CN111273521A - Automatic material loading and unloading single-table-board double-station exposure machine - Google Patents
Automatic material loading and unloading single-table-board double-station exposure machine Download PDFInfo
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- CN111273521A CN111273521A CN202010151962.2A CN202010151962A CN111273521A CN 111273521 A CN111273521 A CN 111273521A CN 202010151962 A CN202010151962 A CN 202010151962A CN 111273521 A CN111273521 A CN 111273521A
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- station
- unloading
- loading
- carrying assembly
- substrate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention discloses an automatic loading and unloading single-table-board double-station exposure machine which comprises an exposure system, a substrate bearing table, a multi-axis motion system, a loading cache station, an unloading cache station, a first loading carrying component, a second loading carrying component, a first unloading carrying component and a second unloading carrying component, wherein the loading cache station and the unloading cache station are respectively positioned at two sides of the substrate bearing table, the substrate bearing table is provided with a first station and a second station, the second loading carrying component and the first unloading carrying component carry substrates on the first station, and the first loading carrying component and the second unloading carrying component carry substrates on the second station. Compared with the common single-table-board technology, the single-table-board loading and unloading device can simultaneously load and unload two substrates, greatly improves the capacity of single-table equipment, only needs one substrate to be accommodated in the loading cache station and the unloading cache station, reduces the number of cache stations, greatly reduces the occupied area of the equipment, and improves the space utilization rate.
Description
Technical Field
The invention relates to the field of exposure machines, in particular to a single-table-board double-station exposure machine capable of automatically feeding and discharging materials.
Background
An exposure machine is a machine device that transfers image information on a film or other transparent body to the surface of an oil-coated photosensitive substance by turning on light. The laser direct writing type exposure is used for printing a composition with characteristics on the surface of a substrate, and compared with the traditional image direct transfer technology of exposure of a mask plate, a film negative film and the like, the direct writing type exposure technology has high productivity and high contraposition precision. Has very important function in the field of semiconductor and PCB production.
Because the ordinary single-station exposure machine has low productivity, the exposure of each plate needs to complete the working procedures of plate feeding, alignment, exposure, plate discharging and the like, the whole process time is long, most of the working procedures need to be manually completed for feeding and discharging, and the labor intensity is high. Although the production efficiency of the common double-station exposure machine is improved, the conventional automatic layout enables the loading and unloading caching stations to be increased in multiples, so that the common double-station exposure machine is unacceptable in customer space and low in space utilization rate.
Disclosure of Invention
In order to solve the technical problem, the invention provides an automatic feeding and discharging single-table-board double-station exposure machine, and aims to improve the space utilization rate of the double-station exposure machine.
In order to achieve the purpose, the technical scheme of the invention is as follows: the utility model provides an automatic material loading and unloading single mesa duplex position exposure machine, includes exposure system, base plate plummer and multiaxis moving system, the drive of multiaxis moving system the base plate plummer motion, exposure system exposes the base plate on the base plate plummer still includes: the substrate carrying device comprises a loading buffer station, a blanking buffer station, a first loading carrying assembly, a second loading carrying assembly, a first blanking carrying assembly and a second blanking carrying assembly, wherein the loading buffer station and the blanking buffer station are respectively positioned on two sides of a substrate bearing table, the substrate bearing table is provided with a first station and a second station, the second loading carrying assembly and the first blanking carrying assembly carry substrates on the first station, and the first loading carrying assembly and the second blanking carrying assembly carry substrates on the second station.
Furthermore, the feeding buffer station is located on the side of the first station, and the discharging buffer station is located on the side of the second station.
Furthermore, the first feeding and carrying assembly is located above the second feeding and carrying assembly, and the first discharging and carrying assembly is located below the second discharging and carrying assembly.
Further, an upper linear motor and a lower linear motor are arranged above the substrate bearing table, the first feeding carrying assembly and the first discharging carrying assembly are installed on the upper linear motor, and the second feeding carrying assembly and the second discharging carrying assembly are installed on the lower linear motor.
Furthermore, the first feeding carrying assembly, the second feeding carrying assembly, the first blanking carrying assembly and the second blanking carrying assembly all comprise adsorption assemblies, and the adsorption assemblies are arranged in a lifting mode.
Furthermore, the adsorption component comprises a plurality of connecting pieces which are distributed in parallel, and a plurality of suction heads are arranged on the connecting pieces.
Furthermore, the device also comprises a portal frame beam, wherein the exposure system is fixed on the portal frame beam and is positioned above the substrate bearing table.
Furthermore, the substrate bearing table is of a hollow sucker structure so as to adsorb the substrate.
