CN112760597A - 一种具有多层反射膜的铝板材及其真空镀膜工艺 - Google Patents

一种具有多层反射膜的铝板材及其真空镀膜工艺 Download PDF

Info

Publication number
CN112760597A
CN112760597A CN202011486477.7A CN202011486477A CN112760597A CN 112760597 A CN112760597 A CN 112760597A CN 202011486477 A CN202011486477 A CN 202011486477A CN 112760597 A CN112760597 A CN 112760597A
Authority
CN
China
Prior art keywords
layer
film
aluminum plate
films
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202011486477.7A
Other languages
English (en)
Inventor
曹轶
郝天宇
关旭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN202011486477.7A priority Critical patent/CN112760597A/zh
Publication of CN112760597A publication Critical patent/CN112760597A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10Glass or silica
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221Ion beam deposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5806Thermal treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明公开了一种具有多层反射膜的铝板材,包括铝材本体,所述铝材本体表面由内向外依次镀有多层膜,所述多层膜共包括二十五层膜,第一层膜为连接层,第二层膜为过渡层,第三层膜为吸收层,第四层‑第十八层膜为反射膜堆层,第十九层‑第二十三层为调色膜堆层,第二十四‑第二十五层为保护层。本发明属于金属介质镀膜技术领域,具体提供了一种具有高反射,耐高温,膜层牢固度高,应用在紫外固化灯设备中,有效提高了设备紫外光反射能效的具有多层反射膜的铝板材及其真空镀膜工艺。

