CN115290953A - Self-driven mechanical signal sensor based on dynamic diode and preparation method thereof - Google Patents
Self-driven mechanical signal sensor based on dynamic diode and preparation method thereof Download PDFInfo
- Publication number
- CN115290953A CN115290953A CN202210730387.0A CN202210730387A CN115290953A CN 115290953 A CN115290953 A CN 115290953A CN 202210730387 A CN202210730387 A CN 202210730387A CN 115290953 A CN115290953 A CN 115290953A
- Authority
- CN
- China
- Prior art keywords
- mechanical signal
- insulating layer
- layer
- self
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002360 preparation method Methods 0.000 title abstract description 5
- 239000004065 semiconductor Substances 0.000 claims abstract description 35
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 19
- 239000010703 silicon Substances 0.000 claims description 19
- 229910052709 silver Inorganic materials 0.000 claims description 14
- 239000004332 silver Substances 0.000 claims description 14
- 238000000926 separation method Methods 0.000 claims description 8
- 238000004140 cleaning Methods 0.000 claims description 7
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 7
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 229910002601 GaN Inorganic materials 0.000 claims description 5
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 239000002033 PVDF binder Substances 0.000 claims description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 4
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 claims description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 3
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- ROUIDRHELGULJS-UHFFFAOYSA-N bis(selanylidene)tungsten Chemical compound [Se]=[W]=[Se] ROUIDRHELGULJS-UHFFFAOYSA-N 0.000 claims description 3
- HITXEXPSQXNMAN-UHFFFAOYSA-N bis(tellanylidene)molybdenum Chemical compound [Te]=[Mo]=[Te] HITXEXPSQXNMAN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- MHWZQNGIEIYAQJ-UHFFFAOYSA-N molybdenum diselenide Chemical compound [Se]=[Mo]=[Se] MHWZQNGIEIYAQJ-UHFFFAOYSA-N 0.000 claims description 3
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052982 molybdenum disulfide Inorganic materials 0.000 claims description 3
- 238000004806 packaging method and process Methods 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 230000007704 transition Effects 0.000 claims description 3
- ITRNXVSDJBHYNJ-UHFFFAOYSA-N tungsten disulfide Chemical compound S=[W]=S ITRNXVSDJBHYNJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000011787 zinc oxide Substances 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 230000007723 transport mechanism Effects 0.000 claims description 2
- 239000004812 Fluorinated ethylene propylene Substances 0.000 claims 2
- 229920009441 perflouroethylene propylene Polymers 0.000 claims 2
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 9
- 230000008569 process Effects 0.000 abstract description 8
- 239000002784 hot electron Substances 0.000 abstract description 6
- 238000001228 spectrum Methods 0.000 abstract description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 229910021389 graphene Inorganic materials 0.000 description 8
- 239000003292 glue Substances 0.000 description 7
- 239000012212 insulator Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- -1 polytetrafluoroethylene Polymers 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 241000282414 Homo sapiens Species 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
- G01R19/0092—Arrangements for measuring currents or voltages or for indicating presence or sign thereof measuring current only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
The invention discloses a self-driven mechanical signal sensor based on a dynamic diode and a preparation method thereof, and the self-driven mechanical signal sensor comprises a layered structure arranged in a package, wherein the layered structure comprises a semiconductor layer, an insulating layer and a gap layer arranged between the semiconductor layer and the insulating layer; the invention uses the potential difference between the metal and the semiconductor to excite high-energy hot electrons under the input of a broadband mechanical signal, and the high-energy hot electrons are transmitted through the insulating layer to form a same-frequency electrical signal for output. The flexible self-driven sensor based on the semiconductor/insulating layer/metal dynamic diode has the advantages of wide frequency spectrum, high voltage, flexibility, long service life and the like, and can keep good performance under extreme environments (sea, land and air). In addition, the invention has simple structure and lower cost, and can be compatible with the existing integrated circuit process, so that the self-driven sensor can be popularized and used in a large scale.
Description
Technical Field
The invention relates to a self-driven sensor and a manufacturing method thereof, in particular to a self-driven mechanical signal sensor based on a dynamic diode and a manufacturing method thereof.
