CN114217425B - Multiplying power internal adjusting lens for photoetching machine - Google Patents
Multiplying power internal adjusting lens for photoetching machine Download PDFInfo
- Publication number
- CN114217425B CN114217425B CN202111575713.7A CN202111575713A CN114217425B CN 114217425 B CN114217425 B CN 114217425B CN 202111575713 A CN202111575713 A CN 202111575713A CN 114217425 B CN114217425 B CN 114217425B
- Authority
- CN
- China
- Prior art keywords
- lens group
- lens
- focal length
- positive
- positive lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001259 photo etching Methods 0.000 title claims abstract description 9
- 230000003287 optical effect Effects 0.000 abstract description 9
- 238000001459 lithography Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B15/00—Optical objectives with means for varying the magnification
- G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
- G02B15/144—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only
- G02B15/1441—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only the first group being positive
- G02B15/144111—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only the first group being positive arranged ++-+
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
Abstract
The invention discloses a multiplying power internal adjusting lens for a photoetching machine, which is formed by combining four groups of lens groups, wherein a first positive lens group G1, a second positive lens group G2, a third negative lens group G3 and a fourth positive lens group G4 are sequentially arranged from left to right, and the second positive lens group G2 is an adjusting lens group; parameters of the four lens groups meet the relation 1< F1/F34< M, wherein F1 is the focal length of the lens group G1, F34 is the combined focal length of the lens group G3 and the lens group G4, and M is the lens multiplying power; parameters of the four lens groups meet the relation 0< F12< L1, F1> L1, wherein L1 is the distance from the object plane to the main surface of the first positive lens group, F1 is the focal length of the lens group G1, and F12 is the combined focal length of the lens group G1 and the lens group G2; the parameters of the four lens groups satisfy the relation F34> L5, F4< L5, where L5 is the distance from the image plane to the main surface of the fourth lens group G4, F4 is the focal length of the lens group G4, and F34 is the combined focal length of the lens group G3 and the lens group G4. The invention is convenient to adjust, and only one lens (the second positive lens group) needs to be moved back and forth along the optical axis.
Description
Technical Field
The invention relates to the technical field of photoetching lenses, in particular to a multiplying power internal adjusting lens for a photoetching machine.
Background
The lithography lens is a core component of the lithography machine, and a plurality of optical modules (lens+illumination) are needed to be spliced, so that exposure with a large area is formed. Typically, at least 4 optical modules, and up to 12 optical modules are required on the device, and the magnification requirements of the optical modules are highly consistent. However, because of errors in processing and assembling, the practically assembled lenses have large magnification difference and cannot meet the use requirement, so that the magnifications of the lenses in all the optical modules need to be adjusted to be consistent, and the errors are generally required to be within a range of ten thousandth.
The solution in the prior art is to adjust the last lens of the lens to realize the adjustment of the magnification of the lens, but the problem of the method is that the working distance is changed after the magnification is adjusted, so that the working distance of each lens is inconsistent, and the whole optical machine needs to be padded again to realize a uniform focal plane. The adjustment is also very complicated due to the different height of each lens pad. In addition, when the last lens is adjusted, the telecentricity of the lens is also changed to some extent. The exposure effect is affected to some extent.
Disclosure of Invention
Aiming at the technical problems, the invention provides a multiplying power internal adjusting lens for a photoetching machine, wherein the multiplying power adjustment of the lens can be realized by adjusting one lens, and the working distance and the telecentricity of the lens are not changed after the multiplying power adjustment.
