CN112147722A - Antireflection film for photovoltaic glass and preparation method and application thereof - Google Patents
Antireflection film for photovoltaic glass and preparation method and application thereof Download PDFInfo
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2296—Oxides; Hydroxides of metals of zinc
Abstract
The invention discloses an antireflection film for photovoltaic glass, which sequentially comprises a rare earth antireflection film layer and a protective film layer from bottom to top; the preparation method comprises the following steps: the method comprises the following steps: dissolving heptadecafluorodecyltrimethoxysilane, ethyl orthosilicate, polyoxyethylene mono-4-octylphenyl ether, sodium fluoride and nano zinc oxide in a solvent, and stirring at 40 ℃ for 20min to obtain sol; step two: adding a silane coupling agent and an acid catalyst into the sol obtained in the step one, and heating to 100-120 ℃ to react for 10-12h to obtain target sol; step three: and coating the obtained sol on a rare earth antireflection film, curing and drying to obtain the antireflection film for the photovoltaic glass. The antireflection film for the photovoltaic glass has excellent optical performance, excellent environmental resistance and excellent chemical and mechanical stability.
Description
Technical Field
The invention belongs to the technical field of optics, and particularly relates to an antireflection film for photovoltaic glass, and a preparation method and application thereof.
Background
To date, the use of fossil energy has prompted human economic development and social progress. However, the limited reserves and non-renewable disadvantages of fossil energy limit its utilization, while the use of fossil energy causes serious ecological problems, haze and global warming effect due to the large emission of greenhouse gases, which are not conducive to the sustainable development of human society. Solar energy is the most widely used clean energy with the largest reserve at present, and in a broad sense, renewable energy sources such as wind energy and water energy and fossil energy belong to solar energy because the generation and the utilization of the renewable energy sources depend on the irradiation of sunlight on the earth. The solar energy utilization technology is mainly divided into a photo-thermal technology and a photovoltaic technology. The solar water heater which is widely applied at present belongs to one of photo-thermal technologies, and the solar photovoltaic power generation belongs to one of photovoltaic technologies. Although the development of photothermal technology has been competitive with traditional energy sources, photovoltaic technology has much more promising prospects from the technical advancement point of view.
Photovoltaic power generation (PV) technology is considered to be clean and renewable power generation technology. Solar cells are solid-state electrical devices that convert solar energy directly into electrical energy through the photovoltaic effect. However, the low photoelectric conversion efficiency of the solar cell limits the application of the photovoltaic technology, and according to the latest research, the optimal conversion efficiency of the silicon solar cell reaches 22.34%, which is a breakthrough of the silicon solar cell. Crystalline silicon is the most important material of solar cells, but the common problem is that silicon doping with high Refractive Index (RI) and more than 30% of incident light is reflected from the surface of crystalline silicon, causing reflection loss at the surface or interface, which negatively affects the energy conversion efficiency of solar cells and greatly reduces the solar photoelectric conversion efficiency. Therefore, it is very important to reduce the light reflection of the solar cell surface, and scientists adopt the methods of adding an anti-reflection coating layer in the middle, embedding metal nano particles and constructing micro texture and photonic crystal structure, etc. to reduce the reflection.
Glass is one of the most important optical substrates, with a reflection loss of about 4% per air/glass interface, although not as severe as silicon wafers, still degrading the performance of the optical device, especially when multiple elements are involved. Research has now demonstrated that the use of glass with an antireflection film as a cover for a solar collector can improve the photoelectric conversion efficiency of a photovoltaic system. When we calculate the annual energy output efficiency in a solar heating apparatus (assuming a fluid temperature of 100 ℃), the annual energy output efficiency can be increased by about 20% if an antireflection film is used on the solar glass. However, after long-term use, the surface of the antireflection film is adhered with dirt, which reduces the transmittance of the photovoltaic glass. In order to meet the outdoor use requirement and prolong the service life of the photovoltaic glass, the antireflection film generally needs to have better hydrophilic or hydrophobic performance so as to prevent dust, moisture and the like from accumulating on the module. For a dry environment, the glass surface itself should have a nanostructure so that dust does not deposit on the surface and allow water diffusion. Therefore, the use of antireflective coatings with versatility in photovoltaic devices is of great value.
