CN114752912A - Conveying device and carrier - Google Patents

Conveying device and carrier Download PDF

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Publication number
CN114752912A
CN114752912A CN202111609937.5A CN202111609937A CN114752912A CN 114752912 A CN114752912 A CN 114752912A CN 202111609937 A CN202111609937 A CN 202111609937A CN 114752912 A CN114752912 A CN 114752912A
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CN
China
Prior art keywords
support portion
substrate
magnetic
carriage
carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202111609937.5A
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Chinese (zh)
Inventor
青木泰一郎
冈部俊介
江泽光晴
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Canon Tokki Corp
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Canon Tokki Corp
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Filing date
Publication date
Application filed by Canon Tokki Corp filed Critical Canon Tokki Corp
Publication of CN114752912A publication Critical patent/CN114752912A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G54/00Non-mechanical conveyors not otherwise provided for
    • B65G54/02Non-mechanical conveyors not otherwise provided for electrostatic, electric, or magnetic
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02Articles
    • B65G2201/0214Articles of special size, shape or weigh
    • B65G2201/022Flat
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2203/00Indexing code relating to control or detection of the articles or the load carriers during conveying
    • B65G2203/02Control or detection
    • B65G2203/0266Control or detection relating to the load carrier(s)
    • B65G2203/0283Position of the load carrier
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2203/00Indexing code relating to control or detection of the articles or the load carriers during conveying
    • B65G2203/04Detection means
    • B65G2203/042Sensors
    • B65G2203/043Magnetic

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Non-Mechanical Conveyors (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention provides a conveying device and a carrier which can reduce the influence of magnetism on magnetic position detection in magnetic conveying. The conveying device is provided with: a carrier for carrying a substrate; a carrying mechanism for carrying the carrier by magnetic force; and a magnetic detection mechanism that detects a position of the carrier in a conveying direction, the carrier including: a substrate supporting portion for supporting the substrate; and a magnet support portion connected to an end portion of the substrate support portion via a connection portion and supporting a permanent magnet of the conveyance mechanism, wherein the detection mechanism is disposed closer to the substrate support portion than the connection portion, and the connection portion is formed of a magnetic material.

