CN113117606A - Beam source control device for precisely adjusting direction and position of beam source in vacuum beam source cavity - Google Patents
Beam source control device for precisely adjusting direction and position of beam source in vacuum beam source cavity Download PDFInfo
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- CN113117606A CN113117606A CN202110592242.4A CN202110592242A CN113117606A CN 113117606 A CN113117606 A CN 113117606A CN 202110592242 A CN202110592242 A CN 202110592242A CN 113117606 A CN113117606 A CN 113117606A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
Abstract
The invention discloses a beam source steering device for precisely adjusting the direction and position of a beam source in a vacuum beam source cavity, which is positioned in the vacuum beam source cavity and comprises: the device comprises an L-shaped support (1), a support base (2), an electric precision rotating platform (3), an electric precision two-dimensional moving platform (4), an ultrasonic jet pulse valve (7), a point light source infrared laser positioner (8), a vertical positioning photodiode (9), a collimator (10) and a horizontal positioning photodiode (11). On the premise of not damaging the high vacuum environment of the cavity, reversible adjustment of the beam source in the vertical direction and the horizontal direction is realized through the electric precision rotating platform, and the position of the beam source is independently adjusted in the two directions by utilizing the electric precision two-dimensional moving platform; on the other hand, the beam source is accurately positioned through the point light source infrared laser positioner and the photodiode which are well positioned by opening the cavity, the aim of accurately adjusting the direction and the position of the beam source in the high-vacuum beam source cavity is achieved, the experimental operation flow and the time cost are simplified, and the experimental operation efficiency is improved.
Description
Technical Field
The invention relates to the field of gas phase reaction dynamics, in particular to a beam source control device for precisely adjusting the direction and the position of a beam source in a vacuum beam source cavity.
Background
Gas phase reaction kinetics the microscopic mechanism of chemical reaction processes is revealed by studying the single collision behavior between particles at the atomic and molecular level, and photolysis and cross-molecular beam techniques are currently the main ones in this fieldExperimental research means. The associated experimental apparatus generally includes a reaction chamber, a beam source chamber and a detection chamber. In the experimental study of gas phase reaction, in order to reduce background noise and improve reaction resolution, the three chambers need to be maintained at a relatively high vacuum degree. In order to further reduce the background noise of the detection area and improve the reaction resolution, the beam source cavity and the detection cavity are separated by a differential pumping mode. Therefore, the background noise can be reduced, and meanwhile, the detector can normally work in a higher vacuum environment. The molecular beam generated by ultrasonic jet can well reduce the internal oscillation temperature of parent molecules, reduce the speed broadening of a beam source, further improve the experimental resolution and really realize the kinetic research from quantum state to quantum state. Therefore, the molecular beam source is mostly generated by adopting a pulse valve ultrasonic jet mode and reaches the reaction region after being collimated by the collimator. The effect of the ultrasonic jet is mainly determined by the ratio of the gas pressure in the container to the ambient pressure in the vacuum cavity, and the larger the ratio, the better the ultrasonic jet effect. Thus, a requirement for molecular beam formation is a sufficiently low background pressure, typically less than 10-7And torr and high vacuum environment can reduce background noise as much as possible and improve experimental resolution. In a specific experimental study process, if the source of the atom or radical beam needs to be generated by photolyzing the precursor molecular beam, a vertical installation mode (i.e. the source direction of the precursor molecular beam is perpendicular to the reaction plane) may be adopted, and the source direction of the atom or radical beam and the reaction plane are parallel by adjusting the polarization direction of the photolyzing light. On one hand, the installation mode can reduce parent molecules from entering a reaction area and improve the signal-to-noise ratio of the reaction; on the other hand, if the parent molecule is corrosive, such an installation also protects the reaction chamber from corrosion as much as possible. The horizontal mounting may produce a neutral beam source directly, or an atomic or radical beam source by electrical discharge. Since the three chambers are separated by means of differential pumping, it also means that if the beam source installation needs to be changed while the beam source is changed in the experimental process, the vacuum of all the chambers must be broken, and the installation direction and position of the pulse valve are changed by opening the chambers.
Disclosure of Invention
In order to precisely adjust the mounting direction and position of a beam source on the premise of not damaging vacuum, simplify the operation flow and time cost of an operation experiment and improve the operation efficiency of the experiment, the invention provides the beam source control device for precisely adjusting the direction and position of the beam source in a vacuum beam source cavity.
