CN111211244B - OLED screen and metal cathode layer thereof - Google Patents
OLED screen and metal cathode layer thereof Download PDFInfo
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- CN111211244B CN111211244B CN202010032972.4A CN202010032972A CN111211244B CN 111211244 B CN111211244 B CN 111211244B CN 202010032972 A CN202010032972 A CN 202010032972A CN 111211244 B CN111211244 B CN 111211244B
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- H10K50/00—Organic light-emitting devices
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- H10K50/805—Electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/822—Cathodes characterised by their shape
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
Abstract
The application belongs to the technical field of OLED screens, and provides an OLED screen and a metal cathode layer thereof, wherein the metal cathode layer is provided with a plurality of through holes and/or a plurality of ribs with the same shape and size, when only the through holes are arranged, the through holes are strip-shaped, the included angle between the length direction and the electrostatic current flow direction is more than or equal to 0 degrees and less than 90 degrees, and all the through holes are arranged at equal intervals along the direction vertical to the electrostatic current flow direction; when only the convex ribs are arranged, all the convex ribs are arranged at equal intervals along the direction vertical to the flow direction of the electrostatic current; when being provided with a plurality of groups of through-holes and bead, every group through-hole sets up with the bead is adjacent, and all through-holes of group and bead are arranged along the equal interval of the direction of perpendicular to electrostatic current flow direction, reduce the width of through-hole in the direction of perpendicular to electrostatic current flow direction, can reduce the current density difference between each region of metal cathode layer when strengthening the cohesion between metal cathode layer and the Frit material layer.
Description
Technical Field
The present application belongs to the field of organic light-Emitting Diode (OLED) display technology, and in particular, relates to an OLED display and a metal cathode layer thereof.
Background
The OLED panel has many advantages such as low power consumption, fast response speed, wide viewing angle, high resolution, wide operating temperature range, foldability, and light weight, and is widely used in various display devices. At present, an OLED screen is generally packaged by a Frit (glass powder) packaging process, and a packaging structure of the OLED screen by the Frit packaging process mainly comprises two glass substrates, and a Frit material layer and a metal cathode layer which are arranged between the two glass substrates. In order to achieve a good packaging effect, a partial excavation design is usually performed on the metal cathode layer to enhance the bonding force between the Frit material layer and the metal cathode layer. But when the external static entered into the OLED screen, the electric charge can get into metal cathode layer, and flow to OLED screen inboard, this moment because on the metal cathode layer part dig except that regional partial metal width is great, can pass through great electric current, and the regional metal width of local digging, the electric current that can pass through is less, lead to the electric current to dig regional transmission in the part, current density increases suddenly, and it is serious to make the local region of digging to generate heat, cause easily to take place the layering phenomenon between Frit material layer and the metal cathode layer, lead to external steam and oxygen to enter into OLED screen inboard through the layering position, cause the internal device of OLED screen to lose efficacy, thereby the black screen phenomenon appears.
Disclosure of Invention
An object of the application is to provide an OLED screen and metal cathode layer thereof, it is less with the metal width who removes the region to solve local on the current metal cathode layer, the electric current that can pass through is less, lead to the electric current to dig when removing regional transmission in the part, current density increases suddenly, and it is serious to make the part dig the regional heat generation of removing, arouse easily that the layering phenomenon takes place between Frit material layer and the metal cathode layer, it is inboard to lead to external steam and oxygen to enter into the OLED screen through the layering position, cause the inside device of OLED screen to become invalid, thereby the problem of black screen phenomenon appears.
A first aspect of an embodiment of the present application provides a metal cathode layer of an OLED screen, where the metal cathode layer is provided with a plurality of first through holes having the same shape and size, the first through holes are elongated, an included angle between a length direction of the first through holes and a flow direction of an electrostatic current flowing through the metal cathode layer is greater than or equal to 0 ° and less than 90 °, and all the first through holes are arranged at equal intervals in a direction perpendicular to the flow direction of the electrostatic current;
or the metal cathode layer is provided with a plurality of first ribs with the same shape and size, and all the first ribs are arranged at equal intervals along the direction perpendicular to the flow direction of the electrostatic current;
or the metal cathode layer is provided with a plurality of groups of second through holes and second protruding ridges, the second through holes and the second protruding ridges in each group are identical in shape and size and are arranged adjacently, the second through holes and the second protruding ridges in all groups are arranged at equal intervals in the direction perpendicular to the flow direction of the electrostatic current, and the width of the second through holes in the direction perpendicular to the flow direction of the electrostatic current is smaller than the length of the first through holes.
