CN114714769A - 防腐蚀的墨盒、喷墨打印装置及qled发光器件的制备方法 - Google Patents

防腐蚀的墨盒、喷墨打印装置及qled发光器件的制备方法 Download PDF

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CN114714769A
CN114714769A CN202210324862.4A CN202210324862A CN114714769A CN 114714769 A CN114714769 A CN 114714769A CN 202210324862 A CN202210324862 A CN 202210324862A CN 114714769 A CN114714769 A CN 114714769A
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周浪
王立成
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Abstract

本发明涉及一种防腐蚀的墨盒、喷墨打印装置及QLED发光器件的制备方法。本发明防腐蚀的墨盒,包括外层硬质保护层和内层塑料储墨层,所述内层塑料储墨层的内表面设置有一混合膜层,所述混合膜层采用Na2SiO3、CaSiO3和SiO2的混合物制成。本发明通过对内层塑料储墨层的内表面进行防腐蚀处理,在内层塑料储墨层的内表面蒸镀一层硅酸钠(Na2SiO3)、硅酸钙(CaSiO3)、二氧化硅(SiO2)的混合膜层,能够提高内层塑料储墨层内表面的耐腐蚀性,当需要更换墨水时不会在内层塑料储墨层里残留很多以前的墨水。使用本发明的喷墨打印装置制备得到的QLED发光器件的稳定性等性能大大提高。

