CN113465369A - Fully computerized silicon controlled annealing furnace - Google Patents

Fully computerized silicon controlled annealing furnace Download PDF

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Publication number
CN113465369A
CN113465369A CN202110617265.6A CN202110617265A CN113465369A CN 113465369 A CN113465369 A CN 113465369A CN 202110617265 A CN202110617265 A CN 202110617265A CN 113465369 A CN113465369 A CN 113465369A
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CN
China
Prior art keywords
wall
box
top end
feeding
furnace body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN202110617265.6A
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Chinese (zh)
Inventor
吉德书
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taizhou Jiqiang Stainless Steel Products Co ltd
Original Assignee
Taizhou Jiqiang Stainless Steel Products Co ltd
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Filing date
Publication date
Application filed by Taizhou Jiqiang Stainless Steel Products Co ltd filed Critical Taizhou Jiqiang Stainless Steel Products Co ltd
Priority to CN202110617265.6A priority Critical patent/CN113465369A/en
Publication of CN113465369A publication Critical patent/CN113465369A/en
Withdrawn legal-status Critical Current

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/20Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
    • F27B9/24Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
    • F27B9/243Endless-strand conveyor
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/02Heat treatment
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/36Arrangements of heating devices
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/40Arrangements of controlling or monitoring devices
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D1/00Casings; Linings; Walls; Roofs
    • F27D1/18Door frames; Doors, lids, removable covers
    • F27D1/1858Doors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D17/00Arrangements for using waste heat; Arrangements for using, or disposing of, waste gases
    • F27D17/004Systems for reclaiming waste heat
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D17/00Arrangements for using waste heat; Arrangements for using, or disposing of, waste gases
    • F27D17/008Arrangements for using waste heat; Arrangements for using, or disposing of, waste gases cleaning gases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27MINDEXING SCHEME RELATING TO ASPECTS OF THE CHARGES OR FURNACES, KILNS, OVENS OR RETORTS
    • F27M2003/00Type of treatment of the charge
    • F27M2003/01Annealing

Abstract

The invention discloses a fully computerized silicon controlled annealing furnace, which comprises a base and a furnace body; the top end of the base is provided with a feeding sealing box, and the surface of the feeding sealing box is connected with a microcomputer through screws; the inner wall of the feeding sealing box is provided with a feeding belt, and the top end of the feeding sealing box is connected with a supporting frame through a screw; the roller wheels are mounted on two sides of the top end of the supporting frame, the multiple groups of dust suction fans are arranged on the inner wall of the base, and the sliding grooves are formed in two sides of the inner wall of the mounting frame.

