CN114061348A - Vapor chamber and preparation method thereof - Google Patents
Vapor chamber and preparation method thereof Download PDFInfo
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- CN114061348A CN114061348A CN202111395114.7A CN202111395114A CN114061348A CN 114061348 A CN114061348 A CN 114061348A CN 202111395114 A CN202111395114 A CN 202111395114A CN 114061348 A CN114061348 A CN 114061348A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
- F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
- F28D15/04—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure
- F28D15/046—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure characterised by the material or the construction of the capillary structure
Abstract
The invention provides a vapor chamber and a preparation method thereof, and relates to the technical field of heat dissipation materials. The vapor chamber comprises an upper plate, a lower plate and a liquid absorption core, wherein the upper plate and the lower plate are sealed into a vacuum cavity, capillary grooves are formed in the inner surfaces of the upper plate and the lower plate which form the vacuum cavity, and the liquid absorption core is sealed in the vacuum cavity. The upper layer plate and the lower layer plate of the vapor chamber are made of graphene materials, the weight and the thickness of the vapor chamber are greatly reduced compared with the traditional copper vapor chamber, and capillary grooves are formed in the inner surface of the vacuum chamber obtained by sealing the graphene material plate, so that the vapor chamber has a higher specific surface area; meanwhile, the liquid absorption core is made of porous graphene materials, and does not have chemical reaction with fluid, so that the environmental adaptability of the graphene vacuum cavity vapor chamber is greatly improved, and the long-term working reliability is realized.
Description
Technical Field
The invention relates to the technical field of heat dissipation materials, in particular to a vapor chamber and a preparation method thereof.
Background
The soaking plate is a plate-shaped heat transfer device which is formed by injecting working liquid into a near-vacuum cavity with a capillary structure arranged inside and can perform phase change heat transfer. The vapor chamber mainly comprises a shell plate, a liquid absorbing core and a liquid filling pipe. The inner part of the soaking plate is of a near vacuum cavity structure, so that the weight is light; external force driving is not needed during working, and energy is saved; the cavity is formed by welding and sealing, so that leakage is avoided, and the device is safe and reliable; the heat transfer mode is phase change heat transfer, and the heat transfer coefficient is high; the heat-conducting device can conduct two-dimensional heat transfer, has high heat-conducting speed, and can quickly transfer and distribute the heat of a point heat source on a heat-radiating surface; the overall dimension can be designed according to specific use occasions; the LED can be directly packaged on the chip base or tightly attached to the chip base, so that the contact thermal resistance is reduced.
Copper soaking plates are generally adopted in the prior art. Among them, the copper vapor chamber usually employs sintered wick, such as silk net fiber, copper powder particles, foam copper, etc. The copper soaking plate has the defects of low heat conductivity coefficient, easy oxidation, small applicable temperature range, large integral mass, internal medium denaturation, inner cavity corrosion and the like in the actual use process. And the copper wick is easily affected by the non-condensable gas, so that the working liquid and the wick generate chemical reaction or electrochemical reaction to generate the non-condensable gas. The non-condensable gas is easy to form an air plug, so that the effective condensation area is reduced, the reflux speed is low, and the heat dissipation efficiency is influenced.
Therefore, it is necessary and urgent to develop a graphene VC vapor chamber (vacuum chamber vapor chamber) that can effectively reduce the weight and thickness of the conventional vapor chamber and is more suitable for the heat dissipation requirements of miniaturization, weight reduction and ultra-thinning.
In view of the above, the present invention is particularly proposed.
Disclosure of Invention
The first purpose of the invention is to provide a vapor chamber, wherein the upper plate, the lower plate and the liquid absorbing core of the vapor chamber are made of graphene materials, so that the weight and the thickness of the vapor chamber are greatly reduced compared with the traditional copper vapor chamber, and the vapor chamber is more suitable for the requirements of the heat dissipation field of miniaturization, light weight and ultra-thinning.
The second purpose of the invention is to provide a preparation method of the vapor chamber.
In order to achieve the above purpose of the present invention, the following technical solutions are adopted:
the invention provides a vapor chamber, which comprises an upper plate, a lower plate and a liquid absorbing core, wherein:
the upper plate and the lower plate are sealed into a vacuum cavity, capillary grooves are formed in the inner surfaces of the upper plate and the lower plate which form the vacuum cavity, and the liquid absorption core is sealed in the vacuum cavity;
the upper layer plate and the lower layer plate are made of graphene materials; the liquid absorption core is made of a porous graphene material.
Furthermore, the upper plate (1) and the lower plate (2) are mainly prepared by sequentially pressing and carbonizing graphene oxide;
preferably, the thickness of the upper layer plate (1) and the lower layer plate (2) is 50-1000 μm independently.
