CN113934111A - Nano-imprinting equipment with double-sided imprinting function - Google Patents
Nano-imprinting equipment with double-sided imprinting function Download PDFInfo
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- CN113934111A CN113934111A CN202111316483.2A CN202111316483A CN113934111A CN 113934111 A CN113934111 A CN 113934111A CN 202111316483 A CN202111316483 A CN 202111316483A CN 113934111 A CN113934111 A CN 113934111A
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- platen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a nano-imprinting device with a double-sided imprinting function, which comprises: the alignment unit is positioned in the equipment cavity and fixed above the equipment; the first stamping plate is positioned above the inner part of the equipment cavity and below the alignment unit; the third stamping plate is positioned below the equipment cavity and below the alignment unit; the second platen is positioned below the cavity of the equipment and on one side of the third platen, and the exposure unit is positioned below the third platen; the device also comprises a substrate and a working mold. The invention has the beneficial effects that: the first stamping plate, the second stamping plate and the third stamping plate are combined with the alignment unit to realize automatic alignment and rotation of the substrate, so that single-sided stamping action and double-sided stamping action can be finished; the exposure unit emits ultraviolet light to solidify the nanoimprint lithography glue.
Description
Technical Field
The invention relates to the technical field of nano-imprinting, in particular to nano-imprinting equipment with a double-sided imprinting function.
Background
The nano-imprinting technology is a technology for transferring a micro-nano structure on a template to a material to be processed through assistance of photoresist, and can be divided into hot imprinting, ultraviolet imprinting, micro-contact imprinting, stepping imprinting and the like according to a curing mode, an imprinting area, the template and the like. In order to reduce the production cost and improve the imprinting accuracy, the substrate needs to be imprinted with micro-nano structures as many as possible, and the structure loss phenomenon does not occur. Therefore, there is a need for an improved imprint apparatus to achieve double-sided imprinting of substrates.
Disclosure of Invention
The invention aims to overcome the technical defects and provides a nano-imprinting device with a double-sided imprinting function.
The technical scheme adopted by the invention for realizing the technical purpose is as follows: a nanoimprinting apparatus with double-sided imprinting function, comprising: the device comprises a platen, an alignment unit and an exposure unit, wherein the platen comprises a first platen, a second platen and a third platen,
the alignment unit is positioned in the equipment cavity and fixed above the equipment; the first stamping plate is positioned above the inner part of the equipment cavity and below the alignment unit; the third stamping plate is positioned below the equipment cavity and below the alignment unit; the second platen is positioned below the cavity of the equipment and on one side of the third platen, and the exposure unit is positioned below the third platen;
the substrate is fixed on the lower surface of the first stamping plate, and alignment marks are arranged on the substrate; the working die comprises a first working die and a second working die, and alignment marks corresponding to the alignment marks are arranged on the working die.
Preferably, the first stamping plate comprises a moving block, a limiting block and a guide rail, and the first stamping plate drives the adsorption fixing plate to move left and right;
the first stamping plate also comprises a motor, a telescopic rod, a connecting block and a fixing block, and the motor drives the adsorption fixing plate to move up and down to complete the first stamping action;
the middle area of the adsorption fixing plate is provided with a transparent area, the lower surface of the adsorption fixing plate is provided with a vacuum groove, and a vacuum hole connected with a vacuum pump is arranged in the vacuum groove;
the first stamping plate is used for fixing the substrate and driving the substrate to move up and down to complete stamping.
Preferably, the second stamping plate comprises an overturning fixing plate for adsorbing and fixing a second working mold, a vacuum groove is formed in the upper surface of the overturning fixing plate, a vacuum hole is formed in the vacuum groove, a working mold positioning groove is formed in the outer side of the vacuum groove, a buffering fixing block is arranged on one side, away from the rotating shaft, of the outer side of the working mold positioning groove, and a transparent area is arranged in the central area of the overturning fixing plate;
the second stamping plate further comprises a rotating shaft, a supporting column, a rotating shaft supporting column, a supporting column and a supporting column lifting motor, the second stamping plate is connected to the rotating shaft in a clamped mode and can rotate around the rotating shaft, and the second stamping plate is used for adsorbing and fixing a second working mold.