The invention has the beneficial effects that: compared with the common single-table-board technology, the single-table-board double-station exposure machine capable of automatically feeding and discharging materials provided by the invention can simultaneously feed and discharge two substrates due to the adoption of the double-station table board, so that the capacity of single-machine equipment is greatly improved. The loading buffer station and the unloading buffer station only need to accommodate one substrate, so that the number of buffer stations is reduced, the floor area of equipment is greatly reduced, and the space utilization rate is improved.
Drawings
FIG. 1 is a top view of the present invention;
FIG. 2 is a partial structural schematic and material flow diagram of the present invention;
FIG. 3 is a time distribution diagram of a conventional single-deck type process;
FIG. 4 is a process time distribution diagram of the present invention
Wherein: 1. the device comprises a substrate bearing table, a first station, a second exposure system, a third multi-axis motion system, a fourth alignment system, a fifth alignment system, a sixth alignment system, a fifth alignment system, a sixth alignment system.
Detailed Description
The present invention will be described in further detail with reference to specific embodiments.
In order that the objects, aspects and advantages of the invention will become more apparent, the invention will be described by way of example only, and in connection with the accompanying drawings. It is to be understood that such description is merely illustrative and not intended to limit the scope of the present invention. Moreover, in the following description, descriptions of well-known structures and techniques are omitted so as to not unnecessarily obscure the concepts of the present invention.
As shown in fig. 1 and fig. 2, the embodiment provides an automatic loading and unloading single-stage double-station exposure machine, which includes an exposure system 2, a substrate carrying table 1, a multi-axis motion system 3, an alignment system 4, a loading buffer station 14, a unloading buffer station 15, a first loading carrying component 5, a second loading carrying component 6, a first unloading carrying component 7, and a second unloading carrying component 8.
The substrate stage 1 is used for supporting a substrate. The substrate bearing table 1 is arranged on a multi-axis motion system 3, and the multi-axis motion system 3 drives the substrate bearing table 1 to move. The multi-axis motion system 3 can control the substrate bearing table to move in the directions of the X axis, the Y axis and the Z axis so as to convey the substrate bearing table 1 to the lower part of the exposure system 2, complete the exposure of the whole breadth of the substrate through periodic scanning and stepping motion, and simultaneously realize the adjustment of an exposure focal plane. The multi-axis motion system 3 is a well-known structure in the field of exposure machines, and the structure thereof will not be described in detail in this embodiment.
The automatic feeding and discharging single-table-board double-station exposure machine further comprises a portal frame beam 16, and the exposure system 2 is fixed on the portal frame beam 16. The exposure system 2 is located above the substrate stage 1. The exposure system 2 exposes the substrate on the substrate stage 1.
The alignment system 4 in this embodiment is used to perform alignment, and has the same structure as that of a general exposure machine, and is a known system, and the structure thereof will not be described in detail in this embodiment.
The feeding buffer station 14 and the blanking buffer station 15 are respectively positioned at the left side and the right side of the substrate bearing table 1. The substrate stage 1 is provided with a first station 1a and a second station 1b. The second loading and carrying assembly 6 and the first unloading and carrying assembly 7 carry the substrate on the first station 1a, wherein the second loading and carrying assembly 6 carries the substrate on the loading buffer station 14 to the first station 1a, and the first unloading and carrying assembly 7 carries the substrate on the first station 1a to the unloading buffer station 15. The first loading and carrying assembly 5 and the second unloading and carrying assembly 8 carry the substrates on the second station 1b, wherein the first loading and carrying assembly 5 carries the substrates on the loading buffer station 14 to the second station 1b, and the second unloading and carrying assembly 7 carries the substrates on the second station 1b to the unloading buffer station 15.
The first station 1a is located on the left side and the second station 1b is located on the right side. The loading buffer station 14 is positioned at the left side of the substrate bearing table 1, and the unloading buffer station 15 is positioned at the right side of the substrate bearing table 1. That is, the feeding buffer station 14 is located at the side of the first station 1a, and the discharging buffer station 15 is located at the side of the second station 1b. The first feeding and carrying assembly 5 is located above the second feeding and carrying assembly 6, and the first discharging and carrying assembly 7 is located below the second discharging and carrying assembly 8. Two material loading transport subassemblies distribute from top to bottom in the space, independent motion, and the motion orbit can not overlap during the material loading, does not produce mutual interference. Two unloading transport subassemblies distribute from top to bottom in the space, independent motion, and the motion orbit can not overlap during the material loading, does not produce mutual interference.
