CN112743096B - Plasma atomizing device, metal powder preparation device and preparation method - Google Patents
Plasma atomizing device, metal powder preparation device and preparation method Download PDFInfo
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 119
- 239000002184 metal Substances 0.000 title claims abstract description 119
- 238000002360 preparation method Methods 0.000 title claims abstract description 35
- 239000007788 liquid Substances 0.000 claims abstract description 93
- 239000011261 inert gas Substances 0.000 claims abstract description 89
- 238000000889 atomisation Methods 0.000 claims abstract description 37
- 239000007789 gas Substances 0.000 claims description 53
- 238000000034 method Methods 0.000 claims description 24
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 238000000926 separation method Methods 0.000 claims description 14
- 239000007787 solid Substances 0.000 claims description 14
- 238000001816 cooling Methods 0.000 claims description 11
- 230000002829 reductive effect Effects 0.000 claims description 7
- 238000009413 insulation Methods 0.000 claims description 6
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/06—Metallic powder characterised by the shape of the particles
- B22F1/065—Spherical particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
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- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Nanotechnology (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Abstract
The invention discloses a plasma atomization device, a preparation device and a preparation method of metal powder, and relates to the technical field of 3D printing. The plasma atomizing device is provided with two sleeves which are oppositely arranged, a liquid conveying channel to be atomized is arranged between the two sleeves, one end of each sleeve, which is close to the liquid conveying channel to be atomized, is provided with a first opening and a second opening, and the first opening and the second opening are distributed along the conveying direction of the liquid conveying channel to be atomized. Each sleeve is provided with an inert gas conveying cavity and a plasma conveying cavity sleeved in the inert gas conveying cavity, the inert gas conveying cavity is communicated with the first opening, and the plasma conveying cavity is communicated with the second opening. The preparation device of the metal powder comprises the plasma atomization device. The preparation device of the metal powder is used for preparing the metal powder.
Description
Technical Field
The invention relates to the technical field of 3D printing, in particular to a plasma atomization device, a metal powder preparation device and a metal powder preparation method.
Background
With rapid developments over the last 30 years, 3D printing technology has become one of the most currently interesting advanced manufacturing technologies. However, in the metal 3D printing process, the requirements for metal powder are high, such as high sphericity, low oxygen content, narrow particle size distribution, etc. The existing preparation process of the metal powder mainly comprises the following steps: a plasma rotating electrode method, a vacuum induction electrode smelting gas atomization method, a plasma wire atomization method, a radio frequency plasma spheroidization method and the like.
The appearance of the metal powder prepared by the existing preparation process is difficult to control, the particle size is larger, the cost is higher, and the production efficiency is low. The purity of the metal powder prepared by the plasma wire atomization method and the radio frequency plasma spheroidization method is also unsatisfactory, and the waste of materials is caused.
Disclosure of Invention
The invention aims to provide a plasma atomization device, a metal powder preparation device and a metal powder preparation method, which are used for preparing metal powder with high sphericity, low oxygen content and narrow particle size distribution.
In a first aspect, the present invention provides a plasma atomizing apparatus. The plasma atomization device is provided with two sleeves which are oppositely arranged, a liquid conveying channel to be atomized is arranged between the two sleeves, one end of each sleeve, which is close to the liquid conveying channel to be atomized, is provided with a first opening and a second opening, and the first opening and the second opening are distributed along the conveying direction of the liquid conveying channel to be atomized.
Each sleeve is provided with an inert gas conveying cavity and a plasma conveying cavity sleeved in the inert gas conveying cavity, the inert gas conveying cavity is communicated with the first opening, and the plasma conveying cavity is communicated with the second opening.
Compared with the prior art, the plasma atomization device provided by the invention is provided with the two sleeves which are oppositely arranged, each sleeve is provided with the inert gas conveying cavity and the plasma conveying cavity sleeved in the inert gas conveying cavity, so that the situation that peripheral components are damaged due to leakage of plasma jet flow caused by poor sealing can be avoided. Simultaneously, the inert gas conveying cavity is communicated with the first opening, the plasma conveying cavity is communicated with the second opening, and the first opening and the second opening are distributed along the conveying direction of the liquid conveying channel to be atomized. At this time, when the molten liquid to be atomized falls from the liquid conveying channel to be atomized, the molten liquid to be atomized is hit by the inert gas jet ejected from the first opening and the plasma jet ejected from the second opening at the same time, and atomized metal droplets are obtained after atomization. At this time, the inert gas jet is continuously supplemented into the liquid conveying channel to be atomized, so that a certain amount of positive pressure exists in the plasma atomization device, the phenomenon of back spraying during atomization is avoided, continuous production is realized, and the atomization efficiency of the molten liquid to be atomized is improved.
