CN113564564B - Atomic layer deposition apparatus - Google Patents

Atomic layer deposition apparatus Download PDF

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Publication number
CN113564564B
CN113564564B CN202110753358.1A CN202110753358A CN113564564B CN 113564564 B CN113564564 B CN 113564564B CN 202110753358 A CN202110753358 A CN 202110753358A CN 113564564 B CN113564564 B CN 113564564B
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China
Prior art keywords
bearing
mounting frame
reaction chamber
atomic layer
layer deposition
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CN113564564A (en
Inventor
陈蓉
邵华晨
刘潇
向俊任
李嘉伟
弋戈
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Huazhong University of Science and Technology
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Huazhong University of Science and Technology
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Priority to CN202110753358.1A priority Critical patent/CN113564564B/en
Publication of CN113564564A publication Critical patent/CN113564564A/en
Priority to PCT/CN2022/083415 priority patent/WO2023273446A1/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • C23C16/45544Atomic layer deposition [ALD] characterized by the apparatus
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417Methods specially adapted for coating powder
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • C23C16/45544Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45546Atomic layer deposition [ALD] characterized by the apparatus specially adapted for a substrate stack in the ALD reactor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention relates to an atomic layer deposition device.A reaction chamber comprises a reaction chamber main body and a chamber door, a reaction cavity is formed inside the reaction chamber main body, an air inlet and an air exhaust port are arranged on the reaction chamber main body, and the chamber door is detachably connected with the reaction chamber main body; the mounting frame is fixedly connected with the cavity door, and when the cavity door is connected with the reaction chamber main body, the mounting frame is positioned inside the reaction cavity; the first bearing piece is used for bearing the blocky object to be coated and is detachably connected with the mounting frame; the second bearing piece is used for bearing the powdery object to be coated and is detachably connected with the mounting frame; in a first use state, the first bearing piece is fixedly connected with the mounting frame; in a second use state, the second bearing part is connected with the mounting frame, the driving part is connected with the second bearing part, and the driving part is used for driving the second bearing part to rotate relative to the mounting frame. The atomic layer deposition device can deposit different types of objects to be coated, and is wider in application range.

Description

Atomic layer deposition apparatus
Technical Field
The invention relates to the technical field of atomic layer deposition, in particular to an atomic layer deposition device.
Background
Atomic layer deposition is a technology for plating substances on the surface of a substrate layer by layer in a monoatomic film form, and has the characteristics of controllable film thickness, good uniformity and the like, so that the atomic layer deposition is widely applied to the fields of micro-nano electronic devices, solar cells and the like. The principle of atomic layer deposition is that a precursor is introduced into a vacuum cavity to be chemically adsorbed with a substrate to be coated, and after the cavity is cleaned by inert gas, another precursor is introduced into the cavity to be chemically reacted with a product in the previous stage. The two stages form an atomic layer deposition reaction cycle, namely single-layer film growth, and the film with the required thickness is obtained by controlling the cycle times. In the related art, there are many apparatuses specially adapted for atomic layer deposition, however, these apparatuses have a single application range for the object to be coated, and can be used for deposition of only a single type of object to be coated.
Disclosure of Invention
Based on the above, the invention provides the atomic layer deposition device which can be used for depositing different types of objects to be coated and has a wider application range.
An atomic layer deposition apparatus comprising:
the reaction chamber comprises a reaction chamber main body and a chamber door, a reaction cavity is formed inside the reaction chamber main body, an air inlet and an air extraction opening are formed in the reaction chamber main body, and the chamber door is detachably connected with the reaction chamber main body;
the mounting frame is fixedly connected with the cavity door, and when the cavity door is connected with the reaction chamber main body, the mounting frame is positioned inside the reaction cavity;
the first bearing piece is used for bearing a blocky object to be coated, and the first bearing piece is detachably connected with the mounting frame;
the second bearing piece is used for bearing a powdery object to be coated and is detachably connected with the mounting frame;
a drive member;
in a first use state, the first bearing piece is fixedly connected with the mounting frame;
in a second use state, the second bearing piece is connected with the mounting frame, the driving piece is connected with the second bearing piece, and the driving piece is used for driving the second bearing piece to rotate relative to the mounting frame.