Description

防腐蚀的墨盒、喷墨打印装置及QLED发光器件的制备方法
技术领域
本发明涉及一种防腐蚀的墨盒、喷墨打印装置及QLED发光器件的制备方法。
背景技术
显示技术从早期的阴极射线管(CRT),到20世纪80年代中期的液晶显示(LCD)、等离子体平板显示(PDP),再到目前主流的OLED/QLED显示,完成了一次又一次质的飞跃。
有机电致发光二极管(OLED)由于具有自发光、结构简单、超轻薄、响应速度快、宽视角、低功耗、可柔性显示等十分优异的显示性能,已成为显示技术领域中的主流技术。量子点发光二极管(QLED)具有出射光颜色饱和,波长可调的优点,而且光致、电致发光量子产率高,近年来成了OLED的有力竞争着。
目前,在OLED/QLED显示技术中,厂家都采用成熟的真空蒸镀技术来制备各功能层,但使用真空蒸镀技术材料利用率太低,且当制备大尺寸显示面板时需使用大尺寸的高精度金属掩模版,而大尺寸的高精度金属掩模版很容易下垂或者变形,这导致产品良率一直上不去,从而成本居高不下。
随着纳米材料技术与设备技术的发展,在OLED/QLED显示技术中,采用喷墨印刷在刚性/柔性衬底上实现低成本、大面积印刷制备成为最受青睐的技术。在现有的OLED/QLED器件中,各功能层物质有的是有机聚合物,有的是无机纳米颗粒等,用来溶解或者分散它们的溶剂覆盖范围很广,本领域常使用的存储墨水的打印墨盒易被某种溶剂或者混合溶剂溶解从而腐蚀污染墨水。在器件制备过程中,经常发现当墨水在墨盒中储存1个星期以上比墨水刚加入墨盒时,制得的QLED发光器件的性能下降很多。当墨水加入墨盒一个星期以上时,受墨盒腐蚀影响制得的QLED发光器件性能下降,且更换墨水时清洗不干净会有残留的问题,而隔一个星期换一次墨水,会造成墨水的浪费。
发明内容
本发明的目的是在于克服现有技术中存在的不足,提供一种防腐蚀的墨盒、喷墨打印装置及QLED发光器件的制备方法。本发明通过对内层塑料储墨层的内表面进行防腐蚀处理,在内层塑料储墨层的内表面蒸镀一层硅酸钠(Na2SiO3)、硅酸钙(CaSiO3)、二氧化硅(SiO2)的混合膜层,能够提高内层塑料储墨层内表面的耐腐蚀性,当需要更换墨水时不会在内层塑料储墨层里残留很多以前的墨水。使用本发明的喷墨打印装置制备得到的QLED发光器件的稳定性等性能大大提高。
为实现以上技术目的,本发明实施例采用的技术方案是:
第一方面,本发明实施例提供了一种防腐蚀的墨盒,包括外层硬质保护层和内层塑料储墨层,所述内层塑料储墨层的内表面设置有一混合膜层,所述混合膜层采用Na2SiO3、CaSiO3和SiO2的混合物制成。
进一步地,所述混合膜层采用真空蒸镀工艺形成在所述内层塑料储墨层的内表面,厚度为0.2-2μm。
进一步地,所述混合膜层中Na2SiO3、CaSiO3和SiO2的质量比为1:1:1-1:1:10。
进一步地,所述混合膜层中Na2SiO3、CaSiO3和SiO2的质量比为1:1:4。
进一步地,所述外层硬质保护层采用塑料制成,所述内层塑料储墨层用于储存墨水,采用聚苯乙烯、聚对苯二甲酸乙二醇酯或聚甲基丙烯酸甲酯制成。
第二方面,本发明实施例提供了一种喷墨打印装置,包括喷头和墨盒,所述墨盒的外层硬质保护层通过卡夹的方式与所述喷头连通,所述内层塑料储墨层与所述喷头的喷嘴连通并为其供墨。
第三方面,本发明实施例提供了一种QLED发光器件的制备方法,采用上述的喷墨打印装置,包括以下步骤:
(1)在玻璃衬底上制备ITO阳极,在所述ITO阳极上制备空穴注入层,将水溶性的导电聚合物PEDOT喷墨打印在所述ITO阳极上,干燥成膜后在140-160℃退火处理10-30min,得到厚度为40-50nm的空穴注入层;
(2)在所述空穴注入层上制备空穴传输层,将TFB(全称为9,9-二辛基芴-CO-N-(4-丁基苯基)二苯胺)墨水通过喷墨打印于所述空穴注入层上,真空干燥成膜后在220-240℃退火处理20-40min,得到厚度为20-30nm的空穴传输层;
(3)在所述空穴传输层上制备QD(发光量子点)发光层,将绿色CdSe@ZnS合金量子点墨水喷墨打印于所述空穴传输层上,真空干燥成膜后在90-110℃退火处理5-20min,得到厚度为10-30nm的QD发光层;
(4)在所述QD发光层上制备电子传输层,将ZnO墨水通过喷墨打印于所述QD发光层上,真空干燥成膜后在110-130℃退火处理10-20min,得到厚度为30-50nm的电子传输层;
(5)在电子传输层上制备阴极,将Al蒸镀在所述电子传输层上,得到厚度为140-160nm的阴极;
(6)封装,制备得到QLED发光器件。
本发明实施例提供的技术方案带来的有益效果是:
本发明通过对内层塑料储墨层的内表面进行防腐蚀处理,在内层塑料储墨层的内表面蒸镀一层硅酸钠(Na2SiO3)、硅酸钙(CaSiO3)、二氧化硅(SiO2)的混合膜层,其中硅酸钠(Na2SiO3)、硅酸钙(CaSiO3)、二氧化硅(SiO2)是玻璃的主要物质,这就相当于在内层塑料储墨层的内表面设置一层薄薄的玻璃,而玻璃的耐腐蚀能力比塑料好很多,能防止绝大部分的有机溶剂腐蚀,且玻璃好清洗,当需要更换墨水时不会在内层塑料储墨层里残留很多以前的墨水。使用本发明的喷墨打印装置制备得到的QLED发光器件的稳定性等性能大大提高。
附图说明
图1为本发明实施例制得的QLED发光器件的结构示意图。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅用以解释本发明,并不用于限定本发明。
实施例1
一种喷墨打印装置,包括墨盒和喷头,墨盒包括外层硬质保护层和内层塑料储墨层,所述内层塑料储墨层的内表面设置有一混合膜层,所述混合膜层采用Na2SiO3、CaSiO3和SiO2的混合物制成,Na2SiO3、CaSiO3和SiO2的质量比为1:1:4。所述混合膜层采用真空蒸镀工艺形成在所述内层塑料储墨层的内表面,厚度为1μm。
外层硬质保护层采用塑料制成,内层塑料储墨层用于储存墨水,采用聚苯乙烯、聚对苯二甲酸乙二醇酯或聚甲基丙烯酸甲酯制成。需要说明的是外层硬质保护层中的“硬质”是相对于内层塑料储墨层而言的。
所述墨盒的外层硬质保护层通过卡夹的方式与所述喷头连通,所述内层塑料储墨层与所述喷头的喷嘴连通并为其供墨。
一种QLED发光器件的制备方法,采用上述喷墨打印装置制备而成,包括以下步骤:
(1)在玻璃衬底制备上ITO阳极,在ITO阳极上制备空穴注入层,将水溶性的导电聚合物PEDOT通过喷墨打印于ITO阳极上,干燥成膜后,150℃退火处理20min,得到厚度为45nm的空穴注入层;其中导电聚合物PEDOT是EDOT(3,4-乙烯二氧噻吩单体)的聚合物。
(2)在空穴注入层上制备空穴传输层,将TFB墨水通过喷墨打印于空穴注入层上,真空干燥成膜后,230℃退火处理30min,得到厚度为25nm的空穴传输层;
(3)在空穴传输层上制备QD发光层,将CdSe@ZnS绿色量子点墨水通过喷墨打印于空穴传输层上,真空干燥成膜后,100℃退火处理10min,得到厚度为20nm的QD发光层;
(4)在QD发光层上制备电子传输层,将ZnO墨水通过喷墨打印于QD发光层上,真空干燥成膜后,120℃退火处理15min,得到厚度为40nm的电子传输层;
(5)在电子传输层上制备阴极,将Al通过蒸镀工艺蒸镀在电子传输层上,得到厚度为150nm的阴极;
(6)封装,制备得到QLED发光器件,如图1所示。
采用上述QLED发光器件的制备方法,利用储放不同时间墨水的墨盒制备QLED发光器件,并对制得的QLED发光器件进行相关性能的对比,经过防腐蚀处理的打印墨盒制备的器件性能如下表1所示。
表1本发明实施例1中不同类型发光器件的相关性能的比较
Figure BDA0003572980180000031
Figure BDA0003572980180000041
对比例1
一种喷墨打印装置,与实施例1中的打印装置相比,区别在于对比例1中墨盒的内层塑料储墨层的内表面不设置混合膜层。
采用实施例1中QLED发光器件的制备方法,利用常规的喷墨打印装置制备不同的QLED发光器件,各个QLED发光器件的区别在与采用储放不同时间墨水的墨盒制备而成,并对制得的QLED发光器件进行相关性能的对比,制备的器件性能如下表2所示。
表2本发明对比例1中不同类型发光器件的相关性能的比较
Figure BDA0003572980180000042
综上所述,本申请实施例中通过对储存墨水的内层塑料储墨层内表面进行防腐蚀处理,在内层塑料储墨层内表面蒸镀一层硅酸钠(Na2SiO3)、硅酸钙(CaSiO3)、二氧化硅(SiO2)的混合膜层,其中硅酸钠(Na2SiO3)、硅酸钙(CaSiO3)、二氧化硅(SiO2)是玻璃的主要物质,这就相当于在软的塑料袋子的内表面设置一层薄薄的玻璃,而玻璃的耐腐蚀能力比塑料好很多,能防止绝大部分的有机溶剂腐蚀,且玻璃好清洗,当需要更换墨水时不会在塑料袋子里残留很多以前的墨水。从实施例中制备的QLED发光器件的相关性能也可以看出,墨水加入墨盒后比较稳定,没有受到墨盒的腐蚀,墨水加入墨盒2week后性能也比较稳定(下降≈7%),而对比例中制备的QLED发光器件的相关性能下降的比较多(2week后下降≈60%)。
最后所应说明的是,以上具体实施方式仅用以说明本发明的技术方案而非限制,尽管参照实例对本发明进行了详细说明,本领域的普通技术人员应当理解,可以对本发明的技术方案进行修改或者等同替换,而不脱离本发明技术方案的精神和范围,其均应涵盖在本发明的权利要求范围当中。

