linear ion beam sections are a first long straight section, a first short straight section, a second long straight section, a third long straight section, a fourth long straight section, a second short straight section, a fifth long straight section and a sixth long straight section in sequence along the clockwise direction;
a quadrupole magnet assembly consisting of a first quadrupole magnet and a second quadrupole magnet is arranged on the first long straight joint, a third quadrupole magnet is arranged on the first short straight joint, a quadrupole magnet assembly consisting of a fourth quadrupole magnet and a fifth quadrupole magnet is arranged on the second long straight joint, a quadrupole magnet assembly consisting of a sixth quadrupole magnet and a seventh quadrupole magnet is arranged on the fourth long straight joint, an eighth quadrupole magnet is arranged on the second short straight joint, and a quadrupole magnet assembly consisting of a ninth quadrupole magnet and a fourteenth quadrupole magnet is arranged on the fifth long straight joint;
the arc ion beam section is provided with two pole magnets, the two pole magnets are a first pole magnet, a second pole magnet, a third pole magnet, a fourth pole magnet, a fifth pole magnet, a sixth pole magnet, a seventh pole magnet and an eighth pole magnet in sequence along the clockwise direction, and the first pole magnet is connected with the second pole magnet through the first long straight section;
wherein, the half of first dipolar magnet, first quadrupole magnet and second quadrupole magnet, second dipolar magnet, third quadrupole magnet constitutes optical unit A, the half of fourth dipolar magnet, fourth quadrupole magnet and fifth quadrupole magnet, third dipolar magnet, third quadrupole magnet constitutes optical unit B, optical unit A with optical unit B is mirror symmetry, and a plurality of dipolar magnet and a plurality of quadrupole magnet constitute four-fold mirror symmetry's octagon structure along the clockwise.
Further, the first, third, fifth, sixth, eighth and fourteenth quadrupole magnets are all focusing magnets, and the second, fourth, seventh and ninth quadrupole magnets are all defocusing magnets.
Furthermore, the deflection angle of each dipolar magnet is 45 degrees, and the range of the edge angle is 0-15 degrees;
the range of the integral gradient field of the focusing quadrupole magnet in each quadrupole magnet assembly is 0.1/m-1.0/m, the range of the integral gradient field of the defocusing quadrupole magnet is-0.1/m-1.0/m, and the range of the integral gradient field of one half of the third quadrupole magnet and the eighth quadrupole magnet is 0.1/m-1/m;
the arc ion beam section is provided with a short straight line section, and the length range of the short straight line section is 0.3-3 m;
the distance between the dipolar magnet and the adjacent quadrupole magnet is 0.1-1 m, and the distance between the two quadrupole magnets in the quadrupole magnet assembly is 1-5 m.
Further, the compact multi-ion synchrotron further comprises:
the injection system comprises an injection cutting magnet and an injection static deflection plate, the injection cutting magnet and the injection static deflection plate are arranged on the first long straight joint and are arranged between the first quadrupole magnet and the second quadrupole magnet, the injection static deflection plate is positioned at the downstream of the injection cutting magnet, the injection cutting magnet is used for deflecting an injection beam to be close to the beam acceptance of the synchrotron, and the injection static deflection plate is used for deflecting the beam deflected by the injection cutting magnet again and sending the beam into the synchrotron acceptance;
the extraction system comprises a first extraction cutting magnet, a second extraction cutting magnet and an extraction electrostatic deflection plate, wherein the first extraction cutting magnet and the second extraction cutting magnet are located on a sixth quadrupole magnet and a seventh quadrupole magnet, the second extraction cutting magnet is located on a fourth long straight section, the first extraction cutting magnet and the second extraction cutting magnet are located at the downstream of the first extraction cutting magnet, the extraction electrostatic deflection plate is located on a third long straight section, the extraction electrostatic deflection plate is used for cutting the beam with the increased internal resonance amplitude of the synchrotron and deviating the acceptance degree of the synchrotron, and the first extraction cutting magnet and the second extraction cutting magnet are used for further deflecting the beam separated by the extraction electrostatic deflection plate outwards of the synchrotron and extracting the synchrotron.
Further, a six-pole magnet assembly comprising a first six-pole magnet and a second six-pole magnet is arranged on the second long straight section, and the first six-pole magnet and the second six-pole magnet are arranged between the fourth four-pole magnet and the fifth four-pole magnet;
a third hexapole magnet is arranged on the third long straight section;
a sixth-pole magnet assembly composed of a fourth six-pole magnet and a fifth six-pole magnet is arranged on the fifth long straight section, and the fourth six-pole magnet and the fifth six-pole magnet are arranged between the ninth quadrupole magnet and the fourteenth quadrupole magnet;
a sixth long straight section is provided with a sixth magnet;
the first six-pole magnet and the fourth six-pole magnet are used for vertical chromaticity correction, the second six-pole magnet and the fifth six-pole magnet are used for horizontal chromaticity correction, and the third six-pole magnet and the sixth six-pole magnet are used for driving resonance slow extraction.
