CN115287659B - Etching liquid regeneration device and regeneration process - Google Patents
Etching liquid regeneration device and regeneration process Download PDFInfo
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- CN115287659B CN115287659B CN202210932867.5A CN202210932867A CN115287659B CN 115287659 B CN115287659 B CN 115287659B CN 202210932867 A CN202210932867 A CN 202210932867A CN 115287659 B CN115287659 B CN 115287659B
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- air
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- box body
- liquid medicine
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- 239000007788 liquid Substances 0.000 title claims abstract description 89
- 238000005530 etching Methods 0.000 title claims abstract description 86
- 238000000034 method Methods 0.000 title claims abstract description 24
- 230000008929 regeneration Effects 0.000 title abstract description 14
- 238000011069 regeneration method Methods 0.000 title abstract description 14
- 239000003814 drug Substances 0.000 claims abstract description 49
- 238000001914 filtration Methods 0.000 claims abstract description 5
- 238000004140 cleaning Methods 0.000 claims description 20
- 230000001172 regenerating effect Effects 0.000 claims description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- 239000012535 impurity Substances 0.000 claims description 4
- 239000000243 solution Substances 0.000 claims 8
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract description 17
- 229910001431 copper ion Inorganic materials 0.000 abstract description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 8
- 239000001301 oxygen Substances 0.000 abstract description 8
- 229910052760 oxygen Inorganic materials 0.000 abstract description 8
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 abstract description 7
- 230000001590 oxidative effect Effects 0.000 abstract description 6
- 238000005507 spraying Methods 0.000 abstract description 3
- 239000007800 oxidant agent Substances 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 7
- 238000007254 oxidation reaction Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 5
- 229960003280 cupric chloride Drugs 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000010405 clearance mechanism Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- PTVDYARBVCBHSL-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu] PTVDYARBVCBHSL-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The application relates to an etching liquid medicine regeneration device and a regeneration process, wherein the etching liquid medicine regeneration device comprises a box body, a plurality of conveying rollers, a plurality of nozzles and a first pump body, wherein the conveying rollers are arranged in the box body and used for conveying a circuit board, the nozzles are used for spraying liquid medicine, the first pump body is used for driving the liquid medicine to flow to the nozzles, the nozzles are respectively arranged at the upper side and the lower side of the conveying rollers, a liquid inlet of the first pump body is communicated with an inner cavity of the box body, and a liquid outlet of the first pump body is respectively communicated with the nozzles; the air delivery mechanism comprises an air pump and an air filter for filtering air, an air outlet of the air pump is connected with the air filter, and the other end of the air filter is communicated with the inner cavity of the box and is lower than the surface of the liquid medicine. Filtering air, introducing the filtered air into etching liquid, and oxidizing the cupric dichloride by using oxygen in the air to form positive bivalent copper ions, so that the etching liquid has etching capability continuously.
Description
Technical Field
The application relates to the technical field of circuit board processing, in particular to an etching liquid regenerating device and an etching liquid regenerating process.
Background
The etching liquid is a chemical agent for etching the surface of a printed circuit board in the manufacturing process of the printed circuit board, thereby forming a circuit on the surface of the printed circuit board. However, after etching the circuit board with the etchant, copper ions to be etched are mixed into the etchant, so that the etchant mixed with a large amount of copper ions is unusable,
At present, in order to save the cost, a large amount of oxidizing agent is usually introduced into the used etching liquid, and negative monovalent copper ions are converted into positive divalent copper ions by using the oxidizing agent, so that the etching liquid has etching capability again.
However, in the process of adding the oxidant, the concentration of the oxidant to be added is high, so that safety accidents easily occur in the process of operation.
It is therefore necessary to propose a new solution to the above-mentioned problems.
Disclosure of Invention
In order to reduce the addition concentration of an oxidant in the process of recycling etching liquid, thereby reducing the probability of safety accidents, the application provides an etching liquid regeneration device and a regeneration process.
