CN113412326A - 氧化铈去除组合物 - Google Patents
氧化铈去除组合物 Download PDFInfo
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- CN113412326A CN113412326A CN202080012705.9A CN202080012705A CN113412326A CN 113412326 A CN113412326 A CN 113412326A CN 202080012705 A CN202080012705 A CN 202080012705A CN 113412326 A CN113412326 A CN 113412326A
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- Prior art keywords
- acid
- composition
- ceria
- compound
- complexing compound
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- 239000000203 mixture Substances 0.000 title claims abstract description 81
- 229910000420 cerium oxide Inorganic materials 0.000 title claims abstract description 39
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 33
- 150000001875 compounds Chemical class 0.000 claims description 39
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 24
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 23
- 230000000536 complexating effect Effects 0.000 claims description 21
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims description 18
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 16
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 claims description 13
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims description 10
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid group Chemical group C(CC(O)(C(=O)O)CC(=O)O)(=O)O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 239000001361 adipic acid Substances 0.000 claims description 8
- 235000011037 adipic acid Nutrition 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 8
- 229960003237 betaine Drugs 0.000 claims description 7
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims description 7
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 6
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 claims description 6
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 claims description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 6
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 claims description 6
- 239000004220 glutamic acid Substances 0.000 claims description 6
- 235000013922 glutamic acid Nutrition 0.000 claims description 6
- 230000000269 nucleophilic effect Effects 0.000 claims description 6
- 239000011975 tartaric acid Substances 0.000 claims description 6
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- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 4
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- 229940075419 choline hydroxide Drugs 0.000 claims description 3
- MFGOFGRYDNHJTA-UHFFFAOYSA-N 2-amino-1-(2-fluorophenyl)ethanol Chemical compound NCC(O)C1=CC=CC=C1F MFGOFGRYDNHJTA-UHFFFAOYSA-N 0.000 claims description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 239000000908 ammonium hydroxide Substances 0.000 claims description 2
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 claims description 2
- 239000004310 lactic acid Substances 0.000 claims description 2
- 235000014655 lactic acid Nutrition 0.000 claims description 2
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 claims description 2
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 claims description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 claims 4
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- 229910052581 Si3N4 Inorganic materials 0.000 abstract description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract description 6
- 239000008139 complexing agent Substances 0.000 abstract description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 3
- 229910052717 sulfur Inorganic materials 0.000 abstract description 3
