CN111419761A - Universal moisturizing mask liquid - Google Patents

Universal moisturizing mask liquid Download PDF

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Publication number
CN111419761A
CN111419761A CN202010396092.5A CN202010396092A CN111419761A CN 111419761 A CN111419761 A CN 111419761A CN 202010396092 A CN202010396092 A CN 202010396092A CN 111419761 A CN111419761 A CN 111419761A
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China
Prior art keywords
parts
extract
skin
mixture
propylene glycol
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CN202010396092.5A
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Chinese (zh)
Inventor
余华
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Guangzhou Yijia Biology Technology Co ltd
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Guangzhou Yijia Biology Technology Co ltd
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Priority to CN202010396092.5A priority Critical patent/CN111419761A/en
Publication of CN111419761A publication Critical patent/CN111419761A/en
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/96—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
    • A61K8/97—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
    • A61K8/9783—Angiosperms [Magnoliophyta]
    • A61K8/9789—Magnoliopsida [dicotyledons]
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00—Preparations for care of the skin
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00—Preparations for care of the skin
    • A61Q19/005—Preparations for sensitive skin
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00—Preparations for care of the skin
    • A61Q19/02—Preparations for care of the skin for chemically bleaching or whitening the skin
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00—Preparations for care of the skin
    • A61Q19/08—Anti-ageing preparations

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Dermatology (AREA)
  • Engineering & Computer Science (AREA)
  • Gerontology & Geriatric Medicine (AREA)
  • Biotechnology (AREA)
  • Botany (AREA)
  • Microbiology (AREA)
  • Mycology (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Cosmetics (AREA)

Abstract

The embodiment of the application discloses a general moisturizing facial mask liquid, which comprises water, propylene glycol, caprylyl hydroximic acid, glyceryl caprylate, glycyrrhiza glabra (G L YCYRRHIZA G L ABRA) root extract, chamomile (CHAMOMI LL A RECUTITA) leaf extract, polygonum CUSPIDATUM (PO L YGONUM CUSPIDATUM) extract, centella asiatica (CENTE LL A ASIATICA) extract, tea (CAME LL IA SINENSIS) leaf extract, scutellaria baicalensis (SCUTE LL ARIA BAICA L ENSIS) root extract, rosemary (ROSMARINUS OFFICINA L IS) leaf extract, phenoxyethanol, caprylyl glycol, carbomer, sodium hyaluronate, methylparaben, hydroxyethyl cellulose, various plant extracts, moisturizing but not greasy, instantly permeating lipid parts absorbed and skin, better moisturizing the stratum corneum, moisturizing, relaxing skin, soothing, skin sensitivity problem, fine skin repairing, skin dryness problem, skin roughness reduction, skin roughness prevention, skin elasticity loss prevention and long-time skin oxidation resistance.

