CN114267744B - Double-glass photovoltaic cell, preparation method and photovoltaic module - Google Patents
Double-glass photovoltaic cell, preparation method and photovoltaic module Download PDFInfo
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- CN114267744B CN114267744B CN202111643306.5A CN202111643306A CN114267744B CN 114267744 B CN114267744 B CN 114267744B CN 202111643306 A CN202111643306 A CN 202111643306A CN 114267744 B CN114267744 B CN 114267744B
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention aims to disclose a double-glass photovoltaic cell, a preparation method and a photovoltaic module, wherein the double-glass photovoltaic cell comprises a first silicon wafer and a second silicon wafer, the illumination surface of the first silicon wafer and the non-illumination surface of the second silicon wafer are in the same direction, the first silicon wafer and the second silicon wafer are distributed in a staggered manner, the illumination surface of the first silicon wafer is compounded with a first hollowed-out copper foil composite material to be used as an electrode, the illumination surface of the second silicon wafer is compounded with a second hollowed-out copper foil composite material to be used as an electrode, and the first hollowed-out copper foil composite material and the second hollowed-out copper foil composite material are both formed by compounding polypropylene films and hollowed-out copper foils, and the invention has the beneficial effects that: in the double-glass photovoltaic cell, a hollowed copper foil is used for replacing the existing silver paste grid line to be used as a light-emitting surface electrode of the photovoltaic cell, and the resistivity of copper is 1.75 x 10 ‑8 Omega.m, can reduce the electrode material cost of the single-glass photovoltaic cell, and can also keep the photoelectric performance of the double-glass photovoltaic cell within an acceptable range.
Description
Technical Field
The invention relates to the technical field of photovoltaic cells, in particular to a double-glass photovoltaic cell, a preparation method and a photovoltaic module.
Background
In photovoltaic cell technical field, current dual glass photovoltaic module includes illumination face photovoltaic glass, illumination face EVA glued membrane, battery piece, non-illumination face EVA glued membrane and non-illumination face photovoltaic glass or transparent backplate etc. and the illumination face of battery piece is provided with the front electrode, and non-illumination face is provided with the back electrode, under the general condition, no matter be front electrode or back electrode, its electrode grid line's main material is silver thick liquid. Because silver paste is expensive, the non-silicon cost of silver paste in the battery plate is up to 33 percent according to statistics. Silver paste plays an important role in conducting electricity in the battery piece as an electrode material, and the performance of the silver paste is directly related to the photoelectric performance of the photovoltaic battery.
In addition, the illumination surface of the existing double-glass component battery piece is in the same direction, the non-illumination surface of the battery piece is in the other direction, power generation is usually mainly performed through the illumination surface, the utilization rate of the non-illumination surface is insufficient, so that the light conversion efficiency of the double-glass component is not fully exerted, and particularly, as HIT (Heterojunction with Intrinsic Thinfilm) battery technology is gradually mature, how to utilize the illumination surface and the non-illumination surface of the battery piece is well, and meanwhile, the material cost of an electrode is reduced, so that the problem in the industry is solved.
In the existing photovoltaic modules, silver paste is used as electrode material because silver has good conductivity and resistivity of 1.65×10 -8 Omega.m, lower than the resistivity of copper and aluminum. However, in view of the fact that the cost is too high and the silver resources are relatively short when the silver paste is used as an electrode material, how to develop a photovoltaic cell with copper as the electrode material, and the photovoltaic cell is applied to a double-glass assembly, the requirement of the photovoltaic cell on the electrode conductivity is met as much as possible while the cost is reduced, so that the photoelectric property of the photovoltaic cell is met, and the light conversion efficiency is improved.
Disclosure of Invention
The invention aims to disclose a double-glass photovoltaic cell, a preparation method and a photovoltaic module, and develops the double-glass photovoltaic cell with copper as an electrode material, so that the cost of the electrode material is reduced, the requirement of the cell on the electrode conductivity is met as much as possible, and the light conversion efficiency is improved.