In addition, in the atomization process, under the dual actions of inert gas jet flow and plasma jet flow, the fine metal powder which is solidified earlier can be quickly blown away from a liquid conveying channel to be atomized, so that the fine metal powder which is solidified earlier and rough metal liquid drops which are not solidified are prevented from being collided, and satellite powder is formed. And because the plasma conveying cavity is sleeved in the inert gas conveying cavity, heat generated by the plasma conveying cavity when conveying plasma is directly transferred to the inert gas conveying cavity, so that the inert gas in the inert gas conveying cavity is heated, the flow speed of the inert gas in the inert gas conveying cavity is increased, and the temperature of the heated inert gas jet is lower than that of the plasma jet, therefore, when the molten liquid to be atomized is atomized, suction can be generated on the molten liquid to be atomized, and the molten liquid to be atomized can be subjected to multiple impact crushing treatments in a short time, so that metal liquid drops with narrow particle size distribution can be obtained.
In a second aspect, the invention also provides a device for preparing metal powder. The preparation device of the metal powder comprises: an atomising chamber and a plasma atomising device as described in the first aspect or any possible implementation of the first aspect, the plasma atomising device being located at an inlet of the atomising chamber.
Compared with the prior art, the beneficial effects of the preparation device of the metal powder provided by the invention are the same as those of the plasma atomization device described in the first aspect or any possible implementation manner of the first aspect, and the description is omitted here.
In a third aspect, the present invention further provides a method for preparing metal powder, which is applied to the apparatus for preparing metal powder according to the second aspect or any possible implementation manner of the second aspect. The preparation method of the metal powder comprises the following steps:
providing a melt to be atomized.
And atomizing the molten liquid to be atomized by using a plasma atomizing device to obtain atomized metal liquid drops, so that the atomized metal liquid drops form metal powder in the atomizing chamber.
Compared with the prior art, the beneficial effects of the preparation method of the metal powder provided by the invention are the same as those of the plasma atomizing device in the first aspect or any possible implementation manner of the first aspect, and the description is omitted here.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention and do not constitute a limitation on the invention. In the drawings:
fig. 1 illustrates a schematic structural diagram of a plasma atomizing device according to an embodiment of the present invention;
FIG. 2 is an enlarged view of FIG. 1 at A;
FIG. 3 is a schematic diagram illustrating a metal powder preparing apparatus according to an embodiment of the present invention;
FIG. 4 is an electron micrograph of TC4 titanium alloy powder prepared by the method for preparing metal powder according to an embodiment of the present invention;
reference numerals:
1-a plasma atomizing device; 111-a liquid delivery channel to be atomized; 112-a first opening; 113-a second opening; 114-an inert gas delivery chamber; 115-a plasma delivery chamber; 1141-a first inert gas delivery section; 1142-a second inert gas delivery section; 1151-a first plasma delivery segment; 1152-a second plasma delivery segment; 116-a wrapping section wrapping the first inert gas delivery section; 117-a wrapping section wrapping the first plasma delivery section; 118-a first air intake interface; 119-a plasma generator; 120-insulation; 121-cooling parts; 2-a preparation device of metal powder; 211-an atomization chamber; 212-a gas-solid separation structure; 213-gas collection structure; 2131-gas collecting ring; 214-a feeding mechanism; 215-a refueling chamber; 216-a smelting chamber; 2161-smelting coils; 217-collection line; 218-a powder collection tank; 219-an exhaust duct; 220-an exhaust fan.
Detailed Description
In order to make the technical problems, technical schemes and beneficial effects to be solved more clear, the invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
It will be understood that when an element is referred to as being "mounted" or "disposed" on another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise. The meaning of "a number" is one or more than one unless specifically defined otherwise.
In the description of the present invention, it should be understood that the directions or positional relationships indicated by the terms "upper", "lower", "front", "rear", "left", "right", etc., are based on the directions or positional relationships shown in the drawings, are merely for convenience of describing the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention.
In the description of the present invention, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
With rapid developments over the last 30 years, 3D printing technology has become one of the most currently interesting advanced manufacturing technologies. Because of its inherent advantages of "flexible manufacturing" and "raw material saving" over traditional manufacturing methods, there has been a rise in recent years to the rise of a hot spot in the global manufacturing industry. The 3D printing technology can be used for manufacturing a blank with the dimensional accuracy close to that of a finished product, and the dimensional accuracy requirement of the component can be met with little or no machining, so that the material utilization rate is greatly improved, and the manufacturing cost is reduced. In terms of mechanical properties, the 3D printed metal part exceeds the traditional cast part, and even reaches the mechanical property level of the forged part. On alloy systems, 3D printed metal materials have been developed from traditional stainless steel materials to titanium alloys, aluminum alloys, superalloys, and refractory metal materials.
