CN112427394A - Ultrasonic cleaning equipment for photovoltaic silicon wafers - Google Patents
Ultrasonic cleaning equipment for photovoltaic silicon wafers Download PDFInfo
- Publication number
- CN112427394A CN112427394A CN202011118153.8A CN202011118153A CN112427394A CN 112427394 A CN112427394 A CN 112427394A CN 202011118153 A CN202011118153 A CN 202011118153A CN 112427394 A CN112427394 A CN 112427394A
- Authority
- CN
- China
- Prior art keywords
- ultrasonic cleaning
- photovoltaic silicon
- pool
- silicon wafer
- cleaning equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004506 ultrasonic cleaning Methods 0.000 title claims abstract description 68
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 56
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 56
- 239000010703 silicon Substances 0.000 title claims abstract description 56
- 235000012431 wafers Nutrition 0.000 title description 34
- 239000002351 wastewater Substances 0.000 claims abstract description 33
- 239000007921 spray Substances 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 10
- 244000309464 bull Species 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 15
- 239000000428 dust Substances 0.000 description 8
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
- B08B3/123—Cleaning travelling work, e.g. webs, articles on a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses a photovoltaic silicon wafer ultrasonic cleaning device, which comprises a conveying device, wherein the conveying device comprises an inclined bracket, a roller arranged on the upper surface of the inclined bracket and a water leakage hole arranged on the inclined bracket, an ash cleaning spray pipe is arranged above the roller, an ultrasonic cleaning pool is arranged below the lower end of the conveying device, a heightening part is arranged above one side of the ultrasonic cleaning pool, which is far away from the conveying device, ultrasonic generators are arranged on two sides of the inside of the ultrasonic cleaning pool, a waste water pool is arranged below the conveying device, and the waste water pool and the ultrasonic cleaning pool are integrally formed. The invention is provided with the wastewater tank which can store cleaning wastewater and avoid the wastewater from accumulating at other positions.
Description
Technical Field
The invention relates to the technical field of ultrasonic cleaning, in particular to ultrasonic cleaning equipment for a photovoltaic silicon wafer.
Background
The photovoltaic is a solar photovoltaic power generation system for short, and is a novel power generation system which directly converts solar radiation energy into electric energy by utilizing the photovoltaic effect of a solar cell semiconductor material, wherein silicon wafers are strictly cleaned in the production of used semiconductor devices. At present, an ultrasonic cleaning machine is generally adopted to clean silicon wafers, a deionized water inlet and a deionized water outlet are formed in a cleaning tank, a certain amount of deionized water is kept in the cleaning tank, the deionized water is always in a flowing state, and the water consumption is large.
The photovoltaic silicon wafer is generally cleaned by adopting an ultrasonic cleaning device when being cleaned, but the volume is large, the direct feeding of an ordinary person into the cleaning equipment is troublesome, and no pre-cleaning device is arranged before cleaning.
Disclosure of Invention
The invention aims to provide ultrasonic cleaning equipment for photovoltaic silicon wafers, which solves the problems that in the prior art, the direct feeding of a common person into the cleaning equipment is troublesome, and a pre-cleaning device is not arranged before cleaning.
In order to achieve the purpose, the invention provides the following technical scheme: the utility model provides a photovoltaic silicon chip ultrasonic cleaning equipment, includes conveyor, conveyor includes the slope support, installs the cylinder and the hole that leaks of setting on the slope support at slope support upper surface, the top of cylinder is equipped with the deashing spray pipe, conveyor's lower extreme below is equipped with the ultrasonic cleaning pond, one side top that conveyor was kept away from in the ultrasonic cleaning pond is equipped with the portion of increaseing.
Preferably, ultrasonic generators are installed on two sides of the interior of the ultrasonic cleaning pool.
Preferably, a wastewater pond is arranged below the conveying device, and the wastewater pond and the ultrasonic cleaning pond are integrally formed.