In order to achieve the first object of the invention, the invention provides a double-glass photovoltaic cell, which comprises a first silicon wafer and a second silicon wafer, wherein the illumination surface of the first silicon wafer and the non-illumination surface of the second silicon wafer are in the same direction, the first silicon wafer and the second silicon wafer are distributed in a staggered manner, the illumination surface of the first silicon wafer is compounded with a first hollowed-out copper foil composite material to serve as an electrode, the illumination surface of the second silicon wafer is compounded with a second hollowed-out copper foil composite material to serve as an electrode, and the first hollowed-out copper foil composite material and the second hollowed-out copper foil composite material are both formed by compounding a polypropylene film and hollowed-out copper foil.
Preferably, the non-illuminated surface electrode of the first silicon wafer is a third hollowed-out copper foil composite material or a welding strip, the non-illuminated surface electrode of the second silicon wafer is a fourth hollowed-out copper foil composite material or a welding strip, and the third hollowed-out copper foil composite material and the fourth hollowed-out copper foil composite material are formed by compounding a polypropylene film and a hollowed-out copper foil.
Preferably, the first hollowed-out copper foil composite material and the second hollowed-out copper foil composite material are respectively compounded on the illuminated surface of the first silicon wafer and the illuminated surface of the second silicon wafer through a hot pressing process.
Preferably, the third hollowed-out copper foil composite material and the fourth hollowed-out copper foil composite material are respectively compounded on the non-illumination surface of the first silicon wafer and the non-illumination surface of the second silicon wafer through a hot pressing process.
Preferably, the thickness of the hollowed-out copper foil is 25-100 μm.
Preferably, the hollowed-out copper foil comprises a transverse copper strip, a longitudinal copper strip and a hollowed-out part, wherein the hollowed-out part is rectangular, and the transverse copper strip and the longitudinal copper strip are in cross connection.
In order to achieve the second object, the invention provides a preparation method of a double-glass photovoltaic cell, which comprises the following steps:
respectively compounding a first copper foil and a second copper foil on a first surface and a second surface of a polypropylene film to form a compound copper foil, wherein the first copper foil and the second copper foil are staggered;
forming a hollowed-out structure on the surface of the copper foil through a double-sided etching process to form a first hollowed-out copper foil composite material and a second hollowed-out copper foil composite material;
preparing a first silicon wafer and a second silicon wafer;
and thermally pressing and compounding the light-irradiated surface of the first silicon wafer to the first hollowed-out copper foil composite material, and thermally pressing and compounding the light-irradiated surface of the second silicon wafer to the second hollowed-out copper foil composite material.
Preferably, the method further comprises the following steps:
compounding the hollowed-out copper foil composite material with a PET film, wherein the PET film is used as a supporting layer;
and (3) after tearing off the PET film, hot-pressing the hollowed-out copper foil composite material on the illumination surface of the silicon wafer.
Preferably, the roughness of the composite surface of the PET film and the polypropylene film is 0.3-0.5 μm.
In order to achieve the third object, the invention provides a double-glass photovoltaic module, which comprises a frame component, first illumination surface glass, second illumination surface glass and the double-glass photovoltaic cell.
Compared with the prior art, the invention has the beneficial effects that:
(1) In the double-glass photovoltaic cell, a hollowed copper foil is used for replacing the existing silver paste grid line to be used as a light-emitting surface electrode of the photovoltaic cell, and the resistivity of copper is 1.75 x 10 -8 Omega.m, can reduce the electrode material cost of the single-glass photovoltaic cell, at the same time, can also keep the photoelectric performance of the double-glass photovoltaic cell within an acceptable range;
(2) The method comprises the steps of carrying out etching process treatment on a composite material of a copper foil and a polypropylene film to enable the copper foil to have a hollowed-out structure, compounding the etched composite material of the copper foil and the polypropylene film on a battery piece illumination surface through a hot pressing process, and carrying out hot melting softening on the film under hot pressing, wherein the thickness of the copper foil is smaller than or equal to that of the film, so that the film is adhered to the surface of the battery piece through the hollowed-out part of the copper foil;
(3) The double-glass photovoltaic cell comprises a first silicon wafer and a second silicon wafer, and the first silicon wafer and the second silicon wafer are arranged on two sides of the polypropylene film in a staggered manner, so that the double-glass photovoltaic cell realizes the identity of two sides, namely the power generation efficiency is the same no matter the side of the cell faces the sun; that is, when any one of the two-glass photovoltaic cell is facing the sun, the front side of one silicon wafer and the back side of the other silicon wafer are facing the sun, and the illumination direction changes of the morning and afternoon are considered from the illumination of the whole day.