Description

Universal moisturizing mask liquid
Technical Field
The invention relates to the field of skin care products, and particularly relates to a universal moisturizing mask liquid.
Background
With the continuous improvement of living standard, people pay more and more attention to their face and image after satisfying the problem of warmness and fullness, and the demand for skin care products is higher and higher, and in addition to the most basic skin care effect, people tend to pursue the change of their skin by using skin care products, such as thinning the skin, increasing the tension and elasticity of the skin, and the like. However, most of the existing cosmetic products contain many chemical components, which can cause certain stimulation to human skin, especially some chemical synthetic products also contain lead, alcohol, lemon oil, pigment, preservative and the like, so that the cosmetic products are not only extremely bad for human health but also cause skin relaxation, edema, thin horny layer, easy allergy and the like after long-term use, and especially the existing skin care products are commonly added with an activating component to promote the absorption of nutrient components by skin, so that although the skin problem can be temporarily relieved, the skin becomes more fragile and easy to age after long-term use. Therefore, how to select the green, healthy and safe skin care products has very important significance. A natural barrier is formed at the skin surface.
The invention aims to provide a general moisturizing facial mask solution for the public, which does not contain chemical additives, has the effects of moisturizing, soothing the skin, improving the absorption of subsequent nutritional skin care products, removing spots, whitening and eliminating powder, belongs to a skin care product which is frequently required to be used in the skin care products, but at present, the number of facial masks aiming at the field of skin repair in the market is small, and the effect is insufficient, so that the general moisturizing facial mask solution is designed.
Disclosure of Invention
The application provides a general moisturizing facial mask liquid, various plant extracts essence instantly permeates and is adsorbed on a lipid part of skin, so that the moisturizing effect of a horny layer can be better, the moisturizing effect is achieved, the moisturizing and tendering skin is achieved, the anti-aging and anti-inflammatory effects are achieved, scars can be lightened, the skin with an allergic barrier damaged can be repaired, the skin sensitivity problem can be relieved, and the problem that the skin is rough and dry can be repaired delicately.
In order to solve the problems in the prior art, the application provides a general moisturizing facial mask liquid which comprises water, propylene glycol, caprylyl hydroxamic acid, glyceryl caprylate, glycyrrhiza glabra (G L YCYRRHIZA G L ABRA) root extract, chamomile (CHAMOMI L0. L ARECUTITA) leaf extract, polygonum CUSPIDATUM (PO L6 YGONUM CUSPIDATUM) extract, centella asiatica (CENTE L1A ASIATICA) extract, tea (CAME L3 IA SINENSIS) leaf extract, scutellaria BAICALENSIS (SCUTE L4 ARIA BAICA L ENSIS) root extract, rosemary (ROSMARINUS OFFICINA L) leaf extract, phenoxyethanol, caprylic glycol, carbomer, sodium hyaluronate, methylparaben, hydroxyethylcellulose, wherein water accounts for 1-50 parts, propylene glycol for 1-20 parts, caprylyl hydroxamic acid for 1-20 parts, glyceryl caprylate for 1-20 parts, glycyrrhiza glabra (G581-5 parts, glycyrrhiza glabra (C) root extract for 1-10 parts, polyoxyethylene glycol for 1-10 parts of capryl glabra (polyoxyethylene capryl extract, polyoxyethylene glycol for 1-10 parts of folium 0-10 parts of rosemary (polyoxyethylene capryl extract, polyoxyethylene glycol for 1-10 parts of acacia extract, polyoxyethylene glycol for 1-10 parts of acacia, polyoxyethylene glycol extract, polyoxyethylene glycol for 0-10 parts of polyoxyethylene ether extract, polyoxyethylene ether for 0-10 parts of acacia extract, polyoxyethylene ether for 1-10 parts of polyoxyethylene ether extract, polyoxyethylene ether extract.