Claims (7)

1.一种防腐蚀的墨盒,其特征在于,包括外层硬质保护层和内层塑料储墨层,所述内层塑料储墨层的内表面设置有一混合膜层,所述混合膜层采用Na2SiO3、CaSiO3和SiO2的混合物制成。
2.根据权利要求1所述的防腐蚀的墨盒,其特征在于,所述混合膜层采用真空蒸镀工艺形成在所述内层塑料储墨层的内表面,厚度为0.2-2 μm。
3.根据权利要求1所述的防腐蚀的墨盒,其特征在于,所述混合膜层中Na2SiO3、CaSiO3和SiO2的质量比为1:1:1-1:1:10。
4.根据权利要求1所述的防腐蚀的墨盒,其特征在于,所述混合膜层中Na2SiO3、CaSiO3和SiO2的质量比为1:1:4。
5.根据权利要求1所述的防腐蚀的墨盒,其特征在于,所述外层硬质保护层采用塑料制成,所述内层塑料储墨层用于储存墨水,采用聚苯乙烯、聚对苯二甲酸乙二醇酯或聚甲基丙烯酸甲酯制成。
6.一种喷墨打印装置,其特征在于,包括喷头和权利要求1-5之一所述的墨盒,所述墨盒的外层硬质保护层通过卡夹的方式与所述喷头连通,所述内层塑料储墨层与所述喷头的喷嘴连通并为其供墨。
7.一种QLED发光器件的制备方法,其特征在于,采用权利要求6所述的喷墨打印装置,包括以下步骤:
(1)在玻璃衬底上制备ITO阳极,在所述ITO阳极上制备空穴注入层,将水溶性的导电聚合物PEDOT喷墨打印在所述ITO阳极上,干燥成膜后在140-160℃退火处理10-30min,得到厚度为40-50nm的空穴注入层;
(2)在所述空穴注入层上制备空穴传输层,将TFB墨水通过喷墨打印于所述空穴注入层上,真空干燥成膜后在220-240℃退火处理20-40min,得到厚度为20-30nm的空穴传输层;
(3)在所述空穴传输层上制备QD发光层,将绿色CdSe@ZnS合金量子点墨水喷墨打印于所述空穴传输层上,真空干燥成膜后在90-110℃退火处理5-20min,得到厚度为10-30nm的QD发光层;
(4)在所述QD发光层上制备电子传输层,将ZnO墨水通过喷墨打印于所述QD发光层上,真空干燥成膜后在110-130℃退火处理10-20min,得到厚度为30-50nm的电子传输层;
(5)在电子传输层上制备阴极,将Al蒸镀在所述电子传输层上,得到厚度为140-160nm的阴极;
(6)封装,制备得到QLED发光器件。
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