Drawings
FIG. 1 is a schematic view of a composite structure of a polypropylene film and a copper foil according to the present invention;
FIG. 2 is a schematic diagram of a dual-glass photovoltaic cell structure according to the present invention;
FIG. 3 is a schematic diagram of a dual-glass photovoltaic cell according to an embodiment of the present invention;
fig. 4 is a schematic structural diagram of a dual-glass photovoltaic cell according to an embodiment of the present invention;
FIG. 5 is a schematic view of the structure of the hollowed-out copper foil of the present invention;
fig. 6 is a flow chart of a method for preparing a double-glass photovoltaic cell.
1, a first silicon wafer; 11. a first silicon wafer illumination surface; 12. a first silicon wafer non-illumination surface; 2. a second silicon wafer; 21. a second silicon wafer illumination surface; 22. a second silicon wafer non-illumination surface; 3. a polypropylene film; 31. a first side of the polypropylene film; 32. a second side of the polypropylene film; 4. hollowed copper foil; 41. a transverse copper strip; 42. longitudinal copper strips; 43. a hollowed-out part; 5. welding a belt; 6. hollowed copper foil; 7. a polypropylene film; 8. hollowed copper foil; 9. a polypropylene film.
Detailed Description
The present invention will be described in detail below with reference to the embodiments shown in the drawings, but it should be understood that the embodiments are not limited to the present invention, and functional, method, or structural equivalents and alternatives according to the embodiments are within the scope of protection of the present invention by those skilled in the art.
In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention.
The following describes embodiments of the present invention.
Embodiment one:
the embodiment discloses a double-glass photovoltaic cell, see fig. 2, including first silicon chip 1 and second silicon chip 2, the illumination face 11 of first silicon chip 1 with the non-illumination face 22 of second silicon chip 2 is the same direction, first silicon chip 1 with second silicon chip 2 staggers the distribution, the illumination face 11 of first silicon chip 1 is compound first fretwork copper foil combined material and is regarded as the electrode, the illumination face 21 of second silicon chip 2 is compound second fretwork copper foil combined material and is regarded as the electrode, first fretwork copper foil combined material and second fretwork copper foil combined material are all by polypropylene film 3 and fretwork copper foil 4 complex and form. Specifically, referring to fig. 1, a first hollowed copper foil 4 is compounded on a first surface 31 of a polypropylene film 3 to obtain a first hollowed copper foil composite material, a second hollowed copper foil composite material is obtained by compounding the hollowed copper foil 4 on a second surface 32 of the polypropylene film 3, the first hollowed copper foil composite material and the second hollowed copper foil composite material are staggered, that is, the first hollowed copper foil composite material and the second hollowed copper foil composite material are not overlapped, and are distributed on two surfaces of the polypropylene film 3, the first silicon wafer 1 is compounded on the first hollowed copper foil composite material, the first hollowed copper foil composite material is used as an illumination surface electrode of the first silicon wafer 1, the second silicon wafer 2 is compounded on the second hollowed copper foil composite material, the second hollowed copper foil composite material is used as an illumination surface electrode of the second silicon wafer 2, so that the illumination surface 11 of the first silicon wafer 1 and the non-illumination surface 22 of the second silicon wafer 2 are in the same direction, the first silicon wafer 1 and the second silicon wafer 2 are staggered, that no overlapping is arranged between the first silicon wafer 1 and the second silicon wafer 2, and are not interfered, and the first silicon wafer 1 and the second silicon wafer 2 are distributed on two surfaces of the polypropylene film, so that the two surfaces of the polypropylene film 3 are not overlapped, and the two surfaces of the second silicon wafer are opposite to each other, and the two surfaces of the two silicon wafers are opposite to each other, and the two surfaces of the solar cell and the solar cell is beneficial to realize.
In addition, the dual-glass photovoltaic cell of this embodiment uses hollowed copper foil instead of the existing silver paste grid line as the light-emitting surface electrode of the photovoltaic cell, and the resistivity of copper is 1.75×10 -8 Omega.m, can reduce the electrode material cost of the single-glass photovoltaic cell, and simultaneously can keep the photoelectric performance of the double-glass photovoltaic cellWithin an acceptable range.
