CN105399340A - Super-hydrophobic high-transmittance SiO2 anti-reflecting thin film and preparation method thereof - Google Patents
Super-hydrophobic high-transmittance SiO2 anti-reflecting thin film and preparation method thereof Download PDFInfo
- Publication number
- CN105399340A CN105399340A CN201510934882.3A CN201510934882A CN105399340A CN 105399340 A CN105399340 A CN 105399340A CN 201510934882 A CN201510934882 A CN 201510934882A CN 105399340 A CN105399340 A CN 105399340A
- Authority
- CN
- China
- Prior art keywords
- super
- film
- preparation
- high transmission
- hydrophobic high
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to a super-hydrophobic high-transmittance SiO2 anti-reflecting thin film and a preparation method thereof; a hybrid sol doped with trimethylchlorosilane is prepared by a sol-gel method; the surface of a glass slide is cleaned; a plating film is formed on the surface of the glass slide by a dip-coating method, and the super-hydrophobic high-transmittance SiO2 anti-reflecting thin film is obtained after the plating film is dried. Compared with the prior art, the preparation method has the advantages of simple manufacturing process and low cost, and the obtained sol has good uniformity and can be used for large-area film forming. Due to relatively high transmission, incident light transmission can be improved and the solar cell efficiency can be improved when the anti-reflecting thin film is used on a photovoltaic glass cover plate. Moreover, because the thin film has good hydrophobicity and has good self cleaning ability, the thin film is suitable for outdoor humid environments.
Description
Technical field
The present invention relates to the multi-functional antireflective film material of a kind of solar energy photovoltaic system, especially relate to a kind of super-hydrophobic high transmission SiO
2antireflection film and preparation method thereof.
Background technology
Current solar photovoltaic industry is in the low ebb of development, and tracing it to its cause is that its efficient energy conversion is low, and high cost causes; and along with coal, the scarcity day by day of the fossil fuel resources such as oil, the pressure of environment protection in addition; development sun power, the renewable energy sources such as wind energy are extremely urgent.Relative to wind energy, the renewable energy sources such as underground heat, it is extremely wide that sun power has energy distributional region, in use can not produce the feature of any pollution.By solar panel, sun power is converted into electric energy, the important channel that the mankind solve energy problem will inevitably be become.But compared with other battery, the photoelectric transformation efficiency of solar cell is lower.Therefore, improve its efficiency be for a long time people endeavour always solve problem, and the important factor affecting battery efficiency be exactly battery to the utilization ratio inciding its surface light, namely battery is to the spectral response inciding its surperficial each wavelength light.We know, the important factor affecting battery efficiency is exactly that battery is to the utilization ratio inciding its surface light, only just account for the silion cell of market dominant contribution, due to high refractive index, incident light more than 30% reflects away from surface of crystalline silicon, and the light of nearly 10% loses in air/glass interface.According to Fresnel reflection principle, prepare at battery surface the reflection that antireflective coating that single or multiple lift specific refractory power is less than cell substrate can reduce incident light, increase transmission, increase effective absorption of photon.Incident light subnumber is more, and spectral response is larger, and the photoelectric transformation efficiency of battery is also higher.Therefore, studying solar cell antireflective film is also improve the key in efficiency of solar cell research.
In addition, the solar energy equipment used due to reality is often in severe outwork environment, in outdoor environment, apparatus surface is often atomized and rain drop erosion, surface film optical characteristics will sharply worsen, special wettability (super-hydrophobicity) surface can be had by creation one and solve this difficult problem, make film in life-time service process, higher light transmission rate can be kept, obtain desirable light-Re or light-electric conversion effect.And dirt problems is also one of problem affecting film performance in outdoor environment, dust scattering can cause incident light to lose, and the automatically cleaning characteristic of film also can solve dust deposit problem to a certain extent.Therefore, there is multi-functional antireflective film in recent years and obtain great concern.