Furthermore, the upper plate (1) and the lower plate (2) are mainly prepared from graphene prepared by a chemical vapor deposition method;
preferably, the thicknesses of the upper plate (1) and the lower plate (2) are respectively and independently 0.01-500 μm.
Furthermore, the width of the capillary groove is 5-10 μm, and the depth is 1-10 μm.
Further, the porous graphene material is graphene porous aerogel or graphene foam;
preferably, the pore diameter of the porous graphene material is 3-30 nm.
Furthermore, the peripheral edges of the upper plate and the lower plate are flat, and can be in sealing contact;
preferably, the peripheral edge of the lower plate has a protrusion for fitting with the upper plate.
Furthermore, one side of the vacuum cavity is provided with a liquid injection hole, and the liquid injection hole is communicated with the vacuum cavity.
The invention provides a preparation method of the vapor chamber, which comprises the following steps:
(a) providing an upper plate and a lower plate which are made of graphene materials, wherein the peripheral edges of the upper plate and the lower plate are flat and can be in sealed contact;
(b) pressing the inner surface of the graphene plate into a capillary groove by using a mold, and aligning and sealing along the peripheral edges of the upper plate and the lower plate to obtain a sealed cavity;
(c) and opening a liquid injection hole at one side of the sealed cavity, injecting liquid into the sealed cavity through the liquid injection hole, vacuumizing and sealing the liquid injection hole to obtain the vapor chamber.
Further, the sealing method is high-temperature hot-press sealing.
Further, the injected liquid in the step (c) is lower alcohol and/or water.
Compared with the prior art, the invention has the beneficial effects that:
the vapor chamber provided by the invention comprises an upper plate, a lower plate and a liquid absorption core, wherein the upper plate and the lower plate are sealed into a vacuum chamber, capillary grooves are formed in the inner surfaces of the upper plate and the lower plate which form the vacuum chamber, and the liquid absorption core is sealed in the vacuum chamber. The upper plate and the lower plate of above-mentioned vacuum cavity soaking plate are graphite alkene material and make, compare in traditional copper soaking plate greatly reduced the weight and the thickness of soaking plate, make it satisfy in the miniaturization more, it is lightweight, the application demand of ultra-thin, the sealed vacuum cavity's that obtains by above-mentioned graphite alkene material board internal surface is provided with the capillary slot, and then make this soaking plate have higher specific surface area, high porosity, high resilience performance, liquid can increase its area of contact rapid condensation backward flow when the evaporation, play one kind between upper plate and lower plate and enlarge effective condensation area and have support and cushioning effect to upper plate and lower plate. Meanwhile, the liquid absorbing core is made of the porous graphene material, and does not have chemical reaction with fluid, so that the problems of internal medium denaturation failure, runner corrosion and the like do not occur, the environmental adaptability of the graphene vacuum cavity vapor chamber is greatly improved, and the long-term working reliability is realized.
In addition, the vapor chamber has very high sealing performance and mechanical property based on the special two-dimensional structure of the graphene material, and has better sealing performance compared with the traditional vapor chamber. Moreover, the graphene (5300W/m.k) has thermal conductivity far higher than that of copper (397W/m.k), so that the heat dissipation capacity of the soaking plate is greatly improved; the common vapor chamber has a low applicable temperature which is usually not more than 100 ℃, the graphene vacuum chamber vapor chamber has ultrahigh thermal conductivity, and a proper liquid medium is used theoretically, so that the applicable temperature range can be greatly improved; meanwhile, the risk of corrosion of the vapor chamber is avoided.
The preparation method of the vapor chamber provided by the invention comprises the following steps of firstly providing an upper plate and a lower plate which are made of graphene materials, wherein the peripheral edges of the upper plate and the lower plate are flat and can be in sealed contact with each other; then, pressing the inner surface of the graphene plate into a capillary groove by using a mold, and aligning and sealing along the peripheral edges of the upper plate and the lower plate to obtain a sealed cavity; then, a liquid injection hole is formed in one side of the sealed cavity, liquid is injected into the sealed cavity through the liquid injection hole, and then the liquid injection hole is vacuumized and sealed to obtain the vapor chamber. The preparation method has the advantages of simple preparation process and easy operation.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
Fig. 1 is a schematic structural view of a vapor chamber provided in embodiment 1 of the present invention;
fig. 2 is a schematic structural view of a vapor chamber provided in embodiment 8 of the present invention;
fig. 3 is a pore size distribution diagram of graphene foam provided in embodiment 1 of the present invention;
fig. 4 is a field emission scan of the graphene foam provided in embodiment 1 of the present invention.