A multiplying power internal adjusting lens for a photoetching machine is formed by combining four lens groups, wherein a first positive lens group, a second positive lens group, a third negative lens group and a fourth positive lens group are arranged in sequence from left to right, and the second positive lens group is an adjusting lens group;
parameters of the four lens groups meet the relation 1< F1/F34< M, wherein F1 is the focal length of the first positive lens group, F34 is the combined focal length of the third negative lens group and the fourth positive lens group, and M is the lens multiplying power;
parameters of the four lens groups meet the relation 0< F12< L1, F1> L1, wherein L1 is the distance from an object plane to a main surface of the first positive lens group, F1 is the focal length of the first positive lens group, and F12 is the combined focal length of the first positive lens group and the second positive lens group;
the parameters of the four lens groups satisfy the relation F34> L5 and F4< L5, wherein L5 is the distance from the image plane to the main surface of the fourth positive lens group, F4 is the focal length of the fourth positive lens group, and F34 is the combined focal length of the third negative lens group and the fourth positive lens group.
Further, each lens group is composed of a single lens or more than two lenses.
The invention has the beneficial effects that: 1. the adjustment is convenient, and only one lens (the second positive lens group) needs to be moved back and forth along the optical axis; 2. when the multiplying power is adjusted, the working distance is kept unchanged all the time, so that great inconvenience brought by subsequent use is avoided; 3. after the multiplying power is adjusted, the telecentricity is kept unchanged, and the subsequent exposure size error caused by telecentricity is avoided.
Drawings
FIG. 1 is a schematic view of the optical path structure of a lithographic lens.
Detailed Description
The invention will be described in further detail with reference to the drawings and the detailed description. The embodiments of the invention have been presented for purposes of illustration and description, and are not intended to be exhaustive or limited to the invention in the form disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, and to enable others of ordinary skill in the art to understand the invention for various embodiments with various modifications as are suited to the particular use contemplated.
Example 1
As shown in FIG. 1, the magnification internal adjusting lens for the photoetching machine is formed by combining four lens groups, wherein a first positive lens group G1, a second positive lens group G2, a third negative lens group G3 and a fourth positive lens group G4 are sequentially arranged from left to right, and the second positive lens group G2 is an adjusting lens group; each lens group is composed of a single lens or more than two lenses.
Parameters of the four lens groups meet the relation 1< F1/F34< M, wherein F1 is the focal length of the first positive lens group G1, F34 is the combined focal length of the third negative lens group G3 and the fourth positive lens group G4, and M is the lens magnification;
parameters of the four lens groups meet the relation 0< F12< L1, F1> L1, wherein L1 is the distance from an object plane to a main surface of the first positive lens group G1, F1 is the focal length of the first positive lens group G1, and F12 is the combined focal length of the first positive lens group G1 and the second positive lens group G2;
the parameters of the four lens groups satisfy the relation F34> L5, F4< L5, where L5 is the distance from the image plane to the main surface of the fourth positive lens group G4, F4 is the focal length of the fourth positive lens group G4, and F34 is the combined focal length of the third negative lens group G3 and the fourth positive lens group G4.
Working principle: by changing the axial position of the lens group G2, the combined focal length F12 of the lens group G1 and the lens group G2 is changed, and at the same time, the focal plane position S1 of the combined lenses of the lens group G1 and the lens group G2 is not changed. The position of the diaphragm is arranged at the focal plane position of the combined lens of the lens group G1 and the lens group G2, and the diaphragm is just overlapped with the front focal plane of the combined lens of the lens group G3 and the lens group G4, so that the telecentricity and the image plane position of the rear group are not changed. Meanwhile, since the combined focal length of the lens group G1 and the lens group G2 is changed, the magnification of the entire lens tends to be changed. Thus, when the lens group G2 is moved, the working distance and telecentricity are ensured to be unchanged, and the multiplying power is changed.
It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art and which are included in the embodiments of the present invention without the inventive step, are intended to be within the scope of the present invention.
