CN114088215A - Installation and adjustment device for multi-interferometer combined application - Google Patents
Installation and adjustment device for multi-interferometer combined application Download PDFInfo
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- CN114088215A CN114088215A CN202111351425.3A CN202111351425A CN114088215A CN 114088215 A CN114088215 A CN 114088215A CN 202111351425 A CN202111351425 A CN 202111351425A CN 114088215 A CN114088215 A CN 114088215A
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- 238000009434 installation Methods 0.000 title claims abstract description 37
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- 238000001900 extreme ultraviolet lithography Methods 0.000 description 2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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Abstract
The invention relates to the technical field of precision machinery, and provides a multi-interferometer combined application installation adjusting device, which comprises: an object stage; the interferometer group comprises a first interferometer, a second interferometer and a third interferometer which are respectively positioned on the front side, the left side and the rear side of the objective table, a first reflecting mirror and a second reflecting mirror are respectively arranged on the objective table at positions corresponding to the first interferometer and the third interferometer, and a first Z-direction reflecting mirror and a second Z-direction reflecting mirror are respectively arranged right above the first reflecting mirror and the second reflecting mirror; and the light path transmission part comprises a first light path transmission path, a second light path transmission path and a third light path transmission path, incident light enters the first interferometer, the second interferometer and the third interferometer along the first light path transmission path, the second light path transmission path and the third light path transmission path respectively, an emergent light beam of the first interferometer is reflected to the first Z-direction reflector through the first reflector, and an emergent light beam of the third interferometer is reflected to the second Z-direction reflector through the second reflector.
Description
Technical Field
The invention relates to the technical field of precision instruments, in particular to the technical field of precision measurement, optical detection and semiconductor equipment, and more particularly relates to a multi-interferometer combined application installation and adjustment device.
Background
With the rapid development of measurement components based on optical principles, interferometer measurement elements of various specifications and types are entering engineering applications. The interferometer itself is a high-precision measuring element, and the requirements on the use environment conditions are extremely strict. Not only are controlled environmental conditions of temperature, humidity, vibration, etc. required, they also impose stringent requirements on installation benchmarks.
At present, various types of interferometers such as single-axis, two-axis, three-axis, five-axis and the like exist in the market, but manufacturers generally only provide the most basic simple mounting seat and cannot adapt to various industrial or scientific research application occasions with complex conditions. Therefore, difficulty is brought to the adjustment of the interferometer, particularly the precise adjustment of the combined use of a plurality of interferometers, a user is required to specially design tools of different application occasions, and the use convenience of the interferometer is reduced. In addition, a set of special tooling is easily designed for one field of measurement, the tooling universality is poor, and the cost is high.
In addition, the interferometer needs more adjustable degrees of freedom during debugging, which brings difficulty to tool development, and the high adjustable degree of freedom causes poor stability, so one of the tool design difficulties is to balance the ratio of the two.
Disclosure of Invention
In view of the above-mentioned drawbacks of the prior art, the present invention provides a mounting and adjusting device for multi-interferometer combined application.
The invention provides a multi-interferometer combined application installation adjusting device, which comprises: an object stage; the interferometer group comprises a first interferometer, a second interferometer and a third interferometer which are respectively positioned on the front side, the left side and the rear side of the objective table, a first reflecting mirror and a second reflecting mirror are respectively arranged on the objective table at positions corresponding to the first interferometer and the third interferometer, and a first Z-direction reflecting mirror and a second Z-direction reflecting mirror are respectively arranged right above the first reflecting mirror and the second reflecting mirror; and the light path transmission part comprises a first light path transmission path, a second light path transmission path and a third light path transmission path, incident light enters the first interferometer, the second interferometer and the third interferometer along the first light path transmission path, the second light path transmission path and the third light path transmission path respectively, an emergent light beam of the first interferometer is reflected to the first Z-direction reflector through the first reflector, and an emergent light beam of the third interferometer is reflected to the second Z-direction reflector through the second reflector.
Further, still include first refraction point, second refraction point, third refraction point, fourth refraction point, fifth refraction point, sixth refraction point and seventh refraction point, wherein: the incident light sequentially passes through a first light folding point, a second light folding point, a third light folding point and a fourth light folding point along a first light path propagation path, and an emergent light beam of the fourth light folding point is incident to the first interferometer; the incident light sequentially passes through the first light folding point, the second light folding point, the third light folding point and the fifth light folding point along the second light path propagation path, and the emergent light beam of the fifth light folding point is incident to the second interferometer; and on the propagation path of the third light path, the incident light sequentially passes through the first light folding point, the sixth light folding point and the seventh light folding point, and the emergent light beam of the seventh light folding point is incident to the third interferometer.