In one embodiment, the first bearing part is provided with a plurality of grooves for accommodating the block-shaped object to be coated.
In one embodiment, in the first use state, the first bearing piece is connected with the mounting frame through a threaded fastener; or the first bearing piece is connected with the mounting frame in a buckling manner; or the first bearing piece and the mounting frame are fixed through magnetic attraction.
In one embodiment, in the second use state, the second bearing piece is connected with the mounting frame through a bearing, and a rotating shaft of the second bearing piece is connected with the driving piece.
In one embodiment, the second bearing part further includes an air exhaust pipe, the air exhaust pipe is connected to the air exhaust opening, the air exhaust pipe is coaxial with the rotating shaft, and the air exhaust pipe and the rotating shaft are respectively located at two ends of the second bearing part along the axial direction.
In one embodiment, a through accommodating groove is formed in the central area of the mounting frame, the second bearing piece is located in the accommodating groove, two mounting grooves are formed in two ends of the accommodating groove respectively along the axial direction, the rotating shaft and the exhaust tube are sleeved with the bearings, and the bearings are in interference fit with the mounting grooves correspondingly.
In one embodiment, the second bearing part comprises an inner supporting net and an outer supporting net which are arranged along the radial direction, and a first end cover and a second end cover which are respectively connected to the two ends of the inner supporting net and the outer supporting net, the inner supporting net and the outer supporting net are hollow, an inner filtering net is sleeved outside the inner supporting net, an outer filtering net is sleeved outside the outer supporting net, a containing cavity used for containing the powdery object to be coated is formed between the inner filtering net and the outer supporting net, and an air pumping cavity communicated with the air pumping pipe is formed inside the inner supporting net.
In one embodiment, the outer support net comprises an outer support net first end plate, the first end cover is detachably connected with the outer support net first end plate, the rotating shaft is arranged on the first end cover, and the rotating shaft is detachably connected with the inner support net.
In one embodiment, the outer supporting net further comprises an outer supporting net second end plate, the second end cover is detachably connected with the outer supporting net second end plate, the air exhaust pipe is arranged on the second end cover, a notch is formed in the outer supporting net second end plate, and the edge of the notch is located on one side, close to the outer supporting net, of the accommodating cavity along the axial projection.
In one embodiment, the second bearing part comprises an inner filter screen and an outer filter screen which are arranged along the radial direction, and a first end cover and a second end cover which are respectively connected to two ends of the inner filter screen and the outer filter screen, wherein the inner filter screen and the outer filter screen are sintered filter screens, a containing cavity for containing the powdery substance to be coated is formed between the inner filter screen and the outer filter screen, and an air pumping cavity communicated with the air pumping pipe is formed inside the inner filter screen.
In one embodiment, the reaction chamber body is provided with quartz glass, and an infrared heating lamp is arranged outside the reaction chamber body and can heat the reaction cavity through the quartz glass.
The atomic layer deposition device is provided with the first bearing piece and the second bearing piece, and if the blocky object to be coated is to be deposited, the first bearing piece can be selected to be fixedly installed on the installation frame; if the powdery to-be-coated object is to be deposited, the second bearing piece can be selectively installed on the installation frame, the second bearing piece is connected with the driving piece, the driving piece drives the second bearing piece to rotate, and the powdery to-be-coated object is scattered so as to avoid caking. Therefore, the device can deposit both the block-shaped object to be coated and the powdery object to be coated, and only the corresponding bearing piece is selected and installed according to the shape of the object to be coated, so that the device has wider application range.
Drawings
Fig. 1 is a schematic structural diagram of an atomic layer deposition apparatus according to an embodiment of the invention without a first carrier and a second carrier;
FIG. 2 is a schematic view of a second carrier mounted to a mounting bracket according to an embodiment of the present invention;
FIG. 3 is a schematic view of a first carrier mounted to a mounting bracket according to an embodiment of the present invention;
fig. 4 is an exploded view (with parts omitted) of the second carrier of fig. 2;
fig. 5 is an exploded view (with parts omitted) of another angle of the second carrier of fig. 2;
fig. 6 is a plan view of the second carrier in fig. 2 (with parts omitted).