Preferably, the third stamping plate comprises a vacuum groove arranged on the upper surface, a vacuum hole is arranged in the vacuum groove, and a working mold positioning groove is arranged on the outer side of the vacuum groove;
the third stamping plate further comprises a front and rear moving block, a left and right moving block, a lifting rod, a motor, a rotating block and a rotating motor, wherein the front and rear moving block is used for driving the first working mold to move front and back, the left and right moving block is used for driving the first working mold to move left and right, the lifting rod and the motor are used for driving the first working mold to move up and down, and the rotating block and the rotating motor are used for driving the first working mold to rotate.
Preferably, the counterpoint unit is located between two guide rails, and the counterpoint unit includes motor, telescopic link, fixed block, counterpoint subassembly, and the motor drives the telescopic link extension or shortens to drive the subassembly of counterpointing and reciprocate, telescopic link and counterpoint subassembly are connected to the fixed block.
Preferably, the exposure unit comprises an ultraviolet lamp, a fixed block, a lifting rod and a motor, wherein the ultraviolet lamp is positioned under a transparent area of the third pressing plate, and ultraviolet light emitted by the ultraviolet lamp can penetrate through the transparent area in the middle of the third pressing plate, the substrate and the working mold; the fixed block is connected with the ultraviolet lamp and the lifting rod, and the motor pushes the lifting rod to stretch so as to drive the ultraviolet lamp to move up and down.
The invention has the beneficial effects that: the stamping plates comprise a first stamping plate, a second stamping plate and a third stamping plate, and the automatic alignment and rotation of the substrate are realized by combining the alignment unit, so that the single-sided stamping action and the double-sided stamping action can be finished; the exposure unit emits ultraviolet light to solidify the nanoimprint lithography glue.
Drawings
FIG. 1 is a schematic diagram of the apparatus of the present invention;
FIG. 2 is a top view of the apparatus of the present invention;
FIG. 3 is a schematic view of the structure of the lower surface of a first platen 1 of the apparatus of the present invention;
figure 4 is a front view of a first platen 1 of the apparatus of the present invention;
FIG. 5 is a schematic view of the upper surface of a second platen 2 of the apparatus of the present invention;
FIG. 6 is a front view of a second platen 2 of the apparatus of the present invention;
FIG. 7 is a schematic view of the structure of the upper surface of a third platen 3 of the apparatus of the present invention;
FIG. 8 is a front elevation view of a third platen 3 of the apparatus of the present invention;
FIG. 9 is a schematic view of the imprinting process of the apparatus of the present invention;
fig. 10-16 are schematic views of the stations of the apparatus of the present invention during double-sided imprinting.
Labeled as: 1. a first platen; 11. a moving block; 111. a limiting block; 112. a guide rail; 12. a motor; 13. a telescopic rod; 14. connecting blocks; 15. a fixed block; 16. adsorbing the fixed plate; 17. a transparent region; 171. a vacuum hole; 172. a vacuum tank;
2. a second platen; 21. turning over the fixing plate; 211. a vacuum tank; 212. a vacuum hole;
22. buffering the fixed block; 23. a rotating shaft; 24. a working mold locating slot; 25. a transparent region;
26. a support pillar; 27. a rotating shaft supporting column; 28. a support pillar; 29. a support column lifting motor;
3. a third platen; 31. a vacuum tank; 32. a vacuum hole; 33. a working mold locating slot; 34. a front and rear moving block; 35. a left moving block and a right moving block; 36. a lifting rod; 37. a motor; 38. rotating the block; 39. a rotating electric machine;
4. a contraposition unit; 41. a motor; 42. a telescopic rod; 43. a fixed block; 44. aligning the assembly;
5. an exposure unit; 51. an ultraviolet lamp; 52. a fixed block; 53. a lifting rod; 54. a motor;
6. a substrate; 61. aligning and marking;
7. working a mold; 71. a first working mold; 72. a second working mold; 73. aligning and marking;
Detailed Description
The invention will be further described with reference to the following examples:
example one
As shown in fig. 1-16:
a nanoimprinting apparatus with double-sided imprinting function, comprising: a platen, a positioning unit 4, and an exposure unit 5. The platens include a first platen 1, a second platen 2, and a third platen 3.