The general moisturizing mask solution IS prepared by adding 1-50 parts of water, 1-20 parts of propylene glycol, 1-20 parts of caprylyl hydroxamic acid, 1-20 parts of glyceryl caprylate, 1-10 parts of Glycyrrhiza glabra (G L YCYRRHIZAG L ABRA) root extract, 1-10 parts of Chamomile (CHAMOMI L0L A RECUTIA) leaf extract, 1-10 parts of Polygonum CUSPIDATUM (PO L YGONONGCUSPIDATUM) extract, 0.1-10 parts of Cente asiatica (CENTE 851A ASIATICA) extract, 1-10 parts of folium Camelliae sinensis (CAME L IASINENSIS) extract, 1-10 parts of Scutellaria baicalensis (SCE L4 ARUTICA L ENSIS) root extract, 0.1-10 parts of Rosmarinus OFFICINALIS (Rosmarinus OFFICINALIS L) leaf extract, 0.1-10 parts of ethanol, 0.1-10 parts of capryl OFFICINALIS, 0.8-5 parts of propylene glycol, heating the mixture to room temperature, adding 0.10 parts of propylene glycol, filtering, adding propylene glycol.
Furthermore, the preparation process has no special requirement on the temperature of water, propylene glycol, caprylhydroxamic acid, glyceryl caprylate, Glycyrrhiza glabra (G L YCYRRHIZA G L ABRA) root extract, chamomile (CHAMOMI LL A RECUTITA) leaf extract, Polygonum cuspidatum (PO L YGONUMCUSPIDATUM) extract, centella asiatica (CENTE LL A ASIATICA) extract, Camellia sinensis (CAME LL IA SINENSIS) leaf extract, Scutellaria baicalensis (SCUTE LL ARIA BAICA L ENSIS) root extract, Rosmarinus officinalis (ROSMARINUS OFFICINA L IS) leaf extract, phenoxyethanol, caprylyl glycol, carbomer, sodium hyaluronate, methylparaben, and hydroxyethyl cellulose.
The beneficial effect of this application: the general moisturizing facial mask liquid disclosed by the application is rich in raw material sources, does not have any toxic or side effect, enables the skin to be water-clear and moist, moisturizes and is soft, instantly improves the water content of the skin, improves the elasticity of the skin, relieves the allergic state of the skin, repairs the skin barrier, promotes the growth of cells, instantly permeates into and is adsorbed on the lipid part of the skin, can better moisturize the horny layer, dredges and nourishes the delicate skin, has the anti-aging and anti-inflammatory effects, can also lighten scars, repair the damaged skin of the allergic barrier, relieve the sensitive problem of the skin, and repair the problem of rough and dry skin. The skin is strengthened to resist oxidation, so that the skin keeps moisture and is in a healthy state; the essence is extracted from various plants, so that the skin is moist but not greasy, and is absorbed, nourished, tender and tender. Fine and smooth to repair the problem of rough and dry skin. Soft and warm feeling, and smooth and compact skin. Can improve skin activity, improve skin metabolism and microcirculation, promote cell metabolism, and delay skin aging, adopts plant product as main ingredient, and has the advantage of low liability to allergy compared with common skin care products.
The active ingredients of the general moisturizing mask liquid permeate into skin, so that a protective film can be formed on the surface of the skin, the damage to the skin is reduced, and various effects of moisturizing, moistening and the like are provided for the skin.
The application discloses a general moisturizing facial mask liquid, adopt pure natural plant raw materials, do not have the pollution, also can not produce the side effect to skin, when improving skin quality, also avoided the bounce-back.
Detailed Description
The application provides general moisturizing facial mask liquid, which comprises water, propylene glycol, caprylic hydroxamic acid, glyceryl caprylate, glycyrrhiza glabra (G L YCYRRHIZA G L ABRA) root extract, chamomile (CHAMOMI L0L A RECUTITA) leaf extract, polygonum CUSPIDATUM (PO 826 YGONUM CUSPIDATUM) extract, centella asiatica (CENTE L1A ASIATICA) extract, tea (CAME L IASINENSIS) leaf extract, scutellaria BAICALENSIS (SCUTE L4 ARIA BAICA L ENSIS) root extract, rosemary (MARROSINUSOFFICA L IS) leaf extract, asiatic alcohol, capryl glycol, carbomer, sodium hyaluronate, methylparaben, hydroxyethyl cellulose, wherein the water accounts for 1-50 parts, the propylene glycol accounts for 1-20 parts, the caprylic hydroxamic acid extract for 1-20 parts, the Glycyrrhiza glabra (G L YRRHIZA), the hyaluronic acid extract for 1-10 parts, the bearded fiber extract for 1-10 parts, the bearded leaf extract for 1-10 parts of spica OFFICINALIS (CAMOMOMOMOMOMOMOMOMOMOMOMOMOMOMOMOMI L A) root extract, the Chamomile (CAME 468A 4610 parts, the CIUM (CAME 4610 parts of CAME 9610 parts of the CAME 3610 parts of the CAME SAIC 59610 parts, the CAME SAIC 59610 parts of the CAMIS, the CAMIS SAC 3610 parts of the root extract, the CAMIS SAC 59610 parts of the root extract, the CAMIS SAC 1-10 parts of the CAMIS SAC 59610 parts of the CAMIS SAC 1-10.