In one embodiment, the number of all the first ribs is the same as the number of all the first through holes, and the first ribs and the first through holes have the same shape and size.
In one embodiment, all the first ribs are arranged in the same order as all the first through holes.
In one embodiment, the number of all the second through holes is the same as the number of all the first through holes, and the second through holes are the same as the first through holes in shape and size.
In one embodiment, each set of the second through holes and the second ribs are parallel to each other, and the arrangement rule of all the sets of the second through holes and the second ribs is the same as the arrangement rule of all the first through holes.
In one embodiment, the number of all the second through holes is the same as the number of all the first through holes, the second through holes are the same as the first through holes in shape, and the length of the second through holes is equal to the length of the first through holes and the width of the second through holes is half of the width of the first through holes.
In one embodiment, all the sets of the second through holes and the second ribs are arranged in the same manner as all the first through holes.
In one embodiment, the number of all the second through holes is the same as the number of all the first through holes, the shapes of the second through holes are the same as the shapes of the first through holes, and the width of each second through hole is equal to the width of each first through hole and the length of each second through hole is half of the width of each first through hole.
In one embodiment, any adjacent two of the first through holes are disposed axisymmetrically with respect to an axis of symmetry parallel to a direction in which the electrostatic current flows.
A second aspect of an embodiment of the present application provides an OLED screen comprising the metal cathode layer of the OLED screen according to the first aspect of an embodiment of the present application, and further comprising a Frit material layer covering the metal cathode layer and coupled to the metal cathode layer.
The embodiment of the invention provides the metal cathode layer provided with the plurality of through holes and/or the plurality of convex edges with the same shape and size, when only the through holes are arranged, the through holes are long-strip-shaped, the included angle between the length direction of the through holes and the flow direction of the electrostatic current flowing through the metal cathode layer is more than or equal to 0 degree and less than 90 degrees, and all the through holes are arranged at equal intervals along the direction vertical to the flow direction of the electrostatic current; when only the convex edges are arranged, all the convex edges are arranged at equal intervals along the direction vertical to the flow direction of the electrostatic current; when being provided with a plurality of groups through-hole and bead, every group through-hole and bead are adjacent to be set up, all through-holes of group and bead are arranged along the equal interval of direction of perpendicular to electrostatic current flow direction, and reduce the width of through-hole in the direction of perpendicular to electrostatic current flow direction, can be in the cohesion between reinforcing metal cathode layer and the Frit material layer, reduce the current density difference between each region of metal cathode layer, thereby can reduce the temperature that generates heat of metal cathode layer, improve the stability of the cohesion between metal cathode layer and the Frit material layer and the life of the inside device of OLED screen, stabilize the display performance of OLED screen.
Drawings
Fig. 1 is a schematic structural diagram of an OLED panel provided in an embodiment of the present application;
fig. 2 is a schematic view of a first structure of a metal cathode layer according to an embodiment of the present disclosure;
fig. 3 is a schematic view of a second structure of a metal cathode layer according to an embodiment of the present disclosure;
fig. 4 is a schematic view of a third structure of a metal cathode layer provided in an embodiment of the present application;
fig. 5 is a schematic view of a fourth structure of a metal cathode layer provided in an embodiment of the present application;
fig. 6 is a schematic view of a fifth structure of a metal cathode layer according to an embodiment of the present disclosure;
fig. 7 is a schematic view of a sixth structure of a metal cathode layer according to an embodiment of the present disclosure;
fig. 8 is a schematic view of a seventh structure of a metal cathode layer provided in an embodiment of the present application;
fig. 9 is an eighth structural schematic diagram of a metal cathode layer according to an embodiment of the present disclosure;
fig. 10 is a schematic view of a ninth structure of a metal cathode layer provided in an embodiment of the present application;
fig. 11 is a schematic view of a tenth structure of a metal cathode layer according to an embodiment of the present disclosure;
fig. 12 is an eleventh structural schematic diagram of a metal cathode layer provided in an embodiment of the present application;
fig. 13 is a schematic view of a twelfth structure of a metal cathode layer according to an embodiment of the present disclosure;
fig. 14 is a thirteenth structural schematic diagram of a metal cathode layer provided in an embodiment of the present application;
fig. 15 is a fourteenth structural diagram of a metal cathode layer according to an embodiment of the disclosure;
fig. 16 is a fifteenth structural schematic diagram of a metal cathode layer according to an embodiment of the present disclosure.
