CN112363460A - Process for manufacturing far infrared electrothermal film - Google Patents
Process for manufacturing far infrared electrothermal film Download PDFInfo
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- CN112363460A CN112363460A CN201911313418.7A CN201911313418A CN112363460A CN 112363460 A CN112363460 A CN 112363460A CN 201911313418 A CN201911313418 A CN 201911313418A CN 112363460 A CN112363460 A CN 112363460A
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- Prior art keywords
- electrothermal film
- far infrared
- infrared electrothermal
- mixed solution
- manufacturing process
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 46
- 239000007788 liquid Substances 0.000 claims abstract description 29
- 239000011259 mixed solution Substances 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 26
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000007747 plating Methods 0.000 claims abstract description 11
- 229910052709 silver Inorganic materials 0.000 claims abstract description 11
- 239000004332 silver Substances 0.000 claims abstract description 11
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 32
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 16
- 239000008367 deionised water Substances 0.000 claims description 16
- 229910021641 deionized water Inorganic materials 0.000 claims description 16
- 229910021389 graphene Inorganic materials 0.000 claims description 16
- 229910003437 indium oxide Inorganic materials 0.000 claims description 16
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 15
- 239000011159 matrix material Substances 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000002994 raw material Substances 0.000 claims description 10
- 239000000919 ceramic Substances 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 5
- 238000004080 punching Methods 0.000 claims description 5
- 230000000694 effects Effects 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 230000005855 radiation Effects 0.000 description 3
- 230000005653 Brownian motion process Effects 0.000 description 1
- 206010003246 arthritis Diseases 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005537 brownian motion Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000036449 good health Effects 0.000 description 1
- 230000004060 metabolic process Effects 0.000 description 1
- 238000000554 physical therapy Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
- G05B19/4185—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by the network communication
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/31—From computer integrated manufacturing till monitoring
- G05B2219/31088—Network communication between supervisor and cell, machine group
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Abstract
The invention discloses a process for manufacturing a far infrared electrothermal film, which relates to the technical field of electrothermal films, and the specific process for manufacturing the electrothermal film comprises the following steps: (1) preparing a mixed solution; (2) heating the substrate; (3) smearing the mixed solution; (4) attaching a conductive layer; (5) and (5) plating silver electrodes. The far infrared electrothermal film prepared by the process flow has the advantages of high temperature rise speed and high heating efficiency, and meanwhile, the thickness of the electrothermal film can be increased and the heating effect of the electrothermal film can be improved by the coated multilayer mixed liquid, so that the electrothermal film can radiate far infrared rays more stably.
Description
Technical Field
The invention relates to the technical field of electrothermal films, in particular to a process for manufacturing a far infrared electrothermal film.
Background
The electrothermal film is divided into high-temperature and low-temperature electrothermal films. The high-temperature electrothermal film is generally used for electronic appliances, military affairs and the like, and is produced by the present science and technology. The electrothermal film heating system is different from a point heating system represented by a radiator, an air conditioner and a radiator and a line heating system represented by a heating cable, and is a low-carbon heating high-tech product researched and developed by adopting the modern aerospace technology in the field of surface heating. In recent years, the electrothermal film has attracted more and more attention because of its advantages of high electrothermal conversion efficiency, long service life, and emitting far infrared rays.
The heating principle of the electrothermal film is as follows: under the action of an electric field, molecular groups in the heating body generate Brownian motion, violent collision and friction are generated among molecules, and generated heat energy is mainly transmitted outwards in the form of far infrared radiation and auxiliary convection. According to scientific research, the far infrared rays with the wavelength of 8-14um are the same as the wave band radiated by the human body, and the far infrared rays with the same wavelength have good physical therapy effect on the human body. The electrothermal film can generate a large amount of far infrared rays when heating, and has good health care effects on rheumatism, arthritis, balance of pH value of a body, promotion of metabolism and the like.