Furthermore, the first fold light point and the second fold light point are arranged along the direction of incident light, the emergent beam of the second fold light point is perpendicular to the incident beam, the emergent beam of the third fold light point is perpendicular to the incident beam, and the emergent beam of the fourth fold light point is collinear with the incident beam; the emergent light beam of the fifth refraction point is collinear with the incident light beam; the emergent light beam of the sixth-fold light spot is vertical to the incident light beam, and the emergent light beam of the seventh-fold light spot is vertical to the incident light beam.
Further, the first mirror and the second mirror are both 45-degree mirrors.
Further, each of the first, second, third, fourth, fifth, sixth, and seventh fold light points includes: a refraction point adjusting seat; at least two layers of cage structures are fixed on the light folding point adjusting seat and are positioned at different heights, and the light folding elements are fixed in the cage structures.
Further, the mounting hole has been seted up to every layer of cage structure, and the mounting hole size of different layers of cage structure is the same.
Further, every interferometer of interferometer group all includes that the interferometer that stacks in proper order establishes and fixes adjusts base, interferometer leveling seat and interferometer body, wherein: the interferometer adjusting base is provided with a first base long-strip hole and a second base long-strip hole at intervals along the Y direction, wherein the first base long-strip hole and the second base long-strip hole are used for adjusting the Y direction displacement of the interferometer; the interferometer leveling seat is used for adjusting X-direction displacement, Z-direction displacement, Theta X-direction angle, Theta Y-direction angle and Theta Z-direction angle of the interferometer.
Further, the interferometer leveling base includes a short side slit and a long side slit cut out from different Z-direction heights, wherein: the short edge slit is cut outwards from the position, close to the long edge, inside the interferometer leveling seat along the direction of the short edge; and the long-edge slit is cut outwards from the position, close to the short edge, inside the interferometer leveling seat along the long-edge direction.
Further, the short-side slits are higher in height in the Z direction than the long-side slits.
Further, interferometer leveling seat still includes first ladder boss, sets up in interferometer leveling seat's minor face place side, wherein: the height of the first step boss is set to be the height from the bottom surface of the interferometer leveling seat to the short side slit; the first step boss is provided with a first adjusting hole, a second adjusting hole and a third adjusting hole in sequence along the direction of the short side.
Further, first adjustment hole and third adjustment all run through first ladder boss perpendicularly, wherein: the first adjusting hole and the third adjusting hole are both provided with threaded holes between the bottom surface of the interferometer leveling seat and the height of the long-side slit; and the first adjusting hole and the third adjusting hole are both provided with unthreaded holes between the height of the long side slit and the height of the short side slit.
Furthermore, the second adjusting hole vertically penetrates from the height of the long side slit to the height of the short side slit, and the second adjusting hole is a threaded hole.
Furthermore, a fourth adjusting hole, a fifth adjusting hole and a sixth adjusting hole are sequentially formed in the top surface of the interferometer leveling seat close to the long edge along the long edge direction.
Further, the fourth adjustment hole and the sixth adjustment hole vertically penetrate to the long side slit from the top surface of the interferometer leveling seat, wherein: a fourth adjusting hole and a sixth adjusting hole are arranged between the top surface of the interferometer leveling seat and the short side slit and are provided with unthreaded holes; and a fourth adjusting hole and a sixth adjusting hole are arranged between the short side slit and the long side slit to be threaded holes.
Furthermore, a fifth adjusting hole vertically penetrates from the top surface of the interferometer leveling seat to the short-side slit, and the fifth adjusting hole is a threaded hole.
Furthermore, the interferometer leveling seat further comprises a second step boss which is arranged on the side face where the long edge of the interferometer leveling seat is located, and a first leveling strip hole and a second leveling strip hole are formed in the second step boss at intervals along the X direction.
Further, the height of the second step boss is set to be the height from the bottom surface of the interferometer leveling seat to the position of the long-side slit.
Furthermore, the installation and adjustment device for the multi-interferometer combination is made of aluminum-based alloy, iron-based alloy, copper-based alloy, stainless steel, invar steel, nylon, plastic or ceramic material.
Compared with the prior art, the installation and adjustment device for the combined application of the multiple interferometers, provided by the invention, at least has the following beneficial effects:
(1) each interferometer mounting seat of the invention adopts a six-degree-of-freedom adjustable structural form so as to solve the problem of low adjustment flexibility in actual installation and debugging of the interferometer.