Icon: 1-upper layer plate; 2-lower layer plate; 3-a wick; 4-capillary grooves; and 5-liquid injection hole.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
According to an aspect of the present invention, a vacuum chamber vapor chamber comprising an upper plate, a lower plate, and a wick, wherein:
the upper plate and the lower plate are sealed into a vacuum cavity, capillary grooves are formed in the inner surfaces of the upper plate and the lower plate which form the vacuum cavity, and the liquid absorption core is sealed in the vacuum cavity;
the upper layer plate and the lower layer plate are made of graphene materials; the liquid absorption core is made of a porous graphene material.
The vapor chamber provided by the invention comprises an upper plate, a lower plate and a liquid absorption core, wherein the upper plate and the lower plate are sealed into a vacuum chamber, capillary grooves are formed in the inner surfaces of the upper plate and the lower plate which form the vacuum chamber, and the liquid absorption core is sealed in the vacuum chamber. The upper plate and the lower plate of above-mentioned vacuum cavity soaking board are graphite alkene material and make, compare in traditional copper soaking board greatly reduced the weight and the thickness of soaking board, make it be applicable to the miniaturization more, it is lightweight, the application demand of ultra-thin, the internal surface of the vacuum cavity who obtains by the sealed board of above-mentioned graphite alkene material is provided with the capillary slot, and then make this soaking board have higher specific surface area, high porosity, high resilience performance, liquid can increase its area of contact rapid condensation backward flow when the evaporation, play one kind and enlarge effective condensation area and have support and cushioning effect to upper and lower plywood between upper and lower layer board. Meanwhile, the liquid absorbing core is made of the porous graphene material, and does not have chemical reaction with fluid, so that the problems of internal medium denaturation failure, runner corrosion and the like do not occur, the environmental adaptability of the graphene vacuum cavity vapor chamber is greatly improved, and the long-term working reliability is realized.
In addition, the vapor chamber has very high sealing performance and mechanical property based on the special two-dimensional structure of the graphene material, and has better sealing performance compared with the traditional vapor chamber. Moreover, the graphene (5300W/m.k) has thermal conductivity far higher than that of copper (397W/m.k), so that the heat dissipation capacity of the soaking plate is greatly improved; the common vapor chamber has a low applicable temperature which is usually not more than 100 ℃, the graphene vacuum chamber vapor chamber has ultrahigh thermal conductivity, and a proper liquid medium is used theoretically, so that the applicable temperature range can be greatly improved; meanwhile, the risk of corrosion of the vapor chamber is avoided.
The upper and lower plates are made by various methods. As an alternative embodiment of the present invention, the upper plate and the lower plate are mainly obtained by sequentially pressing and carbonizing graphene oxide.
The specific method comprises the following steps: firstly, oxidizing original graphite into graphene oxide by a chemical method, then pressing graphene oxide slurry into a graphene oxide plate by a coating machine, carbonizing the graphene oxide plate, then carrying out high-temperature hot-pressing reduction to obtain the graphene plate, and finally processing the graphene plate into an upper plate and a lower plate shown in figure 1.
The temperature of carbonization is typically, but not limited to, 900 deg.C, 1000 deg.C, 1100 deg.C or 1200 deg.C. The temperature of the high temperature hot press reduction is typically, but not limited to, 2500 deg.C, 2600 deg.C, 2700 deg.C, 2800 deg.C, 2900 deg.C, or 3000 deg.C.
The size and the specification of the upper layer plate and the lower layer plate manufactured by the manufacturing method can be various, and as a preferred embodiment of the invention, the thickness of the upper layer plate and the thickness of the lower layer plate are respectively and independently 50-1000 mu m. Typical but non-limiting thicknesses are 50 μm, 75 μm, 100 μm, 200 μm, 300 μm, 400 μm, 500 μm, 600 μm, 700 μm, 800 μm, 900 μm or 1000 μm.
As another alternative embodiment of the present invention, the upper and lower plates are mainly made of graphene prepared by a chemical vapor deposition method.
Specifically, the chemical vapor deposition is to grow graphene on a copper foil and transfer the graphene to obtain graphene, the thickness of the graphene can be changed by adjusting and controlling the temperature, the amount of a precursor and the like, the method can be used for preparing high-quality single-layer or few-layer ultrathin graphene, and the ultrathin graphene is processed into a graphene upper layer plate and a graphene lower layer plate with certain specifications after being prepared.
The upper layer plate and the lower layer plate prepared by the preparation method have smaller thickness, and preferably, the thickness of the upper layer plate and the thickness of the lower layer plate are respectively and independently 0.01-500 mu m. Typical but non-limiting thicknesses are 0.01 μm, 0.1 μm, 1 μm, 5 μm, 10 μm, 20 μm, 50 μm, 100 μm, 200 μm, 300 μm, 400 μm or 500 μm.
In a preferred embodiment of the present invention, the capillary groove has a width of 5 to 10 μm and a depth of 1 to 10 μm.