Disclosure of Invention
Aiming at the technical problems, the invention aims to provide an antireflection film for photovoltaic glass and a preparation method thereof.
In order to achieve the technical purpose, the invention adopts the following technical scheme:
an antireflection film for photovoltaic glass comprises a rare earth antireflection film layer and a protective film layer from bottom to top in sequence;
and the protective film layer is obtained by spraying protective paint on the rare earth antireflection film layer and drying.
The protective coating comprises the following raw materials in parts by weight: 50-100 parts of a solvent; 10-30 parts of heptadecafluorodecyltrimethoxysilane; 30-50 parts of ethyl orthosilicate; 10-20 parts of polyoxyethylene mono-4-octyl phenyl ether; 10-15 parts of a silane coupling agent; 1-5 parts of an acidic catalyst; 1-5 parts of nano zinc oxide; 5-10 parts of sodium fluoride;
the solvent is one of methanol and ethanol; the acid catalyst is nitric acid; the silane coupling agent is one of vinyltriethoxysilane, vinyltrimethoxysilane and vinyltris (beta-methoxyethoxy) silane.
The rare earth antireflection film layer is prepared by the following steps:
1) cleaning of the glass substrate: firstly, carrying out ultrasonic treatment on a glass substrate in absolute ethyl alcohol for 10min, then carrying out ultrasonic treatment in deionized water for 10min, and drying;
2) performing radio frequency magnetron sputtering coating: transferring a glass substrate into a sample chamber of a radio frequency instrument by taking rare earth oxide as a target, closing a substrate baffle, vacuumizing to 0.0008Pa, introducing argon at a fixed volume flow, setting working parameters of the radio frequency instrument, pre-sputtering for 5min after setting is finished, opening the substrate baffle after radio frequency power is stabilized, and starting sputtering to deposit a rare earth antireflection film;
3) annealing the rare earth antireflection film: transferring the prepared rare earth antireflection film into an annealing furnace, controlling the volume flow of argon, setting the annealing temperature, and carrying out high-temperature annealing treatment to obtain a rare earth antireflection film layer;
wherein the volume flow of argon in the step 2) is 20 mL/min; the working parameters of the radio frequency instrument are as follows: the working air pressure of the radio frequency instrument is 0.5-2.0Pa, and the sputtering power is 20-50W; the rare earth oxide is Y2O3、Yb2O3、Er2O3One of (1); the volume flow of argon in the step 3) is 5L/min; the annealing temperature is raised to 600-1000 ℃ at the speed of 20 ℃/min and kept for 20 min.
A preparation method of an antireflection film for photovoltaic glass comprises the following steps:
the method comprises the following steps: dissolving heptadecafluorodecyltrimethoxysilane, ethyl orthosilicate, polyoxyethylene mono-4-octylphenyl ether, sodium fluoride and nano zinc oxide in a solvent, and stirring at 40 ℃ for 20min to obtain sol;
step two: adding a silane coupling agent and an acid catalyst into the sol obtained in the step one, heating to 100-120 ℃, reacting for 10-12h, and cooling to obtain the protective coating;
step three: and spraying the obtained protective coating on a rare earth antireflection film layer, curing and drying to obtain the antireflection film for the photovoltaic glass.
Wherein the drying temperature in the third step is 50-70 ℃.
The thickness of the protective film layer is 5-30 nm.
The invention also provides application of the antireflection film for the photovoltaic glass to solar photovoltaic glass.
The invention has the following beneficial effects:
(1) in the antireflection film for the photovoltaic glass, the rare earth antireflection film layer has good optical transmission performance, the rare earth antireflection film layer prepared by radio frequency magnetron sputtering coating can form a multilayer antireflection film during high-temperature annealing treatment, the internal stress of the rare earth antireflection film layer is low, the bonding force with a substrate is good, the rare earth antireflection film layer added with the primary color of the rare earth has a wider absorption waveband, and the utilization efficiency of solar energy can be effectively improved.