(2) The installation of the light folding point and the spectroscope adopts an installation seat in a double-layer structure form so as to solve the problem that a plurality of interferometers with different incident light heights are combined and used and share one light source.
(3) Spare mounting holes are reserved during the design of mounting seats of all interferometers and refraction points, the application compatibility in different occasions is improved to a certain extent, and the universality is improved.
(4) All interferometers and refraction point mounting seats are designed by adopting uniform mounting hole positions, so that interchangeability among parts is improved.
Drawings
The above and other objects, features and advantages of the present invention will become more apparent from the following description of the embodiments of the present invention with reference to the accompanying drawings, in which:
FIG. 1 schematically illustrates an overall assembly view of a multi-interferometer combined application installation adjustment apparatus according to an embodiment of the present invention;
FIG. 2 schematically illustrates a mounting diagram for each break point according to an embodiment of the invention;
FIG. 3 schematically illustrates an installation view of each interferometer according to an embodiment of the invention;
FIG. 4 schematically illustrates a block diagram of an interferometer leveling base in a view angle, according to an embodiment of the invention;
FIG. 5 schematically illustrates a block diagram of an interferometer leveling base from another perspective, according to an embodiment of the invention;
FIG. 6 schematically shows a structure of a short side slit according to an embodiment of the present invention;
FIG. 7 schematically shows a structure of a long side slit according to an embodiment of the present invention;
FIG. 8 schematically illustrates a block diagram of a first step boss and a second step boss according to an embodiment of the invention;
fig. 9 schematically shows a structure of a long-side adjustment hole according to an embodiment of the present invention.
Description of reference numerals:
1-an object stage; 2-a first interferometer; 8-a second interferometer; 11-a third interferometer;
5-first refraction point; 4-second fold point; 6-third folded spot; 3-fourth fold spot;
7-fifth fold light point; 9-sixth fold light spot; 10-seventh fold light spot;
15-a first mirror; 14-a second mirror;
13-a first Z-mirror; 12-a second Z-mirror;
l1 — first optical path propagation path; l2 — second optical path propagation path; l3 — third optical path propagation path;
901-refraction point adjusting seat; 902-a first refractive element; 903-a second light folding element;
801-interferometer adjustment mount; 802-interferometer leveling mount; 803-the interferometer body;
8011-first base elongated hole; 8012-second base elongate aperture;
8021-a first leveling elongated hole; 8022-second leveling elongated holes;
8023-short edge slit; 8024-long side slits; 8025-first step boss;
8025A-a first threaded hole; 8025B-a second threaded hole; 8025C-third threaded hole;
8025D-fourth threaded hole; 8025E-fifth threaded hole; 8025F — sixth threaded hole;
8026-second step bosses.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to specific embodiments and the accompanying drawings. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Throughout the drawings, like elements are represented by like or similar reference numerals. And conventional structures or constructions will be omitted when they may obscure the understanding of the present invention. And the shapes, sizes and positional relationships of the components in the drawings do not reflect the actual sizes, proportions and actual positional relationships.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The terms "comprises," "comprising," and the like, as used herein, specify the presence of stated features, steps, operations, and/or components, but do not preclude the presence or addition of one or more other features, steps, operations, or components.
The invention relates to the technical field of precision instruments, in particular to the technical field of precision measurement, optical detection and semiconductor equipment. For example, the invention can be used in the scenes with high requirements on the measurement precision, such as precision measurement, optical detection, semiconductor equipment and the like; the method is particularly suitable for the installation and debugging of the multi-axis interferometer, and is particularly suitable for the occasion of multi-interferometer combined application. For another example, the tool set can be extended to be applied to a vacuum environment of EUV (Extreme ultraviolet lithography) lithography by selecting a vacuum material with low outgassing.
FIG. 1 schematically shows an overall assembly diagram of a multi-interferometer combined application installation adjustment apparatus according to an embodiment of the invention.
As shown in fig. 1, the installation adjustment device for a multi-interferometer combined application according to the present embodiment includes a stage 1, an interferometer group, and an optical path propagation section. The interferometer set comprises a first interferometer 2, a second interferometer 8 and a third interferometer 11 which are respectively positioned on the front side, the left side and the rear side of the object stage 1, a first reflecting mirror 15 and a second reflecting mirror 14 are respectively arranged on the object stage 1 opposite to the first interferometer 2 and the third interferometer 11, and a first Z-direction reflecting mirror 13 and a second Z-direction reflecting mirror 12 are respectively arranged right above the first reflecting mirror 15 and the second reflecting mirror 14.
