CN113518913A

CN113518913A - Analysis device

Info

Publication number: CN113518913A
Application number: CN201980093517.0A
Authority: CN
Inventors: 石川丈宽
Original assignee: Shimadzu Corp
Current assignee: Shimadzu Corp
Priority date: 2019-03-05
Filing date: 2019-08-13
Publication date: 2021-10-19
Anticipated expiration: 2039-08-13
Also published as: JP7173277B2; CN113518913B; JPWO2020179102A1; WO2020179102A1

Abstract

The charged particle beam irradiation device is configured to irradiate a sample with a charged particle beam and detect a signal emitted from the sample. The first processing unit (10) is configured to be capable of communicating with the first input device (11), and analyzes the sample based on a detection signal of the charged particle beam irradiation device based on a signal from the first input device (11). The second processing unit (20) is configured to be capable of communicating with the second input device (21) and the first processing unit (10), generates an observation image of the sample on the basis of a detection signal of the charged particle beam irradiation device, and controls the charged particle beam irradiation device on the basis of a signal from the second input device (21). The second input device (21) comprises a pointing device. A second processing unit (20) converts an operation input to the pointing device into a control signal for the charged particle beam irradiation apparatus.

Description

Analysis device

Technical Field

The present invention relates to an analysis device.

Background

An analysis apparatus such as an Electron Probe Microanalyzer (EPMA) and a Scanning Electron Microscope (SEM) is constituted of: a sample is irradiated with a charged particle beam such as an electron beam or an ion beam, and signals (secondary electron beam, reflected electron beam, characteristic X-ray, and the like) generated from the sample by the irradiation are detected, whereby the sample can be observed and analyzed.

Jp 2015-17971 a (patent document 1) discloses a spectroscopic measurement apparatus for observing a sample using a spectroscopic microscope. The spectroscopic measurement apparatus described in patent document 1 includes an image processing apparatus that displays spectroscopic data acquired by a spectroscopic microscope on a display unit. The image processing apparatus is configured to change a display image in accordance with an instruction from a pointing device such as a mouse.

Documents of the prior art

Patent document

Patent document 1: japanese patent laid-open publication No. 2015-17971

Disclosure of Invention

Problems to be solved by the invention

In recent years, there has been proposed an analysis apparatus having a configuration capable of performing all operations for observation and analysis of a sample using an instruction device. According to this configuration, the analyst can perform image observation (secondary electron image, reflected electron image, and X-ray image) of the sample, analysis position search of the sample based on the observation image, and qualitative and quantitative analysis of the elements included in the analysis position by operating the icons or the like displayed on the display using the pointing device.

For example, in the case of searching for an analysis position of a sample by EPMA, an observation image is displayed on a display, and icons for adjusting the position of a sample stage, the focus and magnification of an electron beam, and the like are displayed. When the analyst manipulates the icon with the pointing device while viewing the observation image, the field of view can be set at a desired analysis position on the sample by controlling the electron beam irradiation device in accordance with the manipulation.

Further, since the analysis position search of the sample is performed every time the sample is changed, the execution frequency is relatively high compared to other operations. However, in the above-described configuration, operability may not be necessarily high depending on an analyst, but since a pointing device needs to be used in combination with other operations, it is difficult to exclusively use the pointing device for controlling the electron beam irradiation apparatus.

On the other hand, as another configuration of the analysis device, there is a configuration in which a dedicated operation device dedicated to the control of the electron beam irradiation device is attached to the electron beam irradiation device. For example, a panel-shaped operation device is provided integrally with the electron beam irradiation device, and operation switches (buttons, dials, switches, and the like) for adjusting the position of the sample stage, the focus and magnification of the electron beam, and the like are provided in the operation device. The analyst can control the electron beam irradiation device by manually operating the operation switch while viewing the observation image. However, even with such a manipulation device dedicated to the control of the electron beam irradiation apparatus, since the convenience of use varies depending on the analyst, there is a problem that it is difficult to provide a manipulation device having good operability for all analysts.

In addition, since communication inherent to the electron beam irradiation device is used in communication between the dedicated operation device and the controller of the electron beam irradiation device, device manufacturers need to design each device, which causes a problem of high manufacturing cost.

The present invention has been made to solve the above-described problems, and an object of the present invention is to improve the work efficiency of an analyst with a simple configuration in an analyzer.

Means for solving the problems

According to a first aspect of the present invention, an analysis device includes a charged particle beam irradiation device, a first processing unit, a second processing unit, and a display. The charged particle beam irradiation device is configured to irradiate a sample with a charged particle beam and detect a signal emitted from the sample. The first processing unit is configured to be capable of communicating with the first input device, and configured to analyze the sample based on a detection signal of the charged particle beam irradiation device in accordance with an analysis condition specified by the first input device. The second processing unit is configured to be capable of communicating with the second input device and the first processing unit, and configured to generate an observation image of the sample based on a detection signal of the charged particle beam irradiation device, and to control the charged particle beam irradiation device based on a signal from the second input device. The display is configured to be capable of communicating with the first processing unit and the second processing unit, and configured to display the analysis condition and the observation image generated by the second processing unit. The second input device comprises a pointing device. The second processing unit converts an operation input to the pointing device into a control signal for the charged particle beam irradiation apparatus.