Through the development of decades, people develop SiO in succession
2, TiO
2, MgF
2, the multiple antireflective film such as SiNx, wherein SiO
2with premium propertiess such as its low-refraction, high chemical stability and acid-alkali-corrosive-resistings, becoming is current most study, most widely used reflection-reducing material, is applied in various fields such as optics, solar cell, building glasses.Usual decision SiO
2film antireflective effect because have the specific refractory power that two: is film, the general method reducing specific refractory power mainly increases the porosity of rete, makes dense film become loose membrane.Two is the thickness of film, when thickness equals 1/4 wavelength, reaches best antireflective effect.But nanoporous SiO prepared by some traditional methods
2film porosity is large, surface energy is high, and the suspended substance easily in absorption environment, greatly limit its practical application.
Chinese patent CN103426939A discloses compound antireflective coating used for solar batteries and preparation method thereof, is specifically related to adopt combination of sol-gel Best-Effort request technique coating SiO
2/ TiO
2the method of compound antireflective coating.First, TiO is designed
2and SiO
2the compound antireflective coating used for solar batteries of interlaminate, then, with butyl (tetra) titanate and tetraethyl silicate for presoma, ethanol is solvent, prepares TiO respectively
2colloidal sol and SiO
2colloidal sol, adopts dipping-czochralski process alternately to apply TiO on simple glass
2and SiO
2colloidal sol, finally, heat-treats, and obtains compound antireflective coating used for solar batteries.But this prepares SiO
2what colloidal sol adopted is prepared by hydrochloric acid catalysis, and after the sol filming adopting acid catalysis to prepare, film is finer and close, and specific refractory power is comparatively large, and therefore film transmission is not high.
Summary of the invention
Object of the present invention be exactly in order to overcome above-mentioned prior art exist defect and a kind of super-hydrophobic high transmission SiO improving transmissivity and surface hydrophobicity is provided
2antireflection film and preparation method thereof.
Object of the present invention can be achieved through the following technical solutions:
A kind of super-hydrophobic high transmission SiO
2the preparation method of antireflection film, adopts following steps:
(1) sol-gel method preparation is adopted to be mixed with the hybrid collosol of trimethylchlorosilane;
(2) clean slide surface, the result of clean is most important to preparation high-performance antireflective film;
(3) adopt Best-Effort request method, form plated film on the surface of slide glass, after drying, namely obtain super-hydrophobic high transmission SiO
2antireflection film.
For conventional SiO
2the problem that the thin transmissivity of anti-reflection is low, specific refractory power is high, proposes the catalysis of a kind of alkali one step and prepares porous low-refraction nanoscale SiO
2antireflective film, this porous structural film can reduce film refractive index greatly, thus improves the transmissivity of film, and anti-reflective effect is obvious.And for the feature of base catalysis film hydrophilic, mix certain proportion trimethylchlorosilane in preparation process, make film surface carry a large amount of hydrophobic grouping, pellicular water contact angle is higher than 150 °, and thin film is for ultra-hydrophobicity.Thus solve photovoltaic device easy difficult problem such as the moisture absorption, light transmission reduction in wet environment preferably.
Step (1) specifically adopts following steps:
(1-1) join in dehydrated alcohol by ammoniacal liquor, the volume ratio of ammoniacal liquor and dehydrated alcohol is 1:30-50, stirs 5-20min obtain mixing solutions at the constant temperature lower magnetic force of 40-60 DEG C;
(1-2) by tetraethoxy and trimethylethoxysilane mixing, the volume ratio of tetraethoxy and trimethylethoxysilane is 1:0.5-1, then dropwise join forming reactions solution in the mixing solutions of (1-1), in solution, the volumetric concentration of tetraethoxy is 1.89%-3.08%.；
(1-3) reaction soln stirs 15-30h at 30-40 DEG C of lower magnetic force, then aging 4-6 days at ambient temperature, prepares hybrid collosol.
Step (2) specifically adopts following steps:
(2-1) slide glass is placed in deionized water for ultrasonic cleaning 20-40min;
(2-2) slide glass after cleaning is placed in acetone ultrasonic cleaning 10-20min;
(2-3) the slide glass deionized water rinsing 3-8min cleaned, fully removes acetone and the dust of slide surface;
(2-4) slide glass cleaned is placed in 50-70 DEG C of baking oven 1-3h, before Best-Effort request, again uses lens wiping paper wiped clean.