Background
Nowadays, with the exploration of more coordinates on the earth by human beings, self-driven sensing devices in extreme environments are called for, and human beings urgently need integratable semiconductor sensing chips to provide powerful guarantee for further exploring the earth and even the universe. However, the integration of the current self-driven sensing device is low, and the wide-band mechanical vibration sensor based on the semiconductor still has a large upgrading space. For a long time, the industry and the academia are seeking a reliable solution to integrate broadband mechanical signals into the existing electrical signal systems. The main device model is some devices based on piezoelectric effect, the main principle is to output by using the charge displacement fixed in the material body, and the problem is obvious, namely higher internal resistance of the device and lower limit response amplitude. Therefore, a conductive current sensor capable of fast and accurate response under wide frequency and wide mechanical signal is urgently needed.
Therefore, a semiconductor/insulator/metal-based conduction current dynamic diode is designed, and a broadband mechanical signal input can be accurately and quickly converted into an electrical signal output with the same frequency through the physical processes of hot electron transition, rebound and in-vivo transport. The invention uses the potential difference between the metal and the semiconductor to excite high-energy thermal electrons under the input of broadband mechanical signals, and after rebounding at the interface, the high-energy thermal electrons jump through the insulating layer to form the output of the same-frequency electrical signals, thereby breaking the fixed mode that the insulating material can not conduct current in the traditional thinking. The flexible self-driven sensor based on the semiconductor/insulating layer/metal dynamic diode has the advantages of wide frequency spectrum, high voltage, flexibility, long service life and the like, and can keep good performance under extreme environments (sea, land and air).
Disclosure of Invention
The invention aims to provide a novel mechanical signal sensor and a preparation method thereof, the sensor is a self-driven mechanical signal sensor based on a dynamic diode, can realize output of same-frequency electrical signals under broadband mechanical signal input, and has quick response.
The technical scheme adopted by the invention is as follows:
a self-driven mechanical signal sensor based on a dynamic diode comprises a layered structure arranged in a package, wherein the layered structure comprises a semiconductor layer, an insulating layer and a gap layer arranged between the semiconductor layer and the insulating layer; the sensor converts external mechanical signal input into a same-frequency electrical signal output by dynamic contact and separation between the semiconductor layer and the insulating layer and by utilizing thermal electron transition, rebound and transport mechanisms in the dynamic diode.
Further, the semiconductor layer is one of silicon, gallium arsenide, indium gallium arsenide, zinc oxide, germanium, cadmium telluride, gallium nitride, indium phosphide, molybdenum disulfide, black phosphorus, tungsten diselenide, molybdenum ditelluride, molybdenum diselenide and tungsten disulfide.
Further, the insulating layer is one of insulating materials such as fluoroethylene propylene copolymer (FEP), polyvinylidene fluoride (PVDF), teflon (PTFE), hafnium oxide, titanium oxide, gallium nitride, lithium niobate, and aluminum oxide.
Further, the electrode on the insulating layer is any one of gold, silver, copper, aluminum, platinum and iron, or a plurality of metal materials capable of being formed into a film.
Furthermore, the electrode on the semiconductor layer is a composite electrode of one or more of gold, palladium, silver, titanium, chromium and nickel.
Further, the package is a flexible package.
Further, the thickness of the void layer is preferably not less than 10nm.
The method for preparing the self-driven mechanical signal sensor based on the dynamic diode comprises the following steps: after preparing a back electrode on the semiconductor layer, cleaning the surface and drying the surface; manufacturing a metal film electrode on the insulating layer; flexibly packaging the insulating layer and the semiconductor layer to form a gap layer between the semiconductor layer and the insulating layer; the electrodes are led out of the flexible package through the leads.
Compared with the prior art, the invention has the beneficial effects that:
the invention utilizes the potential difference between the metal and the semiconductor to excite high-energy thermal electrons on the interface of the insulating layer/the semiconductor layer under the input of broadband mechanical signals, the high-energy thermal electrons are transmitted through the insulating layer after rebounding, and the high-energy thermal electrons are guided away before relaxation, so as to form the output of the same-frequency electrical signals. The self-driven sensor based on the semiconductor/insulating layer/metal dynamic diode has the advantages of wide frequency spectrum, high voltage, flexibility, long service life and the like, and can keep good performance under extreme environments (sea, land and air). Taking a dynamic diode mechanical sensor based on P-type silicon/FEP/silver as an example, the sensor can realize 50V limit response, can stabilize the output of same frequency without obvious attenuation voltage under an ultra-wide mechanical frequency spectrum of 0-40kHz, can reach the fastest response time of 1 mu s measured by experiments, and can stably work under the extreme environments of underwater, extreme cold and the like.
