CN113735104B - Graphene film etching device - Google Patents
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- CN113735104B CN113735104B CN202111273444.9A CN202111273444A CN113735104B CN 113735104 B CN113735104 B CN 113735104B CN 202111273444 A CN202111273444 A CN 202111273444A CN 113735104 B CN113735104 B CN 113735104B
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
Abstract
The invention discloses a graphene film etching device which comprises an outer shell, an etching device and a control device, wherein the etching device structurally comprises an etching disc, strip convex grooves, through holes, photoresistors, irradiation lamps and a promoting device, the strip convex grooves are formed in the bottom surface of the inner side of the etching disc, the strip convex grooves are distributed in a plurality of positions in an equidistant mode in relation to the axial direction of the etching disc, the etching disc is provided with the through holes which are uniformly distributed, and the photoresistors are fixedly mounted on the inner side of the bottom end portion of each strip convex groove. This graphite alkene film etching device, the liquid measure and the rate through the etching liquid of pouring into in the sculpture dish are the direct ratio with the area size of graphite alkene film, and then has realized the purpose of the injected liquid measure and the rate of automated control etching liquid to intelligent effect has been reached, the problem of the violent oscillation of liquid level that the injected liquid measure and the injection rate of having solved by the etching liquid simultaneously are not good brings, further firm graphite alkene film.
Description
Technical Field
The invention relates to the technical field of graphene films, in particular to a graphene film etching device.
Background
At present, the graphene film is mainly etched by a chemical vapor deposition method, and when the graphene film is etched by using an etching solution, a plurality of external factors need to be controlled, so that the control and adjustment of the external factors by a graphene film etching device are very important.
The existing graphene film etching device has the following technical defects when in use: firstly, when a graphene film is placed in an etching solution, the graphene film can generate power potential energy due to the action of inertia, so that the film and the etching solution move relatively, if braking is not performed in time, the film collides with an inner wall to damage an outer ring of the film, so that the rejection rate of the film is high, and the production efficiency of the film is greatly influenced; and secondly, the upper-layer etching liquid is subjected to chemical reaction with the film at the beginning and end, and the mutual exchange among the solutions is less because the etching liquid is in a static state, so that the concentration of the upper-layer etching liquid is lower, the concentration of the lower-layer etching liquid is higher, the etching efficiency and the etching quality are directly influenced, and meanwhile, the lower-layer etching liquid is wasted.
Disclosure of Invention
Technical problem to be solved
The invention aims to provide a graphene film etching device to solve the problems in the background technology.
(II) technical scheme
In order to achieve the purpose, the invention provides the following technical scheme: a graphene film etching device comprises an outer shell, etching devices and control devices, wherein the etching devices are fixedly connected to the axial inner side wall of the outer shell, the control devices penetrate through the axial side wall of the outer shell and extend into the outer shell, and the number of the control devices is four in the axial direction of the outer shell at equal intervals;
the structure of etching device includes sculpture dish, rectangular tongue, through-hole, photo resistance, lamp and promotion device, the inboard fixed connection of axial of sculpture dish and shell body, rectangular tongue has been seted up to the inboard bottom surface of sculpture dish, and the graphite alkene film rises in step through the rise of liquid level, owing to seted up rectangular tongue for inject into the produced bubble of etching liquid and can outwards discharge through the clearance between the adjacent rectangular tongue, and then reached and stopped the bubble and piled up the effect between graphite alkene film and etching liquid, solved and piled up by the bubble and cause the not good problem of etching effect.
The strip-shaped convex groove is axially and equidistantly distributed with a plurality of through holes which are uniformly distributed, the inner side of the bottom end part of the strip-shaped convex groove is fixedly provided with a photoresistor, because the inclination angle of the irradiation lamp is consistent with the gradient of the strip-shaped convex groove, the light source irradiates the photoresistor through the gap between the graphene film and the strip-shaped convex groove, when the area of the graphene film is larger, the more the light source is shielded, because the photoresistor can change the resistance value inside the photoresistor according to the intensity of the light source, because the photoresistor is electrically connected with the air pump, the current led into the air pump can be intermittently and forwardly regulated according to the area of the graphene film, and further the expansion amount and the expansion rate of the air bag can be forwardly controlled through the area of the graphene film, so that the liquid amount and the rate of the etching liquid injected into the etching disc are in direct proportion to the area of the graphene film, and the movement of the film is small by injecting the etching liquid from the bottom surface.
