CN114964523A - Wavefront sensor adjusting method for active optical correction system - Google Patents
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Abstract
The invention provides a wave-front sensor adjusting method for an active optical correction system, which comprises the following steps: s1: respectively obtaining the test field position and the test wave aberration of each wave front sensor through wave front test; s2: visualizing the test field position of each wavefront sensor; s3: preliminarily installing a wavefront sensing tool; s4: enabling each wave front sensor on the wave front sensing tool to be located at a corresponding test view field position; s5: carrying out wave aberration test to obtain the actual wave aberration of the corresponding wavefront sensor; s6: and comparing the actual wave aberration with the test wave aberration, and adjusting the wavefront sensing tool according to the comparison result until the comparison result is smaller than a preset residual error RMS threshold value, so that the adjustment of the precision test assembly is finally completed. The invention provides a wavefront sensor adjusting method for an active optical correction system, which solves the problem that the conventional active optical correction system is difficult to install a wavefront sensor at a correct view field position in a correction capability verification stage.
Description
Technical Field
The invention relates to the technical field of optical system adjustment, in particular to a wavefront sensor adjustment method for an active optical correction system.
Background
With the continuous development of scientific technology, large-aperture optical imaging systems play a very important role in many fields such as astronomy science, earth science, military application, civil production and the like. The aperture of the optical imaging system is continuously increased, the focal length is continuously increased, the overall envelope size of the optical imaging system is enlarged, when the supporting structure of the optical imaging system is influenced by factors such as temperature or external force, the structure of the optical imaging system can deform, the relative position between different optical elements in the system can be changed, meanwhile, the state between the optical mirror surface and the supporting structure can also be influenced by external factors and changed, the stress change of different parts of the mirror surface can be caused, the mirror surface deformation is caused, the imaging quality of the optical imaging system can be reduced due to the problems, the observation performance of the optical imaging system can be reduced, effective data can not be obtained, and huge economic loss is caused.
The active optical correction technology is an effective means for ensuring the imaging quality of an optical imaging system, and mainly aims at the optical imaging system with reduced imaging quality to carry out pose and aberration correction so as to restore the imaging quality to a normal working state and provide guarantee for the optical imaging system to obtain effective data. The conventional active optical correction system generally installs wavefront sensors as wavefront receiving devices at multiple positions of an image surface of an installed optical imaging system, when the imaging quality of the optical imaging system is reduced due to the influence of external factors, each wavefront detector simultaneously acquires the reduced wave aberration data of different fields of view, vector adjustment between optical elements is calculated by using an active optical algorithm, then an actuator and a multidimensional adjusting table at the back of the optical elements are adjusted according to the calculation result, the relative position between the optical elements is adjusted to a correct state, the real-time adjustment of the imaging quality of the optical imaging system is realized, and the wave aberration of the system is ensured to meet the imaging quality requirement. However, in the calibration capability verification stage before actual calibration work is performed, the conventional active optical calibration system is difficult to mount the wavefront sensor at the correct field position, so that the measured wavefront aberration data is prone to deviation, the calibration accuracy cannot be guaranteed, the wavefront sensor is often required to be tested and verified through multiple times of disassembly and assembly, and the calibration capability verification stage is complicated.
Disclosure of Invention
The invention provides a wavefront sensor adjusting method for an active optical correction system, aiming at overcoming the technical defect that the conventional active optical correction system is difficult to install a wavefront sensor at a correct view field position in the correction capability verification stage.
In order to solve the technical problems, the technical scheme of the invention is as follows:
a method of wavefront sensor adjustment for an active optical correction system, comprising the steps of:
s1: determining the focal plane position of an optical imaging system to be corrected, placing a laser interferometer on the determined focal plane, arranging a standard plane mirror to form an auto-collimation test light path together with the optical imaging system and the laser interferometer, and respectively obtaining the test field position and the test wave aberration of each wave front sensor through wave front test;
s2: visualizing the test field position of each wavefront sensor;
s3: removing the laser interferometer, primarily installing a wavefront sensing tool on the focal plane of the optical imaging system,
the wave front sensing tool is provided with a plurality of mechanical interfaces for mounting the wave front sensor, and a test point light source is arranged around each mechanical interface in a matching way; the bottom of the wave front sensing tool is provided with a multi-dimensional adjusting mechanism for adjusting the pose of the wave front sensing tool;
s4: enabling each wavefront sensor on the wavefront sensing tool to be located at a corresponding test view field position by using a multi-dimensional adjusting mechanism;
s5: respectively utilizing each test point light source to carry out wave aberration test of a corresponding field of view to obtain actual wave aberration of a corresponding wavefront sensor;
s6: calculating an actual residual RMS (Root Mean Square) value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold value,
if the actual residual RMS value is smaller than the preset residual RMS threshold value, fixing the wavefront sensing tool to finish the debugging;
and if the actual residual RMS value is not less than the preset residual RMS threshold value, adjusting the wavefront sensing tool through the multi-dimensional adjusting mechanism, and returning to the step S5.