Drawings
FIG. 1 is a schematic structural diagram of a self-driven mechanical signal sensor based on a semiconductor/insulator/metal dynamic diode according to the present invention;
FIG. 2 is a schematic diagram of a P-type silicon/FEP/silver based dynamic diode sensor;
fig. 3 is a graph of the output voltage of a P-type silicon/FEP/silver dynamic diode-based sensor at daily frequencies.
Fig. 4 and 5 are graphs of the output voltage of a P-type silicon/FEP/silver based dynamic diode sensor at ultrasonic frequencies.
Fig. 6 is a graph of the output voltage of a graphene film/FEP/silver based flexible dynamic diode sensor at daily frequencies.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and do not limit the invention.
Referring to fig. 1, the self-driven mechanical signal sensor based on dynamic diode of the present invention comprises a semiconductor layer 1, an insulator layer 2, and a metal layer 3 from bottom to top in sequence, wherein a back electrode is arranged on the semiconductor layer 1; packaging to form a gap layer by leaving a gap between the insulator layer 2 and the semiconductor layer 3, and leading the metal layer 3 and the back electrode out through leads; in a dynamic state, a mechanical signal is input to an interface between the semiconductor layer and the insulator layer to keep the semiconductor layer and the insulator layer in contact with each other and separated from each other.
Example 1
1) Depositing a layer of titanium electrode with the thickness of 50nm on the back of the P-silicon by an electron beam evaporation coating method;
2) Sequentially immersing the sample obtained in the step 1) into deionized water, acetone and isopropanol to carry out surface cleaning treatment;
3) Leading out a lead from the sample obtained in the step 2) at a back electrode;
4) Coating a layer of conductive silver paste with the thickness of 500nm on the surface of the FEP film;
5) Drying the sample obtained in the step 4), and sequentially immersing the sample into deionized water, acetone and isopropanol to carry out surface cleaning treatment;
6) Leading out a lead from the sample obtained in the step 5) on a conductive silver paste electrode;
7) After the edges of the obtained p-type silicon are lifted by using insulating glue, the insulating glue is adhered to the edges of the obtained FEP, and a 10nm gap layer is established between the p-type silicon and the FEP to form a working area;
8) Mechanical signals are vertically input into a working area, and the same-frequency electrical signals can be obtained and output after microscopic dynamic contact and separation;
FIG. 2 is a block diagram of a P-silicon/FEP/silver based dynamic diode sensor. The generator is shown in a schematic diagram of fig. 2, in the process of contacting P-silicon and FEP, high-energy hot electrons in P-type silicon are excited to be above a conduction band, and enter a body after rebounding at an interface to form ultra-fast transportation; in the separation process, after the hot holes form a similar kinetic process, an inverted electric signal is output. FIG. 3 is a graph of the power frequency output voltage of a P-silicon/FEP/silver based dynamic diode sensor. Fig. 4 and 5 are graphs of high-frequency output voltage of a P-silicon/FEP/silver dynamic diode sensor.
Example 2
1) Coating conductive silver paste on the graphene film, and drying;
2) Sequentially immersing the sample obtained in the step 1) into deionized water, acetone and isopropanol to carry out surface cleaning treatment;
3) Leading out a lead from the sample obtained in the step 2) on a copper foil back electrode;
4) Coating a layer of conductive silver paste with the thickness of 500nm on one side of the FEP film;
5) Drying the sample obtained in the step 4);
6) Leading out a lead from the sample obtained in the step 5) on a conductive silver paste electrode;
7) After the edges of the obtained graphene are raised by insulating glue, the edges of the obtained graphene are adhered to the edges of the obtained FEP through the insulating glue, and a 20nm high gap layer is established between the edges of the obtained graphene and the FEP to form a working area;
8) Mechanical signals are vertically input into a working area, and the same-frequency electrical signals can be obtained and output after microscopic dynamic contact and separation;
taking a graphene film/FEP/silver-based dynamic diode generator as an example, high-energy hot electrons in a graphite film can be excited to be above a Dirac point in the contact process of the graphene film and the FEP, and enter a body to form ultra-fast transportation after interface rebounding, and simultaneously, a carrier self-avalanche effect is accompanied; in the separation process, after the hot holes form a similar kinetic process, an inverted electric signal is output. Fig. 6 is a graph of the power frequency output voltage of a graphene film/FEP/silver based flexible dynamic diode sensor.
