CN112080734A - Uniform heating device for relaxation-resistant coating of alkali metal atom air chamber - Google Patents
Uniform heating device for relaxation-resistant coating of alkali metal atom air chamber Download PDFInfo
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- CN112080734A CN112080734A CN202010704462.7A CN202010704462A CN112080734A CN 112080734 A CN112080734 A CN 112080734A CN 202010704462 A CN202010704462 A CN 202010704462A CN 112080734 A CN112080734 A CN 112080734A
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- ring
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- overturning
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0209—Pretreatment of the material to be coated by heating
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- Chemical Kinetics & Catalysis (AREA)
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- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Coating Apparatus (AREA)
Abstract
The invention discloses a uniform heating device for an alkali metal atom gas chamber relaxation-resistant coating. The existing device is difficult to ensure the temperature uniformity of the air chamber in the environment. The invention comprises a bracket, a turnover mechanism and a transmission mechanism. The turnover mechanism comprises an outer ring turnover mechanism and an inner ring turnover mechanism. The outer turnover ring of the outer ring turnover mechanism is driven to turn over through a turnover motor. The turnover motor drives the inner turnover ring of the inner ring turnover mechanism to turn over relative to the outer turnover ring through the winding straight gear and the bevel gear set. The turning motor drives the orbiting straight gear to rotate, and the orbiting straight gear revolves along the edge of the fixed straight gear. During use, the alkali metal atom gas chamber is fixedly arranged on the inner overturning ring, and the whole structure is arranged in the heating furnace. According to the invention, through two times of gear connection, the inner and outer two turnover rings are ensured to be vertically and alternately turned over, a uniformly heated environment can be provided when the film coating air chamber is heated, the uniform coating of the anti-relaxation film is realized, and the film forming quality of the alkali metal atom air chamber is ensured.
Description
Technical Field
The invention relates to a uniform heating device for an alkali metal atom gas chamber relaxation-resistant coating.
Background
The alkali metal atom air chamber is a key part of novel quantum instrument devices such as an atom magnetometer, an atom clock, an atom gyro and the like. The performance of the alkali metal atom air chamber greatly determines the testing performance of the novel quantum instrument device. In order to improve the performance of the alkali metal atom gas chamber, an alkali metal gas chamber with good relaxation performance needs to be obtained, and how to improve the film forming quality of the relaxation-resistant coating is the key point of all the problems.
In order to improve the quality of the relaxation-resistant plating film in the alkali metal gas cell, various methods have been proposed in recent years. The method comprises a scheme of using Octadecyl Trichlorosilane (OTS) and paraffin coating, wherein the paraffin coating is found to be capable of greatly improving the relaxation resistance time of an atomic gas chamber. Meanwhile, a large number of methods show that the relaxation time of the paraffin coating surface is greatly influenced by the quality and the appearance of the paraffin coating surface. In order to improve the quality of the relaxation-resistant coating, an important approach is to provide a uniformly heated environment in the alkali metal atomic gas chamber. The structure is complex and the space is large during the coating process of the alkali metal atom air chamber, so that the temperature uniformity of the air chamber in the environment is difficult to ensure. There is a need for a mechanism that allows each part of the chamber to get as much heat as possible during the heating process.
Disclosure of Invention
The invention aims to provide a uniform heating device for an alkali metal atom gas chamber relaxation-resistant coating.
The invention comprises a bracket, a turnover mechanism and a transmission mechanism.
The support comprises a base and two supporting rods perpendicular to the base, and rotating shaft seats with through holes are respectively arranged on the two supporting rods on the same horizontal plane.
The turnover mechanism comprises an outer ring turnover mechanism and an inner ring turnover mechanism.
The outer ring turnover mechanism comprises a turnover motor and an outer turnover ring, two outer turnover shafts are symmetrically arranged on the outer wall of the outer turnover ring, the two outer turnover shafts penetrate through the rotation shaft seat, and the power output end of the turnover motor arranged on the support is connected with one of the outer turnover shafts.
The inner ring turnover mechanism comprises an inner turnover ring and inner turnover shafts, the inner turnover ring and the outer turnover ring are concentrically arranged, and the two inner turnover shafts are symmetrically arranged on the outer wall of the inner turnover ring and penetrate through the outer turnover ring; the inner wall of the inner inversion ring is fixedly provided with an alkali metal atom air chamber fixing bracket.
The transmission mechanism comprises a fixed spur gear, a winding spur gear and a conical gear set.