Description

Fully computerized silicon controlled annealing furnace
Technical Field
The invention relates to the related technical field of annealing furnaces, in particular to a fully computerized silicon controlled annealing furnace.
Background
An annealing furnace is a process used in semiconductor device fabrication that includes heating a plurality of semiconductor wafers to affect their electrical properties, the heat treatment being designed for different effects, the wafers can be heated to activate dopants, convert thin films into thin films or convert thin films into wafer substrate interfaces, densify deposited films, change the state of grown films, repair implanted damage, move dopants or transfer dopants from one film to another or from a film into a wafer substrate, thus providing a fully computerized thyristor annealing furnace.
And the annealing stove that uses at present, when carrying out the material pay-off, arouse pressure and calorific loss in the furnace body very easily, the product that leads to producing leads to scrapping because technological requirement is not up to standard, in addition when the furnace body heats the product, the heat of production is not convenient for retrieve, causes the wasting of resources, can produce a lot of burning rubbish during the high temperature heating in the furnace body simultaneously, is not convenient for clear up the problem.
Disclosure of Invention
The invention aims to provide a fully computerized silicon controlled annealing furnace to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme:
a fully computerized silicon controlled annealing furnace comprises a base and a furnace body; the top end of the base is provided with a feeding sealing box, and the surface of the feeding sealing box is connected with a microcomputer through screws; the inner wall of the feeding sealing box is provided with a feeding belt, and the top end of the feeding sealing box is connected with a supporting frame through a screw; the two sides of the top end of the support frame are both provided with rollers, and the inner walls of the rollers are provided with connecting ropes; one section of the connecting rope is connected with an installation block, and the bottom end of the installation block is connected with an electric push rod through a screw; the electric push rod is welded at the top end of the feeding seal box; the other end of the connecting rope is connected with a box door through a screw, and a sealing block is arranged at the bottom end of the box door; the sealing block is arranged on the outer wall of the feeding sealing box, and a clamping groove is formed in the inner wall of the sealing block; a plurality of groups of dust absorption fans are arranged on the inner wall of the base, and a mounting frame is welded at the bottom end of the base; the two sides of the inner wall of the mounting frame are both provided with sliding grooves, and the inner walls of the sliding grooves are provided with sliding blocks; the outer wall of the sliding block is welded with a dust collecting box; the furnace body is arranged at the top end of the base.
Preferably, the bottom end of the inner wall of the furnace body is provided with a conveyer belt, and both sides of the outer wall of the furnace body are provided with ignition devices; the ignition device and the central axis position of the furnace body are arranged in an axisymmetric way, and a plurality of groups of ignition devices penetrate through the inner wall of the furnace body through the flame nozzles; the outer wall of the ignition device is connected with a drainage tube, and the top end of the drainage tube is connected with a natural gas pipeline; the top of the furnace body is provided with a plurality of groups of heat absorption pipes.
Preferably, the inner wall of the heat absorption pipe is connected with a heat absorption fan through a screw, and the top end of the heat absorption pipe is connected with a hot air conveying pipe; the other end of the hot air conveying pipe is connected with a waste heat recovery box, and the outer wall of the waste heat recovery box is attached with a heat insulation sleeve.
Preferably, the mounting block forms a telescopic structure with the feeding seal box through an electric push rod, and the electric push rod and the feeding seal box are vertically arranged.
Preferably, the dust collecting box is connected with the mounting frame in a sliding mode through a sliding block, and the sliding block is arranged in an axisymmetric mode by taking the central axis of the dust collecting box as an axis.
Preferably, the inner wall of the heat insulation sleeve is tightly attached to the outer wall of the waste heat recovery box, and the size of the inner wall of the heat insulation sleeve is matched with that of the outer wall of the waste heat recovery box.
Compared with the prior art, the invention has the beneficial effects that:
1. according to the invention, the feeding sealing box, the roller, the connecting rope, the mounting block and the electric push rod are arranged, so that when materials are fed, the electric push rod stretches to drive the mounting block and the connecting rope to stretch so as to drive the box door to open and close, and a plug board sealing method is carried out, so that the pressure and heat in the furnace body can be effectively prevented from losing, and the temperature and pressure in the furnace body can meet the process standard.
2. According to the invention, the dust collection fan, the mounting frame, the sliding chute, the sliding block and the dust collection box are arranged, so that a large amount of dust and combustion garbage can be generated when the flame is generated on the flame nozzle in the furnace body through the ignition device to fire materials, the production efficiency can be influenced when the combustion garbage is stored in the furnace body for a long time, the cleaning is difficult, the combustion garbage in the furnace body can be sucked into the dust collection box by opening the dust collection fan when the production is finished, and the dust collection box is drawn out through the sliding block, so that the centralized treatment is facilitated.
3. According to the invention, the heat absorption pipe, the heat absorption fan, the hot air conveying pipe, the waste heat recovery box and the heat insulation sleeve are arranged, so that hot air caused by high-temperature combustion in the furnace body can be conveniently extracted by the heat absorption fan in the heat absorption pipe and conveyed to the waste heat recovery box for storage through the hot air conveying pipe, the waste heat can be fully utilized to other equipment, and the heat insulation sleeve can ensure that the heat in the waste heat recovery box is not lost, so that the energy can be fully recycled.
