CN113275121A - High-purity quartz sand manufacturing system and manufacturing method - Google Patents
High-purity quartz sand manufacturing system and manufacturing method Download PDFInfo
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- CN113275121A CN113275121A CN202110658499.5A CN202110658499A CN113275121A CN 113275121 A CN113275121 A CN 113275121A CN 202110658499 A CN202110658499 A CN 202110658499A CN 113275121 A CN113275121 A CN 113275121A
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 299
- 239000006004 Quartz sand Substances 0.000 title claims abstract description 44
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 41
- 238000012216 screening Methods 0.000 claims abstract description 48
- 238000004140 cleaning Methods 0.000 claims abstract description 29
- 239000010453 quartz Substances 0.000 claims abstract description 27
- 239000002245 particle Substances 0.000 claims abstract description 23
- 239000012535 impurity Substances 0.000 claims abstract description 22
- 238000000909 electrodialysis Methods 0.000 claims abstract description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 76
- 235000012239 silicon dioxide Nutrition 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 20
- 239000003960 organic solvent Substances 0.000 claims description 20
- 239000013612 plasmid Substances 0.000 claims description 18
- 238000012545 processing Methods 0.000 claims description 18
- 238000000926 separation method Methods 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 14
- 238000000746 purification Methods 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 238000013467 fragmentation Methods 0.000 claims description 7
- 238000006062 fragmentation reaction Methods 0.000 claims description 7
- 239000012528 membrane Substances 0.000 claims description 7
- 238000012544 monitoring process Methods 0.000 claims description 7
- 239000004576 sand Substances 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 4
- 239000011022 opal Substances 0.000 claims description 2
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052796 boron Inorganic materials 0.000 abstract description 7
- 229910052698 phosphorus Inorganic materials 0.000 abstract description 7
- 239000011574 phosphorus Substances 0.000 abstract description 7
- 238000010298 pulverizing process Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 238000007873 sieving Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- KEQXNNJHMWSZHK-UHFFFAOYSA-L 1,3,2,4$l^{2}-dioxathiaplumbetane 2,2-dioxide Chemical compound [Pb+2].[O-]S([O-])(=O)=O KEQXNNJHMWSZHK-UHFFFAOYSA-L 0.000 description 4
- -1 hydrogen ions Chemical class 0.000 description 4
- 210000003000 inclusion body Anatomy 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 150000001735 carboxylic acids Chemical group 0.000 description 3
- 230000004308 accommodation Effects 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- 241001313855 Bletilla Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005188 flotation Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000007885 magnetic separation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000004204 optical analysis method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03B—SEPARATING SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS
- B03B9/00—General arrangement of separating plant, e.g. flow sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C7/00—Separating solids from solids by electrostatic effect
- B03C7/02—Separators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B07—SEPARATING SOLIDS FROM SOLIDS; SORTING
- B07C—POSTAL SORTING; SORTING INDIVIDUAL ARTICLES, OR BULK MATERIAL FIT TO BE SORTED PIECE-MEAL, e.g. BY PICKING
- B07C5/00—Sorting according to a characteristic or feature of the articles or material being sorted, e.g. by control effected by devices which detect or measure such characteristic or feature; Sorting by manually actuated devices, e.g. switches
- B07C5/34—Sorting according to other particular properties
- B07C5/342—Sorting according to other particular properties according to optical properties, e.g. colour
- B07C5/3422—Sorting according to other particular properties according to optical properties, e.g. colour using video scanning devices, e.g. TV-cameras
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B07—SEPARATING SOLIDS FROM SOLIDS; SORTING
- B07C—POSTAL SORTING; SORTING INDIVIDUAL ARTICLES, OR BULK MATERIAL FIT TO BE SORTED PIECE-MEAL, e.g. BY PICKING
- B07C5/00—Sorting according to a characteristic or feature of the articles or material being sorted, e.g. by control effected by devices which detect or measure such characteristic or feature; Sorting by manually actuated devices, e.g. switches
- B07C5/34—Sorting according to other particular properties
- B07C5/342—Sorting according to other particular properties according to optical properties, e.g. colour
- B07C5/3425—Sorting according to other particular properties according to optical properties, e.g. colour of granular material, e.g. ore particles, grain
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Silicon Compounds (AREA)
Abstract
The invention discloses a high-purity quartz sand manufacturing system and a manufacturing method. The high-purity quartz sand manufacturing system comprises a crushing device for receiving raw quartz ore and crushing the raw quartz ore into impure particles and silica particles, a screening device for receiving the impure particles and the silica particles and separating the impure particles and the silica particles in a color screening mode, and a purifying device for receiving primary-selected silica particles and purifying the primary-selected silica particles in a cleaning solution through an ultrasonic and electrodialysis mode, wherein the impurity particles in the raw quartz ore can be completely eliminated, the phosphorus and boron content in the silica particles can be controlled to be less than 1ppm, and the purity of the required silica particles is greatly improved.
