CN111427231A - Mask plate and novel production line - Google Patents
Mask plate and novel production line Download PDFInfo
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- CN111427231A CN111427231A CN202010274726.XA CN202010274726A CN111427231A CN 111427231 A CN111427231 A CN 111427231A CN 202010274726 A CN202010274726 A CN 202010274726A CN 111427231 A CN111427231 A CN 111427231A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 50
- 239000000463 material Substances 0.000 claims description 28
- 238000004140 cleaning Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000011161 development Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 abstract description 16
- 230000000295 complement effect Effects 0.000 description 3
- 241000316887 Saissetia oleae Species 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 238000000059 patterning Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a mask plate and a novel production line, wherein the novel production line comprises a first exposure device, a conveyor belt and a second exposure device, the first exposure device comprises a first mask plate and a first exposure machine, and the second exposure device comprises a second mask plate and a second exposure machine; by exposing the same substrate by different mask plates in a subsection mode, the technical problem that a color film substrate produced by the existing yellow ray has many dark stripes is solved.
Description
Technical Field
The invention relates to the field of color film exposure, in particular to a mask plate and a novel production line.
Background
The existing yellow light ray is subjected to mosaic splicing exposure by using one mask plate, so that the problems of long feeding interval and multiple exposure times exist, and the technical problem of multiple dark stripes exists in a color film substrate produced by the existing yellow light ray.
Disclosure of Invention
The invention provides a mask plate and a novel production line, which are used for solving the technical problem that a color film substrate produced by the existing yellow light line has many dark stripes.
In order to solve the above problems, the technical scheme provided by the invention is as follows:
the embodiment of the invention provides a mask plate, which comprises a first mask plate and a second mask plate, wherein the first mask plate comprises a first mask area and a first splicing area, the first splicing area is connected with the first mask area, the second mask plate comprises a second mask area, a third mask area and a second splicing area, the third mask area is connected with the second splicing area, the first splicing area comprises a plurality of hollowed parts, the hollowed parts of the first splicing area correspond to the shielding parts of the second splicing area, and the shielding parts of the first splicing area correspond to the hollowed parts of the second splicing area.
In the novel production line provided by the invention, the first mask region comprises a first region, the second mask region comprises a second region, and the area of the first region is larger than that of the second region.
In the novel production line provided by the invention, along the splicing direction, the length of the second mask area is smaller than that of the third mask area.
In the novel production line provided by the invention, the projection of the second mask region in the third mask region is overlapped with the third mask region.
In the novel production line provided by the invention, the length of the third mask area is equal to that of the first mask area along the splicing direction.
The embodiment of the invention provides a novel production line, which comprises:
the feeding port is used for feeding materials to be exposed and developed;
a cleaning machine;
coating machine;
a first roaster;
the first exposure equipment comprises a first mask plate and a first exposure machine, and the first exposure machine carries out first exposure on the material through the first mask plate;
a conveyor belt for connecting the first exposure machine and the second exposure machine;
the second exposure equipment comprises a second mask plate and a second exposure machine, and the second exposure machine carries out second exposure on the material through the second mask plate;
a developing machine;
a second roaster;
wherein, the material passes through the dog-house and gets into novel producing the line, pass through in proper order the cleaning machine the coating machine first roaster the first conveyer belt first exposure machine connect the conveyer belt the second exposure machine develop the machine and the second roaster, it is right to accomplish the exposure development process of material.
In the novel production line provided by the invention, the conveyor belt comprises a first conveyor belt, a second conveyor belt and a connecting conveyor belt for connecting the first conveyor belt and the second conveyor belt.
In the novel production line provided by the invention, the material of the connecting conveyor belt is the same as that of the first conveyor belt.
In the novel production line provided by the invention, the width of the connecting conveyor belt is the same as that of the first conveyor belt.
In the novel production line provided by the invention, the first mask plate comprises a first mask area and a first splicing area, the first splicing area is connected with the first mask area, the second mask plate comprises a second mask area, a third mask area and a second splicing area, the third mask area is connected with the second splicing area, the first splicing area comprises a plurality of hollowed parts, the hollowed parts of the first splicing area correspond to the shielding parts of the second splicing area, and the shielding parts of the first splicing area correspond to the hollowed parts of the second splicing area.