Detailed Description
In order to make the technical problems, technical solutions and advantageous effects to be solved by the present application clearer, the present application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.
It will be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like, refer to an orientation or positional relationship illustrated in the drawings for convenience in describing the present application and to simplify description, and do not indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present application.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
As shown in fig. 1, the embodiment of the present application exemplarily shows an encapsulation structure 100 of an OLED panel using a Frit encapsulation process, which includes an upper substrate 1, a Frit material layer 2, a metal cathode layer 3, and a lower substrate 4, which are sequentially disposed, wherein the Frit material layer 2 is coupled with the metal cathode layer 3 and disposed on the substrate 2, and the upper substrate 1 covers the Frit material layer 2.
In application, the upper substrate and the lower substrate are usually glass substrates, which serve to protect and support the Frit material layer and the metal cathode layer. The Frit material layer mainly comprises an anode layer and an organic light-emitting layer, and the organic light-emitting layer is arranged between the anode layer and the metal cathode layer. The anode layer is typically an ITO (indium tin oxide) conductive glass layer made of an ITO material, and the metal cathode layer is typically made of at least one of metal materials of Ag (silver), al (aluminum), mg (magnesium), in (indium), li (lithium), and the like. The organic light emitting layer is made of an organic light emitting material.
In application, in order to achieve a better packaging effect, a partial excavation design is usually performed on the metal cathode layer to enhance the bonding force between the Frit material layer and the metal cathode layer.
As shown in fig. 2, an embodiment of the present application exemplarily shows a schematic structural diagram of the metal cathode layer 3 after the metal cathode layer 3 is designed to be partially excavated; the metal cathode layer 3 is provided with a plurality of through holes 10 having the same shape and size, the through holes 10 are elongated, the length direction of the through holes 10 is perpendicular to the flow direction of the electrostatic current flowing through the metal cathode layer 3, and all the through holes 10 are distributed at equal intervals in the direction perpendicular to the flow direction of the electrostatic current.
Based on the structure of the metal cathode layer 3 shown in fig. 2, the metal width of the metal cathode layer 3 in each period is W-L; where W is the period length and L is the width of the via 10. Before the design of the local excavation of the metal cathode layer, the current density in each region of the metal cathode layer is the same, and after the local excavation, the width of the local excavation region (region within one cycle length) in the metal cathode layer 3 shown in fig. 2 is reduced from the original W to W-L, which causes the current density in the local excavation region to suddenly increase, and causes the local excavation region to generate heat seriously.
As shown in any one of fig. 3 to 5, another embodiment of the present application exemplarily shows a schematic structural diagram of the metal cathode layer 3 after the metal cathode layer 3 is designed to be partially excavated; the metal cathode layer 3 is provided with a plurality of first through holes 20 with the same shape and size, the first through holes 20 are strip-shaped, an included angle between the length direction of the first through holes 20 and the flow direction of the electrostatic current flowing through the metal cathode layer 3 is greater than or equal to 0 degree and smaller than 90 degrees, and all the first through holes 20 are arranged at equal intervals along the direction perpendicular to the flow direction of the electrostatic current.
In application, the included angle between the length direction of the first through hole and the flow direction of the electrostatic current flowing through the metal cathode layer is set to be greater than or equal to 0 degree and smaller than 90 degrees, namely the length direction of the first through hole is set to be parallel to the flow direction of the electrostatic current, or the first through hole is obliquely arranged, so that the length direction of the first through hole has a certain included angle with the flow direction of the electrostatic current.
As shown in fig. 3, a schematic structural diagram of the metal cathode layer 3 is exemplarily shown when an angle between the length direction of the first through hole 20 and the flow direction of the electrostatic current is 0 °.
In application, when an included angle between the length direction of the first through hole and the flow direction of the electrostatic current is greater than 0 ° and less than 90 °, the inclination directions of the length directions of any two adjacent first through holes relative to the flow direction of the electrostatic current may be the same or different.
In one embodiment, any two adjacent first through holes are parallel to each other.
In application, the length direction of each first through hole is the same with respect to the direction of the inclination of the electrostatic current flowing direction, and any two adjacent first through holes are parallel to each other.