It should be further noted that, referring to fig. 4, the electrode on the non-illuminated surface 12 of the first silicon wafer 1 is a third hollowed-out copper foil composite material, the electrode on the non-illuminated surface 22 of the second silicon wafer 2 is a fourth hollowed-out copper foil composite material, and both the third hollowed-out copper foil composite material and the fourth hollowed-out copper foil composite material are formed by compounding polypropylene films and hollowed-out copper foils. Specifically, the specific structures of the third hollowed copper foil composite material and the fourth hollowed copper foil composite material are the same as those of the first hollowed copper foil composite material, the third hollowed copper foil composite material consists of a polypropylene film 7 and a hollowed copper foil 6, the fourth hollowed copper foil composite material consists of a polypropylene film 9 and a hollowed copper foil 8, through the design of the embodiment, the two surface electrodes of the double-glass photovoltaic cell are all copper electrodes, on one hand, silver paste grid lines are further replaced to reduce material cost, on the other hand, the fact that the power generation of the illumination surface and the non-illumination surface can be realized after photovoltaic glass is added is realized, no matter which surface faces sunlight, the power generation efficiency is the same, and the non-illumination surface is helped to receive reflected light, or one surface faces sunlight mainly upwards in the morning and the other surface faces sunlight mainly downwards in the afternoon.
It should be further noted that this design is suitable for the HIT (Heterojunction with Intrinsic Thinfilm) battery technology that is becoming mature, and simultaneously, through copper electrode replacement current silver grid line electrode, has reduced electrode cost by a wide margin, has utilized the photoconversion efficiency of battery piece to the maximize.
The first hollowed-out copper foil composite material, the second hollowed-out copper foil composite material, the third hollowed-out copper foil composite material and the fourth hollowed-out copper foil composite material are all compounded on the surface of a silicon wafer through a hot-pressing process, in order to enable the hollowed-out copper foil composite material to be hot-pressed on the surface of the silicon wafer, the polypropylene film needs to have a certain thickness, and the thickness of the polypropylene film is greater than or equal to that of the hollowed-out copper foil, specifically, referring to fig. 1, the thickness of the polypropylene film is 30-100 mu m, the thickness of the hollowed-out copper foil is 25-100 mu m, fig. 1 is a schematic diagram of a state that the polypropylene film and the hollowed-out copper foil are compounded but not hot-pressed, the hollowed-out copper foil is compounded on the surface of the polypropylene film, but after the hollowed-copper foil composite material is hot-pressed on the surface of the silicon wafer, specifically, referring to fig. 2, the polypropylene film is softened under the action of a certain temperature and is adhered with the surface of the silicon wafer, so that the hollowed-out copper foil composite material and the surface of the silicon wafer are compounded, ohmic connection is formed between the silicon wafer and the hollowed-out copper foil is avoided, and the electrode of the hollowed-out copper foil is an electrode of a light surface electrode, and the light surface electrode is simultaneously, and the light surface electrode 2 is wrapped by the polypropylene film, and the surface electrode is oxidized; the hollowed-out copper foil composite material is hot-pressed on the surface of the silicon wafer, and is also suitable for compositing the first hollowed-out copper foil composite material, the second hollowed-out copper foil composite material, the third hollowed-out copper foil composite material, the fourth hollowed-out copper foil composite material and the surface of the silicon wafer.
It should be further noted that, in the process of hot-pressing the composite material of the hollowed copper foil and the polypropylene film on the surface of the battery piece, the hot-pressing can be either rolling or flat pressing; referring to fig. 5, the hollowed copper foil 4 includes a transverse copper strip 41, a longitudinal copper strip 42 and a hollowed portion 43, the hollowed portion 43 is rectangular or polygonal, the transverse copper strip 41 and the longitudinal copper strip 42 are cross-connected, and the transverse copper strip 41 and the longitudinal copper strip 42 serve as grid lines to collect and guide out current on the surface of the silicon wafer, so that a certain current load is required to be met for the widths of the transverse copper strip 41 and the longitudinal copper strip 42, specifically, the width of the transverse copper strip is 30 μm-100 μm, and the width of the longitudinal copper strip is 30 μm-100 μm.
