CN111273800B

CN111273800B - Touch display device and manufacturing method thereof

Info

Publication number: CN111273800B
Application number: CN201811475878.5A
Authority: CN
Inventors: 陈逸轩; 康沐楷; 叶政谚
Original assignee: Hannstar Display Corp
Current assignee: Hannstar Display Corp
Priority date: 2018-12-04
Filing date: 2018-12-04
Publication date: 2023-09-15
Anticipated expiration: 2038-12-04
Also published as: CN111273800A

Abstract

The invention discloses a manufacturing method of a touch display device, which comprises the following steps. A first insulating layer is formed over the thin film transistor. And forming a metal layer on the first insulating layer, wherein the metal layer comprises a touch electrode signal wire. A second insulating layer is formed on the metal layer. And forming a first transparent conductive layer on the second insulating layer, wherein the first transparent conductive layer comprises a touch electrode. A third insulating layer is formed on the first transparent conductive layer. And forming a first connecting hole, a second connecting hole and a third connecting hole, wherein the first connecting hole exposes a part of the touch electrode, the second connecting hole exposes a part of the touch electrode signal line, and the third connecting hole exposes a part of the drain electrode of the thin film transistor. And forming a second transparent conductive layer on the third insulating layer, wherein the second transparent conductive layer comprises a pixel electrode and a connecting electrode, the connecting electrode extends into the first connecting hole and the second connecting hole and is electrically connected with the touch electrode and the touch electrode signal wire, and the pixel electrode extends into the third connecting hole and is electrically connected with the drain electrode.

Description

Touch display device and manufacturing method thereof

Technical Field

The present invention relates to a touch display device and a manufacturing method thereof, and more particularly to an embedded touch display device.

Background

In various electronic products, a touch display device is formed by using a touch component In a matched manner, so that a user can directly communicate with the electronic product to replace a keyboard, a mouse and other traditional input devices, thereby reducing the volume of the electronic product and improving the convenience of man-machine communication.

At present, the process of the embedded touch display device is very complex, and the embedded touch display device formed by using the upper transparent conductive layer and the lower transparent conductive layer as the pixel electrode and the touch electrode respectively is taken as an example, and the embedded touch display device is manufactured by using nine photo-etching processes (PEP), so that the cost is increased. Therefore, how to simplify the process and reduce the manufacturing cost is one of the important research problems in the art.

Disclosure of Invention

The invention aims to solve the technical problems of simplifying the manufacturing process and reducing the manufacturing cost of the touch display device.

In order to solve the above technical problems, the present invention provides a touch display device having a display area and a peripheral area, the touch display device including a substrate, a scan line, a data line, a thin film transistor, a touch electrode signal line, a touch electrode, a pixel electrode and a connection electrode. The scanning lines and the data lines are arranged on the substrate and extend along different directions in the display area. The thin film transistors are arranged on the substrate, wherein each scanning line is respectively and electrically connected with the grid electrode of the corresponding at least one thin film transistor, and each data line is respectively and electrically connected with the source electrode of the corresponding at least one thin film transistor. Each touch electrode signal wire is respectively and electrically connected with the corresponding touch electrode. The pixel electrodes are arranged on the touch electrodes, and each pixel electrode is electrically connected with the drain electrode of the corresponding thin film transistor. The connecting electrodes are arranged on the touch electrode signal lines, wherein the connecting electrodes and the pixel electrodes belong to the same conductive layer, and each touch electrode is electrically connected with the corresponding touch electrode signal line through the corresponding connecting electrode.

In order to solve the technical problems, the invention provides a manufacturing method of a touch display device, which comprises the following steps. A substrate is provided. A thin film transistor is formed on the substrate and includes a gate, a source and a drain. A first insulating layer is formed over the thin film transistor. A metal layer is formed on the first insulating layer, and includes a touch electrode signal line. A second insulating layer is formed on the metal layer and the first insulating layer. A first transparent conductive layer is formed on the second insulating layer and comprises a touch electrode. A third insulating layer is formed on the first transparent conductive layer and the second insulating layer. And forming a first connecting hole, a second connecting hole and a third connecting hole, wherein the first connecting hole exposes a part of the touch electrode, the second connecting hole exposes a part of the touch electrode signal wire, and the third connecting hole exposes a part of the drain electrode. And forming a second transparent conductive layer on the third insulating layer, wherein the second transparent conductive layer comprises a pixel electrode and a connecting electrode, the connecting electrode extends into the first connecting hole and the second connecting hole and electrically connects the contact control electrode and the touch control electrode signal line, and the pixel electrode extends into the third connecting hole and electrically connects the drain electrode.

In the touch display device and the manufacturing method of the invention, the touch electrode is formed by the first transparent conductive layer, and the touch electrode signal line is formed by the third metal layer. The first connecting hole exposes a part of the touch electrode, the second connecting hole exposes a part of the touch electrode signal wire, and the first connecting hole and the second connecting hole are formed together in the same step. The connection electrode may be formed of a second transparent conductive layer. The connecting electrode extends into the first connecting hole to be in contact with the touch electrode, and simultaneously extends into the second connecting hole to be in contact with the touch electrode signal line, so that the touch electrode can be electrically connected with the touch electrode signal line. Therefore, a connecting hole is not required to be formed in the second insulating layer, so that the touch electrode is directly contacted with the touch electrode signal line. In other words, the method for manufacturing the touch display device does not need a patterning process for forming the connecting hole between the touch electrode and the touch electrode signal line, and does not need to manufacture a photomask used in the patterning process, so that the process can be simplified and the manufacturing cost can be reduced.

Drawings

Fig. 1 is a schematic top view of a touch display device according to an embodiment of the invention.

Fig. 2 is a schematic top view of a single touch electrode of a touch display device according to an embodiment of the invention.

Fig. 3 is a schematic top view of a portion of a display area of a touch display device according to an embodiment of the invention.

Fig. 4 is a schematic cross-sectional view of a sub-pixel of a touch display device according to an embodiment of the invention.

Fig. 5 is a flowchart illustrating steps of a method for manufacturing a touch display device according to the present invention.

Fig. 6A-6F are schematic top views of steps for overlapping layers.

Fig. 7A-7F are schematic cross-sectional views of steps for overlapping layers.

Fig. 8 is an enlarged schematic view of a display area edge of a touch display device according to an embodiment of the invention.

Fig. 9 is a schematic configuration diagram of a conductive connection pad of a touch display device according to an embodiment of the invention.

Fig. 10 is a schematic cross-sectional view of an adapter structure according to an embodiment of the invention.

Fig. 11 is a schematic cross-sectional view of a switching structure according to another embodiment of the invention.

