CN113376893A - Semi-reflecting and semi-transmitting structure with hidden display effect and preparation and application thereof - Google Patents
Semi-reflecting and semi-transmitting structure with hidden display effect and preparation and application thereof Download PDFInfo
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- CN113376893A CN113376893A CN202110518936.3A CN202110518936A CN113376893A CN 113376893 A CN113376893 A CN 113376893A CN 202110518936 A CN202110518936 A CN 202110518936A CN 113376893 A CN113376893 A CN 113376893A
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- 230000000694 effects Effects 0.000 title claims abstract description 21
- 238000002360 preparation method Methods 0.000 title abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims abstract description 24
- 230000003287 optical effect Effects 0.000 claims abstract description 12
- 239000004568 cement Substances 0.000 claims abstract description 11
- 239000011521 glass Substances 0.000 claims description 21
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 10
- 229910052681 coesite Inorganic materials 0.000 claims description 9
- 229910052906 cristobalite Inorganic materials 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052682 stishovite Inorganic materials 0.000 claims description 9
- 229910052905 tridymite Inorganic materials 0.000 claims description 9
- 238000010030 laminating Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 238000002310 reflectometry Methods 0.000 description 17
- 238000012360 testing method Methods 0.000 description 5
- 239000005361 soda-lime glass Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- WSNMPAVSZJSIMT-UHFFFAOYSA-N COc1c(C)c2COC(=O)c2c(O)c1CC(O)C1(C)CCC(=O)O1 Chemical compound COc1c(C)c2COC(=O)c2c(O)c1CC(O)C1(C)CCC(=O)O1 WSNMPAVSZJSIMT-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
- G02F1/133555—Transflectors
- G02F1/133557—Half-mirrors
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Optical Filters (AREA)
Abstract
The invention provides a semi-reflecting and semi-transmitting structure with a display hiding effect, and preparation and application thereof, wherein the structure comprises a substrate layer, a semi-reflecting and semi-transmitting film layer and a display layer which are sequentially stacked, a display area formed by optical cement and a reflection area formed by reflection ink are arranged in the display layer, and the display area is used for being connected with a display device; the semi-reflecting and semi-permeable film layer at least comprises a group of high-refractive-index layers and low-refractive-index layers which are stacked; the high refractive index layer is in direct contact with the substrate, and the low refractive index layer is in direct contact with the display layer; wherein the high refractive index layer is made of Si material.
Description
Technical Field
The present invention relates to the field of display device technology; more particularly, to a transflective structure with a hidden display effect, and a preparation and an application thereof.
Background
The semi-reflecting and semi-transparent intelligent mirror in the current market is divided into two structures, namely: as shown in fig. 1, the transflective film layer is arranged on the inner surface of the substrate; the second structure is a semi-reflecting and semi-permeable film layer on the outer surface of the substrate, as shown in fig. 2.
By adopting the reflector with the first structure, the test result is safe and reliable in severe environment and can pass the national automobile 3C certification, but the conventional semi-reflective and semi-transparent film layer can not be matched with the optical adhesive and the printing ink at the same time. When the display is closed, the reflectivity of the display area is 2% -5% higher than that of the reflection area, the display area is brighter, and the color of the whole mirror is inconsistent and is not attractive.
The structure II is as follows: the testing result of the reflector in severe environment does not reach the standard, the film layer is easy to fall off and can not pass the national automobile 3C certification, but the substrate (glass, PET), the optical cement and the printing ink have good matching performance. When the display is closed, the difference between the reflectivity of the display area and the reflectivity of the reflection area is within 1 percent, and the color of the whole mirror is consistent and beautiful.
CN106353914A discloses a semi-reflecting and semi-permeable display panel and a display device, the structure of which is H/L/H/L, the high-folding material adopts Nb2O5Or TiO2The low-refractive index material is SiO2The first structure is adopted, the film layer is arranged on the inner surface of the substrate, but the structure of the film layer can not be matched with the optical cement and the printing ink at the same time, the reflectivity of the display area is greatly different from that of the reflection area when the display is closed, and the color of the whole mirror is inconsistent.
