CN113428932A - High degradation rate atomizing formula plasma water purification installation - Google Patents

High degradation rate atomizing formula plasma water purification installation Download PDF

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Publication number
CN113428932A
CN113428932A CN202110829932.7A CN202110829932A CN113428932A CN 113428932 A CN113428932 A CN 113428932A CN 202110829932 A CN202110829932 A CN 202110829932A CN 113428932 A CN113428932 A CN 113428932A
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China
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subassembly
electrode
liquid outlet
reactor
voltage electrode
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熊青
宋一嘉
梁颂冰
乔俊杰
汪传奇
杨琦
卫丽娟
袁博文
卢琪
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Chongqing University
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Chongqing University
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/30Organic compounds

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  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The invention discloses an atomization type plasma water purification device with high degradation rate, which comprises: the bottom of atomizing device is provided with into fog subassembly, and the bottom fixed mounting that advances the fog subassembly has first fixed plate, advances fog subassembly bottom fixed mounting and has the reactor, and reactor inside fixed mounting has high-pressure electrode subassembly, and the bottom fixed mounting of reactor has out the liquid subassembly, and the bottom fixed mounting that goes out the liquid subassembly has the collection subassembly. The invention has the beneficial effects that: the high-voltage electrode assembly is made of oxidation-resistant and acid corrosion-resistant composite metal and is rust-resistant; have the barb along reactor diameter direction, during discharging, each electrode barb on the reactor cavity internal electrode post forms the discharge microchannel along diameter direction, and it is regional to whole reactor inner chamber almost to disperse, can make active material homodisperse quartz capsule such as hydroxyl free radical, ozone, hydrogen peroxide that discharge produced in the quartz capsule, active material utilization efficiency is high, and the degradation rate is high.

Description

High degradation rate atomizing formula plasma water purification installation
Technical Field
The invention relates to a plasma water purification device, in particular to an atomization type plasma water purification device with high degradation rate, and belongs to the technical field of plasma generation devices.
Background
Plasma is the fourth state in which a substance exists in addition to a solid, liquid, or gaseous state. When the temperature of the gaseous substance is raised to a certain value, the gaseous molecules are ionized due to the violent mutual collision, thereby generating a similar number of positive ions and electrons. The plasma is therefore a mixture (highly ionized gas) consisting of a large number of positive ions, electrons and neutral particles, which overall exhibits electrical neutrality, and is therefore referred to as a plasma.
There are many studies on the use of plasma for water treatment, and the research is mainly focused on the structure of the device, the discharge mode, the discharge space, and the like. Most plasma water treatment facilities all put the electrode in aqueous, and the electrode easily takes place to corrode, needs to change on time, and the cost is higher, and the required voltage of discharging in aqueous is higher, requires high to the power. Part of the plasma water treatment generating devices are excited by high-voltage pulses, and high-energy injection can be repeatedly and instantly carried out on water to enhance the degradation effect. However, in practice, the research on the high-voltage pulse-driven plasma generating device mainly focuses on the liquid phase, and when the discharge is performed in the liquid phase, the high energy is converted into heat energy in the discharge process, the energy utilization efficiency is low, the plasma channel is limited, the contact area between the sample and the plasma is limited, or the pollutants in water need to be repeatedly treated in a circulating manner, the time and the energy are consumed, the treatment amount is small, and the industrialization is difficult to realize, so that the application of the plasma in the field of water purification is limited.
Disclosure of Invention
The invention aims to solve the problems and provide an atomized plasma water purification device with high degradation rate.