Step (3) specifically adopts following steps: the speed with 2.5-3mm/s after processed slide glass floods 3-8s in hybrid collosol at the uniform velocity lifts out, after plated film, slide glass is placed in room temperature environment seasoning, be placed in 200 DEG C of oven drying 20-40min again, obtain super-hydrophobic high transmission SiO
2antireflection film.
Compared with prior art, the porous structural film that the present invention adopts the catalysis of alkali one step to prepare, the most high energy of peak transmission reaches 97.05%, higher by 5.56% than naked glass peak transmission, after 200 DEG C of oven dry, film transmission decay is very little, the highlyest still can reach 96.7%, through the hybrid collosol plated film that trimethylchlorosilane is modified, pellicular water contact angle is 152 °, meet super-hydrophobic requirement, after 200 DEG C of oven dry, pellicular water contact angle is 106 °, still meet hydrophobic requirement, thus solve photovoltaic device easy moisture absorption in wet environment preferably, poor practicability, the difficult problems such as poor durability, can be applicable to solar energy industry field and opticfiber communication, multimedia digital product, IT industry, automotive industry, military, the fields such as aeronautical and space technology.
The application integrates super-hydrophobic and high transmission, and will obtain the excellent effect of antireflective film in the application, must be to adopt base catalysis and the organic surface modifying agent (as trimethylethoxysilane) of doping containing hydrophobic grouping.If not employing ammonia-catalyzed, but adopt hydrochloric acid or other catalyzer, or the proportional range adopted is not proportional range disclosed in the present application, and can may not prepare the porous structural film carried in the application, film may not reach the high transmission effects of peak value 97% yet.If do not have trimethylethoxysilane in raw material, the film obtained also does not possess hydrophobic effect.This is because trimethylethoxysilane is inherently a kind of containing a large amount of hydrophobic grouping methyl (-CH
3) organosilane, be often used to prepare hydrophobic material, being combined with tetraethyl silicate by trimethylethoxysilane of the application's novelty, obtains hybrid collosol, prepares super-hydrophobic high transmission SiO
2film.
SiO prepared by the application
2what colloidal sol adopted is prepared by ammonia-catalyzed, because alkali is different with acid catalysis mechanism, after the sol filming that the application adopts base catalysis to prepare, thin-film hydrophobic porous, specific refractory power is less, transmissivity is general higher, performance is much better than and utilizes acid to prepare colloidal sol, is doped with the hybrid collosol of trimethylethoxysilane, and the film of preparation not only meets the high requirement of transmissivity, hydrophobic performance, can reach 150 °.
Accompanying drawing explanation
Fig. 1 is the infrared absorption spectrum test pattern of film C1 and C2;
Fig. 2 is the transmittance graph of film C1, C2 and naked glass;
Fig. 3 is the water contact angle figure of film C1 and C2;
Fig. 4 is the top plan view scanning electron photomicrograph of film C1
Fig. 5 is transmissivity and the water contact angle comparison diagram of C1 and the rear C3 of test before water droplet test.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described in detail.
Embodiment 1
Super-hydrophobic high transmission SiO
2the preparation method of antireflection film, whole preparation process can be subdivided into: the large step of preparation (Best-Effort request, drying treatment) three of the preparation of colloidal sol, the process of substrate and film.
The preparation of colloidal sol: adopt the preparation of collosol and gel single stage method to mix the hybrid collosol of TMES, mark hybrid collosol SolC.Before experiment, the equipment pickling such as beaker, graduated cylinder, dropper is clean, then use ultrasonic cleaning 30min, finally wash away with deionized water, put into oven drying for subsequent use.Preparation process: the first step, the ammoniacal liquor of 1.3ml joins in 40ml dehydrated alcohol, and mixing solutions is stirred 10 minutes at constant temperature 50 DEG C of lower magnetic forces.Second step, by 1ml tetraethoxy (TEOS) and 0.8ml trimethylethoxysilane (TMES) mixing, then dropwise joins in the mixing solutions of the first step, forms final reaction soln.3rd step, end reaction solution is stirred 20 hours at 35 DEG C of lower magnetic forces, and under room temperature (25 DEG C) aging 4 days (digestion time could form evengranular colloidal sol at least 4 ~ 6 days), form hybrid collosol SolC, this colloidal sol generally can preserve about one month, along with time lengthening, sol particle can become large gradually gradually.