Description
Technical Field
The invention relates to the technical field related to silicon purification, in particular to a manufacturing system and a manufacturing method for high-purity quartz sand with high purity and low phosphorus or boron content.
Background
The quartz sand is an essential important raw material in the process of refining high-purity silicon crystal, and in the production process, in order to obtain quartz sand with a proper specification, the quartz raw material needs to be firstly crushed into powder quartz sand for later use through a crushing process.
However, the silicon dioxide with a purity of about 99.5% can be obtained in the pulverization process, and the content of impurities in the silica sand is still relatively high, and the impurities are difficult to remove in the subsequent process, which may cause deep contamination of the process and decrease the purity of the produced silicon crystal product.
The high-purity quartz sand is generally SiO2Quartz micropowder with content higher than 99.9%. The purification of the quartz sand mainly removes a small amount or trace impurities in the quartz sand to obtain the high-purity quartz sand. In the prior art, the impurity ore phase, surface element impurities and the like of the quartz sand raw material are removed by adopting physical and chemical means such as conventional scrubbing, magnetic separation, flotation, acid leaching and the like, so that the quartz sand with certain purity is obtained. However, impurities in the silica particles obtained by the above method still remain.
Because a large amount of inclusion bodies containing impurities exist in the quartz ore, the diameter of the inclusion bodies is about micron, a part of the inclusion bodies are opened in the grinding and crushing process, but the inclusion bodies in the silicon dioxide powder body still exist completely. One of the keys in producing high-purity quartz sand is to solve the problem that the quartz stone contains a large amount of gas-liquid inclusions.
Therefore, there is a need in the art for a system and a method for manufacturing high-purity quartz sand, which has a simple structure, is safe and reliable, and has an excellent purification effect, and provides guarantee for the production of high-purity silicon crystals.
In view of this, the invention is particularly proposed.
Disclosure of Invention
The invention aims to provide a high-purity quartz sand manufacturing system and a manufacturing method thereof, which can completely remove impurity grains in original quartz ore, can control the content of phosphorus and boron in silica grains to be less than 1ppm, greatly improves the purity of required silica grains and provides guarantee for the production of high-purity silicon crystals.
The invention is realized by the following steps:
the invention provides a high-purity quartz sand manufacturing system, which comprises:
a fragmentation device for receiving raw quartz ore and fragmenting the raw quartz ore into heteroplasmids and silica particles;
a screening device for receiving the heteroplasmid particles and the silica particles, the screening device separating the heteroplasmid particles and the silica particles in a color screening manner and grading the silica particles by the color screening manner to obtain primarily selected silica particles;
and the purification device is used for receiving the primarily selected silica particles and purifying the primarily selected silica particles in an ultrasonic and electrodialysis mode to obtain the required silica particles and obtain the high-purity quartz sand.
In one of the preferred scheme, sieving mechanism includes base, conveyer way and discerns the module, the base has the accommodation space, the conveyer way erects in the accommodation space, the conveyer way has input port, separation mouth and delivery outlet, input port and delivery outlet are located respectively the both ends of conveyer way, the separation mouth is seted up in between input port and the delivery outlet, it locates to discern the module the separation mouth both sides, miscellaneous plasmid reaches the silica grain by the input port gets into the conveyer way, it passes through the colour screening mode to discern the module, will the silica grain of primary election by the separation mouth is exported, will miscellaneous plasmid and surplus silica grain by the delivery outlet is exported.