ADVANTAGEOUS EFFECTS OF INVENTION

According to the present invention, the analyzer can improve the work efficiency of the analyst with a simple configuration.

Drawings

Fig. 1 is a schematic diagram illustrating a configuration example of an analysis device according to an embodiment of the present invention.

Fig. 2 is a diagram schematically showing a configuration example of the electron beam irradiation apparatus shown in fig. 1.

Fig. 3 is a diagram schematically showing the configuration of the first computer and the second computer.

Fig. 4 is a diagram showing a display example of the first display and the second display and a configuration example of the first PD and the second PD.

Fig. 5 is a diagram illustrating the control content of the electron beam irradiation device corresponding to each operation of the second PD.

Detailed Description

Embodiments of the present invention will be described in detail below with reference to the drawings. In the drawings, the same or corresponding portions are denoted by the same reference numerals, and description thereof will not be repeated.

Fig. 1 is a schematic diagram illustrating a configuration example of an analysis device according to an embodiment of the present invention. The analyzer 100 according to the present embodiment is configured to irradiate a sample with a charged particle beam, detect a signal generated from the sample, and observe and analyze the sample. The Analyzer 100 is, for example, an Electron Probe Microanalyzer (EPMA).

Referring to fig. 1, EPMA 100 according to the present embodiment includes an electron beam irradiation device 50, a first computer 10, a second computer 20, a first display 12, a second display 22, a first pointing device (hereinafter also referred to as "first PD") 11, and a second pointing device (hereinafter also referred to as "second PD") 21.

The electron beam irradiation device 50 is configured to irradiate an electron beam on the surface of the sample and detect a signal emitted from the surface of the sample. The detection signal includes characteristic X-rays having energy specific to an element contained in the sample surface, secondary electrons, reflected electrons, and the like. In the EPMA 100, by analyzing the energy and intensity of the detected characteristic X-ray, the element present at the analysis position on the surface of the sample can be identified and quantified. The electron beam irradiation device 50 corresponds to one embodiment of a "charged particle beam irradiation device".

Further, the shape, the group image, and the convex-concave shape of the sample surface can be observed based on the detected secondary electrons and reflected electrons. The analyst can search for an analysis position on the sample surface while observing the secondary electron image or the reflected electron image. Specifically, the analyst can set the irradiation position of the electron beam on the sample surface (i.e., the measurement position of the sample surface) and specify the analysis target region on the sample surface while observing the electron image.

EPMA generally has the following tendency: the amount of information and the amount of computation to be processed in each of the processing related to the control of the electron beam irradiation device and the processing related to the analysis of the characteristic X-rays detected by the electron beam irradiation device increase. Therefore, the analyzer 100 according to the present embodiment is configured to execute processing related to control of the electron beam irradiator 50 and processing related to analysis of the characteristic X-rays by different processing units.

Specifically, the first computer 10 is an analysis computer for analyzing the characteristic X-rays detected by the electron beam irradiation device 50. The first computer 10 corresponds to one embodiment of the "first processing section". The second computer 20 is a control computer for controlling the electron beam irradiation device 50. The second computer 20 corresponds to one embodiment of the "second processing section".

As shown in fig. 1, a first computer 10 and a second computer 20 are connected in a communicable manner. The second computer 20 is also connected to the electron beam irradiation device 50 so as to be able to communicate with it. The second computer 20 generates control signals for controlling the operation of each part of the electron beam irradiation device 50, and outputs the generated control signals to the electron beam irradiation device 50. In addition, the second computer 20 receives signals (characteristic X-rays, secondary electrons, and/or reflected electrons) detected by the electron beam irradiation device 50. The second computer 20 receives the secondary electrons and/or the reflected electrons from the electron beam irradiation device 50, and generates an observation image (secondary electron image and/or reflected electron image) of the analysis position. In addition, the second computer 20 generates a distribution image (X-ray image) of the elements at the analysis position on the sample surface from the position scan of the electron beam at the analysis position.

The first computer 10 receives the characteristic X-rays from the second computer 20, and performs qualitative and quantitative analysis of the elements contained in the analysis position on the sample surface based on the received characteristic X-rays. Specifically, the first computer 10 creates an X-ray spectrum corresponding to a wavelength scan of the characteristic X-rays, and performs qualitative analysis and quantitative analysis based on the X-ray spectrum.