However, the far infrared electrothermal film on the market at present has complex manufacturing process, more manufacturing raw materials, higher production and processing cost and longer manufacturing period, and the far infrared electrothermal film manufactured by the existing manufacturing process has slower heating speed and lower heating efficiency in the use process, and the far infrared radiation wavelength is unstable, thus being incapable of meeting the requirements of the existing market. Therefore, the technical personnel in the field provide a manufacturing process of the far infrared electrothermal film, so as to solve the problems in the background technology.
Disclosure of Invention
The invention aims to provide a manufacturing process of a far infrared electrothermal film, which aims to solve the problems that the far infrared electrothermal film in the current market proposed in the background technology is complex in manufacturing process, more in manufacturing raw materials, higher in production and processing cost and longer in manufacturing period, and the far infrared electrothermal film manufactured by adopting the current manufacturing process flow is low in heating speed and heating efficiency and unstable in far infrared radiation wavelength in the using process and cannot meet the requirements of the current market.
In order to achieve the purpose, the invention provides the following technical scheme: a process for manufacturing a far infrared electrothermal film comprises the following steps:
(1) preparing a mixed solution: mixing graphene, tin dioxide and indium oxide according to a certain proportion, adding deionized water, and uniformly modulating to obtain a mixed solution;
(2) heating a matrix: heating the high-temperature-resistant insulating base plate substrate;
(3) smearing mixed liquid: smearing the prepared mixed solution on the heated insulating bottom plate matrix, and then cooling;
(4) attaching a conductive layer: attaching a layer of conductive heating material on the insulating bottom plate substrate coated with the mixed liquid;
(5) silver plating electrode: and (3) plating silver at two ends of the conductive heating material and arranging electrodes to obtain the product.
As a further scheme of the invention: the mass percentage of each raw material component of the mixed solution in the step (1) is 50-65% of graphene, 10-20% of tin dioxide, 5-10% of indium oxide and 15-25% of deionized water.
As a still further scheme of the invention: the mass percentages of the raw material components of the mixed solution in the step (1) are 50% of graphene, 10% of tin dioxide, 5% of indium oxide and 15% of deionized water.
As a still further scheme of the invention: the mass percentages of the raw material components of the mixed solution in the step (1) are 65% of graphene, 20% of tin dioxide, 10% of indium oxide and 25% of deionized water.
As a still further scheme of the invention: the mass percentages of the raw material components of the mixed solution in the step (1) are 60% of graphene, 15% of stannic oxide, 7% of indium oxide and 20% of deionized water.
As a still further scheme of the invention: and (3) heating the insulating base plate substrate in the step (2) to 1000-1200 ℃.
As a still further scheme of the invention: the insulating baseboard matrix in the step (2) is made of any one of insulating ceramics, glass or insulating metal.
As a still further scheme of the invention: and (4) in the step (3), after the insulating bottom plate substrate coated with the mixed liquid for the first time is cooled, coating the mixed liquid again for cooling, and coating the mixed liquid for at least three times by adopting the method.
As a still further scheme of the invention: the conductive heating material in the step (4) is a far infrared electrothermal film.
As a still further scheme of the invention: the electrode in the step (5) can be made by punching a hole in the manufactured electrothermal film and inserting a metal conductor, or can be formed by screwing a screw.
Compared with the prior art, the invention has the beneficial effects that: the invention discloses a process for manufacturing a far infrared electrothermal film, wherein the manufactured far infrared electrothermal film has the advantages of high temperature rise speed and high heating efficiency, and meanwhile, the thickness of the electrothermal film can be increased and the heating effect of the electrothermal film can be improved through the coated multilayer mixed liquid, so that the electrothermal film can radiate far infrared rays more stably.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the embodiment of the present invention, the first and second substrates,
example 1
A process for manufacturing a far infrared electrothermal film comprises the following steps:
(1) preparing a mixed solution: mixing graphene, tin dioxide and indium oxide according to a certain proportion, adding deionized water, and uniformly modulating to obtain a mixed solution;
(2) heating a matrix: heating the high-temperature-resistant insulating base plate substrate;
(3) smearing mixed liquid: smearing the prepared mixed solution on the heated insulating bottom plate matrix, and then cooling;
(4) attaching a conductive layer: attaching a layer of conductive heating material on the insulating bottom plate substrate coated with the mixed liquid;
(5) silver plating electrode: and (3) plating silver at two ends of the conductive heating material and arranging electrodes to obtain the product.