Preferably, a material lifting device is arranged above the conveying device and the ultrasonic cleaning pool.
Preferably, the material lifting device comprises a rotating rod, a threaded portion is arranged outside the circumference of one side of the rotating rod, which is located on the ultrasonic cleaning pool, a nut is connected to the threaded portion in a threaded mode, and a telescopic cylinder is installed on the lower surface of the nut.
Preferably, the supports are installed at the two ends of the rotating rod, and the supports are rotatably connected with the rotating rod through bearings.
Preferably, the lower extreme of telescoping cylinder is fixed with the grabhook and presss from both sides, grabhook and press from both sides the clamp and include the mounting bracket, and the both sides of mounting bracket all install and press from both sides and get the jar.
Compared with the prior art, the invention has the beneficial effects that:
1. the ultrasonic cleaning device is provided with the inclined conveying device, the cleaning water pipe is arranged above the inclined conveying device, so that the ultrasonic cleaning device can be used for conveying and cleaning at the same time, the ultrasonic cleaning device can automatically fall into the ultrasonic cleaning tank, the whole process is automatic, and the cleaning is convenient.
2. The invention is provided with the wastewater tank which can store cleaning wastewater and avoid the wastewater from accumulating at other positions.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the construction of the present invention gripper;
fig. 3 is a partial structural schematic diagram of the present invention.
In the figure: 1. a support; 2. a material lifting device; 21. a rotating rod; 22. a nut; 23. a threaded portion; 24. a telescopic cylinder; 25. grabbing and clamping; 251. a mounting frame; 252. a clamping cylinder; 4. a soot cleaning spray pipe; 5. a conveying device; 51. a drum; 52. a tilting bracket; 53. a water leakage hole; 6. a wastewater tank; 7. an ultrasonic cleaning pool; 71. an ultrasonic generator; 72. a raised portion.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings of the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
Example one
Referring to fig. 1, in the embodiment of the present invention, an ultrasonic cleaning apparatus for photovoltaic silicon wafers includes a conveying device 5, the conveying device 5 includes an inclined bracket 52, a roller 51 installed on an upper surface of the inclined bracket 52, and water leakage holes 53 disposed on the inclined bracket 52, the photovoltaic silicon wafers are placed on the roller 51, and due to the self weight of the photovoltaic silicon wafers, the photovoltaic silicon wafers gradually move downward along the roller 51;
as shown in fig. 1, an ash removal spray pipe 4 is arranged above the roller 51, the ash removal spray pipe 4 is used for spraying water to further wash dust which is easy to remove on the photovoltaic silicon wafer, a waste water tank 6 is arranged below the conveying device 5, the waste water tank 6 is used for receiving waste water carrying dust, and a drain valve can be arranged on one side of the waste water tank 6;
continuing to refer to fig. 1, an ultrasonic cleaning tank 7 is arranged below the lower end of the conveying device 5, the wastewater tank 6 and the ultrasonic cleaning tank 7 are integrally formed, a height increasing part 72 is arranged above one side of the ultrasonic cleaning tank 7, which is far away from the conveying device 5, when the photovoltaic silicon wafer reaches the position of the ultrasonic cleaning tank 7, the photovoltaic silicon wafer enters the ultrasonic cleaning tank 7, and the height increasing part 72 can prevent the photovoltaic silicon wafer from crossing the ultrasonic cleaning tank 7;
continuing to refer to fig. 1, the ultrasonic generators 71 are installed on two sides inside the ultrasonic cleaning pool 7, and after the photovoltaic silicon wafer enters the ultrasonic cleaning pool 7, the cleaning liquid inside can generate ultrasonic waves so as to better clean the photovoltaic silicon wafer;
with reference to fig. 1, a material lifting device 2 is arranged above the conveying device 5 and the ultrasonic cleaning tank 7, and the material lifting device 2 can take out the photovoltaic silicon wafers cleaned in the ultrasonic cleaning tank 7 and transfer the photovoltaic silicon wafers to a required position;
referring to fig. 1 and 2, the lifting device 2 includes a rotating rod 21, a threaded portion 23 is arranged outside a circumference of one side of the rotating rod 21, which is located in the ultrasonic cleaning tank 7, a nut 22 is connected to the threaded portion 23 through a thread, a telescopic cylinder 24 is installed on a lower surface of the nut 22, a motor can drive the rotating rod 21 to rotate, the rotating rod 21 can drive the nut 22 to reciprocate, the telescopic cylinder 24 extends to enter the ultrasonic cleaning tank 7, a gripping clamp 25 is fixed at a lower end of the telescopic cylinder, the gripping clamp 25 includes a mounting frame 251, gripping cylinders 252 are installed on two sides of the mounting frame 251, and when the two gripping cylinders 252 extend simultaneously, the two gripping cylinders 252 can grip photovoltaic silicon wafers;
the support 1 is installed at the both ends of bull stick 21, and rotates through the bearing between support 1 and the bull stick 21 and be connected.