Description

Conveying device and carrier
Technical Field
The present invention relates to a substrate transfer technique, and more particularly to a transfer apparatus and a carrier.
Background
The organic EL Display device (organic EL Display) is applied not only to a smart phone, a television, and a Display for an automobile, but also to a VR-HMD (Virtual Reality-Head mounted visual device) and the like, and particularly, a Display for a VR-HMD is required to form a pixel pattern with high accuracy. In the manufacture of an organic EL display device, when forming an organic light-emitting element (organic EL element: OLED) constituting the organic EL display device, a film-forming material discharged from a vapor deposition source of a film-forming device is formed on a substrate through a mask on which a pixel pattern is formed, thereby forming an organic layer and a metal layer.
In such a film deposition apparatus, it is necessary to prevent contaminants from adhering to the substrate during film deposition, but a substrate conveyance mechanism may be a source of contaminants. As a conveying mechanism in which the generation of contaminants is relatively small, there is a magnetic conveying in which a conveying carrier is conveyed by a magnet. In particular, magnetic levitation conveyance is non-contact conveyance in which conveyance is performed by reducing contact between a carriage that holds a substrate and a mask and constituent members of a conveyance mechanism, and generation of contaminants can be suppressed.
In this magnetic levitation transport, in order to control the transport carriage, it is necessary to measure the position of the carriage and acquire the measured position as control information. This is a method capable of detecting a position with high accuracy without contact using a magnetic detection head (magnetic sensor) and a magnetic scale on which a magnetic pattern is recorded (patent document 1 and the like).
Documents of the prior art
Patent document
Patent document 1: japanese patent laid-open publication No. 2004-56892
Disclosure of Invention
Problems to be solved by the invention
When magnetic conveyance is used for conveyance of the carriage and magnetic position detection technology is used for position detection of the carriage, magnetism during the magnetic conveyance may affect position detection of the magnetic sensor.
The invention aims to provide a technology for reducing the influence of magnetism on magnetic position detection in magnetic conveying.
Means for solving the problems
According to the present invention, there is provided a conveyance device including:
a carrier on which a substrate is mounted;
a carrying mechanism for carrying the carriage by magnetic force; and
a magnetic detection mechanism for detecting a position of the carriage in a conveying direction,
the handling device is characterized in that it is provided with,
the carrier is provided with:
a substrate support portion that supports the substrate; and
a magnet support portion connected to an end portion of the substrate support portion via a connecting portion and supporting a permanent magnet of the transfer mechanism,
the detection mechanism is disposed closer to the substrate support portion than the connection portion,
the connecting portion is formed of a magnetic material.
Further, according to the present invention, there is provided a carrier,
the carrier carries a substrate, the substrate is carried by the carrying mechanism by magnetic force, and the position in the carrying direction is detected by the magnetic detection mechanism,
the carrier is characterized in that,
the carrier is provided with:
a substrate support portion that supports the substrate; and
A magnet support portion connected to an end portion of the substrate support portion via a connection portion, and supporting a permanent magnet of the transfer mechanism, the permanent magnet serving as a magnetic force,
the detection mechanism is arranged closer to the substrate supporting part than the connection part,
the connecting portion is formed of a magnetic material.
Effects of the invention
According to the present invention, it is possible to provide a technique for reducing the influence of magnetism on magnetic position detection during magnetic conveyance.
Drawings
Fig. 1 is a schematic view schematically showing a film deposition apparatus to which a transfer apparatus according to an embodiment of the present invention is applied.
Fig. 2 is a sectional view of the carriage and the carrying device taken along line a-a of fig. 1.
Fig. 3 is a top view of the carrier.
Fig. 4(a) is a diagram showing magnetic flux lines in a comparative example, and fig. 4(B) is a diagram showing magnetic flux lines in an embodiment.
Fig. 5(a) is a diagram showing magnetic flux lines in the conveying device, and fig. 5(B) is a diagram showing a configuration example of another embodiment.
Fig. 6 is a diagram showing a configuration example of another embodiment.
Fig. 7(a) and 7(B) are diagrams showing a configuration example of another embodiment.
Description of the reference numerals
100 film forming apparatus, 110 substrate, 111 mask, 1 carriage, 2 conveying apparatus, 3 position detecting unit, 10 substrate support part, 11 magnet support part, 12 connecting part
Detailed Description
Hereinafter, embodiments will be described in detail with reference to the drawings. The following embodiments are not intended to limit the claimed invention. In the embodiments, a plurality of features are described, but the plurality of features are not limited to all of the features necessary for the invention, and a plurality of features may be arbitrarily combined. In the drawings, the same or similar components are denoted by the same reference numerals, and redundant description thereof is omitted.
< first embodiment >
< overview of film Forming apparatus >