The process of substrate: the clean of substrate is most important to preparation high-performance antireflective film.The first step of cleaning slide glass is placed in deionized water for ultrasonic to clean 30 minutes.Second step, the slide glass the first step cleaned takes out, then is placed in acetone ultrasonic cleaning 15 minutes.3rd step, the slide glass deionized water rinsing cleaned by second step 5 minutes, fully removes acetone and the dust of slide surface.Finally, the slide glass cleaned is placed in 60 DEG C of baking ovens 2 hours.Before Best-Effort request, slide glass should be wiped clean for subsequent use again with lens wiping paper.
The preparation of film: what film coating method adopted is dip-coating method, and pull rate is 2.7mm/s.Processed slide glass was immersed in SolC for about 5 seconds, then rapid at the uniform velocity to lift out, pull rate 2.7mm/s.Film plating substrate is placed in room temperature environment (about 25 DEG C) and allows its seasoning, namely forms film C1 without any thermal treatment.C1 is placed in 200 DEG C of oven dryings 30 minutes, forms film C2.
The present invention devises the vesicular structure of super-hydrophobic silica antireflective coating, gives optimized result, and its advantage is: 1. the present invention has prepared low-refraction nano material, reaches good anti-reflective effect; And hydrophobic group is successfully added to film surface, make film reach super-hydrophobic effect.2. design result of the present invention has the advantages such as technique conveniently realizes, application prospect is extensive, cheap, for the preparation of multifunctional solar battery antireflective film provides preparation parameter, can be applicable to the field such as solar energy industry field and opticfiber communication, multimedia digital product, IT industry, automotive industry, military affairs, aeronautical and space technology.
Chemical bond and specific functional groups (-CH in film C1 and C2
3) mensuration tested by infrared absorption spectrum, as shown in Figure 1.All there is 2900cm clearly in two curves
-1and 2850cm
-1absorption peak, that this absorption peak is corresponding is methyl (-CH
3) in C-H key, this shows that two film surfaces are all containing a large amount of methyl group.
Fig. 2 is the transmittance graph of film C1, C2 and naked glass.As seen from the figure, the peak transmission of film C1 when wavelength is 472nm prepared by the hybrid collosol mixing TMES reaches 97.05%, and the peak transmission 91.49% of naked glass of comparing, the transmissivity of film C1 improves 5.56%.And the peak transmission of film C2 when wavelength is 474nm is 96.665%, improve 5.173% than the peak transmission of naked glass.As can be seen from graphic representation and peak value, film all has good anti-reflective effect.
Fig. 3 gives the water contact angle figure of film C1 and C2.Can find out, very good without heat treated thin-film hydrophobic, higher than 150 °, possess ultra-hydrophobicity.After 200 DEG C of thermal treatment, film contacts angle is reduced to 106 ° by 152 °, illustrates that thermal treatment obviously can reduce thin-film hydrophobic performance.Film, without thermal treatment, in industrial aspect, can reduce production cost greatly, and therefore film C1 is that one possesses very high performance advantage, cost benefit, the easy antireflection film of preparation technology.
(a), (b), (c) in Fig. 4, (d) the top plan view scanning electron microscopy of corresponding film C1 when 100nm, 200nm, 500nm and 1 μm respectively.As can be seen from series of drawing, the sparse porous of film surface, illustrates that film prepared by this experiment is vesicular structure, can explain about porous membrane specific refractory power low, the feature that transmissivity is high.Individual particle surface diameter size can be about tens nanometers as apparent from figure simultaneously, in the subsequent figure reduced successively as can be seen from magnification again, small-particle polycondensation becomes macrobead, and in uneven stacking reticulated structure, concavo-convex fluctuating is indefinite, makes thin film for certain surfaceness.