Embodiment two:
the embodiment discloses a dual-glass photovoltaic cell, which is different from the first embodiment in that, referring to fig. 3, the electrode of the non-illumination surface of the first silicon wafer 1 adopts a welding belt 5, the electrode of the non-illumination surface of the second silicon wafer 2 adopts a welding belt 5, the non-illumination surface of the first silicon wafer 1, the EVA film and the transparent back plate are combined to form a photovoltaic module, the non-illumination surface of the second silicon wafer 2, the EVA film and the transparent back plate are combined to form the photovoltaic module, the second embodiment realizes that the silver grid electrode is replaced by the copper electrode on the illumination surface, the cost is reduced, and meanwhile, the back surface adopts the transparent back plate, so that both sides of the cell can receive sunlight, and illumination is fully utilized.
Embodiment III:
the embodiment discloses a preparation method of a double-glass photovoltaic cell, which is shown in fig. 6, and comprises the following steps: respectively compounding a first copper foil and a second copper foil on a first surface and a second surface of a polypropylene film to form a compound copper foil, wherein the first copper foil and the second copper foil are staggered; forming a hollowed-out structure on the surface of the copper foil through a double-sided etching process to form a first hollowed-out copper foil composite material and a second hollowed-out copper foil composite material, wherein the specific etching process comprises the steps of film pasting, exposure, development, etching, film stripping, acid washing and the like on the surface of the composite copper foil; preparing a first silicon wafer and a second silicon wafer; and thermally pressing and compounding the light-irradiated surface of the first silicon wafer to the first hollowed-out copper foil composite material, and thermally pressing and compounding the light-irradiated surface of the second silicon wafer to the second hollowed-out copper foil composite material.
Specifically, referring to fig. 1 and fig. 2, a first copper foil and a second copper foil are respectively compounded on a first surface and a second surface of the same polypropylene film, the first copper foil and the second copper foil are staggered to form a composite copper foil, and after the composite copper foil is formed, double-sided etching is performed on the composite copper foil to form a hollowed-out structure on the surface of the copper foil, so that a first hollowed-out copper foil composite material and a second hollowed-out copper foil composite material are formed; and thermally pressing and compounding the illuminated surface of the first silicon wafer on the first hollowed-out copper foil composite material, and thermally pressing and compounding the illuminated surface of the second silicon wafer on the second hollowed-out copper foil composite material to form the double-glass photovoltaic cell.
It should be further noted that, referring to fig. 1, the thickness of the polypropylene film is 30 μm-100 μm, the thickness of the hollowed-out copper foil is 25 μm-100 μm, fig. 1 is a schematic diagram of a state of the polypropylene film and the hollowed-out copper foil after being compounded but not hot-pressed, and it can be seen that the hollowed-out copper foil is compounded on the surface of the polypropylene film, but after the hollowed-out copper foil composite material is hot-pressed on the surface of the silicon wafer, referring specifically to fig. 2, the polypropylene film is softened under the action of a certain temperature and is adhered to the surface of the silicon wafer through the hollowed-out part of the hollowed-out copper foil, thereby realizing the compounding of the hollowed-out copper foil composite material and the surface of the silicon wafer, forming ohmic connection between the silicon wafer and the hollowed-out copper foil, the hollowed-out copper foil becomes a light surface electrode, and meanwhile, the light surface electrode 2 is wrapped by the polypropylene film, and the light surface electrode is prevented from being oxidized; the hollowed-out copper foil composite material is hot-pressed on the surface of the silicon wafer, and is also suitable for compositing the first hollowed-out copper foil composite material, the second hollowed-out copper foil composite material and the surface of the silicon wafer.
It should be further noted that, in the process of hot-pressing the composite material of the hollowed copper foil and the polypropylene film on the surface of the battery piece, the hot-pressing can be either rolling or flat pressing; referring to fig. 5, the hollowed copper foil 4 includes a transverse copper strip 41, a longitudinal copper strip 42 and a hollowed portion 43, the hollowed portion 43 is rectangular or polygonal, the transverse copper strip 41 and the longitudinal copper strip 42 are cross-connected, and the transverse copper strip 41 and the longitudinal copper strip 42 serve as grid lines to collect and guide out current on the surface of the silicon wafer, so that a certain current load is required to be met for the widths of the transverse copper strip 41 and the longitudinal copper strip 42, specifically, the width of the transverse copper strip is 30 μm-100 μm, and the width of the longitudinal copper strip is 30 μm-100 μm.