Further, a first injection convex rail magnet is arranged on the fifth long straight joint and between the fourth six-pole magnet and the fifth six-pole magnet, a second injection convex rail magnet is arranged on the sixth long straight joint and downstream of the sixth six-pole magnet, a third injection convex rail magnet is arranged on the first short straight joint and downstream of the third quadrupole magnet, and the first injection convex rail magnet, the second injection convex rail magnet and the third injection convex rail magnet are all used for shifting beam acceptance to the injection electrostatic deflection plate in an injection process;
the long straight section of second is last to be located first six-pole magnet with it draws forth the convex rail magnet to have arranged the first between the second six-pole magnet, be located on the long straight section of fourth it draws forth the convex rail magnet to have arranged the second between cutting magnet to draw forth seventh quadrupole magnet and the second, be located on the short straight section of second it draws forth the convex rail magnet to have arranged the third in the upper reaches of eighth quadrupole magnet, first draw out convex rail magnet, second draw out the convex rail magnet and the third draw out the convex rail magnet all be used for slowly draw out in-process beam current skew extremely draw out the static deflection board.
Furthermore, an extraction excitation is arranged on the second long straight section, and the extraction excitation is arranged between the first hexapole magnet and the first extraction convex rail magnet and is used for increasing the beam emittance in a controllable manner in the slow extraction process.
Furthermore, the first long straight section, the first short straight section, the second long straight section, the fourth long straight section, the second short straight section and the fifth long straight section are respectively provided with a correcting magnet.
Furthermore, beam position detectors are arranged on the first long straight section, the first short straight section, the second long straight section, the third long straight section, the fourth long straight section, the second short straight section, the fifth long straight section and the sixth long straight section respectively, the beam position detectors on the first long straight section, the second long straight section, the fourth long straight section and the fifth long straight section are arranged in a manner of being overlapped with the correction magnets on the corresponding long straight sections, the beam position detectors on the first short straight section and the second short straight section are arranged in a manner of being overlapped with or separated from the correction magnets on the corresponding short straight sections, and the beam position detectors on the third long straight section and the sixth long straight section are arranged in a manner of being overlapped with the six-pole magnets on the corresponding long straight sections.
Furthermore, a high-frequency cavity is arranged on the sixth long straight section and between the sixth pole magnet and the second injection convex rail magnet, and is used for providing energy for the beam current in the acceleration process.
Due to the adoption of the technical scheme, the invention has the following beneficial effects:
the invention adopts an octagonal structure with clockwise four-fold mirror symmetry optically, and can realize the optical design of the 430MeV/u carbon ion synchrotron with the perimeter of less than 36m by adjusting the position relationship and the strength setting between the dipolar magnet and the quadrupole magnet. Compared with the optical design disclosed in the invention patent with the application number of CN202210674413.2, the invention further shortens the perimeter of the synchrotron by nearly 1/4, and greatly reduces the occupied area of the device and the construction cost. The optimized optics reduces the envelope function in the horizontal direction by 40 percent and the dispersion function by 25 percent, so that the full-ring beam size of the synchrotron is greatly reduced, the sizes of a synchrotron magnet and a beam diagnosis element can be further reduced, the required power and volume are reduced, and the compactness of the synchrotron is improved; the electrostatic deflection plate and the cutting iron are arranged at a position with a larger optical horizontal envelope function, so that the phase shift close to pi/2 can be met in a compact space, and the strength requirement of the electrostatic deflection plate can be obviously reduced; the oscillation amplitude of the last three circles of tracks before the ring beam is led out is small, and the aperture required by the element is small; meanwhile, the invention can accelerate various ions, such as protons, helium ions, carbon ions and the like, and can meet more treatment requirements.
Drawings
Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the invention. Like reference numerals refer to like parts throughout the drawings. In the drawings:
fig. 1 is a general layout diagram of a compact multi-ion synchrotron according to an embodiment of the present invention;
fig. 2 is a beam optical diagram of a compact multi-ion synchrotron according to an embodiment of the present invention;
fig. 3 is a beam envelope diagram of a compact multi-ion synchrotron according to an embodiment of the present invention.