Reference numerals are as follows:
a reaction chamber body 110, an air inlet 111, an extraction opening 112, a chamber door 120, a through hole 121, a reaction chamber body 130, and quartz glass 140;
the mounting frame 200, the accommodating groove 210 and the mounting groove 220;
a first carrier 300, a first groove 310, a second groove 320;
the second bearing part 400, the outer support net 410, the outer support net side plate 411, the outer support net first end plate 412, the outer support net second end plate 413, the notch 4131, the inner support net 420, the outer filter screen 430, the inner filter screen 440, the first end cover 451, the second end cover 452, the rotating shaft 460, the special-shaped groove 461, the suction pipe 470, the accommodating cavity 481, the suction cavity 482 and the filter screen fixing clamp 490;
a driver 510, a coupler 520, a first bearing 530, a second bearing 540;
support 610, slider 620, slide rail 630.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, but are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and are not to be construed as limiting the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. As used herein, the terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like are for purposes of illustration only and do not denote a single embodiment.
Referring to fig. 1 to 3, fig. 1 is a schematic structural view illustrating an atomic layer deposition apparatus according to an embodiment of the present invention without a first carrier and a second carrier, fig. 2 is a schematic structural view illustrating the second carrier mounted on a mounting frame according to an embodiment of the present invention, and fig. 3 is a schematic structural view illustrating the first carrier mounted on the mounting frame according to an embodiment of the present invention. An embodiment of the present invention provides an atomic layer deposition apparatus including a reaction chamber, a mounting frame 200, a first carrier 300, a second carrier 400, a driving member 510, and the like, wherein the reaction chamber includes a reaction chamber body 110 and a cavity door 120, the reaction chamber body 110 is hollow to form a reaction cavity 130, and one side of the reaction chamber body is open. The chamber door 120 is detachably connected to the reaction chamber main body 110, and when the chamber door 120 is connected to the reaction chamber main body 110, the opening of the reaction chamber main body 110 is sealed by the chamber door 120, and the reaction chamber 130 forms a closed chamber. The chamber body 110 is provided with a gas inlet 111 and a pumping port 112, and gas can enter the reaction chamber 130 through the gas inlet 111 and can be pumped out of the reaction chamber 130 through the pumping port 112. The mounting bracket 200 is fixedly coupled to the chamber door 120, and the mounting bracket 200 is positioned at an inner side of the chamber door 120, and particularly, the mounting bracket 200 is fixedly coupled to an inner sidewall of the chamber door 120, so that the mounting bracket 200 is positioned in the reaction chamber body 130 when the chamber door 120 is coupled to the reaction chamber body 110. The first bearing member 300 is used for bearing a block-shaped object to be coated, the second bearing member 400 is used for bearing a powder-shaped object to be coated, both the first bearing member 300 and the second bearing member 400 are detachably connected with the mounting frame 200, and when atomic layer deposition is performed, one of the first bearing member 300 and the second bearing member 400 is mounted on the mounting frame 200. Specifically, in the first usage state, the first carrier 300 is mounted on the mounting frame 200 and is fixedly connected to the mounting frame, so that the atomic layer deposition can be performed on the block-shaped object to be coated. In the second use state, the second carrier 400 is mounted on the mounting frame 200, at this time, atomic layer deposition can be performed on the powder to-be-coated object, and the driving member 510 is also connected to the second carrier 400, and the driving member 510 can drive the second carrier 400 to rotate relative to the mounting frame 200.
In the above embodiment, the first carrier 300 and the second carrier 400 are provided, and if the block-shaped object to be coated is to be deposited, the first carrier 300 may be selected to be fixedly mounted on the mounting frame 200; if the powder to be coated is to be deposited, the second bearing member 400 is optionally mounted on the mounting frame 200, the second bearing member 400 is connected to the driving member 510, and the driving member 510 drives the second bearing member 400 to rotate, so as to break up the powder to be coated, thereby preventing the powder from caking. Therefore, the device can deposit the blocky object to be coated, can also deposit the powdery object to be coated, can break up the powdery object to be coated, meets the requirement of the powdery object to be coated on deposition, and can be used for selectively installing the corresponding bearing piece according to the form of the object to be coated before deposition, so that the device has wider application range.