Wherein reference numerals are as follows:

10. touch display device

100. Substrate board

102. Touch electrode

102C ₁ -102C _i Touch electrode array

102R ₁ -102R _j Touch electrode row

103. Connection electrode

104. A first metal layer

106. Second metal layer

108. Third metal layer

110. First transparent conductive layer

112. Second transparent conductive layer

114. A first insulating layer

116. Second insulating layer

118. Third insulating layer

119. Fourth insulating layer

120. Integrated circuit

122. Junction region

123. Bridging electrode

124. Switching structure

A. Region B

BP1 first conductive connection pad

BP2 second conductive connection pad

BPR1 first conductive connection pad row

BPR2 second conductive connection pad row

CE. Ce_1, ce_2, ce_3, ce_4 common electrode

CH semiconductor layer

CP connecting portion

CP_1 first connecting portion

D drain electrode

D1 First direction

D2 Second direction

DL, dl_1, dl_2 data lines

DR display area

G grid electrode

GI gate insulation layer

OP opening

PE pixel electrode

PX pixel

S source electrode

SL scan line

SP sub-pixel

SPR _h 、SPR _h-1 Sub-pixel row

SSL touch electrode signal line

T thin film transistor

TC1, TC1_1 first wiring

TC2, TC2_1 second wiring

First part of TC2_a

A second part of TC2_b

TC3 third wiring

TH1 first connecting hole

TH2 second connecting hole

TH3 third connecting hole

TH4, th4_1, th4_2 fourth connecting hole

V vertical projection direction

Included angle theta

Detailed Description

The following description sets forth the preferred embodiments of the invention and, together with the drawings, provides further details of the invention and its intended advantages, as will be apparent to those skilled in the art. It should be noted that the drawings are simplified schematic diagrams, and thus only show components and combinations related to the present invention, so as to provide a clearer description of the basic architecture or implementation of the present invention, and actual components and arrangements may be more complex. In addition, for convenience of explanation, the components shown in the drawings of the present invention are not drawn in the same scale as the number, shape, size, etc. of actual implementations, and the detailed proportion thereof may be adjusted according to the design requirements.

Fig. 1 is a schematic top view of a touch display device according to an embodiment of the invention. In order to make the drawing more simplified and easier to understand, fig. 1 depicts only the touch electrode 102 and a portion of the touch electrode signal lines SSL and omits the dummy signal lines DSL in the display area DR. Touch display of this embodimentThe display device 10 is exemplified by an in-cell liquid crystal touch display device, but not limited thereto. As shown in fig. 1, the substrate 100 of the touch display device 10 has a display region DR and a peripheral region PR disposed at least on one side outside the display region DR. In the present embodiment, the peripheral region PR surrounds the display region DR, but is not limited thereto. The substrate 100 may be a hard substrate such as a glass substrate, a plastic substrate, a quartz substrate or a sapphire substrate, or may be a flexible substrate including a Polyimide (PI) material or a polyethylene terephthalate (polyethylene terephthalate, PET) material, but is not limited thereto. The display region DR of the substrate 100 is provided with a plurality of touch electrodes 102, and the touch electrodes 102 are separated from each other. The touch electrodes 102 may be arranged in i columns (columns) and j rows (row), wherein the touch electrode rows 102R ₁ -102R _j Extending along a first direction D1, and a touch electrode row 102C ₁ -102C _i Extends along a second direction D2, and the first direction D1 and the second direction D2 are not parallel. The first direction D1 and the second direction D2 of the present embodiment are perpendicular, but are not limited thereto. For example, the touch electrodes 102 in the present embodiment are arranged in 18 rows (i=18) and 32 columns (j=32), that is, the total number of the touch electrodes 102 is 576, but not limited thereto. In other embodiments, the touch electrodes 102 may have different arrangements or different numbers of touch electrodes 102 according to the design of the touch display device 10. In addition, the touch electrode 102 in the present embodiment is used as a common electrode (common electrode) during the display period of the touch display device 10, and is used for sensing the touch position of the user during the touch sensing period of the touch display device 10, but is not limited thereto.

The touch display device 10 has a plurality of touch electrode signal lines SSL disposed on a substrate 100. The touch electrode signal lines SSL substantially extend along the second direction D2, and each touch electrode signal line SSL is electrically connected to a corresponding one of the touch electrodes 102 to transmit and/or receive touch related signals. However, the touch electrode signal line SSL may be bent or zigzag (zigzag) extending in the second direction D2, not limited to the straight line form shown in fig. 1, which will be described in detail below. In this embodiment, each touch electrode row has 32 touch electrodes 102, wherein each touch electrode row is correspondingly provided with 32 touch electrode signal lines SSL, and each touch electrode signal line SSL is electrically connected with a corresponding one of the touch electrodes 102. As shown in fig. 1, each touch electrode signal line SSL is electrically connected to a corresponding one of the touch electrodes 102 through a connection structure 103. For example, in the embodiment where the touch electrode signal lines SSL and the touch electrode 102 are formed by a metal layer and a transparent conductive layer, respectively, the transparent conductive material of a connection electrode 103 (formed by another transparent conductive layer different from the touch electrode 102) may be filled into the connection hole exposing the touch electrode signal lines SSL and another connection hole exposing the touch electrode 102 to form the connection electrode 103 electrically connecting the touch electrode signal lines SSL and the touch electrode 102 of different layers, which is described in detail below. In addition, in fig. 1, each touch electrode signal line SSL passes through the area of 32 touch electrodes 102 in the corresponding touch electrode row, that is, each touch electrode signal line SSL overlaps with 32 touch electrodes 102 in the corresponding touch electrode row in the direction perpendicular to the substrate 100, but not limited thereto. In other embodiments, at least a portion of the touch electrode signal lines SSL traverse the area of a portion of the touch electrodes 102 in the corresponding touch electrode row.

Referring to fig. 2, a schematic top view of a single touch electrode of a touch display device according to an embodiment of the invention is shown. The touch display device 10 of the present embodiment may further optionally include a plurality of dummy signal lines DSL extending substantially along the second direction D2 and substantially parallel to the touch electrode signal lines SSL, i.e. the dummy signal lines DSL may also extend along the second direction D2 in a zigzag or meandering manner, but not limited thereto. FIG. 2 depicts a top view of a touch electrode 102, a portion of the dummy signal line DSL, and a portion of the touch electrode signal line SSL, which may be, for example, the touch electrode row 102C of the first left row of FIG. 1 ₁ Is provided, wherein one of the touch electrodes 102 is provided. As shown in fig. 2, for the touch electrode row 102C ₁ In other words, the dummy signal line DSL passes through all the areas of the touch electrode 102, but is not limited thereto. The dummy signal line DSL is not electrically connected to the touch electrode 102. Furthermore, for each ofThe dummy signal lines DSL of one part are arranged on one side of the group of touch electrode signal lines SSL in the first direction D1, and the dummy signal lines DSL of the other part are arranged on the other side of the group of touch electrode signal lines SSL in the first direction D1. In other words, for the touch electrode row 102C ₁ The virtual signal line DSL is divided into two parts, and the virtual signal line DSL is respectively arranged at two sides of the group of touch electrode signal lines SSL in the first direction D1.