In the drawings, the reference numerals denote the following:
1-1: a first dipolar magnet; 1-2: a second dipole magnet; 1-3: a third dipolar magnet; 1-4: a fourth dipolar magnet; 1-5: a fifth dipole magnet; 1-6: a sixth dipole magnet; 1-7: a seventh dipolar magnet; 1-8: an eighth dipole magnet; 2-1: a first quadrupole magnet; 2-2: a second quadrupole magnet; 2-3: a third quadrupole magnet; 2-4: a fourth quadrupole magnet; 2-5: a fifth quadrupole magnet; 2-6: a sixth quadrupole magnet; 2-7: a seventh quadrupole magnet; 2-8: an eighth quadrupole magnet; 2-9: a ninth quadrupole magnet; 2-10: a tenth quadrupole magnet; 3-1: a first six-pole magnet; 3-2: a second six-pole magnet; 3-3: a third six-pole magnet; 3-4: a fourth six-pole magnet; 3-5: a fifth six-pole magnet; 3-6: a sixth-pole magnet; 4-1: injecting a cutting magnet; 4-2: a first extraction cutting magnet; 4-3: a second extraction cutting magnet; 5-1: injecting an electrostatic deflection plate; 5-2: leading out an electrostatic deflection plate; 6-1: a first injection convex rail magnet; 6-2: a second injection convex rail magnet; 6-3: a third injection convex rail magnet; 6-4: a first lead-out convex rail magnet; 6-5: a second leading-out convex rail magnet; 6-6: a third leading-out convex rail magnet; 7-1: leading out excitation; 8-1 to 8-6: a calibration magnet; 9-1 to 9-8: a beam position detector; 10-1: a high-frequency cavity.
Detailed Description
Exemplary embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the invention are shown in the drawings, it should be understood that the invention can be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
The traditional ion accelerator treatment device has large occupied area and high construction cost. The invention provides a compact multi-ion synchrotron which comprises a symmetrical optical structure, wherein the symmetrical optical structure comprises a plurality of linear ion beam sections and a plurality of arc ion beam sections, the linear ion beam sections are divided into long straight sections and short straight sections, quadrupole magnet assemblies are arranged on the long straight sections, each quadrupole magnet assembly comprises two quadrupole magnets, a single quadrupole magnet is arranged on the short straight sections, dipolar magnets are arranged on the arc ion beam sections, and the quadrupole magnets and the dipolar magnets are in a four-fold mirror symmetry octagonal structure in the clockwise direction. The octagon structure which is optically symmetrical by four folds in a mirror image in a clockwise direction is utilized, the perimeter and the floor area of the ion therapy synchrotron can be greatly reduced by adjusting the position relation and the strength setting between the dipolar magnet and the quadrupole magnet, the sizes of the synchrotron magnet and a beam diagnosis element are further compressed, a small beam envelope is formed, and the miniaturization of the synchrotron is realized.
The embodiment of the present invention will be described in detail by examples.
Examples
As shown in fig. 1-3, the present invention provides a compact multi-ion synchrotron comprising a symmetrical optical structure comprising a plurality of linear ion beam segments and a plurality of arc ion beam segments, the plurality of linear ion beam segments and the plurality of arc ion beam segments being arranged alternately. The plurality of linear ion beam segments are sequentially a first long straight segment, a first short straight segment, a second long straight segment, a third long straight segment, a fourth long straight segment, a second short straight segment, a fifth long straight segment and a sixth long straight segment along the clockwise direction.
The first long straight section is provided with a quadrupole magnet assembly consisting of a first quadrupole magnet 2-1 and a second quadrupole magnet 2-2. And a third quadrupole magnet 2-3 is arranged on the first short straight section. The second long straight section is provided with a quadrupole magnet assembly consisting of a fourth quadrupole magnet 2-4 and a fifth quadrupole magnet 2-5. A quadrupole magnet assembly comprising a sixth quadrupole magnet 2-6 and a seventh quadrupole magnet 2-7 is arranged on the fourth long straight section. And eighth quadrupole magnets 2-8 are arranged on the second short straight section. And a quadrupole magnet assembly consisting of a ninth quadrupole magnet 2-9 and a fourteenth quadrupole magnet 2-10 is arranged on the fifth long straight section.
The arc ion beam section is provided with two-pole magnets, the two-pole magnets are a first two-pole magnet 1-1, a second two-pole magnet 1-2, a third two-pole magnet 1-3, a fourth two-pole magnet 1-4, a fifth two-pole magnet 1-5, a sixth two-pole magnet 1-6, a seventh two-pole magnet 1-7 and an eighth two-pole magnet 1-8 in sequence along the clockwise direction, the first two-pole magnet 1-1 and the second two-pole magnet 1-2 are connected through a first long straight section, and the rest is done in the clockwise direction.