The invention has the beneficial effects that: the invention provides a mask plate and a novel production line, wherein the novel production line comprises a first exposure device, a conveyor belt and a second exposure device, the first exposure device comprises a first mask plate and a first exposure machine, the first exposure machine carries out first exposure on a material through the first mask plate, the conveyor belt is used for connecting the first exposure machine and the second exposure machine, the second exposure device comprises a second mask plate and a second exposure machine, and the second exposure machine carries out second exposure on the material through the second mask plate; the first mask plate and the second mask plate respectively expose the same color film substrate, so that the technical problem that the color film substrate produced by the existing yellow ray has many dark stripes is solved.
Drawings
The technical solution and other advantages of the present application will become apparent from the detailed description of the embodiments of the present application with reference to the accompanying drawings.
FIG. 1 is a schematic view of a first reticle provided in an embodiment of the invention;
FIG. 2 is a schematic diagram of a second reticle provided in an embodiment of the invention;
fig. 3 is a schematic diagram of a novel production line provided in an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. It is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
In the description of the present application, it is to be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present application and for simplicity in description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and are not to be construed as limiting the present application. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; may be mechanically connected, may be electrically connected or may be in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
In this application, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact of the first and second features, or may comprise contact of the first and second features not directly but through another feature in between. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
The following disclosure provides many different embodiments or examples for implementing different features of the application. In order to simplify the disclosure of the present application, specific example components and arrangements are described below. Of course, they are merely examples and are not intended to limit the present application. Moreover, the present application may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, examples of various specific processes and materials are provided herein, but one of ordinary skill in the art may recognize applications of other processes and/or use of other materials.
As shown in fig. 1, the mask provided by the present invention includes a first mask 10 and a second mask 20, the first mask 10 includes a first mask region 101 and a first splicing region 102, the first splicing region 102 is connected to the first mask region 101, the second mask 20 includes a second mask region 201, a third mask region 202 and a second splicing region 203, the third mask region 202 is connected to the second splicing region 203, wherein the first splicing region 102 includes a plurality of hollows 1001, the first hollows 1001 of the first splicing region 102 correspond to the second shielding portions 2002 of the second splicing region 203, and the first shielding portions 1002 of the first splicing region 102 correspond to the second hollows 2001 of the second splicing region 203.
In this embodiment, the mask includes a first mask 10 and a second mask 20, the first mask 10 includes a first mask region 101 and a first splicing region 102, the first splicing region 102 is connected to the first mask region 101, the second mask 20 includes a second mask region 201, a third mask region 202 and a second splicing region 203, the third mask region 202 is connected to the second splicing region 203, wherein the first splicing region 102 includes a plurality of first hollows 1001, the first hollows 1001 of the first splicing region 102 correspond to the second shielding portions 2002 of the second splicing region 203, and the first shielding portions 1002 of the first splicing region 102 correspond to the second hollows 2001 of the second splicing region 203.
In this embodiment, the color film substrate at the corresponding position below the cutout portion forms a corresponding pattern through exposure patterning, the pattern is exposed for the first time, the pattern is formed by a plurality of independent patterns at the splicing region, and then, after exposure for the second time, a corresponding pattern is formed at the splicing region in a region where no pattern is formed, that is, the first splicing region 102 and the second splicing region 203 are mosaiced and spliced.
In this embodiment, two independent first mask plates 10 and two independent second mask plates 20 are used to perform exposure twice, so that exposure of the color film substrate with low feeding interval and less exposure times is realized.
In one embodiment, the first cutout 1001 of the first splice region 102 and the second cutout 2001 of the second splice region 203 are complementary.
In one embodiment, the first mask region 101 comprises a first region and the second mask region 201 comprises a second region, the first region having an area greater than the area of the second region.
In this embodiment, the second mask region 201 includes at least one second region.
Wherein the second mask region 201 may include a second region.
Wherein the second mask region 201 may also comprise a plurality of second regions
In one embodiment, the length of the second mask region 201 is less than the length of the third mask region 202 in the direction of stitching.
In one embodiment, the length of the second mask region 201 is equal to the length of the third mask region 202 along the direction of stitching.