- 239000011593 sulfur Substances 0.000 abstract description 3
- 125000004437 phosphorous atom Chemical group 0.000 abstract description 2
- 229920005591 polysilicon Polymers 0.000 abstract description 2
- -1 hydroxypropyl Chemical group 0.000 description 30
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 26
- 239000000463 material Substances 0.000 description 24
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 22
- 239000002002 slurry Substances 0.000 description 16
- 229920001223 polyethylene glycol Polymers 0.000 description 14
- 239000000126 substance Substances 0.000 description 14
- 229920001451 polypropylene glycol Polymers 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 238000005498 polishing Methods 0.000 description 11
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- 229920001400 block copolymer Polymers 0.000 description 9
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- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical class CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
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- 229910052751 metal Inorganic materials 0.000 description 6
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- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical class CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
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- 150000003839 salts Chemical class 0.000 description 5
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- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 4
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
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- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Chemical class CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- SVMUEEINWGBIPD-UHFFFAOYSA-N dodecylphosphonic acid Chemical compound CCCCCCCCCCCCP(O)(O)=O SVMUEEINWGBIPD-UHFFFAOYSA-N 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
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- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 4
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 3
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 description 3
- QDCPNGVVOWVKJG-VAWYXSNFSA-N 2-[(e)-dodec-1-enyl]butanedioic acid Chemical compound CCCCCCCCCC\C=C\C(C(O)=O)CC(O)=O QDCPNGVVOWVKJG-VAWYXSNFSA-N 0.000 description 3
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- LCUOIYYHNRBAFS-UHFFFAOYSA-N copper;sulfanylideneindium Chemical compound [Cu].[In]=S LCUOIYYHNRBAFS-UHFFFAOYSA-N 0.000 description 1
- FQQOMPOPYZIROF-UHFFFAOYSA-N cyclopenta-2,4-dien-1-one Chemical compound O=C1C=CC=C1 FQQOMPOPYZIROF-UHFFFAOYSA-N 0.000 description 1
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- SCIGVHCNNXTQDB-UHFFFAOYSA-N decyl dihydrogen phosphate Chemical compound CCCCCCCCCCOP(O)(O)=O SCIGVHCNNXTQDB-UHFFFAOYSA-N 0.000 description 1
- SEGLCEQVOFDUPX-UHFFFAOYSA-N di-(2-ethylhexyl)phosphoric acid Chemical compound CCCCC(CC)COP(O)(=O)OCC(CC)CCCC SEGLCEQVOFDUPX-UHFFFAOYSA-N 0.000 description 1
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 1
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- 229910003460 diamond Inorganic materials 0.000 description 1
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- XRWMGCFJVKDVMD-UHFFFAOYSA-M didodecyl(dimethyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCC XRWMGCFJVKDVMD-UHFFFAOYSA-M 0.000 description 1
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- SGZVXLFVBKDMJH-UHFFFAOYSA-M dihydrogen phosphate;hexadecyl-(2-hydroxyethyl)-dimethylazanium Chemical compound OP(O)([O-])=O.CCCCCCCCCCCCCCCC[N+](C)(C)CCO SGZVXLFVBKDMJH-UHFFFAOYSA-M 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