Disclosure of Invention
The invention provides a semi-reflecting and semi-transmitting structure with a display hiding effect and preparation and application thereof.
The technical scheme is that the semi-reflecting and semi-transmitting structure with the effect of hiding the display comprises a substrate layer, a semi-reflecting and semi-transmitting film layer and a display layer which are sequentially stacked, wherein the display layerThe display device is provided with a display area formed by optical cement and a reflection area formed by reflection ink, wherein the display area is used for being connected with a display device; the semi-reflecting and semi-permeable film layer at least comprises a group of high-refractive-index layers and low-refractive-index layers which are stacked; the high refractive index layer is in direct contact with the substrate, and the low refractive index layer is in direct contact with the display layer; wherein the high refractive index layer is made of Si material, and the low refractive index layer is made of SiO2And (3) material quality.
Further, the refractive index of the high refractive index layer is 3-4.5.
Further, the refractive index of the low refractive index layer is 1.35-1.65.
Further, the semi-reflecting and semi-permeable membrane layer is provided with a group of high refractive index layers and low refractive index layers which are arranged in a stacked mode, wherein the thickness of the high refractive index layers is 15-40nm, and the thickness of the low refractive index layers is 40-80 nm.
Further, the substrate layer is made of glass or PET material.
The invention also relates to a method for preparing the semi-reflecting and semi-transmitting structure with the effect of hiding the display, which comprises the following specific steps:
s1, cleaning the glass substrate;
and S2, sequentially laminating a first high-refractive-index layer and a first low-refractive-index layer on the glass substrate in a magnetron sputtering mode.
And S3, connecting the substrate obtained in the S2 with a display device and a display layer. And obtaining the semi-reflecting and semi-transmitting structure with the effect of hiding the display.
Further, during magnetron sputtering, a horizontal coating process is adopted for magnetron sputtering coating, and the magnetron sputtering power is 15 KW-75 KW; the dynamic deposition rate of magnetron sputtering is 1.2nm (m/min)/KW-4.5 nm (m/min)/KW.
The invention also relates to a display device comprising the transflective structure with the effect of hiding the display.
The invention also relates to application of the semi-reflecting and semi-transmitting structure with the effect of hiding the display in a semi-reflecting and semi-transmitting intelligent mirror and an automobile rearview mirror.
The invention has the following beneficial effects:
the invention adopts Si material in the high refractive index layer, which is an absorption type material, and the Si material is mixed with low-refractive-index SiO2In combination, the reflection rate of the reflection area and the display area is reduced by a similar range. The reflectivity of the semi-reflecting and semi-permeable structure measured from the air surface (non-film layer) of the substrate is 43-50%. The reflectivity of the reflecting area is reduced by 1 to 2 percent; the display area is a substrate/H/L optical cement/display, and the reflectivity is reduced by 1-2%. substrate/Si/SiO of the invention2The equivalent refractive index of the structure is closer to that of the ink and the optical cement/display, the reflectivity is not greatly changed after the structure is attached, the change degree is close, and the reflection area and the display area have no chromatic aberration.
Drawings
Fig. 1 is a schematic structural diagram of a structure one in the background art.
Fig. 2 is a schematic structural diagram of a structure two in the background art.
Detailed Description
Embodiments of the present invention will be described in detail below with reference to examples, but those skilled in the art will appreciate that the following examples are only illustrative of the present invention and should not be construed as limiting the scope of the present invention.
Example 1:
a semi-reflecting and semi-transmitting structure with a display hiding effect comprises a substrate layer, a semi-reflecting and semi-transmitting film layer and a display layer which are sequentially stacked, wherein a display area formed by optical cement and a reflection area formed by reflection ink are arranged in the display layer, and the display area is used for being connected with a display device; the semi-reflecting and semi-permeable film layer is a group of high-refractive-index layers and low-refractive-index layers which are stacked; the high refractive index layer is in direct contact with the substrate, and the low refractive index layer is in direct contact with the display layer; wherein the high refractive index layer is made of Si material, the thickness is 20.29nm, and the refractive index is 3.98; the low refractive index layer is SiO2The material has the thickness of 57.66nm and the refractive index of 1.46.