Fig. 5 is transmissivity and the water contact angle comparison diagram of film C1 before and after water droplet test, as can be seen from the figure, the transmissivity of test rear film C3 is all corresponding with water contact angle value to decline to some extent, but amplitude is all less, transmittance peak decline is only 0.312%, WCA decline and is only 2 °.Illustrate that water droplet is less on film performance impact, this is also because the better hydrophobicity of film makes the moisture resistance moisture-proof of film, embodies the good endurance quality of this film, has very high value to practical application.
Embodiment 2
A kind of super-hydrophobic high transmission SiO
2the preparation method of antireflection film, adopts following steps:
(1) adopt sol-gel method preparation to be mixed with the hybrid collosol of trimethylchlorosilane, specifically adopt following steps:
(1-1) join in dehydrated alcohol by ammoniacal liquor, the volume ratio of ammoniacal liquor and dehydrated alcohol is 1:30, stirs 20min obtain mixing solutions at the constant temperature lower magnetic forces of 40 DEG C;
(1-2) by tetraethoxy and trimethylethoxysilane mixing, the volume ratio of tetraethoxy and trimethylammonium oxyethyl group is 1:0.5, then dropwise join forming reactions solution in the mixing solutions of (1-1), in solution, the volumetric concentration of tetraethoxy is 3.08%.；
(1-3) reaction soln stirs 30h at 30 DEG C of lower magnetic forces, then at ambient temperature aging 4 days, prepares hybrid collosol;
(2) clean slide surface, the result of clean is to the most important concrete employing following steps of preparation high-performance antireflective film:
(2-1) slide glass is placed in deionized water for ultrasonic cleaning 20min;
(2-2) slide glass after cleaning is placed in acetone ultrasonic cleaning 10min;
(2-3) the slide glass deionized water rinsing 3min cleaned, fully removes acetone and the dust of slide surface;
(2-4) slide glass cleaned is placed in 50 DEG C of baking oven 3h, before Best-Effort request, again uses lens wiping paper wiped clean;
(3) speed with 2.5mm/s after processed slide glass floods 3s in hybrid collosol at the uniform velocity lifts out, and after plated film, slide glass is placed in room temperature environment seasoning, then is placed in 200 DEG C of oven drying 20min, obtains super-hydrophobic high transmission SiO
2antireflection film adopts Best-Effort request method, forms plated film, namely obtain super-hydrophobic high transmission SiO after drying on the surface of slide glass
2antireflection film.
Embodiment 3
A kind of super-hydrophobic high transmission SiO
2the preparation method of antireflection film, adopts following steps:
(1) adopt sol-gel method preparation to be mixed with the hybrid collosol of trimethylchlorosilane, specifically adopt following steps:
(1-1) join in dehydrated alcohol by ammoniacal liquor, the volume ratio of ammoniacal liquor and dehydrated alcohol is 1:50, stirs 5min obtain mixing solutions at the constant temperature lower magnetic forces of 60 DEG C;
(1-2) by tetraethoxy and trimethylethoxysilane mixing, the volume ratio of tetraethoxy and trimethylammonium oxyethyl group silicon is 1:1, then dropwise join forming reactions solution in the mixing solutions of (1-1), in solution, the volumetric concentration of tetraethoxy is 1.89%.；
(1-3) reaction soln stirs 15h at 40 DEG C of lower magnetic forces, then at ambient temperature aging 6 days, prepares hybrid collosol;
(2) clean slide surface, the result of clean is most important to preparation high-performance antireflective film, specifically adopts following steps:
(2-1) slide glass is placed in deionized water for ultrasonic cleaning 40min;
(2-2) slide glass after cleaning is placed in acetone ultrasonic cleaning 20min;
(2-3) the slide glass deionized water rinsing 8min cleaned, fully removes acetone and the dust of slide surface;
(2-4) slide glass cleaned is placed in 70 DEG C of baking oven 1h, before Best-Effort request, again uses lens wiping paper wiped clean;
(3) speed with 3mm/s after processed slide glass floods 8s in hybrid collosol at the uniform velocity lifts out, and after plated film, slide glass is placed in room temperature environment seasoning, then is placed in 200 DEG C of oven drying 40min, obtains super-hydrophobic high transmission SiO
2antireflection film.
