CN114107898A - 一种颜色膜膜系设计镀膜工艺 - Google Patents

一种颜色膜膜系设计镀膜工艺 Download PDF

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CN114107898A
CN114107898A CN202111466959.0A CN202111466959A CN114107898A CN 114107898 A CN114107898 A CN 114107898A CN 202111466959 A CN202111466959 A CN 202111466959A CN 114107898 A CN114107898 A CN 114107898A
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翁钦盛
王刚
叶炜昊
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Hangzhou Meidikai Photoelectric Technology Co ltd
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Abstract

本发明公开了一种颜色膜膜系设计镀膜工艺，其需镀膜的膜层结构包括前膜堆、中间金属层和后膜堆，前膜堆和后膜堆分别由高折射率材料的膜层和低折射率材料的膜层堆叠而成，前膜堆、中间金属层和后膜堆在材料选取后，通过膜系设计模拟软件进行颜色膜膜系设计确定前膜堆、中间金属层和后膜堆的膜层厚度配比，采用镀膜实现膜层结构。本发明采用了金属与氧化物结合，利用金属中间层的吸收特性，可以做到除了需要透过的波段，其余可见光波段均截止，透过率T%<1%；由于金属中间层的加入，膜层牢固度的可靠性好，测过90℃水煮90min后用3M胶带拉膜无脱膜，光谱无影响；稳定性好，不存在挥发的问题，可选任意可见光波长位置，成本较低，且价格稳定。

Description

一种颜色膜膜系设计镀膜工艺
技术领域
本发明涉及光学薄膜加工技术领域，尤其涉及一种颜色膜膜系设计镀膜工艺。
背景技术
现有颜色膜可以在透明基板上形成各种绚丽色彩的膜层，因而被广泛应用于各种电子产品上，如手机盖板。用作手机盖板常需丝印油墨来为其着色。但只丝印油墨，颜色光泽度较差，也没有金属后盖的金属质感。随着市场需求的多元化，玻璃盖板不仅起到保护作用，其美化装饰的功能也日益凸显。为增加手机玻璃盖板的美感，玻璃盖板生产厂家通过光学薄膜技术在透明玻璃或膜片上镀制各种高、低折射率介质堆叠膜层，或部分金属膜层以显示不同颜色，例如蓝色，银色，金色等。在玻璃盖板背面丝印黑色油墨，人眼所看到的颜色主要由镀制薄膜的反射色所决定；在玻璃盖板背面丝印其他颜色油墨，人眼所看到的颜色主要由镀制薄膜的反射色、及其油墨的透过色所决定。
但现有颜色膜镀膜工艺制作颜色膜常用的是油墨，油墨存在较多的问题，如：
1.油墨存在较强挥发性，高温下容易出现挥发的情况，导致无法与一些高温工序进行匹配；
2.油墨存在稀缺性，有时想要找到特定波长的油墨十分困难，市面上可能根本没有；
3.可靠性较差，与基板结合的牢固度不理想；
4.每次更换不同波长的油墨需要较长时间进行调试；
5.部分油墨的价格极其昂贵。
发明内容
为解决上述技术问题，本发明设计了一种颜色膜膜系设计镀膜工艺。
本发明采用如下技术方案：
一种颜色膜膜系设计镀膜工艺，其工艺步骤为：
S1、清洗基板；
S2、黄光制程进行涂胶、曝光、显影相关制程；
S3、镀膜工艺：需镀膜的膜层结构包括前膜堆、中间金属层和后膜堆，前膜堆和后膜堆分别由高折射率材料的膜层和低折射率材料的膜层堆叠而成，前膜堆、中间金属层和后膜堆在材料选取后，通过膜系设计模拟软件进行颜色膜膜系设计确定前膜堆、中间金属层和后膜堆的膜层厚度配比，采用镀膜实现膜层结构；
S4、重复步骤S2、S3八次完成整个颜色膜膜系设计镀膜工艺。
作为优选，所述颜色膜膜系设计过程包括：
A1、对不同厚度不同材质的基片的基础光学常数进行计算，记录计算所得的基片基础光学常数；
A2、 对不同单层薄膜材料的光学常数进行计算，记录计算所得的单层薄膜光学常数；
A3、 测量目标物的实测颜色值，使用所述步骤A1和步骤A2中的所述的基片基础光学常数和单层薄膜基础光学常数进行膜系设计模拟软件模拟，得到前膜堆、中间金属层和后膜堆的膜层厚度配比。
作为优选，所述中间金属层采用金属银或铝。
作为优选，所述高折射率材料的膜层采用NB2O5或TIO2，低折射率材料的膜层采用SIO2。
作为优选，所述低折射率材料的膜层折射率为1.4-1.55；高折射率材料的膜层折射率为2-4.5。
本发明的有益效果是：（1）、本发明采用了金属与氧化物结合，利用金属中间层(Ag)或（AL）的吸收特性，可以做到除了需要透过的波段，其余可见光波段均截止，透过率T%<1%；（2）、由于金属中间层的加入，膜层牢固度的可靠性好，测过90℃水煮90min后用3M胶带拉膜无脱膜，光谱无影响；（3）、稳定性好，不存在挥发的问题，成本较低，且价格稳定，（4）、可选任意可见光波长位置透过（对相应的透过位置控制极为精准），具有极好的可控性。
附图说明
图1是本发明中膜层结构的模拟曲线图；
图2是本发明中膜层结构的实际镀膜曲线图。
具体实施方式
下面通过具体实施例，并结合附图，对本发明的技术方案作进一步的具体描述：
实施例：一种颜色膜膜系设计镀膜工艺，其工艺步骤为：
S1、清洗基板；
S2、黄光制程进行涂胶、曝光、显影相关制程；
S3、镀膜工艺：需镀膜的膜层结构包括前膜堆、中间金属层和后膜堆，前膜堆和后膜堆分别由高折射率材料的膜层和低折射率材料的膜层堆叠而成，前膜堆、中间金属层和后膜堆在材料选取后，通过膜系设计模拟软件进行颜色膜膜系设计确定前膜堆、中间金属层和后膜堆的膜层厚度配比，采用镀膜实现膜层结构；
S4、重复步骤S2、S3八次完成整个颜色膜膜系设计镀膜工艺。
作为优选，所述颜色膜膜系设计过程包括：
A1、对不同厚度不同材质的基片的基础光学常数进行计算，记录计算所得的基片基础光学常数；
A2、 对不同单层薄膜材料的光学常数进行计算，记录计算所得的单层薄膜光学常数；
A3、 测量目标物的实测颜色值，使用所述步骤A1和步骤A2中的所述的基片基础光学常数和单层薄膜基础光学常数进行膜系设计模拟软件模拟，得到前膜堆、中间金属层和后膜堆的膜层厚度配比。
中间金属层采用金属银。
高折射率材料的膜层采用NB2O5或TIO2，低折射率材料的膜层采用SIO2。
低折射率材料的膜层折射率为1.4-1.55；高折射率材料的膜层折射率为2-4.5。
附图1所示为本发明中膜层结构的模拟曲线图，在膜系设计模拟软件上对参考波长进行调整后，相应的光谱曲线就会产生变化，从而实现不同波段透过的颜色膜。
附图2所示为本发明中膜层结构的实际镀膜曲线图，可见该颜色膜膜系设计镀膜工艺得到的膜层结构具备良好的重复性，良好的均匀性以及极好的可控性。
以上所述的实施例只是本发明的一种较佳的方案，并非对本发明作任何形式上的限制，在不超出权利要求所记载的技术方案的前提下还有其它的变体及改型。