In a preferred embodiment of the present invention, the porous graphene material is graphene porous aerogel or graphene foam.
As a preferred embodiment, the porous graphene material is graphene foam, and the specific preparation method is as follows: dissolving graphene oxide in water to prepare a 6mg/ml graphene oxide aqueous solution, uniformly dispersing the graphene oxide aqueous solution through ultrasonic stirring, placing 500ml of the graphene oxide solution on a polytetrafluoroethylene plate, performing vacuum drying at 60 ℃ for 12 hours, preparing a 5% sodium hydroxide solution, placing a graphene oxide film in the solution, foaming for 5 minutes at room temperature, taking out the graphene oxide film after foaming, naturally drying the graphene oxide film, pretreating the graphene oxide film at low temperature of 100 ℃, carbonizing the graphene oxide film at 800 ℃, graphitizing the graphene oxide film at 2800 ℃ to obtain graphene foam, wherein the graphene foam has high specific surface area, high porosity and high elasticity, and is cut to match upper and lower graphene laminates and is placed between the upper and lower graphene laminates.
In the above preferred embodiment, the pore diameter of the porous graphene material is 3 to 30 nm.
In a preferred embodiment, the pore diameter of the porous graphene material is 5 nm.
In a preferred embodiment of the present invention, the peripheral edges of the upper and lower plates are flat plate-shaped and can be brought into sealing contact;
preferably, the peripheral edge of the lower plate has a protrusion for fitting with the upper plate.
In a preferred embodiment of the present invention, a liquid injection hole is provided at one side of the vacuum chamber, and the liquid injection hole is communicated with the vacuum chamber.
According to an aspect of the present invention, a method for manufacturing the vapor chamber of the vacuum chamber described above includes the steps of:
(a) providing an upper plate and a lower plate which are made of graphene materials, wherein the peripheral edges of the upper plate and the lower plate are flat and can be in sealed contact;
(b) pressing the inner surface of the graphene plate into a capillary groove by using a mold, and aligning and sealing along the peripheral edges of the upper plate and the lower plate to obtain a sealed cavity;
(c) and opening a liquid injection hole at one side of the sealed cavity, injecting liquid into the sealed cavity through the liquid injection hole, vacuumizing and sealing the liquid injection hole to obtain the vapor chamber.
The preparation method of the vapor chamber provided by the invention comprises the following steps of firstly providing an upper plate and a lower plate which are made of graphene materials, wherein the peripheral edges of the upper plate and the lower plate are flat and can be in sealed contact with each other; then, pressing the inner surface of the graphene plate into a capillary groove by using a mold, and aligning and sealing along the peripheral edges of the upper plate and the lower plate to obtain a sealed cavity; then, a liquid injection hole is formed in one side of the sealed cavity, liquid is injected into the sealed cavity through the liquid injection hole, and then the liquid injection hole is vacuumized and sealed to obtain the vapor chamber. The preparation method has the advantages of simple preparation process and easy operation.
In a preferred embodiment of the present invention, the sealing method of the seal is high temperature hot press sealing;
in a preferred embodiment of the present invention, the liquid injected in step (c) is lower alcohol and/or water.
The technical solution of the present invention will be further described with reference to examples and comparative examples.
Example 1
As shown in fig. 1, a vapor chamber of a vacuum chamber comprises an upper plate 1, a lower plate 2 and a wick 3, wherein:
the upper plate 1 and the lower plate 2 are sealed into a vacuum cavity, the inner surfaces of the upper plate 1 and the lower plate 2 which form the vacuum cavity are provided with capillary grooves 4, and the liquid absorption core 3 is sealed in the vacuum cavity;
the upper plate 1 and the lower plate 2 are made of graphene materials; the liquid absorption core 3 is made of porous graphene materials.
Referring to fig. 1, one side of the vacuum chamber is provided with a liquid injection hole 5, and the liquid injection hole 5 is communicated with the vacuum chamber.