In one preferred embodiment, the identification module has a photographing unit, a processing unit and a separating unit coupled to each other, the photographing unit can photograph images of the impurity particles and the silica particles passing through the separating port and generate a monitoring image, the processing unit receives and analyzes the monitoring image, and when the processing unit determines that the silica particles belong to primary silica particles, the processing unit generates a separating signal, and the separating unit receives the separating signal and outputs the primary silica particles from the separating port.
In one preferable scheme, the cleaning liquid is formed by mixing water and an organic solvent, wherein the organic solvent is a carboxylic acid organic solvent containing carboxylate radicals; in the cleaning liquid, the weight percentage of water is 90-99%, and the weight percentage of organic solvent is 0.1-10%.
In one of them preferred scheme, purifier includes washing tank, electrode module and ultrasonic wave module, the washing tank is used for installing the washing liquid, the electrode module with the ultrasonic wave module set up in the washing tank, be equipped with the pellicle in the washing tank, the electrode module has the positive negative electrode of locating the pellicle both sides respectively.
The invention also provides a method for manufacturing the high-purity quartz sand, which adopts the high-purity quartz sand manufacturing system and comprises the following steps:
a smashing step: receiving raw quartz ore by a fragmentation device, fragmenting the raw quartz ore into heteroplasmids and silica particles;
a screening step: receiving the impure plasmids and the silica grains generated in the crushing step by a screening device, separating the impure plasmids and the silica grains by a color screening mode, and grading the silica grains by the color screening mode to obtain primary silica grains, wherein the silicon dioxide content of the primary silica grains is more than 99%;
a purification step: and receiving the primarily selected silica particles obtained in the screening step through a purifying device, and purifying the primarily selected silica particles in a cleaning solution in an ultrasonic and electrodialysis mode to obtain the silica particles so as to obtain the high-purity quartz sand.
In the screening step, the screening device can further divide the silica grains after removing the impurity plasmids into opal and bletilla transparent silica grains in a color screening mode.
In one preferable scheme, the cleaning liquid is formed by mixing water and an organic solvent, wherein the organic solvent is a carboxylic acid organic solvent containing carboxylate radicals; in the cleaning liquid, the weight percentage of water is 90-99%, and the weight percentage of organic solvent is 0.1-10%.
The invention has the following beneficial effects:
the high-purity quartz sand manufacturing system comprises a smashing device, a screening device and a purifying device, wherein the smashing device is used for receiving original quartz ore and smashing the original quartz ore into heteroplasmids and silica particles, the screening device is used for receiving the heteroplasmids and the silica particles, separating the heteroplasmids and the silica particles in a color screening mode, grading the silica particles in the color screening mode to obtain primary-selected silica particles, and the purifying device is used for receiving the primary-selected silica particles and purifying the primary-selected silica particles in a cleaning solution in an ultrasonic and electrodialysis mode to obtain required silica particles; the manufacturing system can completely remove impurity grains in the original quartz ore, can control the content of phosphorus and boron in the silica grains to be below 1ppm, greatly improves the purity of the required silica grains and obtains high-purity quartz sand. According to the method for manufacturing the high-purity quartz sand, the high-purity quartz sand manufacturing system is adopted, so that impurity grains in original quartz ore can be completely removed, the content of phosphorus and boron in silica grains can be controlled to be below 1ppm, the purity of the required silica grains is greatly improved, and the high-purity quartz sand is obtained.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
FIG. 1 is a schematic view of a high purity quartz sand production system of the present invention;
FIG. 2 is a schematic perspective view of a screening apparatus in the high purity quartz sand manufacturing system according to the present invention;
FIG. 3 is a schematic side view of a screening apparatus in the high purity quartz sand production system of the present invention;
FIG. 4 is a schematic view showing the operation of a screening apparatus in the high purity quartz sand producing system according to the present invention;
FIG. 5 is a schematic view showing a purification apparatus in the high purity quartz sand production system according to the present invention;
FIG. 6 is a flow chart of the method for manufacturing high-purity quartz sand according to the present invention.