The central shaft of the orbiting straight gear is connected with the power output end of the overturning motor through a belt, the power output shaft of the overturning motor penetrates through a central hole of the fixed straight gear, two ends of the connecting rod are respectively movably connected with the central shaft of the orbiting straight gear and an outward turning shaft of the outward turning ring, and the orbiting straight gear is meshed with the fixed straight gear; the turning motor drives the orbiting straight gear to rotate through the belt, and the orbiting straight gear revolves along the edge of the fixed straight gear.
The bevel gear set comprises a driving bevel gear and a driven bevel gear which are meshed with each other, the driving bevel gear is coaxially linked with the orbiting straight gear, and the driven bevel gear penetrates through the outer overturning annular wall to be connected with an inner overturning rotating shaft.
Further, the turning motor drives the outer turning ring to turn, and the straight line where the two outer turning shafts are located is the turning central axis of the outer turning ring; the inner overturning ring overturns relative to the plane of the outer overturning ring, the straight line where the two inner overturning shafts are located is the overturning central axis of the inner overturning ring, and the overturning central axis of the inner overturning ring is vertical to the overturning central axis of the outer overturning ring.
Furthermore, the fixed spur gear is fixedly arranged, and the central axis of the fixed spur gear is the overturning central axis of the outer overturning ring.
Furthermore, the overturning motor drives the orbiting straight gear and the driving bevel gear to synchronously rotate, so as to drive the driven bevel gear to rotate on a vertical plane, and the driven bevel gear drives the inner overturning ring to overturn.
Furthermore, the bevel gear set is arranged in the gear box, the overturning motor drives the outer overturning ring to overturn at the same time, and when the outer overturning ring overturns, the orbiting straight gear shifts along the edge of the fixed straight gear through the limit of the connecting rod, so that the gear box and the bevel gear set synchronously overturn along with the outer overturning ring.
The invention ensures that the inner and outer two turnover rings vertically and crossly rotate at a certain ratio through two times of gear connection, and the structure of the staggered movement can provide a uniformly heated environment when the coating air chamber is heated, so that each part of the alkali metal atom air chamber fixed on the inner wall of the inner turnover ring receives heat with the same size as much as possible in the heating process, the uniform coating of the anti-relaxation film can be realized, and the film forming quality of the alkali metal atom air chamber can be ensured.
Drawings
FIG. 1 is a schematic view of a stent according to the present invention;
FIG. 2 is a schematic view of the turnover mechanism of the present invention;
FIG. 3 is a schematic view of the transmission mechanism of the present invention;
FIG. 4 is a schematic diagram of the transmission of the present invention;
fig. 5 is a schematic view of the usage state of the present invention.
Detailed Description
A uniform heating device for an alkali metal atom gas chamber relaxation-resistant coating comprises a support, a turnover mechanism and a transmission mechanism.
As shown in fig. 1, the bracket comprises a base 1 and two support rods 2 arranged perpendicular to the base, and rotating shaft seats 3 with through holes are respectively arranged on the two support rods 2 on the same horizontal plane.
As shown in fig. 2, the turnover mechanism includes an outer ring turnover mechanism and an inner ring turnover mechanism.
The outer ring turnover mechanism comprises a turnover motor 4 and an outer turnover ring 5, two outer turnover shafts 6 are symmetrically arranged on the outer wall of the outer turnover ring 5, the two outer turnover shafts 6 penetrate through the rotating shaft seat 3, and the power output end of the turnover motor 4 arranged on the support is connected with one of the outer turnover shafts; the turning motor 4 can drive the outer turning ring 5 to turn, and the straight line where the two outer turning shafts 6 are located is the turning central axis of the outer turning ring 5.
The inner ring turnover mechanism comprises an inner turnover ring 7 and inner turnover shafts 8, the inner turnover ring 7 and the outer turnover ring 5 are concentrically arranged, and the two inner turnover shafts 8 are symmetrically arranged on the outer wall of the inner turnover ring 7 and penetrate through the outer turnover ring 5; the inner overturning ring 7 can overturn relative to the plane of the outer overturning ring 5, the straight line of the two inner overturning shafts 8 is the overturning central axis of the inner overturning ring 7, and the overturning central axis of the inner overturning ring is vertical to the overturning central axis of the outer overturning ring; the inner wall of the inner inversion ring 7 is fixedly provided with an alkali metal atom air chamber fixing bracket 9.
As shown in fig. 3, the transmission mechanism includes a fixed spur gear 10, an orbiting spur gear 11, and a bevel gear set 12.