Spherical metal powder is one of the currently major metallic 3D printing raw materials, while low cost, high quality, high purity spherical metal powder is the basis for obtaining high performance 3D printed metal parts. At present, the common preparation method of the spherical metal powder comprises the following steps: plasma rotary electrode process (PREP process), vacuum induction electrode smelting gas atomization (EIGA process), plasma wire atomization process (PA process), and radio frequency plasma spheroidization process. The above methods were analyzed separately as follows:
1. plasma rotary electrode method (PREP method): and smelting a metal or alloy electrode by adopting a plasma torch, simultaneously rotating the electrode at a high speed, and preparing metal powder by utilizing the centrifugal effect. The following disadvantages mainly exist:
1. the electrode rotates at a high speed, and the requirements on the dimensional accuracy and the surface roughness of the electrode are high;
2. the powder granularity powder is high overall, so that fine powder is not easy to obtain;
3. the high-speed rotation control mechanism and the dynamic sealing structure are complex, and the equipment cost is high;
2. vacuum induction electrode smelting gas atomization (EIGA method): smelting in induction coil with metal or alloy electrode, and crushing molten metal in atomizing nozzle under the action of gravity and gas. The following disadvantages mainly exist:
1. atomizing and pulverizing by adopting a free nozzle, wherein the powder is thicker;
2. the gas consumption is high, and the pulverizing cost is high;
3. the powder has more satellite powder and hollow powder;
3. plasma wire atomization (PA method): and (3) adopting direct-current non-transferred arc plasma to generate high-temperature and high-speed plasma jet to melt and crush the metal bar or wire so as to form micro-droplet powder preparation.
The following disadvantages mainly exist:
1. the powder preparation efficiency is low, and batch preparation is not easy to realize;
2. the purity of the powder is affected after the wire is polluted;
4. radio frequency plasma spheroidization: the non-spherical powder is used as a raw material, and the powder is heated in a radio frequency plasma torch to partially melt the surface of the metal powder and then spheroidize the metal powder to obtain the metal powder. The following disadvantages mainly exist:
1. the purity of the powder is limited by the granularity of the raw materials, so that the purity of the product is insufficient;
2. the hot area of the radio frequency plasma torch is limited by the space range, so that the production efficiency is low;
3. the equipment is complex and the production cost is high.
Based on the defects of the metal powder preparation method, the embodiment of the invention provides a plasma atomization device, a metal powder preparation device and a metal powder preparation method, which solve the problems of low metal powder atomization efficiency and powder granularity deviation, improve the appearance of powder, reduce the proportion of satellite powder and hollow powder, and reduce the comprehensive production cost of metal powder.
Fig. 1 illustrates a schematic structural diagram of a plasma atomizing device according to an embodiment of the present invention. As shown in fig. 1, the plasma atomizing device provided by the embodiment of the invention is provided with two sleeves which are oppositely arranged, a liquid conveying channel to be atomized is arranged between the two sleeves, one end of each sleeve, which is close to the liquid conveying channel to be atomized, is provided with a first opening and a second opening, and the first opening and the second opening are distributed along the conveying direction of the liquid conveying channel to be atomized. It should be noted that, in the plasma atomizing device provided by the embodiment of the invention, the two sleeves, the first opening and the second opening which are oppositely arranged are made of high-temperature resistant materials. For example, the material selected may be high purity graphite, tungsten carbide, tungsten nitride, or the like, and is not limited thereto.