Drawings
FIG. 1 is a schematic view of a front cross-sectional structure of a fully computerized SCR annealing furnace according to the present invention;
FIG. 2 is a schematic view of a cross-sectional structure of a furnace body of a fully computerized silicon controlled annealing furnace according to the present invention from top view;
FIG. 3 is a schematic view of a front view of a support frame and a connecting rope of the fully computerized silicon controlled annealing furnace according to the present invention;
FIG. 4 is a schematic diagram of a side view of a feeding sealing box of the fully computerized SCR annealing furnace according to the present invention;
FIG. 5 is an enlarged schematic view of part A of the fully computerized SCR annealing furnace of the present invention.
In the figure: 1. a base; 2. a feeding seal box; 3. a microcomputer; 4. a feed zone; 5. a support frame; 6. a roller; 7. connecting ropes; 8. mounting blocks; 9. an electric push rod; 10. a box door; 11. a sealing block; 12. a card slot; 13. a dust collection fan; 14. installing a frame; 15. a chute; 16. a slider; 17. a dust collecting box; 18. a furnace body; 19. a conveyor belt; 20. an ignition device; 21. a flame nozzle; 22. a drainage tube; 23. a natural gas pipeline; 24. a heat absorbing tube; 25. a heat absorption fan; 26. a hot gas delivery pipe; 27. a waste heat recovery tank; 28. an insulating sleeve.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-5, the present invention provides a technical solution: a fully computerized silicon controlled annealing furnace comprises a base 1 and a furnace body 18; the top end of the base 1 is provided with a feeding sealing box 2, and the surface of the feeding sealing box 2 is connected with a microcomputer 3 through screws; the inner wall of the feeding seal box 2 is provided with a feeding belt 4, and the top end of the feeding seal box 2 is connected with a support frame 5 through a screw; the two sides of the top end of the support frame 5 are both provided with rollers 6, and the inner walls of the rollers 6 are provided with connecting ropes 7; one section of the connecting rope 7 is connected with an installation block 8, and the bottom end of the installation block 8 is connected with an electric push rod 9 through a screw; the electric push rod 9 is welded at the top end of the feeding seal box 2; the other end of the connecting rope 7 is connected with a box door 10 through a screw, and a sealing block 11 is arranged at the bottom end of the box door 10; the sealing block 11 is arranged on the outer wall of the feeding sealing box 2, and a clamping groove 12 is formed in the inner wall of the sealing block 11; a plurality of groups of dust absorption fans 13 are arranged on the inner wall of the base 1, and a mounting frame 14 is welded at the bottom end of the base 1; the two sides of the inner wall of the mounting frame 14 are both provided with sliding grooves 15, and the inner wall of each sliding groove 15 is provided with a sliding block 16; the outer wall of the sliding block 16 is welded with a dust collecting box 17; the furnace body 18 is arranged at the top end of the base 1.
The bottom end of the inner wall of the furnace body 18 is provided with a conveyer belt 19, and both sides of the outer wall of the furnace body 18 are provided with ignition devices 20; the ignition device 20 and the central axis position of the furnace body 18 are arranged in an axisymmetric manner, and a plurality of groups of ignition devices 20 penetrate through the inner wall of the furnace body 18 through a flame nozzle 21; the outer wall of the ignition device 20 is connected with a drainage tube 22, and the top end of the drainage tube 22 is connected with a natural gas pipeline 23; the top end of the furnace body 18 is provided with a plurality of groups of heat absorption pipes 24.
The inner wall of the heat absorbing pipe 24 is connected with a heat absorbing fan 25 by a screw, and the top end of the heat absorbing pipe 24 is connected with a hot air conveying pipe 26; the other end of the hot air delivery pipe 26 is connected with a waste heat recovery box 27, and the outer wall of the waste heat recovery box 27 is attached with a heat insulation sleeve 28.
The mounting block 8 forms a telescopic structure with the feeding seal box 2 through an electric push rod 9, and the electric push rod 9 and the feeding seal box 2 are vertically arranged.
The dust collecting box 17 is connected with the mounting frame 14 in a sliding manner through the sliding block 16, and the sliding block 16 is arranged in an axisymmetric manner by taking the central axis of the dust collecting box 17 as an axis.
The inner wall of the thermal insulation sleeve 28 is tightly attached to the outer wall of the waste heat recovery box 27, and the size of the inner wall of the thermal insulation sleeve 28 is matched with that of the outer wall of the waste heat recovery box 27.
It should be noted that, the invention is a fully computerized silicon controlled annealing furnace, when in use, firstly, a microcomputer 3 is used to set production parameters, an electric push rod 9 is used to stretch and contract to drive a mounting block 8 and a connecting rope 7 to drive a box door 10 to open and close, materials are sent into a feeding belt 4 on the inner wall of a feeding seal box 2, then the box door 10 is put down, the box door 10 is inserted into a clamping groove 12 in a seal block 11 to seal the interior, the materials are conveyed into a furnace body 18 through the feeding belt 4 and are conveyed and transported through a conveying belt 19, during transportation, an ignition device 20 sucks natural gas in a natural gas pipeline 23 into a flame nozzle 21 through a drainage tube 22 to generate flame, the flame bakes the materials on the conveying belt 19, the baked materials flow out through the conveying belt 19, the generated heat is input into a waste heat recovery box 27 through a hot gas conveying tube 26 for storage through a heat absorption fan 25 in a heat absorption tube 24, after the production is completed, the combustion garbage generated after the combustion is sucked into the dust collecting box 17 by the dust suction fan 13 for the subsequent centralized processing.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (6)