The fixed straight gear 10 is fixedly arranged, and the central axis of the fixed straight gear 10 is the overturning central axis of the outer overturning ring 5; the central shaft of the orbiting straight gear 11 is connected with the power output end of the overturning motor 4 through a belt 13, the central shaft of the orbiting straight gear 11 is connected with the outward overturning shaft of the outward overturning ring 5 through a connecting rod 14, and the orbiting straight gear 11 is meshed with the fixed straight gear 10. The turning motor 4 drives the orbiting straight gear 11 to rotate through the belt 13, and the orbiting straight gear 11 revolves along the edge of the fixed straight gear 10.
As shown in fig. 2 and 4, the bevel gear set 12 is disposed in the gear box 15, the driving bevel gear 12-1 of the bevel gear set 12 is coaxially and fixedly disposed with the orbiting spur gear 11, and the driven bevel gear 12-2 of the bevel gear set 12 passes through the outer flip ring wall to be connected with an inner flip shaft. The driving bevel gear 12-1 is meshed with the driven bevel gear 12-2, the turning motor 4 drives the orbiting straight gear 11 to synchronously rotate with the driving bevel gear 12-1, the driven bevel gear 12-2 is driven to rotate on a vertical plane, and the driven bevel gear 12-2 drives the inner turning ring 7 to turn.
The overturning motor 4 simultaneously drives the outer overturning ring 5 to overturn, and when the outer overturning ring 5 overturns, the orbiting straight gear 11 shifts along the edge of the fixed straight gear 10 through the limit of the connecting rod 14, so that the gear box 15 and the conical gear set 12 synchronously overturn along with the outer overturning ring 5.
In use, the alkali metal atom gas cell is fixedly mounted on the inner inversion ring of the apparatus and the entire structure is placed in the furnace 16, as shown in FIG. 5. In the heating process, under the drive of the motor, the air chamber can do the circulating staggered reciprocating motion in the heating furnace, so that the problem of poor coating uniformity caused by uneven temperature inside the heating furnace is avoided.
Claims (5)
1. A even heating device for alkali metal atom air chamber anti relaxation coating film, including support, tilting mechanism and drive mechanism, its characterized in that:
the support comprises a base (1) and two support rods (2) which are perpendicular to the base, and rotating shaft seats (3) with through holes are respectively arranged on the two support rods (2) on the same horizontal plane;
the turnover mechanism comprises an outer ring turnover mechanism and an inner ring turnover mechanism;
the outer ring turnover mechanism comprises a turnover motor (4) and an outer turnover ring (5), two outer turnover shafts (6) are symmetrically arranged on the outer wall of the outer turnover ring (5), the two outer turnover shafts (6) penetrate through the rotating shaft seat (3), and the power output end of the turnover motor (4) arranged on the support is connected with one of the outer turnover shafts;
the inner ring turnover mechanism comprises an inner turnover ring (7) and inner turnover shafts (8), the inner turnover ring (7) and the outer turnover ring (5) are concentrically arranged, and the two inner turnover shafts (8) are symmetrically arranged on the outer wall of the inner turnover ring (7) and penetrate through the outer turnover ring (5); an alkali metal atom air chamber fixing bracket (9) is fixedly arranged on the inner wall of the inner overturning ring (7);
the transmission mechanism comprises a fixed spur gear (10), a winding spur gear (11) and a conical gear set (12);
the central shaft of the orbiting straight gear (11) is connected with the power output end of the overturning motor (4) through a belt (13), the power output shaft of the overturning motor (4) penetrates through a central hole of the fixed straight gear (10), two ends of a connecting rod (14) are respectively movably connected with the central shaft of the orbiting straight gear (11) and an outward overturning shaft (6) of the outward overturning ring, and the orbiting straight gear (11) is meshed with the fixed straight gear (10); the overturning motor (4) drives the orbiting straight gear (11) to rotate through a belt (13), and the orbiting straight gear (11) revolves along the edge of the fixed straight gear (10);
the bevel gear set (12) comprises a driving bevel gear (12-1) and a driven bevel gear (12-2) which are meshed with each other, the driving bevel gear (12-1) is coaxially linked with the orbiting straight gear (11), and the driven bevel gear (12-2) penetrates through the outer overturning annular wall to be connected with an inner overturning rotating shaft.
2. A uniform heating apparatus for an alkali metal atom gas chamber relaxation-resistant coating film as claimed in claim 1, wherein: the turning motor (4) drives the outer turning ring (5) to turn, and the straight line where the two outer turning shafts (6) are located is the turning central axis of the outer turning ring (5); the inner overturning ring (7) overturns relative to the plane of the outer overturning ring (5), the straight line where the two inner overturning shafts (8) are located is the overturning central axis of the inner overturning ring (7), and the overturning central axis of the inner overturning ring is vertical to the overturning central axis of the outer overturning ring.