An upper linear motor 12 and a lower linear motor 13 are disposed above the substrate stage 1. The upper linear motor 12 and the lower linear motor 13 are linear motors, which are also called linear motors and linear motors, and are conventionally known devices. The first feeding and carrying assembly 5 and the first discharging and carrying assembly 7 are mounted on the upper linear motor 12 and move in the left and right direction by the action of the upper linear motor 12. The second feeding and carrying assembly 6 and the second discharging and carrying assembly 8 are mounted on the lower linear motor 13 and move in the left and right directions under the action of the lower linear motor 13. The upper linear motor 12 is higher than the lower linear motor 13, the upper linear motor 12 is located behind the substrate carrier 1, and the lower linear motor 13 is located in front of the substrate carrier 1.
First material loading transport subassembly 5, second material loading transport subassembly 6, first unloading transport subassembly 7 and second unloading transport subassembly 8 all are the same in structure, and the position of only installing is inequality and the effect of playing is inequality, and it all includes adsorption component 9, supporting seat 10 and slider 11. Wherein, the slider 11 is slidably mounted on the upper linear motor 12 or the lower linear motor 13, and the support base 10 is mounted on the slider 11 through the linear motor. The support base 10 is linearly moved in the vertical direction by the linear motor.
The adsorption assembly 9 is mounted on the support base 10 by a cantilever. The support seat 10 moves linearly in the vertical direction to drive the adsorption assembly 9 to ascend and descend. The adsorption assembly 9 comprises a plurality of connectors 901 distributed in parallel, a plurality of suction heads 902 are arranged on the connectors 901, and the suction heads 902 are used for adsorbing the substrate.
The substrate stage 1 is a hollow chuck structure to absorb the substrate, thereby ensuring the exposure quality.
With particular reference to fig. 2, the working principle of the automatic charging and discharging single-table-board double-station exposure machine is as follows:
(1) the substrate moves to the material buffer station 14, the first material loading and conveying assembly 5 moves according to the direction of the solid line in the figure to convey the substrate to the second station 1b, and the second material loading and conveying assembly 6 moves according to the direction of the dotted line in the figure to convey the substrate to the first station 1a.
(2) The substrate stage 1 is moved under the exposure system 2 to be exposed under the control of the multi-axis movement system 3, and then the substrate stage 1 is returned to the initial position.
(3) The first blanking conveying assembly 7 conveys the substrate on the first station 1a to the blanking buffer station 15 according to the direction of the dotted line in the figure, and the second blanking conveying assembly 8 conveys the substrate on the second station 1b to the blanking buffer station 15 according to the direction of the solid line in the figure.
The loading and unloading buffer station only needs to contain one substrate, and the waiting station of the upper and lower carrying assemblies only needs the space of one substrate station, so that compared with a common double-station exposure machine, the invention saves the space of four substrate stations and greatly improves the space utilization rate of equipment.
Referring to fig. 3 and 4 with emphasis, the conventional single-deck model produces 2 substrates compared to the dual-deck production of 2 substrates of the present invention:
according to the specific time comparison tables set forth in fig. 3 and 4. The time for loading and unloading the substrate on the single-mesa device is T1, the time for alignment is T2, the exposure time is T3, and the time required for producing 2 substrates is 2 x (T1 + T2+ T3). The table top of the equipment bears the substrate, the process can be sequentially executed, and when one of the three processes of loading and unloading, alignment and exposure is executed, the components of the other two processes of the equipment are in a standby state. According to the automatic feeding and discharging single-table-board double-station equipment, two substrates are exposed at the same time, the exposure efficiency is doubled, and meanwhile, the feeding and carrying assemblies arranged in the two spaces up and down and the discharging and carrying assemblies arranged in the two spaces up and down can independently feed and discharge the two substrates, so that the carrying efficiency of the substrates is doubled, and thus the feeding, discharging, aligning and exposing of the two substrates can be carried out at the same time, the time required for producing 2 substrates is T1+ T2+ T3, half of the time is saved compared with that of common single-table-board equipment, and the equipment efficiency is improved by 100%.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes, which are made by the present specification, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (8)
1. The utility model provides an automatic material loading and unloading single mesa duplex position exposure machine, includes exposure system, base plate plummer and multiaxis moving system, the drive of multiaxis moving system the base plate plummer motion, exposure system exposes base plate on the base plate plummer, its characterized in that still includes: the feeding buffer station and the blanking buffer station are respectively located on two sides of the substrate bearing table, the first feeding device and the second feeding device correspond to the feeding buffer station and are arranged at intervals from top to bottom, the first blanking device and the second blanking device correspond to the second blanking buffer station and are arranged at intervals from top to bottom, and the substrate bearing table is provided with the first station and the second station.
2. The automatic loading and unloading single-table-top double-station exposure machine according to claim 1, wherein the loading buffer station is located on the side of the first station, and the unloading buffer station is located on the side of the second station.