In the drawings, 10: a fragmenting device; 20: a screening device; 21: an accommodating space; 22: a conveying path; 221; an input port; 222: a separation port; 223: an output port; 23: an identification module; 231: a photographing unit; 232: a processing unit; 233: a separation unit; 24: a first holding tank; 25: a second holding tank; 30: a cleaning tank; 311: a semi-permeable membrane; 312: an accommodating area; 32: an electrode module; 321: positive and negative electrodes; 33: an ultrasonic module; h: a hybrid plasmid; g: silica particles; p: primarily selecting silica particles; s1: a step of fragmentation; s2: a screening step; s3: and (5) a purification step.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. The examples, in which specific conditions are not specified, were conducted under conventional conditions or conditions recommended by the manufacturer. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products available commercially.
Referring to fig. 1 to 5, the present invention first provides a high purity silica sand manufacturing system, which includes a crushing device 10, a screening device 20 and a purifying device 30.
A crushing device 10 for receiving the raw quartz ore, the crushing device 10 being capable of crushing the raw quartz ore along its cracks into impurity grains H and silica grains G of approximately equal size; in the embodiment, the pulverizing device 10 is a clean grinding tool, the pulverizing device 10 can perform pollution-free pulverization, the pulverizing device 10 does not generate pollution problem of powder scattering during the pulverizing process of the original quartz ore, so that the effects of environmental protection and cleanliness maintenance can be achieved, and the pulverizing device 10 can precisely adjust the size and the granularity of the selected silica particles G within a narrow particle size range by an optical analysis method, so as to control the granularity of the silica particles G within 20-80 mm.
And a screening device 20 for receiving the impure plasmid H and the silica grain G, wherein the screening device 20 separates the impure plasmid H and the silica grain G by a color screening method, further grades the silica grain G from which the impure plasmid H is removed by the color screening method, divides the silica grain G into milky white, white and transparent according to color, and selects white or milky white silica grain G as a primary silica grain P, wherein the silica content of the primary silica grain P is more than 99%, in the embodiment, the silica content of the primary silica grain P is more than 99.997%, and the phosphorus and boron contents in the primary silica grain P are controlled to be less than 1ppm, so as to greatly improve the purity of the primary silica grain P.
The invention distinguishes and classifies the silica grains G according to color, such as: silica grains G containing other metals or components exhibit various colors due to the doped metal components, and are suitable for use as building materials and are unsuitable for use as raw materials for refining metallic silicon due to their low silicon dioxide content and many other metal components, while transparent silica grains G are suitable for use as photovoltaic materials, and white or opalescent silica grains G contain many crystal faces and are advantageous for a pulverization process and are also suitable for optical use.
Referring to fig. 2-4, the screening apparatus 20 includes a base 21, a conveying passage 22, an identification module 23, a first collecting tank 24 and a second collecting tank 25, the base 21 has an accommodating space 211, the conveying passage 22 is erected in the accommodating space 211, the conveying passage 22 has an input port 221, a separation port 222 and an output port 223, the input port 221 and the output port 223 are respectively disposed at two ends of the conveying passage 22, the separation port 222 is opened between the input port 221 and the output port 223, the identification module 23 is erected at two sides of the separation port 222, the first collecting tank 24 is communicated with the separation port 222, the second collecting tank 25 is communicated with the output port 223, and the conveying passage 22 is inclined with respect to the base 21.
The hybrid particles H and the silica particles G are put into the conveying channel 22 from the input port 221, each hybrid particle H and each silica particle G sequentially slide along the conveying channel 22 toward the output port 223, and after sliding for a certain distance, each hybrid particle H and each silica particle G generate a gap with the previous and next hybrid particle H or silica particle G, wherein when the hybrid particles H or silica particles G pass through the identification module 23, the identification module 23 can output the white or milky silica particles G from the separation port 222 and concentrate the white or milky silica particles G in the first collecting tank 24 by a color screening method, and each hybrid particle H and the remaining non-white or milky silica particles G are output from the output port 223 and concentrate the non-white or milky silica particles G in the second collecting tank 25.