The optical unit B is formed by one half of the first dipolar magnet 1-1, the first quadrupole magnet 2-1, the second quadrupole magnet 2-2, the second dipolar magnet 1-2 and the third quadrupole magnet 2-3, the other half of the fourth dipolar magnet 1-4, the fourth quadrupole magnet 2-4, the fifth quadrupole magnet 2-5, the third dipolar magnet 1-3 and the third quadrupole magnet 2-3, the optical unit A and the optical unit B form ase:Sub>A mirror symmetry structure, and the analogy is repeated along the clockwise direction, so that the dipolar magnets and the quadrupole magnets form an octagonal structure of ase:Sub>A-B-A-B' four-fold mirror image along the clockwise direction.
Furthermore, the first quadrupole magnet 2-1, the third quadrupole magnet 2-3, the fifth quadrupole magnet 2-5, the sixth quadrupole magnet 2-6, the eighth quadrupole magnet 2-8 and the tenth quadrupole magnet 2-10 are all focusing magnets, and are used for focusing the beam in the horizontal direction and defocusing the beam in the vertical direction; the second quadrupole magnet 2-2, the fourth quadrupole magnet 2-4, the seventh quadrupole magnet 2-7 and the ninth quadrupole magnet 2-9 are defocusing magnets for focusing the beam in the vertical direction and defocusing the beam in the horizontal direction.
Furthermore, the deflection angle of each dipolar magnet is 45 degrees, and the range of the edge angle is 0-15 degrees;
the range of the integral gradient field of the focusing quadrupole magnet in each quadrupole magnet assembly is 0.1/m-1.0/m, the range of the integral gradient field of the defocusing quadrupole magnet is-0.1/m-1.0/m, and the range of the integral gradient field of one half of the third quadrupole magnet and the eighth quadrupole magnet is 0.1/m-1/m;
the arc ion beam section is provided with a short straight line section, and the length range of the short straight line section is 0.3-3 m;
the distance between the two-pole magnet and the adjacent four-pole magnet is 0.1-1 m, and the distance between two four-pole magnets in the four-pole magnet assembly is 1-5 m.
Through the arrangement of the structure, the following core technical effects are achieved:
1. the method is compact: the optical design of the same type device with the shortest world perimeter of less than 36m is realized by adopting a unique octagonal structure with four-fold mirror symmetry and adjusting the position relation and the strength setting between two pole magnets and four pole magnets, and compared with the optical design disclosed in the invention patent with the application number of CN202210674413.2, the invention further shortens the perimeter of a synchrotron by nearly 1/4, has the diameter of only 12m, can provide a carbon ion beam current of 80-430 MeV/u, occupies an area of less than 200 square meters, and greatly reduces the difficulty of the requirement of the sites for constructing accelerator treatment devices in mature hospitals in cities; the construction cost of the accelerator is in direct proportion to the perimeter of the synchrotron, and compared with the prior devices of the same type, the construction cost of the synchrotron can be reduced by 1/3, so that the investment scale of hospitals and companies is reduced, the popularization and the application of accelerator treatment devices are facilitated, and the treatment cost transmitted to cancer patients can be correspondingly reduced, so that the accelerator becomes a popular cancer treatment method which really benefits the nation and people;
2. the beam envelope is small: in the optimized optics, the horizontal envelope function is controlled within 7.5m, the horizontal dispersion is controlled within 3m, and the vertical envelope function is integrally controlled within 20m, compared with the example disclosed in the patent CN114867184A, the horizontal envelope function is reduced by 40%, the horizontal dispersion function is reduced by 25%, the full-ring beam size of the synchrotron is greatly reduced, the horizontal beam envelope is less than +/-45 mm, and the vertical beam envelope is less than +/-20 mm, so that the sizes of a synchrotron magnet and a beam diagnosis element can be further reduced, the required power supply power and the size are reduced, and the scale of the synchrotron is further reduced;
3. the slow extraction design has remarkable advantages: the synchrotron has optical symmetry and a large adjustment range of working points, the lead-out working point is close to 5/3 pi, and independent adjustment of resonance driving and chromaticity correction is easy to realize; the parameter variation of the whole ring Twiss is smooth, the envelope fluctuation is small, the negative angle or the positive angle of the lead-out beam at the entrance of the static deflection plate is small, the kicking angle required by the static deflection plate can be reduced, and the hardware design and processing difficulty is reduced; meanwhile, the oscillation amplitude of the last three circles of tracks before the beam current in the ring is led out is small, the aperture required by the element is within the acceptance range, no special aperture requirement exists, and the size and the weight of the magnetic element are effectively reduced; the electrostatic deflection plate and the cutting iron are arranged at a position with a larger optical horizontal envelope function, the phase shift close to pi/2 is met in a compact space, the strength requirement of the electrostatic deflection plate can be greatly reduced, and the design is obviously optimized compared with the optical design slow leading-out system disclosed in the invention patent with the application number of CN 202210674413.2.