The general moisturizing mask solution IS prepared by adding 1-50 parts of water, 1-20 parts of propylene glycol, 1-20 parts of caprylyl hydroxamic acid, 1-20 parts of glyceryl caprylate, 1-10 parts of Glycyrrhiza glabra (G L YCYRRHIZAG L ABRA) root extract, 1-10 parts of Chamomile (CHAMOMI L0L A RECUTIA) leaf extract, 1-10 parts of Polygonum CUSPIDATUM (PO L YGONONGCUSPIDATUM) extract, 0.1-10 parts of Cente asiatica (CENTE 851A ASIATICA) extract, 1-10 parts of folium Camelliae sinensis (CAME L IASINENSIS) extract, 1-10 parts of Scutellaria baicalensis (SCE L4 ARUTICA L ENSIS) root extract, 0.1-10 parts of Rosmarinus OFFICINALIS (Rosmarinus OFFICINALIS L) leaf extract, 0.1-10 parts of ethanol, 0.1-10 parts of capryl OFFICINALIS, 0.8-5 parts of propylene glycol, heating the mixture to room temperature, adding 0.10 parts of propylene glycol, filtering, adding propylene glycol.
Furthermore, the preparation process has no special requirement on the temperature of water, propylene glycol, caprylhydroxamic acid, glyceryl caprylate, Glycyrrhiza glabra (G L YCYRRHIZA G L ABRA) root extract, chamomile (CHAMOMI LL A RECUTITA) leaf extract, Polygonum cuspidatum (PO L YGONUMCUSPIDATUM) extract, centella asiatica (CENTE LL A ASIATICA) extract, Camellia sinensis (CAME LL IA SINENSIS) leaf extract, Scutellaria baicalensis (SCUTE LL ARIA BAICA L ENSIS) root extract, Rosmarinus officinalis (ROSMARINUS OFFICINA L IS) leaf extract, phenoxyethanol, caprylyl glycol, carbomer, sodium hyaluronate, methylparaben, and hydroxyethyl cellulose.
The application relates to a general moisturizing mask liquid, which comprises the following steps: cleaning skin, opening the facial mask package, taking out the product, applying on facial skin for 15-20min, and massaging to absorb after application.
The general moisturizing facial mask liquid disclosed by the application is rich in raw material sources, does not have any toxic or side effect, enables the skin to be water-clear and moist, moisturizes and is soft, instantly improves the water content of the skin, improves the elasticity of the skin, relieves the allergic state of the skin, repairs the skin barrier, promotes the growth of cells, instantly permeates into and is adsorbed on the lipid part of the skin, can better moisturize the horny layer, dredges and nourishes the delicate skin, has the anti-aging and anti-inflammatory effects, can also lighten scars, repair the damaged skin of the allergic barrier, relieve the sensitive problem of the skin, and repair the problem of rough and dry skin. The skin is strengthened to resist oxidation, so that the skin keeps moisture and is in a healthy state; the essence is extracted from various plants, so that the skin is moist but not greasy, and is absorbed, nourished, tender and tender. Fine and smooth to repair the problem of rough and dry skin. Soft and warm feeling, and smooth and compact skin. Can improve skin activity, improve skin metabolism and microcirculation, promote cell metabolism, and delay skin aging, adopts plant product as main ingredient, and has the advantage of low liability to allergy compared with common skin care products.
The active ingredients of the general moisturizing mask liquid permeate into skin, so that a protective film can be formed on the surface of the skin, the damage to the skin is reduced, and various effects of moisturizing, moistening and the like are provided for the skin.
The application discloses a general moisturizing facial mask liquid, adopt pure natural plant raw materials, do not have the pollution, also can not produce the side effect to skin, when improving skin quality, also avoided the bounce-back.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.