Fig. 1 is a schematic view schematically showing a film deposition apparatus 100 to which a transfer apparatus 2 according to an embodiment of the present invention is applied. The film forming apparatus 100 is an apparatus for forming a film of a vapor deposition substance on a substrate 110, and forms a thin film of the vapor deposition substance in a predetermined pattern using a mask 111. The material of the substrate 110 on which the film is formed by the film forming apparatus 100 can be selected as appropriate from materials such as glass, resin, and metal, and a substrate in which a resin layer such as polyimide is formed on glass is preferably used. The vapor deposition material is an organic material, an inorganic material (metal, metal oxide, or the like), or the like. The film formation apparatus 100 is applicable to a manufacturing apparatus for manufacturing electronic devices, optical components, and the like, such as display devices (flat panel displays, etc.), thin-film solar cells, organic photoelectric conversion elements (organic thin-film imaging elements), and the like, and is particularly applicable to a manufacturing apparatus for manufacturing organic EL panels. In the following description, an example is assumed in which the film forming apparatus 100 forms a film on the substrate 110 by vacuum deposition, but the present invention is not limited thereto, and various film forming methods such as sputtering and CVD can be applied. In each drawing, arrow Z indicates a vertical direction (gravitational direction), and arrows X and Y indicate horizontal directions perpendicular to each other.
The film forming apparatus 100 is a tandem-type film forming apparatus that performs vapor deposition of a vapor deposition substance while conveying a substrate 110, and includes a substrate carrying-in chamber 101, a mask carrying-in chamber 102, an alignment chamber 103, a film forming chamber 104, a mask carrying-out chamber 105, and a substrate carrying-out chamber 110, which are arranged in the X direction. The substrate 110 and the mask 111 are conveyed in the X direction by the conveying device 2 via the carrier 1. In the illustrated example, the substrate 110 is rectangular.
The carrier 1 and the substrate 5 on which a film is not formed are loaded into the substrate carrying-in chamber 101, and the substrate 5 is mounted on the carrier 1 in the substrate carrying-in chamber 101. The carrier 1 on which the substrate 110 is mounted is carried into the mask carrying-in chamber 102, and the mask 111 is also mounted on the carrier 1. The carrier 1 on which the substrate 110 and the mask 111 are mounted is transported to the alignment chamber 103, where the substrate 110 and the mask 111 are aligned. The mask 111 is held so as to overlap the substrate 110 below the substrate 110. Then, the carrier 1 on which the substrate 110 and the mask 111 are mounted is conveyed to the film forming chamber 104. When the vapor deposition material passes through the vapor deposition source in the film forming chamber 104, the vapor deposition material is deposited through the mask 111. The film forming chamber 104 includes a plurality of vapor deposition chambers, and can deposit a vapor deposition material on the substrate 110 in each vapor deposition chamber.
The carrier 1 on which the substrate 110 and the mask 111 are mounted after the film formation is completed is conveyed to the mask carrying-out chamber 105, and the mask 111 is separated from the carrier 1 and carried out. Then, the carrier 1 on which the substrate 110 on which the film formation is completed is carried to the substrate carrying-out chamber 106, and the substrate 110 is separated from the carrier 1 and carried out. Further, the carriage 1 is also carried out.
The configurations of the conveying device 2 and the carriage 1 will be described with reference to fig. 1, and also to fig. 2 and 3. Fig. 2 is a sectional view of the carrier device 2 along the line a-a of fig. 1, and fig. 3 is a plan view of the carriage 1.
The conveying device 2 includes a pair of conveying units CU spaced apart in the width direction of the substrate 110. Each of the conveying units CU extends in the X direction and forms a conveying path of the carriage 1 in the X direction. The conveyance unit CU is a unit for levitating and conveying the carriage 1 by magnetic force. The conveying unit CU includes a plurality of electromagnets (coils) 21 and permanent magnets 23 arranged in the X direction, and they are disposed in the frame 20 so as to be separated in the Z direction. Magnetic shields 22 are provided on both sides of the electromagnet 21 in the Y direction. The magnetic shield 22 is, for example, a plate-like member made of a magnetic material.
The conveying device 2 further includes a limiting unit 24 that limits the movement range of the carriage 1. The restricting unit 24 is supported by the frame 20 and extends in the X direction. The regulating unit 24 includes a roller R1 for regulating the Y-direction movement range of the carriage 1, and rollers R2 and R3 for regulating the Z-direction movement range of the carriage 1. The roller R1 is a freely rotatable body provided rotatably about a rotation axis in the Z direction, and faces the Y-direction end face of the contact portion 13 located at the Y-direction outermost end of the carriage 1. When the carriage 1 attempts to be separated from the conveyance path in the Y direction, the roller R1 abuts against the abutting portion 13 to prevent separation. The rollers R2 and R3 are freely rotatable bodies that are rotatable about a rotation axis in the Y direction, and are disposed apart in the Z direction. The roller R2 is opposed to the upper surface of the abutting portion 13, the roller R3 is opposed to the lower surface of the abutting portion 13, and when the carriage 1 reaches the upper limit position or the lower limit position, the roller R2 or R3 abuts against the abutting portion 13 to restrict further movement of the carriage 1 in the Z direction. The rollers R1 to R3 can be used as members for supporting the carriage 1 even when the carriage 1 is not suspended (non-suspended position).