The working principle and the using process of the invention are as follows: when the device is used, the photovoltaic silicon slice is placed on the roller 51, the photovoltaic silicon slice gradually moves downwards along the roller 51 due to the dead weight of the photovoltaic silicon slice, the ash cleaning water spraying pipe 4 is used for spraying water, thereby flushing the easy-to-clean dust on the photovoltaic silicon wafer, a wastewater tank 6 is arranged below the conveying device 5, the wastewater tank 6 is used for receiving wastewater carrying dust, and a drain valve can be arranged at one side of the wastewater tank 6 for dispatching wastewater, when the photovoltaic silicon wafer reaches the position of the ultrasonic cleaning tank 7, the photovoltaic silicon chip gets into the inside of ultrasonic cleaning pond 7, increases the portion 72 and can avoid the photovoltaic silicon chip to cross ultrasonic cleaning pond 7, and the motor can drive bull stick 21 and rotate, and bull stick 21 can drive nut 22 reciprocating motion, and the telescopic cylinder 24 extension can get into the inside of ultrasonic cleaning pond 7, when two clamps of extension were got jar 252 and are extended simultaneously, can press from both sides and get the photovoltaic silicon chip.
Example two
Referring to fig. 1, in the embodiment of the present invention, an ultrasonic cleaning apparatus for photovoltaic silicon wafers includes a conveying device 5, the conveying device 5 includes an inclined bracket 52, a roller 51 installed on an upper surface of the inclined bracket 52, and water leakage holes 53 disposed on the inclined bracket 52, the photovoltaic silicon wafers are placed on the roller 51, and due to the self weight of the photovoltaic silicon wafers, the photovoltaic silicon wafers gradually move downward along the roller 51;
as shown in fig. 1, an ash removal spray pipe 4 is arranged above the roller 51, the ash removal spray pipe 4 is used for spraying water to further wash dust which is easy to remove on the photovoltaic silicon wafer, a waste water tank 6 is arranged below the conveying device 5, the waste water tank 6 is used for receiving waste water carrying dust, and a drain valve can be arranged on one side of the waste water tank 6;
continuing to refer to fig. 1, an ultrasonic cleaning tank 7 is arranged below the lower end of the conveying device 5, the wastewater tank 6 and the ultrasonic cleaning tank 7 are integrally formed, a height increasing part 72 is arranged above one side of the ultrasonic cleaning tank 7, which is far away from the conveying device 5, when the photovoltaic silicon wafer reaches the position of the ultrasonic cleaning tank 7, the photovoltaic silicon wafer enters the ultrasonic cleaning tank 7, and the height increasing part 72 can prevent the photovoltaic silicon wafer from crossing the ultrasonic cleaning tank 7;
continuing to refer to fig. 1, the ultrasonic generators 71 are installed on two sides inside the ultrasonic cleaning pool 7, and after the photovoltaic silicon wafer enters the ultrasonic cleaning pool 7, the cleaning liquid inside can generate ultrasonic waves so as to better clean the photovoltaic silicon wafer;
with reference to fig. 1, a material lifting device 2 is arranged above the conveying device 5 and the ultrasonic cleaning tank 7, and the material lifting device 2 can take out the photovoltaic silicon wafers cleaned in the ultrasonic cleaning tank 7 and transfer the photovoltaic silicon wafers to a required position.