The axial inner side wall of the etching disc is fixedly connected with a plurality of irradiation lamps, and the irradiation lamps are distributed in the axial direction of the etching disc at equal intervals;
the bottom surface of the inner side of the etching disc is an inner concave arc surface, and a cylindrical hole is formed in the center of the bottom side surface of the etching disc.
Furthermore, the structure of the promoting device comprises a fixed block, a circulating pump, a main body pipe, hole grooves, a discharge pipe, a partition plate, a semicircular plate and square holes, wherein the axial inner side wall of the outer shell is fixedly connected with the fixed block;
the inboard middle part fixedly connected with baffle of main part pipe, start the circulating pump and carry out work, make the circulating pump flow to the downside with the sculpture liquid circulation of main part pipe upside, because the equidistance is provided with a plurality of semicircle boards on the baffle, and seted up the square hole on the semicircle board, because the main part is inside to have a plurality of sculpture liquid intervals through the semicircle board partition, thereby make the sculpture liquid can enter into the main part pipe perpendicularly to the hole groove, again because the aperture in hole groove has the trend of grow gradually from left to right, make the main part pipe have outside-in suction gradually through rivers to the graphite alkene film, thereby can stabilize the graphite alkene film. The lower part of main part pipe and at the lower part front side fixedly connected with equidistance distribution's of baffle discharge pipe, the effect of circulating pump will flow into the etching liquid of main part pipe downside and outwards discharge through the discharge pipe, because the discharge pipe is corresponding with the through-hole for the etching liquid can carry out the circumference flow that has the orbit, thereby can carry out the misce bene with the etching liquid of upper and lower floor, has guaranteed the concentration of etching liquid unanimity, has promoted etching liquid and graphene film reaction effect. The upper side and the lower side of the partition board are fixedly connected with semicircular plates, square holes are formed in the semicircular plates, and a plurality of semicircular plates are equidistantly distributed on the partition board;
the length of the discharge pipe is gradually shortened from left to right, and the discharge pipe and the through holes are in one-to-one correspondence.
Further, controlling means includes air pump, connecting block, trachea and gasbag, the air pump passes through the axial lateral wall fixed connection of connecting block and shell body, the air pump is in the axial outside position of shell body, the right side fixedly connected with trachea of air pump, the trachea runs through the axial lateral wall of shell body and stretches into the inside of shell body, tracheal other end fixedly connected with gasbag is placed the inside central point of sculpture dish with circular graphite alkene film and is put, starts the air pump afterwards and carries out work for the air pump injects into gas through tracheal effect to the gasbag, because the gasbag is the better rubber material of gas tightness, makes the gasbag after injecting into gas, the inflation that carries out of gasbag, thereby extrudees the inside etching liquid of shell body, makes the liquid level of etching liquid rise gradually. The bottom surface of the air bag is fixedly connected with the bottom surface of the inner side of the outer shell;
the material of gasbag adopts the elasticity rubber material of leakproofness, set up the fluting corresponding with the trachea on the axial side of shell body.
Further, the photosensitive resistor is arranged in an inclined mode, and the inclination angle of the photosensitive resistor is consistent with the gradient of the long convex groove.
Furthermore, the external diameter of semicircle board and the internal diameter looks adaptation of main part pipe, the semicircle board interlude distributes in adjacent hole groove middle part position.
Furthermore, the strip-shaped convex groove is provided with a clamping groove corresponding to the photoresistors, and the photoresistors correspond to the irradiation lamps one by one.
Furthermore, the aperture of the hole groove tends to become larger from left to right.
Furthermore, the inside of shell body is equipped with etching liquid, the liquid level of etching liquid is less than the extreme low position of etching dish bottom side.
