CN114656165A - Glass dustproof coating and preparation method thereof - Google Patents
Glass dustproof coating and preparation method thereof Download PDFInfo
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- CN114656165A CN114656165A CN202210292659.3A CN202210292659A CN114656165A CN 114656165 A CN114656165 A CN 114656165A CN 202210292659 A CN202210292659 A CN 202210292659A CN 114656165 A CN114656165 A CN 114656165A
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- 238000000576 coating method Methods 0.000 title claims abstract description 64
- 239000011248 coating agent Substances 0.000 title claims abstract description 61
- 239000011521 glass Substances 0.000 title claims abstract description 40
- 238000002360 preparation method Methods 0.000 title abstract description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000002131 composite material Substances 0.000 claims abstract description 16
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000428 dust Substances 0.000 claims abstract description 14
- 239000007788 liquid Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 238000003756 stirring Methods 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 8
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 8
- 238000007789 sealing Methods 0.000 claims abstract description 8
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 8
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 8
- 230000032683 aging Effects 0.000 claims abstract description 7
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims abstract description 7
- 230000002265 prevention Effects 0.000 claims abstract description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- 229910021389 graphene Inorganic materials 0.000 claims description 13
- 239000011787 zinc oxide Substances 0.000 claims description 10
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 4
- XNDZQQSKSQTQQD-UHFFFAOYSA-N 3-methylcyclohex-2-en-1-ol Chemical compound CC1=CC(O)CCC1 XNDZQQSKSQTQQD-UHFFFAOYSA-N 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 4
- 230000003746 surface roughness Effects 0.000 claims description 4
- YZYKBQUWMPUVEN-UHFFFAOYSA-N zafuleptine Chemical compound OC(=O)CCCCCC(C(C)C)NCC1=CC=C(F)C=C1 YZYKBQUWMPUVEN-UHFFFAOYSA-N 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 2
- 230000003301 hydrolyzing effect Effects 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 abstract description 8
- 238000002156 mixing Methods 0.000 abstract description 4
- 239000011259 mixed solution Substances 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 5
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 4
- 239000007888 film coating Substances 0.000 description 4
- 238000009501 film coating Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000007761 roller coating Methods 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000003075 superhydrophobic effect Effects 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
- E04B2/00—Walls, e.g. partitions, for buildings; Wall construction with regard to insulation; Connections specially adapted to walls
- E04B2/88—Curtain walls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Architecture (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Structural Engineering (AREA)
- Civil Engineering (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Surface Treatment Of Glass (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The invention relates to a glass dustproof coating and a preparation method thereof, which are characterized in that: (1) mixing the mixed solution of ethyl orthosilicate, isopropanol, water and hydrochloric acid uniformly, and sealing and storing in a 50 ℃ oven for 24h to obtain acid-catalyzed SiO2Sol A coated on a glass substrate; (2) preparing an AZO-rGO composite coating by adopting a roll coating method: heat treatment at 450-550 ℃ under reducing atmosphere for 30-60 min; obtaining a transparent conductive layer; (3) the dust-proof layer is prepared by the following method: according to the mass, 1 part of ethyl orthosilicate, 0.1-0.6 part of methyltriethoxysilane, 20-35 parts of isopropanol and 4 parts of water are fully mixed, hydrochloric acid is dropwise added to adjust the pH value to be 1-3.5, stirring is carried out for 4 hours, and coating liquid C is obtained after sealing, standing and aging; the AZO-rGO composite coating is coated on an AZO-rGO composite coating to be used as a dust prevention layer. The invention has the advantages that: the process is simple, the cost is low, and large-area film forming can be realized; the coating is firm and durable, and has good chemical stability; the glass curtain wall and photovoltaic module can be applied to glass curtain walls and photovoltaic modules, and the transmittance attenuation rate is reduced.
Description
Technical Field
The invention belongs to the technical field of glass surface treatment, and particularly relates to a dustproof coating for building glass and photovoltaic glass and a preparation method thereof.