In the present embodiment, the touch electrodes 102 are arranged in i columns and j rows, and the touch display device 10 has a plurality of touch electrode signal lines SSL and a plurality of dummy signal lines DSL, wherein the number of touch electrode signal lines SSL is equal to the product of i and j. The plurality of touch electrode signal lines SSL and the plurality of virtual signal lines DSL are divided into i groups in a first direction D1, each group corresponds to one touch electrode row, and each group comprises j touch electrode signal lines SSL and k virtual signal lines DSL, wherein i, j and k are positive integers which are more than or equal to 2. Among a group of touch electrode signal lines SSL and virtual signal lines DSL, j touch electrode signal lines SSL are disposed between a portion of k virtual signal lines DSL and the rest of k virtual signal lines DSL. In other words, j touch electrode signal lines SSL are disposed between m dummy signal lines DSL and (k-m) dummy signal lines DSL, where m is a positive integer greater than or equal to 1 and less than k. For example, when the touch electrodes 102 are arranged in 18 columns and 32 rows, i.e., i and j are respectively 18 and 32, and the number of the touch electrode signal lines SSL is equal to the product of i and j, i.e., 576 touch electrode signal lines SSL, the plurality of (e.g., 576) touch electrode signal lines SSL and the plurality of virtual signal lines DSL of the touch display device 10 are divided into 18 groups in the first direction D1, and the number of the touch electrode signal lines SSL and the virtual signal lines DSL in each group is respectively 32 and 8, i.e., k is 8, and the 32 touch electrode signal lines SSL may be disposed between 4 virtual signal lines DSL and 4 virtual signal lines DSL, between 3 virtual signal lines DSL and 5 virtual signal lines DSL, between 2 virtual signal lines DSL and 6 virtual signal lines DSL, or between 1 virtual signal line DSL and 7 virtual signal lines DSL, but not limited thereto. In addition, the arrangement of the touch electrode signal lines SSL and the dummy signal lines DSL in each group may be the same or different.

For example, in one embodiment, j touch electrode signal lines SSL among each group of touch electrode signal lines SSL and virtual signal lines DSL are disposed between m virtual signal lines DSL and (k-m) virtual signal lines DSL, but not limited thereto. In other embodiments, j touch electrode signal lines SSL in at least one group may be disposed between m dummy signal lines DSL and (k-m) dummy signal lines DSL, and j touch electrode signal lines SSL in at least another group may be disposed between n dummy signal lines DSL and (k-n) dummy signal lines DSL, where n is a positive integer greater than or equal to 1 and less than k, and m is not equal to n.

As shown in fig. 2, each touch electrode 102 corresponds to a plurality of pixels PX, wherein the pixels PX are disposed in the display region DR in fig. 1. In the present embodiment, the resolution of the touch display device 10 is 720×1440, i.e. the pixels PX are arranged in 720 columns and 1440 rows. Since the touch electrodes 102 of the present embodiment are arranged in 18 columns and 32 rows, each touch electrode 102 corresponds to 40 pixels PX in the first direction D1 and 45 pixels PX in the second direction D2. In addition, each column of pixels PX is correspondingly provided with a touch electrode signal line SSL or a dummy signal line DSL. In the present embodiment, each touch electrode signal line SSL or dummy signal line DSL is disposed adjacent to one column of pixels PX or disposed between two adjacent columns of pixels PX, but is not limited thereto. As described above, for any touch electrode row, the corresponding 32 touch electrode signal lines SSL pass through the region of the 32 touch electrodes 102, that is, one of the plurality of touch electrode signal lines SSL overlaps each touch electrode 102 in one touch electrode row, and each row of pixels PX is correspondingly provided with one touch electrode signal line SSL, so that 32 pixels PX of the 40 pixels PX corresponding to each touch electrode 102 in the first direction D1 all are adjacent to one touch electrode signal line SSL, and the rest 8 pixels PX are adjacent to no touch electrode signal line SSL. Because the touch electrode signal lines SSL are formed of opaque metal, which reduces the aperture ratio of the pixels PX, the present invention sets a dummy signal line DSL beside each of the remaining 8 pixels PX that are not adjacent to the touch electrode signal lines SSL, so that the aperture ratios of the different pixels PX are consistent, so as to avoid the regional difference in the visual effect of the touch display device 10.

Fig. 3 is a schematic top view of a portion of a display area of a touch display device according to an embodiment of the invention. As shown in fig. 3, the touch display device 10 includes a plurality of scan lines SL and a plurality of data lines DL in a display region DR. The scan lines SL extend along a first direction D1, the extending direction of the data lines DL is not parallel to the first direction D1 and extends along a second direction D2, and the scan lines SL and the data lines DL define a plurality of sub-pixels SP in a staggered manner. In the present embodiment, the top-view shape of the sub-pixel SP may be a shape similar to a parallelogram, but is not limited thereto. In the present embodiment, the shape of the sub-pixel SP is similar to a parallelogram, and the top and bottom sides thereof are parallel to the first direction D1 and the other two sides thereof are not parallel to the first direction D1 and the second direction D2. For example, sub-pixel rows SPR in two adjacent rows _h 、SPR _h-1 In sub-pixel row SPR _h With a positive angle θ (e.g., 7 degrees) between the side edges in the parallelogram of the sub-pixels SP and the second direction D2, while the sub-pixel rows SPR _h-1 The side of the parallelogram of the sub-pixels SP has a negative angle- θ (e.g., -7 degrees) with the second direction D2, i.e., the parallelograms of the sub-pixels SP of two adjacent rows are different but symmetrical to the imaginary line parallel to the first direction D1, so that the adjacent sub-pixels SP are arranged in the second direction D2 <Character form or>The sub-pixels SP are arranged in a zigzag shape in the second direction D2, but not limited thereto. In one embodiment, the shape of the sub-pixels may be rectangular. In another embodiment, one sub-pixel SP has the shape of>Character form or<Character form, and>character pattern sub-pixel SP and character pattern sub-pixel<The zigzag subpixels SP may be alternately arranged along the second direction D2.

In addition, as shown in fig. 3, each touch electrode signal line SSL is adjacent to one of the data lines DL, but not limited thereto. In other embodiments, each touch electrode signal line SSL may at least partially overlap with one of the data lines DL in the vertical projection direction V and be electrically insulated from each other. In the display region DR, the data lines DL and the touch electrode signal lines SSL are substantially parallel to each other, and the data lines DL and the touch electrode signal lines SSL extend along sides of the parallelogram of the sub-pixels SP. In other words, the data lines DL and the touch electrode signal lines SSL in the display region DR may also have a bent shape along the second direction D2, but not limited thereto. In addition, the dummy signal line DSL may also have the same or similar features as the touch electrode signal line SSL described above.