The polypropylene film takes a PET film with the thickness of 50-75 mu m as a supporting film to prevent the curling of the composite material, and when the composite material is specifically used, the PET film needs to be torn off and then the composite material and a silicon wafer are rapidly subjected to hot pressing; in order to increase the friction force between the PET film and the film, the PET film with the surface roughness of 0.3-0.5 μm is adopted, and the binding force between the PET film and the film is increased.
Compared with the prior art, the third embodiment has the beneficial effects that:
(1) In the double-glass photovoltaic cell, a hollowed copper foil is used for replacing the existing silver paste grid line to be used as a light-emitting surface electrode of the photovoltaic cell, and the resistivity of copper is 1.75 x 10 -8 Omega.m, can reduce the electrode material cost of the single-glass photovoltaic cell, at the same time, can also keep the photoelectric performance of the double-glass photovoltaic cell within an acceptable range;
(2) The method comprises the steps of carrying out etching process treatment on a composite material of a copper foil and a polypropylene film to enable the copper foil to have a hollowed-out structure, compounding the etched composite material of the copper foil and the polypropylene film on a battery piece illumination surface through a hot pressing process, and carrying out hot melting softening on the film under hot pressing, wherein the thickness of the copper foil is smaller than or equal to that of the film, so that the film is adhered to the surface of the battery piece through the hollowed-out part of the copper foil;
(3) The double-glass photovoltaic cell comprises a first silicon wafer and a second silicon wafer, and the first silicon wafer and the second silicon wafer are arranged on two sides of the polypropylene film in a staggered manner, so that the double-glass photovoltaic cell realizes the identity of two sides, namely the power generation efficiency is the same no matter the side of the cell faces the sun.
Example IV
The embodiment discloses a double-glass photovoltaic module, which comprises a frame component, first illumination surface glass, second illumination surface glass and the double-glass photovoltaic cell in the first embodiment. Specifically, the dual-glass photovoltaic module of the embodiment comprises first illumination glass surface, dual-glass photovoltaic cell and second illumination glass surface, wherein the first illumination glass surface covers a first silicon wafer, the second illumination glass surface covers a second silicon wafer, the illumination surfaces of the first silicon wafer and the second silicon wafer adopt hollowed copper foil to replace the existing silver paste grid line, the effect of collecting and leading out current on the surface of the silicon wafer is achieved, on one hand, the material cost of an electrode can be reduced, and in addition, the photoelectric performance of the single-glass photovoltaic cell can be kept within an acceptable range.
Some possible examples of this embodiment are listed below, see in particular table 1.
TABLE 1 hollowed-out copper foil and film performance parameters
Referring to fig. 5, the transverse copper strip 41 and the longitudinal copper strip 42 serve as grid lines to collect and guide out the current on the surface of the silicon wafer, so that the widths of the transverse copper strip 41 and the longitudinal copper strip 42 meet a certain current load, and in a preferred embodiment, the widths of the transverse copper strip 41 and the longitudinal copper strip 42 can be selectively reduced under the condition that the copper foil is thicker, for example, the performance parameters of hollowed-out copper foil and film with the serial number 6; in the case of thinner copper foil, the widths of the transverse copper strips 41 and the longitudinal copper strips 42 may be optionally increased, such as the hollowed-out copper foil of number 1 and the performance parameters of the film.
The technical solutions of the dual-glass photovoltaic module disclosed in this embodiment, which have the same parts as those of the first, second and third embodiments, will be described in the first, second and third embodiments, and will not be described in detail herein.