The optical path propagation section includes a first optical path propagation path L1, a second optical path propagation path L2, and a third optical path propagation path L3, and the incident light enters the first interferometer 2, the second interferometer 8, and the third interferometer 11 along the first optical path propagation path L1, the second optical path propagation path L2, and the third optical path propagation path L3, respectively, the outgoing beam of the first interferometer 2 is reflected to the first Z-directional reflecting mirror 13 by the first reflecting mirror 15, and the outgoing beam of the third interferometer 11 is reflected to the second Z-directional reflecting mirror 12 by the second reflecting mirror 14.
Specifically, in the embodiment of the present invention, the optical path propagation portion further includes a first folding light spot 5, a second folding light spot 4, a third folding light spot 6, a fourth folding light spot 3, a fifth folding light spot 7, a sixth folding light spot 9, and a seventh folding light spot 10. Along the first optical path propagation path L1, the incident light passes through the first fold light spot 5, the second fold light spot 4, the third fold light spot 6, and the fourth fold light spot 3 in sequence, and the emergent light beam of the fourth fold light spot 3 is incident on the first interferometer 2. Along the second optical path propagation path L2, the incident light passes through the first fold light spot 5, the second fold light spot 4, the third fold light spot 6, and the fifth fold light spot 7 in this order, and the emergent light beam of the fifth fold light spot 7 is incident on the second interferometer 8. Along the third optical path propagation path L3, the incident light passes through the first fold light spot 5, the sixth fold light spot 9, and the seventh fold light spot 10 in this order, and the outgoing light beam of the seventh fold light spot 10 enters the third interferometer 11.
With continued reference to fig. 1, the first and second inflection points 5 and 4 are arranged along the direction of the incident light, the emergent beam of the second inflection point 4 is perpendicular to the incident light beam, the emergent beam of the third inflection point 6 is perpendicular to the incident light beam, and the emergent beam of the fourth inflection point 3 is collinear with the incident light beam. The exit beam of the fifth refracted spot 7 is collinear with the incident beam. The emergent beam of the sixth-fold light spot 9 is perpendicular to the incident beam, and the emergent beam of the seventh-fold light spot 10 is perpendicular to the incident beam.
Further, the first mirror 15 and the second mirror 14 are both 45-degree mirrors. The mirrors mounted on the respective sides of the object table 1 can be realized, for example, by coating.
According to the embodiment of the invention, the main body of the installation and adjustment device for the multi-interferometer combined application is composed of three groups of interferometers surrounding three side surfaces of the objective table 1 and corresponding installation and adjustment seats, the light folding points and the corresponding installation and adjustment seats are arranged at corresponding positions according to the trend of a light path, and the tool still has good adaptability after the arrangement of the interferometer combined application is changed.
Fig. 2 schematically shows an installation view of each refraction point according to an embodiment of the present invention.
As shown in fig. 2, in the embodiment of the present invention, for the first folding light spot 5, the second folding light spot 4, the third folding light spot 6, the fourth folding light spot 3, the fifth folding light spot 7, the sixth folding light spot 9, and the seventh folding light spot 10, each of the folding light spots includes: a folded spot adjusting base 901; at least two layers of cage structures are fixed on the light folding point adjusting seat 901 and located at different heights, and the light folding elements are fixed inside the cage structures.
It can be understood that the cage structure is a cage frame combined structure comprising the crossbeam and the stand column, is made of section steel, and has the advantages of simple structure, low manufacturing cost and convenient installation and operation.
Fig. 2 schematically shows a view of a refractive point mounting comprising a double-layered cage structure having a first refractive element 902 and a second refractive element 903 fixed to the inside thereof. It will be appreciated that in other embodiments, the refractive spots are not limited to double-layer cages, and that a generalized design of a triple-layer cage or a higher number of layers of cages may be used, the number of layers of cages depending on the height of the incident light on the interferometer.
It should also be noted that it is not necessary to attach a refractive element to each of the at least two cage structures, depending on the actual application. That is, for example, the arrangement of the refractive points as shown in FIG. 2, it is also possible to fix a refractive element to one of the layers of the double-layered cage structure.
Further, the mounting hole has been seted up to every layer of cage structure, and the mounting hole size of different layers of cage structure is the same.
Therefore, the refraction point adjusting seats 901 of all the refraction points have a double-layer structure with a certain height difference and have the same mounting holes, and the mounting holes are uniform and standard, so that the two-layer structure can be interchanged and communicated in the whole device and can be flexibly mounted.
FIG. 3 schematically shows an installation view of each interferometer according to an embodiment of the invention.