Claims (2)
1. The magnification internal adjusting lens for the photoetching machine is characterized by comprising four lens groups, wherein the four lens groups are sequentially a first positive lens group, a second positive lens group, a third negative lens group and a fourth positive lens group from left to right, and the second positive lens group is an adjusting lens group;
parameters of the four lens groups meet the relation 1< F1/F34< M, wherein F1 is the focal length of the first positive lens group, F34 is the combined focal length of the third negative lens group and the fourth positive lens group, and M is the lens multiplying power;
parameters of the four lens groups meet the relation 0< F12< L1, F1> L1, wherein L1 is the distance from an object plane to a main surface of the first positive lens group, F1 is the focal length of the first positive lens group, and F12 is the combined focal length of the first positive lens group and the second positive lens group;
parameters of the four lens groups meet the relation F34> L5 and F4< L5, wherein L5 is the distance from an image plane to the main surface of the fourth positive lens group, F4 is the focal length of the fourth positive lens group, and F34 is the combined focal length of the third negative lens group and the fourth positive lens group;
by changing the axial position of the lens group G2, the combined focal length F12 of the lens group G1 and the lens group G2 is changed, and at the same time, the focal plane position S1 of the combined lens of the lens group G1 and the lens group G2 is not changed; when the lens group G2 is moved, the working distance and telecentricity are unchanged, and magnification is changed.
2. The magnification-varying lens of claim 1, wherein each lens group consists of a single lens or more than two lenses.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111575713.7A CN114217425B (en) | 2021-12-21 | 2021-12-21 | Multiplying power internal adjusting lens for photoetching machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111575713.7A CN114217425B (en) | 2021-12-21 | 2021-12-21 | Multiplying power internal adjusting lens for photoetching machine |
Publications (2)
Publication Number | Publication Date |
---|---|
CN114217425A CN114217425A (en) | 2022-03-22 |
CN114217425B true CN114217425B (en) | 2024-04-09 |
Family
ID=80704877
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202111575713.7A Active CN114217425B (en) | 2021-12-21 | 2021-12-21 | Multiplying power internal adjusting lens for photoetching machine |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN114217425B (en) |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09329746A (en) * | 1996-06-12 | 1997-12-22 | Nikon Corp | Zoom lens for finite distance |
JPH11344672A (en) * | 1998-06-01 | 1999-12-14 | Nikon Corp | Zoom lens |
JP2000089113A (en) * | 1998-09-07 | 2000-03-31 | Canon Inc | Photographic lens making good use of floating |
CN200983034Y (en) * | 2006-12-15 | 2007-11-28 | 浙江舜宇光学有限公司 | Ultra-small zooming lens |
JP2010249957A (en) * | 2009-04-13 | 2010-11-04 | Tamron Co Ltd | Wide-angle zoom lens |
CN102279459A (en) * | 2010-06-09 | 2011-12-14 | 上海微电子装备有限公司 | Projection object lens |
CN103926683A (en) * | 2014-04-18 | 2014-07-16 | 中国科学院光电技术研究所 | Zoom optical system |
CN204945619U (en) * | 2015-09-09 | 2016-01-06 | 合肥芯碁微电子装备有限公司 | A kind of photoetching telecentric objective with multiplying power fine adjustment function |
CN108535864A (en) * | 2018-05-02 | 2018-09-14 | 中国科学院上海光学精密机械研究所 | A kind of four component zooming telecentric optical system design methods |
CN112346229A (en) * | 2020-11-25 | 2021-02-09 | 深圳市雷影光电科技有限公司 | Full-frame optical imaging system and optical equipment thereof |
CN213957739U (en) * | 2020-11-13 | 2021-08-13 | 辽宁中蓝光电科技有限公司 | Zoom lens |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4914999B2 (en) * | 2007-04-11 | 2012-04-11 | ペンタックスリコーイメージング株式会社 | Telephoto lens system |
-
2021
- 2021-12-21 CN CN202111575713.7A patent/CN114217425B/en active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09329746A (en) * | 1996-06-12 | 1997-12-22 | Nikon Corp | Zoom lens for finite distance |