The EPMA 100 has a display as an output device for providing various information such as the generated observation image and the analysis result to the analyst. As described above, since the amount of information is large in each of the processing related to the control of the electron beam irradiation device 50 and the processing related to the analysis of the characteristic X-rays, 2 displays 12 and 22 are used in the present embodiment. The first display 12 is connected to the first computer 10 and has a first display screen 120. The first display 12 constitutes a display unit for displaying information on processing relating to analysis of characteristic X-rays. The X-ray spectrum and the results of qualitative analysis and quantitative analysis based on the X-ray spectrum are displayed on the first display screen 120.

The second display 22 is connected to the second computer 20 and has a second display screen 220. The second display 22 constitutes a display unit for displaying information of processing related to control of the electron beam irradiation device 50. An image (X-ray image, secondary electron image, and/or reflected electron image) to be observed by the analyst when setting the analysis position of the sample is displayed on the second display screen 220.

As shown in fig. 1, the first display 12 and the second display 22 are closely arranged for operability of the analyst. In the example of fig. 1, the first display screen 120 is disposed on the left side of the drawing sheet, and the second display screen 220 is disposed on the right side of the drawing sheet.

The first PD11 is connected to the first computer 10. The first PD11 is configured to be able to communicate with the first computer 10 and the second computer 20. The first PD11 constitutes a "first input device" for inputting an instruction of an analyst to the first computer 10. The first input device is, for example, a pointing device (hereinafter also referred to as a PD), a keyboard, a touch panel, or the like. In the example of fig. 1, the first operation portion is an instruction device. The pointing device is for example a mouse, a joystick or a trackball.

The analyst can perform reading of the coordinates of the designated position and input operation to the position by designating the position on the first display screen 120 with the pointer P1 using the first PD 11. As a specific example, an icon indicating an analysis item such as qualitative analysis or quantitative analysis is displayed on the first display screen 120. The analyst uses the first PD11 to designate an icon corresponding to a desired analysis item with the pointer P1. The first computer 10 converts the operation input to the first PD11 into an operation on the pointer P1 displayed on the first display screen 120. This enables the analyst to specify analysis items and analysis conditions such as detailed settings of the analysis items using the first PD 11. The icon is not particularly limited as long as it is an image displayed on the first display screen and the second display screen for use in the operation of the analyzer 100 or the analysis (for example, identification or quantification of a substance) performed by the analyzer 100.

Further, the pointer P1 corresponding to the first PD11 is configured to: normally, the pointer P1 functions on the first display screen 120, but functions on the second display screen 220 if the pointer P1 moves beyond the end of the first display screen 120 (the right end of the first display screen 120 in fig. 1) to the end of the second display screen 220 (the left end of the second display screen 220 in fig. 1) as indicated by an arrow a 1. That is, the pointer P1 functions to virtually connect the right end of the first display screen 120 and the left end of the second display screen 220.

Thus, the analyst can perform the reading of the coordinates of the position pointed by the pointer P1 and the input operation to the position by designating the position on the second display screen 200 using the first PD 11. Specifically, icons indicating control items for the electron beam irradiation device 50 are displayed on the second display screen 220. The analyst uses the first PD11 to designate an icon corresponding to a desired control item with the pointer P1. The first computer 10 converts the operation input to the first PD11 into an operation on the pointer P1 displayed on the second display screen 220. This enables the analyst to specify conditions and the like of desired control items using the first PD 11.

The second PD21 is connected to the second computer 20. The second PD21 is configured to be able to communicate with the second computer 20. The second PD21 constitutes a "second input device" for inputting an instruction of the analyst to the second computer 20. The second input device is a pointing device. The pointing device is for example a mouse, a joystick or a trackball. The analyst can input instructions related to the control of the electron beam irradiation device 50 to the second computer 20 using the second PD 21. However, the pointer corresponding to the second PD21 is not displayed on the first display screen 120 and the second display screen 220. The second PD21 will be described later in detail.

Fig. 2 is a diagram schematically showing a configuration example of the electron beam irradiation device 50 shown in fig. 1.

Referring to fig. 2, the electron beam irradiation device 50 includes an electron gun 1, a deflection yoke 2, an objective lens 3, a sample stage 4, a sample stage driving unit 5, a plurality of

beam splitters

6a and 6b, a deflection yoke control unit 7, and an electron detector 8. The electron gun 1, the deflection yoke 2, the objective lens 3, the sample stage 4, the

spectroscopes

6a and 6b, and the electron detector 8 are provided in a measurement chamber not shown. In the measurement of X-rays, the measurement chamber is evacuated to be in a state close to vacuum.

The electron gun 1 is an excitation source that generates an electron beam E to be irradiated onto the sample S on the sample stage 4, and the beam current of the electron beam E can be adjusted by controlling a condenser lens (not shown). The deflection coil 2 forms a magnetic field by the drive current supplied from the deflection coil control unit 7. The electron beam E can be deflected by the magnetic field formed by the deflection coil 2.