A beam source steering arrangement for fine tuning of beam source direction and position in a vacuum beam source chamber, said arrangement being located in the vacuum beam source chamber, said arrangement comprising: the device comprises an L-shaped support 1, a support base 2, an electric precision rotary table 3, an electric precision two-dimensional moving platform 4, an ultrasonic jet pulse valve 7, a point light source infrared laser positioner 8, a vertical positioning photodiode 9, a collimator 10 and a horizontal positioning photodiode 11; the electric precise two-dimensional moving platform 4 comprises a Y moving surface 5 and an X moving surface 6;
the ultrasonic jet pulse valve 7 is used for generating reactant molecular beams or parent molecular beams and is fixed on the L-shaped support (1), the L-shaped support (1) is fixed on the support base (2), and the support base (2) is fixed on the rotating surface of the electric precise rotating table 3, so that the precise adjustment of the rotating angle of a beam source is realized. The electric precision rotary table 3 is fixed on the moving surface 5 of the electric precision two-dimensional moving platform Y through the bottom surface, and the distance from the beam source to the collimator 10 along the Y-axis direction can be precisely adjusted after the beam source direction is changed. The electric precise two-dimensional moving platform Y moving surface 5 can drive the X moving surface 6 to move in the X-axis direction, so that the precise adjustment of the distance from the beam source to the collimator 10 in the X-axis direction is realized. The electric precise two-dimensional moving platform 4 is fixed on the bottom surface of the cavity of the vacuum beam source cavity through the side surface, and the direction and the position of the ultrasonic jet pulse valve 7 are ensured to be changed only in an XY plane. The point light source infrared laser positioner 8 is fixed on the L-shaped bracket (1), and the laser direction is parallel to the beam source direction. The vertical positioning photodiode 9 is fixed on the top surface of the beam source cavity, is externally connected with an oscilloscope, and enables the connecting line of the center of the vertical positioning photodiode and the center of the point light source infrared laser positioner 8 to be parallel to the beam source direction when the ultrasonic jet pulse valve 7 is vertically installed (installed along the Y-axis direction) through initial cavity opening positioning, so that accurate positioning when the beam source direction rotates from the horizontal direction to the vertical direction is realized. The horizontal positioning photodiode 11 and the collimator 10 are arranged on the same cavity surface, an oscilloscope is externally connected, and the connection line of the center of the horizontal positioning photodiode and the center of the point light source infrared laser positioning 8 is parallel to the beam source direction when the ultrasonic jet pulse valve 7 is horizontally arranged (arranged along the X-axis direction) through primary cavity opening positioning, so that accurate positioning when the beam source direction rotates from the vertical direction to the horizontal direction is realized.
Further, the ultrasonic jet pulse valve 7 is kept in the XY plane during changing the beam source direction and position, so there is no need to adjust the position of the ultrasonic jet pulse valve 7 in the Z axis direction.
Furthermore, the center of the L-shaped bracket 1 is hollowed and fixed on the base 2 through screws; the rough positioning of the distance from the ultrasonic jet pulse valve 7 to the collimator 10 can be realized when the device is fixed by opening the cavity for the first time.
Further, the bracket base 2 is made into a porous shape; can enhance the gas conductivity and improve the vacuum degree.
The invention has the advantages and positive effects that:
on the premise of not damaging the high vacuum environment of the cavity, reversible adjustment of the beam source in the vertical direction and the horizontal direction is realized through the electric precision rotating platform, and the position of the beam source is independently adjusted in the two directions by utilizing the electric precision two-dimensional moving platform; on the other hand, the beam source is accurately positioned through the point light source infrared laser positioner and the photodiode which are well positioned by opening the cavity, the aim of accurately adjusting the direction and the position of the beam source in the high-vacuum beam source cavity is achieved, the experimental operation flow and the time cost are simplified, and the experimental operation efficiency is improved.
Drawings
FIGS. 1, 2 and 3 are schematic views of a beam source steering apparatus for fine adjustment of the direction and position of a beam source in a vacuum beam source chamber in accordance with the present invention;
FIG. 4 is a schematic view of the vertical installation of the ultrasonic jet pulse valve of the present invention;
FIG. 5 is a schematic view of the ultrasonic jet pulse valve of the present invention rotated from a vertical mounting orientation to a horizontal orientation;
FIG. 6 is a schematic diagram of the ultrasonic jet pulse valve driven by the Y moving surface of the electric precise two-dimensional moving platform to move along the Y direction;
FIG. 7 is a schematic diagram of the ultrasonic jet pulse valve driven by the X moving surface of the electric precise two-dimensional moving platform to move along the X direction.
The device comprises a 1-L-shaped support, a 2-support base, a 3-electric precision rotating platform, a 4-electric precision two-dimensional moving platform, a 5-Y moving surface, a 6-X moving surface, a 7-ultrasonic jet pulse valve, an 8-point light source infrared laser positioner, a 9-vertical positioning photodiode, a 10-collimator and an 11-horizontal positioning photodiode.