The invention realizes the purpose through the following technical scheme, and the high-degradation-rate atomization type plasma water purification device comprises:
the device comprises an atomizing device, wherein a fog inlet assembly is arranged at the bottom end of the atomizing device, a first fixing plate is fixedly arranged at the bottom end of the fog inlet assembly, a reactor is fixedly arranged at the bottom end of the fog inlet assembly, a high-voltage electrode assembly is fixedly arranged in the reactor, a liquid outlet assembly is fixedly arranged at the bottom end of the reactor, a collecting assembly is fixedly arranged at the bottom end of the liquid outlet assembly, one side of the fog inlet assembly is electrically connected with an excitation source, and one side of the reactor is electrically connected with a grounding electrode;
the fog inlet assembly comprises a fog inlet cavity, a fog inlet is integrally formed at the top end of the fog inlet cavity, a wire fixing sleeve is fixedly mounted on one side of the fog inlet cavity, a connecting wire is embedded in the wire fixing sleeve, a high-voltage electrode supporting frame is fixedly mounted at the bottom end of the fog inlet cavity, and a high-voltage electrode fixing sleeve is fixedly connected at the bottom end of the high-voltage electrode supporting frame;
the liquid outlet assembly comprises a liquid outlet cavity, a lower high-voltage electrode support frame is fixedly mounted at the top end of the liquid outlet cavity, a lower high-voltage electrode fixing sleeve is fixedly connected to the top end of the lower high-voltage electrode support frame, a conical liquid outlet cavity is fixedly connected to the bottom end of the liquid outlet cavity, a liquid outlet is fixedly connected to the bottom end of the conical liquid outlet cavity, and a fastening thread sleeve is sleeved on the outer wall thread of the liquid outlet.
Preferably, the atomizing device comprises an atomizer, a connecting hose is fixedly connected to the bottom end of the atomizer, and the bottom end of the connecting hose is in through connection with the mist inlet assembly.
Preferably, a connecting table is integrally formed at the bottom end of the mist inlet cavity, and three threaded grooves are formed in the bottom end of the connecting table at equal intervals;
the first fixing plate comprises a fixing plate body, a first rubber ring is arranged on the top end of the fixing plate body, and three first bolts are installed on the bottom end of the fixing plate body in an equidistant threaded mode.
Preferably, the reactor comprises a quartz tube, a copper coil is arranged on the outer wall of the quartz tube, the top of the quartz tube is inserted into the bottom end of the mist inlet assembly, and the bottom of the quartz tube is in threaded connection with the top end of the liquid outlet assembly;
high-voltage electrode subassembly includes the electrode post, the equal integrated into one piece in four sides of electrode post has a plurality of electrode barbs, high-voltage electrode subassembly sets up the inside at the quartz capsule, the top fixed mounting of electrode post is in the bottom of advancing the fog subassembly, the bottom fixed mounting of electrode post is in the bottom of going out the liquid subassembly.
Preferably, the collecting assembly comprises a liquid outlet pipe, the bottom of the liquid outlet pipe is in threaded connection with a collecting box, a buffering baffle is fixedly mounted inside the collecting box, the bottom end of the buffering baffle is fixedly connected with a drainage fence, and a vent is formed in one side of the collecting box.
Preferably, the top of collecting box integrated into one piece has into the liquid mouth, the bottom screw thread of drain pipe is installed in the inside of going into the liquid mouth, the top of going into the liquid mouth is provided with the second fixed plate, a plurality of second bolts are installed to the top equidistance screw thread of second fixed plate, the bottom of second fixed plate is provided with the second rubber ring.
Preferably, the top of the electrode column is fixedly installed inside the upper high-voltage electrode fixing sleeve, the bottom of the electrode column is fixedly installed inside the lower high-voltage electrode fixing sleeve, and the electrode column is electrically connected with the excitation source through a connecting wire.
Preferably, the copper coil is sleeved on the outer wall of the quartz tube, the bottom of the copper coil is electrically connected with the grounding electrode through a wire, and the excitation source is electrically connected with the grounding electrode through a wire.
Preferably, the opening has all been seted up to the bottom on liquid outlet two sides just, the equal integrated into one piece in bottom of liquid outlet both sides outer wall has spacing boss, the inside screw thread of liquid outlet cup joints the top at the drain pipe.
The invention has the beneficial effects that:
firstly, the high-voltage electrode assembly is made of oxidation-resistant and acid corrosion-resistant composite metal and is rust-resistant; have the barb along reactor diameter direction, during discharging, each electrode barb on the reactor cavity internal electrode post forms the discharge microchannel along diameter direction, and it is regional to whole reactor inner chamber almost to disperse, can make active material homodisperse quartz capsule such as hydroxyl free radical, ozone, hydrogen peroxide that discharge produced in the quartz capsule, active material utilization efficiency is high, and the degradation rate is high.