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- PSLWZOIUBRXAQW-UHFFFAOYSA-M dimethyl(dioctadecyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC PSLWZOIUBRXAQW-UHFFFAOYSA-M 0.000 description 1
- SIYLLGKDQZGJHK-UHFFFAOYSA-N dimethyl-(phenylmethyl)-[2-[2-[4-(2,4,4-trimethylpentan-2-yl)phenoxy]ethoxy]ethyl]ammonium Chemical compound C1=CC(C(C)(C)CC(C)(C)C)=CC=C1OCCOCC[N+](C)(C)CC1=CC=CC=C1 SIYLLGKDQZGJHK-UHFFFAOYSA-N 0.000 description 1
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- OWMBTIRJFMGPAC-UHFFFAOYSA-N dimethylamino 2-methylprop-2-enoate Chemical compound CN(C)OC(=O)C(C)=C OWMBTIRJFMGPAC-UHFFFAOYSA-N 0.000 description 1
- FRXGWNKDEMTFPL-UHFFFAOYSA-N dioctadecyl hydrogen phosphate Chemical compound CCCCCCCCCCCCCCCCCCOP(O)(=O)OCCCCCCCCCCCCCCCCCC FRXGWNKDEMTFPL-UHFFFAOYSA-N 0.000 description 1
- FGRVOLIFQGXPCT-UHFFFAOYSA-L dipotassium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].[K+].[O-]S([O-])(=O)=S FGRVOLIFQGXPCT-UHFFFAOYSA-L 0.000 description 1
- RZMWTGFSAMRLQH-UHFFFAOYSA-L disodium;2,2-dihexyl-3-sulfobutanedioate Chemical compound [Na+].[Na+].CCCCCCC(C([O-])=O)(C(C([O-])=O)S(O)(=O)=O)CCCCCC RZMWTGFSAMRLQH-UHFFFAOYSA-L 0.000 description 1
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- FFGSPQDSOUPWGY-UHFFFAOYSA-M dodecyl-ethyl-dimethylazanium;bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(C)CC FFGSPQDSOUPWGY-UHFFFAOYSA-M 0.000 description 1
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- 238000011068 loading method Methods 0.000 description 1
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- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
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- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- GSGDTSDELPUTKU-UHFFFAOYSA-N nonoxybenzene Chemical compound CCCCCCCCCOC1=CC=CC=C1 GSGDTSDELPUTKU-UHFFFAOYSA-N 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
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- UHGIMQLJWRAPLT-UHFFFAOYSA-N octadecyl dihydrogen phosphate Chemical compound CCCCCCCCCCCCCCCCCCOP(O)(O)=O UHGIMQLJWRAPLT-UHFFFAOYSA-N 0.000 description 1
- YTJSFYQNRXLOIC-UHFFFAOYSA-N octadecylsilane Chemical class CCCCCCCCCCCCCCCCCC[SiH3] YTJSFYQNRXLOIC-UHFFFAOYSA-N 0.000 description 1
- UYDLBVPAAFVANX-UHFFFAOYSA-N octylphenoxy polyethoxyethanol Chemical group CC(C)(C)CC(C)(C)C1=CC=C(OCCOCCOCCOCCO)C=C1 UYDLBVPAAFVANX-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
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- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- ZWBAMYVPMDSJGQ-UHFFFAOYSA-N perfluoroheptanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZWBAMYVPMDSJGQ-UHFFFAOYSA-N 0.000 description 1
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical compound OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 1
- KFSLWBXXFJQRDL-UHFFFAOYSA-N peroxyacetic acid Substances CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- FHHJDRFHHWUPDG-UHFFFAOYSA-L peroxysulfate(2-) Chemical compound [O-]OS([O-])(=O)=O FHHJDRFHHWUPDG-UHFFFAOYSA-L 0.000 description 1
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- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- IYPZRUYMFDWKSS-UHFFFAOYSA-N piperazin-1-amine Chemical compound NN1CCNCC1 IYPZRUYMFDWKSS-UHFFFAOYSA-N 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920001983 poloxamer Polymers 0.000 description 1
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- 229920001456 poly(acrylic acid sodium salt) Polymers 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920000333 poly(propyleneimine) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