The carrier 1 has a rectangular shape in a plan view, and includes a substrate support portion 10 that supports the substrate 110, a pair of magnet support portions 11, and a mask support portion 14. The substrate support portion 10 is located at the center in the Y direction. The pair of magnet support portions 11 are connected to respective ends of the substrate support portion 10 in the Y direction via connection portions 12, and are arranged along two sides of the substrate support portion 10 facing each other in the Y direction. Each of the substrate support portion 10 and the magnet support portion 11 is a rectangular plate-shaped member.
The substrate support portion 10 supports the substrate 110 on the lower surface thereof. The substrate support portion 10 includes a holding portion for holding the substrate 110, and the holding portion is, for example, an adhesive portion using an adhesive material or an adsorption portion by air suction or the like. The holding portion may be a jig mechanism portion that mechanically clamps the substrate. The substrate 110 is supported in a horizontal posture on the X-Y plane.
The mask support portion 14 supports the mask 111 below the substrate 110 so as to overlap the substrate 110 supported by the substrate support portion 10. The mask support portion 14 has a holding portion for holding the mask 111, and the holding portion is, for example, an adhesive portion using an adhesive material or an adsorption portion by air suction or the like. The holding portion may be a jig mechanism portion that mechanically clamps the substrate. The mask 111 is supported in a horizontal posture on the X-Y plane.
Each magnet support portion 11 has an end portion on the side of the connection portion 12 and an end portion on the opposite side in the Y direction. The abutting portion 13 abutting against the regulating unit 24 is a plate-like member connected to the end portion on the opposite side, and extends in the X direction.
Each magnet support 11 supports a plurality of permanent magnets M1 and M2. The plurality of permanent magnets M1 and M2 are arranged in the X direction, and a yoke, not shown, is provided. The permanent magnet M1 is fixed to the lower surface of the magnet support portion 11 so as to face the permanent magnet 23 of the conveying unit CU in the Z direction. The repulsive force of the permanent magnet 23 and the permanent magnet M1 is used to generate a levitation force to the carriage 1. The permanent magnet M2 is fixed to the upper surface of the magnet support portion 11 so as to face the electromagnet 21 of the conveying unit CU in the Z direction. By sequentially switching the electromagnets 21 that generate magnetic force, the carriage 1 can generate a moving force in the X direction by the attraction force of the electromagnets 21 and the permanent magnets M2.
In the present embodiment, the electromagnet 21 and the permanent magnet 23 are assumed to be disposed inside (inside the chamber) of each chamber (101 to 106) of the film forming apparatus 100, but may be disposed outside the chamber. Further, although the carriage 1 is configured to generate the levitation force by the repulsive force between the permanent magnet 23 and the permanent magnet M1 in order to levitating and conveying the carriage 1, the levitation and conveying of the carriage 1 can be performed even in a configuration in which the permanent magnet 23 and the permanent magnet M1 are not provided and only the permanent magnet M2 and the electromagnet 21 are provided.
Each connection portion 12 is formed of a magnetic material. The magnetic material is, for example, a soft magnetic material such as iron. The other components of the carrier 1 (the substrate support portion 10, the magnet support portion 11, and the contact portion 13) are formed of a nonmagnetic material such as aluminum or an aluminum alloy, for example. By forming the connection portion 12 of a magnetic material, the range of action of magnetism generated by the permanent magnets M1 and M2 is limited. Details will be described later.
Next, the conveying device 2 includes a magnetic detection unit 3 for detecting a position of the carriage 1 in the conveying direction (X direction). The detection unit 3 includes a magnetic scale 31 and a magnetic sensor 32. In the present embodiment, the magnetic scale 31 is provided on the carriage 1 on the moving side, and the magnetic sensor 32 is provided on the frame 20 on the fixed side.
The magnetic scale 31 is a strip-shaped member extending in the X direction, and a magnetic pattern is recorded in the X direction. In the present embodiment, the magnetic scale 31 is provided at one end portion of the substrate support portion 10 in the Y direction. The magnetic sensor 32 is a sensor (magnetic detection head) that reads the magnetic pattern of the magnetic scale 31, and is disposed at a position facing the magnetic scale 31. The position of the carriage 1 in the X direction can be specified by the detection result of the magnetic sensor 32, and the conveyance control of the carriage 1 can be performed by driving the electromagnet 21 by feedback control based on the specified position. As shown in fig. 1, the magnetic sensors 32 are disposed at a plurality of positions in the transport path in the film deposition apparatus 1. In the present embodiment, the magnetic scale 31 and the magnetic sensor 32 are disposed only on one end side in the Y direction of the substrate support portion 10, but may be disposed on both end portions.
The detection unit 3 is disposed closer to the substrate support portion 10 than the connection portion 12 in the Y direction. By forming the coupling portion 12 of a magnetic material as described above, it is possible to reduce the influence of the magnetism of the permanent magnets M1 and M2 supported by the magnet support portion 11 on the position detection of the detection unit 3. Fig. 4(a) and 4(B) are explanatory views thereof.