Example 3
1) Depositing a layer of nickel-gold electrode on the back of the n-silicon rod by an electron beam evaporation coating method, wherein the thickness of the nickel-gold electrode is 50nm;
2) Sequentially immersing the sample obtained in the step 1) into deionized water, acetone and isopropanol to carry out surface cleaning treatment;
3) Leading out a lead from the sample obtained in the step 2) at a back electrode;
4) Spraying a layer of conductive copper paste on the surface of the polytetrafluoroethylene, wherein the thickness of the conductive copper paste is 500nm;
5) Drying the sample obtained in the step 4), and sequentially immersing the sample into deionized water, acetone and isopropanol to carry out surface cleaning treatment;
6) Leading out a lead from the sample obtained in the step 5) on a conductive silver paste electrode;
7) After the edges of the obtained n-type silicon are heightened by using insulating glue, the insulating glue is adhered with the edges of polytetrafluoroethylene, and a 20 nm-high clearance layer is established in the glue-free middle parts of the insulating glue and the polytetrafluoroethylene to form a working area;
8) Mechanical signals are vertically input into a working area, and the same-frequency electrical signals can be obtained and output after microcosmic dynamic contact and separation;
according to the obtained dynamic diode sensor based on n-silicon/polytetrafluoroethylene/copper, high-energy hot electrons in n-type silicon can be excited to be above a conduction band in the process of contacting n-silicon with polytetrafluoroethylene, and enter a body to form ultra-fast transportation after interface rebounding; during the separation process, after the hot holes form a similar kinetic process, an inverted electric signal is output.
In addition, through a large number of experimental researches, the semiconductor layer can also be any one of indium gallium arsenic, zinc oxide, germanium, cadmium telluride, gallium nitride, indium phosphide, molybdenum disulfide, black phosphorus, tungsten diselenide, molybdenum ditelluride, molybdenum diselenide and tungsten disulfide, the prepared samples can generate similar electric signal output, specific preparation methods are not described any more, and the technical scheme description of the invention can be realized by the technical personnel in the field.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.
Claims (8)
1. A self-driven mechanical signal sensor based on a dynamic diode is characterized by comprising a layered structure arranged in a package, wherein the layered structure comprises a semiconductor layer, an insulating layer and a gap layer arranged between the semiconductor layer and the insulating layer; the sensor converts external mechanical signal input into a same-frequency electrical signal output by dynamic contact and separation between the semiconductor layer and the insulating layer and by utilizing thermal electron transition, rebound and transport mechanisms in the dynamic diode.
2. The dynamic diode based self driven mechanical signal sensor of claim 1 wherein said semiconductor layer is one of silicon, gallium arsenide, indium gallium arsenide, zinc oxide, germanium, cadmium telluride, gallium nitride, indium phosphide, molybdenum disulfide, black phosphorus, tungsten diselenide, molybdenum ditelluride, molybdenum diselenide, tungsten disulfide.
3. The dynamic diode-based self-driven mechanical signal sensor as claimed in claim 1, wherein the insulating layer is one of Fluorinated Ethylene Propylene (FEP), polyvinylidene fluoride (PVDF), teflon (PTFE), hafnium oxide, titanium oxide, gallium nitride, lithium niobate, and aluminum oxide.
4. The dynamic diode-based self-driven mechanical signal sensor as claimed in claim 1, wherein the electrode on the insulating layer is any one or more of gold, silver, copper, aluminum, platinum, and iron.