In the scheme, the test field position and the test wave aberration of each wavefront sensor are obtained by using a laser interferometer, and the test field position of each wavefront sensor is visualized; then, a wave front sensing tool is installed according to the visual test field position, and a wave aberration test is carried out by using a test point light source on the wave front sensing tool to obtain the actual wave aberration of the corresponding wave front sensor; the actual wave aberration is compared with the test wave aberration, the wave front sensing tool is adjusted according to the comparison result until the comparison result is smaller than the preset residual error RMS threshold value, so that the adjustment of the precision test assembly is finally completed, the accurate installation of the wave front sensor in the correction precision test of the active optical correction system in the initial adjustment stage of the optical imaging system is realized, and the wave front sensor has the characteristic of strong universality.
Preferably, in step S2, the test field of view position of each wavefront sensor is visualized using a laser tracker and a standard spherical mirror.
Preferably, the specific steps of visualizing the test field position of the wavefront sensor are as follows:
s2.1: placing a standard spherical mirror in front of the laser interferometer to form a self-collimating optical path to obtain interference fringes;
s2.2: adjusting the position of a standard spherical mirror according to the interference fringes to enable the spherical center of the standard spherical mirror to coincide with the focus of the laser interferometer;
s2.3: placing a test target ball of a laser tracker at any position on the mirror surface of the standard spherical mirror, recording the position of the test target ball by the laser tracker, and repeating for multiple times to obtain multiple different positions of the test target ball on the mirror surface of the standard spherical mirror;
s2.4: and fitting the sphere center position of the standard spherical mirror according to the plurality of different positions obtained in the step S2.3, wherein the obtained sphere center position is the test view field position, and the visualization of the test view field position is completed.
Preferably, in step S4,
respectively placing a test target ball of a laser tracker on the surface of each wavefront sensor, obtaining the position of each wavefront sensor through the laser tracker, and then adjusting the multidimensional adjusting mechanism according to the sphere center position of each standard spherical mirror obtained in the step S2.3 to enable the position of the wavefront sensor to correspond to the sphere center position of the standard spherical mirror one by one respectively, thereby realizing that each wavefront sensor is positioned at the corresponding test view field position.
Preferably, the multidimensional adjusting mechanism is a six-dimensional adjusting mechanism and is used for adjusting the front-back, left-right, up-down, pitching, yawing and rolling poses of the wavefront sensing tool.
Preferably, in step S5, the test light beams emitted by the test point light sources sequentially pass through the optical imaging system and the standard plane mirror and return to the original path, and are received by the corresponding wavefront sensors, so as to obtain the actual wave aberration.
Preferably, the size of the frame of the wavefront sensing tool is consistent with the size of the image plane of the optical imaging system.
Preferably, the test point light source is an LED light source.
Preferably, the number of the wave-front sensors is 2-4.
Preferably, the test point light source is 20mm from the edge of the matching wavefront sensor.
Compared with the prior art, the technical scheme of the invention has the beneficial effects that:
the invention provides a wave front sensor adjusting method for an active optical correction system, which comprises the steps of acquiring the test field position and the test wave aberration of each wave front sensor by utilizing a laser interferometer, and visualizing the test field position of each wave front sensor; then, a wave front sensing tool is installed according to the visual test field position, and a wave aberration test is carried out by using a test point light source on the wave front sensing tool to obtain the actual wave aberration of the corresponding wave front sensor; the actual wave aberration is compared with the test wave aberration, the wave front sensing tool is adjusted according to the comparison result until the comparison result is smaller than the preset residual error RMS threshold value, so that the adjustment of the precision test assembly is finally completed, the accurate installation of the wave front sensor in the correction precision test of the active optical correction system in the initial adjustment stage of the optical imaging system is realized, and the wave front sensor has the characteristic of strong universality.