The preparation method comprises the following steps:
s1, cleaning the glass substrate;
and S2, sequentially laminating a first high-refractive-index layer and a first low-refractive-index layer on the glass substrate in a magnetron sputtering mode. And during sputtering control, performing magnetron sputtering coating by adopting a horizontal coating process.
The material of the glass substrate of example 1 was soda lime glass and the thickness was 1.1 mm.
After the semi-reflective and semi-transparent glass in example 1 was bonded to the ink, the display was measured using a CM-700D spectrocolorimeter, kornia zenda, japan, and the results are shown in table 1 below.
TABLE 1
| Bonding method | Type of measurement | L*(D65) | a*(D65) | b*(D65) | Reflectance @550nm |
| Semi-reflective and semi-transparent cover plate OCR + LCM display screen | Reflectivity of light | 69.21 | -3.32 | -3.54 | 40.58 |
| Semi-reflecting and semi-permeable cover plate and printing ink | Reflectivity of light | 69.86 | -3.32 | -3.03 | 41.03 |
After the bonding, the difference between the reflectivity of the display area and the reflectivity of the printing ink area is small, and the integration effect is excellent.
Example 2:
a semi-reflecting and semi-transmitting structure with a display hiding effect comprises a substrate layer, a semi-reflecting and semi-transmitting film layer and a display layer which are sequentially stacked, wherein a display area formed by optical cement and a reflection area formed by reflection ink are arranged in the display layer, and the display area is used for being connected with a display device; the semi-reflecting and semi-permeable film layer is a group of high-refractive-index layers and low-refractive-index layers which are stacked; the high refractive index layer is in direct contact with the substrate, and the low refractive index layer is in direct contact with the display layer; wherein the high refractive index layer is made of Si material, the thickness is 16.24nm, and the refractive index is 3.98; the low refractive index layer is SiO2The material has the thickness of 59.89nm and the refractive index of 1.46.
The preparation method comprises the following steps:
s1, cleaning the glass substrate;
and S2, sequentially laminating a first high-refractive-index layer and a first low-refractive-index layer on the glass substrate in a magnetron sputtering mode. And during sputtering control, performing magnetron sputtering coating by adopting a horizontal coating process.
And S3, connecting the substrate obtained in the S2 with a display device and a display layer. And obtaining the semi-reflecting and semi-transmitting structure with the effect of hiding the display.
Wherein, the glass substrate is made of soda-lime glass and has a thickness of 1.1 mm.
After the display screen and the ink are attached to the semi-reflective and semi-transparent glass in the embodiment 2, the results of the test by using a Nikonicam Minneta CM-700D spectrocolorimeter are shown in the following table 2.
TABLE 2
| Bonding method | Type of measurement | L*(D65) | a*(D65) | b*(D65) | Reflectance @550nm |
| Semi-reflective and semi-transparent cover plate OCR + LCM display screen | Reflectivity of light | 71.33 | -3.82 | -3.04 | 41.58 |
| Semi-reflecting and semi-permeable cover plate and printing ink | Reflectivity of light | 68.52 | -3.95 | -3.43 | 39.23 |
Example 3:
a semi-reflecting and semi-transmitting structure with a display hiding effect comprises a substrate layer, a semi-reflecting and semi-transmitting film layer and a display layer which are sequentially stacked, wherein a display area formed by optical cement and a reflection area formed by reflection ink are arranged in the display layer, and the display area is used for being connected with a display device; the semi-reflecting and semi-permeable film layer is a group of high-refractive-index layers and low-refractive-index layers which are stacked; a high refractive index layer in direct contact with the substrate, a low refractive index layer and a display layerDirect contact; wherein the high refractive index layer is made of Si material and has a thickness of24.33nm, refractive index of3.98(ii) a The low refractive index layer is SiO2Material of thickness of55.42nm, refractive index of1.46。
The preparation method comprises the following steps:
s1, cleaning the glass substrate;
and S2, sequentially laminating a first high-refractive-index layer and a first low-refractive-index layer on the glass substrate in a magnetron sputtering mode. And during sputtering control, performing magnetron sputtering coating by adopting a horizontal coating process.
