CN115356262A - Efficient detection method for quartz glass processing subsurface damage - Google Patents
Efficient detection method for quartz glass processing subsurface damage Download PDFInfo
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- CN115356262A CN115356262A CN202210968907.1A CN202210968907A CN115356262A CN 115356262 A CN115356262 A CN 115356262A CN 202210968907 A CN202210968907 A CN 202210968907A CN 115356262 A CN115356262 A CN 115356262A
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- 238000001514 detection method Methods 0.000 title claims abstract description 70
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 62
- 238000012545 processing Methods 0.000 title claims abstract description 26
- 238000006073 displacement reaction Methods 0.000 claims abstract description 19
- 230000031700 light absorption Effects 0.000 claims abstract description 12
- 238000003384 imaging method Methods 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 11
- 230000010287 polarization Effects 0.000 claims description 7
- 238000010521 absorption reaction Methods 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 2
- 230000009286 beneficial effect Effects 0.000 abstract description 3
- 230000000149 penetrating effect Effects 0.000 abstract description 2
- 230000001066 destructive effect Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000009659 non-destructive testing Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012014 optical coherence tomography Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000000204 total internal reflection microscopy Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
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Abstract
The invention discloses a quartz glass processing subsurface damage efficient detection method, which comprises the following steps: placing a light absorption sheet on a displacement platform; placing quartz glass to be detected on a light absorption sheet; starting a laser device to emit laser with the wavelength of 300-500nm for detection; starting a photoelectric detector to detect a scattering signal of the sub-surface damage of the quartz glass to be detected; and analyzing and processing the signals measured by the photoelectric detector by the computer to obtain the position information of the quartz glass processing subsurface damage. According to the invention, the beam expander is used for expanding the light spot of the detection light beam, so that the detection efficiency is greatly improved, and the efficient detection of the quartz glass processing subsurface damage is realized. The invention uses laser with wavelength of 300-500nm, has shorter wavelength, is beneficial to the scattering of the detection laser at the crack of the quartz glass and enhances the detection signal. The invention uses the light absorption sheet to prevent the detection light beam from penetrating through the quartz glass and generating scattering with the lower direction displacement platform to influence the detection result, thereby reducing the detection error.
Description
Technical Field
The invention relates to the field of detection of quartz glass processing subsurface damage, in particular to a high-efficiency detection method of quartz glass processing subsurface damage.
Background
The quartz glass has excellent physical and chemical properties, and is widely applied to the fields of high-energy lasers, semiconductors, optical fibers, chemical industries, special light sources, photovoltaic industries and the like. Grinding is an important step in the processing of quartz glass. However, due to the hard and brittle nature of quartz glass, machined sub-surface damage can occur to the ground workpiece. The detection of the damage of the machined subsurface is very important for optimizing the machining process.
The current method for detecting the damage of the machined subsurface of the quartz glass is mainly divided into destructive detection and nondestructive detection. The destructive detection technology is to expose the subsurface damage information and then carry out microscopic observation by locally or completely destroying the material, so as to obtain the subsurface damage information. The destructive detection method is greatly influenced by experimental conditions and experience of operators, and the in-situ detection integration is difficult to realize due to the lack of standards or specifications of destructive detection modes of quartz glass at home and abroad at present, so that the overall production efficiency is reduced. The nondestructive testing technology does not damage the testing sample, and realizes the sub-surface damage testing by means of scientific principles such as optics, electricity and the like. The nondestructive testing of the quartz glass subsurface damage can realize on-site testing, has high efficiency, can provide guidance for optimizing the processing technology, can greatly reduce the whole production cycle, and improves the productivity and the benefit, so the nondestructive testing is the future development direction of the quartz glass processing subsurface damage testing. The prior quartz glass subsurface nondestructive detection method mainly comprises a polarized laser scattering method, an optical coherence tomography method, a laser scattering confocal method, a total internal reflection microscopy, a scanning ultrasonic detection method SAM and the like. The polarized laser detection method effectively eliminates the influence of the roughness of the processed surface by utilizing the characteristics that the polarization state of the surface scattered light is consistent with that of the incident laser and the polarization state of the sub-surface damage scattered light is different from that of the incident laser. Therefore, the polarized laser scattering detection method has wide application prospect in the detection of the quartz glass subsurface damage.