As shown in fig. 1, each sleeve has an inert gas delivery chamber and a plasma delivery chamber nested within the inert gas delivery chamber. The inert gas conveying cavity is communicated with the first opening and is used for conveying inert gas into the liquid conveying channel to be atomized. The plasma conveying cavity is communicated with the second opening and is used for conveying plasma into the liquid conveying channel to be atomized. The plasma conveying cavity is sleeved in the inert gas conveying cavity, so that the situation that surrounding parts are damaged due to leakage of high-temperature plasma jet can be prevented. When the plasma atomization device is used for treating the molten liquid to be atomized, the inert gas jet is continuously supplied into the liquid conveying channel to be atomized, so that a certain amount of positive pressure exists in the plasma atomization device, the phenomenon of back spraying during atomization is avoided, continuous production can be realized, and the atomization efficiency of the molten liquid to be atomized is improved. And the inert gas jet can rapidly blow the fine metal powder which is solidified first away from the liquid conveying channel to be atomized, so that the fine metal powder which is solidified first is prevented from colliding with the rough metal liquid drops which are not solidified, and satellite powder is formed. When the inert gas jet in the inert gas conveying cavity is heated, the flow speed of the inert gas jet is increased, and the molten liquid to be atomized is dispersed into metal liquid drops with narrower particle size distribution under the combined action of the high-speed inert gas jet and the plasma jet. And because the temperature of the inert gas jet is lower than that of the plasma jet, when the molten liquid to be atomized is atomized, the molten liquid to be atomized can be sucked, so that the molten liquid to be atomized can be subjected to multiple impact crushing treatments in a short time, and the particle size distribution of the obtained metal liquid drops is narrower.
As shown in fig. 1, the liquid to be atomized conveying channel is a funnel-shaped liquid to be atomized conveying channel, and the diameter of the funnel-shaped liquid to be atomized conveying channel gradually increases along the conveying direction of the liquid to be atomized. The liquid conveying channel to be atomized is used for enabling the molten liquid to be atomized to pass through and enabling the molten liquid to be atomized in the liquid conveying channel to be atomized.
In order to increase the flow velocity of the gas, a high-velocity gas flow is obtained, so that metal powder with narrower particle size distribution is obtained, as shown in fig. 1, the radial length of the inert gas conveying cavity is gradually reduced along the direction approaching the first opening, and the minimum radial length of the inert gas conveying cavity is smaller than the radial length of the liquid conveying channel to be atomized. The radial length of the plasma conveying cavity is gradually reduced along the direction approaching to the second opening, and the minimum radial length of the plasma conveying cavity is smaller than the radial length of the liquid conveying channel to be atomized. It should be understood that in order to reduce the flow resistance of the gas, parallel or small-angle convergence may be adopted between the upper and lower surfaces of the inner cavities of the inert gas conveying cavity and the plasma conveying cavity, so that the change rate of the cross-sectional areas in the radial direction of the inner cavities of the inert gas conveying cavity and the plasma conveying cavity is low, and when the inert gas or the plasma flows through, the compression amount of the inert gas or the plasma is small, so that the flow velocity gradient of the inert gas or the plasma is as small as possible, and the uniformity of the inert gas or the plasma is higher. When inert gas or plasma with high uniformity acts on the molten liquid to be atomized, the particle size of the prepared metal powder is narrower and more uniform due to the narrow force distribution interval of the inert gas or plasma. Wherein, the convergence angle can be 0-5 degrees.
In practical applications, as shown in fig. 1, in order to increase the flow rate of the gas, a circular seam type laval structure may be adopted at the connection position of the inert gas delivery cavity near the first opening. Specifically, the diameter of the inner cavity of the inert gas conveying cavity near the first opening is gradually reduced, and the minimum value of the diameter of the inner cavity of the inert gas conveying cavity, namely the diameter of the first circumferential seam, is arranged between the inner cavity of the inert gas conveying cavity and the first opening. For example, the inert gas delivery chamber may have an outer diameter of 50nm to 100mm, the first opening may have a diameter of 0.5nm to 1.2mm, and the first circumferential seam may have a diameter of 0.3nm to 0.6mm. The diameter of the inner cavity of the plasma conveying cavity near the second opening is gradually reduced, and the minimum value of the inner cavity diameter of the plasma conveying cavity, namely the diameter of the second circular seam, is arranged between the inner cavity of the plasma conveying cavity and the second opening. For example, the plasma delivery chamber may have an outer diameter of 40nm to 97mm, the second opening may have a diameter of 0.5nm to 1.2mm, and the first circumferential seam may have a diameter of 0.3nm to 0.7mm.
In order to improve the crushing effect of the airflow on the molten liquid to be atomized, and in order to avoid that the atomized molten liquid is dispersed in the liquid conveying channel to be atomized, satellite powder is formed, as shown in fig. 1, a first included angle is formed between the normal direction of the first opening and the axial direction of the liquid conveying channel to be atomized, and the first included angle may be 10 ° to 20 °. The normal direction of the second opening and the axial direction of the liquid conveying channel to be atomized have a second included angle, and the second included angle can be 35-45 degrees. Because the high-temperature plasma jet has lower mass flow, under the condition that a first included angle formed by the first opening and a second included angle formed by the second opening exceed a conventional gas atomization angle, static pressure formed at a converging point of the inert gas jet and the plasma jet is lower, a reverse jet is not easy to form, and the converging air flow with a large angle improves the crushing effect and the atomization efficiency. It should be noted that smooth circular transitions may be used where corners occur in order to reduce the effect on the gas flow rate.