(2) The protective film layer sprayed on the rare earth antireflection film layer is tightly combined with the rare earth antireflection film layer under the action of a coupling agent, an acid catalyst and ether; the selected coating components endow the film with excellent hydrophobic property and self-cleaning property, and can effectively improve the environmental resistance of the rare earth antireflection film layer; the addition of the nano-particles and inorganic substances is used for improving the wear resistance of the film. Therefore, the antireflection film for the photovoltaic glass provided by the invention has excellent optical performance, excellent environmental resistance and chemical and mechanical stability.
Drawings
FIG. 1 is a contact angle test chart of the antireflection film obtained in example 1 and the antireflection film obtained in comparative example 1;
FIG. 2 is a graph showing the transmittance at a wavelength of 300 to 1100nm of an antireflection film prepared in example 5;
FIG. 3 is a graph showing the reflectance of an antireflection film prepared in example 5 at a wavelength in the range of 300 to 1100 nm.
Detailed Description
The principles and features of this invention are described below in conjunction with the following drawings, which are set forth by way of illustration only and are not intended to limit the scope of the invention. The examples, in which specific conditions are not specified, were conducted under conventional conditions or conditions recommended by the manufacturer. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products available commercially.
Example 1
An antireflection film for photovoltaic glass comprises a rare earth antireflection film layer and a protective film layer from bottom to top, wherein the protective film layer is obtained by spraying a protective coating on the rare earth antireflection film layer and drying.
The protective coating comprises the following raw materials in parts by weight: 50 parts of methanol; 10 parts of heptadecafluorodecyltrimethoxysilane; 30 parts of ethyl orthosilicate; 10 parts of polyoxyethylene mono-4-octyl phenyl ether; 10 parts of vinyl triethoxysilane; 1 part of nitric acid with the mass fraction of 68 percent; 1 part of nano zinc oxide; and 5 parts of sodium fluoride.
A preparation method of an antireflection film for photovoltaic glass comprises the following steps:
the method comprises the following steps: according to the mixture ratio, dissolving heptadecafluorodecyltrimethoxysilane, ethyl orthosilicate, polyoxyethylene mono-4-octylphenyl ether, sodium fluoride and nano zinc oxide in a solvent methanol, and stirring for 20min at 40 ℃ to obtain sol;
step two: adding vinyltriethoxysilane and nitric acid into the sol obtained in the first step according to the proportion, heating to 100 ℃, reacting for 12 hours, and cooling to obtain a protective coating;
step three: carrying out ultrasonic treatment on the glass substrate in absolute ethyl alcohol for 10min, then carrying out ultrasonic treatment in deionized water for 10min, and drying; followed by a rare earth oxide Y2O3As a target, transferring a glass substrate into a sample chamber of a radio frequency instrument, closing a substrate baffle, vacuumizing to 0.0008Pa, introducing argon at a volume flow of 20mL/min, setting the pressure of the radio frequency instrument to be 0.5Pa, sputtering power to be 20W, pre-sputtering for 5min after setting, opening the substrate baffle after stabilizing the radio frequency power, and starting sputtering and depositing a rare earth antireflection film; secondly, transferring the prepared rare earth antireflection film into an annealing furnace, controlling the volume flow of argon to be 5L/min, heating to 600 ℃ at the speed of 20 ℃/min, keeping for 20min, and carrying out high-temperature annealing treatment to obtain a rare earth antireflection film layer; and finally, spraying the obtained protective coating on a rare earth antireflection film to form a protective film with the thickness of about 15nm, and drying at 55 ℃ after curing to obtain the antireflection film for the photovoltaic glass.