The objective lens 3 is provided between the deflection yoke 2 and the sample S placed on the sample stage 4, and reduces the electron beam E passing through the deflection yoke 2 to a small diameter. The sample stage 4 is a stage on which the sample S is placed, and is configured such that the sample stage 4 can be moved in a horizontal plane by the sample stage driving unit 5.

The electron beam irradiation device 50 can two-dimensionally scan the irradiation position of the electron beam E on the sample S by driving the sample stage 4 by the sample stage driving unit 5 and/or driving the deflection coil 2 by the deflection coil control unit 7. The deflection yoke 2 and/or the sample stage 4 constitute a "scanning unit" for scanning the electron beam E on the sample S. Normally, when the scanning range is relatively small, scanning is performed by the deflection coil 2, and when the scanning range is relatively large, scanning is performed by movement of the sample stage 4.

The

spectroscopes

6a and 6b are devices for detecting characteristic X-rays emitted from the sample S irradiated with the electron beam E. In fig. 2, only 2

beam splitters

6a and 6b are shown, but actually, a total of 4 beam splitters are provided in the electron beam irradiation device 50 so as to surround the sample S. The structures of the spectrometers are the same except for the spectroscopic crystal, and hereinafter, the spectrometers may be simply referred to as "spectrometer 6".

The spectrometer 6a includes a spectroscopic crystal 61a, a detector 63a, and a slit 64 a. The irradiation position of the electron beam E on the sample S, the spectroscopic crystal 61a, and the detector 63a are arranged on a rowland circle, not shown. The spectroscopic crystal 61a is tilted while moving on the straight line 62a by a drive mechanism not shown. The detector 63a is rotated as shown in the figure in accordance with the movement of the spectroscopic crystal 61a by a driving mechanism not shown in the figure so that the incident angle of the characteristic X-ray with respect to the spectroscopic crystal 61a and the output angle of the diffracted X-ray with respect to the spectroscopic crystal 61a satisfy the bragg diffraction condition. This enables wavelength scanning of the characteristic X-rays emitted from the sample S.

The spectrometer 6b includes a spectroscopic crystal 61b, a detector 63b, and a slit 64 b. The structure of the spectroscope 6b and the spectroscope not shown is the same as that of the spectroscope 6a except for the spectroscopic crystal, and therefore, the description thereof will not be repeated. The configuration of each beam splitter is not limited to the above configuration, and various conventionally known configurations can be adopted.

The electron detector 8 is a device for detecting an electron beam emitted from the sample S irradiated with the electron beam E. The electron detector 8 detects secondary electrons. The detection signal of the electronic detector 8 is sent to the second computer 20.

The reflected electrons are also detected by an electron detector not shown. The detection signal of the reflected electrons is also sent to the second computer 20.

The deflection coil control unit 7 controls the drive current supplied to the deflection coil 2 in accordance with an instruction from the second computer 20. By controlling the drive current in accordance with a predetermined drive current pattern (magnitude and changing speed), the irradiation position of the electron beam E can be scanned on the sample S at a desired scanning speed.

The second computer 20 executes various processes related to the control of the electron beam irradiation device 50 in accordance with a built-in program and table. The second computer 20 generates an observation image in the analysis target region in accordance with the position scan of the electron beam E in the analysis target region on the sample S. Specifically, the second computer 20 generates a secondary electron image of the analysis target region of the sample S based on the secondary electrons detected by the electron detector 8. Further, the second computer 20 generates a distribution image (X-ray image) of the analysis target elements in the analysis target region of the sample S based on the characteristic X-rays detected by the 4 spectroscopes 6.

When receiving a wavelength scan of X-rays to be analyzed from the second computer 20, the first computer 10 creates an X-ray spectrum based on the received wavelength scan. The first computer 10 performs qualitative analysis and/or quantitative analysis based on X-ray spectra, and the like.

Fig. 3 is a diagram schematically showing the configuration of the first computer 10 and the second computer 20.

Referring to fig. 3, the first computer 10 includes a CPU 13, a memory 14, an input interface (hereinafter also referred to as an input I/F)15, a display controller 16, and a communication interface (hereinafter also referred to as a communication I/F) 17.

The first computer 10 is configured to operate according to a program stored in the memory 14. The Memory 14 includes a ROM (Read Only Memory), a RAM (Random Access Memory), and an HDD (Hard Disk Drive), which are not shown.

The ROM can store programs executed by the CPU 13. The program includes a program related to a process of analyzing the characteristic X-rays detected by the electron beam irradiation device 50 and received via the second computer 20. The RAM can function as a temporary data memory that temporarily stores data used during execution of a program by the CPU 13 and is used as a work area. The HDD is a nonvolatile storage device and can store the characteristic X-rays received from the second computer 20, the analysis result of the characteristic X-rays, and the like. A semiconductor storage device such as a flash memory may be used in addition to or instead of the HDD.