As shown in fig. 3, in the embodiment of the present invention, each interferometer of the interferometer set includes an interferometer adjusting base 801, an interferometer leveling base 802, and an interferometer body 803, which are sequentially stacked and fixed. The interferometer adjustment base 801 is provided with a first base elongated hole 8011 and a second base elongated hole 8012 at intervals along the Y direction for adjusting Y-direction displacement of the interferometer. The interferometer leveling base 802 is used for adjusting the X-direction displacement, the Z-direction displacement, the Theta X-direction angle, the Theta Y-direction angle and the Theta Z-direction angle of the interferometer.
Thus, the elongated mounting holes 8011 and 8012 of the interferometer adjustment base 801 can be adjusted in the degree of freedom Y. All interferometers can have the function of six-degree-of-freedom adjustment by combining the functions of the interferometer leveling seat 802.
FIG. 4 schematically illustrates a block diagram of an interferometer leveling base in a view angle, according to an embodiment of the invention. FIG. 5 schematically illustrates a block diagram of an interferometer leveling base from another perspective, according to an embodiment of the invention. Fig. 6 schematically shows a structure of a short-side slit according to an embodiment of the present invention. Fig. 7 schematically shows a structure of a long-side slit according to an embodiment of the present invention.
With reference to fig. 4 to 6, in the embodiment of the present invention, the interferometer leveling base 802 includes a short-side slit 8023 and a long-side slit 8024 cut out from different Z-direction heights, wherein: a short-edge slit 8023 is cut outwards from the position, close to the long edge, inside the interferometer leveling base 802 along the direction of the short edge; the long-side slit 8024 is cut out from the inside of the interferometer leveling base 802 near the short-side position outward in the long-side direction.
In the embodiment of the present invention, the short side slit 8023 has a higher Z-direction height than the long side slit 8024.
Further, the interferometer leveling base 802 further includes a first step boss 8025 disposed on a side surface of the interferometer leveling base 802 where the short side is located. The height of the first step boss 8025 is set to be the height from the bottom surface of the interferometer leveling base 802 to the short side slit 8023. The first stepped boss 8025 is provided with a first adjusting hole 8025A, a second adjusting hole 8025B, and a third adjusting hole 8025C in the short side direction in order.
In the embodiment of the present invention, the interferometer leveling base 802 further includes a second stepped boss 8026, which is disposed on a side surface where the long side of the interferometer leveling base 802 is located, and the second stepped boss 8026 is provided with a first leveling elongated hole 8021 and a second leveling elongated hole 8022 at intervals along the X direction.
Further, the height of the second step bosses 8026 is set to a height from the bottom surface of the interferometer leveling base 802 to the height of the long-side slits 8024.
Thus, the elongated mounting holes 8021 and 8022 on the second step bosses 8026 can be adjusted by the degree of freedom X.
Fig. 8 schematically shows a block diagram of a first step boss and a second step boss according to an embodiment of the present invention.
As shown in fig. 8, in the embodiment of the present invention, the first adjusting hole 8025A and the third adjusting hole 8025C both vertically penetrate through the first stepped boss 8025, wherein: between the bottom surface of the interferometer leveling base 802 and the height of the long-side slit 8024, both the first adjusting hole 8025A and the third adjusting hole 8025C are provided as threaded holes; between the height of the long-side slit 8024 and the height of the short-side slit 8023, the first adjustment hole 8025A and the third adjustment hole 8025C are both set as light holes.
In the embodiment of the present invention, the second adjusting hole 8025B vertically penetrates from the height of the long side slit 8024 to the height of the short side slit 8023, and the second adjusting hole 8025B is a threaded hole.
Fig. 9 schematically shows a structure of a long-side adjustment hole according to an embodiment of the present invention.
As shown in fig. 9, in the embodiment of the present invention, a fourth adjusting hole 8025D, a fifth adjusting hole 8025E, and a sixth adjusting hole 8025F are sequentially formed in the top surface of the interferometer leveling base 802 near the inside of the long side along the long side direction.
In the embodiment of the present invention, the fourth adjusting hole 8025D and the sixth adjusting hole 8025F both vertically penetrate from the top surface of the interferometer leveling base 802 to the long-side slit 8024. Wherein, between the top surface of the interferometer leveling base 802 and the short side slit 8023, the fourth adjusting hole 8025D and the sixth adjusting hole 8025F are both set as light holes; between the short-side slit 8023 and the long-side slit 8024, a fourth adjustment hole 8025D and a sixth adjustment hole 8025F are provided as screw holes.