Claims (5)

1.一种颜色膜膜系设计镀膜工艺，其特征是，其工艺步骤为：
S1、清洗基板；
S2、黄光制程进行涂胶、曝光、显影相关制程；
S3、镀膜工艺：需镀膜的膜层结构包括前膜堆、中间金属层和后膜堆，前膜堆和后膜堆分别由高折射率材料的膜层和低折射率材料的膜层堆叠而成，前膜堆、中间金属层和后膜堆在材料选取后，通过膜系设计模拟软件进行颜色膜膜系设计确定前膜堆、中间金属层和后膜堆的膜层厚度配比，采用镀膜实现膜层结构；
S4、重复步骤S2、S3八次完成整个颜色膜膜系设计镀膜工艺。
2.根据权利要求1所述的一种颜色膜膜系设计镀膜工艺，其特征是，所述颜色膜膜系设计过程包括：
A1、对不同厚度不同材质的基片的基础光学常数进行计算，记录计算所得的基片基础光学常数；
A2、 对不同单层薄膜材料的光学常数进行计算，记录计算所得的单层薄膜光学常数；
A3、根据光学设计需要来确定透过率以及对应波长，使用所述步骤A1和步骤A2中的所述的基片基础光学常数和单层薄膜基础光学常数进行膜系设计模拟软件模拟，得到前膜堆、中间金属层和后膜堆的膜层厚度配比。
3.根据权利要求1所述的一种颜色膜膜系设计镀膜工艺，其特征是，所述中间金属层采用金属银或铝。
4.根据权利要求1所述的一种颜色膜膜系设计镀膜工艺，其特征是，所述高折射率材料的膜层采用NB2O5或TIO2，低折射率材料的膜层采用SIO2。
5.根据权利要求1所述的一种颜色膜膜系设计镀膜工艺，其特征是，所述低折射率材料的膜层折射率为1.4-1.55；高折射率材料的膜层折射率为2-4.5。
CN202111466959.0A 2021-12-03 2021-12-03 一种颜色膜膜系设计镀膜工艺 Pending CN114107898A (zh)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200806806A (en) * 2006-07-18 2008-02-01 Kinoptics Technologies Inc A manufacture method of micro-filter array
CN101211735A (zh) * 2006-12-28 2008-07-02 甘国工 等离子体显示器滤光板及使用该滤光板的显示器
CN103018902A (zh) * 2013-01-21 2013-04-03 天津南玻节能玻璃有限公司 一种光学薄膜膜系设计的方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200806806A (en) * 2006-07-18 2008-02-01 Kinoptics Technologies Inc A manufacture method of micro-filter array
CN101211735A (zh) * 2006-12-28 2008-07-02 甘国工 等离子体显示器滤光板及使用该滤光板的显示器
CN103018902A (zh) * 2013-01-21 2013-04-03 天津南玻节能玻璃有限公司 一种光学薄膜膜系设计的方法

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