3. A uniform heating apparatus for an alkali metal atom gas chamber relaxation-resistant coating film as claimed in claim 1, wherein: the fixed straight gear (10) is fixedly arranged, and the central axis of the fixed straight gear is the overturning central axis of the outer overturning ring (5).
4. A uniform heating apparatus for an alkali metal atom gas chamber relaxation-resistant coating film as claimed in claim 1, wherein: the overturning motor (4) drives the orbiting straight gear (11) and the driving bevel gear (12-1) to synchronously rotate, the driven bevel gear (12-2) is driven to rotate on a vertical plane, and the driven bevel gear (12-2) drives the inner overturning ring (7) to overturn.
5. A uniform heating apparatus for an alkali metal atom gas chamber relaxation-resistant coating film as claimed in claim 1, wherein: the bevel gear set (12) is arranged in the gear box (15), the overturning motor (4) simultaneously drives the outer overturning ring (5) to overturn, and when the outer overturning ring (5) overturns, the orbiting straight gear (11) shifts along the edge of the fixed straight gear (10) through the limiting of the connecting rod (14), so that the gear box (15) and the bevel gear set (12) synchronously overturn along with the outer overturning ring (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010704462.7A CN112080734B (en) | 2020-07-21 | 2020-07-21 | Uniform heating device for alkali metal atom air chamber relaxation-resistant coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010704462.7A CN112080734B (en) | 2020-07-21 | 2020-07-21 | Uniform heating device for alkali metal atom air chamber relaxation-resistant coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112080734A true CN112080734A (en) | 2020-12-15 |
| CN112080734B CN112080734B (en) | 2023-06-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010704462.7A Active CN112080734B (en) | 2020-07-21 | 2020-07-21 | Uniform heating device for alkali metal atom air chamber relaxation-resistant coating |
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Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06172996A (en) * | 1992-12-02 | 1994-06-21 | Matsushita Electric Ind Co Ltd | Rotating and revolving holder device |
| JP2008138276A (en) * | 2006-12-05 | 2008-06-19 | Tsukishima Kikai Co Ltd | Vacuum film deposition system |
| US20090295054A1 (en) * | 2008-06-03 | 2009-12-03 | Hon Hai Precision Industry Co., Ltd. | Support device for sputtering machine |
| JP2011105983A (en) * | 2009-11-16 | 2011-06-02 | Fujifilm Corp | Apparatus for continuously inverting workpiece |
| CN104643896A (en) * | 2015-02-15 | 2015-05-27 | 深圳减字科技有限公司 | Heating pot device |
| CN105559518A (en) * | 2015-12-01 | 2016-05-11 | 珠海优特电力科技股份有限公司 | Cooking pot |
| CN208266258U (en) * | 2018-03-26 | 2018-12-21 | 成都西沃克真空科技有限公司 | A kind of substrate automatic turning device |
| CN208733220U (en) * | 2018-09-13 | 2019-04-12 | 济南华度光学技术有限公司 | A kind of multidirectional automatic turning device of optical coating fixture |
| CN212560431U (en) * | 2020-07-21 | 2021-02-19 | 浙江工业大学 | Uniform heating device for relaxation-resistant coating of alkali metal atom air chamber |
-
2020
- 2020-07-21 CN CN202010704462.7A patent/CN112080734B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06172996A (en) * | 1992-12-02 | 1994-06-21 | Matsushita Electric Ind Co Ltd | Rotating and revolving holder device |
| JP2008138276A (en) * | 2006-12-05 | 2008-06-19 | Tsukishima Kikai Co Ltd | Vacuum film deposition system |
| US20090295054A1 (en) * | 2008-06-03 | 2009-12-03 | Hon Hai Precision Industry Co., Ltd. | Support device for sputtering machine |
| JP2011105983A (en) * | 2009-11-16 | 2011-06-02 | Fujifilm Corp | Apparatus for continuously inverting workpiece |
| CN104643896A (en) * | 2015-02-15 | 2015-05-27 | 深圳减字科技有限公司 | Heating pot device |
| CN105559518A (en) * | 2015-12-01 | 2016-05-11 | 珠海优特电力科技股份有限公司 | Cooking pot |
| CN208266258U (en) * | 2018-03-26 | 2018-12-21 | 成都西沃克真空科技有限公司 | A kind of substrate automatic turning device |
| CN208733220U (en) * | 2018-09-13 | 2019-04-12 | 济南华度光学技术有限公司 | A kind of multidirectional automatic turning device of optical coating fixture |
| CN212560431U (en) * | 2020-07-21 | 2021-02-19 | 浙江工业大学 | Uniform heating device for relaxation-resistant coating of alkali metal atom air chamber |
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| CN112080734B (en) | 2023-06-27 |
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