Further, the mixed solution in the step (1) comprises 50% of graphene, 10% of tin dioxide, 5% of indium oxide and 15% of deionized water by mass.
Still further, the insulating baseboard substrate in the step (2) is heated to 1000 ℃.
Still further, the insulating baseboard substrate in the step (2) is made of any one of insulating ceramic, glass or insulating metal.
And (3) further, after the insulating bottom plate substrate coated with the mixed liquid for the first time is cooled, coating the mixed liquid again for cooling, and coating the mixed liquid for at least three times by adopting the method.
And (3) further, the conductive heating material in the step (4) is a far infrared electrothermal film.
Still further, the electrode in step (5) can be made by punching a hole in the finished electrothermal film and inserting a metal conductor, or by screwing a screw to form the electrode.
Example 2
A process for manufacturing a far infrared electrothermal film comprises the following steps:
(1) preparing a mixed solution: mixing graphene, tin dioxide and indium oxide according to a certain proportion, adding deionized water, and uniformly modulating to obtain a mixed solution;
(2) heating a matrix: heating the high-temperature-resistant insulating base plate substrate;
(3) smearing mixed liquid: smearing the prepared mixed solution on the heated insulating bottom plate matrix, and then cooling;
(4) attaching a conductive layer: attaching a layer of conductive heating material on the insulating bottom plate substrate coated with the mixed liquid;
(5) silver plating electrode: and (3) plating silver at two ends of the conductive heating material and arranging electrodes to obtain the product.
Further, the mixed solution in the step (1) comprises 65% of graphene, 20% of tin dioxide, 10% of indium oxide and 25% of deionized water by mass.
Still further, the insulating base plate substrate in the step (2) is heated to 1200 ℃.
Still further, the insulating baseboard substrate in the step (2) is made of any one of insulating ceramic, glass or insulating metal.
And (3) further, after the insulating bottom plate substrate coated with the mixed liquid for the first time is cooled, coating the mixed liquid again for cooling, and coating the mixed liquid for at least three times by adopting the method.
And (3) further, the conductive heating material in the step (4) is a far infrared electrothermal film.
Still further, the electrode in step (5) can be made by punching a hole in the finished electrothermal film and inserting a metal conductor, or by screwing a screw to form the electrode.
Example 3
A process for manufacturing a far infrared electrothermal film comprises the following steps:
(1) preparing a mixed solution: mixing graphene, tin dioxide and indium oxide according to a certain proportion, adding deionized water, and uniformly modulating to obtain a mixed solution;
(2) heating a matrix: heating the high-temperature-resistant insulating base plate substrate;
(3) smearing mixed liquid: smearing the prepared mixed solution on the heated insulating bottom plate matrix, and then cooling;
(4) attaching a conductive layer: attaching a layer of conductive heating material on the insulating bottom plate substrate coated with the mixed liquid;
(5) silver plating electrode: and (3) plating silver at two ends of the conductive heating material and arranging electrodes to obtain the product.
Further, the mixed solution in the step (1) comprises 60% of graphene, 15% of tin dioxide, 7% of indium oxide and 20% of deionized water by mass percent.
Still further, the insulating base plate substrate in the step (2) is heated to 1100 ℃.
Still further, the insulating baseboard substrate in the step (2) is made of any one of insulating ceramic, glass or insulating metal.
And (3) further, after the insulating bottom plate substrate coated with the mixed liquid for the first time is cooled, coating the mixed liquid again for cooling, and coating the mixed liquid for at least three times by adopting the method.
And (3) further, the conductive heating material in the step (4) is a far infrared electrothermal film.
Still further, the electrode in step (5) can be made by punching a hole in the finished electrothermal film and inserting a metal conductor, or by screwing a screw to form the electrode.