Claims (7)
1. The double-glass photovoltaic cell is characterized by comprising a first silicon wafer and a second silicon wafer, wherein the illumination surface of the first silicon wafer and the non-illumination surface of the second silicon wafer are in the same direction, the first silicon wafer and the second silicon wafer are distributed in a staggered manner, the illumination surface of the first silicon wafer is compounded with a first hollowed-out copper foil composite material to be used as an electrode, the illumination surface of the second silicon wafer is compounded with a second hollowed-out copper foil composite material to be used as an electrode, and the first hollowed-out copper foil composite material and the second hollowed-out copper foil composite material are both formed by compounding a polypropylene film and a hollowed-out copper foil, and the thickness of the polypropylene film is more than or equal to that of the hollowed-out copper foil;
the hollowed copper foil comprises a transverse copper strip, a longitudinal copper strip and a hollowed part, wherein the hollowed part is rectangular, the transverse copper strip and the longitudinal copper strip are in cross connection, the width of the transverse copper strip is 60-100 mu m, and the width of the longitudinal copper strip is 60-100 mu m;
compounding the hollowed-out copper foil composite material with a PET film, wherein the PET film is used as a supporting layer;
after tearing off the PET film, hot-pressing the hollowed-out copper foil composite material on the illumination surface of the silicon wafer;
the polypropylene film takes a PET film with the thickness of 50-75 mu m as a supporting film so as to prevent the curling of the composite material;
the roughness of the composite surface of the PET film and the polypropylene film is 0.3-0.5 mu m;
and compounding the etched composite material of the hollowed-out copper foil and the polypropylene film on the battery piece illumination surface through a hot-pressing process, and carrying out hot-melting softening on the polypropylene film under hot pressing, wherein the polypropylene film is adhered to the surface of the battery piece through the hollowed-out part of the hollowed-out copper foil.
2. The dual-glass photovoltaic cell of claim 1, wherein the non-illuminated side electrode of the first silicon wafer is a third hollowed-out copper foil composite or solder strip, the non-illuminated side electrode of the second silicon wafer is a fourth hollowed-out copper foil composite or solder strip, and the third hollowed-out copper foil composite and the fourth hollowed-out copper foil composite are both formed by compounding a polypropylene film and a hollowed-out copper foil.
3. The dual-glass photovoltaic cell of claim 1, wherein the first hollowed-out copper foil composite material and the second hollowed-out copper foil composite material are respectively compounded on the illuminated surface of the first silicon wafer and the illuminated surface of the second silicon wafer through a hot pressing process.
4. The dual-glass photovoltaic cell of claim 2, wherein the third hollowed-out copper foil composite material and the fourth hollowed-out copper foil composite material are respectively compounded on the non-illuminated surface of the first silicon wafer and the non-illuminated surface of the second silicon wafer through a hot pressing process.
5. The dual-glass photovoltaic cell of any of claims 1-4, wherein the hollowed-out copper foil has a thickness of 25 μm to 100 μm.
6. The preparation method of the double-glass photovoltaic cell slice is characterized by comprising the following steps of:
respectively compounding a first copper foil and a second copper foil on a first surface and a second surface of a polypropylene film to form a compound copper foil, wherein the first copper foil and the second copper foil are staggered;
forming a hollowed-out structure on the surface of the copper foil through a double-sided etching process to form a first hollowed-out copper foil composite material and a second hollowed-out copper foil composite material;
preparing a first silicon wafer and a second silicon wafer;
thermally pressing and compounding the light-irradiated surface of the first silicon wafer to the first hollowed-out copper foil composite material, and thermally pressing and compounding the light-irradiated surface of the second silicon wafer to the second hollowed-out copper foil composite material;
the method also comprises the following steps:
compounding the hollowed-out copper foil composite material with a PET film, wherein the PET film is used as a supporting layer;
after tearing off the PET film, hot-pressing the hollowed-out copper foil composite material on the illumination surface of the silicon wafer;
the polypropylene film takes a PET film with the thickness of 50-75 mu m as a supporting film so as to prevent the curling of the composite material; the roughness of the composite surface of the PET film and the polypropylene film is 0.3-0.5 mu m;
and compounding the etched composite material of the hollowed-out copper foil and the polypropylene film on the battery piece illumination surface through a hot-pressing process, and carrying out hot-melting softening on the polypropylene film under hot pressing, wherein the polypropylene film is adhered to the surface of the battery piece through the hollowed-out part of the hollowed-out copper foil.
7. The double-glass photovoltaic module is characterized by comprising a frame component, first illumination surface glass, second illumination surface glass and the double-glass photovoltaic cell slice as claimed in any one of claims 1-5.
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