The first stamping plate 1 is positioned above the inner part of the equipment cavity and below the aligning unit 4. The first stamping plate 1 is used for fixing the substrate 6 and driving the substrate 6 to move up and down to complete stamping.
The first platen 1 includes a moving block 11, a stopper 111, and a guide rail 112, and drives the adsorption fixing plate 16 to move left and right.
The first stamping plate 1 further comprises a motor 12, an expansion rod 13, a connecting block 14 and a fixing block 15, and the motor drives an adsorption fixing plate 16 to move up and down to complete a first stamping action.
The middle region of the adsorption fixing plate 16 is provided with a transparent region 17, the lower surface of the adsorption fixing plate 16 is provided with a vacuum groove 172, and a vacuum hole 171 connected with a vacuum pump is arranged in the vacuum groove 172.
The second platen 2 is engaged with the rotary shaft 23 and is rotatable about the rotary shaft 23. The second platen 2 is used to suction-fix the second working mold 72.
The second platen includes an inversion fixing plate 21 for fixing the second working mold 72 by suction, a vacuum groove 211 is formed in an upper surface of the inversion fixing plate 21, and a vacuum hole 212 is formed in the vacuum groove 211. The outside of the vacuum groove 211 is provided with a working mold positioning groove 24. Outside the working mold positioning groove 24, a buffering fixed block 22 is arranged on one side away from the rotating shaft, the buffering fixed block is an electromagnet, and when the turnover fixing plate 21 rotates to the position above the third pressing plate 3 around the rotating shaft 23, the turnover fixing plate 21 is fixed through magnetic force when powered on. The central area of the turnover fixing plate 21 is provided with a transparent area 25, and the relative position of the alignment mark can be observed by the alignment unit through the transparent area 25.
The second platen 2 further includes a rotary shaft 23, a support column 26, a rotary shaft support column 27, a support column 28, and a support column lift motor 29.
The third platen 3 is located below the apparatus chamber below the counter-rotating unit 4. The third platen 3 fixes the first working mold 71 by suction.
The third platen 3 includes a vacuum groove 31 formed in an upper surface thereof, vacuum holes 32 formed in the vacuum groove 31, and a mold positioning groove 33 formed outside the vacuum groove 31.
The third platen 3 further includes a front-rear moving block 34 for moving the first working mold 71, a left-right moving block 35, a lift lever 36, a motor 37, a rotating block 38, and a rotating motor 39.
The forward and backward moving block 34 is used for moving the first working mold forward and backward.
The left and right moving block 35 is used for driving the first working mold to move left and right.
The lifting rod 36 and the motor 37 are used for driving the first working mold 71 to move up and down.
The rotating block 38 and the rotating motor 39 are used for driving the first working mold 71 to rotate.
The alignment unit 4 is located inside the equipment cavity and fixed above the equipment. The alignment unit is located between the two guide rails 112. The alignment unit 4 comprises a motor 41, an expansion link 42, a fixing block 43 and an alignment assembly 44. The motor 41 extends or shortens the telescopic rod 42 to drive the alignment assembly 44 to move up and down. The fixed block is connected with the telescopic rod 42 and the alignment component 44.
The exposure unit 5 is positioned below the third stamping plate 3, and after the two stamping processes are finished, the exposure unit 5 emits ultraviolet light to solidify the nano stamping glue. The exposure unit 5 includes an ultraviolet lamp 51, a fixed block 52, a lifting rod 53, and a motor 54. The uv lamps 51 are located directly below the transparent region of the third platen 3 and the uv light emitted by the uv lamps 51 is transmitted through the transparent region in the middle of the third platen 3, the substrate 6 and the working mold 7. The fixed block 52 is connected with the ultraviolet lamp 51 and the lifting rod 53. The motor 54 drives the lifting rod to extend and retract so as to drive the ultraviolet lamp 51 to move up and down.
The substrate 6 is fixed on the lower surface of the adsorption fixing plate 16 of the first stamping plate 1, and the substrate 6 is provided with an alignment mark 61;
the working die 7 includes a first working die 71 and a second working die 72. The working mold is provided with alignment marks 73 corresponding to the alignment marks 61.