Drawings
FIG. 1 is a flow chart of the steps for implementing the technical solution of the present invention;
FIG. 2 is a schematic diagram of an auto-collimation test optical path formed by a standard plane mirror, an optical imaging system and a laser interferometer in the present invention;
FIG. 3 is a schematic diagram of a self-collimating optical path formed by a standard spherical mirror and a laser interferometer according to the present invention;
FIG. 4 is a schematic diagram of a wave aberration test using various point light sources;
wherein: 1. an optical imaging system; 2. a laser interferometer; 3. a standard plane mirror; 4. a laser tracker; 41. testing the target ball; 5. a standard spherical mirror; 6. a wavefront sensing tool; 7. a six-dimensional adjustment mechanism; A. a wavefront sensor A; B. a wavefront sensor B; C. a wavefront sensor C; D. a wavefront sensor D; a. a test point light source a; b. a test point light source b; c. a test point light source c; d. and testing the point light source d.
Detailed Description
The drawings are for illustrative purposes only and are not to be construed as limiting the patent;
for the purpose of better illustrating the embodiments, certain features of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product;
it will be understood by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
The technical solution of the present invention is further described below with reference to the accompanying drawings and examples.
Example 1
As shown in fig. 1, a wavefront sensor adjusting method for an active optical correction system includes the following steps:
s1: determining the focal plane position of an optical imaging system 1 to be corrected, placing a laser interferometer 2 on the determined focal plane, and arranging a standard plane mirror 3 to form an auto-collimation test optical path together with the optical imaging system 1 and the laser interferometer 2, as shown in fig. 2, respectively obtaining the test field position and the test wave aberration of each wavefront sensor through wavefront test;
s2: visualizing the test field position of each wavefront sensor;
s3: removing the laser interferometer 2, primarily installing a wavefront sensing tool 6 on the focal plane of the optical imaging system 1,
the wavefront sensing tool 6 is provided with a plurality of mechanical interfaces for mounting the wavefront sensor, and a test point light source is arranged around each mechanical interface in a matching manner; the bottom of the wave front sensing tool 6 is provided with a multidimensional adjusting mechanism for adjusting the pose of the wave front sensing tool 6;
s4: enabling each wavefront sensor on the wavefront sensing tool 6 to be located at a corresponding test view field position by using a multi-dimensional adjusting mechanism;
s5: respectively utilizing each test point light source to carry out wave aberration test of a corresponding field of view to obtain actual wave aberration of a corresponding wavefront sensor;
s6: calculating an actual residual RMS (Root Mean Square) value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold value,
if the actual residual RMS value is smaller than the preset residual RMS threshold value, fixing the wavefront sensing tool 6 and completing the debugging;
if the actual residual RMS value is not less than the preset residual RMS threshold value, the wavefront sensing tool 6 is adjusted by the multidimensional adjustment mechanism, and the process returns to step S5.
In the specific implementation process, the laser interferometer 2 is used for acquiring the test field position and the test wave aberration of each wavefront sensor, and the test field position of each wavefront sensor is visualized; then, a wave front sensing tool 6 is installed according to the visual test view field position, and a wave aberration test is carried out by using a test point light source on the wave front sensing tool 6 to obtain the actual wave aberration of the corresponding wave front sensor; the actual wave aberration is compared with the test wave aberration, the wavefront sensing tool 6 is adjusted according to the comparison result until the comparison result is smaller than the preset residual error RMS threshold value, so that the adjustment of the precision test assembly is finally completed, the wavefront sensor is accurately installed in the correction precision test of the active optical correction system in the initial adjustment stage of the optical imaging system 1, and the method has the characteristic of strong universality.
Example 2
A method of wavefront sensor adjustment for an active optical correction system, comprising the steps of:
s1: determining the focal plane position of an optical imaging system 1 to be corrected, placing a laser interferometer 2 on the determined focal plane, arranging a standard plane mirror 3 to form an auto-collimation test light path together with the optical imaging system 1 and the laser interferometer 2, and respectively obtaining the test field position and the test wave aberration of each wave front sensor through wave front test;
before wavefront testing, the position of the laser interferometer 2 on a focal plane needs to be adjusted for each wavefront sensor, so that the focal position of the laser interferometer 2 is on the theoretical field of view of the wavefront sensor to be adjusted and corresponds to the wavefront sensor to be adjusted.
More specifically, the number of the wavefront sensors is 2-4.
S2: visualizing the test field position of each wavefront sensor;
more specifically, in step S2, the test field-of-view positions of the respective wavefront sensors are visualized using the laser tracker 4 and the standard spherical mirror 5.