JPH11344672A (en) * | 1998-06-01 | 1999-12-14 | Nikon Corp | Zoom lens |
JP2000089113A (en) * | 1998-09-07 | 2000-03-31 | Canon Inc | Photographic lens making good use of floating |
CN200983034Y (en) * | 2006-12-15 | 2007-11-28 | 浙江舜宇光学有限公司 | Ultra-small zooming lens |
JP2010249957A (en) * | 2009-04-13 | 2010-11-04 | Tamron Co Ltd | Wide-angle zoom lens |
CN102279459A (en) * | 2010-06-09 | 2011-12-14 | 上海微电子装备有限公司 | Projection object lens |
CN103926683A (en) * | 2014-04-18 | 2014-07-16 | 中国科学院光电技术研究所 | Zoom optical system |
CN204945619U (en) * | 2015-09-09 | 2016-01-06 | 合肥芯碁微电子装备有限公司 | A kind of photoetching telecentric objective with multiplying power fine adjustment function |
CN108535864A (en) * | 2018-05-02 | 2018-09-14 | 中国科学院上海光学精密机械研究所 | A kind of four component zooming telecentric optical system design methods |
CN213957739U (en) * | 2020-11-13 | 2021-08-13 | 辽宁中蓝光电科技有限公司 | Zoom lens |
CN112346229A (en) * | 2020-11-25 | 2021-02-09 | 深圳市雷影光电科技有限公司 | Full-frame optical imaging system and optical equipment thereof |
Also Published As
Publication number | Publication date |
---|---|
CN114217425A (en) | 2022-03-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6104544A (en) | Exposure apparatus | |
KR100573913B1 (en) | Iprojection optical system and exposure apparatus having the same | |
KR100446130B1 (en) | Projection optical system, exposure apparatus and exposure method thereof | |
KR100485376B1 (en) | Projection optical system and its exposure apparatus, and device manufacturing method | |
EP1662325A2 (en) | Projection optical system and exposure apparatus having the same | |
CN102789044B (en) | Aspherical focal length-variable photoetching objective lens system | |
US3877795A (en) | Small retrofocus type super wide-angle objective lens system | |
JP2002287029A (en) | Projection optical system and projection aligner using the same | |
CN102998779A (en) | Varifocal photoetching objective lens system | |
CN103926683A (en) | Zoom optical system | |
JPWO2020045559A1 (en) | An optical system in which an intermediate image is formed | |
CN105527701B (en) | Big view-field projection lithography objective lens | |
EP1586950A2 (en) | Illumination optical system, exposure apparatus, and device manufacturing method using the same | |
CN111596532A (en) | Double telecentric lens and digital projection photoetching system | |
JP2004022708A (en) | Imaging optical system, illumination optical system, aligner and method for exposure | |
CN114217425B (en) | Multiplying power internal adjusting lens for photoetching machine | |
US6600550B1 (en) | Exposure apparatus, a photolithography method, and a device manufactured by the same | |
CN109375480A (en) | A kind of photoetching projection objective lens and litho machine | |
KR20030052967A (en) | Optical magnification adjustment system and projection exposure device | |
CN112526834B (en) | High-resolution maskless photoetching system and exposure method | |
CN112526833B (en) | Projection imaging system for maskless lithography | |
JP2010097975A (en) | Correction unit, illumination optical system, exposure apparatus, and device manufacturing method | |
JP5387893B2 (en) | Illumination optical system, exposure apparatus, and device manufacturing method | |
JP3026648B2 (en) | 1x projection lens | |
JP5190804B2 (en) | Dimming unit, illumination optical system, exposure apparatus, and device manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20220801 Address after: 230000 5th floor, building B4, xiezhihui Park, Zhongguancun, Baohe Economic Development Zone, Hefei, Anhui Province Applicant after: Anhui Guoxin Lithography Technology Co.,Ltd. Address before: 230051 1st floor, building D3, Zhongguancun collaborative innovation Zhihui Park, intersection of Chongqing Road and Lanzhou Road, Baohe Economic Development Zone, Hefei City, Anhui Province Applicant before: Anhui Guoxin Intelligent Equipment Co.,Ltd. |
|
TA01 | Transfer of patent application right | ||
GR01 | Patent grant | ||
GR01 | Patent grant |