Description

一种具有多层反射膜的铝板材及其真空镀膜工艺
技术领域
本发明属于金属介质镀膜技术领域,具体为一种具有多层反射膜的铝板材及其真空镀膜工艺。
背景技术
在半导体制造工艺过程中,通常需要对沉积的薄膜进行固化,以获得所需的薄膜性能。以往常采用加热烘烤达到固化薄膜的目的,但是热固化速度慢、能耗高、设备及工艺复杂,目前已逐渐被紫外固化(UVcure)所替代。
紫外线固化是利用光引发剂的感光性,在紫外线光照射下,光引发形成激发生态分子,分解成自由基或是离子,使不饱和有机物进行聚合、接枝、交联等化学反应达到固化的目的。
目前的紫外固化灯一般采用两排灯珠的光源,通过单层透镜折射来进行紫外线聚焦,固化物体。为提高紫外固化灯的固化效率,紫外固化灯上通常设有铝材制成的反射罩。但是,传统紫外固化灯用普通铝材做反射罩,反射能量低,通常仅能达到70%,反射红外热量高,且铝材表面硬度低,抗腐蚀能力差。
发明内容
针对上述情况,为克服当前的技术缺陷,本发明提供了一种具有高反射,耐高温,膜层牢固度高,应用在紫外固化灯设备中,有效提高了设备紫外光反射能效的具有多层反射膜的铝板材及其真空镀膜工艺。
本发明采取的技术方案如下:本发明一种具有多层反射膜的铝板材,包括铝材本体,所述铝材本体表面由内向外依次镀有多层膜,所述多层膜共包括二十五层膜,第一层膜为连接层,第二层膜为过渡层,第三层膜为吸收层,第四层-第十八层膜为反射膜堆层,第十九层-第二十三层为调色膜堆层,调色膜堆层的目的是使产品外观为蓝紫色,对应紫外光反射颜色,第二十四-第二十五层为保护层。
进一步地,所述连接层为金属铬膜,选取金属铬膜为连接层,达到一种膜层和铝板直接的软连接作用,为后续的裁剪压弧工艺做基础。
进一步地,所述过渡层为二氧化硅膜。
进一步地,所述吸收层为氮化钛膜或氧化钛膜中的一种,选取氮化钛膜或氧化钛膜为吸收层,吸收近红外光,达到反射热量低的效果,同时使膜层具有一定韧性,可达到压弧工艺的要求。
进一步地,所述反射膜堆层由铪和硅组成,选取铪和硅组成的反射膜堆层,使铝板紫外光的反射率70%提高到90%。
进一步地,所述保护层为二氧化硅膜,保护层使用二氧化硅膜,使产品达到耐磨损、可擦拭的技术效果。
作为优选地,所述铝材本体为抛光铝材。
一种具有多层反射膜的铝板材的真空镀膜工艺,具体包括下列步骤:
(1)在真空炉中放置铝材,抽真空2*10-3Pa,不加温;
(2)充50sccm氩气进行离子轰击清洗10分钟;
(3)使用10kv电子枪,晶控仪控制厚度,依照膜系设计的厚度进行多层膜镀制,过程中使用离子辅助工艺;
(4)镀制完成后加热到120℃保持20分钟释放膜层应力。
采用上述结构本发明取得的有益效果如下:本发明一种具有多层反射膜的铝板材及其真空镀膜工艺,通过真空镀膜技术,在铝材上镀设多层反射膜,对紫外光波段反射率提高到90%以上,吸收可见和近红外光,降低反射热量80%,达到紫外光低温高反射效果,且膜层呈现蓝紫色,膜层牢固度高,耐磨损、可擦拭、抗腐蚀能力强。
附图说明
附图用来提供对本发明的进一步理解,并且构成说明书的一部分,与本发明的实施例一起用于解释本发明,并不构成对本发明的限制。在附图中:
图1为本发明一种新型复合墙体的结构示意图;
图2为本发明实施例的光谱测试曲线图。
其中,1、铝材本体,2、连接层,3、过渡层,4、吸收层,5、反射膜堆层,6、调色膜堆层,7、保护层。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例;基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
实施例1:
一种具有多层反射膜的铝板材,包括铝材本体1,所述铝材本体表面由内向外依次镀有多层膜,所述多层膜共包括二十五层膜,第一层膜为连接层2,所述连接层2为金属铬膜,第二层膜为过渡层3,所述过渡层3为二氧化硅膜,第三层膜为吸收层4,所述吸收层4为氮化钛膜,第四层-第十八层膜为反射膜堆层5,所述反射膜堆层5由铪和硅组成,第十九层-第二十三层为调色膜堆层6,第二十四-第二十五层为保护层7,所述保护层7为二氧化硅膜,其中,所述铝材本体为抛光铝材。
一种具有多层反射膜的铝板材的真空镀膜工艺,具体包括下列步骤:
(1)在真空炉中放置铝材,抽真空2*10-3Pa,不加温;
(2)充50sccm氩气进行离子轰击清洗10分钟;
(3)使用10kv电子枪,晶控仪控制厚度,依照膜系设计的厚度进行多层膜镀制,过程中使用离子辅助工艺;
(4)镀制完成后加热到120℃保持20分钟释放膜层应力。
实施例2:
一种具有多层反射膜的铝板材,包括铝材本体,所述铝材本体表面由内向外依次镀有多层膜,所述多层膜共包括二十五层膜,第一层膜为连接层2,所述连接层2为金属铬膜,第二层膜为过渡层3,所述过渡层3为二氧化硅膜,第三层膜为吸收层4,所述吸收层4为氧化钛膜,第四层-第十八层膜为反射膜堆层5,所述反射膜堆层5由铪和硅组成,第十九层-第二十三层为调色膜堆层6,第二十四-第二十五层为保护层7,所述保护层7为二氧化硅膜,其中,所述铝材本体为抛光铝材。
一种具有多层反射膜的铝板材的真空镀膜工艺,具体包括下列步骤:
(1)在真空炉中放置铝材,抽真空2*10-3Pa,不加温;
(2)充50sccm氩气进行离子轰击清洗10分钟;
(3)使用10kv电子枪,晶控仪控制厚度,依照膜系设计的厚度进行多层膜镀制,过程中使用离子辅助工艺;
(4)镀制完成后加热到120℃保持20分钟释放膜层应力。
要说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物料或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物料或者设备所固有的要素。
尽管已经示出和描述了本发明的实施例,对于本领域的普通技术人员而言,可以理解在不脱离本发明的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型,本发明的范围由所附权利要求及其等同物限定。

Claims (8)

1.一种具有多层反射膜的铝板材,其特征在于,包括铝材本体,所述铝材本体表面由内向外依次镀有多层膜,所述多层膜共包括二十五层膜,第一层膜为连接层,第二层膜为过渡层,第三层膜为吸收层,第四层-第十八层膜为反射膜堆层,第十九层-第二十三层为调色膜堆层,第二十四-第二十五层为保护层。
2.根据权利要求1所述的一种具有多层反射膜的铝板材,其特征在于,所述连接层为金属铬膜。
3.根据权利要求1所述的一种具有多层反射膜的铝板材,其特征在于,所述过渡层为二氧化硅膜。
4.根据权利要求1所述的一种具有多层反射膜的铝板材,其特征在于,所述吸收层为氮化钛膜或氧化钛膜中的一种。
5.根据权利要求1所述的一种具有多层反射膜的铝板材,其特征在于,所述反射膜堆层由铪和硅组成。
6.根据权利要求1所述的一种具有多层反射膜的铝板材,其特征在于,所述保护层为二氧化硅膜。
7.根据权利要求1所述的一种具有多层反射膜的铝板材,其特征在于,所述铝材本体为抛光铝材。
8.一种具有多层反射膜的铝板材的真空镀膜工艺,其特征在于,具体包括下列步骤:
(1)在真空炉中放置铝材,抽真空2*10-3Pa,不加温;
(2)充50sccm氩气进行离子轰击清洗10分钟;
(3)使用10kv电子枪,晶控仪控制厚度,依照膜系设计的厚度进行多层膜镀制,过程中使用离子辅助工艺;
(4)镀制完成后加热到120℃保持20分钟释放膜层应力。
CN202011486477.7A 2020-12-16 2020-12-16 一种具有多层反射膜的铝板材及其真空镀膜工艺 Pending CN112760597A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202011486477.7A CN112760597A (zh) 2020-12-16 2020-12-16 一种具有多层反射膜的铝板材及其真空镀膜工艺