Furthermore, the position of the main body pipe is located in the middle of the adjacent long-strip convex groove, and the height of the main body pipe is lower than that of the long-strip convex groove.
(III) advantageous effects
Compared with the prior art, the invention provides a graphene film etching device, which has the following beneficial effects:
1. this graphite alkene film etching device, through the mode of pouring into the etching liquid from the bottom surface, and then realized that film and etching liquid take place corresponding motion less, this action has reached the effect that can avoid film and device inner wall to collide mutually, and then solved and caused the problem that the film outer lane damaged by film and device inner wall collision mutually, changed the tradition simultaneously and put into the mode of etching liquid operation difficulty by the film, and then show and improved the sculpture efficiency, also reduced the disability rate simultaneously.
2. This graphite alkene film etching device, the liquid measure and the rate through the etching liquid of pouring into in the sculpture dish are the direct ratio with the area size of graphite alkene film, and then has realized the purpose of the injected liquid measure and the rate of automated control etching liquid to intelligent effect has been reached, the problem of the violent oscillation of liquid level that the injected liquid measure and the injection rate of having solved by the etching liquid simultaneously are not good brings, further firm graphite alkene film.
3. This graphite alkene film etching device through the clearance between the adjacent rectangular tongue for the produced bubble of injection etching liquid can outwards discharge, and then has reached and has prevented that the bubble from piling up between graphite alkene film and etching liquid, thereby has realized stopping the accumulational purpose of bubble, has solved simultaneously and has piled up by the bubble and cause the not good problem of etching effect.
4. This graphite alkene film etching device has outside-in suction that gradually increases to graphite alkene film through rivers, and then has realized can be through the purpose that the firm graphite alkene film of suction of grow gradually is in central point and puts, further prevents that film and device inner wall from colliding mutually, is showing simultaneously and has improved firm quality.
5. This graphite alkene film etching device through the mating reaction between discharge pipe and the through-hole to realized that the etching liquid can carry out the purpose that has the track circumference to flow, this action has reached the etching liquid of upper and lower layer and has carried out the effect that the misce bene, and then solved upper etching liquid concentration lower, lower floor's etching liquid concentration is higher, causes the problem of direct influence sculpture efficiency and sculpture quality, has also stopped the extravagant phenomenon of etching liquid simultaneously.
Drawings
FIG. 1 is a schematic perspective view of the present invention;
FIG. 2 is a schematic perspective view of a control device according to the present invention;
FIG. 3 is a schematic perspective view of an etching tray according to the present invention;
FIG. 4 is a schematic perspective view of the main tube of the present invention;
FIG. 5 is a schematic perspective view of a facilitating device according to the present invention;
FIG. 6 is a schematic perspective view of a circulation pump according to the present invention;
FIG. 7 is an enlarged view taken at A of FIG. 3 in accordance with the present invention;
FIG. 8 is an enlarged view at B of FIG. 3 in accordance with the present invention;
fig. 9 is an enlarged view of the invention at C in fig. 6.
In the figure: 1. an outer housing; 2. an etching device; 21. etching the disc; 22. a long-strip convex groove; 23. a through hole; 24. a photoresistor; 25. illuminating a lamp; 26. a facilitating device; 261. a fixed block; 262. a circulation pump; 263. a main body tube; 264. a hole groove; 265. a discharge pipe; 266. a partition plate; 267. a semicircular plate; 268. a square hole; 3. a control device; 31. an air pump; 32. an air tube; 33. an air bag.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Examples
Referring to fig. 1-9, a graphene film etching apparatus includes an outer casing 1, an etching apparatus 2 and control apparatuses 3, wherein the etching apparatus 2 is fixedly connected to an axial inner sidewall of the outer casing 1, the control apparatuses 3 penetrate through the axial sidewall of the outer casing 1 and extend into the outer casing 1, and four control apparatuses 3 are equidistantly arranged in an axial direction of the outer casing 1;
the structure of etching device 2 includes sculpture dish 21, rectangular tongue 22, through-hole 23, photo resistance 24, lamp 25 and promotion device 26, sculpture dish 21 and shell body 1's the inboard fixed connection of axial, rectangular tongue 22 has been seted up to the inboard bottom surface of sculpture dish 21, the graphite alkene film rises in step through the rising of liquid level, owing to seted up rectangular tongue 22, make the produced bubble of injection etching solution outwards discharge through the clearance between the adjacent rectangular tongue 22, and then reached and stopped the bubble and piled up between graphite alkene film and etching solution, solved and piled up the not good problem of cause etching effect by the bubble.