Referring to fig. 3, in some embodiments, the first carrier 300 is provided with a plurality of grooves for receiving the block-shaped object to be wrapped. Specifically, the first carrier 300 is provided with a first groove 310 and a second groove 320, the size of the first groove 310 is slightly larger than that of the second groove 320, and an appropriate groove can be selected according to the size of the block-shaped object to be wrapped and placed in the selected groove. The positions of the first grooves 310 and the second grooves 320 are not limited to the manner shown in the drawings, nor are the number limited to two. The shape of the block-shaped object to be coated is not limited, and may be a plate shape, a column shape, a sphere shape or other shapes. Preferably, one of the length and the width of the groove is approximately equal to the size of the blocky object to be coated in one direction, so that the blocky object to be coated can be limited to a certain extent, and the phenomenon that the blocky object to be coated is pushed by overlarge air pressure when air blows through the blocky object to be coated to cause position deviation and be separated from the groove is avoided.
Referring to fig. 3, in some embodiments, in the first use state, when the first carrier 300 is fixedly mounted on the mounting bracket 200, the first carrier 300 and the mounting bracket 200 may be connected by a threaded fastener. Specifically, the first carrier 300 is placed on top of the mounting bracket 200, and the two are fixed by screws. Alternatively, in some embodiments, the first carrier 300 and the mounting bracket 200 may be mounted by a snap connection. Alternatively, in some embodiments, the first carrier 300 and the mounting frame 200 may also be fixed by magnetic attraction, for example, by providing magnetic members on both of them for attraction.
Referring to fig. 2, 4 to 6, fig. 4 is an exploded view (with parts omitted) of the second carrier in fig. 2, fig. 5 is an exploded view (with parts omitted) of the second carrier at another angle in fig. 2, and fig. 6 is a top view (with parts omitted) of the second carrier in fig. 2. In some embodiments, in the second use state, when the second bearing 400 is fixedly mounted on the mounting bracket 200, the second bearing 400 is connected to the mounting bracket 200 through a bearing, and the rotating shaft 460 of the second bearing 400 is connected to the driving member 510. In the deposition process, the driving part 510 can drive the second bearing part 400 to rotate relative to the mounting frame 200, and in the rotation process, the powdery coating to be treated continuously rolls up and down in the second bearing part 400, so that the powder can be prevented from caking, the contact probability between the powder and the precursor gas can be increased, the powder and the precursor gas can be in more sufficient contact reaction, and the deposition effect is better. Specifically, the driving member 510 may be a rotating motor or a rotating cylinder, and the rotating shaft 460 of the second bearing member 400 passes through the through hole 121 formed in the cavity door 120 and is connected to the output shaft of the driving member 510 through the coupling 520. In some embodiments, a transmission assembly may be further disposed between the driving member 510 and the second carrier 400, for example, a gear set or a synchronous belt may be disposed therebetween, and a speed reduction or speed increase may be achieved through the transmission assembly.
In some embodiments, the second carrier 400 further includes a pumping tube 470, the pumping tube 470 is in communication with the pumping port 112 disposed on the chamber body 110, a vacuum pump or the like may be connected to the pumping port 112, and the gas flowing through the powder in the second carrier 400 is pumped out through the pumping tube 470. The suction pipe 470 is disposed coaxially with the rotation shaft 460, and the rotation shaft 460 is located at one end of the second bearing 400 and the suction pipe 470 is located at the other end of the second bearing 400 in the axial direction of the second bearing 400. During operation of the drive member 510, it is often necessary to cool the torque input, i.e., the region of the shaft 460, to avoid failure due to excessive component temperatures. In this embodiment, the air exhaust tube 470 and the rotating shaft 460 are respectively disposed at two ends, which are spaced far apart from each other, so that when the region of the rotating shaft 460 is cooled, the temperature in the air exhaust tube 470 is not easily affected by cooling, and when the precursor is pumped out through the air exhaust tube 470, the precursor is not easily condensed due to low temperature, thereby the air exhaust tube 470 is not easily blocked. Secondly, compared with the situation that the air exhaust tube 470 and the rotating shaft 460 are arranged at the same end, the sealing requirements of the air exhaust tube 470 are reduced by arranging the air exhaust tube 470 and the rotating shaft 460 at two ends, a magnetic fluid sealing structure with a complex structure is not needed, the structure can be simplified, and the cost and the assembly difficulty are reduced. Moreover, the magnetic fluid sealing structure can lose efficacy when exceeding 120 ℃, and the upper limit of the deposition temperature can be improved without arranging the magnetic fluid sealing structure in the embodiment, so that the device can be used for high-temperature atomic layer deposition, and the application range of the device is wider.