Example 2
An antireflection film for photovoltaic glass comprises a rare earth antireflection film layer and a protective film layer from bottom to top in sequence;
the anti-reflection protective coating comprises the following raw materials in parts by weight: 60 parts of ethanol; 15 parts of heptadecafluorodecyltrimethoxysilane; 35 parts of ethyl orthosilicate; 12 parts of polyoxyethylene mono-4-octyl phenyl ether; 11 parts of vinyl trimethoxy silane; 2 parts of nitric acid with the mass fraction of 68 percent; 2 parts of nano zinc oxide; 6 parts of sodium fluoride;
a preparation method of an antireflection film for photovoltaic glass comprises the following steps:
the method comprises the following steps: according to the mixture ratio, dissolving heptadecafluorodecyltrimethoxysilane, ethyl orthosilicate, polyoxyethylene mono-4-octylphenyl ether, sodium fluoride and nano zinc oxide in ethanol, and stirring for 20min at 40 ℃ to obtain sol;
step two: adding vinyl trimethoxy silane and nitric acid into the sol obtained in the first step according to the proportion, and heating to 110 ℃ to react for 11h to obtain a protective coating;
step three: firstly, carrying out ultrasonic treatment on a glass substrate in absolute ethyl alcohol for 10min, then carrying out ultrasonic treatment in deionized water for 10min, and drying; then rare earth oxide Er2O3As a target, transferring a glass substrate into a sample chamber of a radio frequency instrument, closing a substrate baffle, vacuumizing to 0.0008Pa, introducing argon at a volume flow of 20mL/min, setting the pressure of the radio frequency instrument to be 1.0Pa, sputtering power to be 30W, pre-sputtering for 5min after setting, opening the substrate baffle after stabilizing the radio frequency power, and starting sputtering and depositing a rare earth antireflection film; transferring the prepared rare earth antireflection film into an annealing furnace, controlling the volume flow of argon to be 5L/min, heating to 700 ℃ at the speed of 20 ℃/min, keeping the temperature for 20min, and carrying out high-temperature annealing treatment to obtain the rare earth antireflection film; and finally, spraying the obtained protective coating on a rare earth antireflection film to form a protective film with the thickness of about 20nm, and drying at 70 ℃ after curing to obtain the antireflection film for the photovoltaic glass.
Example 3
An antireflection film for photovoltaic glass comprises a rare earth antireflection film layer and a protective film layer from bottom to top in sequence;
the anti-reflection protective coating comprises the following raw materials in parts by weight: 70 parts of ethanol; 20 parts of heptadecafluorodecyltrimethoxysilane; 40 parts of tetraethoxysilane; 16 parts of polyoxyethylene mono-4-octyl phenyl ether; 13 parts of vinyl tri (beta-methoxyethoxy) silane; 3 parts of nitric acid with the mass fraction of 68 percent; 3 parts of nano zinc oxide; 7 parts of sodium fluoride;
a preparation method of an antireflection film for photovoltaic glass comprises the following steps:
the method comprises the following steps: according to the mixture ratio, dissolving heptadecafluorodecyltrimethoxysilane, ethyl orthosilicate, polyoxyethylene mono-4-octylphenyl ether, sodium fluoride and nano zinc oxide in ethanol, and stirring for 20min at 40 ℃ to obtain sol;
step two: adding vinyl tri (beta-methoxyethoxy) silane and nitric acid into the sol obtained in the step one according to the proportion, heating to 120 ℃, reacting for 10 hours, and cooling to obtain a protective coating;
step three: firstly, carrying out ultrasonic treatment on a glass substrate for 10min, then carrying out ultrasonic treatment in deionized water for 10min, and drying; then using rare earth oxide Yb2O3As a target, transferring a glass substrate into a sample chamber of a radio frequency instrument, closing a substrate baffle, vacuumizing to 0.0008Pa, introducing argon at a volume flow of 20mL/min, setting the pressure of the radio frequency instrument to be 2.0Pa, sputtering power to be 40W, pre-sputtering for 5min after setting, opening the substrate baffle after stabilizing the radio frequency power, and starting sputtering and depositing a rare earth antireflection film; then transferring the prepared rare earth antireflection film into an annealing furnace, controlling the volume flow of argon to be 5L/min, heating to 800 ℃ at the speed of 20 ℃/min, keeping the temperature for 20min, and carrying out high-temperature annealing treatment to obtain the rare earth antireflection film; and finally, spraying the obtained protective coating on a rare earth antireflection film to form a protective film with the thickness of about 8nm, curing, and drying in a dryer at 50 ℃ to obtain the antireflection film for the photovoltaic glass.