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011486477.7A CN112760597A (zh) 2020-12-16 2020-12-16 一种具有多层反射膜的铝板材及其真空镀膜工艺

Publications (1)

Publication Number Publication Date
CN112760597A true CN112760597A (zh) 2021-05-07

Family

ID=75695406

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011486477.7A Pending CN112760597A (zh) 2020-12-16 2020-12-16 一种具有多层反射膜的铝板材及其真空镀膜工艺

Country Status (1)

Country Link
CN (1) CN112760597A (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4798960A (en) * 1986-07-17 1989-01-17 Ferd. Ruesch Ag Device for the treatment of substances by UV radiation
TW201411198A (zh) * 2012-09-13 2014-03-16 Xxentria Technology Materials Co Ltd 耐候高反射板及其製造方法
JP2015008283A (ja) * 2013-05-31 2015-01-15 Hoya株式会社 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法
US20160077346A1 (en) * 2014-09-17 2016-03-17 Corning Incorporated High-efficiency multiwavelength beam expander employing dielectric-enhanced mirrors

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4798960A (en) * 1986-07-17 1989-01-17 Ferd. Ruesch Ag Device for the treatment of substances by UV radiation
TW201411198A (zh) * 2012-09-13 2014-03-16 Xxentria Technology Materials Co Ltd 耐候高反射板及其製造方法
JP2015008283A (ja) * 2013-05-31 2015-01-15 Hoya株式会社 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法
US20160077346A1 (en) * 2014-09-17 2016-03-17 Corning Incorporated High-efficiency multiwavelength beam expander employing dielectric-enhanced mirrors

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
薛春荣 等: "真空紫外光学薄膜及薄膜材料", 《激光与光电子学进展》 *

Similar Documents

Publication Publication Date Title
CN108093628B (zh) 带有硬涂层的高分子基板及其制造方法
JP2578416B2 (ja) 任意に1つ以上の薄膜金属層で被覆されたガラス基板に堆積される複合有機鉱物化合物フイルム
CN109971382B (zh) 一种节能降温隔热车衣膜及其制备方法
CN108914069B (zh) Rpvd绿色镀膜工艺
JP7375271B2 (ja) プライマー層形成用組成物、バリアフィルム、波長変換シート、及び、波長変換シートの製造方法
CN107227460A (zh) 一种以硫系红外玻璃为基底的增透dlc膜及其制备方法
CN111334794A (zh) 一种在基体表面沉积含Ti过渡层及钛掺杂类金刚石的改性薄膜及方法
CN115368031A (zh) 硫系玻璃8-12um波段高耐久性增透膜的制备方法
CN112760597A (zh) 一种具有多层反射膜的铝板材及其真空镀膜工艺
CN104459835A (zh) 一种红外玻璃gasir1增透膜及其制备方法
CN204331075U (zh) 一种红外玻璃gasir1增透膜
CN210048693U (zh) 一种节能降温隔热车衣膜
JPS63265844A (ja) 曲げ熱線反射ガラスの製造方法
CN115657190A (zh) 一种金属基底紫外宽带高反射滤光镜及制备方法
RU2235802C1 (ru) Способ изготовления гибкой зеркально отражающей структуры и структура, полученная этим способом
JP3723682B2 (ja) 反射防止フイルム
EP0136450B1 (de) Verfahren zum Herstellen einer Spiegelschicht, insbesondere für Scheinwerferreflektoren
CN117888062B (zh) 一种黑蓝色pvd装饰薄膜及其制备方法
JPS63111167A (ja) 無機質薄膜で被覆されたプラスチツク物品の製法
CN212410893U (zh) 一种薄膜
KR20190027562A (ko) Pcm 칼라강판의 제조시스템 및 이를 이용한 pcm 칼라강판의 제조방법
KR102244873B1 (ko) 디스플레이 기판용 기능성 코팅막 및 그 제조방법
JPS63265846A (ja) 曲げ熱線反射ガラス及びその製造方法
CN116479377B (zh) 一种改善塑胶表面光学薄膜在氙灯照射试验中的膜裂的方法
CN212864647U (zh) 一种安全隔热车顶车衣膜

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20210507

RJ01 Rejection of invention patent application after publication