Specifically, in some embodiments, the central region of the mounting bracket 200 is provided with a through receiving groove 210, and two ends of the receiving groove 210 are respectively provided with one mounting groove 220 along the axial direction. The second bearing member 400 is disposed in the receiving groove 210, and the rotating shaft 460 and the suction pipe 470 are respectively mounted in the corresponding mounting grooves 220. The rotating shaft 460 is connected with the corresponding mounting groove 220 through a first bearing 530, and the first bearing 530 is in interference fit with the mounting groove 220. The suction pipe 470 is connected with the corresponding mounting groove 220 through a second bearing 540, and the second bearing 540 is in interference fit with the mounting groove 220. Therefore, if the powder to be coated is to be deposited, the first bearing 530 and the second bearing 540 are inserted into the corresponding mounting grooves 220; if the blocky object to be coated is to be deposited, the first bearing 530 and the second bearing 540 are removed from the corresponding mounting grooves 220, and then the first bearing 300 is mounted, so that the operation is very convenient.
Specifically, in some embodiments, the second carrier 400 includes an inner support mesh 420, an outer support mesh 410, an inner filter mesh 440, an outer filter mesh 430, a first end cap 451, and a second end cap 452. The inner support net 420 and the outer support net 410 are both in a hollow cylinder shape with openings at both ends, the outer support net 410 is radially arranged outside the inner support net 420, and a gap is formed between the inner support net 420 and the outer support net 410. The inner filter screen 440 is sleeved outside the inner support screen 420 and is jointed and fixedly connected with the inner support screen, and the outer filter screen 430 is sleeved outside the outer support screen 410 and is jointed and fixedly connected with the outer support screen. The inner support net 420 may support and fix the inner filter net 440 so as not to deform, and similarly, the outer support net 410 may support and fix the outer filter net 430. The inner support net 420 and the outer support net 410 are both hollow, and the side walls of the inner support net and the outer support net are both provided with through hole sites along the radial direction, and the shape of the hole sites is not limited and can be circular, strip-shaped or square. A first end cap 451 is fixed to one end of the inner support mesh 420 and the outer support mesh 410, and a second end cap 452 is fixed to the other end. An accommodating cavity 481 is formed between the inner filter screen 440 and the outer support screen 410, an air suction cavity 482 is formed inside the inner support screen 420, and the air suction cavity 482 is communicated with the air suction pipe 470. The powdery covering object is placed in the accommodating cavity 481, and the inner filter 440 and the outer filter 430 are high-count filters, so that the powdery covering object can be blocked, prevented from leaking inwards into the air-extracting cavity 482 and being extracted away, and prevented from leaking outwards to the outside of the second bearing member 400.
During atomic layer deposition, a powdery object to be coated is placed in the accommodating cavity 481, the vacuum pump is connected to the pumping hole 112 formed in the reaction chamber main body 110, different precursors alternately enter the reaction cavity 130 from the gas inlet 111 formed in the reaction chamber main body 110, sequentially pass through the outer filter mesh 430 and the outer support mesh 410, enter the accommodating cavity 481, contact the powder and perform coating deposition, and redundant precursors sequentially pass through the inner filter mesh 440 and the inner support mesh 420, enter the pumping cavity 482 and are pumped away through the pumping pipe 470.