Fig. 4 is a schematic cross-sectional view of a sub-pixel of a touch display device according to an embodiment of the invention. As shown in fig. 3 and 4, the touch display device 10 includes a first metal layer 104, a second metal layer 106, a third metal layer 108, a first transparent conductive layer 110, and a second transparent conductive layer 112. In addition, the touch display device 10 further includes a first insulating layer 114, a second insulating layer 116, and a third insulating layer 118. The first metal layer 104 is disposed on the substrate 100 and includes scan lines SL. The second metal layer 106 is disposed on the first metal layer 104 and includes the data line DL. The first insulating layer 114 is disposed on the thin film transistor T and may cover the second metal layer 106. The third metal layer 108 includes a touch electrode signal line SSL and a dummy signal line DSL. The first transparent conductive layer 110 is disposed on the third metal layer 108 and includes the touch electrode 102. In detail, the first transparent conductive layer 110 includes a plurality of common electrodes CE respectively disposed in the sub-pixels SP, and each of the touch electrodes 102 is formed by electrically connecting the common electrodes CE of the corresponding sub-pixels SP, in other words, one of the touch electrodes 102 includes a plurality of common electrodes CE respectively corresponding to the sub-pixels SP, and the first transparent conductive layer 110 is disconnected between the adjacent touch electrodes 102. The second insulating layer 116 is disposed on the first insulating layer 114 and between the third metal layer 108 and the first transparent conductive layer 110. The second transparent conductive layer 112 is disposed on the first transparent conductive layer 110, the second metal layer 106, and the third metal layer 108, and includes a plurality of pixel electrodes PE disposed in the respective sub-pixels SP of the display region DR, respectively. As shown in fig. 3, the pixel electrode PE of the present embodiment may have at least one opening (or may be referred to as a slit) OP. The opening OP overlaps the common electrode CE in the vertical projection direction V, so that the common electrode CE and the pixel electrode PE can generate fringe electric fields to rotate the liquid crystal by the arrangement of the opening OP. The vertical projection direction V of the present embodiment may be perpendicular to the surface of the substrate 100, but is not limited thereto. The pixel electrode PE of the present embodiment has two openings OP, but the number of openings OP is not limited thereto. The third insulating layer 118 is disposed on the second insulating layer 116 and between the first transparent conductive layer 110 and the second transparent conductive layer 112.

In this embodiment, the second transparent conductive layer 112 further includes a plurality of connection electrodes 103 disposed in the display region DR, and the touch display device 10 further includes a plurality of first connection holes TH1 and a plurality of second connection holes TH2 disposed in the display region DR. The first connection holes TH1 penetrate through the third insulating layer 118, wherein each of the first connection holes TH1 exposes a portion of one of the touch electrodes 102 (or the common electrode CE), respectively. The second connection holes TH2 penetrate through the second insulating layer 116 and the third insulating layer 118, wherein each of the second connection holes TH2 exposes a portion of one of the touch electrode signal lines SSL. Accordingly, the plurality of connection electrodes 103 respectively extend into one of the first connection holes TH1 and one of the second connection holes TH2 and simultaneously contact with the touch electrode 102 exposed by the first connection hole TH1 and the touch electrode signal line SSL exposed by the second connection hole TH2, so that the touch electrode 102 can be electrically connected to the corresponding touch electrode signal line SSL through the corresponding connection electrode 103. Further, the pixel electrode PE and the connection electrode 103 are electrically isolated, and the pixel electrode PE and the connection electrode 103 are not connected.

On the other hand, in the display region DR of the touch display device 10, each sub-pixel SP includes a thin film transistor T. The structure of the thin film transistor T will be described below. As shown in fig. 3 and 4, the thin film transistor T of the present embodiment may be a bottom gate thin film transistor (bottom-gate thin film transistor), but not limited thereto, and in other embodiments, the thin film transistor T may be a top gate thin film transistor (top-gate thin film transistor). In addition, the thin film transistor T may be, for example, a low temperature polysilicon (low temperature poly-silicon, LTPS) thin film transistor, an indium gallium zinc oxide (indium gallium zinc oxide, IGZO) thin film transistor, or an amorphous silicon (a-Si) thin film transistor, but not limited thereto, the thin film transistor T is disposed between the substrate 100 and the second transparent conductive layer 112. The thin film transistor T includes a gate G, a gate insulating layer GI, a source S, a drain D, and a semiconductor layer CH.. The thin film transistor T may further include ohmic contact layers (not shown in FIG. 4) disposed between the source S and the semiconductor layer CH and between the drain D and the semiconductor layer CH. In the present embodiment, the gate insulating layer GI is a portion of the fourth insulating layer 119. In some embodiments, the fourth insulating layer 119 may be patterned as the first metal layer 104 of the gate insulating layer GI. includes the gate G of the thin film transistor T, wherein the scanning lines SL are electrically connected to the gate G of at least one thin film transistor T, respectively, to provide a control signal for the switching of the thin film transistor T for updating the display.

The second metal layer 106 includes a source S and a drain D of the thin film transistor T, wherein the data lines DL are electrically connected to the source S of at least one thin film transistor T, respectively, to provide a grayscale signal to the source S of the thin film transistor T. Each pixel electrode PE is electrically connected to the drain electrode D of one of the corresponding thin film transistors T. The transparent conductive material of each pixel electrode PE may extend into one of the third connection holes TH3 to contact the drain electrode D exposed by the third connection hole TH3, wherein the third connection hole TH3 penetrates the first, second and third insulating layers 114, 116 and 118. Since the first metal layer 104 and the second metal layer 106 are formed by metal, they have lower resistance, so that the attenuation of the signal during transmission can be reduced. The first metal layer 104 and the second metal layer 106 may be single metal layers or stacked metal layers. The first metal layer 104 and the second metal layer 106 may be single metal layers of aluminum, copper, titanium, tungsten, or composite metal layers of molybdenum/aluminum/molybdenum, titanium/aluminum/titanium, titanium/copper …, but the invention is not limited thereto.

The gate insulating layer GI is disposed on and covers the gate electrode G, and the semiconductor layer CH is disposed between the gate insulating layer GI and the source electrode S and the drain electrode D. The semiconductor layer CH may be amorphous silicon, polysilicon, or a metal oxide (e.g., indium gallium zinc oxide), for example. The first, second and third insulating layers 114, 116 and 118 are disposed between the second metal layer 106 (e.g., the drain electrode D) and the second transparent conductive layer 112 (e.g., the pixel electrode PE). The gate insulating layer GI, the first insulating layer 114, the second insulating layer 116 and the third insulating layer 118 may be silicon oxide, silicon nitride or silicon oxynitride, but are not limited thereto. The thickness of the first insulating layer 114 may range from 3000 to 4000 angstroms, the thickness of the second insulating layer 116 may range from 2500 to 3500 angstroms, and the thickness of the third insulating layer 118 may range from 1000 to 2000 angstroms, but is not limited thereto. In the present embodiment, the thickness of the first insulating layer 114 is 3500 angstroms, the thickness of the second insulating layer 116 is 3000 angstroms, and the thickness of the third insulating layer 118 is 1500 angstroms.