5. The dynamic diode-based self-driven mechanical signal sensor as claimed in claim 1, wherein the electrode on the semiconductor layer is a composite electrode of one or more of gold, palladium, silver, titanium, chromium and nickel.
6. The dynamic diode-based self-driven mechanical signal sensor of claim 1, wherein said package is a flexible package.
7. The dynamic diode-based self-driven mechanical signal sensor of claim 1, wherein said voided layer has a thickness of no less than 10nm.
8. A method of making a dynamic diode-based self-driven mechanical signal sensor as claimed in any one of claims 1 to 7, comprising: after preparing a back electrode on the semiconductor layer, cleaning the surface and drying the surface; manufacturing a metal film electrode on the insulating layer; flexibly packaging the insulating layer and the semiconductor layer to form a gap layer between the semiconductor layer and the insulating layer; the electrodes are led out of the flexible package through leads.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210730387.0A CN115290953B (en) | 2022-06-24 | 2022-06-24 | Self-driven mechanical signal sensor based on dynamic diode and preparation method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210730387.0A CN115290953B (en) | 2022-06-24 | 2022-06-24 | Self-driven mechanical signal sensor based on dynamic diode and preparation method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
CN115290953A true CN115290953A (en) | 2022-11-04 |
CN115290953B CN115290953B (en) | 2024-05-17 |
Family
ID=83820361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202210730387.0A Active CN115290953B (en) | 2022-06-24 | 2022-06-24 | Self-driven mechanical signal sensor based on dynamic diode and preparation method thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN115290953B (en) |
Citations (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3817750A (en) * | 1970-05-05 | 1974-06-18 | Licentia Gmbh | Method of producing a semiconductor device |
JPH02310974A (en) * | 1989-05-25 | 1990-12-26 | Mitsubishi Electric Corp | Semiconductor photodetector |
US5591321A (en) * | 1993-11-02 | 1997-01-07 | Electric Power Research Institute | Detection of fluids with metal-insulator-semiconductor sensors |
CN101179075A (en) * | 2006-11-10 | 2008-05-14 | 冲电气工业株式会社 | High-voltage-withstanding semiconductor device and fabrication method thereof |
CN101202293A (en) * | 2006-12-13 | 2008-06-18 | 和舰科技(苏州)有限公司 | Image sensor and method of manufacture |
US20080217623A1 (en) * | 2007-03-08 | 2008-09-11 | Kabushiki Kaisha Toshiba | Optical sensor element and method for driving the same |
CN101714566A (en) * | 2008-10-03 | 2010-05-26 | 索尼株式会社 | Sensor element and method of driving sensor element, and input device, display device with input function and communication device |
CN101777620A (en) * | 2009-12-31 | 2010-07-14 | 深圳市蓝科电子有限公司 | High-power LED lead frame using graphite material as substrate, and preparation method |
JP2012156286A (en) * | 2011-01-26 | 2012-08-16 | Tateyama Kagaku Kogyo Kk | Infrared sensor |
WO2013071335A1 (en) * | 2011-11-14 | 2013-05-23 | Hardcastle Philip | Multilayered heat to power conversion device |
CN105136860A (en) * | 2015-07-24 | 2015-12-09 | 浙江大学 | Humidity sensor based on graphene oxide/graphene/silicon and preparation method thereof |
CN105470313A (en) * | 2014-08-12 | 2016-04-06 | 北京纳米能源与***研究所 | Back-gate field effect transistor based on contact electrification |
CN109906376A (en) * | 2016-11-02 | 2019-06-18 | 株式会社Lg化学 | Gas detection sensor |
CN109935627A (en) * | 2019-01-21 | 2019-06-25 | 上海易密值半导体技术有限公司 | Thin film transistor (TFT) |
CN111297321A (en) * | 2018-12-18 | 2020-06-19 | 北京纳米能源与***研究所 | Transparent flexible sensor, preparation method thereof, electronic skin and wearable device |