Secondly, the water solution to be treated can be dispersed into liquid drops with the diameter less than or equal to five microns through the atomizing device, compared with the water outlet form of a common nozzle, the mode has the advantages that the diameter of the mist liquid drops is much smaller, the contact area of the active substances and the liquid drops is larger, and the plasma active substances generated by discharge are fully contacted with the liquid drops in the reactor; during discharging, all plasma areas are included in the atomization area, so that the collision probability of active substances generated by plasma and pollutant molecules in liquid drops is increased, waste of the plasma active substances generated by discharging is avoided to a certain extent, and the utilization rate of the active substances is high; on the basis, various other physical and chemical effects exist in the discharging period to synergistically degrade organic pollutants in the solution, the water solution is hardly required to be treated circularly, and energy loss is reduced.
Thirdly, the invention adopts a high-voltage pulse power supply as an excitation source, the input of the excitation source is connected with the output end of the signal generator, and parameters such as the width of pulse output can be freely adjusted; the ultrasonic atomizer in the atomizing device can freely adjust the atomizing amount and the air quantity, and the water purification degree can be enhanced by the increase of the ultrasonic atomizer and the air quantity to a certain degree; the electrodes can be freely replaced, electrode columns with different tooth pitches can be replaced for different main degradation pollutants in water, and energy waste is avoided; the main body has simple structure and simple operation, is convenient for transportation and can be miniaturized.
Drawings
FIG. 1 is a schematic sectional view of the present invention;
FIG. 2 is an enlarged view of the structure at A in FIG. 1 according to the present invention;
FIG. 3 is an enlarged view of the structure at B in FIG. 1 according to the present invention;
FIG. 4 is an enlarged view of the structure of FIG. 1 at C according to the present invention;
FIG. 5 is an enlarged view of the structure of FIG. 1 at D according to the present invention;
FIG. 6 is a schematic bottom view of the mist inlet chamber according to the present invention;
FIG. 7 is a schematic top view of the liquid outlet chamber according to the present invention.
In the figure: 1. an atomizing device; 11. an atomizer; 12. a connecting hose; 2. a mist inlet assembly; 21. a mist inlet; 22. a mist inlet cavity; 23. a lead fixing sleeve; 24. connecting a lead; 25. a high voltage electrode fixing sleeve; 26. a high-voltage electrode support frame; 27. a threaded groove; 3. a first fixing plate; 31. a fixing plate body; 32. a first rubber ring; 33. a first bolt; 4. a reactor; 41. a quartz tube; 42. a copper coil; 5. a high voltage electrode assembly; 51. an electrode column; 52. an electrode barb; 6. a liquid outlet assembly; 61. a liquid outlet cavity; 62. a lower high-voltage electrode fixing sleeve; 63. a lower high voltage electrode support frame; 64. a conical liquid outlet cavity; 65. a liquid outlet; 66. fastening the threaded sleeve; 7. a collection assembly; 71. a liquid outlet pipe; 72. a collection box; 73. a buffer baffle; 74. draining the fence; 75. a vent; 76. a second fixing plate; 77. a second bolt; 78. a second rubber ring; 79. a liquid inlet; 8. an excitation source; 9. and a grounding electrode.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-7, an atomized plasma water purification apparatus with high degradation rate includes:
atomizing device 1, atomizing device 1's bottom is provided with into fog subassembly 2, the bottom fixed mounting who advances fog subassembly 2 has first fixed plate 3, advance fog subassembly 2 bottom fixed mounting reactor 4, reactor 4 inside fixed mounting has high voltage electrode subassembly 5, the bottom fixed mounting of reactor 4 has play liquid subassembly 6, the bottom fixed mounting who goes out liquid subassembly 6 has collection subassembly 7, one side electric connection who advances fog subassembly 2 has excitation source 8, excitation source 8 sets up to unipolar high voltage pulse power, excitation source 8 is positive polarity high voltage pulse power, also can be negative polarity high voltage pulse power, alternating current power etc, excitation source 8's input connection signal generator's output, the width isoparametric of pulse output can freely be adjusted, one side electric connection of reactor 4 has earthing pole 9.