As shown in fig. 4, the structure of the metal cathode layer 3 is schematically illustrated when the angle between the length direction of the first through holes 20 and the electrostatic current flow direction is greater than 0 ° and 90 °, and any two adjacent first through holes 20 are parallel to each other.
In one embodiment, any adjacent two of the first through holes are disposed axisymmetrically with respect to an axis of symmetry parallel to a direction in which the electrostatic current flows.
In application, when the length directions of any two adjacent first through holes are different from the inclination direction of the electrostatic current flowing direction, any two adjacent first through holes are arranged in axial symmetry with the symmetry axis parallel to the direction of the electrostatic current flowing direction.
As shown in fig. 5, a schematic structural diagram of the metal cathode layer 3 is exemplarily shown when an angle between the length direction of the first through hole 20 and the flow direction of the electrostatic current is greater than 0 ° and 90 °, and any two adjacent first through holes 20 are axially symmetrically disposed about a symmetry axis parallel to the flow direction of the electrostatic current.
In one embodiment, an included angle between the length direction of the first through hole and the flow direction of the electrostatic current ranges from 30 ° to 60 °.
In application, an included angle between the length direction of the first through holes and the flow direction of the electrostatic current can be set to be any value between 30 degrees and 60 degrees, so that the length and the width of the metal cathode layer can be reduced simultaneously under the condition that the same number of first through holes are arranged, and materials and space are saved.
The length of the through hole in the embodiment corresponding to fig. 2 is equal to the length of the first through hole in the embodiment corresponding to any one of fig. 3 to 5, and the metal width of the local excavated area can be increased in the structure shown in any one of fig. 3 to 5 compared with the structure shown in fig. 2, so that the current density of the local excavated area is increased and the heating temperature of the local excavated area is reduced while the bonding force between the metal cathode layer and the Frit material layer is not changed relative to fig. 2.
As shown in any one of fig. 6 to 9, an embodiment of the present application exemplarily shows a schematic structural diagram of the metal cathode layer 3 when the metal cathode layer 3 is not designed to be partially excavated; the metal cathode layer 3 is provided with a plurality of first ribs 30 having the same shape and size, and all the first ribs 30 are arranged at equal intervals along a direction perpendicular to the flow direction of the electrostatic current.
In application, the number, shape and size of the first ribs can be set according to the requirement of the bonding force between the Frit material layer and the metal cathode layer. In order to achieve the same coupling force as in the embodiment corresponding to fig. 2, 3, 4 or 5, the number, shape and size of the first ribs may be the same as those of the through holes in fig. 2 or those of fig. 3 to 5.
In one embodiment, the number of all the first ribs is the same as the number of all the first through holes, and the first ribs and the first through holes have the same shape and size.
In one embodiment, all the first ribs are arranged in the same order as all the first through holes.
Fig. 6 exemplarily shows that all the first protruding ribs 30 are arranged in the same manner as all the through holes 10 shown in fig. 2, and the length direction of the first protruding ribs 30 is perpendicular to the flow direction of the electrostatic current flowing through the metal cathode layer 3.
As shown in any one of fig. 7 to 9, it is exemplarily shown that the number of all the first ribs 30 is the same as that of all the first through holes 20, and the shape and size of the first ribs 30 are the same as those of the first through holes 20.
Fig. 7 exemplarily shows that all the first ribs 30 are arranged in the same manner as all the first through holes 20 shown in fig. 3.
Fig. 8 exemplarily shows that all the first ribs 30 are arranged in the same manner as all the first through holes 20 shown in fig. 4.
Fig. 9 exemplarily shows that all the first ribs 30 are arranged in the same manner as all the first through holes 20 shown in fig. 5.
In the structure of the metal cathode layer shown in any one of fig. 6 to 9, the metal cathode layer is provided with the ribs, so that the bonding force between the metal cathode layer and the Frit material layer can be enhanced, and the metal width of the metal cathode layer is not changed, thereby preventing the heat generation phenomenon caused by the excessive current density in the local area of the metal cathode layer.
As shown in any one of fig. 10 to 16, another embodiment of the present application exemplarily shows a schematic structure of the metal cathode layer 3 when the metal cathode layer 3 is partially excavated; the metal cathode layer 3 is provided with a plurality of groups of second through holes 40 and second protruding ridges 50, each group of second through holes 40 and second protruding ridges 50 has the same shape and size and are adjacently arranged, all the groups of second through holes 40 and second protruding ridges 50 are arranged at equal intervals along a direction perpendicular to the flow direction of the electrostatic current, and the width of the second through holes 40 in the direction perpendicular to the flow direction of the electrostatic current is smaller than the length of the through holes 10 and the length of the first through holes 20.