The preparation method of the vapor chamber comprises the following steps:
(1) preparing a graphene plate: firstly, oxidizing original graphite into graphene oxide by a chemical method, pressing graphene oxide slurry into a graphene oxide plate by a coating machine, carbonizing the graphene oxide plate at 1000 ℃, hot-pressing and reducing the graphene oxide plate at 3000 ℃ to form the graphene plate, and finally processing the graphene plate into an upper plate and a lower plate shown in figure 1, wherein the specification of the upper plate and the lower plate of the graphene is 5cm and the thickness of the upper plate and the lower plate of the graphene is 100 mu m;
(2) respectively taking the graphene plates as an upper plate and a lower plate, processing the inner surfaces of the upper plate and the lower plate, and pressing the inner surfaces of the upper plate and the lower plate into concave groove-shaped zigzag-arranged capillary grooves 4 through a die; meanwhile, the peripheral edge of the lower layer plate 2 is designed to be convex, and is provided with a liquid injection hole, and the peripheral edge of the upper layer plate 1 is designed to be flat, so that the peripheral edge can be in sealed contact with the lower layer plate;
(3) preparing a liquid absorption core: dissolving graphene oxide in water to prepare a 6mg/ml graphene oxide aqueous solution, uniformly dispersing the graphene oxide aqueous solution through ultrasonic stirring, placing 500ml of the graphene oxide solution on a polytetrafluoroethylene plate, performing vacuum drying at 60 ℃ for 12 hours, preparing a 5% sodium hydroxide solution, placing a graphene oxide film in the solution, foaming for 5 minutes at room temperature, taking out the graphene oxide film after foaming, naturally drying the graphene oxide film, pretreating the graphene oxide film at a low temperature of 100 ℃, carbonizing the graphene oxide film at 800 ℃, graphitizing the graphene oxide film at 2800 ℃ to obtain graphene foam, wherein the graphene foam has a high specific surface area, a high porosity and a high elasticity, is cut to match upper and lower graphene plates, and is placed between the upper and lower graphene plates;
fig. 3 is a pore size distribution diagram of the graphene foam prepared in this embodiment.
Fig. 4 is a field emission scan of the graphene foam prepared in this example.
As can be seen from the figure 4, the foam has a large hole-shaped structure inside, and the lamella are spread, so that the vapor in the soaking plate can contact with more internal surface area, and the vapor can be rapidly condensed and reflowed.
(4) Aligning the upper plate 1 and the lower plate 2, and performing high-temperature mould pressing sealing to obtain a sealing chamber, wherein the liquid injection hole is not sealed in the step;
(5) injecting deionized water into the sealing chamber through the liquid injection hole, vacuumizing, and carrying out high-temperature hot-pressing sealing on the liquid injection hole to obtain the vapor chamber.
Example 2
A preparation method of a vapor chamber, comprising the following steps:
(1) preparing a graphene plate: firstly, oxidizing original graphite into graphene oxide by a chemical method, pressing graphene oxide slurry into a graphene oxide plate by a coating machine, carbonizing the graphene oxide plate at 1000 ℃, hot-pressing and reducing the graphene oxide plate at 3000 ℃ to form a graphene plate, and finally processing the graphene plate into an upper plate and a lower plate shown in figure 1, wherein the specification of the upper plate and the lower plate of the graphene is 5 x 5cm, and the thickness of the upper plate and the lower plate of the graphene is 150 microns;
(2) the same as in example 1;
(3) preparing a liquid absorption core: dissolving graphene oxide in water to prepare a 6mg/ml graphene oxide aqueous solution, uniformly dispersing the graphene oxide aqueous solution through ultrasonic stirring, placing 500ml of the graphene oxide solution on a polytetrafluoroethylene plate, performing vacuum drying at 60 ℃ for 12 hours, preparing a 5% sodium hydroxide solution, placing a graphene oxide film in the solution, foaming for 5 minutes at room temperature, taking out the graphene oxide film after foaming, naturally drying the graphene oxide film, pretreating the graphene oxide film at a low temperature of 100 ℃, carbonizing the graphene oxide film at 800 ℃, graphitizing the graphene oxide film at 2800 ℃ to obtain graphene foam, wherein the graphene foam has a high specific surface area, a high porosity and a high elasticity, is cut to match upper and lower graphene plates, and is placed between the upper and lower graphene plates;
(4) the same as in example 1;
(5) the same procedure as in example 1 was repeated.
Example 3
A preparation method of a vapor chamber, comprising the following steps:
(1) preparing a graphene plate: firstly, oxidizing original graphite into graphene oxide by a chemical method, pressing graphene oxide slurry into a graphene oxide plate by a coating machine, carbonizing the graphene oxide plate at 1000 ℃, hot-pressing and reducing the graphene oxide plate at 3000 ℃ to form a graphene plate, and finally processing the graphene plate into an upper plate and a lower plate shown in figure 1, wherein the specification of the upper plate and the lower plate of the graphene is 5 x 5cm, and the thickness of the upper plate and the lower plate of the graphene is 150 microns;
(2) the same as in example 1;
(3) preparing a liquid absorption core: dissolving graphene oxide in water to prepare a 10mg/ml graphene oxide aqueous solution, uniformly dispersing the graphene oxide aqueous solution through ultrasonic stirring, placing 300ml of the graphene oxide solution on a polytetrafluoroethylene plate, performing vacuum drying at 60 ℃ for 12 hours, preparing a 5% sodium hydroxide solution, placing a graphene oxide film in the solution, foaming for 5 minutes at room temperature, taking out the graphene oxide film after foaming, naturally drying the graphene oxide film, pretreating the graphene oxide film at a low temperature of 100 ℃, carbonizing the graphene oxide film at 800 ℃, graphitizing the graphene oxide film at 2800 ℃ to obtain graphene foam, wherein the graphene foam has a high specific surface area, a high porosity and a high elasticity, is cut to match upper and lower graphene plates, and is placed between the upper and lower graphene plates;
(4) the same as in example 1;
(5) the same procedure as in example 1 was repeated.