The working principle and the working process of the invention are as follows:
as shown in fig. 8-16:
and (3) double-sided stamping process:
s1: reduction of position
And returning each unit to the original position and recording the current position. The first platen 1 is positioned below the aligning unit 4.
S2: feeding material
The first working mold 71 adsorption fixing process:
the four corners of the first working mold 71 are flush with the working mold positioning grooves 33, the vacuum in the vacuum groove 31 region is opened, the first working mold 71 is adsorbed and fixed on the upper surface of the third platen 3, and the nanostructure surface of the first working mold faces upward.
Suction fixing process of the second working mold 72:
the four corners of the second working mold 72 are flush with the working mold positioning grooves 211, the vacuum in the vacuum groove 211 area is opened, the second working mold 72 is fixed on the upper surface of the second pressing plate 2 in an absorbing manner, and the nano-structure surface of the second working mold faces upwards.
Adsorption and fixation of the substrate 6:
the substrate 6 is placed on the lower surface of the adsorption/fixation plate 16 of the first platen 1, and the substrate 6 is adsorbed and fixed by opening the vacuum chamber 172.
S3: glue dispensing
Dispensing is performed at the center of the first working mold 71 which is fixed to the upper surface of the third platen 3 by suction, and dispensing is performed (dispensing device is not shown, and dispensing can be performed manually).
S4: first time of alignment
After dispensing, the motor 12 extends the telescopic rod 13 to drive the absorption fixing plate 16 to move downward to a position where the nanoimprint glue at the center of the first working mold 71 does not contact the substrate 6.
The motor 41 of the alignment unit 4 extends the telescopic rod 42 to drive the alignment assembly 44 to move to the position right above the transparent region 17. The alignment unit 41 observes the relative positions of the alignment marks 61 and 73, processes the information, and feeds the information back to the third platen 3. The forward and backward moving block 34 moves the first working mold 71 forward and backward. The left and right moving block 35 moves the first working mold 71 left and right. The rotary motor 39 rotates the rotary block 38, thereby rotating the first working mold 71. Finally, the alignment marks 73 of the first working mold 71 and the alignment marks 61 of the substrate 6 are aligned in the vertical direction.
After the alignment is completed, the alignment unit returns to the original position.
S5: first impression
And after the first alignment action is finished, carrying out a first stamping action to finish stamping the lower surface of the substrate 6. After the positioning operation is completed, the first working mold 71 is not movable in all directions, and the substrate 6 can be moved only in the up-down direction.
The motor 12 extends the telescopic rod 13 to drive the adsorption fixing plate 16 to move downwards, the substrate 6 moves downwards along with the adsorption fixing plate 16, and the colloid is pushed to expand from the center of the first working mold 71 to the periphery to fill the nano-imprinting structure.
S6: reduction of position
After the first imprinting operation is completed, the vacuum groove 172 releases the substrate 6, the first platen 1 returns to the origin position, and the first platen 1 moves in the direction of the second platen 2 along the guide rails 112.
S7: glue dispensing
After the first imprinting is completed, preparation for the second imprinting is performed. First, dispensing is performed at the center of the upper surface of the substrate 6. The nano-imprint glue dispensed twice can be the same or different.
S8: second alignment
The inverting fixing plate 21 is rotated around the rotation shaft 23, and the inverting fixing plate 21 is inverted to be above the third platen 3 with the nanostructure surface of the second working mold 72 facing downward. Outside the working mold positioning groove 24, a buffering fixed block 22 is arranged on one side away from the rotating shaft, the buffering fixed block is an electromagnet, and when the turnover fixing plate 21 rotates to the position above the third pressing plate 3 around the rotating shaft 23, the turnover fixing plate 21 is fixed through magnetic force when powered on.
The motor 41 of the alignment unit 4 extends the telescopic rod 42 to drive the alignment assembly 44 to move to the position right above the transparent area 25. The alignment unit 41 observes the relative positions of the alignment marks 61 and 73, processes the information, and feeds the information back to the third platen 3. The forward and backward moving block 34 moves the first working mold 71 forward and backward. The left and right moving block 35 moves the first working mold 71 left and right. The rotary motor 39 rotates the rotary block 38, thereby rotating the first working mold 71. Finally, the alignment marks 73 of the first working mold 71, the second working mold 72, and the alignment marks 61 of the substrate 6 are aligned in the vertical direction.