The working principle and the using process of the invention are as follows: when using this device, through placing the photovoltaic silicon chip at cylinder 51, because the dead weight of photovoltaic silicon chip, the photovoltaic silicon chip can be along cylinder 51 downstream gradually, deashing spray pipe 4 is used for the blowout water, and then wash the easy clear dust on the photovoltaic silicon chip, conveyor 5's below is equipped with wastewater disposal basin 6, wastewater disposal basin 6 is used for accepting the waste water that carries the dust, and can be at a side-mounting drain valve of wastewater disposal basin 6, be used for dispatching waste water, when the photovoltaic silicon chip reachs the position of ultrasonic cleaning pond 7, the photovoltaic silicon chip gets into the inside that ultrasonic cleaning pond 7, it can avoid the photovoltaic silicon chip to cross ultrasonic cleaning pond 7 to increase portion 72.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (7)
1. The utility model provides a photovoltaic silicon chip ultrasonic cleaning equipment, includes conveyor (5), its characterized in that: conveyor (5) are including slope support (52), install cylinder (51) at slope support (52) upper surface and set up the hole (53) that leaks on slope support (52), the top of cylinder (51) is equipped with deashing spray pipe (4), the lower extreme below of conveyor (5) is equipped with ultrasonic cleaning pond (7), one side top that conveyor (5) were kept away from in ultrasonic cleaning pond (7) is equipped with and increases high portion (72).
2. The ultrasonic cleaning equipment for the photovoltaic silicon wafer according to claim 1, characterized in that: ultrasonic generators (71) are installed on two sides of the interior of the ultrasonic cleaning pool (7).
3. The ultrasonic cleaning equipment for the photovoltaic silicon wafer according to claim 1, characterized in that: the lower part of the conveying device (5) is provided with a wastewater pool (6), and the wastewater pool (6) and the ultrasonic cleaning pool (7) are integrally formed.
4. The ultrasonic cleaning equipment for the photovoltaic silicon wafer according to claim 1, characterized in that: and a material lifting device (2) is arranged above the conveying device (5) and the ultrasonic cleaning pool (7).
5. The ultrasonic cleaning equipment for the photovoltaic silicon wafer as claimed in claim 4, wherein: the material lifting device (2) comprises a rotating rod (21), a threaded portion (23) is arranged outside the circumference of one side, located on the ultrasonic cleaning pool (7), of the rotating rod (21), a nut (22) is connected to the threaded portion (23) in a threaded mode, and a telescopic cylinder (24) is installed on the lower surface of the nut (22).
6. The ultrasonic cleaning equipment for the photovoltaic silicon wafer according to claim 5, characterized in that: support (1) are installed at the both ends of bull stick (21), and rotate through the bearing between support (1) and bull stick (21) and be connected.