The first transparent conductive layer 110 and the second transparent conductive layer 112 can be Indium Tin Oxide (ITO), indium zinc oxide (indium zinc oxide, IZO), or aluminum zinc oxide (aluminum zinc oxide, AZO), but are not limited thereto.

Referring to fig. 3, fig. 4, fig. 5, fig. 6A-6F, and fig. 7A-7F, fig. 5 is a flowchart illustrating steps of a method for manufacturing a touch display device according to the present invention, and fig. 6A-6F and fig. 7A-7F are a schematic top view and a schematic cross-sectional view of overlapping layers. The present embodiment also provides a method for manufacturing a touch display device, which includes steps S100 to S116 as shown in fig. 5, and is not limited to the following sequence.

Step S100: a substrate 100 is provided.

Step S102: at least one scan line SL, at least one data line DL and at least one thin film transistor T are formed on the substrate 100, wherein the thin film transistor T comprises a gate G, a gate insulating layer GI, a semiconductor layer CH, a source S and a drain D. Step S102 includes forming the scan lines SL and the gate electrodes G (see fig. 6A and 7A), forming the gate insulating layer GI, forming the semiconductor layer CH (see fig. 6B and 7B), and forming the data lines DL, the source electrodes S and the drain electrodes D (see fig. 6C and 7C). In some embodiments, ohmic contact layers may be further provided between the source electrode S and the semiconductor layer CH and between the drain electrode D and the semiconductor layer CH. For example, an ohmic contact layer may be formed on the semiconductor layer CH of fig. 6B and 7B, which may be formed by the same photolithography-etching process as the semiconductor layer CH, and then the portion of the ohmic contact layer uncovered by the source S and the drain D is etched when the source S and the drain D are formed, so that the ohmic contact layer is formed between the source S and the semiconductor layer CH and between the drain D and the semiconductor layer CH, but the forming method of the ohmic contact layer is not limited thereto.

Step S104: a first insulating layer 114 is formed on the scan lines SL, the data lines DL, and the thin film transistors T.

Step S106: a metal layer (such as the third metal layer 108) is formed on the first insulating layer 114, and the metal layer includes a touch electrode signal line SSL (see fig. 6D and 7D).

Step S108: a second insulating layer 116 is formed over the metal layer and the first insulating layer 114.

Step S110: a first transparent conductive layer 110 is formed on the second insulating layer 116, and the first transparent conductive layer 110 includes a touch electrode 102 (see fig. 6E and 7E).

Step S112: a third insulating layer 118 is formed on the first transparent conductive layer 110 and the second insulating layer 116.

Step S114: a first connection hole TH1, a second connection hole TH2, and a third connection hole TH3 are formed (refer to fig. 6F and 7F). The first connection holes TH1 penetrate through the third insulating layer 118 to expose a portion of the touch electrode 102. The second connection holes TH2 penetrate through the second insulating layer 116 and the third insulating layer 118 to expose a portion of the touch electrode signal lines SSL. The third connection holes TH3 penetrate the first, second and third insulating layers 114, 116 and 118 to expose a portion of the drain electrode D. The first, second and third connection holes TH1, TH2 and TH3 are formed together in the same patterning step.

Step S116: a second transparent conductive layer 112 is formed on the third insulating layer 118, and the second transparent conductive layer 112 includes a pixel electrode PE and a connection electrode 103 (see fig. 3 and 4). The connection electrode 103 extends into the first connection hole TH1 and the second connection hole TH2, and electrically connects the touch electrode 102 and the touch electrode signal line SSL. In addition, the pixel electrode PE extends into the third connection hole TH3 and is electrically connected to the drain electrode D. The method of forming the components in the above steps may include any suitable patterning process and may include, for example, a photolithography process, an etching process, and the like.

In the method for manufacturing the touch display device of the present embodiment, the touch electrode 102 and the touch electrode signal line SSL are electrically connected to each other through the connection electrode 103, wherein the connection electrode 103 and the pixel electrode PE are formed together through the same process, and the first connection hole TH1, the second connection hole TH2 and the third connection hole TH3 are formed together through the same process. Thus, no additional process step is required to form a connection hole in the second insulating layer 116 to allow the touch electrode 102 to directly contact the touch electrode signal line SSL. In other words, the method for manufacturing the touch display device of the present embodiment does not require a patterning process for forming the connection hole between the touch electrode 102 and the touch electrode signal line SSL, and does not require a photomask (photo mask) used for the patterning process, so that the process can be simplified and the manufacturing cost can be reduced.

In addition, as described above, the metal layer (the third metal layer 108 described above) for forming the touch electrode signal lines SSL is disposed under the first transparent conductive layer 110 for forming the touch electrodes 102 in the present embodiment, that is, the step of forming the touch electrode signal lines SSL is performed before the step of forming the touch electrodes 102, and the advantages thereof are described in detail below. As shown in fig. 6E, the plurality of common electrodes CE respectively correspond to the plurality of sub-pixels SP, and the adjacent common electrodes CE are electrically connected to each other through the connection portion CP formed by the first transparent conductive layer 110 so as to electrically connect the plurality of common electrodes CE to each other to form one touch electrode 102. The connection portion CP includes a first connection portion cp_1, at least a portion of the first connection portion cp_1 is disposed in a region between four adjacent common electrodes ce_1, ce_2, ce_3 and ce_4, and the first connection portion cp_1 is electrically connected to the touch electrode signal lines SSL through the connection electrode 103 in addition to the adjacent common electrodes ce_1 and ce_2, so as to electrically connect the touch electrode 102 and the corresponding touch electrode signal lines SSL. Since the third metal layer 108 forming the touch electrode signal line SSL is disposed below the first transparent conductive layer 110 forming the touch electrode 102, the first connection portion cp_1 is disposed above the touch electrode signal line SSL and is not covered by the touch electrode signal line SSL, such that the first connection hole TH1 may be disposed above the first connection portion cp_1 and expose a portion of the first connection portion cp_1 (i.e., a portion of the touch electrode 102), and the second connection hole TH2 may expose a portion of the touch electrode signal line SSL, and the connection electrode 103 may extend into the first connection hole TH1 and the second connection hole TH2 and electrically connect the touch electrode 102 and the touch electrode signal line SSL. As shown in fig. 3, since the pixel electrode PE and the connection electrode 103 are the same as the second transparent conductive layer 112 and are electrically insulated from each other, the corners of the pixel electrodes pe_1 and pe_3 near the connection electrode 103 have the oblique sides pes_1 and pes_3 to increase the distance between the pixel electrode PE and the connection electrode 103, thereby avoiding the short circuit between the pixel electrode PE and the connection electrode 103. In summary, since the step of forming the touch electrode signal line SSL is performed before the step of forming the touch electrode 102, the third metal layer 108 forming the touch electrode signal line SSL is disposed under the first transparent conductive layer 110 forming the touch electrode 102, and thus the connection electrode 103 electrically connected to the touch electrode signal line SSL and the touch electrode 102 can be disposed in the area between the adjacent four common electrodes ce_1, ce_2, ce_3 and ce_4, so as to avoid influencing the design of the pixel electrode PE (e.g. influencing the number and width of the openings OP of the pixel electrode PE) and the transmittance due to the distance between the connection electrode 103 and the pixel electrode PE.