In an embodiment, the projection of said second mask area 201 within the third mask area 202 coincides with the third mask area 202.
In this embodiment, the second mask region 201 is disposed adjacent to the third mask region 202 and does not exceed the boundary of the length of the third mask region 202.
In the embodiment, the space on the motherboard can be better utilized, more display panels are arranged, and the utilization rate of the motherboard is improved.
In one embodiment, the length of the third mask region 202 is equal to the length of the first mask region 101 along the direction of stitching.
In one embodiment, the two yellow light lines are connected through the conveying belt and matched with two specific mask plates to achieve the purpose of secondary exposure.
The embodiment of the invention provides a novel production line, which comprises:
the feeding port 301 is used for feeding materials to be exposed and developed;
a washer 302;
a coater 303;
a first roaster 304;
the first exposure equipment 306 comprises a first mask plate and a first exposure machine, and the first exposure machine carries out first exposure on the material through the first mask plate;
a conveyor 305 for connecting the first exposure machine 306 and the second exposure machine 307;
the second exposure device 307 comprises a second mask plate and a second exposure machine, and the second exposure machine performs second exposure on the material through the second mask plate;
a developing machine 308;
a second roaster 309;
the materials enter the novel production line through a feeding port 301, sequentially pass through the cleaning machine 302, the coating machine 303, the first baking machine 304, the first conveyor belt 3051, the first exposure machine 306, the connecting conveyor belt 3052, the second conveyor belt 3053, the second exposure machine 307, the developing machine 308 and the second baking machine 309, and the exposure and development processes of the materials are completed.
In this embodiment, the cleaning machine 302 is used to clean the material.
In this embodiment, the first exposure device 306 and the second exposure device 307 respectively expose the material to realize mosaic splicing.
In this embodiment, the mosaic splicing means that the first splicing region 102 and the second splicing region 203 are formed by hollows having no regularity, which are similar to a mosaic, wherein the hollows of the first splicing region and the second splicing region are just complementary, and exposure of the splicing region on the color film substrate is realized through two exposures, so that the low-feeding interval time and the low exposure times are realized.
In this embodiment, the new production line is also called a double tap, and taking a color film mother board of 85+43 as an example, the average feeding interval time of the double tap is shorter than that of a yellow ray, and is reduced from 169.3 seconds to 109.4 seconds.
In one embodiment, in a novel production line, the first mask plate 10 includes a first mask region 101 and a first splicing region 102, the first splicing region 102 is connected to the first mask region 101, the second mask plate 20 includes a second mask region 201 and a third mask region 202 and a second splicing region 203, the third mask region 202 is connected to the second splicing region 203, wherein the first splicing region 102 includes a plurality of first hollow portions 1001, the first hollow portion 1001 of the first splicing region 102 corresponds to the second blocking portion 2002 of the second splicing region 203, and the first blocking portion 1002 of the first splicing region 102 corresponds to the second hollow portion 2001 of the second splicing region 203.
In one embodiment, in the novel production line, the first cutout 1001 of the first splice area 102 and the second cutout 2001 of the second splice area 203 are complementary.
In one embodiment, in a novel production line, the first mask region 101 comprises a first region and the second mask region 201 comprises a second region, the first region having an area greater than the area of the second region.
In this embodiment, in the novel production line, the second mask region 201 includes at least one second region.
Wherein the second mask region 201 may include a second region.
Wherein the second mask region 201 may also comprise a plurality of second regions
In one embodiment, in the novel production line, the length of the second mask region 201 is smaller than the length of the third mask region 202 in the direction of splicing.
In one embodiment, in the novel production line, the length of the second mask area 201 is equal to the length of the third mask area 202 in the direction of splicing.
In an embodiment, in the novel production line, the projection of the second mask region 201 within the third mask region 202 coincides with the third mask region 202.
In this embodiment, the second mask region 201 is disposed adjacent to the third mask region 202 and does not exceed the boundary of the length of the third mask region 202.
In the embodiment, the space on the motherboard can be better utilized, more display panels are arranged, and the utilization rate of the motherboard is improved.
In one embodiment, in the novel production line, the length of the third mask region 202 is equal to the length of the first mask region 101 in the direction of stitching.