One preferred embodiment is: the compact multi-ion synchrotron also comprises an injection system and an extraction system, and is specifically arranged as follows:
the injection system includes an injection cutting magnet 4-1 disposed on the first long straight section and an injection electrostatic deflection plate 5-1. An injection cutting magnet 4-1 and an injection electrostatic deflection plate 5-1 are disposed between the first quadrupole magnet 2-1 and the second quadrupole magnet 2-2, and the injection electrostatic deflection plate 5-1 is located downstream of the injection cutting magnet 4-1. The injection cutting magnet 4-1 is used for deflecting injected beams to be close to the beam acceptance of the synchrotron, and the injection static deflection plate 5-1 is used for deflecting the beams deflected by the injection cutting magnet again and sending the beams into the acceptance of the synchrotron.
The extraction system comprises a first extraction cutting magnet 4-2, a second extraction cutting magnet 4-3 and an extraction electrostatic deflection plate 5-2. The first and second lead-out cutting magnets 4-2 and 4-3 are disposed on the fourth long straight section between the sixth and seventh quadrupole magnets 2-6 and 2-7, and the second lead-out cutting magnet 4-3 is disposed downstream of the first lead-out cutting magnet 4-2. The leading-out electrostatic deflection plate 5-2 is arranged on the third long straight section, the leading-out electrostatic deflection plate 5-2 is used for cutting the beam with increased resonance amplitude inside the synchrotron and deviating the beam from the acceptance of the synchrotron, and the first leading-out cutting magnet 4-2 and the second leading-out cutting magnet 4-3 are used for further deflecting the beam separated by the leading-out electrostatic deflection plate 5-2 to the outside of the synchrotron and leading out the synchrotron.
Further, a six-pole magnet assembly including a first six-pole magnet 3-1 and a second six-pole magnet 3-2 is arranged on the second long straight section, and the first six-pole magnet 3-1 and the second six-pole magnet 3-2 are arranged between the fourth four-pole magnet 2-4 and the fifth four-pole magnet 2-5;
a third hexapole magnet 3-3 is arranged on the third long straight section;
a sixth-pole magnet assembly composed of a fourth six-pole magnet 3-4 and a fifth six-pole magnet 3-5 is arranged on the fifth long straight section, and the fourth six-pole magnet 3-4 and the fifth six-pole magnet 3-5 are arranged between the ninth quadrupole magnet 2-9 and the fourteenth quadrupole magnet 2-10;
a sixth six-pole magnet 3-6 is arranged on the sixth long straight section;
the first six-pole magnet 3-1 and the fourth six-pole magnet 3-4 are used for vertical chromaticity correction, the second six-pole magnet 3-2 and the fifth six-pole magnet 3-5 are used for horizontal chromaticity correction, and the third six-pole magnet 3-6 and the sixth six-pole magnet 3-6 are used for driving resonance slow extraction.
Further, a first injection convex rail magnet 6-1 is arranged between the fourth six-pole magnet 3-4 and the fifth six-pole magnet 3-5 on the fifth long straight section. And a second injection convex rail magnet 6-2 is arranged on the sixth long straight section and is positioned at the downstream of the sixth six-pole magnet 3-6. And a third injection convex rail magnet 6-3 is arranged on the first short straight section and is positioned at the downstream of the third four-pole magnet 2-3. The first injection convex rail magnet 6-1, the second injection convex rail magnet 6-2 and the third injection convex rail magnet 6-3 are all used for shifting the beam acceptance to the injection static deflection plate in the injection process;
and a first leading-out convex rail magnet 6-4 is arranged between the first six-pole magnet 3-1 and the second six-pole magnet 3-2 on the second long straight section. And a second leading-out convex rail magnet 6-5 is arranged between the seventh quadrupole magnet 2-7 and the second leading-out cutting magnet 4-3 on the fourth long straight section. And a third lead-out convex rail magnet 6-6 is arranged on the second short straight section and is positioned at the upstream of the eighth four-pole magnet 2-8. The first leading-out convex rail magnet 6-4, the second leading-out convex rail magnet 6-5 and the third leading-out convex rail magnet 6-6 are all used for shifting the beam current to the leading-out electrostatic deflection plate in the slow leading-out process.
Further, the second long straight section is provided with an extraction excitation 7-1. The extraction excitation 7-1 is arranged between the first six-pole magnet 3-1 and the first extraction convex rail magnet 6-4 and is used for controllably increasing the beam emittance in the slow extraction process.