The etching liquid regenerating device and the etching liquid regenerating process adopt the following technical scheme:
the etching liquid medicine regeneration device comprises a box body, a plurality of conveying rollers, a plurality of nozzles and a first pump body, wherein the conveying rollers are arranged in the box body and are used for conveying a circuit board, the nozzles are used for spraying liquid medicine, the first pump body drives the liquid medicine to flow to the nozzles, the nozzles are respectively arranged on the upper side and the lower side of the conveying rollers, a liquid inlet of the first pump body is communicated with an inner cavity of the box body, and a liquid outlet of the first pump body is respectively communicated with the nozzles;
the air delivery mechanism comprises an air pump and an air filter for filtering air, an air outlet of the air pump is connected with the air filter, and the other end of the air filter is communicated with the inner cavity of the box and is lower than the surface of the liquid medicine.
Through adopting above-mentioned technical scheme, air is filtered the back and is let in etching liquid medicine, utilizes the oxygen in the air to oxidize the cupric dichloride to form positive bivalent copper ion, make etching liquid medicine continue to have the ability of etching.
Optionally: the novel air filter is characterized in that an air outlet mechanism for increasing the contact area of air and liquid is arranged in the box body, the air outlet mechanism comprises a rotating piece and a driving piece, the rotating piece is arranged in the inner cavity of the box body and drives the rotating piece to rotate, the rotating piece is hollow, a plurality of vent holes communicated with the inner cavity of the rotating piece are formed in the outer wall of the rotating piece, and an air outlet of the air filter is communicated with the inner cavity of the rotating piece.
Through adopting above-mentioned technical scheme, after the air lets in the rotor and forms the bubble in etching liquid medicine, then pass from the air vent under the drive of air bubble in, make the volume of bubble diminish to increase the area of contact of bubble and etching liquid medicine under the certain circumstances of gaseous volume, accelerate the oxidation of the negative monovalent copper ion in the etching liquid medicine.
Optionally: the air filter comprises a rotating piece, wherein a fixing piece for dividing air bubbles is coaxially arranged in the rotating piece, the fixing piece is fixedly connected with a box body, a plurality of dividing grooves are circumferentially formed in the outer wall of the fixing piece, the outer wall of the fixing piece is abutted to the inner wall of the rotating piece, and an air outlet of the air filter is communicated with an inner cavity of the fixing piece.
Through adopting above-mentioned technical scheme, when the bubble passes through in dividing tank and air vent, dividing tank and air vent cut the volume of thereby reducing single bubble simultaneously to under the volume of the air that lets in etching liquid medicine keeps certain circumstances, increase the area of contact of air and etching liquid medicine, make the oxidation efficiency of negative monovalent copper ion in the etching liquid medicine higher.
Optionally: the outer wall circumference of the rotating piece is provided with a plurality of guide pipes, and the guide pipes are communicated with a plurality of vent holes.
Through adopting above-mentioned technical scheme, utilize the guide tube to guide the bubble that breaks up towards the direction of keeping away from the rotor to make the diffusion rate of bubble in etching liquid medicine faster, improve the oxidation efficiency of oxygen in the air and the negative monovalent copper ion in the etching liquid medicine.
Optionally: one end of the guide tube, which is far away from the rotating member, is inclined towards the rotating direction which is far away from the rotating member.
Through adopting above-mentioned technical scheme, at the pivoted in-process of stand pipe, etching liquid medicine is difficult to keep away from the opening direction inflow stand pipe of rotating the piece from the stand pipe to make the bubble be difficult for receiving the influence from the in-process of flowing out of stand pipe, make the diffusion of bubble in etching liquid medicine be difficult for receiving the influence.
Optionally: the guide pipe upper end is provided with a plurality of guide plates, the one end that the guide plate kept away from the guide pipe is faced to the direction of rotation slope of guide pipe, the inlet opening has been seted up to the guide pipe upper end, the guide plate is located the inlet opening and deviates from the one side of the direction of rotation of guide pipe.