More specifically, as shown in fig. 3, the specific steps of visualizing the test field position of the wavefront sensor include:
s2.1: a standard spherical mirror 5 is arranged in front of the laser interferometer 2 to form a self-collimating optical path to obtain interference fringes;
s2.2: adjusting the position of the standard spherical mirror 5 according to the interference fringes to ensure that the spherical center of the standard spherical mirror coincides with the focal point of the laser interferometer 2;
s2.3: placing the test target ball 41 of the laser tracker 4 at any position on the mirror surface of the standard spherical mirror 5, recording the position of the test target ball 41 through the laser tracker 4, and repeating the steps for multiple times to obtain multiple different positions of the test target ball 41 on the mirror surface of the standard spherical mirror 5;
in practice, the laser tracker 4 can automatically construct a coordinate system and record the positions of the test target balls 41 in the form of coordinates.
S2.4: and fitting the sphere center position of the standard spherical mirror 5 according to the plurality of different positions obtained in the step S2.3, wherein the obtained sphere center position is the test view field position, and the visualization of the test view field position is completed.
And the test view field position visualization of each wavefront sensor is realized through the steps S2.1-S2.4.
S3: removing the laser interferometer 2 and a standard spherical mirror 5 arranged in front of the laser interferometer, primarily installing a wavefront sensing tool 6 on the focal plane of the optical imaging system 1,
the wavefront sensing tool 6 is provided with a plurality of mechanical interfaces for mounting the wavefront sensor, a test point light source is arranged around each mechanical interface in a matching manner, and the distance between the test point light source and the mechanical interfaces is a certain distance so as to ensure that the test point light source is not shielded after the wavefront sensor is mounted; the bottom of the wave front sensing tool 6 is provided with a multidimensional adjusting mechanism for adjusting the pose of the wave front sensing tool 6;
s4: enabling each wavefront sensor on the wavefront sensing tool 6 to be located at a corresponding test view field position by using a multi-dimensional adjusting mechanism;
more specifically, in step S4,
respectively placing a test target ball 41 of the laser tracker 4 on the surface of each wavefront sensor, acquiring the position of each wavefront sensor through the laser tracker 4, and then adjusting the multidimensional adjusting mechanism according to the sphere center position of each standard spherical mirror 5 obtained in the step S2.3, so that the positions of the wavefront sensors and the sphere center position of the standard spherical mirror 5 respectively correspond to each other one by one, thereby realizing that each wavefront sensor is positioned at the corresponding test view field position.
S5: respectively utilizing each test point light source to carry out wave aberration test of a corresponding field of view to obtain actual wave aberration of a corresponding wavefront sensor;
more specifically, in step S5, the test light beams emitted by the test point light sources sequentially pass through the optical imaging system 1 and the standard plane mirror 3 and return to the original path, and are received by the corresponding wavefront sensors, so as to obtain the actual wave aberration.
S6: calculating an actual residual RMS (Root Mean Square) value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold value,
if the actual residual RMS value is smaller than the preset residual RMS threshold value, fixing the wavefront sensing tool 6 and completing the debugging;
if the actual residual RMS value is not less than the preset residual RMS threshold value, the wavefront sensing tool 6 is adjusted by the multidimensional adjustment mechanism, and the process returns to step S5.
Example 3
A wave-front sensor adjusting method for an active optical correction system is provided, wherein 4 wave-front sensors are respectively a wave-front sensor A, a wave-front sensor B, a wave-front sensor C and a wave-front sensor D, and the method comprises the following steps:
s1: determining the focal plane position of an optical imaging system 1 to be corrected, placing a laser interferometer 2 on the determined focal plane, and arranging a standard plane mirror 3;
taking the wavefront sensor a as an example, adjusting the position of the laser interferometer 2 on the focal plane, so that the focal position of the laser interferometer 2 is on the theoretical field of view of the wavefront sensor a, adjusting the standard plane mirror 3, so that the standard plane mirror 3, the optical imaging system 1 and the laser interferometer 2 form an auto-collimation test optical path, and obtaining the test field of view position and the test wave aberration of the wavefront sensor a through wavefront test;
in accordance with the above example, the test field positions and the test wave aberrations of the wavefront sensor B, the wavefront sensor C, and the wavefront sensor D are acquired, respectively;
s2: visualizing the test field position of each wavefront sensor;
more specifically, in step S2, the test field-of-view positions of the respective wavefront sensors are visualized using the laser tracker 4 and the standard spherical mirror 5.