In the embodiment of the present invention, the fifth adjusting hole 8025E vertically penetrates from the top surface of the interferometer leveling base 802 to the short side slit 8023, and the fifth adjusting hole 8025E is a threaded hole.
Specifically, with reference to the coordinate system direction in fig. 3 and fig. 8, in the present embodiment, inside the interferometer leveling base 802, by pressing the screws in the first adjusting hole 8025A and the third adjusting hole 8025C, the angle adjustment in the positive Theta Y direction can be achieved. The negative Theta Y-direction angle adjustment can be achieved by loosening the screws in the first and third adjustment holes 8025A, 8025C and then tightening the screws in the second adjustment hole 8025B.
Meanwhile, in combination with the coordinate system direction in fig. 3 and fig. 9, in the present embodiment, inside the interferometer leveling seat 802, by pressing the screws in the fourth adjusting hole 8025D and the sixth adjusting hole 8025F, the angle adjustment in the negative Theta X direction can be realized. The positive Theta X-direction angle adjustment can be achieved by loosening the screws in the fourth and sixth adjustment holes 8025D, 8025F and then tightening the screws in the fifth adjustment hole 8025E.
Therefore, the interferometer leveling base 802 of the present embodiment can pull and press the two layers of the slot gap, and can adjust the degree of freedom Z, the degree of freedom Theta X, and the degree of freedom Theta Y. In addition, the angle adjustment in the Theta Z direction can be adjusted through each horizontal mounting aperture.
Through the analysis, for each interferometer, the horizontal degree of freedom Y can be adjusted by the strip-shaped mounting hole on the interferometer adjusting base 801, the two layers of slotting gaps can be pulled and pressed by the interferometer adjusting base 802, and the degree of freedom Z, the degree of freedom Theta X and the degree of freedom Theta Y can be adjusted. In addition, the long strip mounting hole on the interferometer leveling base 802 can adjust the degree of freedom X, and the degree of freedom Theta Z is adjusted through each horizontal mounting hole. Therefore, all interferometers have six-freedom-degree adjustability, simple structure and stable and reliable installation.
The above is merely an exemplary description, and the present embodiment is not limited thereto. For example, in some embodiments, the installation and adjustment device for a multi-interferometer combination may be made of a metal material such as aluminum-based alloy, iron-based alloy, copper-based alloy, stainless steel, invar, or a non-metal material such as nylon, plastic, or ceramic.
For another example, in some embodiments, the interferometer or the tooling set for folding the spot may not be limited to the combined application layout of the interferometer described in this embodiment, and the number of the parts may be increased or decreased according to different use requirements, so as to adapt to other application occasions.
In summary, the embodiment of the present invention provides a mounting and adjusting device for a multi-interferometer combination application, the main body is composed of three sets of interferometers surrounding three sides of the stage and corresponding mounting and adjusting seats, and the beam folding points and the corresponding mounting and adjusting seats are arranged at corresponding positions according to the direction of the light path. All interferometer installation adjusting seats have six-degree-of-freedom adjustability, and refraction point installation adjusting seats have double-layer structures with certain height difference and the same installation holes, are interchangeable and are flexibly installed. The tool still has good adaptability after the combined application layout of the interferometer changes.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention.
In the present invention, unless otherwise expressly specified or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically connected, electrically connected or can communicate with each other; either directly or indirectly through intervening media, either internally or in any other suitable relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
All terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art unless otherwise defined. It is noted that the terms used herein should be interpreted as having a meaning that is consistent with the context of this specification and should not be interpreted in an idealized or overly formal sense.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (18)
1. A multi-interferometer combined application installation adjusting device is characterized by comprising:
an object stage (1);
the interferometer group comprises a first interferometer (2), a second interferometer (8) and a third interferometer (11) which are respectively positioned on the front side, the left side and the rear side of the objective table (1), a first reflector (15) and a second reflector (14) are respectively arranged on the objective table (1) at positions corresponding to the first interferometer (2) and the third interferometer (11), and a first Z-direction reflector (13) and a second Z-direction reflector (12) are respectively arranged right above the first reflector (15) and the second reflector (14);
an optical path propagation part comprises a first optical path propagation path (L1), a second optical path propagation path (L2) and a third optical path propagation path (L3), incident light enters a first interferometer (2), a second interferometer (8) and a third interferometer (11) along the first optical path propagation path (L1), the second optical path propagation path (L2) and the third optical path propagation path (L3), outgoing light beams of the first interferometer (2) are reflected to a first Z-direction reflecting mirror (13) through a first reflecting mirror (15), and outgoing light beams of the third interferometer (11) are reflected to a second Z-direction reflecting mirror (12) through a second reflecting mirror (14).