Referring to fig. 1, 8 and 9, fig. 8 is an enlarged schematic view of a display area edge of a touch display device according to an embodiment of the invention, and fig. 9 is a schematic view of a configuration of a conductive connection pad of the touch display device according to an embodiment of the invention. Fig. 8 and 9 are enlarged views of the areas a and B in fig. 1. As shown in fig. 1, the touch display device 10 of the present embodiment includes an integrated circuit (integrated circuit, IC) 120 disposed on the substrate 100 in the peripheral region PR, and the touch display device 10 further includes a plurality of first conductive connection pads BP1 and a plurality of second conductive connection pads BP2 disposed on the substrate 100 and located in the peripheral region PR (as shown in fig. 9). The substrate 100 has a bonding region 122 disposed in the peripheral region PR, and the integrated circuit 120, the first conductive connection pad BP1 and the second conductive connection pad BP2 are disposed in the bonding region 122. The touch display device 10 further includes a plurality of first traces TC1, a plurality of second traces TC2, and a plurality of third traces TC3 disposed in the peripheral region PR, through which the touch electrode signal lines SSL and the data lines DL in the display region DR can extend to the bonding region 122 in the peripheral region PR, so that the touch electrode signal lines SSL and the data lines DL are electrically connected to the first conductive connection pads BP1 and the second conductive connection pads BP2, respectively. The connection manner of the first trace TC1, the second trace TC2 and the third trace TC3 is described in detail below. It should be noted that fig. 9 only depicts the touch electrode signal line SSL, the data line DL, the first conductive connection pad BP1 and the second conductive connection pad BP2 and omits the integrated circuit 120.

In the present embodiment, the integrated circuit 120 may include a source driving circuit and a touch sensing circuit, and the integrated circuit 120 may be disposed on the substrate 100 in the form of a chip or SOG (System on Glass), but is not limited thereto. In an embodiment in which the integrated circuit 120 is a chip and is disposed on the substrate 100, the integrated circuit 120 includes a plurality of pads, and at least some of the plurality of pads are located at positions corresponding to and electrically connected to the first conductive connection pad BP1 and the second conductive connection pad BP2, respectively. In a variant embodiment, the integrated circuit 120 may be disposed on a flexible or hard circuit board in the form of a chip and then electrically connected to a plurality of conductive connection pads on the substrate 100, where the plurality of conductive connection pads are electrically connected to the touch electrode signal lines SSL and the data lines DL. The touch electrode signal line SSL is electrically connected to the integrated circuit 120, so that the integrated circuit 120 can transmit and/or receive touch sensing signals. The data line DL may also be electrically connected to the integrated circuit 120, wherein the integrated circuit 120 is capable of transmitting a grayscale signal of the image to the data line DL.

As shown in fig. 8 and 9, the arrangement of the touch electrode signal lines SSL and the data lines DL along the first direction D1 is sequentially three data lines DL (respectively electrically connected to the sub-pixels SP corresponding to different colors), one touch electrode signal line SSL, three data lines DL, and one touch electrode signal line SSL …. Each of the first traces TC1 is coupled to a corresponding one of the touch electrode signal lines SSL, and the first traces TC1 and the touch electrode signal lines SSL may be formed by the third metal layer 108 and may be formed together by the same process. Each of the second wires TC2 is coupled to the corresponding data line dl_1, the data line dl_1 may be formed by the second metal layer 106, and the second wire TC2 includes a first portion tc2_a and a second portion tc2_b, the first portion tc2_a may be formed by the second metal layer 106, and the second portion tc2_b may be formed by the first metal layer 104. The first portion tc2_a can be electrically connected to the corresponding second portion tc2_b in the peripheral region PR through the transfer structure 124. The interposer fabric 124 is used to electrically connect the different metal layers, the detailed features of which are described in detail below. Each third wire TC3 is coupled to the corresponding data line dl_2, and the third wire TC3 and the data line dl_2 may be formed by the second metal layer 106 and may be formed together by the same process. Herein, the first wire TC1 is also referred to as a touch wire, and the second wire TC2 and the third wire TC3 are also referred to as data wires. As shown in fig. 8 and 9, since the first wires TC1 and the second wires TC2 respectively belong to different metal layers, and the first wires TC1 and the third wires TC3 respectively belong to different metal layers, a portion of one of the plurality of first wires TC1 (e.g., tc1_1 in fig. 8) and a portion of one of the plurality of second wires TC2 (e.g., tc2_1 in fig. 8) may be parallel to and overlap with each other (e.g., tc1_1/tc2_1 in fig. 8) in the extending direction of the peripheral region PR, so as to reduce the area occupied by the wires in the peripheral region PR, but not limited thereto. In other embodiments, a portion of one of the plurality of first traces TC1 and a portion of one of the plurality of third traces TC3 may be parallel and overlap each other in the extending direction in the peripheral region PR. Since the insulating layer between the first metal layer 104 and the third metal layer 108 is thicker than the insulating layer between the first metal layer 104 and the second metal layer 106, signal coupling or interference between the first trace TC1 and the overlapped second trace TC2 or third trace TC3 can be reduced, so that the first trace TC1 belonging to the third metal layer 108 is preferably overlapped with a portion of the second trace TC2 belonging to the first metal layer 104, but not limited thereto. Since the first wire TC1 and the third wire TC3 respectively belong to different metal layers, and the second portion tc2_b and the third wire TC3 of the second wire TC2 respectively belong to different metal layers, and the pitch between the wires of two adjacent different metal layers may be smaller than the pitch between the wires of two adjacent same metal layers, the distance between the third wire TC3 and the second wire TC2 (e.g., the distance between tc3_1 and tc2_1 in fig. 8) may be reduced, and the distance between the third wire TC3 and the first wire TC1 and the second wire TC2 overlapping each other (e.g., the distance between tc3_1 and tc1/tc2_1 in fig. 8) may be reduced to reduce the area occupied by the wires in the peripheral region PR. In addition, since the first wires TC1 and the second wires TC2 respectively belong to different metal layers, the first wires TC1 and the third wires TC3 respectively belong to different metal layers, and a portion of the second wires TC2 and a portion of the third wires TC3 respectively belong to different metal layers, in other embodiments, a portion of one of the plurality of first wires TC1, a portion of one of the plurality of second wires TC2, and a portion of one of the plurality of third wires TC3 may be parallel to and overlap each other in an extending direction in the peripheral region PR, in other words, the first wires TC1 may partially overlap the corresponding second wires TC2 and third wires TC3, so as to further reduce an area occupied by the wires in the peripheral region PR.