Detailed Description
The invention is described in detail below with reference to the figures and the embodiments. The following examples are only for explaining the present invention, the scope of the present invention shall include the full contents of the claims, and the full contents of the claims of the present invention can be fully realized by those skilled in the art through the following examples.
Referring to fig. 1-6, a beam source steering arrangement of the present invention for fine tuning of the direction and position of a beam source in a vacuum beam source chamber, said arrangement being located in the vacuum beam source chamber, said arrangement comprising: the device comprises an L-shaped support 1, a support base 2, an electric precision rotary table 3, an electric precision two-dimensional moving platform 4, an ultrasonic jet pulse valve 7, a point light source infrared laser positioner 8, a vertical positioning photodiode 9, a collimator 10 and a horizontal positioning photodiode 11; the electric precision two-dimensional moving platform 4 comprises a Y moving surface 5 and an X moving surface 6.
The ultrasonic jet pulse valve 7 is used for generating reactant molecular beams or parent molecular beams and is fixed on the L-shaped support 1, the L-shaped support 1 is fixed on the support base 2, and the support base 2 is fixed on the rotating surface of the electric precise rotating table 3, so that the precise adjustment of the rotating angle of a beam source is realized. The electric precision rotary table 3 is fixed on the moving surface 5 of the electric precision two-dimensional moving platform Y through the bottom surface, and the distance from the beam source to the collimator 10 along the Y-axis direction can be precisely adjusted after the beam source direction is changed. The electric precise two-dimensional moving platform Y moving surface 5 can drive the X moving surface 6 to move in the X-axis direction, so that the precise adjustment of the distance from the beam source to the collimator 10 in the X-axis direction is realized. The electric precise two-dimensional moving platform 4 is fixed on the bottom surface of the cavity of the vacuum beam source cavity through the side surface, and the direction and the position of the ultrasonic jet pulse valve 7 are ensured to be changed only in an XY plane. The point light source infrared laser positioner 8 is fixed on the L-shaped bracket 1, and the laser direction is parallel to the beam source direction. The vertical positioning photodiode 9 is fixed on the top surface of the beam source cavity, is externally connected with an oscilloscope, and is positioned by opening the cavity to enable the connecting line of the center of the vertical positioning photodiode and the center of the point light source infrared laser positioner 8 to be parallel to the beam source direction when the ultrasonic jet pulse valve 7 is vertically installed (installed along the Y-axis direction), so that the accurate positioning when the beam source direction rotates from the horizontal direction to the vertical direction is realized. The horizontal positioning photodiode 11 and the collimator 10 are arranged on the same plane, and the connecting line of the center of the horizontal positioning photodiode and the center of the point light source infrared laser positioning 8 is parallel to the beam source direction when the ultrasonic jet pulse valve 7 is horizontally arranged (arranged along the X-axis direction) through open cavity positioning, so that the accurate positioning when the beam source direction rotates from the vertical direction to the horizontal direction is realized.
The ultrasonic jet pulse valve 7 is always maintained in the XY plane during changing the beam source direction and position, so there is no need to adjust the position of the ultrasonic jet pulse valve 7 in the Z-axis direction.
The ultrasonic jet pulse valve 7 is fixed on the L-shaped support, the center of the L-shaped support 1 is hollowed, and the L-shaped support is fixed on the fixed base 2 through screws, so that the rough positioning of the distance from the ultrasonic jet pulse valve 7 to the collimator 10 can be realized when the device is fixed by opening a cavity for the first time. The base 2 is made into a porous shape, so that the gas conductivity can be enhanced, and the vacuum degree can be improved.
When the beam source manipulating device for finely adjusting the direction and the position of the beam source in the vacuum beam source cavity is used, the method is implemented as follows:
(1) the cavity is opened, the side surface of the electric precise two-dimensional movable platform 4 is fixed on the bottom surface of the beam source cavity by screws, the bottom surface of the electric precise rotary platform 3 is fixed on the Y movable surface 5 of the electric precise two-dimensional movable platform by screws, the base 2 is fixed on the rotatable surface of the electric precise rotary platform 3 by screws, the L-shaped support 1 is fixed on the support base 2 by screws, and the ultrasonic jet pulse valve 7 and the point light source infrared laser positioner 8 are installed in the vertical direction (installed along the Y axis direction).
(2) The L-shaped support 1 is fixed after the position of the ultrasonic jet pulse valve 7 is determined by moving the L-shaped support 1 and the side surface of the electric precise two-dimensional moving platform, the vertical positioning photodiode 9 is externally connected with an oscilloscope, and the point light source infrared laser positioner 8 is opened to find the position of the vertical positioning photodiode 9 and then is fixed.