For conventional SiO
2the problem that the thin transmissivity of anti-reflection is low, specific refractory power is high, proposes the catalysis of a kind of alkali one step and prepares porous low-refraction nanoscale SiO
2antireflective film, this porous structural film can reduce film refractive index greatly, thus improves the transmissivity of film, and anti-reflective effect is obvious.And for the feature of base catalysis film hydrophilic, mix certain proportion trimethylchlorosilane in preparation process, make film surface carry a large amount of hydrophobic grouping, pellicular water contact angle is higher than 150 °, and thin film is for ultra-hydrophobicity.Thus solve photovoltaic device easy difficult problem such as the moisture absorption, light transmission reduction in wet environment preferably.
Claims (9)
1. a super-hydrophobic high transmission SiO
2the preparation method of antireflection film, is characterized in that, the method adopts following steps:
(1) sol-gel method preparation is adopted to be mixed with the hybrid collosol of trimethylchlorosilane;
(2) slide surface is cleaned;
(3) adopt Best-Effort request method, form plated film on the surface of slide glass, after drying, namely obtain super-hydrophobic high transmission SiO
2antireflection film.
2. the super-hydrophobic high transmission SiO of one according to claim 1
2the preparation method of antireflection film, is characterized in that, step (1) specifically adopts following steps:
(1-1) join in dehydrated alcohol by ammoniacal liquor, constant temperature stirs and obtains mixing solutions;
(1-2) by tetraethoxy and trimethylethoxysilane mixing, forming reactions solution in the mixing solutions of (1-1) is then dropwise joined;
(1-3) reaction soln carries out aging at ambient temperature after stirring, and prepares hybrid collosol.
3. the super-hydrophobic high transmission SiO of one according to claim 2
2the preparation method of antireflection film, is characterized in that, in step (1-1), the volume ratio of ammoniacal liquor and dehydrated alcohol is 1:30-50, stirs 5-30min at the constant temperature lower magnetic force of 30-60 DEG C.
4. the super-hydrophobic high transmission SiO of one according to claim 2
2the preparation method of antireflection film, is characterized in that, in step (1-2), the volume ratio of tetraethoxy and trimethylammonium oxyethyl group silicon is 1:0.5-1, and in reaction soln, the volumetric concentration of tetraethoxy is 1.89%-3.08%.
5. the super-hydrophobic high transmission SiO of one according to claim 2
2the preparation method of antireflection film, is characterized in that, reaction soln stirs 15-30h at 30-40 DEG C of lower magnetic force in step (1-3), then aging 4-6 days at ambient temperature.
6. the super-hydrophobic high transmission SiO of one according to claim 1
2the preparation method of antireflection film, is characterized in that, step (2) specifically adopts following steps:
(2-1) slide glass is placed in deionized water for ultrasonic cleaning 20-40min;
(2-2) slide glass after cleaning is placed in acetone ultrasonic cleaning 10-20min;
(2-3) the slide glass deionized water rinsing 3-8min cleaned, fully removes acetone and the dust of slide surface;
(2-4) slide glass cleaned is placed in 50-70 DEG C of baking oven 1-3h, before Best-Effort request, again uses lens wiping paper wiped clean.
7. the super-hydrophobic high transmission SiO of one according to claim 1
2the preparation method of antireflection film, it is characterized in that, step (3) specifically adopts following steps: at the uniform velocity lift out after processed slide glass floods 3-8s in hybrid collosol, after plated film, slide glass is placed in room temperature environment seasoning, be placed in 200 DEG C of oven drying 20-40min again, obtain super-hydrophobic high transmission SiO
2antireflection film.