Fig. 2 is an enlarged view at a in fig. 1. As shown in fig. 2, each of the above-described sleeves may include first and second inert gas delivery sections forming an inert gas delivery chamber and first and second plasma delivery sections forming a plasma delivery chamber.
As shown in fig. 2, in order to increase the sealing effect between different gas delivery sections, the end connection interface of the first inert gas delivery section and the second inert gas delivery section is an inclined plane connection interface, and the inclination angle of the interface may be 20 ° to 40 °. The end of the second inert gas conveying section, which is close to the first inert gas conveying section, is provided with a wrapping section wrapping the first inert gas conveying section.
As shown in fig. 1, in order to increase the sealing effect between different gas delivery sections, the end connection interfaces of the first plasma delivery section and the second plasma delivery section are inclined connection interfaces, and the inclination angle of the interfaces may be 20 ° to 40 °. The end of the second plasma conveying section, which is close to the first plasma conveying section, is provided with a wrapping section wrapping the first plasma conveying section.
As shown in fig. 1 and 2, in order to introduce corresponding atomizing gas into the inert gas conveying cavity and the plasma conveying cavity of the plasma atomizing device, the plasma atomizing device further comprises a first air inlet interface communicated with the inert gas conveying cavity and a plasma generator communicated with the plasma conveying cavity. The first air inlet interface is used for introducing inert gas into the inert gas conveying cavity, the air inlet pressure can be 0 Mpa-2 Mpa, and the flow of the inert gas can be 0L/min-300L/min. The plasma generator is used for introducing plasma into the plasma conveying cavity, and the power of the plasma generator can be 10 Kw-100 Kw.
As shown in fig. 1 and 2, in order to prevent the heat generated in the plasma transport chamber from causing thermal deformation with components surrounding the plasma atomizing apparatus, the plasma atomizing apparatus further includes a heat insulating member and a temperature reducing member. Through setting up the heat insulating part, produce the temperature gradient to protection cooling piece prevents that cooling piece from damaging. Each sleeve is positioned on the same side of the heat insulating piece, and the cooling piece is positioned on one side of the heat insulating piece away from each sleeve. The heat insulating member may be a heat insulating plate or other materials with heat insulating function, which is not limited herein. The cooling member may be a water cooling plate or other materials with cooling function, which is not limited herein.
Fig. 3 illustrates a schematic structural diagram of a metal powder preparation apparatus according to an embodiment of the present invention. As shown in fig. 3, the apparatus for preparing metal powder according to the embodiment of the present invention includes: an atomizing chamber and the plasma atomizing device. The plasma atomizing device is located at the entrance of the atomizing chamber. The atomized metal liquid drops can enter an atomization chamber from a plasma atomization device and are collected after being cooled in the atomization chamber, so that metal powder is obtained.
As shown in fig. 3, in order to collect the cooled metal powder and prevent the previously solidified fine metal powder from colliding with the non-solidified coarse metal droplets to form satellite powder, the apparatus for preparing metal powder further includes a gas-solid separation structure and a gas collection structure. The gas inlet of the gas collecting structure is communicated with the gas-solid separation structure, and the outlet of the gas collecting structure is communicated with the atomizing chamber. The gas collection structure includes a gas collection ring having an opening. The gas collecting ring is positioned in the atomizing chamber.