And S3, connecting the substrate obtained in the S2 with a display device and a display layer. And obtaining the semi-reflecting and semi-transmitting structure with the effect of hiding the display.
Wherein, the glass substrate is made of soda-lime glass and has a thickness of 1.1 mm.
After the display screen and the ink are attached to the semi-reflective and semi-transparent glass in the embodiment 3, the results of the test by using a Nikonicam Minneta CM-700D spectrocolorimeter are shown in the following table 3.
TABLE 3
| Bonding method | Type of measurement | L*(D65) | a*(D65) | b*(D65) | Reflectance @550nm |
| Semi-reflective and semi-transparent cover plate OCR + LCM display screen | Reflectivity of light | 69.1 | -3.01 | -3.93 | 40.53 |
| Semi-reflecting and semi-permeable cover plate and printing ink | Reflectivity of light | 73.03 | -2.82 | -2.44 | 42.68 |
Comparative example 1:
a semi-reflecting and semi-transmitting structure comprises a substrate layer, a semi-reflecting and semi-transmitting film layer and a display layer which are sequentially stacked, wherein a display area formed by optical cement and a reflection area formed by reflection ink are arranged in the display layer, and the display area is used for being connected with a display device; the semi-reflecting and semi-permeable film layer comprises a first high refractive index layer, a first low refractive index layer, a second high refractive index layer and a second low refractive index layer which are sequentially stacked; the first high refractive index layer is in direct contact with the substrate, and the second low refractive index layer is in direct contact with the display layer.
Wherein the first high refractive index layer is Nb2O5The material has the thickness of 105nm and the refractive index of 2.3; the first low refractive index layer is SiO2The material has the thickness of 98nm and the refractive index of 1.46; wherein the second high refractive index layer is Nb2O5The material is 47nm thick; the second low refractive index layer is SiO2The material thickness is 10 nm.
The material of the glass substrate of comparative example 1 was soda lime glass with a thickness of 1.1 mm.
After the semi-reflective and semi-transparent glass of comparative example 1 was bonded to the display screen and the ink, the results of the test were obtained by using a CM-700D spectrocolorimeter, kornia mebenda, japan, and are shown in table 4 below.
TABLE 4
After the laminating, the reflectivity of the display area is about 4 percent higher than that of the ink area, and the color difference is obvious.
Claims (9)
1. A semi-reflecting and semi-transmitting structure with a display hiding effect is characterized by comprising a substrate layer, a semi-reflecting and semi-transmitting film layer and a display layer which are sequentially stacked, wherein a display area formed by optical cement and a reflection area formed by reflection ink are arranged in the display layer, and the display area is used for being connected with a display device; the semi-reflecting and semi-permeable film layer at least comprises a group of high-refractive-index layers and low-refractive-index layers which are stacked; the high refractive index layer is in direct contact with the substrate, and the low refractive index layer is in direct contact with the display layer; wherein the high refractive index layer is made of Si material, and the low refractive index layer is made of SiO2And (3) material quality.
2. The transflective structure according to claim 1, wherein: the refractive index of the high refractive index layer is 3-4.5.
3. The transflective structure according to claim 1, wherein: the refractive index of the low refractive index layer is 1.35-1.65.
4. The transflective structure according to claim 1, wherein: the semi-reflecting and semi-permeable film layer is a group of high refractive index layers and low refractive index layers which are stacked, wherein the thickness of the high refractive index layers is 15-40nm, and the thickness of the low refractive index layers is 40-80 nm.