The prior polarization laser detection device can realize the subsurface damage detection of semiconductor materials such as silicon wafers and the like. However, since the transmittance of the quartz glass is high, it is difficult to apply the existing polarized laser detection method to the detection of the quartz glass processing subsurface damage. Meanwhile, the existing polarized laser detection method uses a focused light beam to scan the subsurface damage, the scanning detection time is long, and the efficient detection of the quartz glass processing subsurface damage is difficult to realize.
Disclosure of Invention
In order to solve the problems in the prior art, the invention designs a quartz glass processing subsurface damage efficient detection method which can realize rapid scanning and can adopt polarized laser for detection.
In order to achieve the purpose, the technical scheme of the invention is as follows: a quartz glass processing subsurface damage efficient detection method adopts a detection device for quartz glass subsurface damage signals to detect, and the specific method comprises the following steps:
A. placing the light absorption sheet on a displacement platform;
B. putting quartz glass to be detected on a light absorption sheet;
C. starting a laser to emit laser with the wavelength of 300-500nm, namely emergent light, converting the laser into beam-expanded light beams after beam expansion through a beam expander, converting the beam-expanded light beams into linearly polarized laser, namely detection light beams through a polaroid, and reflecting the linearly polarized laser to the surface of quartz glass to be detected through a polarization beam splitter, wherein the light transmitted through the quartz glass is absorbed by a light absorption sheet;
D. the exit line polarized light scattered and depolarized by the sub-surface damage of the quartz glass is focused by the polarizing beam splitter and the imaging lens and then received by the photoelectric detector;
E. controlling a displacement platform by using a computer to enable linear polarized laser to irradiate on the surface of the quartz glass to be detected; controlling the displacement platform to scan and detect along an X axis and a Y axis according to an S-shaped detection path to complete the detection of the quartz glass to be detected;
F. and analyzing and processing the signals measured by the photoelectric detector by the computer to obtain the position information of the quartz glass subsurface damage.
Furthermore, the detection device for the quartz glass subsurface damage signal comprises a laser, a beam expander, a polarizing plate, a polarizing beam splitter, an optical absorption plate, a displacement platform, an imaging lens, a photoelectric detector, a dark field box and a signal processing system;
the laser provides a detection light source;
the beam expander is placed in front of the laser;
the polaroid is placed in front of the beam expander;
the polarizing beam splitter is arranged in front of the polaroid;
the imaging lens is positioned above the polarizing beam splitter; the photoelectric detector is positioned above the imaging lens;
the dark field box covers the laser, the beam expander, the polaroid, the polarizing beam splitter, the displacement platform, the imaging lens and the photoelectric detector.
The signal processing system comprises a data acquisition card, a computer and a motion controller.
Compared with the prior art, the invention has the following beneficial effects:
1. according to the invention, the beam expander is used, the light spot of the detection light beam is enlarged, the detection efficiency is greatly improved, and the efficient detection of the sub-surface damage of the quartz glass is realized.
2. The invention uses laser with wavelength of 300-500nm, has shorter wavelength, is beneficial to the detection of the scattering of the laser at the crack of the quartz glass and enhances the detection signal.
3. The invention uses the light absorption sheet to prevent the detection light beam from penetrating through the quartz glass and generating scattering with the lower direction displacement platform to influence the detection result, thereby reducing the detection error.
4. The invention uses the dark field box to cover the detection area, thereby avoiding the interference of stray light such as natural light and the like to the detection process and reducing the detection error.
Drawings
FIG. 1 shows a flow chart of the present invention.