Through adopting above-mentioned technical scheme, in the guide pipe pivoted in-process etching liquid medicine flows into the guide pipe through the guide of guide plate, drive the bubble in the guide pipe and keep away from the one end opening that the rotor was kept away from to the guide pipe afterwards, make the bubble in the guide pipe more diffuse to in the etching liquid medicine, increase the efficiency of oxidation.
Optionally: the side walls of the guide plates facing the rotation direction of the guide plates are provided with side plates which are far away from each other and fixed with the upper ends of the guide pipes.
Through adopting above-mentioned technical scheme, at the guide plate along turning to a pivoted in-process, utilize the curb plate to further guide etching liquid medicine, make etching liquid medicine more easily flow in the guide tube through the inlet opening.
Optionally: still be provided with the clearance mechanism that clears away impurity in the venthole on the mounting, clearance mechanism sets up the clearance piece on the mounting including sliding, the elastic component that promotes clearance piece to insert the venthole and promote the actuating ring that the venthole was kept away from to the clearance piece on the setting piece, the axis setting that the piece was rotated in parallel with the slider just the clearance piece sets up along the length direction of slider, the slider slides in a parallel with the radial of rotation piece, the actuating ring is fixed in on the rotation piece coaxially, the inner wall circumference of actuating ring is fixed with a plurality of drive blocks, the drive block can be in proper order with slider butt and promote the slider to remove.
Through adopting above-mentioned technical scheme, the in-process clearance piece that turns to the rotation constantly inserts and provides the gas pocket in-process to strike off the copper ion that will deposit in the air vent, make the copper ion be difficult for blocking up the air vent inner chamber, thereby make the air be difficult for easily influencing from the process of passing through in the air vent.
An etching liquid regeneration process comprises the following steps:
s1, introducing air into etching liquid medicine;
s2, scattering bubbles formed by air introduced into the etching liquid;
and S3, introducing hydrochloric acid into the etching liquid filled with air.
By adopting the technical scheme, the negative monovalent copper ions are oxidized by utilizing the oxygen in the air, so that the use of high oxidants such as hydrochloric acid is reduced, and the probability of safety accidents is reduced in the process of regeneration treatment of etching liquid medicine.
In summary, the present application includes at least one of the following beneficial technical effects:
1. introducing the filtered air into etching liquid medicine, and oxidizing negative monovalent copper ions in the etching liquid medicine by utilizing oxygen contained in the air, so that the use of a high oxidant in the regeneration treatment of the etching liquid medicine is reduced, and the occurrence rate of safety accidents is reduced;
2. after air is introduced into the etching liquid medicine to form bubbles, the bubbles with larger volume are divided into bubbles with smaller volume through the mutual staggering of the cutting grooves and the vent holes, so that the contact area between the air and the etching liquid medicine is increased under the condition that the volume of the air is kept constant, and the oxidation efficiency of negative monovalent copper ions in the etching liquid medicine is increased.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of the present application;
FIG. 2 is a schematic view for showing an internal structure of a case according to an embodiment of the present application;
FIG. 3 is a schematic diagram showing a mating relationship between a fixed member and a rotating member according to an embodiment of the present disclosure;
fig. 4 is an enlarged view of a portion a of fig. 3;
fig. 5 is a schematic view for showing a guide tube structure according to an embodiment of the present application.
In the figure, 1, a box body; 11. a conveying roller; 12. a nozzle; 13. a first pump body; 14. a material through hole; 15. a fixing member; 151. a dividing groove; 2. an air delivery mechanism; 21. an air pump; 22. an air filter; 3. an air outlet mechanism; 31. a rotating member; 311. a vent hole; 32. a driving member; 321. a first gear; 322. a second gear; 33. a guide tube; 331. a water inlet hole; 34. a deflector; 35. a side plate; 4. a cleaning mechanism; 41. a sliding member; 42. cleaning the piece; 43. an elastic member; 44. a drive ring; 441. a driving block; 45. a guide rod; 46. and abutting the block.
Detailed Description
The present application is described in further detail below with reference to the accompanying drawings.