2. The multiple interferometer combined application setup adjustment device of claim 1, further comprising a first fold light spot (5), a second fold light spot (4), a third fold light spot (6), a fourth fold light spot (3), a fifth fold light spot (7), a sixth fold light spot (9), and a seventh fold light spot (10), wherein:
incident light sequentially passes through a first light folding point (5), a second light folding point (4), a third light folding point (6) and a fourth light folding point (3) along the first light path propagation path (L1), and an emergent light beam of the fourth light folding point (3) is incident to the first interferometer (2);
the incident light sequentially passes through a first light folding point (5), a second light folding point (4), a third light folding point (6) and a fifth light folding point (7) along the second optical path propagation path (L2), and an emergent light beam of the fifth light folding point (7) is incident to the second interferometer (8);
along the third light path propagation path (L3), the incident light passes through a first light folding point (5), a sixth light folding point (9) and a seventh light folding point (10) in sequence, and an emergent light beam of the seventh light folding point (10) is incident to the third interferometer (11).
3. The multiple interferometer combined application setup device according to claim 2, wherein the first fold-spot (5) and the second fold-spot (4) are arranged in the direction of the incident light, the exit beam of the second fold-spot (4) is perpendicular to the incident light beam, the exit beam of the third fold-spot (6) is perpendicular to the incident light beam, and the exit beam of the fourth fold-spot (3) is collinear with the incident light beam;
the emergent light beam of the fifth light folding point (7) is collinear with the incident light beam;
the emergent light beam of the sixth light-folding point (9) is perpendicular to the incident light beam, and the emergent light beam of the seventh light-folding point (10) is perpendicular to the incident light beam.
4. The multiple interferometer combined application mounting adjustment device of claim 1, wherein the first mirror (15) and the second mirror (14) are each 45 degree mirrors.
5. The multiple interferometer combined application setup adjustment device of claim 2, wherein each of the first (5), second (4), third (6), fourth (3), fifth (7), sixth (9) and seventh (10) fold spots comprises:
a refraction point adjusting seat (901);
at least two layers of cage structures which are fixed on the light folding point adjusting seat (901) and are positioned at different heights, and a refraction element is fixed inside the cage structures.
6. The installation adjustment device for multi-interferometer combined application according to claim 5, wherein each layer of cage structure is provided with no installation holes, and the installation holes of different layers of cage structures are the same in size.
7. The multiple interferometer combined application mounting adjustment device of claim 1, wherein each interferometer of the interferometer set comprises an interferometer adjustment base (801), an interferometer leveling base (802) and an interferometer body (803) which are stacked and fixed in sequence, wherein:
the interferometer adjusting base (801) is provided with a first base long strip hole (8011) and a second base long strip hole (8012) at intervals along the Y direction, wherein the first base long strip hole and the second base long strip hole are used for adjusting Y-direction displacement of the interferometer;
the interferometer leveling seat (802) is used for adjusting X-direction displacement, Z-direction displacement, Theta X-direction angle, Theta Y-direction angle and Theta Z-direction angle of the interferometer.
8. The multi-interferometer combined application installation adjustment device of claim 7, wherein the interferometer leveling base (802) comprises short side slits (8023) and long side slits (8024) cut out from different Z-direction heights, wherein:
the short-edge slit (8023) is cut outwards from the position, close to the long edge, inside the interferometer leveling seat (802) along the direction of the short edge;
the long-edge slit (8024) is cut outwards from the position, close to the short edge, inside the interferometer leveling base (802) along the long-edge direction.
9. The multi-interferometer combined application mounting adjustment apparatus of claim 8, wherein the short side slit (8023) has a higher Z-direction height than the long side slit (8024).
10. The multi-interferometer combined application mounting adjustment apparatus of claim 9, wherein the interferometer leveling base (802) further comprises a first step boss (8025) provided on a side of the short side of the interferometer leveling base (802), wherein:
the height of the first step boss (8025) is set to be the height from the bottom surface of the interferometer leveling base (802) to the position of the short side slit (8023);
the first stepped boss (8025) is provided with a first adjusting hole (8025A), a second adjusting hole (8025B) and a third adjusting hole (8025C) in sequence along the short side direction.