FIG. 2 shows a schematic view of the structure of an apparatus used in the present invention.
FIG. 3 is a graph showing scattering signals of quartz glass processed subsurface damage.
Fig. 4 is a schematic diagram of a scanning detection route according to the present invention.
In the figure: 1. the device comprises a laser, 2, emergent light, 3, a beam expander, 4, a beam expanding light beam, 5, a polaroid, 6, a detection light beam, 7, a polarization beam splitter, 8, emergent linear polarized light, 9, an imaging lens, 10, a photoelectric detector, 11, a data acquisition card, 12, a computer, 13, a motion controller, 14, quartz glass, 15, a light absorption sheet, 16, a displacement platform, 17, a dark field box, 18, quartz glass subsurface damage, 19 and a detection path.
Detailed Description
The invention is further described below with reference to the accompanying drawings. As shown in fig. 1-4, a method for efficiently detecting quartz glass subsurface damage, which uses a detection device for detecting quartz glass processing subsurface damage, comprises the following steps:
A. placing the light absorption sheet 15 on a displacement platform 16;
B. placing the quartz glass 14 to be detected on the light absorption sheet 15;
C. starting a laser 1 to emit laser with the wavelength of 300-500nm, namely emergent light 2, expanding the beam by a beam expander 3 to become a beam-expanded light beam 4, then changing the beam into linearly polarized laser, namely a detection light beam 6, by a polaroid 5, and reflecting the linearly polarized laser to the surface of quartz glass 14 to be detected by a polarization spectroscope 7, wherein the light transmitted through the quartz glass 14 is absorbed by a wave absorption plate;
D. the emergent linearly polarized light 8 scattered and depolarized by the quartz glass subsurface damage 18 is focused by the polarizing beam splitter 7 and the imaging lens 10 and then received by the photoelectric detector 10;
E. controlling a displacement platform 16 by using a computer 12 to enable linearly polarized laser to irradiate on the surface of the quartz glass 14 to be measured; controlling the displacement platform 16 to scan and detect along the X axis and the Y axis according to the S-shaped detection path 19 to complete the detection of the quartz glass 14 to be detected;
F. the computer 12 analyzes and processes the signals detected by the photoelectric detector 10 to obtain the position information of the quartz glass subsurface damage 18.
Further, the detection device for the quartz glass subsurface damage signal comprises a laser 1, a beam expander 3, a polarizing film 5, a polarizing beam splitter 7, a light absorption sheet 15, a displacement platform 16, an imaging lens 9, a photoelectric detector 10, a dark field box 17 and a signal processing system;
the laser 1 provides a detection light source;
the beam expander 3 is arranged in front of the laser 1;
the polaroid 5 is placed in front of the beam expander 3;
the polarizing beam splitter 7 is arranged in front of the polarizing film 5;
the imaging lens 9 is positioned above the polarizing beam splitter 7;
the photoelectric detector 10 is positioned above the imaging lens 9;
the dark field box 17 covers the laser 1, the beam expander 3, the polaroid 5, the polarizing beam splitter 7, the displacement platform 16, the imaging lens 9 and the light detector 10.
The signal processing system comprises a data acquisition card 11, a computer 12 and a motion controller 13.
The present invention is not limited to the embodiment, and any equivalent idea or change within the technical scope of the present invention is to be regarded as the protection scope of the present invention.