8. the super-hydrophobic high transmission SiO of one according to claim 7
2the preparation method of antireflection film, is characterized in that, described slide glass at the uniform velocity lifts out from hybrid collosol with the speed of 2.5-3mm/s.
9. the super-hydrophobic high transmission SiO that the method according to any one of claim 1-8 prepares
2antireflection film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510934882.3A CN105399340A (en) | 2015-12-14 | 2015-12-14 | Super-hydrophobic high-transmittance SiO2 anti-reflecting thin film and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510934882.3A CN105399340A (en) | 2015-12-14 | 2015-12-14 | Super-hydrophobic high-transmittance SiO2 anti-reflecting thin film and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105399340A true CN105399340A (en) | 2016-03-16 |
Family
ID=55465151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510934882.3A Pending CN105399340A (en) | 2015-12-14 | 2015-12-14 | Super-hydrophobic high-transmittance SiO2 anti-reflecting thin film and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105399340A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105826404A (en) * | 2016-03-25 | 2016-08-03 | 陕西煤业化工技术研究院有限责任公司 | Preparation method of doped polysiloxanes sol antireflection film based on interface modification |
| CN106966604A (en) * | 2017-04-21 | 2017-07-21 | 沧州天瑞星光热技术有限公司 | Nanometer thin film layer, filming equipment and film plating process for collector tube glass outer tube |
| CN107032359A (en) * | 2017-04-13 | 2017-08-11 | 宁波大学 | A kind of preparation method of silicon dioxide gel, the preparation method of photovoltaic glass |
| CN108914092A (en) * | 2018-07-25 | 2018-11-30 | 三峡大学 | A kind of iron hydroxide based superhydrophobic thin films and preparation method thereof |
| CN110564187A (en) * | 2019-09-03 | 2019-12-13 | 天津工业大学 | Anti-reflection fluorine-free super-hydrophobic self-cleaning nano film and preparation method thereof |
| CN111410429A (en) * | 2020-03-25 | 2020-07-14 | 安徽汇昌新材料有限公司 | Preparation method of colored foam glass with adjustable light reflection rate |
| CN111490017A (en) * | 2020-04-16 | 2020-08-04 | 电子科技大学 | Moisture-proof structure for optoelectronic device and preparation method thereof |
| CN112509985A (en) * | 2020-12-14 | 2021-03-16 | 电子科技大学 | Moisture-proof structure for optoelectronic device and preparation method thereof |
| CN115974421A (en) * | 2023-02-08 | 2023-04-18 | 青岛中邦新材料科技有限公司 | Super-hydrophobic and heat-stable silicon dioxide coating and preparation method thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101885586A (en) * | 2009-05-14 | 2010-11-17 | 中国科学院宁波材料技术与工程研究所 | Preparation method of photovoltaic glass surface antireflection film |
-
2015
- 2015-12-14 CN CN201510934882.3A patent/CN105399340A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101885586A (en) * | 2009-05-14 | 2010-11-17 | 中国科学院宁波材料技术与工程研究所 | Preparation method of photovoltaic glass surface antireflection film |
Non-Patent Citations (4)
| Title |
|---|
| SHEN JUN ET AL: "Sol-gel derived contamination resistant antireflective coatings", 《PROC. OF SPIE》 * |
| 任洪波等: "《气凝胶手册》", 31 December 2014, 中国原子能出版社 * |
| 晏良宏等: "持效疏水SiO2增透膜的制备和研究", 《激光技术》 * |
| 陈烈意等: "疏水性SiO2增透膜的制备与表征", 《广东化工》 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105826404A (en) * | 2016-03-25 | 2016-08-03 | 陕西煤业化工技术研究院有限责任公司 | Preparation method of doped polysiloxanes sol antireflection film based on interface modification |
| CN105826404B (en) * | 2016-03-25 | 2017-11-28 | 陕西煤业化工技术研究院有限责任公司 | A kind of preparation method of the doped poly silicon oxygen alkane colloidal sol antireflective coating based on modifying interface |
| CN107032359A (en) * | 2017-04-13 | 2017-08-11 | 宁波大学 | A kind of preparation method of silicon dioxide gel, the preparation method of photovoltaic glass |