3. The automatic loading and unloading single-table-top double-station exposure machine according to claim 1 or 2, wherein the first loading carrying assembly is located above the second loading carrying assembly, the first unloading carrying assembly is located above the second unloading carrying assembly, the second loading carrying assembly and the first unloading carrying assembly carry the substrate on the first station, and the first loading carrying assembly and the second unloading carrying assembly carry the substrate on the second station.
4. The automatic loading and unloading single-table-top double-station exposure machine according to claim 3, wherein an upper linear motor and a lower linear motor are arranged above the substrate bearing table, the first loading and carrying assembly and the first unloading and carrying assembly are mounted on the upper linear motor, and the second loading and carrying assembly and the second unloading and carrying assembly are mounted on the lower linear motor.
5. The automatic charging and discharging single-table-top double-station exposure machine according to claim 1, wherein the first charging and carrying assembly, the second charging and carrying assembly, the first discharging and carrying assembly and the second discharging and carrying assembly comprise adsorption assemblies, and the adsorption assemblies are arranged in a lifting mode.
6. The single-stage double-station exposure machine with automatic feeding and discharging functions as claimed in claim 5, wherein the adsorption assembly comprises a plurality of connectors distributed in parallel, and a plurality of suction heads are arranged on the connectors.
7. The automatic loading and unloading single-table-top double-station exposure machine according to claim 1, further comprising a gantry beam, wherein the exposure system is fixed on the gantry beam and is positioned above the substrate bearing table.
8. The automatic loading and unloading single-stage double-station exposure machine according to claim 1, wherein the substrate bearing table is a hollow chuck structure for adsorbing the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010151962.2A CN111273521A (en) | 2020-03-06 | 2020-03-06 | Automatic material loading and unloading single-table-board double-station exposure machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010151962.2A CN111273521A (en) | 2020-03-06 | 2020-03-06 | Automatic material loading and unloading single-table-board double-station exposure machine |
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| CN111273521A true CN111273521A (en) | 2020-06-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202010151962.2A Pending CN111273521A (en) | 2020-03-06 | 2020-03-06 | Automatic material loading and unloading single-table-board double-station exposure machine |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112099320A (en) * | 2020-09-29 | 2020-12-18 | 广东华恒智能科技有限公司 | Double-station exposure equipment |
| CN114675510A (en) * | 2022-05-30 | 2022-06-28 | 上海图双精密装备有限公司 | Wafer placing device of photoetching machine |
| CN116674993A (en) * | 2023-07-28 | 2023-09-01 | 昆山晟丰精密机械有限公司 | Automatic printing equipment |
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| CN105974746A (en) * | 2016-05-31 | 2016-09-28 | 东莞市威力固电路板设备有限公司 | Double-station exposure method |
| CN108762007A (en) * | 2018-06-05 | 2018-11-06 | 苏州源卓光电科技有限公司 | A kind of raising exposure production capacity direct-write photoetching mechanism and its exposure method |
| CN110497102A (en) * | 2019-08-27 | 2019-11-26 | 武汉帝尔激光科技股份有限公司 | A kind of material transmission system and laser process equipment |
| CN110515274A (en) * | 2018-05-21 | 2019-11-29 | 东莞市多普光电设备有限公司 | It is a kind of based on Multi-station circulating and table top can independent work Full-automatic exposure machine |
-
2020
- 2020-03-06 CN CN202010151962.2A patent/CN111273521A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105974746A (en) * | 2016-05-31 | 2016-09-28 | 东莞市威力固电路板设备有限公司 | Double-station exposure method |
| CN110515274A (en) * | 2018-05-21 | 2019-11-29 | 东莞市多普光电设备有限公司 | It is a kind of based on Multi-station circulating and table top can independent work Full-automatic exposure machine |
| CN108762007A (en) * | 2018-06-05 | 2018-11-06 | 苏州源卓光电科技有限公司 | A kind of raising exposure production capacity direct-write photoetching mechanism and its exposure method |
| CN110497102A (en) * | 2019-08-27 | 2019-11-26 | 武汉帝尔激光科技股份有限公司 | A kind of material transmission system and laser process equipment |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112099320A (en) * | 2020-09-29 | 2020-12-18 | 广东华恒智能科技有限公司 | Double-station exposure equipment |
| CN114675510A (en) * | 2022-05-30 | 2022-06-28 | 上海图双精密装备有限公司 | Wafer placing device of photoetching machine |
| CN116674993A (en) * | 2023-07-28 | 2023-09-01 | 昆山晟丰精密机械有限公司 | Automatic printing equipment |
| CN116674993B (en) * | 2023-07-28 | 2023-12-08 | 昆山晟丰精密机械有限公司 | Automatic printing equipment |
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