In some embodiments, the inner screen 440 is secured to the exterior of the inner support screen 420 by a screen retainer clip 490. Specifically, the shape and size of the inner filter screen 440 are matched with those of the outer wall of the inner support screen 420, the inner filter screen 440 is sleeved on the outer wall of the inner support screen 420, and then the filter screen fixing clamp 490 is used for fixing the outer part of the inner filter screen 440 and locking the inner filter screen. Similarly, the outer screen 430 is also secured to the exterior of the outer support screen 410 by a screen retainer clip 490.
Referring to fig. 2, 4-6, specifically, in some embodiments, the outer support mesh 410 includes an outer support mesh first end plate 412, the outer support mesh first end plate 412 being integrally connected to one end of the outer support mesh side plate 411. The rotating shaft 460 is disposed on the first end cap 451, and the first end cap 451 is detachably connected to the first end plate 412 of the outer supporting net. The rotating shaft 460 is detachably connected with the inner supporting net 420, specifically, the rotating shaft 460 penetrates through the outer supporting net first end plate 412, a part of the rotating shaft 460, which is located at the inner side of the outer supporting net first end plate 412, is inserted into the inner supporting net 420 and is in interference fit, and a sealing ring is arranged between the two. Meanwhile, the first end plate 412 of the outer support net is connected with the first end cap 451 by a screw fastener. Preferably, the portion of the shaft 460 located inside the first end plate 412 of the outer support net is gradually reduced in diameter in the direction of inserting the inner support net 420, i.e., the portion is provided with a slope, so that the support net 420 can be easily detached from the first end plate 412 of the outer support net.
Further, in some embodiments, the outer support mesh 410 further comprises an outer support mesh second end plate 413, and the outer support mesh second end plate 413 and the outer support mesh first end plate 412 are respectively connected to two ends of the outer support mesh side plate 411. The second end cap 452 is detachably connected to the second end plate 413 of the outer support net, the suction pipe 470 is disposed on the second end cap 452, and an end of the suction pipe 470 is fixedly connected to the inner support net 420, for example, the end of the suction pipe 470 is in interference fit with the inner support net 420, or the two are fixed by adhesion. Specifically, in some embodiments, the suction tube 470 is hollow inside, and penetrates through the outer support net second end plate 413, and the portion of the suction tube 470 located inside the outer support net second end plate 413 is inserted into the inner support net 420, and is in interference fit, and a sealing ring is disposed between the two. Meanwhile, the outer support net second end plate 413 is coupled with the second end cap 452 by a screw fastener. The outer support net second end plate 413 is provided with a notch 4131, the notch 4131 is circular, and the projection of the edge of the notch 4131 along the axial direction is located on one side of the accommodating cavity 481 close to the outer support net 410, that is, the radius of the notch 4131 is larger. Thus, it is more convenient to insert the powder into the accommodation cavity 481 and to take out the powder from the accommodation cavity 481 after the deposition is completed. Specifically, when the powder is put in, the powder is put into the accommodating cavity 481 from the notch 4131, and then the second end cap 452 is mounted on the second end plate 413 of the outer support mesh. When the powder is taken out, the second end cap 452 is detached from the outer support net second end plate 413, the inner support net 420 is taken out together with the inner filter net 440 while being detached, and then the powder is poured out. As previously described, the portion of the shaft 460 located inside the outer support screen first end plate 412 is tapered so that the inner support screen 420 is more easily separated from the outer support screen first end plate 412 when the second end cap 452 is removed.
Preferably, the rotating shaft 460 is provided with a special-shaped groove 461, and the special-shaped groove 461 is a blind hole and has a step surface, so that the shaft can be limited when being connected with the coupler 520.
In some embodiments, the second carrier 400 includes an inner filter 440, an outer filter 430, a first end cap 451, and a second end cap 452. The inner filter screen 440 and the outer filter screen 430 are both hollow cylinders with openings at both ends, the outer filter screen 430 is radially arranged outside the inner filter screen 440, and a gap is formed between the inner filter screen 440 and the outer filter screen 430. The first end cap 451 is fixed to one end of the inner filter 440 and the outer filter 430, and the second end cap 452 is fixed to the other end. An accommodating cavity 481 is formed between the inner filter screen 440 and the outer filter screen 430, an air suction cavity 482 is formed inside the inner filter screen 440, and the air suction cavity 482 is communicated with the air suction pipe 470. The powdery coating object is placed in the accommodating cavity 481, and the inner filter screen 440 and the outer filter screen 430 are both high in number, so that the powdery coating object can be blocked, the powdery coating object is prevented from leaking inwards to enter the air pumping cavity 482 and being pumped away, and the powdery coating object is prevented from leaking outwards to the outside of the second bearing piece 400. The inner filter screen 440 and the outer filter screen 430 are sintered filter screens, and the filter screens have high strength and are not easy to deform.