Example 4
An antireflection film for photovoltaic glass comprises a rare earth antireflection film layer and a protective film layer from bottom to top in sequence;
the anti-reflection protective coating comprises the following raw materials in parts by weight: 80 parts of ethanol; 25 parts of heptadecafluorodecyltrimethoxysilane; 45 parts of tetraethoxysilane; 18 parts of polyoxyethylene mono-4-octyl phenyl ether; 14 parts of vinyl tri (beta-methoxyethoxy) silane; 4 parts of nitric acid with the mass fraction of 68 percent; 4 parts of nano zinc oxide; 8 parts of sodium fluoride;
a preparation method of an antireflection film for photovoltaic glass comprises the following steps:
the method comprises the following steps: according to the mixture ratio, dissolving heptadecafluorodecyltrimethoxysilane, ethyl orthosilicate, polyoxyethylene mono-4-octylphenyl ether, sodium fluoride and nano zinc oxide in ethanol, and stirring for 20min at 40 ℃ to obtain sol;
step two: adding vinyl tri (beta-methoxyethoxy) silane and nitric acid into the sol obtained in the step one according to the proportion, heating to 120 ℃, reacting for 10 hours, and cooling to obtain a protective coating;
step three: firstly, carrying out ultrasonic treatment on a glass substrate for 10min, then carrying out ultrasonic treatment in deionized water for 10min, and drying; then rare earth oxide Y2O3As a target, transferring a glass substrate into a sample chamber of a radio frequency instrument, closing a substrate baffle, vacuumizing to 0.0008Pa, introducing argon at a volume flow of 20mL/min, setting the pressure of the radio frequency instrument to be 2.0Pa, sputtering power to be 50W, pre-sputtering for 5min after setting, opening the substrate baffle after stabilizing the radio frequency power, and starting sputtering and depositing a rare earth antireflection film; then transferring the prepared rare earth antireflection film into an annealing furnace, controlling the volume flow of argon to be 5L/min, heating to 900 ℃ at the speed of 20 ℃/min, keeping the temperature for 20min, and carrying out high-temperature annealing treatment to obtain the rare earth antireflection film; and finally, spraying the obtained protective coating on a rare earth antireflection film to form a protective film with the thickness of about 30nm, and drying at 60 ℃ after curing to obtain the antireflection film for the photovoltaic glass.
Example 5
An antireflection film for photovoltaic glass comprises a rare earth antireflection film layer and a protective film layer from bottom to top in sequence;
the anti-reflection protective coating comprises the following raw materials in parts by weight: 100 parts of ethanol; 30 parts of heptadecafluorodecyltrimethoxysilane; 50 parts of tetraethoxysilane; 20 parts of polyoxyethylene mono-4-octyl phenyl ether; 15 parts of vinyl tri (beta-methoxyethoxy) silane; 5 parts of nitric acid; 5 parts of nano zinc oxide; 10 parts of sodium fluoride;
a preparation method of an antireflection film for photovoltaic glass comprises the following steps:
the method comprises the following steps: according to the mixture ratio, dissolving heptadecafluorodecyltrimethoxysilane, ethyl orthosilicate, polyoxyethylene mono-4-octylphenyl ether, sodium fluoride and nano zinc oxide in ethanol, and stirring for 20min at 40 ℃ to obtain sol;
step two: adding vinyl tri (beta-methoxyethoxy) silane and nitric acid into the sol obtained in the step one according to the proportion, heating to 120 ℃, reacting for 10 hours, and cooling to obtain a protective coating;
step three: firstly, carrying out ultrasonic treatment on a glass substrate for 10min, then carrying out ultrasonic treatment in deionized water for 10min, and drying; then rare earth oxide Y2O3As a target, transferring a glass substrate into a sample chamber of a radio frequency instrument, closing a substrate baffle, vacuumizing to 0.0008Pa, introducing argon at a volume flow of 20mL/min, setting the pressure of the radio frequency instrument to be 2.0Pa, sputtering power to be 50W, pre-sputtering for 5min after setting, opening the substrate baffle after stabilizing the radio frequency power, and starting sputtering and depositing a rare earth antireflection film; then transferring the prepared rare earth antireflection film into an annealing furnace, controlling the volume flow of argon to be 5L/min, heating to 1000 ℃ at the speed of 20 ℃/min, keeping the temperature for 20min, and carrying out high-temperature annealing treatment to obtain the rare earth antireflection film; and finally, spraying the obtained protective coating on a rare earth antireflection film to form a protective film with the thickness of about 20nm, and drying at 63 ℃ after curing to obtain the antireflection film for the photovoltaic glass.