Background
The dust prevention functionalization of the surfaces of building glass curtain walls, photovoltaic components, solar flat plate collectors and the like is an important practical problem which needs to be solved urgently. At present, the antireflection film technology can improve the initial light transmittance of glass, but the surface of the glass is polluted and the light transmittance is obviously reduced due to the action of environments such as long-term complex weather, dust and the like. In addition, long-term dust adhesion causes corrosion of the glass surface and growth of mold, thereby affecting the physicochemical properties of the glass. For photovoltaic power stations, no matter mechanical cleaning or manual wiping, a large amount of water resources need to be consumed, so that the method is difficult to be suitable for being used in remote desert and low water areas with common site selection. The super-hydrophobic coating technology has excellent hydrophobicity, but the surface roughness is large, and the super-hydrophobic coating technology cannot be used for pollution of PM2.5 (particulate matters with equivalent diameter not more than 2.5 mu m) with tiny particle size and nanoscale dust.
Disclosure of Invention
The invention aims to solve the problem that the optical transmittance of glass is reduced because the glass is easily attached by tiny particles such as sand and dust under the existing use environment, and provides a glass dustproof coating and a preparation method thereof.
In order to realize the purpose, the technical scheme adopted by the invention is as follows:
a glass dust-proof coating comprises a glass substrate and is characterized in that: on the upper surface of the glass substrateThe surface is sequentially provided with a first layer of SiO2The second transparent conductive layer and the third dustproof layer; the second layer of transparent conducting layer coating solution is aluminum-doped zinc oxide-reduced graphene oxide (AZO-rGO) composite sol.
Further, the addition amount of the reduced graphene oxide (rGO) in the aluminum-doped zinc oxide-reduced graphene oxide (AZO-rGO) composite sol accounts for 0-0.5% of the mass percentage of the aluminum-doped zinc oxide (AZO) sol.
Further, the average size of the reduced graphene oxide in the aluminum-doped zinc oxide-reduced graphene oxide (AZO-rGO) composite sol is 100-500 nm.
Further, the aluminum-doped zinc oxide (AZO) is prepared from the following raw materials in parts by mole: 1 part of zinc acetate dihydrate, 0.01-0.03 part of aluminum nitrate nonahydrate, 10-20 parts of ethylene glycol monomethyl ether and 0.5-3 parts of diethanolamine.
Further, the main component of the dustproof layer is silicone resin.
Further, the organic silicon resin is prepared by hydrolyzing and condensing methyl triethoxysilane serving as a main component; wherein the ratio (R/Si value) of the organic portion to the inorganic portion in the dust-proof layer is 0.9 to 1.2; the surface energy of the dust-proof layer is less than 30J/m2And the surface roughness is less than 50 nm.
A preparation method of a glass dustproof coating is characterized by comprising the following steps:
(1) preparing mixed liquor by taking ethyl orthosilicate, isopropanol, water and hydrochloric acid as raw materials, fully stirring, and then sealing and storing in a 50 ℃ oven for 24 hours to obtain acid-catalyzed SiO2Sol A, coating a layer of SiO on a glass substrate by taking A as coating liquid2；
(2) Then on SiO2Preparing an AZO-rGO composite coating on the layer by adopting a roll coating method: carrying out heat treatment in a reducing atmosphere, wherein the heat treatment temperature is 450-550 ℃, and the heat treatment time is 30-60 min; the obtained transparent conductive layer had a resistivity of 0.5X 10-3~3.5×10-2Ω·cm；
(3) And coating a dust-proof layer on the AZO-rGO composite coating, wherein the dust-proof layer is prepared by adopting the following method: according to the mass, 1 part of ethyl orthosilicate, 0.1-0.6 part of methyltriethoxysilane, 20-35 parts of isopropanol and 4 parts of water are fully mixed, then hydrochloric acid solution is dropwise added to adjust the pH value to 1-3.5, stirring is continued for 4 hours, and coating liquid C is obtained after sealing, standing and aging; the coating is coated on the AZO-rGO composite coating to be used as a dustproof layer.
According to the invention, the AZO is doped with a proper amount of graphene, so that the coating has good conductivity and the heat treatment temperature is reduced. When AZO/rGO film is annealed in a reducing atmosphere, carbon atoms may occupy Zn2+Vacancy formation CZnA defect; AZO is used as an n-type semiconductor, and after a certain content of rGO is added into the sol of the AZO, the carrier concentration of the obtained coating is improved, so that the resistivity is reduced.
First layer of SiO2The bonding force between the coating and the glass substrate can be enhanced, the protective and blocking effects are achieved, the second layer provides certain conductivity, dust adsorption caused by electrostatic accumulation is prevented, the surface of the coating is enabled to have enough flatness and hardness through the third layer, the surface energy is low, and the adhesion and adhesion of pollutants such as dust are further reduced.