Referring to fig. 1, in some embodiments, a reaction chamber body 110 is mounted with quartz glass 140, and an infrared heating lamp is disposed outside the reaction chamber body 110 and is capable of heating a reaction chamber body 130 through the quartz glass 140. Compared with modes such as resistance heating, the heating speed of infrared heating is higher, a heating sleeve does not need to be customized according to the size of the reaction chamber like resistance heating, a special fixing structure does not need to be arranged, and the structure can be simplified.
In some embodiments, a support 610 is further provided, wherein the support 610 is fixedly connected to both the chamber door 120 and the driving member 510, a sliding block 620 is fixedly connected to the bottom of the support 610, and the sliding block 620 is slidably connected to the sliding rail 630. When the chamber door 120 is pushed to approach or move away from the chamber body 110, the slider 620 slides along the slide rail 630 to be guided.
When the atomic layer deposition apparatus of the above embodiment is used to perform atomic layer deposition, the chamber door 120 is first connected to the reaction chamber main body 110, to check whether the apparatus is operating normally, and the reaction chamber 130 is evacuated through the pumping hole 112. Then, the chamber door 120 is separated from the reaction chamber body 110, a corresponding bearing member is selected according to the form of the object to be coated, and if the object to be coated is a block-shaped object to be coated, the first bearing member 300 is fixed on the mounting frame 200; if the powder is to be coated, the second carrier 400 is mounted on the mounting frame 200. The powder to be coated is explained as an example. The chamber door 120 is connected to the chamber body 110 again, the reaction chamber 130 is heated by the infrared heating lamp, and the driving member 510 is turned on to drive the second carrier 400 to rotate (if the first carrier 300 is used, the driving member 510 is not turned on). The carrier gas is introduced into the reaction chamber 130 through the gas inlet 111, flows into the accommodating chamber 481 to contact with the powder to be coated, flows into the pumping tube 470 through the pumping chamber 482, and is pumped out from the pumping hole 112. The carrier gas can be nitrogen or inert gas, and the interior can be cleaned by firstly introducing the carrier gas to remove impurities. Then, the first precursor is mixed into the carrier gas and introduced into the gas inlet 111, the first precursor is adsorbed on the surface of the powder to be coated for deposition, and the excess first precursor flows into the pumping tube 470 from the pumping cavity 482 and is pumped out. As the second carrier 400 rotates continuously, the first precursor can be sufficiently contacted with the powder to be coated and adsorbed. And after a period of time, stopping introducing the first precursor, continuing introducing the carrier gas, and purging and cleaning the inside by the carrier gas. After purging for a period of time, mixing the second precursor with the carrier gas, introducing the mixture into the gas inlet 111, performing a chemical reaction between the second precursor and the first precursor on the surface of the powder to be coated, wherein the reaction product is a coating material, and the excess second precursor flows into the exhaust tube 470 from the exhaust cavity 482 and is exhausted. And after a period of time, stopping introducing the second precursor, continuing introducing the carrier gas, and purging and cleaning the inside by the carrier gas. Thus, an atomic layer deposition cycle is performed, namely, a film with the thickness of an atomic layer is deposited on the surface of the object to be coated. In the experiment, the number of deposition layers is controlled by controlling the cycle number, so that the expected coating thickness is achieved. After the deposition is finished and the carrier gas is purged for a period of time, the vacuum pump is turned off, the gas is stopped being pumped out from the pumping hole 112, the carrier gas is continuously pumped in for gas return, the internal pressure is gradually equal to the atmospheric pressure, the chamber door 120 and the reaction chamber main body 110 are separated, the temperature is reduced to the normal temperature, the second bearing piece 400 is disassembled, the second end cover 452 is opened, and the product is poured out from the notch 4131 on the second end plate 413 of the outer support net.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that various changes and modifications can be made by those skilled in the art without departing from the spirit of the invention, and these changes and modifications are all within the scope of the invention. Therefore, the protection scope of the present patent should be subject to the appended claims.