More specifically, the present invention is to provide a novel,
taking the wavefront sensor a as an example, the specific steps of enabling the laser interferometer 2 to be near the wavefront sensor a and visualizing the test view field position of the wavefront sensor a are as follows:
s2.1: a standard spherical mirror 5 is arranged in front of the laser interferometer 2 to form a self-collimating optical path to obtain interference fringes;
s2.2: adjusting the position of the standard spherical mirror 5 according to the interference fringes to ensure that the spherical center of the standard spherical mirror coincides with the focal point of the laser interferometer 2; at this time, the position of the center of the standard spherical mirror 5 is the test view field position corresponding to the wavefront sensor a;
s2.3: placing the test target ball 41 of the laser tracker 4 at any position on the mirror surface of the standard spherical mirror 5, recording the position of the test target ball 41 through the laser tracker 4, and repeating the steps for multiple times to obtain multiple different positions of the test target ball 41 on the mirror surface of the standard spherical mirror 5;
in the present embodiment, 10 different positions of the test target ball 41 on the mirror surface of the standard spherical mirror 5 are obtained by repeating the above steps for 10 times;
s2.4: and fitting the sphere center position of the standard spherical mirror 5 according to the plurality of different positions obtained in the step S2.3, wherein the obtained sphere center position is the test view field position, and the visualization of the test view field position is completed.
In accordance with the above example, the test field positions of the wavefront sensor B, the wavefront sensor C, and the wavefront sensor D are visualized, respectively. For the wavefront sensor at the same horizontal position, the aperture and the radius of curvature of the standard spherical mirror 5 adopted by the wavefront sensor are the same, including but not limited to the standard spherical mirror 5 with the aperture of 30mm and the radius of curvature of 450mm, or the standard spherical mirror 5 with the aperture of 20mm and the radius of curvature of 300 mm.
S3: removing the laser interferometer 2 and a standard spherical mirror 5 arranged in front of the laser interferometer, primarily installing a wavefront sensing tool 6 on the focal plane of the optical imaging system 1,
in this embodiment, the wavefront sensing tool 6 is made of invar steel material, so as to ensure the stability of the structure; the bottom of the wave front sensing tool 6 is provided with a six-dimensional adjusting mechanism 7 for adjusting the front and back, left and right, up and down, pitching, yawing and rolling poses of the wave front sensing tool 6, and the six-dimensional adjusting mechanism 7 is used as a main supporting structure of the wave front sensing tool 6 and has a locking function; the wavefront sensing tool 6 is also provided with an interface connected with the optical platform; the frame size of the wavefront sensing tool 6 is consistent with the image surface size of the optical imaging system 1, the four wavefront sensing fields are respectively located at four corners of the image surface, such as (-0.9 degrees, 0.9 degrees (-0.9 degrees, -0.9 degrees), 0.9 degrees, -0.9 degrees, a mechanical interface for mounting a wavefront sensor is reserved at each wavefront sensing field position, the four wavefront sensors are ensured to be stably connected with the wavefront sensing tool 6 through structural design, and the relative positions of the four wavefront sensors are not influenced by changes of the surrounding environment; and a test point light source is arranged around each mechanical interface in a matching way and is respectively a test point light source a, a test point light source b, a test point light source c and a test point light source d, and the test point light sources are at a certain distance from the mechanical interfaces so as to ensure that the test point light sources are not shielded after the wave front sensor is installed.
More specifically, the test point light source is an LED light source.
More specifically, the test point light source is 20mm from the edge of the matching wavefront sensor.
S4: enabling each wavefront sensor on the wavefront sensing tool 6 to be located at a corresponding test view field position by using a multi-dimensional adjusting mechanism;
more specifically, in step S4,
respectively placing a test target ball 41 of the laser tracker 4 on the surface of each wavefront sensor, acquiring the position of each wavefront sensor through the laser tracker 4, and then adjusting the multidimensional adjusting mechanism according to the sphere center position of each standard spherical mirror 5 obtained in the step S2.3, so that the positions of the wavefront sensors and the sphere center position of the standard spherical mirror 5 respectively correspond to each other one by one, thereby realizing that each wavefront sensor is positioned at the corresponding test view field position.
S5: respectively utilizing each test point light source to carry out wave aberration test of a corresponding field of view to obtain actual wave aberration of a corresponding wavefront sensor;
more specifically, in step S5, the test light beams emitted by the test point light sources sequentially pass through the optical imaging system 1 and the standard plane mirror 3 and return to the original path, and are received by the corresponding wavefront sensors, so as to obtain the actual wave aberration.