In conclusion, the far infrared electrothermal film prepared by the invention has the advantages of high temperature rise speed and high heating efficiency, and meanwhile, the thickness of the electrothermal film can be increased and the heating effect of the electrothermal film can be improved through the coated multilayer mixed liquid, so that the electrothermal film can radiate far infrared rays more stably.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (10)
1. A manufacturing process of a far infrared electrothermal film is characterized by comprising the following steps:
(1) preparing a mixed solution: mixing graphene, tin dioxide and indium oxide according to a certain proportion, adding deionized water, and uniformly modulating to obtain a mixed solution;
(2) heating a matrix: heating the high-temperature-resistant insulating base plate substrate;
(3) smearing mixed liquid: smearing the prepared mixed solution on the heated insulating bottom plate matrix, and then cooling;
(4) attaching a conductive layer: attaching a layer of conductive heating material on the insulating bottom plate substrate coated with the mixed liquid;
(5) silver plating electrode: and (3) plating silver at two ends of the conductive heating material and arranging electrodes to obtain the product.
2. The manufacturing process of the far infrared electrothermal film according to claim 1, wherein the raw material components of the mixed solution in the step (1) comprise, by mass, 50-65% of graphene, 10-20% of tin dioxide, 5-10% of indium oxide and 15-25% of deionized water.
3. The manufacturing process of the far infrared electrothermal film according to claim 2, wherein the raw material components of the mixed solution in the step (1) comprise, by mass, 50% of graphene, 10% of tin dioxide, 5% of indium oxide and 15% of deionized water.
4. The manufacturing process of the far infrared electrothermal film according to claim 2, wherein the raw material components of the mixed liquid in the step (1) comprise, by mass, 65% of graphene, 20% of tin dioxide, 10% of indium oxide and 25% of deionized water.
5. The manufacturing process of the far infrared electrothermal film according to claim 2, wherein the raw material components of the mixed solution in the step (1) comprise, by mass, 60% of graphene, 15% of tin dioxide, 7% of indium oxide and 20% of deionized water.
6. The manufacturing process of a far infrared electrothermal film according to claim 1, wherein the insulating base substrate in the step (2) is heated to 1000-1200 ℃.
7. The manufacturing process of a far infrared electrothermal film according to claim 1, wherein the insulating base plate substrate in the step (2) is made of any one of insulating ceramics, glass or insulating metal.
8. The process according to claim 1, wherein the mixed liquid is applied again after the insulating base substrate is cooled after the mixed liquid is applied for the first time in the step (3), and the mixed liquid is applied for cooling at least three times.
9. The manufacturing process of a far infrared electrothermal film according to claim 1, wherein the conductive heating material in the step (4) is a far infrared electrothermal film.
10. The process of claim 1, wherein the electrodes of step (5) are made by punching holes in the finished electrothermal film and inserting metal conductors, or by screwing screws to form electrodes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911313418.7A CN112363460A (en) | 2019-12-19 | 2019-12-19 | Process for manufacturing far infrared electrothermal film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911313418.7A CN112363460A (en) | 2019-12-19 | 2019-12-19 | Process for manufacturing far infrared electrothermal film |
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| CN112363460A true CN112363460A (en) | 2021-02-12 |
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| CN201911313418.7A Pending CN112363460A (en) | 2019-12-19 | 2019-12-19 | Process for manufacturing far infrared electrothermal film |
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| CN109803458A (en) * | 2019-01-25 | 2019-05-24 | 安徽中烟工业有限责任公司 | It is a kind of for heating the infrared electrothermal film and preparation method thereof for the tobacco product that do not burn |
| CN109890094A (en) * | 2019-03-15 | 2019-06-14 | 西安交通大学 | A kind of high temperature exothermic film and preparation method thereof |
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2019
- 2019-12-19 CN CN201911313418.7A patent/CN112363460A/en active Pending
Patent Citations (10)
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| CN103035916A (en) * | 2012-11-28 | 2013-04-10 | 华中科技大学 | Preparation method of nano tin dioxide-graphene composite material and product thereof |
| CN103338538A (en) * | 2013-07-19 | 2013-10-02 | 南京中脉科技控股有限公司 | Graphene radiation heating film and preparation method and application thereof |
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Application publication date: 20210212 |