In practical use, as shown in fig. 3, the gas-solid separation structure separates the atomized gas from the metal powder, and a part of the atomized gas is utilized by the gas collecting structure and acts on scattered metal droplets through the gas collecting ring located in the atomizing chamber. The gas collecting ring is provided with a plurality of gas ports for spraying atomized gas, and scattered metal liquid drops are blown into the atomizing chamber under the action of the sprayed atomized gas and gravity so as to reduce or avoid forming satellite powder. Specifically, as shown in fig. 2, the apparatus for preparing metal powder may include a feeding mechanism, a refueling chamber, a smelting chamber, a plasma atomizing device, an atomizing chamber, a powder collecting device, a vacuum pipe (not shown), an exhaust pipe, a gas collecting structure, and a control system (not shown). The feeding mechanism is positioned at the top of the metal powder preparation device and is used for fixing the bar stock and enabling the bar stock to do linear motion and rotary motion along the axial direction in the material changing bin. The material changing chamber is a sealed bin chamber, a sealing device (which can be a shaft seal) is arranged between the top of the material changing chamber and the feeding mechanism, a gate valve is arranged at the lower part of the material changing chamber, and a material changing bin door is arranged at the front part of the material changing chamber and used for changing material changing bars. The smelting chamber is positioned below the reloading chamber, and the reloading chamber and the smelting chamber are separated by a gate valve. The smelting chamber is provided with a smelting system electric inlet interface, a plasma atomization device interface and corresponding sealing elements (which can be o-rings for flanges). A smelting coil is arranged in the smelting chamber. The lower part of the smelting chamber is connected with a plasma atomization device which is used for atomizing molten liquid to be atomized melted in the smelting chamber. The lower part of the plasma atomizing device is connected with an atomizing chamber, the top of the atomizing chamber is provided with a gas collecting ring, the inner diameter of the gas collecting ring can be 150 nm-300 mm, the distance between a gas outlet of the gas collecting ring and the top of the atomizing chamber can be 50 nm-200 mm, the gas outlet of the gas collecting ring can be in a circular seam structure, and the width of the circular seam can be 5 nm-30 mm. The lower part of the atomizing chamber is connected with the gas-solid separation structure through a collecting pipeline, and the gas-solid separation structure can comprise a cyclone separator and a powder collecting tank which is arranged under the cyclone separator and is coaxially arranged. The top of the cyclone separator is connected with an exhaust fan through an exhaust pipeline, a tee joint (not shown in the figure) is arranged in the pipeline, the tee joint is communicated with an air collecting ring in the atomization chamber through a pipeline of an air collecting structure, and a circulating fan (not shown in the figure) can be arranged on the pipeline of the air collecting structure and used for conveying air in the exhaust pipeline to the air collecting ring so as to prevent atomized liquid drops from gathering and form satellite powder.
The embodiment of the invention also provides a preparation method of the metal powder, which is used for preparing the metal powder. The preparation method of the metal powder comprises the following steps:
s110: providing a melt to be atomized.
In practical application, under the condition of vacuumizing the system, a feeding mechanism is used for feeding the bar stock into a smelting chamber, and the head of the metal bar is gradually melted under the action of a smelting coil in the smelting chamber to obtain molten liquid to be atomized.
S120: and atomizing the molten liquid to be atomized by using a plasma atomization device to obtain atomized metal liquid drops, so that the atomized metal liquid drops form metal powder in an atomization chamber.
In practical application, the molten liquid to be atomized enters the liquid conveying channel to be atomized under the action of gravity, and the plasma jet generated by the plasma generator is sprayed out through the second opening communicated with the plasma conveying cavity. Meanwhile, the temperature of the inner cavity of the inert gas conveying cavity is increased, after the inert gas in the inert gas conveying cavity is heated, an inert gas jet flow and a plasma jet flow are formed to impact and crush molten liquid to be atomized together, atomized metal liquid drops are formed, the atomized metal liquid drops fly into the atomizing chamber under the action of the inert gas jet flow, the plasma jet flow and gravity, and the atomized metal liquid drops are gradually cooled and solidified in the flying process, so that metal powder is obtained.
After the molten liquid to be atomized is atomized by utilizing the plasma atomization device to obtain atomized metal liquid drops, so that the atomized metal liquid drops form metal powder in the atomization chamber, the preparation method of the metal powder further comprises the following steps:
s130: and blowing the atomized liquid drops into the atomizing chamber by utilizing the gas collecting structure to obtain a mixture of metal powder and inert gas.
In practical application, after forming atomized metal droplets, the atomized gas sprayed from the gas collecting ring acts on the atomized metal droplets, so that the atomized metal droplets are accelerated to be blown into the atomizing chamber, and a mixture of metal powder and inert gas is obtained. Reducing or preventing the formation of satellite powder.
S140: and separating the mixture of the metal powder and the inert gas by utilizing a gas-solid separation structure to obtain the metal powder.
In practical application, metal powder in the atomizing chamber is conveyed into the gas-solid separation structure through a pipeline, the gas-solid separation structure separates the metal powder from atomized gas, so that the metal powder falls into a powder collecting tank at the lower part of the gas-solid separation structure, and the atomized gas is discharged through the pipeline at the upper part of the gas-solid separation structure. Wherein a portion of the atomizing gas is utilized by the gas collection structure.
Compared with the prior art, the beneficial effects of the preparation method of the metal powder provided by the invention are the same as those of the plasma atomization device, and the description is omitted here.
Taking a titanium alloy bar as an example, the metal powder is manufactured by using the metal powder manufacturing device and the metal powder manufacturing method provided by the embodiment of the invention.