Further, the identification module 23 has a photographing unit 231, a processing unit 232 and a separating unit 233 coupled to each other, in this embodiment, the separating unit 233 is an air gun. The photographing unit 231 can capture images of the miscellaneous plasmids H and the silica grains G passing through the separating port 222 and generate a monitoring image, the processing unit 232 receives and analyzes the monitoring image, the processing unit 232 determines the color of each miscellaneous plasmid H and each silica grain G from the monitoring image and identifies white or milk-white particles as primary silica grains P, that is, when the processing unit 232 determines that one of the silica grains G is white or milk-white, the processing unit 232 determines the primary silica grains P, the processing unit 232 generates a separating signal at this time, the processing unit 232 transmits the separating signal to the separating unit 233, the separating unit 233 receives the separating signal, the white or milk-white silica grains G are blown out of the conveying channel 22 by the separating port 222 and are collected in the first collecting tank 24 by using high-speed gas, and each miscellaneous plasmid H and the remaining non-white or milk-white silica grains G are continuously output toward the output port 223, and is concentrated in the second collecting tank 25, the processing unit 232 can be a Central Processing Unit (CPU), a system on a chip, a wafer group or the like, which should not be construed as a limitation of the invention.
And the purification device is used for receiving the primary silica particles P and purifying the primary silica particles P by a cleaning solution in an ultrasonic and electrodialysis mode to obtain silica particles with required purity and obtain high-purity quartz sand. The cleaning liquid is formed by mixing water and an organic solvent, wherein the organic solvent is preferably a carboxylic acid organic solvent containing carboxylate radicals, and in the embodiment, the weight percentage of the water is 90% -99%, and the weight percentage of the organic solvent is 0.1% -10%.
Referring to fig. 1 and 5, the cleaning apparatus 30 includes a cleaning tank 31, an electrode module 32 and an ultrasonic module 33, the electrode module 32 and the ultrasonic module 33 are disposed in the cleaning tank 31, a semi-permeable membrane 311 is disposed in the cleaning tank 31, the semi-permeable membrane 311 can divide the cleaning tank 31 into two receiving areas 312, and the two receiving areas 312 can receive cleaning liquid and each of the primarily selected silica particles P.
The ultrasonic module 33 can generate high frequency vibration waves to separate the finer impurities in each of the primarily selected silica particles P to separate other impurities such as metals; the electrode module 32 has positive and negative electrodes 321 respectively disposed on two sides of the semi-permeable membrane 311, and after the positive and negative electrodes 321 are energized, the cleaning liquid in the cleaning tank 31 can respectively generate hydrogen ions and hydroxide ions, wherein impurities such as metal particles are respectively gathered to the positive and negative electrodes 321 through the semi-permeable membrane 311 according to different properties and react with the hydrogen ions or the hydroxide ions, so as to greatly reduce the contents of metal and other impurities in each primarily selected silica particle P, thereby obtaining the desired silica particles and obtaining the high-purity silica sand.
Referring to fig. 6, based on the above-mentioned high purity quartz sand manufacturing system, the present invention further provides a high purity quartz sand manufacturing method, which includes the following steps:
fragmentation step S1: the raw quartz ore is received by the crushing apparatus 10, and the crushing apparatus 10 can crush the raw quartz ore along its cracks to fragment the raw quartz ore into the heteroplasmic particles H and the silica particles G.
Screening step S2: the impure plasmid H and the silica grain G generated in the fragmentation step S1 are received by the sieving device 20, the sieving device 20 separates each impure plasmid H and each silica grain G by color sieving, further divides the silica grain G from which the impure plasmid H is removed into milky, white and transparent silica grains G by color sieving, and selects the white or milky silica grain G as the primary selected silica grain P.
Purification step S3: the primary selected silica particles P obtained in the screening step S2 are received by the purification device 30, and the primary selected silica particles P are purified in the cleaning solution by means of ultrasound and electrodialysis to obtain desired silica particles, resulting in high purity silica sand.