The invention has the beneficial effects that:
1. the AZO transparent conductive film prepared by adopting the sol-gel method is a wet chemical process with low cost and simple process, has simple and easy component adjustment and lower crystallization temperature than a pure AZO coating, and can form a film in a large area by matching with a roller coating process;
2. the dustproof coating is firm and durable and has good chemical stability;
3. the coating disclosed by the invention is applied to glass curtain walls and photovoltaic modules, the transmittance decay rate is reduced, even if dirt such as dust is formed on the surface of the coating, the dirt can be easily removed in a manual or mechanical wiping and washing mode, the cleaning and maintenance cost is favorably reduced, and the coating is an important way for solving the problem that the glass surface is easy to pollute.
Drawings
FIG. 1 is a schematic view of a glass dustproof coating structure.
Detailed Description
The invention is further illustrated with reference to fig. 1: a preparation method of a glass dustproof coating comprises the following specific implementation steps:
example 1
(1) Adding 98mL of tetraethoxysilane into 840mL of isopropanol, mixing and stirring for 10min, then dropwise adding 31.7 mL of 0.01mol/L dilute hydrochloric acid, continuing stirring for 2h, and hermetically storing in a 50 ℃ oven for 24h to obtain SiO2Coating liquid A;
(2) 760mL of ethylene glycol monomethyl ether and 36mL of ethanolamine are magnetically stirred for 30min, 131.70 g of zinc acetate dihydrate and 1.13 g of aluminum nitrate nonahydrate are added, the mixture is continuously stirred for 30min, the mixture is moved into a four-hole flask, water bath at 60 ℃ is carried out, stirring is carried out for 5 h, aging is carried out for 24h, AZO sol is obtained, reduced graphene oxide rGO with the particle size of 120-250 nm accounting for 0.01 mass percent of the AZO sol is added, and the mixed solution is ultrasonically vibrated for 6 h, so that coating solution B1 is obtained;
(3) dispersing 69.44 g of tetraethoxysilane and 29.71 g of methyltriethoxysilane in 636.53 g of isopropanol, fully mixing, then gradually adding 24 g of 0.01mol/L dilute hydrochloric acid solution, continuously stirring for 4 hours, sealing, standing and aging to obtain coating solution C;
(4) coating the film coating liquid A on the surface of a clean glass substrate by using a roller coating device, heating the surface for 10min at 350 ℃, continuously using the film coating liquid B1 to prepare a second layer, and performing surface treatment in a reducing atmosphere (95 vol% N)2 ，5 vol% H2) And heating to 500 ℃, preserving the temperature for 1 h, cooling to room temperature, and preparing a third layer on the surface of the second layer by using the coating liquid C.
Example 2
(1) Preparation of SiO by the method of example 12Coating;
(2) 760mL of ethylene glycol monomethyl ether and 36mL of ethanolamine are magnetically stirred for 30min, 131.70 g of zinc acetate dihydrate and 1.33 g of aluminum nitrate nonahydrate are added, the mixture is continuously stirred for 30min, the mixture is moved into a four-hole flask, water bath at 60 ℃ is carried out, the stirring is carried out for 5 h, and the aging is carried out for 24h, so as to obtain AZO sol; adding 0.04% by mass of reduced graphene oxide rGO with the particle size of 260-450 nm into the AZO sol, and ultrasonically vibrating the mixed solution for 6 hours to obtain a coating solution B2;
(3) dispersing 69.44 g of tetraethoxysilane and 29.71 g of methyltriethoxysilane in 636.53 g of isopropanol, fully mixing, gradually adding 24 g of 0.01mol/L dilute hydrochloric acid solution, continuously stirring for 4 hours, sealing, standing and aging to obtain coating liquid C;
(4) coating the film coating liquid A on the surface of a clean glass substrate by using a roller coating device, heating the surface for 10min at 300 ℃, continuously using the film coating liquid B2 to prepare a second layer, and performing surface treatment in a reducing atmosphere (95 vol% N)2 ，5 vol% H2) Heating to 500 ℃, preserving the heat for 1 h, cooling to room temperature, and preparing a third layer on the surface of the second layer by using the coating liquid C;
the dust-proof performance of the samples prepared in examples 1 and 2 and uncoated glass pieces was verified by a dust test chamber by simulating dust in the atmosphere with talc powder having a particle size of 3000 meshes, and the dust-fall rate was set to be 5 g/m2And d, testing after the temperature of the testing environment is 20 ℃, the relative humidity is 40%, the placing angle of the sample and the horizontal plane is 45 degrees, the dust settling time is 480min, taking out the sample, erecting the original piece and the coating sample, and slightly knocking the table top twice with the same mode and strength to remove the dust without adhesive force for testing.