In application, the number, shape and size of the second through holes and the second ribs can be set according to the requirement of the bonding force between the Frit material layer and the metal cathode layer.
In one embodiment, the number of all the second through holes is the same as the number of all the first through holes, and the second through holes are the same as the first through holes in shape and size.
In one embodiment, each set of the second through holes and the second ribs are parallel to each other, and the arrangement rule of all the sets of the second through holes and the second ribs is the same as the arrangement rule of all the first through holes.
In application, the number, shape and size of the second through holes and the second ribs are the same as those of the through holes in fig. 2 or the first through holes in any one of fig. 3 to 5, so that a greater coupling force can be achieved relative to the embodiment corresponding to fig. 2, 3, 4 or 5.
As shown in any one of fig. 10 to 12, the number of all the second through holes 40 and the number of all the second ribs 50 are exemplarily shown to be the same as the number of all the first through holes 20, and the shapes and sizes of the second through holes 40 and the second ribs 50 are the same as those of the first through holes 20.
Fig. 10 exemplarily shows that all the second through holes 40 and all the second protrusions 50 are arranged in the same manner as all the first through holes 20 shown in fig. 3.
Fig. 11 exemplarily shows that all the second through holes 40 and all the second ribs 50 are arranged in the same manner as all the first through holes 20 shown in fig. 4.
Fig. 12 exemplarily shows that all the second through holes 40 and all the second ribs 50 are arranged in the same manner as all the first through holes 20 shown in fig. 3.
In one embodiment, the number of all the second through holes is the same as the number of all the first through holes, the second through holes are the same as the first through holes in shape, and the length of the second through holes is equal to the length of the first through holes and the width of the second through holes is half of the width of the first through holes.
In one embodiment, all the sets of the second through holes and the second ribs are arranged in the same manner as all the first through holes.
In application, the number and shape of the second through holes and the second ribs are set to be the same as those of the through holes in fig. 2 or the first through holes in any one of fig. 3 to 5, the length of the second through holes and the second ribs is set to be equal to that of the through holes in fig. 2 or the first through holes in any one of fig. 3 to 5, and the width of the second through holes and the second ribs is half of that of the through holes in fig. 2 or the first through holes in any one of fig. 3 to 5, so that the same coupling force as that of the corresponding embodiment of fig. 2, 3, 4 or 5 can be achieved.
As shown in fig. 13, it is exemplarily shown that the number of all the second through holes 40 and the number of all the second ribs 50 are the same as the number of all the first through holes 20, the shapes of the second through holes 40 and the second ribs 50 are the same as the first through holes 20, the lengths of the second through holes 40 and the second ribs 50 are the same as the length of the first through holes 20 and the widths thereof are half of the widths of the first through holes 20, and the arrangement rule of all the second through holes 40 and all the second ribs 50 is the same as the arrangement rule of all the first through holes 20 shown in fig. 3.
As shown in fig. 14, it is exemplarily shown that the number of all the second through holes 40 and the number of all the second ribs 50 are the same as the number of all the first through holes 20, the shapes of the second through holes 40 and the second ribs 50 are the same as the first through holes 20, the lengths of the second through holes 40 and the second ribs 50 are the same as the length of the first through holes 20 and the widths thereof are half of the widths of the first through holes 20, and the arrangement rule of all the second through holes 40 and all the second ribs 50 is the same as the arrangement rule of all the first through holes 20 shown in fig. 4.
As shown in fig. 15, it is exemplarily shown that the number of all the second through holes 40 and the number of all the second ribs 50 are the same as the number of all the first through holes 20, the shapes of the second through holes 40 and the second ribs 50 are the same as the first through holes 20, the lengths of the second through holes 40 and the second ribs 50 are the same as the length of the first through holes 20 and the widths thereof are half of the widths of the first through holes 20, and the arrangement rule of all the second through holes 40 and all the second ribs 50 is the same as the arrangement rule of all the first through holes 20 shown in fig. 5.