11. The multi-interferometer combined application mounting adjustment apparatus of claim 10, wherein the first adjustment hole (8025A) and the third adjustment hole (8025C) each extend perpendicularly through the first stepped boss (8025), wherein:
between the height of the bottom surface of the interferometer leveling seat (802) and the height of the long-side slit (8024), the first adjusting hole (8025A) and the third adjusting hole (8025C) are both provided with threaded holes;
and between the height of the long-side slit (8024) and the height of the short-side slit (8023), the first adjusting hole (8025A) and the third adjusting hole (8025C) are both set as light holes.
12. The installation and adjustment device for multiple interferometer combinations according to claim 10, wherein the second adjustment hole (8025B) vertically penetrates from the height of the long side slit (8024) to the height of the short side slit (8023), and the second adjustment hole (8025B) is a threaded hole.
13. The installation and adjustment device for multi-interferometer combination application according to claim 7, wherein a fourth adjustment hole (8025D), a fifth adjustment hole (8025E) and a sixth adjustment hole (8025F) are sequentially formed in the top surface of the interferometer leveling base (802) near the long side along the long side direction.
14. The multi-interferometer combined application mounting adjustment apparatus of claim 13, wherein the fourth adjustment hole (8025D) and the sixth adjustment hole (8025F) each vertically penetrate from the top surface of the interferometer leveling base (802) to the long side slit (8024), wherein:
between the top surface of the interferometer leveling seat (802) and the short-side slit (8023), the fourth adjusting hole (8025D) and the sixth adjusting hole (8025F) are both set to be unthreaded holes;
and between the short side slit (8023) and the long side slit (8024), the fourth adjusting hole (8025D) and the sixth adjusting hole (8025F) are both provided as threaded holes.
15. The multi-interferometer combined application mounting adjustment apparatus of claim 13, wherein the fifth adjustment hole (8025E) vertically penetrates from the top surface of the interferometer leveling base (802) to the short side slit (8023), and the fifth adjustment hole (8025E) is a threaded hole.
16. The installation and adjustment device for multiple interferometer combinations according to claim 7, wherein the interferometer leveling base (802) further comprises a second step boss (8026) disposed on the side of the long side of the interferometer leveling base (802), and the second step boss (8026) is provided with a first leveling elongated hole (8021) and a second leveling elongated hole (8022) at intervals along the X direction.
17. The multi-interferometer combined application mounting adjustment apparatus of claim 16, wherein the height of the second step boss (8026) is set to be from the bottom surface of the interferometer leveling base (802) to the height of the long side slit (8024).
18. The multi-interferometer combination application installation adjustment device of claim 1, wherein the multi-interferometer combination application installation adjustment device is fabricated from aluminum-based alloy, iron-based alloy, copper-based alloy, stainless steel, invar, nylon, plastic, or ceramic material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111351425.3A CN114088215A (en) | 2021-11-15 | 2021-11-15 | Installation and adjustment device for multi-interferometer combined application |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111351425.3A CN114088215A (en) | 2021-11-15 | 2021-11-15 | Installation and adjustment device for multi-interferometer combined application |
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| CN114088215A true CN114088215A (en) | 2022-02-25 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1758014A (en) * | 2004-10-07 | 2006-04-12 | 三星电子株式会社 | The exposure system that is used for the interferometer system of Displacement Measurement and adopts this interferometer system |
| CN103770044A (en) * | 2014-01-14 | 2014-05-07 | 中国科学院上海光学精密机械研究所 | Six-freedom degree adjusting mounting mechanism |
| CN206292445U (en) * | 2016-12-16 | 2017-06-30 | 九江精达检测技术有限公司 | The high-precision optical of a kind of height and adjustable angle is turned back device |
| CN107687933A (en) * | 2016-08-04 | 2018-02-13 | 中国科学院长春光学精密机械与物理研究所 | A kind of distorting lens system high accuracy rigid body displacement detection method and device |
-
2021
- 2021-11-15 CN CN202111351425.3A patent/CN114088215A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1758014A (en) * | 2004-10-07 | 2006-04-12 | 三星电子株式会社 | The exposure system that is used for the interferometer system of Displacement Measurement and adopts this interferometer system |
| CN103770044A (en) * | 2014-01-14 | 2014-05-07 | 中国科学院上海光学精密机械研究所 | Six-freedom degree adjusting mounting mechanism |
| CN107687933A (en) * | 2016-08-04 | 2018-02-13 | 中国科学院长春光学精密机械与物理研究所 | A kind of distorting lens system high accuracy rigid body displacement detection method and device |
| CN206292445U (en) * | 2016-12-16 | 2017-06-30 | 九江精达检测技术有限公司 | The high-precision optical of a kind of height and adjustable angle is turned back device |
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