The data such as the average transmittance change of the sample in the wavelength range of 380-1100 nm are shown in the table 1:
TABLE 1
| Surface roughness (nm) | Water contact Angle (°) | Initial transmittance (%) | Transmittance after experiment (%) | |
| Uncoated master | 6.5 | 8 | 91.5 | 85.6 |
| Example 1 sample | 23.1 | 118 | 92.8 | 90.1 |
| Example 2 sample | 18.2 | 125 | 93.5 | 91.2 |
Claims (7)
1. A glass dust-proof coating comprises a glass substrate and is characterized in that: a first SiO layer is arranged on the upper surface of the glass substrate from bottom to top in sequence2The second transparent conductive layer and the third dustproof layer; the coating liquid of the second transparent conducting layer is aluminum-doped zinc oxide-reduced graphene oxide (AZO-rGO) composite sol.
2. The glass dust-proof coating according to claim 1, characterized in that: the addition amount of the reduced graphene oxide (rGO) in the aluminum-doped zinc oxide-reduced graphene oxide (AZO-rGO) composite sol accounts for 0-0.5% of the mass percentage of the aluminum-doped zinc oxide (AZO) sol.
3. The glass dust-proof coating according to claim 1 or 2, characterized in that: the average size of the reduced graphene oxide in the aluminum-doped zinc oxide-reduced graphene oxide (AZO-rGO) composite sol is 100-500 nm.
4. The glass dust-proof coating according to claim 1 or 2, characterized in that: the aluminum-doped zinc oxide (AZO) is prepared from the following raw materials in parts by mole: 1 part of zinc acetate dihydrate, 0.01-0.03 part of aluminum nitrate nonahydrate, 10-20 parts of ethylene glycol monomethyl ether and 0.5-3 parts of diethanolamine.
5. The glass dust-proof coating according to claim 1, characterized in that: the main component of the dustproof layer is organic silicon resin.
6. The glass dust-proof coating according to claim 5, characterized in that: the organic silicon resin is prepared by hydrolyzing and condensing methyl triethoxysilane serving as a main component; wherein the ratio of organic to inorganic portions (R/Si value) in the dust-proof layer is between 0.9 and 1.2; the surface energy of the dust-proof layer is less than 30J/m2And the surface roughness is less than 50 nm.
7. The method for preparing a glass dustproof coating according to claim 1, characterized by comprising the following steps:
(1) preparing mixed liquor by taking ethyl orthosilicate, isopropanol, water and hydrochloric acid as raw materials, fully stirring, and then sealing and storing in a 50 ℃ oven for 24 hours to obtain acid-catalyzed SiO2Sol A, coating a layer of SiO on a glass substrate by taking A as coating liquid2；
(2) Then on SiO2Preparing an AZO-rGO composite coating on the layer by adopting a roll coating method: carrying out heat treatment in a reducing atmosphere, wherein the heat treatment temperature is 450-550 ℃, and the heat treatment time is 30-60 min; the obtained transparent conductive layer had a resistivity of 0.5X 10-3~3.5×10-2Ω·cm；
(3) And coating a dust-proof layer on the AZO-rGO composite coating, wherein the dust-proof layer is prepared by adopting the following method: according to the mass, 1 part of ethyl orthosilicate, 0.1-0.6 part of methyltriethoxysilane, 20-35 parts of isopropanol and 4 parts of water are fully mixed, then hydrochloric acid solution is dropwise added to adjust the pH value to 1-3.5, stirring is continued for 4 hours, and coating liquid C is obtained after sealing, standing and aging; the AZO-rGO composite coating is coated on an AZO-rGO composite coating to be used as a dust prevention layer.
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Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102568654A (en) * | 2010-12-13 | 2012-07-11 | 国家纳米科学中心 | Transparent conductive film and preparation method of transparent conductive film |
| KR20130140386A (en) * | 2012-06-14 | 2013-12-24 | 한국기계연구원 | Method for organic photovoltaics with reduced graphene oxide and organic photovoltatics prepared thereof |
| CN105810303A (en) * | 2014-12-30 | 2016-07-27 | 北京生美鸿业科技有限公司 | Graphene/ inorganic matter composite transparent conductive film-based light adjusting film |
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