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- 229920002689 polyvinyl acetate Polymers 0.000 description 1
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- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 235000010408 potassium alginate Nutrition 0.000 description 1
- 239000000737 potassium alginate Substances 0.000 description 1
- MZYRDLHIWXQJCQ-YZOKENDUSA-L potassium alginate Chemical compound [K+].[K+].O1[C@@H](C([O-])=O)[C@@H](OC)[C@H](O)[C@H](O)[C@@H]1O[C@@H]1[C@@H](C([O-])=O)O[C@@H](O)[C@@H](O)[C@H]1O MZYRDLHIWXQJCQ-YZOKENDUSA-L 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N propiophenone Chemical compound CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
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- 239000011347 resin Substances 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
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- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- FVEFRICMTUKAML-UHFFFAOYSA-M sodium tetradecyl sulfate Chemical compound [Na+].CCCCC(CC)CCC(CC(C)C)OS([O-])(=O)=O FVEFRICMTUKAML-UHFFFAOYSA-M 0.000 description 1
- UELAIMNOXLAYRW-UHFFFAOYSA-M sodium;1,4-dicyclohexyloxy-1,4-dioxobutane-2-sulfonate Chemical compound [Na+].C1CCCCC1OC(=O)C(S(=O)(=O)[O-])CC(=O)OC1CCCCC1 UELAIMNOXLAYRW-UHFFFAOYSA-M 0.000 description 1
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- 239000007921 spray Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000011885 synergistic combination Substances 0.000 description 1
- FBWNMEQMRUMQSO-UHFFFAOYSA-N tergitol NP-9 Polymers CCCCCCCCCC1=CC=C(OCCOCCOCCOCCOCCOCCOCCOCCOCCO)C=C1 FBWNMEQMRUMQSO-UHFFFAOYSA-N 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- YNJQKNVVBBIPBA-UHFFFAOYSA-M tetrabutylazanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCC[N+](CCCC)(CCCC)CCCC YNJQKNVVBBIPBA-UHFFFAOYSA-M 0.000 description 1
- BVQJQTMSTANITJ-UHFFFAOYSA-N tetradecylphosphonic acid Chemical compound CCCCCCCCCCCCCCP(O)(O)=O BVQJQTMSTANITJ-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229940113082 thymine Drugs 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- LDGFRUUNCRYSQK-UHFFFAOYSA-N triazin-4-ylmethanediamine Chemical compound NC(N)C1=CC=NN=N1 LDGFRUUNCRYSQK-UHFFFAOYSA-N 0.000 description 1
- MPSUGQWRVNRJEE-UHFFFAOYSA-N triazol-1-amine Chemical compound NN1C=CN=N1 MPSUGQWRVNRJEE-UHFFFAOYSA-N 0.000 description 1
- XDUVTZGINNGNAG-UHFFFAOYSA-M tridodecyl(methyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(CCCCCCCCCCCC)CCCCCCCCCCCC XDUVTZGINNGNAG-UHFFFAOYSA-M 0.000 description 1
- GPQCSCQDQNXQSV-UHFFFAOYSA-N tridodecylazanium;chloride Chemical compound Cl.CCCCCCCCCCCCN(CCCCCCCCCCCC)CCCCCCCCCCCC GPQCSCQDQNXQSV-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 150000008648 triflates Chemical class 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- SZEMGTQCPRNXEG-UHFFFAOYSA-M trimethyl(octadecyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C SZEMGTQCPRNXEG-UHFFFAOYSA-M 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 229940116269 uric acid Drugs 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000000230 xanthan gum Substances 0.000 description 1
- 235000010493 xanthan gum Nutrition 0.000 description 1
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- 229940082509 xanthan gum Drugs 0.000 description 1
Classifications
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Abstract
本发明大体上涉及一种去除组合物和方法,其尤其适用于从上面有氧化铈粒子和CMP污染物的微电子装置,尤其具有PETEOS、氮化硅和多晶硅衬底的微电子装置清洁所述粒子和CMP污染物。在一个方面中,本发明提供利用不含硫和磷原子的络合剂处理上面有氧化铈粒子的微电子衬底。
Description
技术领域
本发明大体上涉及用于从上面有氧化铈粒子和其它化学机械研磨浆料污染物的微电子装置去除所述粒子和污染物的组合物。
背景技术