Furthermore, the first long straight section, the first short straight section, the second long straight section, the fourth long straight section, the second short straight section and the fifth long straight section are respectively provided with a correcting magnet (8-1-8-6). Beam position detectors (9-1-9-8) are arranged on the first long straight section, the first short straight section, the second long straight section, the third long straight section, the fourth long straight section, the second short straight section, the fifth long straight section and the sixth long straight section respectively, beam position detectors on the first long straight section, the second long straight section, the fourth long straight section and the fifth long straight section are arranged in a sleeved mode with correction magnets on the corresponding long straight sections (9-1, 8-1, 9-3, 8-3, 9-5, 8-4, 9-7 and 8-6), beam position detectors on the first short straight section and the second short straight section are arranged in a sleeved mode with or separated from correction magnets on the corresponding short straight sections (9-2, 8-2, 9-6 and 8-5), and beam position detectors on the third long straight section and the sixth long straight section are arranged in a sleeved mode with hexapole magnets on the corresponding sleeved straight sections (9-4, 3-3, 9-8 and 3-6).
Furthermore, a high-frequency cavity 10-1 is arranged between the sixth pole magnet 3-6 and the second injection convex rail magnet 6-2 on the sixth long straight section and used for providing energy for the beam in the acceleration process.
The specific implementation process is as follows:
1. injecting: the beam from the linear accelerator or the cyclotron is injected into the synchrotron from the injection cutting magnet 4-1 along the clockwise direction, so that the beam gradually approaches the acceptance phase space of the synchrotron from the outside of the ring and enters the injection electrostatic deflection plate 5-1 to be sent into the acceptance of the synchrotron, and then the beam rotates along the clockwise direction. In order to restrain the beam current in a vacuum pipeline of the synchrotron, the beam current is deflected by using dipolar magnets 1-8, so that the beam current track forms a closed circle. In order to avoid beam divergence, the quadrupole magnets 2-1-2-10 are used for periodically restricting the beam current, and the optical lens is different from the optical lens in that the quadrupole magnets 2-1-2-10 focus the beam current in the horizontal direction and defocus in the vertical direction, and focus in the vertical direction and defocus in the horizontal direction, and an important content of the optical design is that the positions and the intensities of the dipole magnets 1-8 and the quadrupole magnets 2-1-2-10 are reasonably set, so that the horizontal direction and the vertical direction can be stably and periodically focused and defocused without uncontrollable divergence;
2. accelerating: the high-frequency cavity 10-1 is an important element of a synchrotron, and is used for generating a high-frequency alternating electric field, so that a beam can be slightly accelerated every time when passing through the high-frequency cavity, the speed of the beam is increased after acceleration, the deflection radius is increased when passing through the same magnetic field, the conditions of a closed track and focusing can not be met any more, the beam is collided with a vacuum wall and lost, in order to avoid the loss of the beam, the magnetic fields in the dipolar magnet and the quadrupole magnet must be synchronously raised along with the energy of the beam, and the beam track and focusing and defocusing are ensured to be unchanged. After the beam current is accelerated by hundreds of thousands to millions of circles, the energy is increased to the target energy, and then the beam current can be led out;
3. leading out: the method is characterized in that a slow extraction method is adopted, the method is different from a fast extraction single loop and can be used for completely extracting the beam in a synchronous accelerator, the slow extraction is used for slowly extracting the beam in hundreds of thousands to millions of loops and is used for the field of uniform beam scanning such as industrial irradiation, cancer treatment and the like, firstly, the horizontal working point of the synchronous accelerator is adjusted to be 1/3 resonance line accessories through four-pole magnets 2-1-2-10, secondly, six-pole magnets 3-1-3-6 are started, a first six-pole magnet 3-1 and a fourth six-pole magnet 3-4 are used for vertical chromaticity correction, a second six-pole magnet 3-2 and a fifth six-pole magnet 3-5 are used for horizontal chromaticity correction, a third six-pole magnet 3-3 and a sixth-pole magnet 3-6 are used for driving resonant slow extraction, the beam phase space is changed into a triangle shape, the condition of three-order resonance is met, then, under the action of slow extraction excitation 7-1, the oscillation amplitude is controllably increased, the beam gradually enters a non-stable area, the oscillation amplitude is increased, the beam is extracted from the static electricity deflection plate 5-2, the beam is deflected and then enters the synchronous accelerator, and is cut by the magnet, and the beam is extracted by the synchronous extraction process is completed (2-4).