After the alignment is completed, the alignment unit returns to the original position.
S9: second embossing
After the alignment is completed, the second working mold 72 is fixed, and the third platen 3 can only move up and down.
The motor 37 extends the lifting rod 36 to drive the first working mold 71 and the substrate 6 to move upwards, and push the colloid to expand from the center of the substrate 6 to the periphery, so as to fill the nano-imprinting structure.
S10: exposure method
After the two imprints are completed, the UV curing process is started. The motor 54 extends the lift bar 53 and moves the uv lamp 51 under the third platen 3. The ultraviolet lamp 51 emits ultraviolet light to penetrate through the third stamping plate 3, the working mold 7 and the substrate 6, and the nano-imprinting glue is cured.
S11: separation of
The vacuum grooves 211 and 31 of the second and third platens 2 and 71 release the second and first working dies 72 and 71, respectively, and are manually separated. Completing the double-sided nanoimprint process.
The single-sided imprinting only needs to complete the steps of S1-5, S10 and S11.
Claims (6)
1. A nanoimprinting apparatus with double-sided imprinting function, comprising: platen, counterpoint unit and exposure unit, its characterized in that: the platens including a first platen, a second platen and a third platen,
the alignment unit is positioned in the equipment cavity and fixed above the equipment; the first stamping plate is positioned above the inner part of the equipment cavity and below the alignment unit; the third stamping plate is positioned below the equipment cavity and below the alignment unit; the second platen is positioned below the cavity of the equipment and on one side of the third platen, and the exposure unit is positioned below the third platen;
the substrate is fixed on the lower surface of the first stamping plate, and alignment marks are arranged on the substrate; the working die comprises a first working die and a second working die, and alignment marks corresponding to the alignment marks are arranged on the working die.
2. The nanoimprint apparatus with two-sided imprinting capability of claim 1, characterized in that: the first stamping plate comprises a moving block, a limiting block and a guide rail, and drives the adsorption fixing plate to move left and right;
the first stamping plate also comprises a motor, a telescopic rod, a connecting block and a fixing block, and the motor drives the adsorption fixing plate to move up and down to complete the first stamping action;
the middle area of the adsorption fixing plate is provided with a transparent area, the lower surface of the adsorption fixing plate is provided with a vacuum groove, and a vacuum hole connected with a vacuum pump is arranged in the vacuum groove;
the first stamping plate is used for fixing the substrate and driving the substrate to move up and down to complete stamping.
3. The nanoimprint apparatus with two-sided imprinting capability of claim 1, characterized in that: the second stamping plate comprises an overturning fixing plate used for adsorbing and fixing a second working mold, a vacuum groove is formed in the upper surface of the overturning fixing plate, a vacuum hole is formed in the vacuum groove, a working mold positioning groove is formed in the outer side of the vacuum groove, a buffering fixing block is arranged on one side, away from the rotating shaft, of the outer side of the working mold positioning groove, and a transparent area is arranged in the central area of the overturning fixing plate;
the second stamping plate further comprises a rotating shaft, a supporting column, a rotating shaft supporting column, a supporting column and a supporting column lifting motor, the second stamping plate is connected to the rotating shaft in a clamped mode and can rotate around the rotating shaft, and the second stamping plate is used for adsorbing and fixing a second working mold.
4. The nanoimprint apparatus with two-sided imprinting capability of claim 1, characterized in that: the third stamping plate comprises a vacuum groove arranged on the upper surface, a vacuum hole is arranged in the vacuum groove, and a working mold positioning groove is arranged on the outer side of the vacuum groove;
the third stamping plate further comprises a front and rear moving block, a left and right moving block, a lifting rod, a motor, a rotating block and a rotating motor, wherein the front and rear moving block is used for driving the first working mold to move front and back, the left and right moving block is used for driving the first working mold to move left and right, the lifting rod and the motor are used for driving the first working mold to move up and down, and the rotating block and the rotating motor are used for driving the first working mold to rotate.
5. The nanoimprint apparatus with two-sided imprinting capability of claim 1, characterized in that: the counterpoint unit is located between two guide rails, and the unit of counterpointing includes motor, telescopic link, fixed block, counterpoint subassembly, and the motor drives the telescopic link extension or shortens to drive the subassembly of counterpointing and reciprocate, telescopic link and counterpoint subassembly are connected to the fixed block.