Claims (6)

1. The embodiment of the application discloses general moisturizing facial mask liquid, which comprises water, propylene glycol, caprylyl hydroxamic acid, glyceryl caprylate, glycyrrhiza glabra (G L YCYRRHIZA G L ABRA) root extract, chamomile (CHAMOMI L0L A RECUTITA) leaf extract, polygonum CUSPIDATUM (PO L6 YGONUM CUSPIDATUM) extract, centella asiatica (CENTE L1A ASIATICA) extract, tea (CAME L3 IASINENSIS) leaf extract, scutellaria BAICALENSIS (SCUTE L4 ARIA BAICA L ENSIS) root extract, rosemary (ROSINUSOFFICA A L) leaf extract, asiatic alcohol, capryl glycol, carbomer, sodium hyaluronate, methylparaben, hydroxyethyl cellulose, wherein the water accounts for 1-50 parts, the propylene glycol 1-20 parts, the caprylyl hydroxamic acid 1-20 parts, glyceryl caprylate 1-20 parts, glycyrrhiza glabra (G L), glycyrrhiza glabra (SAC) root extract for 1-10 parts, polyoxyethylene glycol 1-10 parts, polyoxyethylene sorbitan 5 parts, polyoxyethylene sorbitan 1-10 parts, polyoxyethylene sorbitan 5 parts, polyoxyethylene sorbitan 1-10 parts, polyoxyethylene sorbitan 5-10 parts, polyoxyethylene sorbitan 1-10 parts, polyoxyethylene sorbitan 5 parts, polyoxyethylene sorbitan 1-10 parts of (polyoxyethylene sorbitan 1-10 parts of folium, polyoxyethylene sorbitan 5 parts of (polyoxyethylene sorbitan 1-10 parts of (polyoxyethylene ether) extract, polyoxyethylene ether, polyoxyethylene.
2. The general moisturizing facial mask solution of claim 1, wherein the general moisturizing facial mask solution IS prepared by adding 1-50 parts of water, 1-20 parts of propylene glycol, 1-20 parts of caprylhydroxamic acid, 1-20 parts of glyceryl caprylate, 1-10 parts of Glycyrrhiza glabra (G L YCYRRHIZA G L ABRA) root extract, 1-10 parts of chamomile (Chamomile L0L ARECUTITA) leaf extract, 1-10 parts of Polygonum CUSPIDATUM (PO L YGONUM CUIDATUM) extract, 0.1-10 parts of centella asiatica (CENTE L1A ASIATICA) extract, 1-10 parts of tea (CAME L3 IA SINENSIS) leaf extract, 1-10 parts of Scutellaria BAICALENSIS (SCUTE L ARBAICA 38 ENSIS) root extract, 391-10 parts of Rosemary (Rosmarinus OFFICINALIS) extract, heating the mixture to 0.1-10 parts of propylene glycol, 0.10 parts of propylene glycol, 0-5 parts of propylene glycol, heating the mixture to 10 parts of propylene glycol, filtering the mixture to 0.10 parts of propylene glycol, heating the mixture to 10 parts of propylene glycol, adding 0-5, heating the mixture to 10 parts of propylene glycol, stirring, adding the mixture to 0.10 parts of propylene glycol, stirring, heating the mixture to obtain a capryl ethyl capryl glycol, stirring, adding the mixture to obtain a mixture, heating the mixture, adding the mixture to obtain the mixture, adding the mixture to obtain the mixture, adding the mixture to the mixture, adding the mixture.
3. The universal moisturizing mask solution of claim 1, wherein the preparation process IS free of specific requirements for water, propylene glycol, caprylic hydroxamic acid, glyceryl caprylate, glycyrrhiza glabra (G L ycyrrhiz G L ABRA) root extract, chamomile (chamomil LL ARECUTITA) leaf extract, polygonum CUSPIDATUM (PO L YGONUM cubidatum) extract, centella asiatica (CENTE LL A ASIATICA) extract, tea (CAME LL IA SINENSIS) leaf extract, scutellaria baicalensis (SCUTE LL ARIA BAICA L enis) root extract, rosemary (ROSMARINUS officinalis L IS) leaf extract, phenoxyethanol, caprylyl glycol, carbomer, sodium hyaluronate, methylparaben, and hydroxyethylcellulose.
4. The universal moisturizing mask solution according to claim 1, wherein the preparation process is simple and does not require a complex process.
5. The universal moisturizing mask solution of claim 1, wherein centella asiatica has anti-aging and anti-inflammatory effects, can lighten scars, repair skin with damaged allergic barriers, and maintain skin moisture. Thus, centella asiatica extract has a significant effect in the treatment of dry and sensitive skin.
6. The universal moisturizing mask liquid according to claim 1, wherein the glycyrrhiza glabra root extract has the effects of accelerating lipid peroxide metabolism in a human body, fading color spots, nourishing and tendering skin and improving anti-aging capability of skin.
CN202010396092.5A 2020-05-12 2020-05-12 Universal moisturizing mask liquid Pending CN111419761A (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111658568A (en) * 2020-07-20 2020-09-15 广州葆雀化妆品有限公司 Nourishing and skin-activating lotion and preparation method thereof
CN113230191A (en) * 2021-05-25 2021-08-10 内蒙古满佗丽人健康服务有限公司 Butter moistening and nourishing mask
CN113520953A (en) * 2021-08-19 2021-10-22 广东美思康宸药业股份有限公司 Centella asiatica micro-essence repairing and moisturizing mask liquid and preparation method thereof
CN113693991A (en) * 2021-09-24 2021-11-26 上海梦希生物科技有限公司 Composition for effectively relieving wrinkle generation and preparation method and application thereof
CN113750007A (en) * 2021-08-31 2021-12-07 南京中医药大学 A series of Chinese medicinal compositions for moisturizing and caring skin, and its preparation method
CN113813206A (en) * 2021-09-29 2021-12-21 深圳市薇美经典科技发展有限公司 Preparation for removing redness in post-surgical repair of laser therapy
CN114939087A (en) * 2022-05-16 2022-08-26 同芙集团(中国)股份有限公司 Facial mask and preparation method thereof
CN114948820A (en) * 2022-06-30 2022-08-30 彭氏(惠州)实业发展有限公司 Composition with anti-allergy and relieving effects, application thereof and essence milk