Comparative example 1
Comparative example 1 production method referring to example 1 disclosed in patent CN109401173B, a high performance vacuum antireflective film was produced.
Test examples
The antireflection film obtained in example 1 was subjected to a contact angle test with the antireflection film obtained in comparative example 1, and the contact liquid was water, and the results are shown in fig. 1.
As can be seen from FIG. 1, the antireflection film obtained in example 1 and the antireflection film obtained in comparative example were subjected to contact angle characterization (using a contact angle meter), the contact angle of the antireflection film obtained in comparative example 1 was 30 ° (FIG. 1a), and the contact angle of the antireflection film obtained in example 1 was 150 ° (FIG. 1 b). The antireflection film for the photovoltaic glass can effectively reduce the water adsorption of the film layer, and the film layer has high weather resistance and self-cleaning capability.
FIGS. 2 and 3 are graphs of transmittance and reflectance of the antireflection film prepared in example 5 in a wavelength range of 300 to 1100nm, and the average transmittance thereof in a visible light region (380 to 780nm) is 99.51%; the average reflectance was 0.19%.
Claims (8)
1. The antireflection film for the photovoltaic glass is characterized by comprising a rare earth antireflection film layer and a protective film layer from bottom to top in sequence;
and the protective film layer is obtained by spraying protective paint on the rare earth antireflection film layer and drying.
2. The antireflection film for photovoltaic glass according to claim 1, wherein the protective coating comprises the following raw materials in parts by weight: 50-100 parts of a solvent; 10-30 parts of heptadecafluorodecyltrimethoxysilane; 30-50 parts of ethyl orthosilicate; 10-20 parts of polyoxyethylene mono-4-octyl phenyl ether; 10-15 parts of a silane coupling agent; 1-5 parts of an acidic catalyst; 1-5 parts of nano zinc oxide; 5-10 parts of sodium fluoride.
3. The antireflection film for photovoltaic glass according to claim 2, wherein the solvent is one of methanol and ethanol; the acid catalyst is nitric acid; the silane coupling agent is one of vinyltriethoxysilane, vinyltrimethoxysilane and vinyltris (beta-methoxyethoxy) silane.
4. The antireflection film for photovoltaic glass according to claim 1, wherein the rare earth antireflection film layer is prepared by the following method steps:
1) cleaning of the glass substrate: firstly, carrying out ultrasonic treatment on a glass substrate in absolute ethyl alcohol for 10min, then carrying out ultrasonic treatment in deionized water for 10min, and drying;
2) performing radio frequency magnetron sputtering coating: transferring a glass substrate into a sample chamber of a radio frequency instrument by taking rare earth oxide as a target, closing a substrate baffle, vacuumizing to 0.0008Pa, introducing argon at a fixed volume flow, setting working parameters of the radio frequency instrument, pre-sputtering for 5min after setting is finished, opening the substrate baffle after radio frequency power is stabilized, and starting sputtering to deposit a rare earth antireflection film;
3) annealing the rare earth antireflection film: and transferring the prepared rare earth antireflection film into an annealing furnace, controlling the volume flow of argon, setting the annealing temperature, and carrying out high-temperature annealing treatment to obtain the rare earth antireflection film layer.