Claims (2)
1. A quartz glass processing subsurface damage efficient detection method is characterized by comprising the following steps: the detection device for the quartz glass subsurface damage signal is adopted for detection, and the specific method comprises the following steps:
A. placing the light absorbing sheet (15) on a displacement platform (16);
B. placing quartz glass (14) to be detected on an optical absorption sheet (15);
C. starting a laser (1) to emit laser with the wavelength of 300-500nm, namely emergent light (2), expanding the beam by a beam expander (3), then changing the beam into a beam expanding beam (4), changing the beam into linearly polarized laser, namely detection beam (6), through a polaroid (5), and reflecting the linearly polarized laser to the surface of quartz glass (14) to be detected through a polarization spectroscope (7), wherein the light transmitting the quartz glass (14) is absorbed by a wave absorption plate;
D. the emergent linearly polarized light (8) which is scattered and depolarized by the quartz glass subsurface damage (18) is focused by the polarizing beam splitter (7) and the imaging lens (10) and then received by the photoelectric detector (10);
E. controlling a displacement platform (16) by using a computer (12) to enable linearly polarized laser to irradiate on the surface of quartz glass (14) to be measured; controlling the displacement platform (16) to scan and detect along an X axis and a Y axis according to an S-shaped detection path (19) to finish the detection of the whole surface of the quartz glass (14) to be detected;
F. the computer (12) analyzes and processes the signals measured by the photoelectric detector (10) to obtain the position information of the quartz glass subsurface damage (18).
2. The method for efficiently detecting the damage of the quartz glass processing subsurface according to claim 1, wherein the method comprises the following steps: the detection device for the damage of the quartz glass processing subsurface comprises a laser (1), a beam expander (3), a polarizing plate (5), a polarizing beam splitter (7), a light absorption plate (15), a displacement platform (16), an imaging lens (9), a photoelectric detector (10), a dark field box (17) and a signal processing system;
the laser (1) provides a detection light source;
the beam expander (3) is placed in front of the laser (1);
the polaroid (5) is placed in front of the beam expander (3);
the polarizing beam splitter (7) is arranged in front of the polaroid (5);
the imaging lens (9) is positioned above the polarizing beam splitter (7); the photoelectric detector (10) is positioned above the imaging lens (9);
the dark field box (17) covers the laser (1), the beam expander (3), the polaroid (5), the polarizing beam splitter (7), the displacement platform (16), the imaging lens (9) and the photoelectric detector (10);
the signal processing system comprises a data acquisition card (11), a computer (12) and a motion controller (13).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210968907.1A CN115356262A (en) | 2022-08-12 | 2022-08-12 | Efficient detection method for quartz glass processing subsurface damage |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210968907.1A CN115356262A (en) | 2022-08-12 | 2022-08-12 | Efficient detection method for quartz glass processing subsurface damage |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117705827A (en) * | 2024-02-06 | 2024-03-15 | 上海强华实业股份有限公司 | Method for optimizing quartz glass defect detection based on multivariable fine burning energy consumption |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201110835Y (en) * | 2007-09-11 | 2008-09-03 | 中国科学院上海光学精密机械研究所 | Laser scattering detection device for large-caliber neodymium glass surface defects |
| CN109781665A (en) * | 2018-11-27 | 2019-05-21 | 大连理工大学 | A kind of device scattering detection semiconductor material sub-surface damage using polarization laser |
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2022
- 2022-08-12 CN CN202210968907.1A patent/CN115356262A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201110835Y (en) * | 2007-09-11 | 2008-09-03 | 中国科学院上海光学精密机械研究所 | Laser scattering detection device for large-caliber neodymium glass surface defects |
| CN109781665A (en) * | 2018-11-27 | 2019-05-21 | 大连理工大学 | A kind of device scattering detection semiconductor material sub-surface damage using polarization laser |
Non-Patent Citations (1)
| Title |
|---|
| 马浩: "研磨石英玻璃亚表面损伤三维重构方法", 《机电工程技术》, vol. 50, no. 10, 31 October 2021 (2021-10-31), pages 64 - 67 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117705827A (en) * | 2024-02-06 | 2024-03-15 | 上海强华实业股份有限公司 | Method for optimizing quartz glass defect detection based on multivariable fine burning energy consumption |
| CN117705827B (en) * | 2024-02-06 | 2024-04-12 | 上海强华实业股份有限公司 | Method for optimizing quartz glass defect detection based on multivariable fine burning energy consumption |
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