微电子装置晶片用于形成集成电路。微电子装置晶片包括例如硅的衬底,衬底中区域经图案化用以沉积具有绝缘、导电或半导电特性的不同材料。
为获得恰当的图案化,必须去除用于在衬底上形成层的过量材料。此外,为制造功能性并且可靠的电路,在后续加工之前制备平整或平坦的微电子晶片表面很重要。因此,必需去除和/或研磨微电子装置晶片的某些表面。
化学机械研磨或平坦化(“CMP”)为一种从微电子装置晶片的表面去除材料,并且通过联合物理方法(例如磨耗)与化学方法(例如氧化或螯合)来研磨(例如,平坦化)所述表面的方法。CMP以其最基本的形式涉及将具有活性化学物质的研磨浆料施加到研磨垫,所述研磨垫在去除、平坦化和研磨工艺期间磨光微电子装置晶片的表面。为达成快速、均匀去除,利用纯物理或纯化学作用的去除或研磨方法并不如使用两者的协同组合般有效。另外,在集成电路的制造中,CMP浆料亦应能够优先去除包含金属和其它材料的络合层的膜,从而可产生用于后续光刻或图案化、蚀刻和薄膜加工的高度平坦的表面。
在用于使用浅沟槽隔离(STI)工艺在硅衬底中形成隔离区的生产线前段(front-end-of-the-line;FEOL)方法中,将垫氧化物膜和垫氮化物膜沉积于半导体衬底上并且图案化以暴露衬底中对应于隔离区的部分。接着,蚀刻衬底的暴露区以形成沟槽。其后,使衬底经受牺牲氧化工艺以去除由衬底蚀刻引起的损坏,随后在沟槽的表面上形成壁氧化物膜。接着,以如内埋于沟槽中的方式将内埋沟槽的氧化物膜(例如,由高密度等离子体化学气相沉积形成的氧化物膜,称为HDP-氧化物膜)沉积于衬底的表面上。随后,使HDP-氧化物膜的表面经受化学机械研磨,直到暴露垫氮化物膜为止。随后清洁所得衬底并且去除在沟槽蚀刻期间用作蚀刻屏障的垫氮化物膜,从而形成隔离区。
相对于含二氧化硅的浆料,对于绝缘体而言使用氧化铈粒子的CMP浆料通常达成较快研磨速度。此外,基于氧化铈的浆料由于其在最小氧化物侵蚀的情况下达成STI图案平坦化的能力而最常使用。不利地,由于氧化铈粒子相对于氧化硅和氮化硅表面带相反电荷的ζ电位,故基于氧化铈的浆料难以从STI结构去除。如果制造具有此些残余物残留于晶片上的装置,那么所述残余物将导致短路和电阻增加。在使用氧化铈浆料进行CMP加工之后,氧化铈粒子亦为FinFET结构的问题。
当前,用于去除氧化铈粒子的最有效湿清洁调配物为稀氢氟酸(DHF)。然而,DHF不利地蚀刻氧化硅和其它低k介电材料。
因此,仍需要一种氧化铈粒子去除组合物和方法,所述组合物和方法可有效地从微电子装置的表面去除氧化铈粒子,同时不损害例如氮化硅层、低k介电(例如,氧化硅)层和含钨层的底层材料。氧化铈粒子去除组合物亦应有效地从微电子装置的表面去除CMP浆料污染物。
发明内容
本发明大体上关于一种去除组合物和方法,其尤其适用于从上面有氧化铈粒子和CMP污染物的微电子装置,尤其具有PETEOS、氮化硅和多晶硅衬底的微电子装置清洁所述粒子和CMP污染物。在一个方面中,本发明提供利用不含硫和磷原子的络合剂处理上面有氧化铈粒子的微电子衬底。就此而言,氧化铈粒子可带正电或带负电。
具体实施方式
本发明大体上涉及适用于从上面有氧化铈粒子和CMP污染物的微电子装置去除此类一或多种材料的组合物。使用所述组合物有效去除氧化铈粒子和CMP污染物,另外,所述组合物与氮化硅和低k介电(例如,氧化硅)层相容。
在第一方面中,本发明提供一种组合物,所述组合物包含如本文中所阐述的组合物、由其组成或基本上由其组成。在一个实施例中,本发明提供一种pH为约1到约6的组合物,其包含:
(a)铈-氧键断裂化合物;
(b)pH调节剂;
(c)至少一种清洁剂;
(d)选自酒石酸、乙酰丙酮、谷氨酸、己二酸、甜菜碱、氨基三(亚甲基膦酸)和次氮基三乙酸的氧化铈络合化合物;和
(e)水。
在本发明的组合物中,铈-氧键断裂化合物可为任何用于有效断裂铈-氧化学键的常规化合物。此类化合物包括氧化剂、还原剂和亲核化合物。
如本文中所使用,术语“亲核化合物”是指理解为在化学反应中充当亲核试剂的化合物。换言之,亲核化合物为可向亲电试剂供给电子对以形成与反应相关的化学键的化学物质。
在一个实施例中,亲核化合物为胺。实例包括单乙醇胺(MEA)、吗啉、异丙基胺、二异丙醇胺、二甘醇胺、三乙胺、N-甲基吗啉、甲基乙醇胺、N-氨基丙基吗啉和3-氨基-丙醇。
其它亲核化合物包括具有通式NR1R2R3的物质,其中R1、R2和R3可彼此相同或不同并且选自氢、直链或分支链C1-C6烷基(例如,甲基、乙基、丙基、丁基、戊基和己基)、直链或分支链C1-C6羟烷基(例如羟甲基、羟乙基、羟丙基、羟丁基、羟戊基和羟己基)和如上文所定义直链或分支链C1-C6羟烷基的C1-C6烷基醚。在某些实施例中,R1、R2和R3中的至少一者为直链或分支链C1-C6羟烷基。实例包括但不限于烷醇胺,例如氨基乙基乙醇胺、N-甲氨基乙醇、氨基乙氧基乙醇、二甲氨基乙氧基乙醇、二乙醇胺、N-甲基二乙醇胺、单乙醇胺(MEA)、三乙醇胺(TEA)、1-氨基-2-丙醇、2-氨基-1-丁醇、异丁醇胺、三乙二胺、其它C1-C8烷醇胺和其组合。当胺包括烷基醚组分时,胺可视为烷氧基胺,例如1-甲氧基-2-氨基乙烷。
如本文中所使用,所涵盖的“还原剂”包括选自次磷酸(H3PO2)、抗坏血酸、L(+)抗坏血酸、异抗坏血酸、抗坏血酸衍生物、DEHA(二乙基羟胺)、还原糖(半乳糖)和其组合的化合物。另外,亚磷酸、亚硫酸、硫代硫酸铵和硫代硫酸钾、木糖、山梨糖醇。可利用N-氨基吗啉、N-氨基哌嗪、对苯二酚、儿茶酚、四氢富瓦烯、N,N-二甲基苯胺苄胺、羟胺和其它基于硫的还原剂。
如本文中所使用,“氧化剂”对应于(一或多种)氧化暴露的金属导致金属腐蚀或金属上形成氧化物的化合物。氧化剂包括但不限于:过氧化氢;其它过化合物,例如含有过氧单硫酸根、过硼酸根、过氯酸根、过碘酸根、过硫酸根、过锰酸根和过乙酸根阴离子的盐和酸;以及胺-N-氧化物。
适合的pH调节剂包括氢氧化胆碱、氢氧化钾、氢氧化铯、氢氧化四乙铵、氢氧化铵、硝酸、硫酸、氨基磺酸、乙醇酸、乳酸和甲磺酸。
如上文所指出,组合物包含至少一种清洁剂。所述清洁剂选自(i)一或多种水混溶性溶剂和/或(ii)一或多种聚合物和/或柠檬酸中的至少一者。
水混溶性溶剂的实例包括二醇和二醇醚,包括但不限于甲醇、乙醇、异丙醇、丁醇和高级醇(例如C2-C4二醇和C2-C4三醇)、四氢糠醇(THFA)、卤化醇(例如3-氯-1,2-丙二醇、3-氯-1-丙硫醇、1-氯-2-丙醇、2-氯-1-丙醇、3-氯-1-丙醇、3-溴-1,2-丙二醇、1-溴-2-丙醇、3-溴-1-丙醇、3-碘-1-丙醇、4-氯-1-丁醇、2-氯乙醇)、二氯甲烷、三氯甲烷、乙酸、丙酸、三氟乙酸、四氢呋喃N-甲基吡咯烷酮(NMP)、环己基吡咯烷酮、N-辛基吡咯烷酮、N-苯基吡咯烷酮、甲基二乙醇胺、甲酸甲酯、二甲基甲酰胺(DMF)、二甲亚砜(DMSO)、四亚甲基砜(环丁砜)、二***、苯氧基-2-丙醇(PPh)、苯丙酮、乳酸乙酯、乙酸乙酯、苯甲酸乙酯、乙腈、丙酮、乙二醇、丙二醇(PG)、1,3-丙二醇、二恶烷、丁酰基内酯、碳酸伸丁酯、碳酸伸乙酯、碳酸伸丙酯、二丙二醇、二乙二醇单甲醚、三乙二醇单甲醚、二乙二醇单***、三乙二醇单***、乙二醇单丙醚、乙二醇单丁醚、二乙二醇单丁醚(即,丁基卡必醇)、三乙二醇单丁醚、乙二醇单己醚、二乙二醇单己醚、乙二醇苯醚、丙二醇甲醚、二丙二醇甲醚(DPGME)、三丙二醇甲醚(TPGME)、二丙二醇二甲醚、二丙二醇***、丙二醇正丙醚、二丙二醇正丙醚(DPGPE)、三丙二醇正丙醚、丙二醇正丁醚、二丙二醇正丁醚、三丙二醇正丁醚、丙二醇苯醚、乙二醇单苯醚、二乙二醇单苯醚、六乙二醇单苯醚、二丙二醇甲醚乙酸酯、四乙二醇二甲醚(TEGDE)、二元酯、丙三醇碳酸酯、N-甲酰基吗啉、磷酸三乙酯和其组合。
聚合物(如果存在)包括但不限于甲基丙烯酸均聚物和与例如丙烯酰氨基甲基丙烷磺酸和顺丁烯二酸的共聚物;顺丁烯二酸/乙烯基醚共聚物;聚(乙烯吡咯烷酮)/乙酸乙烯酯;均聚物,例如膦酸化聚乙二醇寡聚物、聚(丙烯酸)(PAA)、聚(丙烯酰胺)、聚(乙酸乙烯酯)、聚(乙二醇)(PEG)、聚(丙二醇)(PPG)、聚(苯乙烯磺酸)、聚(乙烯基磺酸)、聚(乙烯基膦酸)、聚(乙烯基磷酸)、聚(乙烯亚胺)、聚(丙烯亚胺)、聚烯丙胺、聚氧化乙烯(PEO)、聚乙烯吡咯烷酮(PVP)、PPG-PEG-PPG嵌段共聚物、PEG-PPG-PEG嵌段共聚物、聚(乙烯醇)、聚(羟乙基)丙烯酸酯、聚(羟乙基)甲基丙烯酸酯、羟乙基纤维素、甲基羟乙基纤维素、羟丙基纤维素、甲基羟丙基纤维素、三仙胶、海藻酸钾、果胶、羧甲基纤维素、葡糖胺、聚(二烯丙基二甲铵)氯化物、PEG化(即,聚乙二醇化)甲基丙烯酸酯/丙烯酸酯共聚物、聚MADQuat和其共聚物、二甲氨基甲基丙烯酸酯聚合物和其共聚物、三甲铵甲基丙烯酸甲酯聚合物和其共聚物,以及其组合。以上共聚物可为无规共聚物或嵌段共聚物。如果存在,组合物中的(一或多种)聚合物的量按所述组合物的总重量计在约0.0001重量%到约5重量%范围内。