5. The antireflection film for photovoltaic glass according to claim 4, wherein the volume flow rate of argon in the step 2) is 20 mL/min; the working parameters of the radio frequency instrument are as follows: the working air pressure of the radio frequency instrument is 0.5-2.0Pa, and the sputtering power is 20-50W; the rare earth oxide is Y2O3、Yb2O3And Er2O3One of (1); the volume flow of argon in the step 3) is 5L/min; the annealing temperature is raised to 600-1000 ℃ at the speed of 20 ℃/min and kept for 20 min.
6. The antireflection film for photovoltaic glass according to claim 1 or 4, wherein the preparation method of the antireflection film for photovoltaic glass comprises the following steps:
the method comprises the following steps: dissolving heptadecafluorodecyltrimethoxysilane, ethyl orthosilicate, polyoxyethylene mono-4-octylphenyl ether, sodium fluoride and nano zinc oxide in a solvent, and stirring at 40 ℃ for 20min to obtain sol;
step two: adding a silane coupling agent and an acid catalyst into the sol obtained in the step one, heating to 100-120 ℃, reacting for 10-12h, and cooling to obtain the protective coating;
step three: and spraying the obtained protective coating on a rare earth antireflection film layer, curing and drying to obtain the antireflection film for the photovoltaic glass.
7. The antireflection film for photovoltaic glass according to claim 6, wherein the drying temperature in the third step is 50 to 70 ℃.
8. Use of the antireflection film for a photovoltaic glass according to any one of claims 1 to 7 for a solar photovoltaic glass.
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| CN112876896A (en) * | 2021-01-26 | 2021-06-01 | 苏州中来光伏新材股份有限公司 | Rare earth metal organic complex coated zinc oxide titanium nano sol and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101997039A (en) * | 2010-09-29 | 2011-03-30 | 上海电力学院 | Antireflection material for solar cell and manufacturing method thereof |
| CN203032031U (en) * | 2012-11-27 | 2013-07-03 | 信义玻璃工程（东莞）有限公司 | Anti-reflection glass |
| CN105970171A (en) * | 2016-06-08 | 2016-09-28 | 苏州佳新新材料科技有限公司 | Method adopting magnetron sputtering to prepare flexible rare earth oxide film |
| CN106057641A (en) * | 2016-05-27 | 2016-10-26 | 清华大学 | Semiconductor structure and method for preparing semiconductor structure |
| CN111060995A (en) * | 2020-01-13 | 2020-04-24 | 苏州众为光电有限公司 | Antireflection film and optical lens |
-
2020
- 2020-09-17 CN CN202010977961.3A patent/CN112147722A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101997039A (en) * | 2010-09-29 | 2011-03-30 | 上海电力学院 | Antireflection material for solar cell and manufacturing method thereof |
| CN203032031U (en) * | 2012-11-27 | 2013-07-03 | 信义玻璃工程（东莞）有限公司 | Anti-reflection glass |
| CN106057641A (en) * | 2016-05-27 | 2016-10-26 | 清华大学 | Semiconductor structure and method for preparing semiconductor structure |
| CN105970171A (en) * | 2016-06-08 | 2016-09-28 | 苏州佳新新材料科技有限公司 | Method adopting magnetron sputtering to prepare flexible rare earth oxide film |
| CN111060995A (en) * | 2020-01-13 | 2020-04-24 | 苏州众为光电有限公司 | Antireflection film and optical lens |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112876896A (en) * | 2021-01-26 | 2021-06-01 | 苏州中来光伏新材股份有限公司 | Rare earth metal organic complex coated zinc oxide titanium nano sol and preparation method thereof |
| CN112876896B (en) * | 2021-01-26 | 2022-05-17 | 苏州中来光伏新材股份有限公司 | Rare earth metal organic complex coated zinc oxide titanium nano sol and preparation method thereof |
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