The etching liquid regenerating device disclosed by the application, as shown in fig. 1 and 2, comprises a rectangular and hollow box body 1, a plurality of conveying rollers 11 arranged in the box body 1 and used for conveying a circuit board, a plurality of nozzles 12 for spraying liquid medicine and a first pump body 13 for driving the liquid medicine to flow to the nozzles 12. The two vertical side walls of the box body 1, which are far away from each other, are provided with material through holes 14 communicated with the inner cavities of the two vertical side walls, and the conveying rollers 11 are rotatably arranged in the box body 1 and are arranged along the connecting lines of the two material through holes 14. The conveying rollers 11 are arranged in two rows, the circuit board is arranged between the two rows of conveying rollers 11 to move, and the rotation directions of the two rows of conveying rollers 11 are different. Adjacent conveying rollers 11 in the same row are connected through a chain, so that the conveying rollers 11 in the same row can synchronously rotate, two motors which respectively drive the conveying rollers 11 in two rows to rotate are arranged outside the box body 1, and output shafts of the motors are respectively connected with the conveying rollers 11 in different rows through gearboxes. The first pump body 13 is fixed outside the box body 1 by using bolts, a liquid inlet of the first pump body is communicated with an inner cavity of the box body 1 through a pipeline, a liquid outlet of the first pump body is respectively connected with the nozzles 12 through pipelines, the nozzles 12 are respectively arranged on the upper side and the lower side of the two rows of conveying rollers 11, and a liquid outlet end of each nozzle 12 faces between the adjacent conveying rollers 11 in the same row.
As shown in fig. 2, the box 1 is further provided with an air delivery mechanism 2 for inputting air toward the inner cavity of the box, the air delivery mechanism 2 comprises an air pump 21 and an air filter 22 for filtering air, the air pump 21 is fixed outside the box 1 by using bolts, an air outlet of the air pump is connected with the air filter 22 through a pipeline, an air outlet of the air filter 22 is connected with the box 1 through a pipeline, and the connection position of the air filter 22 and the box 1 is lower than the liquid level of the liquid medicine.
As shown in fig. 2 and 3, when air is introduced into the etching solution, large bubbles are generated in the etching solution, so that the contact area between the etching solution and the air is reduced, and the reaction efficiency of oxygen and the copper dichloride in the etching solution is affected. Therefore, the air outlet mechanism 3 for scattering air bubbles is further arranged in the box body 1, the air outlet mechanism 3 comprises a rotating piece 31 rotatably connected to the bottom surface of the inner cavity of the box body 1 and a driving piece 32 for driving the rotating piece 31 to rotate, the rotating piece 31 is in a hollow arrangement, and a plurality of vent holes 311 communicated with the inner cavity are circumferentially formed in the side wall of the rotating piece 31. The driving member 32 is a servo motor in this embodiment, the servo motor is fixed on the bottom surface of the case 1 by using a bolt, the output shaft of the servo motor penetrates through the bottom surface of the case 1 and is coaxially fixed with a first gear 321, the lower end of the rotating member 31 is coaxially fixed with a second gear 322, the first gear 321 is meshed with the second gear 322, and an oil seal for reducing liquid leakage is arranged between the output shaft of the servo motor and the case 1.
As shown in fig. 3 and 4, the bottom wall of the inner cavity of the box body 1 is further fixed with a fixing piece 15 which is arranged in a hollow manner by using a bolt, the fixing piece 15 is arranged in an upper opening, the rotating piece 31 is sleeved outside the fixing piece 15, a bearing is arranged between the inner wall of the rotating piece 31 and the fixing piece 15, and the bearing is respectively arranged at the upper end and the lower end of the fixing piece 15. The outer wall of the fixed member 15 is circumferentially provided with a plurality of dividing grooves 151, and the dividing grooves 151 are parallel to the axis of the rotary member 31. The air outlet end of the air filter 22 is communicated with the inner cavity of the fixing member 15 through a pipeline, so that air is mixed with etching solution to form bubbles when entering the fixing member 15, then the bubbles are continuously inflated towards the inside of the fixing member 15 so as to flow along the vent holes 311 and the dividing grooves 151 towards the outside of the rotating member 31, the bubbles are divided when passing through the dividing grooves 151 and the vent holes 311 so as to reduce the volume, and then the contact area between the etching solution and the air is increased when the bubbles enter the etching solution, so that the oxidation of the copper dichloride in the etching solution is accelerated.