Claims (10)

1. An atomic layer deposition apparatus, comprising:
the reaction chamber comprises a reaction chamber main body and a chamber door, a reaction cavity is formed inside the reaction chamber main body, an air inlet and an air extraction opening are formed in the reaction chamber main body, and the chamber door is detachably connected with the reaction chamber main body;
the mounting rack is fixedly connected with the cavity door, and when the cavity door is connected with the reaction chamber main body, the mounting rack is positioned inside the reaction cavity;
the first bearing piece is used for bearing a blocky object to be coated, and the first bearing piece is detachably connected with the mounting frame;
the second bearing piece is used for bearing a powdery object to be coated and is detachably connected with the mounting frame; the second bearing piece comprises an air suction pipe connected with the air suction port; the second bearing part also comprises an inner supporting net and an outer supporting net which are arranged along the radial direction, and a first end cover and a second end cover which are respectively connected with the two ends of the inner supporting net and the outer supporting net; the inner support net and the outer support net are both hollow, an inner filter screen is sleeved outside the inner support net, an outer filter screen is sleeved outside the outer support net, a containing cavity for containing the powdery object to be coated is formed between the inner filter screen and the outer support net, and an air exhaust cavity communicated with the air exhaust pipe is formed inside the inner support net;
a drive member;
in a first use state, the first bearing piece is fixedly connected with the mounting frame;
under a second use state, the second bearing part is connected with the mounting frame, the driving part is connected with the second bearing part, and the driving part is used for driving the second bearing part to rotate relative to the mounting frame.
2. The atomic layer deposition apparatus according to claim 1, wherein the first carrier is provided with a plurality of recesses for receiving the mass of material to be encapsulated.
3. The atomic layer deposition apparatus according to claim 1, wherein in the first use state the first carrier is connected to the mounting frame by means of threaded fasteners; or the first bearing piece is connected with the mounting frame in a buckling manner; or the first bearing piece and the mounting frame are fixed through magnetic attraction.
4. The atomic layer deposition apparatus according to claim 1, wherein in the second use state, the second carrier is connected to the mounting frame via a bearing, and a rotating shaft of the second carrier is connected to the driving member.
5. The atomic layer deposition apparatus according to claim 4, wherein the pumping tube is disposed coaxially with the rotation axis and is disposed at two axial ends of the second carrier respectively.
6. The atomic layer deposition device according to claim 5, wherein a through receiving groove is formed in a central region of the mounting frame, the second bearing member is located in the receiving groove, two mounting grooves are formed in two ends of the receiving groove respectively along the axial direction, the rotating shaft and the suction pipe are sleeved with the bearings, and the bearings are in interference fit with the corresponding mounting grooves.
7. The atomic layer deposition apparatus according to claim 5, wherein the outer support mesh comprises an outer support mesh first end plate, the first end cap is detachably connected to the outer support mesh first end plate, the rotation shaft is disposed on the first end cap, and the rotation shaft is detachably connected to the inner support mesh.
8. The atomic layer deposition apparatus according to claim 7, wherein the outer support net further comprises a second end plate of the outer support net, the second end cap is detachably connected to the second end plate of the outer support net, the exhaust pipe is disposed on the second end cap, a notch is disposed on the second end plate of the outer support net, and an axial projection of an edge of the notch is located on a side, close to the outer support net, in the accommodating cavity.
9. The atomic layer deposition apparatus according to claim 1, wherein the reaction chamber body is mounted with quartz glass, and an infrared heating lamp is disposed outside the reaction chamber body and capable of heating the reaction chamber through the quartz glass.
10. The atomic layer deposition apparatus according to claim 1, comprising a support fixedly connected to the chamber door and the driving member, wherein a sliding block is fixedly connected to a bottom of the support, the sliding block is slidably connected to a sliding rail, and the sliding block and the sliding rail are used for guiding the linear motion of the chamber door.
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