CN112152509A (en) * | 2020-07-10 | 2020-12-29 | 浙江大学 | Novel direct current generator based on semiconductor/polar liquid/semiconductor dynamic diode and preparation method thereof |
CN112165275A (en) * | 2020-08-26 | 2021-01-01 | 浙江大学 | Dynamic diode generator capable of working at extremely low temperature and preparation method thereof |
CN113169224A (en) * | 2018-12-27 | 2021-07-23 | 京瓷株式会社 | Circuit and electric device |
CN113594271A (en) * | 2021-07-22 | 2021-11-02 | 浙江大学杭州国际科创中心 | Wide-spectrum photoelectric detector based on two-dimensional material/insulating layer/semiconductor structure |
CN114256362A (en) * | 2021-12-15 | 2022-03-29 | 欧梯恩智能科技(苏州)有限公司 | Photoelectric detector and preparation method thereof |
CN114300541A (en) * | 2021-12-30 | 2022-04-08 | 广州华星光电半导体显示技术有限公司 | Thin film transistor, manufacturing method thereof and array substrate |
CN114497314A (en) * | 2022-04-18 | 2022-05-13 | 泉州三安半导体科技有限公司 | Light emitting diode and light emitting device |
CN114551497A (en) * | 2022-02-23 | 2022-05-27 | 浙江大学 | Graphene-semiconductor dynamic diode high-performance generator with vertical structure and preparation method thereof |
-
2022
- 2022-06-24 CN CN202210730387.0A patent/CN115290953B/en active Active
Patent Citations (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3817750A (en) * | 1970-05-05 | 1974-06-18 | Licentia Gmbh | Method of producing a semiconductor device |
JPH02310974A (en) * | 1989-05-25 | 1990-12-26 | Mitsubishi Electric Corp | Semiconductor photodetector |
US5591321A (en) * | 1993-11-02 | 1997-01-07 | Electric Power Research Institute | Detection of fluids with metal-insulator-semiconductor sensors |
CN101179075A (en) * | 2006-11-10 | 2008-05-14 | 冲电气工业株式会社 | High-voltage-withstanding semiconductor device and fabrication method thereof |
CN101202293A (en) * | 2006-12-13 | 2008-06-18 | 和舰科技(苏州)有限公司 | Image sensor and method of manufacture |
US20080217623A1 (en) * | 2007-03-08 | 2008-09-11 | Kabushiki Kaisha Toshiba | Optical sensor element and method for driving the same |
CN101714566A (en) * | 2008-10-03 | 2010-05-26 | 索尼株式会社 | Sensor element and method of driving sensor element, and input device, display device with input function and communication device |
CN101777620A (en) * | 2009-12-31 | 2010-07-14 | 深圳市蓝科电子有限公司 | High-power LED lead frame using graphite material as substrate, and preparation method |
JP2012156286A (en) * | 2011-01-26 | 2012-08-16 | Tateyama Kagaku Kogyo Kk | Infrared sensor |
WO2013071335A1 (en) * | 2011-11-14 | 2013-05-23 | Hardcastle Philip | Multilayered heat to power conversion device |
CN105470313A (en) * | 2014-08-12 | 2016-04-06 | 北京纳米能源与***研究所 | Back-gate field effect transistor based on contact electrification |
CN105136860A (en) * | 2015-07-24 | 2015-12-09 | 浙江大学 | Humidity sensor based on graphene oxide/graphene/silicon and preparation method thereof |
CN109906376A (en) * | 2016-11-02 | 2019-06-18 | 株式会社Lg化学 | Gas detection sensor |
CN111297321A (en) * | 2018-12-18 | 2020-06-19 | 北京纳米能源与***研究所 | Transparent flexible sensor, preparation method thereof, electronic skin and wearable device |
CN113169224A (en) * | 2018-12-27 | 2021-07-23 | 京瓷株式会社 | Circuit and electric device |
CN109935627A (en) * | 2019-01-21 | 2019-06-25 | 上海易密值半导体技术有限公司 | Thin film transistor (TFT) |
CN112152509A (en) * | 2020-07-10 | 2020-12-29 | 浙江大学 | Novel direct current generator based on semiconductor/polar liquid/semiconductor dynamic diode and preparation method thereof |
CN112165275A (en) * | 2020-08-26 | 2021-01-01 | 浙江大学 | Dynamic diode generator capable of working at extremely low temperature and preparation method thereof |
CN113594271A (en) * | 2021-07-22 | 2021-11-02 | 浙江大学杭州国际科创中心 | Wide-spectrum photoelectric detector based on two-dimensional material/insulating layer/semiconductor structure |
CN114256362A (en) * | 2021-12-15 | 2022-03-29 | 欧梯恩智能科技(苏州)有限公司 | Photoelectric detector and preparation method thereof |