In one embodiment, in a novel production line, two yellow light lines are connected through a conveying belt and matched with two specific mask plates to achieve the purpose of secondary exposure.
In one embodiment, in a novel production line, the conveyor belts include a first conveyor belt 3051 and a second conveyor belt 3053 and a connecting conveyor belt 3052 connecting the first conveyor belt 3051 and the second conveyor belt 3053.
In one embodiment, in the novel production line, the material of the connecting conveyor 3052 is the same as the first conveyor 3051.
In one embodiment, in the novel production line, the material of the connecting conveyor belt 3052 is the same as the second conveyor belt 3053.
In one embodiment, in the novel production line, the width of the connecting conveyor 3052 is the same as the first conveyor 3051.
In one embodiment, the width of the connecting conveyor 3052 is the same as the second conveyor 3053 in a new production line.
In one embodiment, in a novel production line, the width of the connecting conveyor 3052 is the same as the first conveyor 3051, and the width of the connecting conveyor 3052 is the same as the second conveyor 3053.
In one embodiment, in a novel production line, characteristics of a splicing position of two mask plates are obtained through experiments, so that the level of dark stripes is confirmed, and a conclusion is drawn that the dark stripes at the splicing position of a color film substrate produced by the novel production line are equivalent to the level of the dark stripes at a normal splicing position, and the dark stripes are basically invisible.
In this embodiment, in a novel production line, a color film substrate obtained by simulating two yellow lines and performing mosaic splicing exposure respectively once is compared with a color film substrate obtained by performing mosaic splicing exposure once on one yellow line.
In this embodiment, in novel production line, work as after exposure on the first yellow light line, the developing machine and the second roaster of first yellow light are out of work, various membrane base plate is direct to pass on the second yellow light line through the conveyer belt, dog-house, cleaning machine, coating machine, the first roaster of second yellow light are all inoperative, directly reach the second exposure machine position through the conveyer belt, carry out the exposure of second time after, again carry out subsequent process in second yellow light department, developing machine and the second roaster work of second yellow light.
And by simulating the exposure and development processes of the novel production line, the obtained various data of the color film substrate are similar to the data of the color film substrate obtained by one mosaic splicing exposure of a yellow light line, but the exposure times are reduced, and the feeding interval is shortened.
Wherein, through the black scale luminance of panel when not circular telegram totally black and the grey scale luminance of panel when circular telegram, contrast simulation novel producing line and former single yellow light, the data that obtains black scale and grey scale is close, promptly passes through novel producing line has reduced when throwing the material interval and the exposure number of times, and the yield and the performance of the panel that the production obtained are roughly the same with original, have guaranteed under the prerequisite of quality, have improved production efficiency.
According to the above embodiments:
the invention provides a mask plate and a novel production line, wherein the novel production line comprises a first exposure device, a conveyor belt and a second exposure device, the first exposure device comprises a first mask plate and a first exposure machine, the first exposure machine carries out first exposure on a material through the first mask plate, the conveyor belt is used for connecting the first exposure machine and the second exposure machine, the second exposure device comprises a second mask plate and a second exposure machine, and the second exposure machine carries out second exposure on the material through the second mask plate; the first mask plate and the second mask plate respectively expose the same color film substrate, so that the technical problem that the color film substrate produced by the existing yellow ray has many dark stripes is solved.
In summary, although the present invention has been described with reference to the preferred embodiments, the above-described preferred embodiments are not intended to limit the present invention, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, therefore, the scope of the present invention shall be determined by the appended claims.
Claims (10)
1. A mask plate is characterized by comprising a first mask plate and a second mask plate, wherein the first mask plate comprises a first mask area and a first splicing area, the first splicing area is connected with the first mask area, the second mask plate comprises a second mask area, a third mask area and a second splicing area, the third mask area is connected with the second splicing area, the first splicing area comprises a plurality of hollowed parts, the hollowed parts of the first splicing area correspond to the shielding parts of the second splicing area, and the shielding parts of the first splicing area correspond to the hollowed parts of the second splicing area.
2. A mask according to claim 1, wherein the first mask region comprises a first region, the second mask region comprises a second region, and the area of the first region is larger than that of the second region.