The plurality of long-strip convex grooves 22 are equidistantly distributed in the axial direction of the etching disc 21, the etching disc 21 is provided with a plurality of through holes 23 which are uniformly distributed, the inner side of the bottom end part of each long-strip convex groove 22 is fixedly provided with a photoresistor 24, because the inclination angle of an irradiation lamp 25 is consistent with the gradient of each long-strip convex groove 22, a light source irradiates the photoresistor 24 through the gap between the graphene film and the long-strip convex groove 22, when the area of the graphene film is larger, the more light sources are shielded, the resistance value inside the photoresistor 24 can be changed according to the strength of the light source, because the photoresistor 24 is electrically connected with the air pump 31, the current introduced into the air pump 31 can be intermittently and positively regulated according to the area of the graphene film, and further, the expansion amount and the expansion rate of the air bag 33 can be positively controlled according to the area of the graphene film, so that the liquid amount and the rate of the etching liquid injected into the etching disc 21 are in direct proportion to the area of the graphene film, and the movement of the film is small by injecting the etching liquid from the bottom surface.
The axial inner side wall of the etching disc 21 is fixedly connected with a plurality of irradiation lamps 25, and the irradiation lamps 25 are distributed in the axial direction of the etching disc 21 at equal intervals;
the inner side bottom surface of the etching disc 21 is an inner concave arc surface, and a cylindrical hole is formed in the center of the bottom side surface of the etching disc 21.
Further, the structure of the promoting device 26 includes a fixing block 261, a circulating pump 262, a main pipe 263, a plurality of hole slots 264, a discharge pipe 265, a partition plate 266, a semicircular plate 267 and a square hole 268, wherein the axial inner side wall of the outer shell 1 is fixedly connected with the fixing block 261, the fixing block 261 is equidistantly distributed in the axial direction of the outer shell 1, the circulating pump 262 is fixedly connected to the right side of the fixing block 261, the main pipe 263 is fixedly connected to the right side of the circulating pump 262, and the main pipe 263 is provided with the plurality of hole slots 264 which are equidistantly distributed;
the length of discharge pipe 265 tends to decrease from left to right, and discharge pipes 265 correspond to through-holes 23 one by one.
Further, controlling means 3 includes air pump 31, the connecting block, trachea 32 and gasbag 33, air pump 31 passes through the axial lateral wall fixed connection of connecting block and shell body 1, air pump 31 is in the axial outside position of shell body 1, the right side fixedly connected with trachea 32 of air pump 31, trachea 32 runs through the axial lateral wall of shell body 1 and stretches into the inside of shell body 1, trachea 32's other end fixedly connected with gasbag 33, place circular graphite alkene film at the inside central point of sculpture dish 21 and put, start air pump 31 and work afterwards, make air pump 31 inject gas to gasbag 33 through trachea 32's effect, because gasbag 33 is the better rubber material of gas tightness, make gasbag 33 after injecting gas, the inflation of gasbag 33, thereby extrude the inside etching solution of shell body 1, make the liquid level of etching solution rise gradually. The bottom surface of the air bag 33 is fixedly connected with the inner bottom surface of the outer shell 1;
the air bag 33 is made of elastic rubber with sealing performance, and the axial side surface of the outer shell 1 is provided with a groove corresponding to the air pipe 32.
Further, the photo-resistor 24 is disposed in an inclined manner, and the inclined angle of the photo-resistor 24 is consistent with the slope of the elongated convex groove 22.
Further, the outer diameter of the semicircular plate 267 is matched with the inner diameter of the main tube 263, and the semicircular plate 267 is inserted and distributed at the middle position of the adjacent hole groove 264.