关于络合剂,我们已发现如上文所阐述的所有不含磷和硫原子的某些化合物在络合氧化铈物质方面有效,其帮助从微电子装置的表面去除所述氧化铈物质。在一个实施例中,此些络合剂选自酒石酸、乙酰丙酮、谷氨酸、己二酸、次氮基三乙酸、氨基三(亚甲基膦酸)、甜菜碱、IDA(氨基二乙酸)和HEDP(依替膦酸)。在另一实施例中,络合剂为乙酰丙酮。
为易于参考,“微电子装置”对应于半导体衬底、平板显示器、相变内存装置、太阳电池板和其它包括太阳能衬底、光伏打和微机电***(MEMS)的产品,其经制造用于微电子应用、集成电路应用或计算机芯片应用。太阳能衬底包括但不限于硅、非晶硅、多晶硅、单晶硅、CdTe、硒化铜铟、硫化铜铟和镓上砷化镓(gallium arsenide on gallium)。太阳能衬底可经掺杂或未经掺杂。应理解,术语“微电子装置”并不意谓以任何方式限制,并且包括最终将变为微电子装置或微电子组件的任何衬底。
如本文中所使用,“氧化铈粒子”对应于可用于化学机械研磨浆料的基于铈的研磨粒子,其包括例如具有式Ce2O3和CeO2的氧化铈。应了解“氧化铈粒子”可包含氧化铈、由氧化铈组成或基本上由氧化铈组成。
如本文中所使用,“污染物”对应于存在于CMP浆料中的化学物质、研磨浆料的反应副产物、CMP后残余物、存在于湿式蚀刻组合物中的化学物质、湿式蚀刻组合物的反应副产物和为CMP工艺、湿式蚀刻、等离子体蚀刻或等离子体灰化工艺的副产物的任何其它材料。
如本文中所使用,“CMP后残余物”对应于来自研磨浆料的粒子,例如存在于浆料中的化学物质、研磨浆料的反应副产物、富碳粒子、研磨垫粒子、刷去载粒子、构建粒子的装备材料、本质上为金属、有机物、有机金属、有机硅或无机物的例如含硅材料、含钛材料、含氮材料、含氧材料、聚合物残余物材料、含铜残余物材料(包括氧化铜残余物)、含钨残余物材料、含钴残余物材料、例如氯和氟的蚀刻气体残余物和其组合以及为CMP工艺的副产物的任何其它材料。
如本文中所使用,术语“低k介电材料”对应于在分层微电子装置中用作介电材料的任何材料,其中所述材料具有小于约3.5的介电常数。在某些实施例中,低k介电材料包括低极性材料,例如含硅有机聚合物、含硅混合有机/无机材料、有机硅酸盐玻璃(OSG)、TEOS、氟化硅酸盐玻璃(FSG)、二氧化硅、碳氧化硅、氮氧化硅、氮化硅、掺碳氧化物(CDO)或掺碳玻璃,例如来自Novellus***公司(Novellus Systems,Inc.)的CORALTM、来自应用材料公司(Applied Materials,Inc.)的BLACK DIAMONDTM(例如用于PECVD的BD1、BD2和BD3名称),来自Dow的SiLKTM介电树脂(通过多官能环戊二烯酮与含乙炔材料反应产生的基于交联聚苯的聚合物;参见例如以引用的方式并入本文中的美国专利第5,965,679号)和纳米孔公司(Nanopore,Inc.)的NANOGLASSTM(二氧化硅气凝胶/干凝胶(称为纳米多孔性二氧化硅))等。应了解低k介电材料可具有不同密度和不同孔隙度。
如本文中所使用,术语“蚀刻剂”是指:氢氟酸(HF);氟硅酸(H2SiF6);氟硼酸;氟硅酸铵盐((NH4)2SiF6);六氟磷酸四甲铵;氟化铵;二氟化铵;四氟硼酸季铵盐和四氟硼酸季鏻盐以及其组合。
如本文中所使用,术语“金属腐蚀抑制剂”是指非离子型表面活性剂,例如PolyFoxPF-159(OMNOVA溶液)、聚(乙二醇)(“PEG”)、聚(丙二醇)(“PPG”)、环氧乙烷/环氧丙烷嵌段共聚物例如Pluronic F-127(BASF)、聚山梨醇酯聚氧乙烯(20)脱水山梨糖醇单油酸酯(Tween 80)、聚氧乙烯(20)脱水山梨糖醇单硬脂酸酯(Tween 60)、聚氧乙烯(20)脱水山梨糖醇单棕榈酸酯(Tween 40)、聚氧乙烯(20)脱水山梨糖醇单月桂酸酯(Tween 20)、聚氧丙烯/聚氧乙烯嵌段共聚物(例如,Pluronic L31、Plutonic 31R1、Pluronic 25R2和Pluronic25R4)以及其组合;和此类化合物与以下各项的组合:唑类,例如5-氨基四唑、5-苯基-苯并***、1H-四唑-5-乙酸、1-苯基-2-四唑啉-5-硫酮、苯并咪唑、甲基四唑、Bismuthiol I、胞嘧啶、鸟嘌呤、胸腺嘧啶、吡唑;亚氨基二乙酸(IDA)、丙硫醇、苯并羟肟酸、柠檬酸、抗坏血酸、5-氨基-1,3,4-噻二唑-2-硫醇(ATDT)、苯并***(BTA)、1,2,4-***(TAZ)、甲苯基***、5-甲基-苯并***(mBTA)、5-苯基-苯并***、5-硝基-苯并***、苯并***甲酸、3-氨基-5-巯基-1,2,4-***、1-氨基-1,2,4-***、羟基苯并***、2-(5-氨基-戊基)-苯并***、1-氨基-1,2,3-***、1-氨基-5-甲基-1,2,3-***、3-氨基-1,2,4-***(3-ATA)、3-巯基-1,2,4-***、3-异丙基-1,2,4-***、5-苯硫醇-苯并***、卤基-苯并***(卤基=F、Cl、Br或I)、萘并***、2-巯基苯并咪唑(MBI)、2-巯基苯并噻唑、4-甲基-2-苯基咪唑、2-巯基噻唑啉、5-氨基-1,2,4-***(5-ATA)、十二烷基硫酸钠(SDS)、ATA-SDS、3-氨基-5-巯基-1,2,4-***、戊烯四唑、5-苯基-1H-四唑、5-苄基-1H-四唑、Ablumine O、2-苄基吡啶、丁二酰亚胺、2,4-二氨基-6-甲基-1,3,5-三嗪、噻唑、三嗪、甲基四唑、1,3-二甲基-2-咪唑烷酮、1,5-五亚甲基四唑、1-苯基-5-巯基四唑、二氨基甲基三嗪、咪唑啉硫酮、4-甲基-4H-1,2,4-***-3-硫醇、4-氨基-4H-1,2,4-***、3-氨基-5-甲硫基-1H-1,2,4-***、苯并噻唑、咪唑、吲唑、腺嘌呤、丁二酰亚胺、腺苷、咔唑、糖精、尿酸、安息香肟(benzoinoxime)、阳离子四级盐(例如苯扎氯铵、氯化苄基二甲基十二烷基铵、溴化肉豆蔻基三甲基铵、溴化十二烷基三甲基铵、氯化十六烷基吡啶鎓、Aliquot 336(科尼公司(Cognis))、氯化苄基二甲基苯基铵、Crodaquat TES(禾大公司(Croda.Inc.))、Rewoquat CPEM(威科公司(Witco))、对甲苯磺酸十六烷基三甲基铵、氢氧化十六烷基三甲基铵、二氯化1-甲基-1'-十四烷基-4,4'-联吡啶鎓、溴化烷基三甲基铵、盐酸氨丙啉、氢氧化苄乙铵、苄索氯铵、氯化苄基二甲基十六烷基铵、氯化苄基二甲基十四烷基铵、溴化苄基十二烷基二甲基铵、氯化苄基十二烷基二甲基铵、氯化鲸蜡基吡啶鎓、胆碱对甲苯磺酸盐、溴化二甲基二(十八烷基)铵、溴化十二烷基乙基二甲基铵、氯化十二烷基三甲基铵、溴化乙基十六烷基二甲基铵、吉拉德试剂(Girard's reagent)、磷酸二氢十六烷基(2-羟乙基)二甲基铵、溴化十六烷基吡啶鎓、溴化十六烷基三甲基铵、氯化十六烷基三甲基铵、甲基苄索氯铵、1622、LuviquatTM、N,N',N'-聚氧乙烯(10)-N-动物脂-1,3-二氨基丙烷液体、奥芬溴铵、溴化四庚基铵、溴化四(癸基)铵、通佐溴铵、氯化三(十二烷基)铵、溴化三甲基十八烷基铵、四氟硼酸1-甲基-3-正辛基咪唑鎓、四氟硼酸1-癸基-3-甲基咪唑鎓、氯化1-癸基-3-甲基咪唑鎓、溴化三(十二烷基)甲基铵、氯化二甲基二硬脂铵、溴化鲸蜡基三甲铵、溴化肉豆蔻基三甲基铵和氯化六甲双铵)、阴离子表面活性剂(例如,十二烷基苯磺酸、十二烷基苯磺酸钠、十二烷基膦酸(DDPA)以及其组合)。
如本文中所使用,术语“钝化剂”是指减少低k层的化学侵蚀并且保护晶片免受额外氧化的化合物。硼酸为低k钝化剂的一个实例,但出于此目的已知其它羟基添加剂,例如3-羟基-2-萘甲酸、丙二酸、亚氨基二乙酸、五硼酸铵、脲、甲基三乙氧基硅烷和其混合物。
“大体上不含”在本文中某些实施例中定义为小于2wt.%、小于1wt.%、小于0.5wt.%或小于0.1wt.%。“不含”打算在某些实施例中对应于小于0.001wt.%以考虑环境污染并且在另一实施例中为0.0wt.%。
在一些实施例中,组合物大体上不含(a)腐蚀抑制剂;(b)蚀刻剂;和(c)钝化剂。在其它实施例中,组合物不含(a)腐蚀抑制剂;(b)蚀刻剂;和(c)钝化剂。