As a technical optimization scheme of the invention, the atomization device 1 comprises an atomizer 11, the atomizer 11 adopts an ultrasonic atomizer 11, the ultrasonic atomizer 11 atomizes water flow, the diameter of atomized water flow particles is less than or equal to five micrometers, the ultrasonic atomizer 11 can freely adjust atomization amount and air volume, the atomizer 11 is arranged in a water storage tank, a water inlet is integrally cast at the top end of the water storage tank, a connecting hose 12 is fixedly connected to the bottom end of the water storage tank outside the atomizer 11, and the bottom end of the connecting hose 12 is communicated with the mist inlet assembly 2.
As a technical optimization scheme of the invention, the mist inlet component 2 comprises a mist inlet cavity 22, a mist inlet 21 is integrally cast at the top end of the mist inlet cavity 22, the mist inlet 21 is sleeved at the bottom of the connecting hose 12, a lead fixing sleeve 23 is fixedly installed at one side of the mist inlet cavity 22, one end of the lead fixing sleeve 23 extends into the mist inlet cavity 22, a connecting lead 24 is embedded in the lead fixing sleeve 23, an upper high-voltage electrode support frame 26 is fixedly installed at the bottom end of the mist inlet cavity 22, the upper high-voltage electrode support frame 26 is arranged in a symmetrical Y shape, the bottom end of the upper high-voltage electrode support frame 26 is fixedly connected with an upper high-voltage electrode fixing sleeve 25, the top of the upper high-voltage electrode fixing sleeve 25 penetrates through the upper high-voltage electrode support frame 26 and extends upwards, and the extending end of the upper high-voltage electrode fixing sleeve 25 is fixedly connected with the lead fixing sleeve 23.
As a technical optimization scheme of the invention, the bottom end of the mist inlet cavity 22 is integrally formed with a connecting platform, the bottom end of the connecting platform is equidistantly provided with three threaded grooves 27, an inner cavity of the mist inlet cavity 22 penetrates through the connecting platform, and the high-voltage electrode support frame 26 is fixedly arranged inside the cavity of the mist inlet cavity 22.
As a technical optimization scheme of the present invention, the first fixing plate 3 includes a fixing plate body 31, the fixing plate body 31 is configured in a circular ring shape, a first rubber ring 32 is disposed at the top end of the fixing plate body 31, three first bolts 33 are threadedly mounted at equal intervals at the bottom end of the fixing plate body 31, the fixing plate body 31 is fixed at the bottom end of the connecting table through the first bolts 33, and the first rubber ring 32 and the connecting table are in contact with each other.
As a technical optimization scheme of the invention, the reactor 4 comprises a quartz tube 41, a copper coil 42 is arranged on the outer wall of the quartz tube 41, the top of the quartz tube 41 is inserted at the bottom end of the mist inlet component 2, that is, the top of the quartz tube 41 is inserted at the bottom of the inner cavity of the mist inlet cavity 22, the top of the quartz tube 41 is fixed by a fixing plate body 31, a first rubber ring 32 and a first bolt 33, the bottom of the quartz tube 41 is in threaded connection with the top end of the liquid outlet component 6, the outer diameter of the quartz tube 41 is equal to the aperture of the bottom end of the inner cavity of the mist inlet cavity 22, the Y-shaped structure of the upper voltage electrode support frame 26 can stably abut against the top end of the quartz tube 41, and the air tightness of the device is ensured by the cooperation of the first rubber ring 32, the.
As a technical optimization scheme of the invention, the copper coil 42 is sleeved on the outer wall of the quartz tube 41, the bottom of the copper coil 42 is electrically connected with the grounding electrode 9 through a lead, the excitation source 8 is electrically connected with the grounding electrode 9 through a lead, the coaxial medium of the reactor 4 is generally quartz material (the quartz tube 41), and other insulating material media such as acrylic, photosensitive resin and the like can also be utilized.