Referring to fig. 10, fig. 10 is a schematic cross-sectional view of an adapting structure 124 according to an embodiment of the invention, and the position corresponds to a line A-A' in fig. 8. As shown in fig. 10, the via structure 124 may include a metal pad of the first metal layer 104, a metal pad of the second metal layer 106, and at least one fourth connection hole TH4 corresponding to the metal pads. The metal pad of the second metal layer 106 may be located at one end of the first portion tc2_a of the second trace TC2, the metal pad of the first metal layer 104 may be located at one end of the second portion tc2_b of the second trace TC2, and the metal pad of the second metal layer 106 covers the metal pad of the first metal layer 104. The fourth connection holes TH4 are disposed in the insulating layer between the second metal layer 106 and the first metal layer 104, each of the fourth connection holes TH4 exposes a portion of the metal pad of the first metal layer 104, and the metal material of the second metal layer 106 may be filled into the fourth connection holes TH4 and contact the metal pad of the first metal layer 104 exposed by the fourth connection holes TH4.

Referring to fig. 11, fig. 11 is a schematic cross-sectional view of an adapting structure 124 according to another embodiment of the invention. As shown in fig. 11, the via structure 124 may include a metal pad of the first metal layer 104, a metal pad of the second metal layer 106, at least two fourth connection holes th4_1, th4_2 corresponding to the metal pads, and a bridge electrode 123. The metal pad of the second metal layer 106 may be located at one end of the first portion tc2_a of the second trace TC2, and the metal pad of the first metal layer 104 may be located at one end of the second portion tc2_b of the second trace TC 2. At least one fourth connection hole th4_1 is disposed in the insulating layer between the bridge electrode 123 and the second metal layer 106 and exposes a portion of the metal pad of the second metal layer 106, and at least another fourth connection hole th4_2 is disposed in the insulating layer between the bridge electrode 123 and the first metal layer 104 and exposes a portion of the metal pad of the first metal layer 104. The bridge electrode 123 fills in the fourth connection holes th4_1 and th4_2 and contacts the metal pad of the first metal layer 104 and the metal pad of the second metal layer 106 exposed by the fourth connection holes th4_1 and th4_2, that is, the first metal layer 104 and the second metal layer 106 are electrically connected to each other by the bridge electrode 123. In this embodiment, the bridge electrode 123 may be formed by the second transparent conductive layer 112, in other words, the bridge electrode 123 may be formed together with the pixel electrode PE in the same step, but not limited thereto. In another embodiment, the bridge electrode 123 may be formed by the third metal layer 108 or the first transparent conductive layer 110, in other words, the bridge electrode 123 may be formed together with the touch electrode signal line SSL or the touch electrode 102 in the same step. In addition, in still another embodiment, the bridge electrode 123 may be formed of a conductor layer different from the third metal layer 108, the first transparent conductive layer 110, and the second transparent conductive layer 112. It should be noted that, the switching structure 124 of fig. 10 and fig. 11 is exemplified, and the first portion tc2_a of the second trace TC2 may be electrically connected to the corresponding second portion tc2_b of the switching structure 124 of fig. 10 and fig. 11 through the peripheral region PR.

In the present embodiment, the extending directions of the corresponding first wires TC1 and the second wires TC2 are parallel and overlap each other (e.g., TC1/TC2 in fig. 9), and the regions extending to the vicinity of the first conductive connection pads BP1 and the second conductive connection pads BP2 are separated and do not overlap each other (e.g., as shown in fig. 9) so as to extend to the corresponding conductive connection pads, respectively. In this area, each first trace TC1 extends to a corresponding first conductive connection pad BP1, each second trace TC2 extends to a corresponding second conductive connection pad BP2, and each third trace TC3 extends to a corresponding second conductive connection pad BP2. Accordingly, the touch electrode signal lines SSL and the data lines DL in the display region DR can be electrically connected to the first conductive connection pads BP1 and the second conductive connection pads BP2 through the traces, and further electrically connected to the integrated circuit 120.

In this embodiment, the first conductive connection pads BP1 may be arranged in a first conductive connection pad row BPR1 along the first direction D1, and the second conductive connection pads BP2 may be arranged in at least one second conductive connection pad row BPR2 along the first direction D1. In the present embodiment, the first conductive connection pad row BPR1 may be located between the second conductive connection pad row BPR2 and the display area DR, but is not limited thereto. In a variation, the second conductive connection pad BP2 may be located between the first conductive connection pad row BPR1 and the display region DR. In addition, in fig. 9, the first conductive connection pad BP1 in the first conductive connection pad row BPR1 and the second conductive connection pad BP2 in the adjacent second conductive connection pad row BPR2 may partially overlap in the second direction D2, and the second conductive connection pads BP2 in the adjacent two second conductive connection pad rows BPR2 may also partially overlap in the second direction D2, but is not limited thereto. In a variant embodiment, the conductive connection pads in two adjacent rows of conductive connection pad rows may be completely non-overlapping and staggered from each other in the second direction D2.

In addition, the dummy signal lines of the present invention may have the same or similar characteristics as the touch electrode signal lines SSL, i.e., the dummy signal lines may also be electrically connected to the corresponding conductive connection pads by the first traces TC 1. Since the dummy signal line is not electrically connected to the touch electrode 102, the conductive connection pad electrically connected to the dummy signal line may be floating (i.e., the conductive connection pad is not applied with a fixed potential), but is not limited thereto. In other embodiments, the integrated circuit 120 or other chips can apply a fixed potential to the conductive connection pads so that the dummy signal lines have a fixed potential to avoid noise coupling to the floating dummy signal lines to affect the visual effect of the touch display device 10. For example, the integrated circuit 120 or other chip may apply a Common Voltage (Common Voltage) to the conductive connection pads such that the potential of the dummy signal line is the Common Voltage.