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (10)
1. A compact multi-ion synchrotron, comprising: the compact multi-ion synchrotron comprises a symmetrical optical structure, wherein the symmetrical optical structure comprises a plurality of linear ion beam sections and a plurality of arc ion beam sections, the plurality of linear ion beam sections and the plurality of arc ion beam sections are alternately arranged, and the plurality of linear ion beam sections are sequentially a first long straight section, a first short straight section, a second long straight section, a third long straight section, a fourth long straight section, a second short straight section, a fifth long straight section and a sixth long straight section along the clockwise direction;
a quadrupole magnet assembly consisting of a first quadrupole magnet and a second quadrupole magnet is arranged on the first long straight section, a third quadrupole magnet is arranged on the first short straight section, a quadrupole magnet assembly consisting of a fourth quadrupole magnet and a fifth quadrupole magnet is arranged on the second long straight section, a quadrupole magnet assembly consisting of a sixth quadrupole magnet and a seventh quadrupole magnet is arranged on the fourth long straight section, an eighth quadrupole magnet is arranged on the second short straight section, and a quadrupole magnet assembly consisting of a ninth quadrupole magnet and a fourteenth quadrupole magnet is arranged on the fifth long straight section;
the arc ion beam section is provided with two-pole magnets, the two-pole magnets are a first two-pole magnet, a second two-pole magnet, a third two-pole magnet, a fourth two-pole magnet, a fifth two-pole magnet, a sixth two-pole magnet, a seventh two-pole magnet and an eighth two-pole magnet in sequence along the clockwise direction, and the first two-pole magnet is connected with the second two-pole magnet through the first long straight section;
wherein, the half of first dipolar magnet, first quadrupole magnet and second quadrupole magnet, second dipolar magnet, third quadrupole magnet constitutes optical unit A, the half of fourth dipolar magnet, fourth quadrupole magnet and fifth quadrupole magnet, third dipolar magnet, third quadrupole magnet constitutes optical unit B, optical unit A with optical unit B is mirror symmetry, and a plurality of dipolar magnet and a plurality of quadrupole magnet constitute four-fold mirror symmetry's octagon structure along the clockwise.
2. The compact multi-ion synchrotron of claim 1, wherein: first quadrupole magnet, third quadrupole magnet, fifth quadrupole magnet, sixth quadrupole magnet, eighth quadrupole magnet and fourteenth quadrupole magnet are focusing magnets, second quadrupole magnet, fourth quadrupole magnet, seventh quadrupole magnet and ninth quadrupole magnet are defocusing magnets.
3. A compact multi-ion synchrotron as recited in claim 2, wherein:
the deflection angle of each dipolar magnet is 45 degrees, and the range of the edge angle is 0-15 degrees;
the integral gradient field range of the focusing quadrupole magnet in each quadrupole magnet assembly is 0.1/m-1.0/m, the integral gradient field range of the defocusing quadrupole magnet is-0.1/m-1.0/m, and the integral gradient field range of one half part of the third quadrupole magnet and the eighth quadrupole magnet is 0.1/m-1/m;
the arc ion beam section is provided with a short straight line section, and the length range of the short straight line section is 0.3-3 m;
the distance between the dipolar magnet and the adjacent quadrupole magnet is 0.1-1 m, and the distance between the two quadrupole magnets in the quadrupole magnet assembly is 1-5 m.
4. The compact multi-ion synchrotron of claim 1, further comprising:
the injection system comprises an injection cutting magnet and an injection static deflection plate, the injection cutting magnet and the injection static deflection plate are arranged on the first long straight section and are arranged between the first quadrupole magnet and the second quadrupole magnet, the injection static deflection plate is positioned at the downstream of the injection cutting magnet, the injection cutting magnet is used for deflecting an injection beam to be close to the beam acceptance of the synchrotron, and the injection static deflection plate is used for deflecting the beam deflected by the injection cutting magnet again and sending the beam into the acceptance of the synchrotron;
the leading-out system comprises a first leading-out cutting magnet, a second leading-out cutting magnet and a leading-out electrostatic deflection plate, the first leading-out cutting magnet and the second leading-out cutting magnet are located on a sixth quadrupole magnet and a seventh quadrupole magnet, the fourth long straight section is arranged between the sixth quadrupole magnet and the seventh quadrupole magnet, the second leading-out cutting magnet is located at the downstream of the first leading-out cutting magnet, the leading-out electrostatic deflection plate is arranged on a third long straight section, the leading-out electrostatic deflection plate is used for cutting beams with increased internal resonance amplitude of the synchrotron and deviating from the acceptance of the synchrotron, and the first leading-out cutting magnet and the second leading-out cutting magnet are used for further deflecting the beams separated by the leading-out electrostatic deflection plate outwards of the synchrotron and leading out the synchrotron.