As a technical optimization scheme of the invention, the high-voltage electrode assembly 5 comprises an electrode column 51, a plurality of electrode barbs 52 are integrally formed on four surfaces of the electrode column 51, the electrode barbs 52 are arranged at equal intervals, the high-voltage electrode assembly 5 is arranged inside a quartz tube 41, the top of the electrode column 51 is fixedly arranged at the bottom end of the mist inlet assembly 2, and the bottom of the electrode column 51 is fixedly arranged at the bottom end of the liquid outlet assembly 6.
As a technical optimization scheme of the invention, the liquid outlet assembly 6 comprises a liquid outlet cavity 61, a lower high-voltage electrode support frame 63 is fixedly mounted at the top end of the liquid outlet cavity 61, the lower high-voltage electrode support frame 63 is arranged in a symmetrical Y shape, a lower high-voltage electrode fixing sleeve 62 is fixedly connected at the top end of the lower high-voltage electrode support frame 63, the lower high-voltage electrode fixing sleeve 62 is welded with the lower high-voltage electrode support frame 63, a conical liquid outlet cavity 64 is fixedly connected at the bottom end of the liquid outlet cavity 61, a liquid outlet 65 is fixedly connected at the bottom end of the conical liquid outlet cavity 64, a fastening threaded sleeve 66 is sleeved on the outer wall of the liquid outlet 65 in a threaded manner, and the liquid outlet cavity 61, the conical liquid outlet cavity 64 and the liquid outlet 65 are communicated with each other.
As a technical optimization scheme of the invention, the top end of the liquid outlet cavity 61 is provided with an installation groove, the lower high-voltage electrode support frame 63 is fixedly installed at the bottom of the installation groove, and the bottom end of the quartz tube 41 is installed in the installation groove in a threaded manner.
As a technical optimization scheme of the invention, the top of the electrode column 51 is fixedly arranged in the upper high-voltage electrode fixing sleeve 25, the bottom of the electrode column 51 is fixedly arranged in the lower high-voltage electrode fixing sleeve 62, the top of the electrode column 51 is electrically connected with the excitation source 8 through the connecting lead 24, and the high-voltage electrode assembly 5 is made of an anti-corrosion and anti-oxidation composite metal conductive material.
As a technical optimization scheme of the invention, the collecting assembly 7 comprises a liquid outlet pipe 71, the bottom of the liquid outlet pipe 71 is in threaded connection with a collecting box 72, a buffering baffle 73 is fixedly arranged inside the collecting box 72, the buffering baffle 73 is used for condensing liquefied water mist, the bottom end of the buffering baffle 73 is fixedly connected with a flow guide fence 74, the flow guide fence 74 is used for guiding condensed and liquefied water drops to the bottom of an inner cavity of the collecting box 72, one side of the collecting box 72 is provided with a gas vent 75, and a mist catching net can be arranged inside the gas vent 75. For intercepting the mist not liquefied by the buffer baffle 73.
As a technical optimization scheme of the invention, the top of the collection box 72 is integrally formed with a liquid inlet 79, internal threads are arranged inside the liquid inlet 79, the bottom threads of the liquid outlet pipe 71 are installed inside the liquid inlet 79, the top end of the liquid inlet 79 is provided with a second fixing plate 76, the second fixing plate 76 is provided with a circular ring plate, a plurality of second bolts 77 are installed at the top end of the second fixing plate 76 in an equidistant threaded manner, the number of the second bolts 77 is four, the bottom end of the second fixing plate 76 is provided with a second rubber ring 78, the second rubber ring 78 is clamped at the top of the inner cavity of the liquid inlet 79, and the bottom of the liquid outlet pipe 71 is fixed through the second fixing plate 76, the second bolts 77 and the second rubber ring 78.
As a technical optimization scheme of the invention, the bottoms of the front and back surfaces of the liquid outlet 65 are both provided with openings, the bottoms of the outer walls of the two sides of the liquid outlet 65 are both integrally formed with limiting bosses, and the internal threads of the liquid outlet 65 are sleeved on the top of the liquid outlet pipe 71 and are further fixed by a fastening threaded sleeve 66.