As shown in fig. 5, in order to make the diffusion range of the bubbles wider, a plurality of horizontally arranged guide pipes 33 are circumferentially arranged on the outer wall of the rotating member 31, one end of each guide pipe 33 is fixed to the outer wall of the rotating frame member, and the vent holes 311 are respectively located in the openings of the guide pipes 33, one end of each guide pipe 33, which is far away from the rotating member 31, is inclined away from the rotating direction of the rotating member 31, so that the bubbles can be moved towards the axial direction, which is far away from the rotating member 31, in the rotating process of the rotating member 31, and the diffusion of the bubbles in the etching liquid is faster.
As shown in fig. 5, in order to further increase the diffusion efficiency of bubbles, the upper ends of the guide tubes 33 are provided with guide plates 34 for guiding the etching liquid to flow, the upper ends of the guide tubes 33 are provided with water inlet holes 331 communicated with the inner cavities of the guide tubes 33, and the guide plates 34 are arranged on one side of the water inlet holes 331 away from the rotation direction. The end of the deflector 34 remote from the guide tube 33 is inclined toward the rotation direction of the guide tube 33. The two side walls of the deflector 34 parallel to the rotation direction are respectively fixed with a side plate 35, and the two side walls are mutually far away and are respectively fixed with the upper end face of the guide tube 33. Therefore, when the rotating member 31 drives the guiding tube 33 to rotate, the guiding plate 34 drives the etching liquid medicine to enter the guiding tube 33, and then the etching liquid medicine entering the guiding tube 33 drives the bubbles to flow along the guiding tube 33 towards the direction away from the rotating member 31, so that the bubbles are easier to diffuse in the etching liquid medicine.
As shown in fig. 4, since copper ions will deposit and affect the etching solution flowing out of the air outlet, the fixing member 15 is further provided with a cleaning mechanism 4 for cleaning impurities in the air outlet, and the cleaning mechanism 4 includes a sliding member 41 slidably disposed in the fixing member 15, a plurality of cleaning members 42 disposed on the sliding member 41, an elastic member 43 for pushing the cleaning members 42 into the air outlet, and a driving ring 44 for pushing the cleaning members 42 away from the air outlet. Two guide rods 45 which are horizontally arranged are fixed in the inner cavity of the fixing piece 15 and are respectively close to two ends of the fixing piece 15, and the two guide rods 45 are respectively penetrated at two ends of the sliding piece 41 so as to guide the sliding piece 41 to slide. The end of the guiding rod 45, which is close to the rotation axis of the rotating member 31, is connected with an abutting block 46 in a threaded manner, the elastic member 43 is a spring in the embodiment, the spring is sleeved on the guiding rod 45, one end of the spring abuts against the side wall of the sliding member 41, which is far away from the vent hole 311, and the other end of the spring abuts against the end of the abutting block 46, which is close to the sliding member 41, so that the sliding member 41 is pushed to move towards the direction of the vent hole 311. The cleaning piece 42 is arranged on one side of the sliding piece 41, which is close to the vent hole 311, the upper end and the lower end of the cleaning piece 42 are respectively abutted with the upper side wall and the lower side wall of the vent hole 311, a gap is reserved between the two vertical side walls of the cleaning piece 42 and the inner wall of the cleaning hole, and a plurality of cleaning pieces 42 can be simultaneously inserted into the vent hole 311, so that deposited copper ions are removed. The driving ring 44 is coaxially fixed in the inner cavity of the rotating member, a plurality of driving blocks 441 are circumferentially fixed on the inner wall of the driving ring 44, and the driving blocks 441 and the ventilation holes 311 are staggered. The two side walls of the driving block 441 facing and facing away from the rotation direction are inclined, one ends of the two inclined side walls, which are close to the axis of the driving ring 44, are close to each other, and the driving block 441 can be sequentially abutted with the end part of the sliding rod. The cleaning member 42 is sequentially inserted into the vent holes 311 during rotation of the rotating member, so that copper ion deposition in the vent holes 311 is removed, and the process of passing air bubbles through the vent holes 311 is not easily affected.