Fig. 4(a) shows a configuration example in which the substrate support portion 10 and the magnet support portion 11 are connected without a configuration corresponding to the connection portion 12 as a comparative example. The illustrated example schematically shows the magnetic flux lines F1 of the magnetic fluxes generated by the permanent magnets M1 and M2. The permanent magnets M1 and M2 interact with each other, and generate a leakage flux that does not contribute to the movement and levitation of the carriage 1. Fig. 4(a) shows only the magnetic flux lines of the leakage flux. The magnetic flux may reach the magnetic scale 31 and the magnetic sensor 32 to lower the position detection accuracy.
Fig. 4(B) shows magnetic flux lines F1 and F2 in the present embodiment. By forming the connection portion 12 of a magnetic material, as indicated by the magnetic flux lines F2, the magnetic flux generated by the permanent magnets M1 and M2 is attracted to the connection portion 12. As a result, the leakage magnetic flux can be prevented from reaching the magnetic scale 31 and the magnetic sensor 32. The connection portion 12 of the present embodiment has a portion 12a extending upward in the Z direction from the magnet support portion 11. The portion 12a is formed to have the same height as or extend to a position higher than the Z direction of the permanent magnet M2. The connection portion 12 has a portion 12b extending downward in the Z direction from the magnet support portion 11. The portion 12b is configured to be at the same height as or extend to a lower position than the Z direction of the permanent magnet M1. This can more effectively generate the action of attracting the magnetic flux generated by the permanent magnets M1 and M2 to the connection portion 12. As described above, the influence of the magnetism of the permanent magnets M1 and M2 on the position detection of the detection unit 3 can be reduced.
Fig. 5(a) shows an effect of shielding the magnetic flux generated by the electromagnet 21 with the magnetic shield 22. The leakage magnetic flux F3 generated by the electromagnet 21, which does not contribute to the movement of the carriage 1, is shielded by the magnetic shield 14, and the influence of the magnetism generated by the electromagnet 21 on the position detection of the detection unit 3 can be reduced.
< second embodiment >
In the first embodiment, the influence of the magnetism of the permanent magnets M1 and M2 on the position detection of the detection unit 3 is reduced only by the connection portion 12 as a magnetic material, but it may be used together with a magnetic shield. Fig. 5(B) shows an example thereof. In the illustrated example, the connection portion 12' corresponding to the connection portion 12 has no portion 12 a. Instead, a magnetic shield member 15 is provided at the connecting portion 12'. The magnetic shield member 15 is an L-shaped member extending in the X direction, and is formed of a magnetic material. The magnetic shield 15 plays the same role as the portion 12a, and mainly attracts the magnetic flux generated by the permanent magnet M2 to reduce the influence on the detection unit 3.
< third embodiment >
In the first embodiment, the configuration example in which the carriage 1 is levitated and conveyed in the X direction has been described, but the levitated and conveyed in two directions intersecting each other may be employed. Fig. 6 is a plan view of the carriage 1 of the present embodiment, and fig. 7(a) is a plan view of the conveying device 2 of the present embodiment. In the present embodiment, an example in which the carriage 1 can be conveyed in the X direction and the Y direction will be described.
The carriage 1 has a cross shape in a plan view, and in addition to the magnet supporting portions 11 being arranged along two sides of the substrate supporting portion 10 facing in the Y direction as in the first embodiment, magnet supporting portions 11' are arranged along two sides facing in the X direction. The magnet support portion 11 'has the same configuration as the magnet support portion 11, and the magnet support portion 11' is connected to the substrate support portion 10 via a connecting portion 12, and an abutting portion 13 is provided at an end thereof.
The conveying device 2 has a conveying unit CU similar to that of the first embodiment, and a conveying unit CU' having the same structure as that of the conveying unit CU. The conveyance unit CU extends in the Y direction.
The magnetic sensors 32 of the detection unit 3 are provided in plural on the conveying path of the conveying unit CU and on the conveying path of the conveying unit CU'. The detection unit 3 includes a magnetic scale 31 extending in the X direction and a magnetic scale 31 extending in the Y direction, and these magnetic scales 31 are disposed at the end of the substrate support portion 10.
In the conveying device 2 configured as described above, the carriage 1 can be conveyed in the X direction by the permanent magnets M1 and M2 of the conveying unit CU and the magnet supporting unit 11, and the carriage 1 can be conveyed in the Y direction by the permanent magnets M1 and M2 of the conveying unit CU 'and the magnet supporting unit 11' from the end point of the conveying unit CU. In this configuration, the magnetic coupling portion 12 made of a magnetic material also prevents the magnetic properties of the permanent magnets M1 and M2 of the magnet supporting portions 11 and 11' from affecting the detection unit 3. In the present embodiment, when the conveyance direction of the carriage 1 is changed, the carriage is conveyed without changing the direction thereof, but the posture of the carriage 1 may be rotated by 90 degrees.
< fourth embodiment >
In the first embodiment, the magnetic scale 31 is provided on the carriage 1 as the moving side, and the magnetic sensor 32 is provided on the frame 20 as the fixed side. Fig. 7(B) shows an example thereof. In the illustrated example, the magnetic sensor 32 is mounted on the carriage 1, and the magnetic scale 31 is supported by the frame 20. The magnetic sensors 32 can be arranged at least one with respect to one carrier 1. The magnetic scale 31 extends along the conveyance path of the carriage 1, but may not be provided in a section where precise positional accuracy is not required.
The present invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the claims are appended to disclose the scope of the invention.