When the invention is used;
please refer to fig. 1 to 7;
firstly, energizing an excitation source 8, and connecting a high-voltage electrode assembly 5 with current; simultaneously starting the ultrasonic atomizer 11 and always introducing water flow into a water storage tank outside the atomizer 11;
carrying out operation one;
the ultrasonic atomizer 11 atomizes water flow, then water mist is guided into the mist inlet cavity 22 through the connecting hose 12 and the mist inlet 21 by the ultrasonic atomizer 11, and the water mist entering the inner cavity of the mist inlet cavity 22 further enters the quartz tube 41;
carrying out operation two;
the water mist enters the quartz tube 41, the high-voltage electrode assembly 5 discharges through the electrode barbs 52, dielectric barrier discharge is generated between the tube wall of the quartz tube 41 and the copper coil 42 outside the tube wall and the grounding electrode 9, each electrode barb 52 on the electrode column 51 forms a discharge channel along the axial direction, so that the whole inner cavity of the quartz tube 41 is filled with plasma active substances such as hydroxyl radicals, ozone and the like, the liquid drops fully react with the active substances in the reactor 4, or ultraviolet radiation generated by the discharge directly acts on the liquid drops or directly participates in the reaction to purify the water mist;
carrying out operation three;
the purified water mist enters the liquid outlet cavity 61, then enters the liquid outlet pipe 71 through the conical liquid outlet cavity 64 and the liquid outlet 65, the water mist entering the liquid outlet pipe 71 enters the collecting box 72, firstly is condensed and liquefied through the buffer baffle 73, the liquefied water flow is guided to the bottom of the inner cavity of the collecting box 72 by the flow guide fence 74, the water mist which is not liquefied is collected and liquefied through the mist catching net of the air vent 75, and the water flow is purified.
To those skilled in the art;
firstly, the high-voltage electrode assembly 5 is made of oxidation-resistant and acid corrosion-resistant composite metal and is rust-resistant; the barbs are arranged along the diameter direction of the reactor 4, when discharging, each electrode barb 52 on each electrode column 51 in the cavity of the reactor 4 forms a discharging micro-channel along the diameter direction and almost disperses to the whole area of the inner cavity of the reactor 4, so that active substances such as hydroxyl radicals, ozone, hydrogen peroxide and the like generated by discharging can be uniformly dispersed in the quartz tube 41, the utilization efficiency of the active substances is high, and the degradation rate is high;
secondly, the water solution to be treated can be dispersed into liquid drops with the diameter less than or equal to five microns through the atomizing device 1, compared with the water outlet form of a common nozzle, the mode has the advantages that the diameter of the mist liquid drops is much smaller, the contact area of active substances and the liquid drops is larger, and the plasma active substances generated by discharge are fully contacted with the liquid drops in the reactor 4; during discharging, all plasma areas are included in the atomization area, so that the collision probability of active substances generated by plasma and pollutant molecules in liquid drops is increased, waste of the plasma active substances generated by discharging is avoided to a certain extent, and the utilization rate of the active substances is high; on the basis, various other physical and chemical effects exist in the discharging period to synergistically degrade organic pollutants in the solution, the water solution is hardly required to be circularly treated, and the energy loss is reduced;
thirdly, a high-voltage pulse power supply is adopted as an excitation source 8, the input of the excitation source 8 is connected with the output end of a signal generator, and parameters such as the width of pulse output can be freely adjusted; the ultrasonic atomizer 11 in the atomizer 1 can freely adjust the atomization amount and the air quantity, and the water purification degree can be enhanced by the increase of the ultrasonic atomizer and the air quantity to a certain degree; the electrodes can be freely replaced, and electrode columns 51 with different tooth pitches can be replaced for different main degradation pollutants in water, so that the energy waste is avoided; the main body has simple structure and simple operation, is convenient for transportation and can be miniaturized.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.