Further, the strip-shaped convex groove 22 is provided with a clamping groove corresponding to the photo-resistor 24, and the photo-resistor 24 and the irradiation lamp 25 correspond to each other one by one.
Further, the aperture of the hole groove 264 tends to become larger from left to right.
Further, the outer shell 1 contains etching liquid, and the liquid level of the etching liquid is lower than the lowest position of the bottom side surface of the etching disc 21.
Further, the main body tube 263 is located at a middle position of the adjacent elongated tongue 22, and the height of the main body tube 263 is lower than the height of the elongated tongue 22.
The specific use mode and function of the embodiment are as follows:
during the use, at first the staff pours into the inside of shell body 1 with the etching liquid, and the liquid level is less than the extreme low position of etching dish 21 bottom surface side, then place the inside central point of etching dish 21 with circular graphite alkene film and put, start air pump 31 and work afterwards, make air pump 31 pour into gas to gasbag 33 through trachea 32's effect, because gasbag 33 is the better rubber material of gas tightness, make gasbag 33 after pouring into gas into, gasbag 33 expands, thereby extrude the inside etching liquid of shell body 1, make the liquid level of etching liquid rise gradually.
Meanwhile, the irradiation lamp 25 is turned on to generate an irradiation light source, and since the inclination angle of the irradiation lamp 25 is consistent with the gradient of the long convex groove 22, the light source irradiates the photoresistor 24 through the gap between the graphene film and the long convex groove 22, when the area of the graphene film is larger, the shielded light sources are more, since the photo resistor 24 can change its internal resistance value according to the intensity of the light source, since the photo resistor 24 is electrically connected to the air pump 31, so that the current introduced into the air pump 31 can be intermittently and positively regulated according to the area of the graphene film, further, the expansion amount and the expansion rate of the air bag 33 can be positively controlled by the area of the graphene film, the liquid amount and the speed of the etching liquid injected into the etching disc 21 are in a direct proportion relation with the area of the graphene film, and the film moves less in a mode of injecting the etching liquid from the bottom surface.
Further, when pouring into the etching liquid, the graphite alkene film rises through the rising of liquid level in step, owing to seted up rectangular tongue 22 for the produced bubble of pouring into the etching liquid can outwards be discharged through the clearance between the adjacent rectangular tongue 22, and then has reached and stopped the bubble and has piled up between graphite alkene film and etching liquid, has solved and has piled up by the bubble and cause the not good problem of etching effect.
Further, after the etching liquid injection finishes, start circulating pump 262 and work, make circulating pump 262 with the etching liquid circulation of main part pipe 263 upside to the downside flow, because the equidistance is provided with a plurality of semicircle boards 267 on the baffle 266, and seted up the square hole on the semicircle board 267, because main part pipe 263 is inside to have a plurality of etching liquid intervals through the semicircle board 267 partition, thereby make etching liquid hole 264 relatively enter into main part pipe 263 perpendicularly, again because the aperture of hole 264 has the trend of grow gradually from left to right, make main part pipe 263 have the suction that the outside-in gradually strengthened to the graphite alkene film through rivers, thereby can stabilize the graphite alkene film.
Further, the etching liquid flowing into the lower side of the main tube 263 is discharged outwards through the discharge pipe 265 under the action of the circulating pump 262, and the discharge pipe 265 corresponds to the through hole 23, so that the etching liquid can flow along the track in a circumferential manner, the etching liquid in the upper layer and the etching liquid in the lower layer can be uniformly mixed, the consistency of the etching liquid is ensured, and the reaction effect of the etching liquid and the graphene film is promoted.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (9)
1. The utility model provides a graphite alkene film etching device, includes shell body (1), etching device (2) and controlling means (3), its characterized in that: the etching device (2) is fixedly connected to the axial inner side wall of the outer shell (1), the control devices (3) penetrate through the axial side wall of the outer shell (1) and extend into the outer shell (1), and four control devices (3) are arranged in the outer shell (1) at equal intervals in the axial direction;
the structure of the etching device (2) comprises an etching disc (21), a strip-shaped convex groove (22), through holes (23), a photoresistor (24), a radiation lamp (25) and a promoting device (26), wherein the etching disc (21) is fixedly connected with the inner axial side of the outer shell (1), the strip-shaped convex groove (22) is formed in the bottom surface of the inner side of the etching disc (21), the strip-shaped convex groove (22) is axially and equidistantly distributed with a plurality of through holes (23) which are uniformly distributed on the etching disc (21), the photoresistor (24) is fixedly mounted on the inner side of the bottom end part of the strip-shaped convex groove (22), the radiation lamp (25) is fixedly connected to the inner axial side wall of the etching disc (21), and the radiation lamp (25) is axially and equidistantly distributed with the etching disc (21);
the inner side bottom surface of the etching disc (21) is an inner concave arc surface, and a cylindrical hole is formed in the center of the bottom side surface of the etching disc (21).