The CPU 13 controls the first computer 10. The CPU 13 expands a program stored in the ROM of the memory 14 in the RAM or the like and executes the program.

The input I/F15 is connected to the first PD 11. The input I/F15 is an interface for the first computer 10 to communicate with the first PD11, and receives various signals from the first PD 11.

The display controller 16 is connected to the first display 12. The display controller 16 outputs a signal indicating the display content on the first display screen 120 to the first display 12. When the first display 12 is a display provided with a touch panel, the display controller 16 receives a signal indicating a touch operation by the analyst from the first display 12.

The communication I/F17 is connected to the communication I/F27 of the second computer 20. The communication I/F17 is an interface for the first computer 10 and the second computer 20 to communicate with each other, and inputs and outputs various signals to and from the second computer 20.

The first computer 10 is realized by installing software related to analysis of characteristic X-rays in a computer having a general function and storing a dedicated program and data in the memory 14. Specifically, in the first computer 10, a basic software program called an Operating System (OS) is always running. The basic software program is responsible for display on the first display 12, processing of operation input to the first PD11, access to the memory 14, and the like, and can perform processing in parallel.

On the other hand, a software program related to the analysis of characteristic X-rays is executed on the basic software program. The memory 14 of the first computer 10 is supplied with a software program related to the analysis of the characteristic X-rays from the outside, and the CPU 13 reads out and executes the supplied program code to realize the software program related to the analysis of the characteristic X-rays.

The second computer 20 includes a CPU 23, a memory 24, an input I/F25, a display controller 26, and a communication I/F27. The second computer 20 is configured to operate in accordance with a program stored in the memory 24. The memory 24 includes a ROM, a RAM, and an HDD, which are not shown.

The ROM can store programs executed by the CPU 23. The program includes a program of processing related to control of the electron beam irradiation device 50. The RAM can function as a temporary data memory that temporarily stores data used during execution of the program by the CPU 23 and can be used as a work area. The HDD is a nonvolatile storage device capable of storing the detection signal generated by the electron beam irradiation device 50 and the information generated by the second computer 20. A semiconductor storage device such as a flash memory may be used in addition to or instead of the HDD.

The CPU 23 controls the entirety of the electron beam irradiation device 50 and the analysis device 100. The CPU 23 expands the program stored in the ROM of the memory 24 in the RAM or the like and executes the program.

The input I/F25 is connected to the second PD 21. The input I/F25 is an interface for the second computer 20 to communicate with the second PD21, and receives various signals from the second PD 21.

The display controller 26 is connected to the second display 22. The display controller 26 outputs a signal indicating the display content of the second display screen 220 to the second display 22. When the second display 22 is a display provided with a touch panel, the display controller 26 receives a signal indicating a touch operation of the second display screen 220 by the analyst from the second display 22.

The communication I/F27 is connected to the electron beam irradiation device 50 and the communication I/F17 of the first computer 10. The communication I/F27 is an interface for the second computer 20 to communicate with the electron beam irradiation device 50 and the first computer 10, and inputs and outputs various signals to and from the electron beam irradiation device 50 and the first computer 10.

The second PD21 is a PD dedicated to control the electron beam irradiation device 50. The second PD21 will be described later in detail.

The second computer 20 can be realized by installing software related to control of the electron beam irradiation device 50 in a computer having a general function and storing a dedicated program and data in the memory 24. Specifically, in the second computer 20, a basic software program called an OS is always running. The basic software program is responsible for display on the second display 22, processing of operation input to the second PD21, access to the memory 24, and the like, and can perform processing in parallel.

On the other hand, a software program related to the control of the electron beam irradiation device 50 is executed on the basic software program. The memory 24 of the second computer 20 is supplied with a software program related to the control of the electron beam irradiation device 50 from the outside, and the CPU 23 reads out and executes the supplied program code to realize the software program related to the control of the electron beam irradiation device 50.

Referring to fig. 4, the second display 22 displays information related to control of the electron beam irradiation device 50. The analyst can provide various instructions for controlling the electron beam irradiating device 50 to the second computer 20 based on the display. For example, a numerical value indicating the observation condition of the electron beam irradiation device 50 and observation images (secondary electron image and/or reflected electron image and X-ray image) can be displayed on the second display screen 220 of the second display 22. In the example of fig. 4, an X-ray image I1, which is an observation image generated based on the characteristic X-rays transmitted from the electron beam irradiation device 50 to the second computer 20, and numerical values M1 to M4 indicating the observation conditions of the X-ray image I1 are displayed on the second display screen 220. The analyst can adjust the numerical values M1 to M4 while viewing the X-ray image I1. The icons 221 to 224 will be described later.