The implementation principle of the embodiment is as follows: the air pump 21 introduces the filtered air into the fixing member 15 to form bubbles in the fixing member 15, then the bubbles pass through the vent holes 311 and the dividing grooves 151 under the pushing of the air, the dividing grooves 151 and the vent holes 311 reduce the bubbles, etching liquid medicine enters the water guide pipe under the guiding of the guide plate 34 in the rotating process of the rotating member 31, so that the bubbles are driven to move along the end, away from the rotating member 31, of the water guide pipe towards the direction away from the rotating member 31, the bubbles are diffused in the etching liquid medicine, and then oxygen in the air accelerates the oxidation of the copper dichloride.
An etching liquid regeneration process comprises the following steps:
s1, introducing air into etching liquid medicine;
wherein impurities such as dust of air are filtered by the air filter 22 before the air is introduced into the etching liquid.
S2, scattering bubbles formed by air introduced into the etching liquid;
wherein, after the filtered air is introduced into the fixing member 15, bubbles are formed in the etching liquid medicine, and then the bubbles pass through the vent holes 311 and the cutting grooves and are scattered under the driving of the air introduced subsequently;
s3, introducing hydrochloric acid into the etching liquid filled with air;
after the hydrochloric acid is introduced into the etching liquid medicine, the hydrochloric acid, oxygen and the cupric dichloride react to generate copper chloride and water, so that the etching liquid medicine has the etching effect continuously.
The embodiments of the present invention are all preferred embodiments of the present application, and are not intended to limit the scope of the present application in this way, therefore: all equivalent changes in structure, shape and principle of this application should be covered in the protection scope of this application.
Claims (8)
1. An etching liquid regenerating device is characterized in that: the liquid injection device comprises a box body (1), a plurality of conveying rollers (11) arranged in the box body (1) and used for conveying a circuit board, a plurality of nozzles (12) used for injecting liquid medicine and a first pump body (13) used for driving the liquid medicine to flow to the nozzles (12), wherein the nozzles (12) are respectively arranged on the upper side and the lower side of the conveying rollers (11), a liquid inlet of the first pump body (13) is communicated with an inner cavity of the box body (1), and a liquid outlet of the first pump body (13) is respectively communicated with the nozzles (12);
the air delivery mechanism (2) for inputting air is further arranged on the box body (1), the air delivery mechanism (2) comprises an air pump (21) and an air filter (22) for filtering air, an air outlet of the air pump (21) is connected with the air filter (22), and the other end of the air filter (22) is communicated with an inner cavity of the box body (1) and is lower than the surface of the liquid medicine; the novel air filter is characterized in that an air outlet mechanism (3) for increasing the contact area of air and liquid is arranged in the box body (1), the air outlet mechanism (3) comprises a rotating piece (31) which is rotatably arranged in the inner cavity of the box body (1) and a driving piece (32) which is used for driving the rotating piece (31) to rotate, the rotating piece (31) is in a hollow arrangement, a plurality of vent holes (311) which are communicated with the inner cavity of the rotating piece (31) are formed in the outer wall of the rotating piece (31), and an air outlet of the air filter (22) is communicated with the inner cavity of the rotating piece (31).
2. The etching solution regenerating device according to claim 1, wherein: the air filter is characterized in that a fixing piece (15) for dividing air bubbles is coaxially arranged in the rotating piece (31), the fixing piece (15) is fixedly arranged on the box body (1) and is circumferentially provided with a plurality of dividing grooves (151), the outer wall of the fixing piece (15) is abutted to the inner wall of the rotating piece (31), and an air outlet of the air filter (22) is communicated with an inner cavity of the fixing piece (15).