2. The graphene film etching device according to claim 1, wherein: the structure of the promotion device (26) comprises a fixing block (261), a circulating pump (262), a main body pipe (263), hole grooves (264), a discharge pipe (265), a partition plate (266), a semicircular plate (267) and a square hole (268), wherein the axial inner side wall of the outer shell (1) is fixedly connected with the fixing block (261), the fixing block (261) is axially and equidistantly distributed with a plurality of holes, the right side of the fixing block (261) is fixedly connected with the circulating pump (262), the right side of the circulating pump (262) is fixedly connected with the main body pipe (263), and the main body pipe (263) is provided with a plurality of hole grooves (264) which are equidistantly distributed;
the middle position of the inner side of the main pipe (263) is fixedly connected with a partition plate (266), the lower part of the main pipe (263) and the front side of the lower part of the partition plate (266) are fixedly connected with discharge pipes (265) which are distributed at equal intervals, the upper side and the lower side of the partition plate (266) are fixedly connected with semicircular plates (267), square holes (268) are formed in the semicircular plates (267), and a plurality of semicircular plates (267) are distributed at equal intervals on the partition plate (266);
the length of the discharge pipe (265) is gradually shortened from left to right, and the discharge pipe (265) and the through holes (23) are in one-to-one correspondence.
3. The graphene film etching device according to claim 1, wherein: the control device (3) comprises an air pump (31), a connecting block, an air pipe (32) and an air bag (33), the air pump (31) is fixedly connected with the axial outer side wall of the outer shell (1) through the connecting block, the air pump (31) is located at the axial outer side position of the outer shell (1), the air pipe (32) is fixedly connected to the right side of the air pump (31), the air pipe (32) penetrates through the axial side wall of the outer shell (1) and extends into the outer shell (1), the air bag (33) is fixedly connected to the other end of the air pipe (32), and the bottom surface of the air bag (33) is fixedly connected with the inner side bottom surface of the outer shell (1);
the material of gasbag (33) adopts the elasticity rubber material of leakproofness, seted up the fluting corresponding with trachea (32) on the axial side of shell body (1).
4. The graphene film etching device according to claim 1, wherein: the photosensitive resistor (24) is obliquely arranged, and the inclination angle of the photosensitive resistor (24) is consistent with the gradient of the long-strip convex groove (22).
5. The graphene film etching device according to claim 2, wherein: the outer diameter of the semicircular plate (267) is matched with the inner diameter of the main body pipe (263), and the semicircular plate (267) is distributed in the middle position of the adjacent hole groove (264) in an inserting mode.
6. The graphene film etching device according to claim 1, wherein: the strip convex groove (22) is provided with a clamping groove corresponding to the photosensitive resistor (24), and the photosensitive resistor (24) and the irradiation lamp (25) correspond to each other one by one.
7. The graphene film etching device according to claim 2, wherein: the aperture of the hole groove (264) is gradually increased from left to right.
8. The graphene film etching device according to claim 1, wherein: the etching liquid is contained in the outer shell (1), and the liquid level of the etching liquid is lower than the lowest position of the bottom side surface of the etching disc (21).
9. The graphene film etching device according to claim 5, wherein: the main body pipe (263) is located at the middle position of the adjacent long convex groove (22), and the height of the main body pipe (263) is lower than that of the long convex groove (22).
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