如下文实验部分中所展示,我们已发现某些化合物在络合氧化铈物质方面出人意料地有效。因此,在另一方面中,本发明提供一种用于络合二氧化铈的方法,所述方法包含在pH为约1到约6下掺合其与选自酒石酸、乙酰丙酮、谷氨酸、己二酸、IDA(亚氨基二乙酸)、甜菜碱、HEDP和次氮基三乙酸的氧化铈络合化合物。在其它实施例中,一种用于络合二氧化铈的方法包含在pH为约4到约6下掺合其与选自酒石酸、乙酰丙酮、谷氨酸、己二酸和次氮基三乙酸的氧化铈络合化合物。
如本文中所使用,“约”打算对应于所述值的+/-0.5%。
如本文中所使用,术语“缓冲剂”是指常见缓冲剂,例如磷酸盐(例如磷酸氢二铵、磷酸二氢铵、磷酸铵)和碳酸盐,例如碳酸氢钾和碳酸钾。如果存在,按所述组合物的总重量计,组合物包含约0.1wt%到约20wt%的缓冲物质。
如本文中所使用,用于从上面有氧化铈粒子和CMP污染物的微电子装置去除所述粒子和污染物的“适合性”对应于从微电子装置至少部分去除所述粒子/污染物。清洁功效由微电子装置上的物件的减少来评定。例如,可使用原子力显微镜来进行清洁前分析和清洁后分析。样品上的粒子可记录为像素范围。直方图(例如,Sigma Scan Pro)可应用于以特定强度(例如,231-235)过滤像素和计数粒子的数目。粒子减少可使用以下计算:
值得注意地,清洁功效的测定方法仅提供用于实例并且并不打算受限于所述实例。可替代地,清洁功效可视为由粒子物质所覆盖的总表面的百分比。例如,可对AFM进行编程以执行z平面扫描以识别在某一高度阈值以上所关注的表面形貌区域,随后计算由所关注的所述区域覆盖的总表面面积。所属领域的技术人员将容易理解,由清洗后所关注的所述区域覆盖的面积愈小,去除组合物愈有效。在某些实施例中,使用本文中所描述的组合物,从微电子装置去除至少75%的粒子/污染物,去除至少90%、至少95%或至少99%的粒子/污染物。
如下文更充分地描述,本文中所描述的组合物可以广泛多种特定调配物形式体现。
在所有此类组合物中,其中参考重量百分比范围(包括零下限)论述组合物的特定组分,应理解所述组分可存在或不存在于组合物的各种特定实施例中,并且在存在所述组分的实例中,以采用所述组分的组合物的总重量计,其可以低到0.00001重量百分比的浓度存在。
为了将pH调节到所需终点,可利用例如氢氧化胆碱的碱性化合物。
另外,组合物可按需要含有其它添加剂,例如表面活性剂。
如本文中所使用,术语“表面活性剂”是指降低两种液体之间或液体与固体之间表面张力(或界面张力)的有机化合物,其通常为含有疏水性基团(例如,烃(例如,烷基)“尾”)和亲水性基团的有机两亲媒性化合物。如果存在,用于本文中所描述的组合物中的表面活性剂包括但不限于两性盐、阳离子表面活性剂、阴离子表面活性剂、两性离子表面活性剂、非离子表面活性剂和其组合,包括但不限于癸基磷酸、十二烷基膦酸(DDPA)、十四烷基膦酸、十六烷基膦酸、双(2-乙基己基)磷酸盐、十八烷基膦酸、全氟庚酸、全氟癸酸、三氟甲磺酸、膦酰基乙酸、十二烷基苯磺酸(DDBSA)、其它R1苯磺酸或其盐(其中R1为直链或分支链C8-C18烷基)、十二烯基丁二酸、二(十八烷基)磷酸氢盐、十八烷基磷酸二氢盐、十二胺、十二烯基丁二酸单二乙醇酰胺、月桂酸、棕榈酸、油酸、桧酸、12羟基硬脂酸、十八烷基膦酸(ODPA)、十二烷基磷酸盐。所涵盖的非离子表面活性剂包括但不限于聚氧乙烯月桂基醚、十二烯基丁二酸单二乙醇酰胺、乙二胺四(乙氧基化物-嵌段-丙氧基化物)四醇、聚乙二醇、聚丙二醇、聚乙二醇或聚丙二醇醚、基于环氧乙烷和环氧丙烷的嵌段共聚物、聚氧丙烯蔗糖醚、三级辛基苯氧基聚乙氧基乙醇、10-乙氧基-9,9-二甲基癸-1-胺、分支链聚氧乙烯(9)壬基苯基醚、分支链聚氧乙烯(40)壬基苯基醚、二壬基苯基聚氧乙烯、壬基苯酚烷氧基化物、聚氧乙烯山梨糖醇六油酸酯、聚氧乙烯山梨糖醇四油酸酯、聚乙二醇脱水山梨糖醇单油酸酯、脱水山梨糖醇单油酸酯、醇烷氧基化物、烷基-聚葡萄糖苷、全氟丁酸乙酯、1,1,3,3,5,5-六甲基-1,5-双[2-(5-降冰片烯-2-基)乙基]三硅氧烷、单体十八烷基硅烷衍生物、经硅氧烷改性的聚硅氮烷、硅酮-聚醚共聚物和乙氧基化含氟表面活性剂。所涵盖的阳离子表面活性剂包括但不限于溴化鲸蜡基三甲铵(CTAB)、十七烷氟辛烷磺酸、四乙铵、氯化硬脂基三甲铵、溴化4-(4-二乙氨基苯基氮杂)-1-(4-硝基苄基)吡啶鎓、氯化十六烷基吡啶鎓单水合物、苯扎氯铵、苄索氯铵、氯化苄基二甲基十二烷基铵、氯化苄基二甲基十六烷基铵、溴化十六烷基三甲基铵、氯化二甲基二(十八烷基)铵、氯化十二烷基三甲基铵、对甲苯磺酸十六烷基三甲基铵、溴化二(十二烷基)二甲基铵、氯化二(氢化动物脂)二甲基铵、溴化四庚基铵、溴化四(癸基)铵和奥芬溴铵、盐酸胍(C(NH2)3Cl)或三氟甲磺酸盐(例如三氟甲磺酸四丁铵)、氯化二甲基二(十八烷基)铵、溴化二甲基二(十六烷基)铵、氯化二(氢化动物脂)二甲铵和乙基硫酸聚氧乙烯(16)动物脂乙基铵。所涵盖的阴离子表面活性剂包括但不限于聚(丙烯酸钠盐)、聚丙烯酸铵、聚氧乙烯月桂基醚钠、二己基磺基丁二酸钠、十二烷基硫酸钠、二辛基磺基丁二酸盐、2-磺基丁二酸盐、2,3-二巯基-1-丙磺酸盐、二环己基磺基丁二酸钠盐、7-乙基-2-甲基-4-十一烷基硫酸钠、磷酸盐含氟表面活性剂、含氟表面活性剂和聚丙烯酸酯。两性离子表面活性剂包括但不限于炔二醇或经改性的炔二醇、环氧乙烷烷基胺、N,N-二甲基十二烷胺N-氧化物、椰油胺丙酸钠、3-(N,N-二甲基肉豆蔻基铵基)丙磺酸盐和(3-(4-庚基)苯基-3-羟丙基)二甲铵基丙磺酸盐。
关于组成量,其它添加剂与组分(a)、(b)、(c)、(d)、(e)的重量百分比比率在一个实施例中在约0.001:1到约10:1范围内,并且在其它实施例中在约0.1:1到约5:1范围内。基于本文中所公开的pH值和所属领域的技术人员的知识,pH调节剂的量视制备去除组合物供使用时所寻求的最终pH而定。
组分的重量百分比比率范围将涵盖组合物的所有可能经浓缩或经稀释的实施例。为此,在一个实施例中,提供可经稀释以用作清洁溶液的经浓缩的去除组合物。浓缩组合物或“浓缩物”有利地准许用户(例如,CMP工艺工程师)在使用时将浓缩物稀释到所需浓度和pH。经浓缩的水性组合物的稀释可在约1:1到约49:1或约1:1到约100:1范围内,其中水性组合物在工具处或恰好在工具之前经溶剂(例如,去离子水)稀释。所属领域的技术人员应了解,在稀释之后,本文中所公开的组分的重量百分比比率的范围应保持不变。
就衬底而言,本发明的组合物被认为适用于清洁如本文中所阐述的低k介电材料。
在又另一实施例中,本文中所描述的组合物进一步包含氧化铈粒子和/或CMP污染物。氧化铈粒子和污染物在清洁已开始之后变为组合物的组分并且将溶解和/或悬浮于组合物中。
去除组合物是通过简单添加相应成分并且混合到均质状态容易地调配。此外,组合物可易于调配为单包装调配物或在使用时或使用前混合的多部分调配物,例如,多部分调配物的个别部分可在工具处或在工具上游的储槽中混合。各别成分的浓度可以组合物的特定倍数广泛变化,即更稀或更浓,并且应了解,本文中所描述的组合物可以各种方式并且可替代地包含符合本文中的公开内容的成分的任何组合、由其组成或基本上由其组成。
当应用于微电子制造操作时,本文中所描述的组合物有效地用于从微电子装置的表面清洁氧化铈粒子和/或CMP污染物(例如,CMP后残余物和污染物)。在某些实施例中,水性去除组合物去除至少85%、至少90%、至少95%或至少99%的在粒子去除之前存在于装置上的氧化铈粒子。
在CMP后粒子和污染物去除应用中,本文中所描述的水性去除组合物可与多种常规清洁工具(例如兆声波和刷洗涤)一起使用,所述工具包括但不限于Verteq单晶片兆声波Goldfinger、OnTrak***DDS(双侧洗涤器)、SEZ或其它单晶片喷雾冲洗、AppliedMaterials Mirra-MesaTM/ReflexionTM/Reflexion LKTM和兆声波分批湿台***。
在使用本文中所描述的组合物以从上面有氧化铈粒子和CMP污染物的微电子装置去除所述粒子和污染物时,通常在约20℃到约90℃或约20℃到约50℃范围内的温度下使水性去除组合物与装置接触约5秒到约10分钟、或约1秒到20分钟或约15秒到约5分钟的时间。此类接触时间和温度为说明性的,并且在所述方法的广泛实践内可采用有效地从装置至少部分去除氧化铈粒子和CMP污染物的任何其它适合的时间和温度条件。“至少部分清洁”与“大体上去除”在某些实施例中均对应于去除至少85%、至少90%、至少95%或至少99%的在粒子去除之前存在于装置上的氧化铈粒子。