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CN106551868A (en) * 2016-11-28 2017-04-05 益科路博（天津）科技有限公司 A kind of resveratrol multi-effect compound facial film and preparation method thereof
CN108078881A (en) * 2017-12-29 2018-05-29 广州宸极生物科技有限公司 A kind of skin repair liquid
CN110179711A (en) * 2019-06-25 2019-08-30 广州膜束生物科技有限公司 A kind of Essence and preparation method for repairing keratoderma barrier

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111658568A (en) * 2020-07-20 2020-09-15 广州葆雀化妆品有限公司 Nourishing and skin-activating lotion and preparation method thereof
CN113230191A (en) * 2021-05-25 2021-08-10 内蒙古满佗丽人健康服务有限公司 Butter moistening and nourishing mask
CN113520953A (en) * 2021-08-19 2021-10-22 广东美思康宸药业股份有限公司 Centella asiatica micro-essence repairing and moisturizing mask liquid and preparation method thereof
CN113750007A (en) * 2021-08-31 2021-12-07 南京中医药大学 A series of Chinese medicinal compositions for moisturizing and caring skin, and its preparation method
CN113693991A (en) * 2021-09-24 2021-11-26 上海梦希生物科技有限公司 Composition for effectively relieving wrinkle generation and preparation method and application thereof
CN113813206A (en) * 2021-09-29 2021-12-21 深圳市薇美经典科技发展有限公司 Preparation for removing redness in post-surgical repair of laser therapy
CN114939087A (en) * 2022-05-16 2022-08-26 同芙集团(中国)股份有限公司 Facial mask and preparation method thereof
CN114948820A (en) * 2022-06-30 2022-08-30 彭氏(惠州)实业发展有限公司 Composition with anti-allergy and relieving effects, application thereof and essence milk

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Application publication date: 20200717