On the other hand, on the first display screen 120 of the first display 12, icons 121 to 123 for processing and analyzing the characteristic X-rays transmitted from the second computer 20 to the first computer 10, a window W1 indicating the analysis result, and an image I2 obtained by image processing the X-ray image I1 displayed on the first display 12 are displayed. The analyst can select an observation image to be analyzed using the first PD11, select analysis contents in the icons 121 to 123 and the like, and confirm the results of the analysis and the processing through the window W1, the image I2 and the like. Further, an example in which the visibility of the analyst is improved by performing processing for improving the contrast of the X-ray image I1 is shown in an image I2 of fig. 4.

As described above, in the sample observation by the analyzer, when the sample S to be observed is changed, the respective parts of the electron beam irradiation device 50 are controlled by performing the alignment of the sample S, the change of the focal point and magnification of the electron beam, and the like. Information from the electron beam irradiation device 50 is sent to a control computer that controls the electron beam irradiation device 50, and is displayed on the second display 22 for displaying information relating to the control. The analyst provides instructions related to control of each unit of the electron beam irradiation device 50 to the second computer 20 based on the information displayed on the second display 22. The second computer 20 reflects the instruction of the analyst in the control of the electron beam irradiation device 50.

Here, since various instructions related to the control of the electron beam irradiation device 50 by the analyst are given every time the sample S is changed, the frequency of giving the various instructions is high compared to other operations. Thus, it is preferable to perform various instructions using an input device that can be easily accessed by an analyst. As a first typical method of performing various instructions using such an input device, there is a method of: icons indicating various controls displayed on the second display screen 220 of the second display 22 are operated using a mouse, a keyboard, a display provided with the touch panel, or the like.

Hereinafter, a method of performing various instructions using a mouse will be described as an example. First, a mouse is connected to at least one of the control computer and a computer (e.g., an analysis computer) that communicates with the control computer. Next, the analyst can output a command to the control computer by operating the mouse based on the information displayed on the second display 22 to operate the pointer in conjunction with the operation of the mouse. For example, by right-clicking a predetermined icon on the second display screen 220, a command for moving the sample stage up and down can be issued. The control computer controls the electron beam irradiation device 50 based on the instruction.

In addition, as in the case of the input of various commands by the mouse, the input of various commands can be performed by the keyboard. Wherein the analyst presses the keys on the keyboard with the fingers to send signals and the like to the control computer, thereby giving instructions to the control computer. For example, by simultaneously pressing a predetermined key and a down arrow, a command for lowering the sample stage can be output.

Alternatively, the analyst touches or lightly presses an icon or the like displayed on the display with a finger, and the control computer converts the operation into a predetermined command, thereby realizing input of various commands using the display provided with the touch panel. For example, a command for moving the sample stage up and down can be output by touching a predetermined button on the display screen.

As a specific example, fig. 4 shows a configuration in which the first PD11, which is an analysis PD, is used in combination as a control PD. Icons 221 to 224 for inputting and changing the observation conditions of the X-ray image I1 are displayed on the second display screen 220 of the second display 22 in fig. 4. The analyst can output a command for performing desired control to the electron beam irradiation device 50 by operating the icons 221 to 224 using the first PD 11. Note that the method of issuing the instruction by the analyst is not limited to the above example, and may be realized by directly changing the numerical values M1 to M4 using at least one of the first PD11 and a keyboard not shown, for example. Alternatively, the slide bar may be operated instead of the numerical values M1 to M4. The following configuration may be adopted: the second display 22 is a display provided with a touch panel that can be operated by an analyst, and the analyst outputs a command to the electron beam irradiation device 50 by touching the display. The values M1-M4 (or sliders) and the icons 221-224 correspond to one embodiment of "icons".

However, in the method of operating the icons on the display screen using the input device such as the mouse, the keyboard, or the touch panel, these input devices need to be used in combination with many other operations implemented on the display screen. The input device is used for changing basic settings of a computer and for creating a file, for example, and is also used for software other than for controlling the electron beam irradiation device 50. Therefore, it is difficult to configure the input device to realize an intuitive operation exclusively for the control of the electron beam irradiation device 50 with a high frequency while being used in combination with many other operations.

Next, as a second typical method of various instructions related to the control of the electron beam irradiation apparatus 50 using an input device, there is a method of using a dedicated input device developed to support the control of the electron beam irradiation apparatus 50. Specifically, an operation panel may be provided on a side surface of the electron beam irradiation device 50, and buttons, switches, and the like corresponding to various controls may be arranged on the operation panel. The analyst can perform desired control of the electron beam irradiation device 50 by operating the buttons, switches, and the like. Alternatively, a joystick or the like attached to the electron beam irradiation device 50 and configured to be able to communicate with the device by wire or the like may be used as the dedicated input device.

However, in the method using the dedicated input device attached to the electron beam irradiation device 50, the operability is likely to vary depending on the analyst, and thus the work efficiency may be lowered.