S6: calculating an actual residual RMS (Root Mean Square) value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold value,
if the actual residual RMS value is smaller than the preset residual RMS threshold value, fixing the wavefront sensing tool 6 and completing the debugging;
if the actual residual RMS value is not less than the preset residual RMS threshold value, the wavefront sensing tool 6 is adjusted by the multidimensional adjustment mechanism, and the process returns to step S5.
In the specific implementation process, the value range of the residual error RMS threshold is generally 5-15 nm, the residual error RMS threshold can be selected or adjusted according to the actual situation, the residual error RMS threshold is generally preset to be 10nm, the precision is high, and the universality is high.
It should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. A method of tuning a wavefront sensor for an active optical correction system, comprising the steps of:
s1: determining the focal plane position of an optical imaging system to be corrected, placing a laser interferometer on the determined focal plane, arranging a standard plane mirror to form an auto-collimation test light path together with the optical imaging system and the laser interferometer, and respectively obtaining the test field position and the test wave aberration of each wave front sensor through wave front test;
s2: visualizing the test field position of each wavefront sensor;
s3: removing the laser interferometer, primarily installing a wavefront sensing tool on the focal plane of the optical imaging system,
the wave front sensing tool is provided with a plurality of mechanical interfaces for mounting the wave front sensor, and a test point light source is arranged around each mechanical interface in a matching way; the bottom of the wave front sensing tool is provided with a multi-dimensional adjusting mechanism for adjusting the pose of the wave front sensing tool;
s4: enabling each wavefront sensor on the wavefront sensing tool to be located at a corresponding test view field position by using a multi-dimensional adjusting mechanism;
s5: respectively utilizing each test point light source to carry out wave aberration test of a corresponding field of view to obtain actual wave aberration of a corresponding wavefront sensor;
s6: calculating actual residual RMS values of the actual wave aberration and the test wave aberration, comparing the actual residual RMS values with a preset residual RMS threshold value,
if the actual residual RMS value is smaller than the preset residual RMS threshold value, fixing the wavefront sensing tool to finish the debugging;
and if the actual residual RMS value is not less than the preset residual RMS threshold value, adjusting the wavefront sensing tool through the multi-dimensional adjusting mechanism, and returning to the step S5.
2. The method of claim 1, wherein in step S2, the test field of view position of each wavefront sensor is visualized with a laser tracker and standard spherical mirrors.
3. The method of claim 2, wherein the step of visualizing the test field position of the wavefront sensor comprises:
s2.1: placing a standard spherical mirror in front of the laser interferometer to form a self-collimating optical path to obtain interference fringes;
s2.2: adjusting the position of a standard spherical mirror according to the interference fringes to enable the spherical center of the standard spherical mirror to coincide with the focus of the laser interferometer;
s2.3: placing a test target ball of a laser tracker at any position on the mirror surface of the standard spherical mirror, recording the position of the test target ball by the laser tracker, and repeating for multiple times to obtain multiple different positions of the test target ball on the mirror surface of the standard spherical mirror;
s2.4: and fitting the sphere center position of the standard spherical mirror according to the plurality of different positions obtained in the step S2.3, wherein the obtained sphere center position is the test view field position, and the visualization of the test view field position is completed.
4. The wavefront sensor assembly method of claim 3, wherein in step S4,
respectively placing a test target ball of a laser tracker on the surface of each wavefront sensor, obtaining the position of each wavefront sensor through the laser tracker, and then adjusting the multidimensional adjusting mechanism according to the sphere center position of each standard spherical mirror obtained in the step S2.3 to enable the positions of the wavefront sensors to respectively correspond to the sphere center positions of the standard spherical mirrors one by one, so that each wavefront sensor is located at the corresponding test view field position.
5. The method as claimed in claim 1 or 4, wherein the multi-dimensional adjustment mechanism is a six-dimensional adjustment mechanism for adjusting the pose of the wavefront sensor fixture, such as forward and backward, left and right, up and down, pitch, yaw, and roll.
6. The method of claim 1, wherein in step S5, the test beams from the test point light sources sequentially pass through the optical imaging system and the standard plane mirror, and then return to the original path, and are received by the corresponding wavefront sensors to obtain the actual wavefront aberrations.
7. The method of claim 1, wherein the frame size of the wavefront sensor tool is consistent with the image plane size of the optical imaging system.
8. The method of claim 1 wherein the test point source is an LED source.
9. The method of claim 1, wherein the number of wavefront sensors is 2-4.
10. The method of claim 1, wherein the test point source is 20mm from the edge of the matched wavefront sensor.
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