In summary, in the touch display device and the manufacturing method of the present invention, the touch electrode is formed by the first transparent conductive layer, and the touch electrode signal line is formed by the third metal layer. The first connecting hole exposes a part of the touch electrode, the second connecting hole exposes a part of the touch electrode signal wire, and the first connecting hole and the second connecting hole are formed together in the same step. The connection electrode may be formed of a second transparent conductive layer. The connecting electrode extends into the first connecting hole to be in contact with the touch electrode, and simultaneously extends into the second connecting hole to be in contact with the touch electrode signal line, so that the touch electrode can be electrically connected with the touch electrode signal line. Therefore, a connecting hole is not required to be formed in the second insulating layer, so that the touch electrode is directly contacted with the touch electrode signal line. In other words, the method for manufacturing the touch display device does not need a patterning process for forming the connecting hole between the touch electrode and the touch electrode signal line, and does not need to manufacture a photomask used in the patterning process, so that the process can be simplified and the manufacturing cost can be reduced. On the other hand, the second wire and the third wire connected with the data wire respectively belong to different metal layers, so that the third wire and the second wire can be arranged in a staggered manner, and the distance between the third wire and the second wire can be reduced, so that the occupied area of the wires in the peripheral area is reduced. In addition, in the peripheral region, the first wire is formed by the third metal layer and is connected with the touch electrode signal wire, and the extending directions of the first wire and the second wire are parallel and overlap with each other, so that the occupied area of the wires in the peripheral region is further reduced. In addition, the distance between the third metal layer and the first metal layer is far, so that signals in the first wire and the second wire are less prone to being mutually influenced.

The above description is only of the preferred embodiments of the present invention and is not intended to limit the present invention, but various modifications and variations can be made to the present invention by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A touch display device having a display area and a peripheral area, the touch display device comprising:

a substrate;

a plurality of scanning lines and a plurality of data lines arranged on the substrate, wherein the scanning lines and the data lines extend along different directions in the display area;

the scanning lines are respectively and electrically connected with the grid electrode of at least one corresponding thin film transistor, and the data lines are respectively and electrically connected with the source electrode of at least one corresponding thin film transistor;

a first insulating layer disposed on the thin film transistor;

the touch electrode signal wires are respectively and electrically connected with the corresponding touch electrodes;

the second insulating layer is arranged on the first insulating layer and is positioned between the plurality of touch electrode signal lines and the plurality of touch electrodes;

The pixel electrodes are arranged on the touch electrodes and are respectively and electrically connected with the drain electrodes of the corresponding thin film transistors;

the plurality of connecting electrodes are arranged on the plurality of touch electrodes and the plurality of touch electrode signal lines, wherein the plurality of connecting electrodes and the plurality of pixel electrodes belong to the same conductive layer, the plurality of connecting electrodes and the plurality of pixel electrodes are electrically isolated from each other, and each touch electrode is electrically connected with the corresponding touch electrode signal line through the corresponding connecting electrode;

the third insulating layer is arranged on the second insulating layer and is positioned between the touch electrodes and the conducting layer;

the first connecting holes penetrate through the third insulating layer, and a part of one touch electrode is exposed out of each first connecting hole; and

the second connecting holes penetrate through the second insulating layer and the third insulating layer, and a part of one touch electrode signal wire is exposed out of each second connecting hole;

wherein the plurality of connection electrodes extend into at least one of the first connection holes and at least one of the second connection holes, respectively, to be in contact with the touch electrode exposed by the first connection hole and the touch electrode signal line exposed by the second connection hole;

Each touch electrode comprises a plurality of connecting parts and a plurality of common electrodes electrically connected with each other, the plurality of connecting parts comprise a first connecting part, the first connecting parts are arranged in the adjacent four areas between the common electrodes, the adjacent two common electrodes are electrically connected with each other through the first connecting parts, each first connecting hole is arranged above the corresponding first connecting part of the touch electrode and exposes a part of the first connecting part, each connecting electrode is arranged in the adjacent four areas between the common electrodes, and the corners, close to the corresponding connecting electrode, of the adjacent two pixel electrodes are respectively provided with a bevel edge.

2. The touch display device of claim 1, wherein the touch display device further comprises:

a plurality of third connection holes penetrating through the first insulating layer, the second insulating layer and the third insulating layer and exposing a portion of the drain electrode of one of the thin film transistors respectively;

wherein the plurality of pixel electrodes extend into at least one of the third connection holes, respectively, to contact the drain electrode exposed by the third connection hole.

3. The touch display device of claim 1, further comprising a plurality of touch traces and a plurality of data traces disposed in the peripheral region, each of the touch traces coupled to a corresponding one of the touch electrode signal lines, and each of the data traces coupled to a corresponding one of the data lines, wherein a portion of one of the plurality of touch traces and a portion of one of the plurality of data traces extend in parallel in the peripheral region and overlap each other.

4. The touch display device according to claim 3, wherein a part of one of the two adjacent data lines and the other of the two adjacent data lines respectively belong to different metal layers.

5. The touch display device of claim 4, wherein the plurality of touch traces belong to a third metal layer, a portion of one of two adjacent data traces belongs to a first metal layer, and another of two adjacent data traces belongs to a second metal layer.

6. The touch display device of claim 5, wherein the portion of the touch trace and the portion of the data trace that overlap each other belong to the third metal layer and the first metal layer, respectively.

7. The manufacturing method of the touch display device is characterized by comprising the following steps of:

providing a substrate;

forming a thin film transistor on the substrate, wherein the thin film transistor comprises a grid electrode, a source electrode and a drain electrode;

forming a first insulating layer on the thin film transistor;

forming a metal layer on the first insulating layer, wherein the metal layer comprises a touch electrode signal wire;

forming a second insulating layer on the metal layer and the first insulating layer;

forming a first transparent conductive layer on the second insulating layer, wherein the first transparent conductive layer comprises a touch electrode, the touch electrode comprises a plurality of connecting parts and a plurality of common electrodes electrically connected with each other, the plurality of connecting parts comprise a first connecting part, the first connecting part is arranged in the area between the adjacent four common electrodes, and the adjacent two common electrodes are electrically connected with each other through the first connecting part;

forming a third insulating layer on the first transparent conductive layer and the second insulating layer;

forming a first connecting hole, a second connecting hole and a third connecting hole, wherein the first connecting hole is arranged above the first connecting part and exposes a part of the first connecting part, the second connecting hole exposes a part of the touch electrode signal wire, and the third connecting hole exposes a part of the drain electrode; and

And forming a second transparent conductive layer on the third insulating layer, wherein the second transparent conductive layer comprises a pixel electrode and a connecting electrode, the connecting electrode extends into the first connecting hole and the second connecting hole and is electrically connected with the touch electrode and the touch electrode signal line, the pixel electrode extends into the third connecting hole and is electrically connected with the drain electrode, the connecting electrode is arranged in the area between the four adjacent common electrodes, and a corner, close to the connecting electrode, of the pixel electrode is provided with a bevel edge.

8. The method of claim 7, wherein the first connection hole penetrates through the third insulating layer, the second connection hole penetrates through the second insulating layer and the third insulating layer, and the third connection hole penetrates through the first insulating layer, the second insulating layer and the third insulating layer.

9. The method of claim 7, wherein the first connection hole, the second connection hole and the third connection hole are formed together in the same patterning step.