3. The etching solution regenerating device according to claim 1, wherein: the outer wall of the rotating piece (31) is circumferentially provided with a plurality of guide pipes (33), and the guide pipes (33) are communicated with a plurality of vent holes (311).
4. An etching solution regenerating device as defined in claim 3, wherein: the end of the guide tube (33) facing away from the rotating member (31) is inclined toward the direction of rotation facing away from the rotating member (31).
5. An etching solution regenerating device as defined in claim 3, wherein: the guide pipe (33) upper end is provided with a plurality of guide plates (34), the one end that guide plate (34) kept away from guide pipe (33) is faced to the direction of rotation slope of guide pipe (33), inlet opening (331) have been seted up to guide pipe (33) upper end, guide plate (34) are located one side that inlet opening (331) deviate from the direction of rotation of guide pipe (33).
6. The etching solution regenerating device according to claim 5, wherein: the side walls of the guide plates (34) facing the rotation direction of the guide plates are provided with side plates (35), and the side plates (35) are far away from each other and are fixed with the upper ends of the guide pipes (33).
7. The etching solution regenerating device according to claim 2, wherein: the cleaning mechanism (4) for removing impurities in the air outlet holes is further arranged on the fixing piece (15), the cleaning mechanism (4) comprises a sliding piece (41) arranged in the fixing piece (15) in a sliding mode, a cleaning piece (42) arranged on the sliding piece (41), an elastic piece (43) for pushing the cleaning piece (42) to be inserted into the air outlet holes, and a driving ring (44) for pushing the cleaning piece (42) to be away from the air outlet holes, the sliding piece (41) is parallel to the axis of the rotating piece (31) and the cleaning piece (42) is arranged along the length direction of the sliding piece (41), the sliding piece (41) slides in the radial direction of the rotating piece (31), the driving ring (44) is coaxially fixed on the rotating piece (31), and a plurality of driving blocks (441) are circumferentially fixed on the inner wall of the driving ring (44) and can be sequentially abutted to the sliding piece (41) and push the sliding piece (41) to move.
8. An etching solution regenerating process, applying the etching solution regenerating device according to any one of claims 1 to 7, characterized in that: the method comprises the following steps:
s1, introducing air into etching liquid medicine;
s2, scattering bubbles formed by air introduced into the etching liquid;
and S3, introducing hydrochloric acid into the etching liquid filled with air.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210932867.5A CN115287659B (en) | 2022-08-04 | 2022-08-04 | Etching liquid regeneration device and regeneration process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210932867.5A CN115287659B (en) | 2022-08-04 | 2022-08-04 | Etching liquid regeneration device and regeneration process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115287659A CN115287659A (en) | 2022-11-04 |
| CN115287659B true CN115287659B (en) | 2024-03-29 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210932867.5A Active CN115287659B (en) | 2022-08-04 | 2022-08-04 | Etching liquid regeneration device and regeneration process |
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| Country | Link |
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| CN (1) | CN115287659B (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB964665A (en) * | 1963-07-10 | 1964-07-22 | Siemens Ag | Method of continuously regenerating etching solutions containing copper |
| US4388276A (en) * | 1980-09-23 | 1983-06-14 | Siemens Aktiengesellschaft | Device for regenerating hydrochloric copper chloride etching solutions |
| JPH09202980A (en) * | 1996-01-26 | 1997-08-05 | Sumitomo Metal Ind Ltd | Method for regenerating etchant and method for using the regenerated etchant |
| JP3928998B2 (en) * | 1998-04-08 | 2007-06-13 | エム・エフエスアイ株式会社 | Etching solution regeneration processing apparatus and etching apparatus using the same |
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| EP2927347A1 (en) * | 2014-04-01 | 2015-10-07 | Sigma Engineering Ab | Oxidation of copper in a copper etching solution by the use of oxygen and/or air as an oxidizing agent |
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