Example 1
TC4 titanium alloy bars with the diameter of 40mm and the length of 600mm are selected as electrode bars and are arranged on a feeding mechanism of a metal powder preparation device, and then argon protective gas is filled after the whole system is vacuumized. The feeding mechanism drives the electrode rod to feed to the smelting coil at a rotation speed of 140r/min and a descending speed of 1000 mm/min. And (3) starting an exhaust fan, maintaining a micro negative pressure state in the system, and keeping the pressure difference between the smelting chamber and the atomizing chamber at 0.03-0.05 Mpa. Simultaneously, the gas path valves of the plasma generator and the first gas inlet interface are opened, the power of the plasma generator is set to be 30Kw, the argon flow is 150L/min, and the argon pressure of the outer cavity gas path is set to be 0.8Mpa. And starting an electric inlet of the smelting system to 15Kw, so that the tip of the electrode rod is subjected to induction heating in the smelting coil, and gradually melts and converges to the conical tip at the top of the electrode rod. The molten liquid to be atomized flows into a liquid conveying channel to be atomized of the plasma atomizing device below the smelting coil under the action of gravity and the action of suction force of the plasma atomizing device. The plasma jet flow and the high-temperature argon jet flow are converged in the axial directions of the first opening and the second opening, and the molten liquid to be atomized is crushed into atomized metal liquid drops. In the process of flying in the atomizing chamber, atomized metal liquid drops are spheroidized and solidified into metal powder through self surface tension.
Fig. 4 illustrates an electron micrograph of TC4 titanium alloy powder prepared by the method for preparing metal powder according to the embodiment of the present invention. As shown in fig. 4, the TC4 titanium alloy powder prepared by the preparation method of the metal powder provided by the embodiment of the present invention has high sphericity, few satellite powder, and fine powder particle size.
In the description of the above embodiments, particular features, structures, materials, or characteristics may be combined in any suitable manner in any one or more embodiments or examples.
The foregoing is merely illustrative of the present invention, and the present invention is not limited thereto, and any person skilled in the art will readily recognize that variations or substitutions are within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (9)
1. The plasma atomization device is characterized by comprising two sleeves which are oppositely arranged, wherein a liquid conveying channel to be atomized is arranged between the two sleeves, a first opening and a second opening are formed in one end, close to the liquid conveying channel to be atomized, of each sleeve, and the first opening and the second opening are distributed along the conveying direction of the liquid conveying channel to be atomized;
each sleeve is provided with an inert gas conveying cavity and a plasma conveying cavity sleeved in the inert gas conveying cavity, the inert gas conveying cavity is communicated with the first opening, the plasma conveying cavity is communicated with the second opening, the radial length of the inert gas conveying cavity is gradually reduced along the direction close to the first opening, the minimum radial length of the inert gas conveying cavity is smaller than the radial length of the liquid conveying channel to be atomized, the radial length of the plasma conveying cavity is gradually reduced along the direction close to the second opening, the minimum radial length of the plasma conveying cavity is smaller than the radial length of the liquid conveying channel to be atomized, a first included angle is formed between the normal direction of the first opening and the axial direction of the liquid conveying channel to be atomized, the first included angle is 10-20 degrees, a second included angle is formed between the normal direction of the second opening and the axial direction of the liquid conveying channel to be atomized, and the second included angle is 35-45 degrees.
2. The plasma atomizing apparatus according to claim 1, wherein the liquid to be atomized is a funnel-shaped liquid to be atomized conveying passage, and a diameter of the funnel-shaped liquid to be atomized conveying passage is gradually increased along a conveying direction of the liquid to be atomized;
each sleeve comprises a first inert gas conveying section and a second inert gas conveying section which form an inert gas conveying cavity, wherein the end connecting interface of the first inert gas conveying section and the end connecting interface of the second inert gas conveying section are inclined surface connecting interfaces, and the end, close to the first inert gas conveying section, of the second inert gas conveying section is provided with a wrapping section wrapping the first inert gas conveying section;
the plasma conveying device comprises a first plasma conveying section and a second plasma conveying section which form a plasma conveying cavity, wherein the end connecting interface of the first plasma conveying section and the end connecting interface of the second plasma conveying section are inclined surface connecting interfaces, and the end, close to the first plasma conveying section, of the second plasma conveying section is provided with a wrapping section wrapping the first plasma conveying section.
3. The plasma atomizing device according to any one of claims 1 to 2, further comprising a first air inlet port communicating with the inert gas delivery chamber for introducing an inert gas into the inert gas delivery chamber; and/or the number of the groups of groups,
the plasma atomizing device further comprises a plasma generator in communication with the plasma delivery chamber.