Claims (10)

1. A conveyance device is provided with:
a carrier on which a substrate is mounted;
a carrying mechanism for carrying the carriage by magnetic force; and
a magnetic detection mechanism for detecting a position of the carriage in a conveying direction,
the handling device is characterized in that it is provided with,
the carrier is provided with:
a substrate support portion that supports the substrate; and
a magnet support portion connected to an end portion of the substrate support portion via a connecting portion and supporting a permanent magnet of the transfer mechanism,
The detection mechanism is arranged closer to the substrate supporting part than the connection part,
the connecting portion is formed of a magnetic material.
2. Handling device according to claim 1,
the detection mechanism is provided with:
a magnetic scale supported by the carriage; and
and a magnetic sensor which is disposed on a conveyance path of the carriage and reads the magnetic scale.
3. Handling device according to claim 1,
the connection portion is provided with a magnetic shielding member disposed between the permanent magnet and the detection mechanism.
4. Handling device according to claim 1,
the carrying mechanism is capable of carrying the carriage in a first direction and a second direction intersecting the first direction,
the magnet support portion includes:
a first magnet support portion arranged along the first direction; and
and a second magnet support portion arranged along the second direction.
5. Handling device according to claim 1,
the magnet support portion supports:
a first permanent magnet that generates a levitation force by the carriage using a first magnetic force from the conveyance mechanism; and
And a second permanent magnet for generating a moving force in the conveying direction by the carriage using a second magnetic force from the conveying mechanism.
6. Handling device according to claim 1,
the carrier includes a mask support portion that supports a mask so as to overlap the substrate.
7. Handling device according to claim 1,
the substrate support portion is in the form of a rectangular plate,
the magnet support portion includes a pair of first magnet support portions arranged along two opposing sides of the substrate support portion.
8. Handling device according to claim 4,
the first direction is orthogonal to the second direction,
the substrate support portion is a rectangular plate-like portion,
the magnet support portion includes:
a pair of first magnet supporting portions arranged along two opposite sides of the substrate supporting portion; and
and a pair of second magnet support portions arranged along two opposite sides of the substrate support portion different from the two sides.
9. Handling device according to claim 1,
the conveying device is provided with a free rotating body for limiting the moving range of the carrier in the direction crossed with the conveying direction,
The magnet support portion includes a first end portion connected to the connection portion and a second end portion opposite to the first end portion,
a contact portion that can contact the free rotating body is connected to the second end portion.
10. A carrier for carrying a substrate, which is carried by a carrying mechanism by magnetic force and whose position in the carrying direction is detected by a magnetic detection mechanism,
the carrier is characterized in that,
the carrier is provided with:
a substrate support portion that supports the substrate; and
a magnet support portion connected to an end portion of the substrate support portion via a connecting portion and supporting a permanent magnet of the transfer mechanism,
the detection mechanism is disposed closer to the substrate support portion than the connection portion,
the connecting portion is formed of a magnetic material.
CN202111609937.5A 2021-01-08 2021-12-27 Conveying device and carrier Pending CN114752912A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-002375 2021-01-08
JP2021002375A JP2022107427A (en) 2021-01-08 2021-01-08 Transport device and carrier

Publications (1)

Publication Number Publication Date
CN114752912A true CN114752912A (en) 2022-07-15

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111609937.5A Pending CN114752912A (en) 2021-01-08 2021-12-27 Conveying device and carrier

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JP (1) JP2022107427A (en)
KR (1) KR20220100509A (en)
CN (1) CN114752912A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004056892A (en) 2002-07-18 2004-02-19 Yaskawa Electric Corp Linear motor apparatus

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JP2022107427A (en) 2022-07-21

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