Example 4
A preparation method of a vapor chamber, comprising the following steps:
(1) preparing a graphene plate: firstly, oxidizing original graphite into graphene oxide by a chemical method, pressing graphene oxide slurry into a graphene oxide plate by a coating machine, carbonizing the graphene oxide plate at 1000 ℃, hot-pressing and reducing the graphene oxide plate at 3000 ℃ to form the graphene plate, and finally processing the graphene plate into an upper plate and a lower plate shown in figure 1, wherein the specification of the upper plate and the lower plate of the graphene is 5cm and the thickness of the upper plate and the lower plate of the graphene is 100 mu m;
(2) the same as in example 1;
(3) preparing a liquid absorption core: dissolving graphene oxide in water to prepare a 4mg/ml graphene oxide aqueous solution, uniformly dispersing the graphene oxide aqueous solution through ultrasonic stirring, adding 200ml graphene oxide solution and 800mg sodium hydroxide into the graphene oxide solution, stirring at room temperature for 30 minutes, uniformly stirring, transferring the mixture into a sealed mould, keeping the temperature at 95 ℃ for 3 hours to obtain graphene hydrogel, cleaning the graphene hydrogel for a plurality of times by using an ethanol aqueous solution, freezing at-20 ℃, and drying for 48 hours by using a freeze dryer to obtain graphene porous aerogel, wherein the graphene porous aerogel has high specific surface area, high porosity and high elasticity and is placed between an upper laminate and a lower laminate of graphene;
(4) the same as in example 1;
(5) the same procedure as in example 1 was repeated.
Example 5
A preparation method of a vapor chamber, comprising the following steps:
(1) preparing a graphene plate: the same as example 4;
(2) the same as example 4;
(3) preparing a liquid absorption core: dissolving graphene oxide in water to prepare a 4mg/ml graphene oxide aqueous solution, uniformly dispersing the graphene oxide aqueous solution through ultrasonic stirring, adding 200ml graphene oxide solution and 800mg sodium hydroxide into the graphene oxide solution, stirring for 30 minutes at room temperature, then adding 1600mg glucose, uniformly stirring, transferring the mixture into a sealed mould, and preserving heat at 95 ℃ for 3 hours to obtain graphene hydrogel, washing the graphene hydrogel with an ethanol aqueous solution for a plurality of times, freezing at-20 ℃ and drying for 48 hours with a freeze dryer to obtain the graphene porous aerogel, wherein the graphene porous aerogel has a high specific surface area, a high porosity and a high elasticity and is placed between an upper laminate and a lower laminate of graphene;
(4) the same as example 4;
(5) the same procedure as in example 4 was repeated.
Example 6
A preparation method of a vapor chamber, comprising the following steps:
(1) preparing a graphene plate: firstly, oxidizing original graphite into graphene oxide by a chemical method, pressing graphene oxide slurry into a graphene oxide plate by a coating machine, carbonizing the graphene oxide plate at 1000 ℃, hot-pressing and reducing the graphene oxide plate at 3000 ℃ to form a graphene plate, and finally processing the graphene plate into an upper plate and a lower plate shown in figure 1, wherein the specification of the upper plate and the lower plate of the graphene is 5 x 5cm, and the thickness of the upper plate and the lower plate of the graphene is 150 microns;
(2) the same as example 4;
(3) preparing a liquid absorption core: dissolving graphene oxide in water to prepare a 4mg/ml graphene oxide aqueous solution, uniformly dispersing the graphene oxide aqueous solution through ultrasonic stirring, adding 200ml graphene oxide solution and 800mg sodium hydroxide into the graphene oxide solution, stirring for 30 minutes at room temperature, then adding 1600mg glucose, uniformly stirring, transferring the mixture into a sealed mould, and preserving heat at 95 ℃ for 3 hours to obtain graphene hydrogel, washing the graphene hydrogel with an ethanol aqueous solution for a plurality of times, freezing at-20 ℃ and drying for 48 hours with a freeze dryer to obtain the graphene porous aerogel, wherein the graphene porous aerogel has a high specific surface area, a high porosity and a high elasticity and is placed between an upper laminate and a lower laminate of graphene;
(4) the same as example 4;
(5) the same procedure as in example 4 was repeated.