Claims (9)

1. A high degradation rate atomizing plasma water purification installation which characterized in that includes:
the device comprises an atomizing device (1), wherein a fog inlet assembly (2) is arranged at the bottom end of the atomizing device (1), a first fixing plate (3) is fixedly installed at the bottom end of the fog inlet assembly (2), a reactor (4) is fixedly installed at the bottom end of the fog inlet assembly (2), a high-voltage electrode assembly (5) is fixedly installed in the reactor (4), a liquid outlet assembly (6) is fixedly installed at the bottom end of the reactor (4), a collecting assembly (7) is fixedly installed at the bottom end of the liquid outlet assembly (6), one side of the fog inlet assembly (2) is electrically connected with an excitation source (8), and one side of the reactor (4) is electrically connected with a grounding electrode (9);
the fog inlet assembly (2) comprises a fog inlet cavity (22), a fog inlet (21) is formed at the top end of the fog inlet cavity (22) in an integrated mode, a lead fixing sleeve (23) is fixedly installed on one side of the fog inlet cavity (22), a connecting lead (24) is buried in the lead fixing sleeve (23), an upper high-voltage electrode support frame (26) is fixedly installed at the bottom end of the fog inlet cavity (22), and an upper high-voltage electrode fixing sleeve (25) is fixedly connected to the bottom end of the upper high-voltage electrode support frame (26);
go out liquid subassembly (6), go out liquid subassembly (6) including going out liquid cavity (61), the top fixed mounting that goes out liquid cavity (61) has lower high-voltage electrode support frame (63), the fixed cover of high-voltage electrode (62) under the top fixedly connected with of lower high-voltage electrode support frame (63), the bottom fixedly connected with toper play liquid chamber (64) of going out liquid cavity (61), the bottom fixedly connected with liquid outlet (65) of toper play liquid chamber (64), fastening screw sleeve (66) have been cup jointed to the outer wall screw thread of liquid outlet (65).
2. The high-degradation-rate atomized plasma water purification device as claimed in claim 1, wherein: atomizing device (1) includes atomizer (11), the bottom fixedly connected with coupling hose (12) of atomizer (11), the bottom of coupling hose (12) with advance fog subassembly (2) through connection.
3. The high-degradation-rate atomized plasma water purification device as claimed in claim 1, wherein: a connecting table is integrally formed at the bottom end of the mist inlet cavity (22), and three threaded grooves (27) are formed at the bottom end of the connecting table at equal intervals;
first fixed plate (3) are including fixed plate body (31), the top of fixed plate body (31) sets up first rubber ring (32), three first bolt (33) are installed to the bottom equidistance screw thread of fixed plate body (31).
4. The high-degradation-rate atomized plasma water purification device as claimed in claim 1, wherein: the reactor (4) comprises a quartz tube (41), a copper coil (42) is arranged on the outer wall of the quartz tube (41), the top of the quartz tube (41) is inserted into the bottom end of the mist inlet assembly (2), and the bottom of the quartz tube (41) is in threaded connection with the top end of the liquid outlet assembly (6);
high voltage electrode subassembly (5) are including electrode column (51), the equal integrated into one piece in four sides of electrode column (51) has a plurality of electrode barbs (52), high voltage electrode subassembly (5) set up the inside at quartz capsule (41), the top fixed mounting of electrode column (51) is in the bottom of advancing fog subassembly (2), the bottom fixed mounting of electrode column (51) is in the bottom of going out liquid subassembly (6).
5. The high-degradation-rate atomized plasma water purification device as claimed in claim 1, wherein: the collecting assembly (7) comprises a liquid outlet pipe (71), the bottom of the liquid outlet pipe (71) is in threaded connection with a collecting box (72), a buffering baffle plate (73) is fixedly mounted inside the collecting box (72), a drainage fence (74) is fixedly connected to the bottom end of the buffering baffle plate (73), and a vent hole (75) is formed in one side of the collecting box (72).
6. The high-degradation-rate atomized plasma water purification device as claimed in claim 5, wherein: the top integrated into one piece of collecting box (72) has into liquid mouth (79), the bottom screw thread of drain pipe (71) is installed in the inside of going into liquid mouth (79), the top of going into liquid mouth (79) is provided with second fixed plate (76), a plurality of second bolts (77) are installed to the top equidistance screw thread of second fixed plate (76), the bottom of second fixed plate (76) is provided with second rubber ring (78).
7. The high-degradation-rate atomized plasma water purification device as claimed in claim 4, wherein: the top of the electrode column (51) is fixedly mounted inside the upper high-voltage electrode fixing sleeve (25), the bottom of the electrode column (51) is fixedly mounted inside the lower high-voltage electrode fixing sleeve (62), and the electrode column (51) is electrically connected with the excitation source (8) through the connecting wire (24).