3. A mask according to claim 2 wherein the length of the second mask region is less than the length of the third mask region in the direction of stitching.
4. A mask according to claim 3, wherein the projection of the second mask region in the third mask region coincides with the third mask region.
5. A mask according to claim 1 wherein the length of the third mask region is equal to the length of the first mask region in the direction of stitching.
6. A novel production line is characterized by comprising:
the feeding port is used for feeding materials to be exposed and developed;
a cleaning machine;
coating machine;
a first roaster;
the first exposure equipment comprises a first mask plate and a first exposure machine, and the first exposure machine carries out first exposure on the material through the first mask plate;
a conveyor belt for connecting the first exposure machine and the second exposure machine;
the second exposure equipment comprises a second mask plate and a second exposure machine, and the second exposure machine carries out second exposure on the material through the second mask plate;
a developing machine;
a second roaster;
wherein, the material passes through the dog-house and gets into novel producing the line, pass through in proper order the cleaning machine the coating machine first roaster the first conveyer belt first exposure machine connect the conveyer belt the second exposure machine develop the machine and the second roaster, it is right to accomplish the exposure development process of material.
7. The novel production line of claim 6, wherein the conveyor belts comprise a first conveyor belt and a second conveyor belt and a connecting conveyor belt connecting the first conveyor belt and the second conveyor belt.
8. The novel production line of claim 7, wherein the connecting conveyor belt is of the same material as the first conveyor belt.
9. The novel production line of claim 7, wherein the connecting conveyor belt has the same width as the first conveyor belt.
10. The novel production line of claim 6, wherein the first mask comprises a first mask region and a first splicing region, the first splicing region is connected to the first mask region, the second mask comprises a second mask region, a third mask region and a second splicing region, the third mask region is connected to the second splicing region, wherein the first splicing region comprises a plurality of hollowed portions, the hollowed portions of the first splicing region correspond to the blocked portions of the second splicing region, and the blocked portions of the first splicing region correspond to the hollowed portions of the second splicing region.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010274726.XA CN111427231A (en) | 2020-04-09 | 2020-04-09 | Mask plate and novel production line |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010274726.XA CN111427231A (en) | 2020-04-09 | 2020-04-09 | Mask plate and novel production line |
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| Publication Number | Publication Date |
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| CN111427231A true CN111427231A (en) | 2020-07-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202010274726.XA Pending CN111427231A (en) | 2020-04-09 | 2020-04-09 | Mask plate and novel production line |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040248020A1 (en) * | 2003-03-19 | 2004-12-09 | Fujitsu Display Technologies Corporation | Exposure mask and pattern exposure method |
| US20060250594A1 (en) * | 2005-05-09 | 2006-11-09 | Tokyo Electron Limited | Edge exposure apparatus, coating and developing apparatus, and edge exposure method |
| CN101183213A (en) * | 2007-12-18 | 2008-05-21 | 友达光电股份有限公司 | Photo mask and manufacturing method of thin-film transistor substrates |
| WO2009037965A1 (en) * | 2007-09-19 | 2009-03-26 | Sharp Kabushiki Kaisha | Liquid crystal display panel manufacturing method and photomask |
| US20110086313A1 (en) * | 2009-10-08 | 2011-04-14 | Tomoya Oori | Method and system of manufacturing semiconductor device |
| CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
-
2020
- 2020-04-09 CN CN202010274726.XA patent/CN111427231A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040248020A1 (en) * | 2003-03-19 | 2004-12-09 | Fujitsu Display Technologies Corporation | Exposure mask and pattern exposure method |
| US20060250594A1 (en) * | 2005-05-09 | 2006-11-09 | Tokyo Electron Limited | Edge exposure apparatus, coating and developing apparatus, and edge exposure method |
| WO2009037965A1 (en) * | 2007-09-19 | 2009-03-26 | Sharp Kabushiki Kaisha | Liquid crystal display panel manufacturing method and photomask |
| CN101183213A (en) * | 2007-12-18 | 2008-05-21 | 友达光电股份有限公司 | Photo mask and manufacturing method of thin-film transistor substrates |
| US20110086313A1 (en) * | 2009-10-08 | 2011-04-14 | Tomoya Oori | Method and system of manufacturing semiconductor device |
| CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
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