Example 7
A preparation method of a vapor chamber, comprising the following steps:
(1) preparing a graphene plate: firstly, oxidizing original graphite into graphene oxide by a chemical method, pressing graphene oxide slurry into a graphene oxide plate by a coating machine, carbonizing the graphene oxide plate at 1000 ℃, hot-pressing and reducing the graphene oxide plate into a graphene plate at 3000 ℃ at high temperature, and finally processing the graphene plate into an upper plate and a lower plate, wherein the specification of the upper plate and the lower plate of the graphene is 5 x 5cm, and the thickness of the upper plate and the lower plate of the graphene is 50 microns;
(2) respectively taking the graphene plates as an upper plate and a lower plate, processing the inner surfaces of the upper plate and the lower plate, and etching the inner surfaces of the upper plate and the lower plate into concave groove-shaped zigzag capillary grooves by laser etching, wherein the depth of each capillary groove is 5 microns; meanwhile, the peripheral edge of the lower layer plate is designed to be convex, and is provided with a liquid injection hole, and the peripheral edge of the upper layer plate is designed to be flat-shaped, so that the peripheral edge can be in sealed contact with the lower layer plate;
(3) preparing a liquid absorption core: dissolving graphene oxide in water to prepare a 6mg/ml graphene oxide aqueous solution, uniformly dispersing the graphene oxide aqueous solution through ultrasonic stirring, placing 500ml of the graphene oxide solution on a polytetrafluoroethylene plate, performing vacuum drying at 60 ℃ for 12 hours, preparing a 5% sodium hydroxide solution, placing a graphene oxide film in the solution, foaming for 5 minutes at room temperature, taking out the graphene oxide film after foaming, naturally drying the graphene oxide film, pretreating the graphene oxide film at a low temperature of 100 ℃, carbonizing the graphene oxide film at 800 ℃, graphitizing the graphene oxide film at 2800 ℃ to obtain graphene foam, wherein the graphene foam has a high specific surface area, a high porosity and a high elasticity, is cut to match upper and lower graphene plates, and is placed between the upper and lower graphene plates to serve as a wick;
(4) aligning the upper layer plate and the lower layer plate, and performing high-temperature mould pressing sealing to obtain a sealing chamber, wherein the liquid injection hole is not sealed in the step;
(5) injecting deionized water into the sealing chamber through the liquid injection hole, vacuumizing, and carrying out high-temperature hot-pressing sealing on the liquid injection hole to obtain the vapor chamber.
Example 8
A preparation method of a vapor chamber, comprising the following steps:
(1) preparing a graphene plate: preparing ultrathin graphene by adopting a chemical vapor deposition method, specifically, carrying out ultrasonic treatment on a copper foil in acetone and ethanol for 10 minutes, cleaning the copper foil by using deionized water, then drying the cleaned copper foil by using high-purity nitrogen, placing the cleaned copper foil in a quartz box, sending the copper foil into a constant-temperature area of a tubular furnace by using a push rod, closing a furnace door, then pumping out air, pumping the vacuum degree to 100Pa, introducing hydrogen and argon mixed gas, heating the copper foil to 1000 ℃ for 30 minutes at an air flow rate of 100sccm, realizing annealing treatment of the copper foil, introducing acetylene at an acetylene flow rate of 10sccm after the annealing is finished, keeping the temperature at 950 ℃ for a certain time, taking out the copper foil after the annealing is finished, carrying out etching transfer on the graphene by adopting a PMMA auxiliary method to obtain few layers of ultrathin graphene, and finally pressing the graphene plate to be processed into an upper layer plate 1 and a lower layer plate 2, wherein the specification of the upper layer plate and the lower layer plate of the graphene is 5cm and the thickness is processed to be 0.1 mu m;
(2) - (5) A vapor chamber of the same construction as in example 1 as shown in FIG. 2 was obtained.
Comparative example 1
The present comparative example provides a vapor chamber comprising: the first plate body is provided with an inward concave part, and the edge of the first plate body is provided with a first positioning groove; the second plate body is arranged opposite to the first plate body and forms a cavity with the inner concave part of the first plate body, and a second positioning groove is correspondingly arranged at the edge of the second plate body and forms a positioning cavity with the first positioning groove; the liquid absorption core is arranged in the cavity; the heat transfer medium is packaged in the cavity; and the preformed welding flux is arranged in the positioning cavity and is used for realizing the welding of the first plate body and the second plate body.
The specific preparation process of the soaking plate provided by the comparative example can be referred to as CN202011220624.6, a soaking plate and a preparation method thereof.