CN114300541A (en) * | 2021-12-30 | 2022-04-08 | 广州华星光电半导体显示技术有限公司 | Thin film transistor, manufacturing method thereof and array substrate |
CN114551497A (en) * | 2022-02-23 | 2022-05-27 | 浙江大学 | Graphene-semiconductor dynamic diode high-performance generator with vertical structure and preparation method thereof |
CN114497314A (en) * | 2022-04-18 | 2022-05-13 | 泉州三安半导体科技有限公司 | Light emitting diode and light emitting device |
Non-Patent Citations (1)
Title |
---|
钟德刚 等: "MISiC肖特基二极管式气体传感器响应特性分析", 《华中科技大学学报(自然科学版)》, no. 03, pages 93 - 95 * |
Also Published As
Publication number | Publication date |
---|---|
CN115290953B (en) | 2024-05-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10541358B2 (en) | Hybrid generator using thermoelectric generation and piezoelectric generation | |
JP6049271B2 (en) | Electric energy generator | |
KR102155933B1 (en) | Energy device with integral collector surface for electromagnetic energy harvesting and method thereof | |
CN105633191B (en) | A kind of have two-dimentional transition metal chalcogenide homojunction photodetector of vertical-growth structure and preparation method thereof | |
Opoku et al. | Fabrication of field-effect transistors and functional nanogenerators using hydrothermally grown ZnO nanowires | |
CN109921687B (en) | Layered semiconductor-semiconductor dynamic PN junction direct current generator and preparation method thereof | |
US20220084708A1 (en) | Thermionic Power Cell | |
CN109149992B (en) | Improved friction nano generator | |
CN109037352A (en) | A kind of dc generator and preparation method thereof based on mobile schottky junction | |
CN112152509B (en) | Direct current generator based on dynamic diode and preparation method thereof | |
CN103364444A (en) | Method for gas detection by utilizing nanogenerator based on nano-piezoelectric semiconductor materials | |
CN106226171B (en) | The piezoelectric semiconductor's fracture failure experiment research changed based on polarization direction | |
CN115290953B (en) | Self-driven mechanical signal sensor based on dynamic diode and preparation method thereof | |
CN108963065B (en) | Method for preparing single-layer multi-layer graphene thermoelectric detector through laser ablation | |
CN105070751B (en) | GaAs HBT devices | |
CN106442131A (en) | Piezoelectric-semiconductor multi-field-coupling fracture failure experiment research method | |
CN111431433B (en) | Direct current generator based on dynamic semiconductor homojunction and preparation method thereof | |
CN114551497A (en) | Graphene-semiconductor dynamic diode high-performance generator with vertical structure and preparation method thereof | |
US4543442A (en) | GaAs Schottky barrier photo-responsive device and method of fabrication | |
CN112165275B (en) | Dynamic diode generator capable of working at extremely low temperature and preparation method thereof | |
CN105185841B (en) | A kind of field-effect diode and preparation method thereof | |
Pascu et al. | High temperature sensor based on SiC Schottky diodes with undoped oxide ramp termination | |
WO2020098417A1 (en) | Direct-current generator based on dynamic semiconductor heterojunction, and method for preparing same | |
Wang | Nanogenerators and nanopiezotronics | |
WO2019013704A1 (en) | Electron pumps |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB02 | Change of applicant information |
Address after: Room B3029, Floor 3, Building 1 (North), No. 368, Liuhe Road, Binjiang District, Hangzhou, Zhejiang 310051 Applicant after: Hangzhou Gelanfeng Technology Co.,Ltd. Address before: 310000 room b3029, 3rd floor, building 1 (North), No. 368, Liuhe Road, Binjiang District, Hangzhou City, Zhejiang Province Applicant before: Hangzhou Gelanfeng Nano Technology Co.,Ltd. |
|
CB02 | Change of applicant information | ||
GR01 | Patent grant | ||
GR01 | Patent grant |