According to the high-purity quartz sand manufacturing system and the manufacturing method, the impurity grains H in the original quartz ore can be completely removed through the screening device 20, the silica grains G with low silica content are selected and classified in a color screening mode, the primarily selected silica grains P with high silica content can be obtained, and the content of phosphorus and boron in the primarily selected silica grains P can be controlled to be below 1 ppm; the purification device 30 can further remove impurities in the primarily selected silica particles P by means of ultrasound and electrodialysis, thereby greatly improving the purity of the desired silica particles.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A high-purity quartz sand manufacturing system is characterized by comprising;
a fragmentation device for receiving raw quartz ore and fragmenting the raw quartz ore into heteroplasmids and silica particles;
a screening device for receiving the heteroplasmid particles and the silica particles, the screening device separating the heteroplasmid particles and the silica particles in a color screening manner and grading the silica particles by the color screening manner to obtain primarily selected silica particles;
and the purification device is used for receiving the primarily selected silica particles and purifying the primarily selected silica particles in an ultrasonic and electrodialysis mode to obtain the required silica particles.
2. The system for manufacturing high-purity quartz sand according to claim 1, wherein the screening device comprises a base, a conveying passage and an identification module, the base has a receiving space, the conveying passage is erected in the receiving space, the conveying passage has an input port, a separation port and an output port, the input port and the output port are respectively arranged at two ends of the conveying passage, the separation port is arranged between the input port and the output port, the identification module is erected at two sides of the separation port, the impurity grains and the silica grains enter the conveying passage from the input port, and the identification module outputs the primarily selected silica grains from the separation port and the impurity grains and the residual silica grains from the output port in a color screening manner.
3. The system of claim 2, wherein the recognition module comprises a photographing unit, a processing unit and a separating unit coupled to each other, the photographing unit is capable of photographing the images of the foreign particles and the silica particles passing through the separating port and generating a monitoring image, the processing unit receives and analyzes the monitoring image, and when the processing unit determines that the silica particles belong to the primary silica particles, the processing unit generates a separation signal, and the separating unit receives the separation signal and outputs the primary silica particles from the separating port.
4. The system for manufacturing high-purity quartz sand according to claim 1, wherein the cleaning liquid is formed by mixing water and an organic solvent, and the organic solvent is a carboxylic acid organic solvent.
5. The system for manufacturing high purity quartz sand according to claim 4, wherein the cleaning liquid contains 90 to 99% by weight of water and 0.1 to 10% by weight of an organic solvent.
6. The system for manufacturing high-purity quartz sand according to claim 1, wherein the cleaning apparatus comprises a cleaning tank for containing a cleaning liquid, an electrode module and an ultrasonic module, the electrode module and the ultrasonic module are disposed in the cleaning tank, a semi-permeable membrane is disposed in the cleaning tank, and the electrode module has positive and negative electrodes disposed on both sides of the semi-permeable membrane.
7. A method for manufacturing high purity silica sand, using the high purity silica sand manufacturing system according to any one of claims 1 to 6, comprising the steps of:
a smashing step: receiving raw quartz ore by a fragmentation device, fragmenting the raw quartz ore into heteroplasmids and silica particles;
a screening step: receiving the impure plasmids and the silica grains generated in the crushing step by a screening device, separating the impure plasmids and the silica grains by a color screening mode, and grading the silica grains by the color screening mode to obtain primary silica grains, wherein the silicon dioxide content of the primary silica grains is more than 99%;
a purification step: and receiving the primarily selected silica particles obtained in the screening step through a purifying device, and purifying the primarily selected silica particles in a cleaning solution in an ultrasonic and electrodialysis mode to obtain the required silica particles.
8. The method of claim 7, wherein the screening step further comprises classifying the silica grains from which the plasmids are removed into opal, white and transparent silica grains by a color screening method.
9. The method for manufacturing high-purity quartz sand according to claim 7, wherein the cleaning liquid is a mixture of water and an organic solvent, and the organic solvent is a carboxylic acid organic solvent.
10. The method for manufacturing high purity quartz sand according to claim 7, wherein the cleaning liquid contains 90 to 99% by weight of water and 0.1 to 10% by weight of an organic solvent.
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