5. The compact multi-ion synchrotron of claim 4, wherein:
a six-pole magnet assembly composed of a first six-pole magnet and a second six-pole magnet is arranged on the second long straight section, and the first six-pole magnet and the second six-pole magnet are arranged between the fourth four-pole magnet and the fifth four-pole magnet;
a third hexapole magnet is arranged on the third long straight section;
a sixth-pole magnet assembly composed of a fourth six-pole magnet and a fifth six-pole magnet is arranged on the fifth long straight section, and the fourth six-pole magnet and the fifth six-pole magnet are arranged between the ninth quadrupole magnet and the fourteenth quadrupole magnet;
a sixth long straight section is provided with a sixth magnet;
the first six-pole magnet and the fourth six-pole magnet are used for vertical chromaticity correction, the second six-pole magnet and the fifth six-pole magnet are used for horizontal chromaticity correction, and the third six-pole magnet and the sixth six-pole magnet are used for driving resonance slow extraction.
6. The compact multi-ion synchrotron of claim 5, wherein: a first injection convex rail magnet is arranged on the fifth long straight section and between the fourth hexapole magnet and the fifth hexapole magnet, a second injection convex rail magnet is arranged on the sixth long straight section and downstream of the sixth hexapole magnet, a third injection convex rail magnet is arranged on the first short straight section and downstream of the third quadrupolar magnet, and the first injection convex rail magnet, the second injection convex rail magnet and the third injection convex rail magnet are all used for shifting beam acceptance to the injection electrostatic deflection plate in the injection process;
the long straight section of the second is located first six-pole magnet with first leading-out convex rail magnet has been arranged between the second six-pole magnet, the long straight section of the fourth is located the second leading-out convex rail magnet has been arranged between seventh quadrupole magnet and the second leading-out cutting magnet, the short straight section of the second is located the third leading-out convex rail magnet has been arranged at the upstream of eighth quadrupole magnet, first leading-out convex rail magnet, second leading-out convex rail magnet and third leading-out convex rail magnet all are used for drawing the in-process beam current skew extremely slowly draw out the static deflector.
7. The compact multi-ion synchrotron of claim 6, wherein: and the second long straight section is provided with an extraction excitation, and the extraction excitation is arranged between the first hexapole magnet and the first extraction convex rail magnet and is used for controllably increasing the beam emittance in the slow extraction process.
8. The compact multi-ion synchrotron of claim 7, wherein: and the first long straight joint, the first short straight joint, the second long straight joint, the fourth long straight joint, the second short straight joint and the fifth long straight joint are respectively provided with a correcting magnet.
9. The compact multi-ion synchrotron of claim 7, wherein: the long straight festival of first long straight festival, first short straight festival, the long straight festival of second, the long straight festival of third, the long straight festival of fourth, the short straight festival of second, the long straight festival of fifth and the long straight festival of sixth have arranged respectively on the beam position detector, on the long straight festival of first long straight festival, the long straight festival of second, the long straight festival of fourth and the long straight festival of fifth beam position detector with correspond on the long straight festival rectify the intussusception setting of magnet, first short straight festival with on the short straight festival of second beam position detector with correspond on the short straight festival rectify intussusception magnet or separation setting, the long straight festival of third with on the long straight festival of sixth beam position detector with correspond on the long straight festival the intussusception setting of six-pole magnet.
10. The compact multi-ion synchrotron of claim 9, wherein: and a high-frequency cavity is arranged on the sixth long straight section and between the sixth pole magnet and the second injection convex rail magnet and is used for providing energy for the beam current in the acceleration process.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112822830A (en) * | 2020-11-25 | 2021-05-18 | 中国科学院近代物理研究所 | Proton and light ion synchrotron, therapeutic system containing the same and application |
| CN113382529A (en) * | 2021-06-08 | 2021-09-10 | 兰州科近泰基新技术有限责任公司 | Superconducting ion annular synchrotron |
| CN114867184A (en) * | 2022-06-15 | 2022-08-05 | 中国科学院近代物理研究所 | Compact multi-ion accelerator treatment device and application thereof |
| CN115003004A (en) * | 2022-05-25 | 2022-09-02 | 国科离子医疗科技有限公司 | Miniaturized ion synchrotron |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112822830A (en) * | 2020-11-25 | 2021-05-18 | 中国科学院近代物理研究所 | Proton and light ion synchrotron, therapeutic system containing the same and application |
| CN113382529A (en) * | 2021-06-08 | 2021-09-10 | 兰州科近泰基新技术有限责任公司 | Superconducting ion annular synchrotron |
| CN115003004A (en) * | 2022-05-25 | 2022-09-02 | 国科离子医疗科技有限公司 | Miniaturized ion synchrotron |
| CN114867184A (en) * | 2022-06-15 | 2022-08-05 | 中国科学院近代物理研究所 | Compact multi-ion accelerator treatment device and application thereof |
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