| CN106966604A (en) * | 2017-04-21 | 2017-07-21 | 沧州天瑞星光热技术有限公司 | Nanometer thin film layer, filming equipment and film plating process for collector tube glass outer tube |
| CN108914092A (en) * | 2018-07-25 | 2018-11-30 | 三峡大学 | A kind of iron hydroxide based superhydrophobic thin films and preparation method thereof |
| CN110564187A (en) * | 2019-09-03 | 2019-12-13 | 天津工业大学 | Anti-reflection fluorine-free super-hydrophobic self-cleaning nano film and preparation method thereof |
| CN111410429A (en) * | 2020-03-25 | 2020-07-14 | 安徽汇昌新材料有限公司 | Preparation method of colored foam glass with adjustable light reflection rate |
| CN111490017A (en) * | 2020-04-16 | 2020-08-04 | 电子科技大学 | Moisture-proof structure for optoelectronic device and preparation method thereof |
| CN112509985A (en) * | 2020-12-14 | 2021-03-16 | 电子科技大学 | Moisture-proof structure for optoelectronic device and preparation method thereof |
| CN115974421A (en) * | 2023-02-08 | 2023-04-18 | 青岛中邦新材料科技有限公司 | Super-hydrophobic and heat-stable silicon dioxide coating and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105399340A (en) | Super-hydrophobic high-transmittance SiO2 anti-reflecting thin film and preparation method thereof | |
| Sarkın et al. | A review of anti-reflection and self-cleaning coatings on photovoltaic panels | |
| CN108623185B (en) | Double-layer composite SiO2Preparation method of antireflection film | |
| CN110002767B (en) | Preparation method of high-transmittance hydrophobic coating film for photovoltaic glass | |
| EP2197804B1 (en) | Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same | |
| CN109665719B (en) | Self-cleaning high anti-reflection coating solution, preparation method thereof and self-cleaning high anti-reflection solar glass | |
| Xin et al. | A novel route to prepare weather resistant, durable antireflective films for solar glass | |
| CN102234183A (en) | Anti-reflection coating and super-hydrophobic self-cleaning anti-reflection coating and preparation method thereof | |
| CN109206017B (en) | Graphene-doped glass coating liquid and preparation method thereof | |
| CN102702806A (en) | Preparation and application of self-cleaning synergistic solar paint | |
| CN102584024A (en) | Preparation method of efficient increased-transmission and antireflection glass | |
| CN103434215B (en) | Super-hydrophilic anti-reflection coated glass and preparation method thereof | |
| CN109651863B (en) | Solar glass antireflection coating with self-cleaning function, preparation method thereof and self-cleaning high-antireflection solar glass | |
| CN103524049A (en) | Preparation method of monolayer SiO2 antireflection film | |
| CN104362208B (en) | There is hydrophobic solar cell glass with spectral selection and preparation method thereof | |
| CN101570401B (en) | Method for preparing self-cleaning glass | |
| KR101013433B1 (en) | Solar-cell module with improved light transmission, ant-dirt and self-cleaning and building intergrated photovoltaic system using the same | |
| CN103059617B (en) | Preparation method for nanometer anti-reflection self-cleaning coating solution | |
| CN103524048A (en) | Preparation method of multi-layer SiO2 inorganic anti-reflection film | |
| CN1817812A (en) | Production of self-cleaning glass | |
| Xin et al. | Effects of polysiloxane doping on transmittance and durability of sol–gel derived antireflective coatings for photovoltaic glass | |
| CN202523741U (en) | Antireflection glass used for solar battery packaging | |
| CN110606670A (en) | Preparation method of broad-spectrum anti-reflection super-hydrophobic photovoltaic glass | |
| CN112661415B (en) | Antireflection film layer for photovoltaic glass, preparation method of antireflection film layer and solar cell module | |
| CN201549516U (en) | Solar battery component coated cover board glass |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160316 |
|
| RJ01 | Rejection of invention patent application after publication |