8. The high-degradation-rate atomized plasma water purification device as claimed in claim 4, wherein: the copper coil (42) is sleeved on the outer wall of the quartz tube (41), the bottom of the copper coil (42) is electrically connected with the grounding electrode (9) through a lead, and the excitation source (8) is electrically connected with the grounding electrode (9) through a lead.
9. The high-degradation-rate atomized plasma water purification device as claimed in claim 1, wherein: the opening has all been seted up to the bottom on liquid outlet (65) two sides just, the equal integrated into one piece in bottom of liquid outlet (65) both sides outer wall has the spacing boss, the inside screw thread of liquid outlet (65) cup joints the top at drain pipe (71).
CN202110829932.7A 2021-07-22 2021-07-22 High degradation rate atomizing formula plasma water purification installation Pending CN113428932A (en)

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CN202110829932.7A CN113428932A (en) 2021-07-22 2021-07-22 High degradation rate atomizing formula plasma water purification installation

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Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101513586A (en) * 2009-02-27 2009-08-26 重庆大学 Reactor for eliminating oil smoke and foreign odor thereof
CN203731562U (en) * 2014-01-27 2014-07-23 西安交通大学 Air cleaning unit
CN105948372A (en) * 2016-06-24 2016-09-21 石家庄铁道大学 Industrial sewage treatment technique and system based on high-voltage nanosecond pulsed electric field technology
CN107344740A (en) * 2016-05-06 2017-11-14 魏星 A kind of technique and method of low-temperature plasma processing high-concentration sewage
CN108261897A (en) * 2018-04-04 2018-07-10 佛山市上利丰装饰材料有限公司 A kind of waste water and the general purifier of exhaust gas
CN208577466U (en) * 2018-08-08 2019-03-05 中国矿业大学(北京) A kind of purification device of used water difficult to degradate
CN109896677A (en) * 2017-12-11 2019-06-18 江苏丽港稀土材料有限公司 Plasma and ultrasonic combined processing organic wastewater system and its method for handling waste water
CN109942059A (en) * 2019-04-03 2019-06-28 大连理工大学 A kind of falling liquid film device for treating aqueous discharge plasma that water distribution is integrated with catalysis
CN212310411U (en) * 2020-05-21 2021-01-08 合肥学院 Low-temperature plasma soil organic pollutant degradation device
CN113731325A (en) * 2021-09-03 2021-12-03 重庆大学 Device for synthesizing nitrogen oxide by air plasma

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101513586A (en) * 2009-02-27 2009-08-26 重庆大学 Reactor for eliminating oil smoke and foreign odor thereof
CN203731562U (en) * 2014-01-27 2014-07-23 西安交通大学 Air cleaning unit
CN107344740A (en) * 2016-05-06 2017-11-14 魏星 A kind of technique and method of low-temperature plasma processing high-concentration sewage
CN105948372A (en) * 2016-06-24 2016-09-21 石家庄铁道大学 Industrial sewage treatment technique and system based on high-voltage nanosecond pulsed electric field technology
CN109896677A (en) * 2017-12-11 2019-06-18 江苏丽港稀土材料有限公司 Plasma and ultrasonic combined processing organic wastewater system and its method for handling waste water
CN108261897A (en) * 2018-04-04 2018-07-10 佛山市上利丰装饰材料有限公司 A kind of waste water and the general purifier of exhaust gas
CN208577466U (en) * 2018-08-08 2019-03-05 中国矿业大学(北京) A kind of purification device of used water difficult to degradate
CN109942059A (en) * 2019-04-03 2019-06-28 大连理工大学 A kind of falling liquid film device for treating aqueous discharge plasma that water distribution is integrated with catalysis
CN212310411U (en) * 2020-05-21 2021-01-08 合肥学院 Low-temperature plasma soil organic pollutant degradation device
CN113731325A (en) * 2021-09-03 2021-12-03 重庆大学 Device for synthesizing nitrogen oxide by air plasma

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