Comparative example 2
The present comparative example provides a vapor chamber comprising the steps of:
(1) preparing a copper plate: preparing copper foil by adopting a stamping process, and processing the copper foil into an upper layer plate and a lower layer plate, wherein the specifications of the upper layer plate and the lower layer plate are 5cm by 5cm, and the thicknesses of the upper layer plate and the lower layer plate are 150 micrometers;
(2) respectively taking the upper layer plate and the lower layer plate, processing the inner surfaces of the upper layer plate and the lower layer plate, and etching the inner surfaces of the upper layer plate and the lower layer plate into concave groove-shaped zigzag capillary grooves by chemical etching, wherein the depth of each capillary groove is 5 mu m; meanwhile, the peripheral edge of the lower layer plate is designed to be convex, and is provided with a liquid injection hole, and the peripheral edge of the upper layer plate is designed to be flat-shaped, so that the peripheral edge can be in sealed contact with the lower layer plate;
(3) the same as example 2;
(4) aligning the upper layer plate and the lower layer plate, assembling and welding to obtain a sealed chamber, wherein the liquid injection hole is not sealed in the step;
(5) injecting deionized water into the sealed chamber through the liquid injection hole, vacuumizing, and welding and sealing the liquid injection hole to obtain the soaking plate.
Experimental example 1
In order to show that the vacuum cavity vapor chamber prepared by the invention has the advantages of light weight, good sealing property, good mechanical property and higher thermal conductivity, the vacuum cavity vapor chamber prepared by the embodiments 1-8 and the comparative examples 1-2 is specially subjected to performance detection.
Through detection, the density of the upper and lower graphene plates provided by the invention is about 1-2g/cm3The density of the graphene foam is about 0.1-1g/cm3Much lower than the density of copper, 8.9g/cm3The light weight is shown. The thermal conductivity of the upper and lower graphene plates is 1500-2000W/m.K, and the theoretical value (5300W/m.K) is far higher than the thermal conductivity 397W/m.K of copper, which shows that the thermal conductivity of the graphene vapor chamber is high, and heat can be rapidly transferred. And the graphene has good toughness, can be bent and stretched, and is more suitable for heat conduction in some light and flexible fields.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. A vacuum chamber vapor chamber, comprising an upper plate (1), a lower plate (2) and a wick (3), wherein:
the upper plate (1) and the lower plate (2) are sealed into a vacuum cavity, capillary grooves (4) are formed in the inner surfaces of the upper plate (1) and the lower plate (2) which form the vacuum cavity, and the liquid absorption core (3) is sealed in the vacuum cavity;
the upper plate (1) and the lower plate (2) are made of graphene materials; the liquid absorption core (3) is made of a porous graphene material.
2. The vapor chamber of claim 1, wherein the upper plate (1) and the lower plate (2) are mainly prepared by sequentially pressing and carbonizing graphene oxide;
preferably, the thickness of the upper layer plate (1) and the lower layer plate (2) is 50-1000 μm independently.
3. A vapor chamber in accordance with claim 1, wherein the upper plate (1) and the lower plate (2) are mainly made of graphene made by chemical vapor deposition;
preferably, the thicknesses of the upper plate (1) and the lower plate (2) are respectively and independently 0.01-500 μm.
4. A vapor chamber in accordance with claim 1, characterized in that the capillary groove (4) has a width of 5-10 μm and a depth of 1-10 μm.
5. The vacuum chamber vapor chamber of claim 1, wherein the porous graphene material is graphene cellular aerogel or graphene foam;
preferably, the pore diameter of the porous graphene material is 3-30 nm.
6. A vapor chamber in accordance with claim 1, wherein the peripheral edges of the upper plate (1) and the lower plate (2) are flat plate-like and can be brought into sealing contact;
preferably, the peripheral edge of the lower plate (2) has a protrusion for fitting with the upper plate (1).
7. A vapor chamber in accordance with claim 1, wherein a liquid injection hole (5) is provided at one side of the vacuum chamber, and the liquid injection hole (5) communicates with the vacuum chamber.
8. A method for manufacturing a vapor chamber of any one of claims 1 to 7, wherein the method comprises the steps of:
(a) the graphene-based composite plate comprises an upper plate (1) and a lower plate (2) which are made of graphene materials, wherein the peripheral edges of the upper plate (1) and the lower plate (2) are flat and can be in sealed contact;
(b) pressing capillary grooves (4) on the inner surfaces of the upper plate (1) and the lower plate (2) by using a die, and aligning and sealing along the peripheral edges of the upper plate (1) and the lower plate (2) to obtain a sealed cavity;
(c) and one side of the sealed cavity is provided with a liquid injection hole (5), liquid is injected into the sealed cavity through the liquid injection hole (5), and then the liquid injection hole is vacuumized and sealed to obtain the vapor chamber.
9. The method for manufacturing a vapor chamber of claim 8, wherein the sealing method is a high temperature thermocompression sealing.
10. The method for preparing a vapor chamber of claim 8 or 9, wherein the liquid injected in the step (c) is lower alcohol and/or water.
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