5. The transflective structure according to claim 1, wherein: the substrate layer is made of glass or PET material.
6. The method for preparing the semi-reflecting and semi-transmitting structure with the effect of hiding the display as claimed in any one of claims 1 to 5 is characterized by comprising the following specific steps:
s1, cleaning the glass substrate;
s2, sequentially laminating a first high-refractive-index layer and a first low-refractive-index layer on the glass substrate in a magnetron sputtering mode;
s3, connecting the substrate obtained in the S2 with a display device and a display layer;
and obtaining the semi-reflecting and semi-transmitting structure with the effect of hiding the display.
7. The method of claim 6, wherein: during magnetron sputtering, a horizontal coating process is adopted for magnetron sputtering coating, and the magnetron sputtering power is 15 KW-75 KW; the dynamic deposition rate of magnetron sputtering is 1.2nm (m/min)/KW-4.5 nm (m/min)/KW.
8. A display device comprising the transflective structure with a hidden display effect according to any one of claims 1 to 5.
9. The application of the transflective structure with the effect of hiding the display according to any one of claims 1 to 5 in a transflective smart mirror and an automobile rearview mirror.
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|---|---|---|---|---|
| CN1297163A (en) * | 1999-11-17 | 2001-05-30 | 日本板硝子株式会社 | Base board for liquid crystal display element |
| JP2004098420A (en) * | 2002-09-09 | 2004-04-02 | Dainippon Printing Co Ltd | Transparent laminated film, polarizing plate, liquid crystal display element and crystal display device |
| CN104163022A (en) * | 2014-08-07 | 2014-11-26 | 宜昌南玻显示器件有限公司 | Semi reflective and semi transparent glass and preparation method thereof |
| CN106353914A (en) * | 2016-10-18 | 2017-01-25 | 宜昌南玻显示器件有限公司 | Semi-reflective and semitransparent display panel and display device |
| CN107615100A (en) * | 2015-05-12 | 2018-01-19 | 旭硝子株式会社 | Matrix with low-reflection film |
| US20180136367A1 (en) * | 2016-11-11 | 2018-05-17 | Asahi Glass Company, Limited | Substrate with low-reflection property and manufacturing method thereof |
| CN112437176A (en) * | 2020-11-13 | 2021-03-02 | 惠州市德赛西威汽车电子股份有限公司 | Structure and method for optimizing touch screen integral black |
| CN112666788A (en) * | 2019-09-30 | 2021-04-16 | Hoya株式会社 | Substrate with multilayer reflective film, reflective mask blank, reflective mask and manufacturing method, and semiconductor device manufacturing method |
-
2021
- 2021-05-12 CN CN202110518936.3A patent/CN113376893A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1297163A (en) * | 1999-11-17 | 2001-05-30 | 日本板硝子株式会社 | Base board for liquid crystal display element |
| JP2004098420A (en) * | 2002-09-09 | 2004-04-02 | Dainippon Printing Co Ltd | Transparent laminated film, polarizing plate, liquid crystal display element and crystal display device |
| CN104163022A (en) * | 2014-08-07 | 2014-11-26 | 宜昌南玻显示器件有限公司 | Semi reflective and semi transparent glass and preparation method thereof |
| CN107615100A (en) * | 2015-05-12 | 2018-01-19 | 旭硝子株式会社 | Matrix with low-reflection film |
| CN106353914A (en) * | 2016-10-18 | 2017-01-25 | 宜昌南玻显示器件有限公司 | Semi-reflective and semitransparent display panel and display device |
| US20180136367A1 (en) * | 2016-11-11 | 2018-05-17 | Asahi Glass Company, Limited | Substrate with low-reflection property and manufacturing method thereof |
| CN112666788A (en) * | 2019-09-30 | 2021-04-16 | Hoya株式会社 | Substrate with multilayer reflective film, reflective mask blank, reflective mask and manufacturing method, and semiconductor device manufacturing method |
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Application publication date: 20210910 |