Therefore, the analyzer 100 according to the present embodiment can input a command for controlling the electron beam irradiation device 50 with a simple configuration using an input device that meets the preference of the analyst, thereby improving the work efficiency of the analyst.

Referring to fig. 4, the second PD21 is a PD dedicated to the purpose of providing the second computer 20 with various instructions related to the control of the electron beam irradiation device 50. Unlike the first PD11, the second PD21 does not display a pointer corresponding to a pointing device on the display. The operation input to the second PD21 is converted into a control signal for controlling the electron beam irradiation device 50 in the second computer 20. That is, the second PD21 is different from the first PD11 in that the second PD21 does not have a function as an original PD. Further, unlike the first PD11 for inputting instructions to the first computer 10 and the second computer 20, the second PD21 is used for inputting instructions only to the second computer 20. The second computer 20 controls the electron beam irradiation device 50 based on the instruction supplied from the second PD 21.

Here, as the second PD21, a general PD such as a mouse, a joystick, or a trackball can be used. The operability of PDs such as a mouse, a joystick, and a trackball is usually different from each other. The analyst can select a PD that feels good operability by himself/herself, and use it as the second PD 21. These general PDs are easily available to an analyst, and therefore have an advantage of not consuming excessive costs and efforts of the analyst.

In fig. 4, a mouse mounted with a trackball 215, a scroll wheel 216, an L button 213, an R button 214, a button 211, and a button 212 is illustrated as the second PD 21. In the present embodiment, the predetermined operations of the above-described respective portions of the second PD21 are respectively associated with control of a scanning unit (the deflection yoke 2 and/or the sample stage 4) for driving the electron beam irradiation device 50.

Fig. 5 is a diagram illustrating the control content of the electron beam irradiation device 50 corresponding to each operation of the second PD 21. Referring to fig. 5, for example, when the trackball 215 moves, the sample stage 4 (see fig. 2) moves in the horizontal (XY) direction in the direction in which the trackball 215 moves.

On the other hand, when the roller 216 is rotated, the sample stage 4 moves in the vertical (Z) direction.

The following example is also shown in fig. 5: the focus change, astigmatism correction, and magnification change are controlled by operating each part of the second PD21 (in the table of fig. 5, the trackball 215, the wheel 216, the L button 213, and the R button 214).

When the second PD21 is operated by the analyst, the second computer 20 is configured to convert the signal from the second PD21 into a control signal for the electron beam irradiation device 50 in accordance with the relationship between the operation of the second PD21 and the control for the electron beam irradiation device 50 shown in fig. 5. Further, the program describing the relationship shown in fig. 5 is stored in advance in the ROM incorporated in the second computer 20.

The methods shown in fig. 4 and 5 can directly convert the movement of the hand of the analyst into the movement of the electron beam irradiation device 50, and therefore have an advantage that the operation can be performed intuitively as compared with the method of operating the icons 221 to 224 using the first PD11 and the method of changing the numerical values M1 to M4 using the first PD11, a keyboard, or the like.

On the other hand, consider the following case: the operation with the mouse shown in fig. 4 is intuitively inappropriate depending on the analyst. In this case, the analyst can change the second PD21 to another PD (for example, a joystick or the like) which feels better operability by himself. In this case, the analyst can customize the program stored in the ROM of the second computer 20 so that each operation of the PD in accordance with his preference is associated with the control of the electron beam irradiation device 50.

As described above, since the analyst can control the electron beam irradiation device using the input device which feels good operability, the operability of the analyst can be improved. In addition, since it is not necessary to create a program corresponding to each input device, it is also easy to implement.

The second computer 20 is configured to be capable of switching between control of the electron beam irradiation device 50 in accordance with a signal from the second PD21 and control of the electron beam irradiation device 50 in accordance with a signal from the first PD11 transmitted via the first computer 10. Specifically, when the icons 221 to 224 are operated using the first PD11, the second computer 20 controls the electron beam irradiation device 50 in accordance with the operation input. On the other hand, when the second PD21 is operated as illustrated in fig. 5, the second computer 20 controls the electron beam irradiation device 50 in accordance with the operation input. This allows the analyst to selectively use 2 input devices, thereby widening the range of operability.

Fig. 1 shows a configuration example in which the first PD11 and the second PD21 are communicably connected to the first computer 10 and the second computer 20, respectively. However, the connection method of the first PD11 and the second PD21 to the computer is not limited to this, and the first PD11 may transmit signals to the first computer 10 and the second computer 20 by wire or wirelessly, and the second PD21 may transmit signals to the second computer 20 by wire or wirelessly. For example, the following configuration may be adopted: both the first PD11 and the second PD21 are connected to the first computer 10, and a signal of the second PD21 is transmitted to the second computer 20 via the first computer 10.