6. The nanoimprint apparatus with two-sided imprinting capability of claim 1, characterized in that: the exposure unit comprises an ultraviolet lamp, a fixed block, a lifting rod and a motor, wherein the ultraviolet lamp is positioned under a transparent area of a third pressing plate, and ultraviolet light emitted by the ultraviolet lamp can penetrate through the transparent area in the middle of the third pressing plate, the substrate and the working mold; the fixed block is connected with the ultraviolet lamp and the lifting rod, and the motor pushes the lifting rod to stretch so as to drive the ultraviolet lamp to move up and down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111316483.2A CN113934111B (en) | 2021-11-09 | 2021-11-09 | Nanometer impression equipment with two-sided impression function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111316483.2A CN113934111B (en) | 2021-11-09 | 2021-11-09 | Nanometer impression equipment with two-sided impression function |
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| CN113934111A true CN113934111A (en) | 2022-01-14 |
| CN113934111B CN113934111B (en) | 2023-07-18 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202111316483.2A Active CN113934111B (en) | 2021-11-09 | 2021-11-09 | Nanometer impression equipment with two-sided impression function |
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| CN101377618A (en) * | 2007-08-29 | 2009-03-04 | 三星电子株式会社 | Dual-side imprinting lithography system |
| CN101535021A (en) * | 2005-12-08 | 2009-09-16 | 分子制模股份有限公司 | Method and system for double-sided patterning of substrates |
| US20100112116A1 (en) * | 2005-12-08 | 2010-05-06 | Molecular Imprints, Inc. | Double-Sided Nano-Imprint Lithography System |
| WO2011155582A1 (en) * | 2010-06-11 | 2011-12-15 | 株式会社日立ハイテクノロジーズ | Stamper for microstructure transfer and microstructure transfer device |
| WO2012066864A1 (en) * | 2010-11-19 | 2012-05-24 | 株式会社日立ハイテクノロジーズ | Double-side imprinting apparatus |
| CN213704888U (en) * | 2020-09-24 | 2021-07-16 | 龙帛生物科技有限公司 | Double-sided stamping device for composite special functional fiber cloth |
| CN214151370U (en) * | 2021-02-18 | 2021-09-07 | 青岛天仁微纳科技有限责任公司 | Nano-imprinting equipment capable of automatically carrying out double-sided imprinting |
| CN214311286U (en) * | 2021-04-01 | 2021-09-28 | 青岛天仁微纳科技有限责任公司 | Negative pressure formula nanometer impression equipment |
-
2021
- 2021-11-09 CN CN202111316483.2A patent/CN113934111B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101535021A (en) * | 2005-12-08 | 2009-09-16 | 分子制模股份有限公司 | Method and system for double-sided patterning of substrates |
| US20100112116A1 (en) * | 2005-12-08 | 2010-05-06 | Molecular Imprints, Inc. | Double-Sided Nano-Imprint Lithography System |
| CN101377618A (en) * | 2007-08-29 | 2009-03-04 | 三星电子株式会社 | Dual-side imprinting lithography system |
| WO2011155582A1 (en) * | 2010-06-11 | 2011-12-15 | 株式会社日立ハイテクノロジーズ | Stamper for microstructure transfer and microstructure transfer device |
| WO2012066864A1 (en) * | 2010-11-19 | 2012-05-24 | 株式会社日立ハイテクノロジーズ | Double-side imprinting apparatus |
| CN213704888U (en) * | 2020-09-24 | 2021-07-16 | 龙帛生物科技有限公司 | Double-sided stamping device for composite special functional fiber cloth |
| CN214151370U (en) * | 2021-02-18 | 2021-09-07 | 青岛天仁微纳科技有限责任公司 | Nano-imprinting equipment capable of automatically carrying out double-sided imprinting |
| CN214311286U (en) * | 2021-04-01 | 2021-09-28 | 青岛天仁微纳科技有限责任公司 | Negative pressure formula nanometer impression equipment |
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| Publication number | Publication date |
|---|---|
| CN113934111B (en) | 2023-07-18 |
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