1. A fully computerized silicon controlled annealing furnace is characterized in that: comprises a base (1) and a furnace body (18); the top end of the base (1) is provided with a feeding sealing box (2), and the surface of the feeding sealing box (2) is connected with a microcomputer (3) through screws; a feeding belt (4) is installed on the inner wall of the feeding sealing box (2), and a supporting frame (5) is connected to the top end of the feeding sealing box (2) through a screw; both sides of the top end of the support frame (5) are provided with rollers (6), and the inner wall of each roller (6) is provided with a connecting rope (7); one section of the connecting rope (7) is connected with an installation block (8), and the bottom end of the installation block (8) is connected with an electric push rod (9) through a screw; the electric push rod (9) is welded at the top end of the feeding seal box (2); the other end of the connecting rope (7) is connected with a box door (10) through a screw, and a sealing block (11) is arranged at the bottom end of the box door (10); the sealing block (11) is arranged on the outer wall of the feeding sealing box (2), and a clamping groove (12) is formed in the inner wall of the sealing block (11); a plurality of groups of dust suction fans (13) are arranged on the inner wall of the base (1), and a mounting frame (14) is welded at the bottom end of the base (1); sliding grooves (15) are formed in two sides of the inner wall of the mounting frame (14), and sliding blocks (16) are mounted on the inner wall of each sliding groove (15); the outer wall of the sliding block (16) is welded with a dust collecting box (17); the furnace body (18) is arranged at the top end of the base (1).
2. The fully computerized silicon controlled annealing furnace according to claim 1, wherein: a conveyer belt (19) is arranged at the bottom end of the inner wall of the furnace body (18), and ignition devices (20) are arranged on two sides of the outer wall of the furnace body (18); the ignition device (20) and the central axis position of the furnace body (18) are arranged in an axisymmetric manner, and a plurality of groups of ignition devices (20) penetrate through the inner wall of the furnace body (18) through a flame nozzle (21); the outer wall of the ignition device (20) is connected with a drainage tube (22), and the top end of the drainage tube (22) is connected with a natural gas pipeline (23); the top end of the furnace body (18) is provided with a plurality of groups of heat absorption pipes (24).
3. The fully computerized silicon controlled annealing furnace according to claim 2, wherein: the inner wall of the heat absorption pipe (24) is connected with a heat absorption fan (25) through a screw, and the top end of the heat absorption pipe (24) is connected with a hot air conveying pipe (26); the other end of the hot air conveying pipe (26) is connected with a waste heat recovery box (27), and the outer wall of the waste heat recovery box (27) is attached with a heat insulation sleeve (28).
4. The fully computerized silicon controlled annealing furnace according to claim 1, wherein: the mounting block (8) and the feeding seal box (2) form a telescopic structure through an electric push rod (9), and the electric push rod (9) and the feeding seal box (2) are vertically arranged.
5. The fully computerized silicon controlled annealing furnace according to claim 1, wherein: the dust collection box (17) is connected with the mounting frame (14) in a sliding mode through the sliding block (16), and the sliding block (16) is arranged in an axisymmetric mode by taking the central axis of the dust collection box (17) as an axis.
6. The fully computerized silicon controlled annealing furnace according to claim 3, wherein: the inner wall of the heat insulation sleeve (28) is tightly attached to the outer wall of the waste heat recovery box (27), and the size of the inner wall of the heat insulation sleeve (28) is matched with the size of the outer wall of the waste heat recovery box (27).
CN202110617265.6A 2021-06-03 2021-06-03 Fully computerized silicon controlled annealing furnace Withdrawn CN113465369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110617265.6A CN113465369A (en) 2021-06-03 2021-06-03 Fully computerized silicon controlled annealing furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110617265.6A CN113465369A (en) 2021-06-03 2021-06-03 Fully computerized silicon controlled annealing furnace

Publications (1)

Publication Number Publication Date
CN113465369A true CN113465369A (en) 2021-10-01

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CN202110617265.6A Withdrawn CN113465369A (en) 2021-06-03 2021-06-03 Fully computerized silicon controlled annealing furnace

Country Status (1)

Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113865338A (en) * 2021-10-29 2021-12-31 浙江孚菱机械有限公司 Mesh belt type sintering furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113865338A (en) * 2021-10-29 2021-12-31 浙江孚菱机械有限公司 Mesh belt type sintering furnace

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Application publication date: 20211001