Likewise, the following structural examples are shown: the first display 12 and the second display 22 are communicably connected to the first computer 10 and the second computer 20, respectively, but the connection method of the first display 12 and the second display 22 to the computers is not limited to this. The first display 12 may receive a signal from the first computer 10 in a wired or wireless manner, and the second display 22 may receive a signal from the second computer 20 in a wired or wireless manner.

In fig. 1, the second computer 20 for controlling the electron beam irradiation device 50 and the first computer 10 for analysis are illustrated as 2 independent computers. However, the configuration and the number of the second computers 20 and the first computers 10 are not limited to this, and the second computers and the first computers may have a processing unit (second processing unit) that performs processing related to control of the computers and a processing unit (first processing unit) that performs processing related to analysis. For example, the second computer 20 and the first computer 10 may be configured by a processing unit (second processing unit) that performs processing related to control in 1 computer and a processing unit (first processing unit) that performs processing related to analysis. In this case, a part of the constituent elements and functions of the first processing unit and the second processing unit may overlap. The first processing unit and the second processing unit may be virtual drivers, respectively. In this case, the following configuration can be adopted: both the first PD11 and the second PD21 are connected in a wired or wireless manner to a computer responsible for both control and analysis.

Similarly, the second display 22 for control and the first display 12 for analysis may be any display portions that display information for control and information for analysis. For example, the second display 22 for control and the first display 12 for analysis may be an integrated single display. Similarly, the first display screen 120 and the second display screen 220 are not limited to 2 screens, and may be 2 display regions of 1 display. The first display screen 120 and the second display screen 220 correspond to a "first display area" and a "second display area", respectively. In addition, the first display 12 and the second display 22 correspond to "displays".

The above embodiment is an example, and can be modified as appropriate according to the spirit of the present invention. Specifically, although EPMA is exemplified as the analysis device in the above embodiment, an ion beam may be used as the excitation source instead of the electron beam. In the above embodiment, the following configuration is adopted: the secondary electrons and the reflected electrons are detected to create a secondary electron image and a reflected electron image, and the characteristic X-ray is detected to create a two-dimensional distribution image (X-ray image) of a specific element.

The presently disclosed embodiments are to be considered in all respects as illustrative and not restrictive. The scope of the present invention is defined not by the above description but by the appended claims, and all changes that come within the meaning and range of equivalency of the claims are intended to be embraced therein.

Description of the reference numerals

1: an electron gun; 2: a deflection yoke; 3: an objective lens; 4: a sample stage; 5: a sample stage driving section; 6. 6a, 6 b: a light splitter; 7: a deflection coil control unit; 8: an electron detector; 10: a first computer (first processing unit); 12: a first display; 14. 24: a memory; 15. 25: an input interface (input I/F); 16. 26: a display controller; 17. 27: a communication interface (communication I/F); 20: a second computer (second processing unit); 22: a second display; 50: an electron beam irradiation device; 61a, 61 b: a spectroscopic crystal; 63a, 62 b: a detector; 64a, 64 b: a slit; 100: an analysis device; 120: a first display screen; 121 to 123, 221 to 224: an icon; 221-214: a button; 215: a trackball; 216: a roller; 220: a second display screen; e: an electron beam; i1: an X-ray image; i2: an image; p1: a pointer; s: a sample; w1: and (4) a window.

Claims

1. An analysis device is provided with:

a charged particle beam irradiation device configured to irradiate a sample with a charged particle beam and detect a signal emitted from the sample;

a first processing unit configured to be capable of communicating with a first input device and configured to analyze the sample based on a detection signal of the charged particle beam irradiation device in accordance with an analysis condition specified by the first input device;

a second processing unit configured to be capable of communicating with a second input device and the first processing unit, and configured to generate an observation image of the sample based on a detection signal of the charged particle beam irradiation device and control the charged particle beam irradiation device based on a signal from the second input device; and

a display configured to be capable of communicating with the first processing unit and the second processing unit and configured to display the analysis condition and the observation image generated by the second processing unit,

wherein the second input device comprises a pointing device,

the second processing unit converts an operation input to the pointing device into a control signal for the charged particle beam irradiation apparatus.

2. The analysis device according to claim 1,

the charged particle beam irradiation apparatus includes a scanning unit configured to scan the charged particle beam in an analysis target region on the sample,

the pointing device is configured to be able to accept a plurality of operation inputs,

the second processing unit is configured to convert the plurality of operation inputs into control signals for the scanning unit.

3. The analysis device according to claim 1 or 2,

the second processing unit is configured to: the control of the charged particle beam irradiation apparatus according to the signal from the second input device and the control of the charged particle beam irradiation apparatus according to the signal from the first input device transmitted via the first processing unit can be switched.

4. The analysis device according to any one of claims 1 to 3,

the display device has a first display area for displaying icons representing the analysis conditions and a second display area for displaying control contents of the second processing unit, and the icons for controlling the charged particle beam irradiation device are displayed in the second display area,

the first input device is configured to be capable of accepting an operation input for operating the icon.