在达成所需粒子去除作用之后,水性去除组合物可容易地从先前已施加有所述水性去除组合物的装置去除,正如在本文中所描述的组合物的给定最终用途应用中所需并且有效的。在一个实施例中,冲洗溶液包括去离子水。其后,可使用氮气或旋转干燥循环来干燥所述装置。
另一方面涉及根据本文中所描述的方法制得的改进微电子装置并且关于含有此类微电子装置的产品。
另一方面涉及一种经再循环水性去除组合物,其中所述去除组合物可经再循环直到如所属领域的技术人员容易地确定,粒子和/或污染物负载达到水性去除组合物可容纳的最大量为止。
又一方面涉及制造包含微电子装置的物品的方法,所述方法包含使微电子装置与水性去除组合物接触持续足以从上面有氧化铈粒子和CMP污染物的微电子装置去除所述粒子和污染物的时间和使用本文中所描述的去除组合物将所述微电子装置并入到所述物品中。
在另一方面中,提供一种从上面有氧化铈粒子和CMP污染物的微电子装置去除所述粒子和污染物的方法。因此在另一方面中,本发明提供一种用于从上面有氧化铈粒子和化学机械研磨污染物的微电子装置去除所述粒子和污染物的方法,所述方法包含:
(i)使所述微电子装置与本发明的所述组合物接触;和
(ii)用包含去离子水的水性溶液至少部分从所述微电子装置去除所述粒子和污染物。
本发明可通过其优选实施例的以下实例进一步说明,但应理解,除非另外具体指示,否则仅出于说明的目的包括此些实例并且不打算限制本发明的范围。
实验部分
将固定量的CeO2-浆料添加到各经稀释的组合物中。对于各组合物将混合物搅拌持续相同时间量。将其过滤并且从溶液分离固体残余物。溶液中溶解的氧化铈离子经由ICP-OES方法测量。
支持数据ICP-OES溶解度数据
实例 | 所添加的氧化铈% |
实例1 | 1.52 |
实例2 | 2.76 |
实例3 | 0.95 |
实例4 | 2.73 |
实例5 | 1.06 |
实例6 | 1.35 |
实例7 | 0.91 |
实例8 | 1.22 |
实例9 | 1.29 |
实例10 | 2.78 |
实例11 | 1.74 |
实例12 | 0.40 |
实例13 | 1.20 |
实例14 | 1.02 |
实例 | 所添加的氧化铈% |
实例15 | 1.22 |
实例16 | 2.75 |
实例17 | 1.13 |
实例18 | 3.09 |
。
Claims (20)
1.一种pH为约1到约6的组合物,其包含:
(a)铈-氧键断裂化合物;
(b)pH调节剂;
(c)至少一种清洁剂;
(d)选自酒石酸、乙酰丙酮、谷氨酸、己二酸、甜菜碱、次氮基三乙酸、亚氨基二乙酸(IDA)、依替膦酸(HEDP)和氨基三(亚甲基膦酸)的氧化铈络合化合物;和
(e)水。
2.根据权利要求1所述的组合物,其中铈-氧键断裂化合物选自亲核化合物、氧化剂和还原剂。
3.根据权利要求1所述的组合物,其中所述pH调节剂选自氢氧化胆碱、氢氧化钾、氢氧化铯、氢氧化四乙铵、氢氧化铵、硝酸、硫酸、氨基磺酸、乙醇酸、乳酸和甲磺酸。
4.根据权利要求1所述的组合物,其中所述氧化铈络合化合物为氨基三(亚甲基膦酸)。
5.根据权利要求1所述的组合物,其中所述氧化铈络合化合物为乙酰丙酮。
6.根据权利要求1所述的组合物,其中所述氧化铈络合化合物为亚氨基二乙酸。
7.根据权利要求1所述的组合物,其中所述氧化铈络合化合物为己二酸。
8.根据权利要求1所述的组合物,其中所述氧化铈络合化合物为依替膦酸。
9.根据权利要求1所述的组合物,其中所述氧化铈络合化合物为甜菜碱。
10.根据权利要求1所述的组合物,其中所述清洁剂选自水混溶性有机溶剂和聚合物。
11.根据权利要求1所述的组合物,其中所述清洁剂为柠檬酸。
12.根据权利要求1所述的组合物,其中所述pH为约1到约6。
13.一种用于络合氧化铈的方法,所述方法包含在pH为约4到约6下将其与选自酒石酸、乙酰丙酮、谷氨酸、己二酸、甜菜碱、次氮基三乙酸、亚氨基二乙酸(IDA)、依替膦酸(HEDP)和氨基三(亚甲基膦酸)的氧化铈络合化合物掺合。
14.根据权利要求13所述的方法,其中所述氧化铈络合化合物为氨基三(亚甲基膦酸)。
15.根据权利要求13所述的方法,其中所述氧化铈络合化合物为乙酰丙酮。
16.根据权利要求13所述的方法,其中所述氧化铈络合化合物为亚氨基二乙酸。
17.根据权利要求13所述的方法,其中所述氧化铈络合化合物为己二酸。
18.根据权利要求13所述的方法,其中所述氧化铈络合化合物为依替膦酸。
19.根据权利要求13所述的方法,其中所述氧化铈络合化合物为氮基三乙酸。
20.根据权利要求13所述的方法,其中所述氧化铈络合化合物为甜菜碱。
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101146901A (zh) * | 2005-01-27 | 2008-03-19 | 高级技术材料公司 | 用于半导体基片处理的组合物 |
CN104508072A (zh) * | 2012-02-15 | 2015-04-08 | 安格斯公司 | 用于cmp后去除的组合物及使用方法 |
CN110234719A (zh) * | 2017-01-18 | 2019-09-13 | 恩特格里斯公司 | 用于从表面去除氧化铈粒子的组合物和方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5972124A (en) * | 1998-08-31 | 1999-10-26 | Advanced Micro Devices, Inc. | Method for cleaning a surface of a dielectric material |
US6326305B1 (en) * | 2000-12-05 | 2001-12-04 | Advanced Micro Devices, Inc. | Ceria removal in chemical-mechanical polishing of integrated circuits |
US7314578B2 (en) | 2003-12-12 | 2008-01-01 | Samsung Electronics Co., Ltd. | Slurry compositions and CMP methods using the same |
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US20090133716A1 (en) * | 2007-10-29 | 2009-05-28 | Wai Mun Lee | Methods of post chemical mechanical polishing and wafer cleaning using amidoxime compositions |
CN104781204A (zh) * | 2012-11-22 | 2015-07-15 | 旭硝子株式会社 | 玻璃基板的清洗方法 |
US20160122696A1 (en) * | 2013-05-17 | 2016-05-05 | Advanced Technology Materials, Inc. | Compositions and methods for removing ceria particles from a surface |
TWI726859B (zh) * | 2015-01-05 | 2021-05-11 | 美商恩特葛瑞斯股份有限公司 | 後化學機械拋光配方及使用之方法 |
JP6645136B2 (ja) | 2015-11-20 | 2020-02-12 | 日立化成株式会社 | 半導体基板の製造方法及び洗浄液 |
JP6594201B2 (ja) * | 2015-12-28 | 2019-10-23 | 花王株式会社 | 半導体デバイス用基板用の酸性洗浄剤組成物 |
JP6847657B2 (ja) | 2016-12-28 | 2021-03-24 | 花王株式会社 | 半導体デバイス用基板用の洗浄剤組成物 |
WO2018180256A1 (ja) * | 2017-03-31 | 2018-10-04 | 関東化學株式会社 | 洗浄液組成物 |
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