CN114252014A - 一种光掩膜基板标记尺寸测试***及方法 - Google Patents
一种光掩膜基板标记尺寸测试***及方法 Download PDFInfo
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- CN114252014A CN114252014A CN202111596532.2A CN202111596532A CN114252014A CN 114252014 A CN114252014 A CN 114252014A CN 202111596532 A CN202111596532 A CN 202111596532A CN 114252014 A CN114252014 A CN 114252014A
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- 238000000034 method Methods 0.000 title claims abstract description 47
- 238000012360 testing method Methods 0.000 title claims abstract description 33
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
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CN202111596532.2A CN114252014A (zh) | 2021-12-24 | 2021-12-24 | 一种光掩膜基板标记尺寸测试***及方法 |
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CN202111596532.2A CN114252014A (zh) | 2021-12-24 | 2021-12-24 | 一种光掩膜基板标记尺寸测试***及方法 |
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CN114252014A true CN114252014A (zh) | 2022-03-29 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115096222A (zh) * | 2022-08-24 | 2022-09-23 | 中科卓芯半导体科技(苏州)有限公司 | 一种用于光掩膜基版的平面度检测方法及*** |
WO2024045204A1 (zh) * | 2022-08-29 | 2024-03-07 | 长鑫存储技术有限公司 | 光罩生产监控点定位方法、装置与电子设备 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1690698A (zh) * | 2004-04-23 | 2005-11-02 | 大日本网目版制造株式会社 | 光学式外观检查方法以及光学式外观检查装置 |
CN101268420A (zh) * | 2005-10-25 | 2008-09-17 | 株式会社V技术 | 曝光装置 |
CN102253569A (zh) * | 2011-01-17 | 2011-11-23 | 深圳市保千里电子有限公司 | 一种摄像机聚焦的方法及装置 |
CN103858426A (zh) * | 2010-07-23 | 2014-06-11 | 泽伊塔仪器科技(上海)有限公司 | 测量图形化基板的3d显微镜和方法 |
CN108227402A (zh) * | 2017-12-29 | 2018-06-29 | 信利(惠州)智能显示有限公司 | 一种掩膜板曝光平台及掩膜板的调整方法 |
-
2021
- 2021-12-24 CN CN202111596532.2A patent/CN114252014A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1690698A (zh) * | 2004-04-23 | 2005-11-02 | 大日本网目版制造株式会社 | 光学式外观检查方法以及光学式外观检查装置 |
CN101268420A (zh) * | 2005-10-25 | 2008-09-17 | 株式会社V技术 | 曝光装置 |
CN103858426A (zh) * | 2010-07-23 | 2014-06-11 | 泽伊塔仪器科技(上海)有限公司 | 测量图形化基板的3d显微镜和方法 |
CN102253569A (zh) * | 2011-01-17 | 2011-11-23 | 深圳市保千里电子有限公司 | 一种摄像机聚焦的方法及装置 |
CN108227402A (zh) * | 2017-12-29 | 2018-06-29 | 信利(惠州)智能显示有限公司 | 一种掩膜板曝光平台及掩膜板的调整方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115096222A (zh) * | 2022-08-24 | 2022-09-23 | 中科卓芯半导体科技(苏州)有限公司 | 一种用于光掩膜基版的平面度检测方法及*** |
WO2024045204A1 (zh) * | 2022-08-29 | 2024-03-07 | 长鑫存储技术有限公司 | 光罩生产监控点定位方法、装置与电子设备 |
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