7. The ultrasonic cleaning equipment for the photovoltaic silicon wafer according to claim 5, characterized in that: the lower extreme of telescoping cylinder (24) is fixed with grabhook clamp (25), grabhook clamp (25) including mounting bracket (251), and the both sides of mounting bracket (251) all install and get jar (252) of pressing from both sides.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011118153.8A CN112427394A (en) | 2020-10-19 | 2020-10-19 | Ultrasonic cleaning equipment for photovoltaic silicon wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011118153.8A CN112427394A (en) | 2020-10-19 | 2020-10-19 | Ultrasonic cleaning equipment for photovoltaic silicon wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112427394A true CN112427394A (en) | 2021-03-02 |
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ID=74695651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011118153.8A Pending CN112427394A (en) | 2020-10-19 | 2020-10-19 | Ultrasonic cleaning equipment for photovoltaic silicon wafers |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112427394A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113707758A (en) * | 2021-07-16 | 2021-11-26 | 江苏晶旺新能源科技有限公司 | PERC battery cleaning and texturing system |
| CN115338225A (en) * | 2022-08-16 | 2022-11-15 | 常州工学院 | Waste photovoltaic module fluorine-containing back plate harmless treatment device |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1073095A2 (en) * | 1999-07-29 | 2001-01-31 | Kaneka Corporation | Method for cleaning photovoltaic module and cleaning apparatus |
| CN101276856A (en) * | 2008-04-30 | 2008-10-01 | 苏州纳米技术与纳米仿生研究所 | Process and equipment for etching and drying silicon solar cell |
| CN205762614U (en) * | 2016-07-04 | 2016-12-07 | 周恋东 | A kind of food cleaner |
| CN205949436U (en) * | 2016-06-30 | 2017-02-15 | 江西大杰新能源技术有限公司 | Silicon wafer clamp in silicon chip ultrasonic cleaning groove holds device |
| CN106618756A (en) * | 2017-02-22 | 2017-05-10 | 袁红 | Medical intelligent clamping manipulator |
| CN107159625A (en) * | 2017-07-17 | 2017-09-15 | 无锡市白马机械设备有限公司 | Ramp type cleaning case for component of machine Integral cleaning |
| CN108554922A (en) * | 2018-05-03 | 2018-09-21 | 浙江海顺新能源有限公司 | A kind of full-automatic silicon wafer cleaning device |
| CN208303457U (en) * | 2018-04-02 | 2019-01-01 | 南轩（天津）科技有限公司 | One kind having automatically feed Wafer Cleaning equipment |
-
2020
- 2020-10-19 CN CN202011118153.8A patent/CN112427394A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1073095A2 (en) * | 1999-07-29 | 2001-01-31 | Kaneka Corporation | Method for cleaning photovoltaic module and cleaning apparatus |
| CN101276856A (en) * | 2008-04-30 | 2008-10-01 | 苏州纳米技术与纳米仿生研究所 | Process and equipment for etching and drying silicon solar cell |
| CN205949436U (en) * | 2016-06-30 | 2017-02-15 | 江西大杰新能源技术有限公司 | Silicon wafer clamp in silicon chip ultrasonic cleaning groove holds device |
| CN205762614U (en) * | 2016-07-04 | 2016-12-07 | 周恋东 | A kind of food cleaner |
| CN106618756A (en) * | 2017-02-22 | 2017-05-10 | 袁红 | Medical intelligent clamping manipulator |
| CN107159625A (en) * | 2017-07-17 | 2017-09-15 | 无锡市白马机械设备有限公司 | Ramp type cleaning case for component of machine Integral cleaning |
| CN208303457U (en) * | 2018-04-02 | 2019-01-01 | 南轩（天津）科技有限公司 | One kind having automatically feed Wafer Cleaning equipment |
| CN108554922A (en) * | 2018-05-03 | 2018-09-21 | 浙江海顺新能源有限公司 | A kind of full-automatic silicon wafer cleaning device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113707758A (en) * | 2021-07-16 | 2021-11-26 | 江苏晶旺新能源科技有限公司 | PERC battery cleaning and texturing system |
| CN113707758B (en) * | 2021-07-16 | 2024-03-19 | 江苏晶旺新能源科技有限公司 | PERC battery washs system of making wool |
| CN115338225A (en) * | 2022-08-16 | 2022-11-15 | 常州工学院 | Waste photovoltaic module fluorine-containing back plate harmless treatment device |
| CN115338225B (en) * | 2022-08-16 | 2024-04-26 | 常州工学院 | Harmless treatment device for fluorine-containing backboard of waste photovoltaic module |
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Application publication date: 20210302 |