4. The plasma atomizing apparatus according to any one of claims 1 to 2, characterized in that the plasma atomizing apparatus further comprises: the heat insulation part and the cooling part are arranged on the same side of the heat insulation part, and the cooling part is arranged on one side of the heat insulation part away from each sleeve;
the heat insulation piece is a heat insulation board, and the cooling piece is a water cooling board.
5. A device for producing a metal powder, comprising: an atomising chamber and a plasma atomising device as claimed in any one of claims 1 to 4, the plasma atomising device being located at an inlet of the atomising chamber.
6. The apparatus for producing metal powder according to claim 5, further comprising a gas-solid separation structure and a gas collection structure;
the gas inlet of the gas collecting structure is communicated with the gas-solid separation structure, and the outlet of the gas collecting structure is communicated with the atomizing chamber.
7. The apparatus for producing metal powder according to claim 6, wherein the gas collecting structure comprises: a gas collecting ring with an opening, the gas collecting ring being located within the atomizing chamber.
8. A method for producing a metal powder, characterized by being applied to the apparatus for producing a metal powder according to any one of claims 5 to 7; the preparation method of the metal powder comprises the following steps:
providing a melt to be atomized;
and atomizing the molten liquid to be atomized by using a plasma atomizing device to obtain atomized metal liquid drops, so that the atomized metal liquid drops form metal powder in the atomizing chamber.
9. The method according to claim 8, wherein when the apparatus for producing a metal powder is the apparatus for producing a metal powder according to claim 6, the molten liquid to be atomized is atomized by a plasma atomizing apparatus to obtain atomized metal droplets, so that after the atomized metal droplets form a metal powder in the atomizing chamber, the method further comprises:
blowing the atomized liquid drops into an atomization chamber by utilizing the gas collecting structure to obtain a mixture of metal powder and inert gas;
and separating the mixture of the metal powder and the inert gas by utilizing the gas-solid separation structure to obtain the metal powder.
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| CN116604023B (en) * | 2023-05-29 | 2023-11-21 | 中航迈特增材科技(北京)有限公司 | Atomizer and preparation method of silver powder for 3D printing |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2080433U (en) * | 1990-12-29 | 1991-07-10 | 清华大学 | Plasma spray pyrolytic device for preparing ceramic ultrafines |
| US5196049A (en) * | 1988-06-06 | 1993-03-23 | Osprey Metals Limited | Atomizing apparatus and process |
| CN105855560A (en) * | 2016-05-27 | 2016-08-17 | 广州纳联材料科技有限公司 | Spherical metal powder and preparation method thereof |
| JP2017145442A (en) * | 2016-02-16 | 2017-08-24 | ハード工業有限会社 | Metal powder production device |
| CN209288280U (en) * | 2018-10-30 | 2019-08-23 | 湖南天际智慧材料科技有限公司 | A kind of plasma powder by atomization equipment suitable for refractory metal |
| CN110181067A (en) * | 2019-07-08 | 2019-08-30 | 华南理工大学 | A kind of combined type gas-atomized powder equipment |
| WO2019178668A1 (en) * | 2018-03-17 | 2019-09-26 | Pyrogenesis Canada Inc. | Method and apparatus for the production of high purity spherical metallic powders from a molten feedstock |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8029595B2 (en) * | 2008-06-02 | 2011-10-04 | Nitto Denko Corporation | Method and apparatus of producing nanoparticles using nebulized droplet |
-
2020
- 2020-12-30 CN CN202011611964.1A patent/CN112743096B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5196049A (en) * | 1988-06-06 | 1993-03-23 | Osprey Metals Limited | Atomizing apparatus and process |
| CN2080433U (en) * | 1990-12-29 | 1991-07-10 | 清华大学 | Plasma spray pyrolytic device for preparing ceramic ultrafines |
| JP2017145442A (en) * | 2016-02-16 | 2017-08-24 | ハード工業有限会社 | Metal powder production device |
| CN105855560A (en) * | 2016-05-27 | 2016-08-17 | 广州纳联材料科技有限公司 | Spherical metal powder and preparation method thereof |
| WO2019178668A1 (en) * | 2018-03-17 | 2019-09-26 | Pyrogenesis Canada Inc. | Method and apparatus for the production of high purity spherical metallic powders from a molten feedstock |
| CN209288280U (en) * | 2018-10-30 | 2019-08-23 | 湖南天际智慧材料科技有限公司 | A kind of plasma powder by atomization equipment suitable for refractory metal |
| CN110181067A (en) * | 2019-07-08 | 2019-08-30 | 华南理工大学 | A kind of combined type gas-atomized powder equipment |
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