(3) The electric precise rotary table 3 is controlled by a motor controller to rotate the ultrasonic jet pulse valve 7 to the horizontal direction, the electric precise two-dimensional moving platform Y moving surface 5 is adjusted to enable a beam source to pass through the center of the collimator 10, the electric precise two-dimensional moving platform X moving surface 6 is adjusted to fix the distance between the ultrasonic jet pulse valve 7 and the collimator 10 along the X-axis direction, the distance of the electric precise two-dimensional moving platform in two directions is recorded, and the point light source infrared laser positioner 8 is opened to find the position of the horizontal positioning photodiode 11 and then is fixed.
(4) Closing the vacuum beam source cavity and vacuumizing to 10 DEG C-7～10-8Torr。
(5) The photoelectric diode is externally connected with an oscilloscope, the electric precise rotary table 3 is controlled by a motor controller to rotate the beam source to the vertical installation direction, the electric precise two-dimensional mobile platform 4 is adjusted according to data recorded during the first cavity opening, signals of the oscilloscope are observed to determine whether the laser of the point light source infrared laser positioner 8 strikes on the vertical positioning photoelectric diode 9 to complete positioning, and the reversible operation of the beam source from the horizontal installation direction to the vertical installation direction is realized.
(6) And opening the detector and the ultrasonic jet pulse valve 7 to acquire an experimental signal.
The above-described embodiments are merely illustrative of the preferred embodiments of the present invention, and the preferred embodiments are not exhaustive and do not limit the invention to the precise embodiments described. Various modifications and improvements of the technical solution of the present invention may be made by those skilled in the art without departing from the spirit of the present invention, and the technical solution of the present invention is to be covered by the protection scope defined by the claims.
Claims (4)
1. A beam source steering arrangement for fine tuning of the direction and position of a beam source in a vacuum beam source chamber, said arrangement being located in the vacuum beam source chamber, said arrangement comprising: the device comprises an L-shaped support (1), a support base (2), an electric precision rotating platform (3), an electric precision two-dimensional moving platform (4), an ultrasonic jet pulse valve (7), a point light source infrared laser positioner (8), a vertical positioning photodiode (9), a collimator (10) and a horizontal positioning photodiode (11); the electric precise two-dimensional moving platform (4) comprises a Y moving surface (5) and an X moving surface (6);
the ultrasonic jet pulse valve (7) is used for generating reactant molecular beams or parent molecular beams and is fixed on the L-shaped support (1), the L-shaped support (1) is fixed on the support base (2), and the support base (2) is fixed on the rotating surface of the electric precision rotating table (3) to realize the adjustment of the rotating angle of a beam source; the electric precise rotating table (3) is fixed on a Y moving surface (5) of the electric precise two-dimensional moving platform through the bottom surface, and the distance from the beam source to the collimator (10) along the Y-axis direction can be adjusted after the beam source direction is changed; the Y moving surface (5) of the electric precise two-dimensional moving platform can drive the X moving surface (6) to move in the X-axis direction, so that the distance from the beam source to the collimator (10) in the X-axis direction can be adjusted; the electric precise two-dimensional moving platform (4) is fixed on the bottom surface of the cavity of the vacuum beam source cavity through the side surface, so that the position and the direction of the ultrasonic jet pulse valve (7) are ensured to be changed only in an XY plane; the point light source infrared laser positioner (8) is fixed on the L-shaped bracket (1), and the laser direction is parallel to the beam source direction; the vertical positioning photodiode (9) is fixed on the top surface of the beam source cavity, the connection line of the center of the vertical positioning photodiode and the center of the point light source infrared laser positioner (8) is parallel to the beam source direction when the ultrasonic jet pulse valve (7) is vertically installed (installed along the Y-axis direction) through initial cavity opening positioning, and the positioning when the beam source direction rotates from the horizontal direction to the vertical direction is realized; the horizontal positioning photodiode (11) and the collimator (10) are arranged on the same cavity surface, the connecting line of the center of the cavity opening positioning and the center of the point light source infrared laser positioning (8) is parallel to the beam source direction when the ultrasonic jet pulse valve (7) is horizontally arranged (arranged along the X-axis direction), and the positioning when the beam source direction rotates from the vertical direction to the horizontal direction is realized.
2. The device according to claim 1, characterized in that the ultrasonic jet pulse valve (7) is kept in the XY plane during changing the beam source direction and position, so that there is no need to adjust the position of the ultrasonic jet pulse valve (7) in the Z axis direction.
3. Device according to claim 1, characterized in that the L-shaped bracket (1) is hollowed out in the center and is fixed to the bracket base (2) by means of screws.
4. Device according to claim 1, characterized in that the holder base (2) is made porous.
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| US20150037260A1 (en) * | 2012-02-28 | 2015-02-05 | University Of Leicester | Chemical reaction by combination of gas-phase and wet-chemical methods |
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