In one embodiment, the number of all the second through holes is the same as the number of all the first through holes, the shapes of the second through holes are the same as the shapes of the first through holes, and the width of each second through hole is equal to the width of each first through hole and the length of each second through hole is half of the width of each first through hole.
As shown in fig. 16, it is exemplarily shown that the number of all the second through holes 40 and the number of all the second ribs 50 are the same as the number of all the first through holes 20, the shapes of the second through holes 40 and the second ribs 50 are the same as the first through holes 20, the lengths of the second through holes 40 and the second ribs 50 are the same as the length of the first through holes 20 and the widths thereof are half of the widths of the first through holes 20, and the arrangement rule of all the second through holes 40 and all the second ribs 50 is the same as the arrangement rule of all the through holes 10 shown in fig. 2.
In the structure of the metal cathode layer shown in any one of fig. 10 to 16, the metal cathode layer is provided with the through hole and the rib, and the width of the through hole in the direction perpendicular to the flow direction of the electrostatic current is reduced as compared with fig. 2, so that the metal width of the local cut-out region is increased, and the current density of the local cut-out region is increased, and the heat generation temperature of the local cut-out region is reduced while the bonding force between the metal cathode layer and the Frit material layer is enhanced.
The embodiment of the invention provides the metal cathode layer provided with the plurality of through holes and/or the plurality of convex edges with the same shape and size, when only the through holes are arranged, the through holes are long-strip-shaped, the included angle between the length direction of the through holes and the flow direction of the electrostatic current flowing through the metal cathode layer is more than or equal to 0 degree and less than 90 degrees, and all the through holes are arranged at equal intervals along the direction vertical to the flow direction of the electrostatic current; when only the convex ribs are arranged, all the convex ribs are arranged at equal intervals along the direction vertical to the flow direction of the electrostatic current; when being provided with through-hole and bead simultaneously, every through-hole corresponds a bead and adjacent setting, all through-holes are arranged along the equal interval of direction of perpendicular to electrostatic current flow direction, all beads are arranged along the equal interval of direction of perpendicular to electrostatic current flow direction, and reduce the width of through-hole in the ascending width of direction of perpendicular to electrostatic current flow direction, can be in the cohesion between reinforcing metal cathode layer and the Frit material layer, reduce the current density difference between each region of metal cathode layer, thereby can reduce the temperature that generates heat of metal cathode layer, improve the stability of the cohesion between metal cathode layer and the Frit material layer and the life of the inside device of OLED screen, stabilize the display performance of OLED screen.
The above-mentioned embodiments are only used to illustrate the technical solutions of the present application, and not to limit the same; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the embodiments of the present application, and they should be construed as being included in the present application.
Claims (5)
1. The utility model provides a metal cathode layer of OLED screen which characterized in that, metal cathode layer is provided with a plurality of groups second through-hole and second bead, and every group the second through-hole with the shape and the size of second bead are the same and adjacent setting, and all groups the second through-hole with the second bead is arranged along the equal interval of direction of perpendicular to electrostatic current flow direction, wherein, the second through-hole with the second bead is rectangular shape, the second through-hole with the length direction of second bead and the electrostatic current that flows through metal cathode layer flow to between the contained angle be greater than or equal to 0 and be less than 90.
2. The metallic cathode layer of an OLED screen of claim 1 wherein each set of said second vias and said second ribs are parallel to each other.
3. The metallic cathode layer of an OLED panel as claimed in claim 1 wherein said second through holes and said second ribs are arranged in a regular pattern throughout all of said groups.
4. The metallic cathode layer of an OLED panel as claimed in any one of claims 1 to 3 wherein any adjacent said second via and said second rib are disposed axisymmetrically with respect to an axis of symmetry parallel to the direction of flow of said electrostatic current.
5. An OLED screen, comprising the metal cathode layer of the OLED screen as claimed in any one of claims 1 to 4, further comprising a Frit material layer covering the metal cathode layer and coupled to the metal cathode layer.
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| JP2015162344A (en) * | 2014-02-27 | 2015-09-07 | パナソニックＩｐマネジメント株式会社 | Method of manufacturing organic electroluminescent light emitting device |
| CN105576149A (en) * | 2016-02-03 | 2016-05-11 | 昆山国显光电有限公司 | Frit contact membrane layer and OLED packaging structure with frit contact membrane layer |
| CN106981585A (en) * | 2017-05-23 | 2017-07-25 | 上海天马微电子有限公司 | Transparent OLED panel and display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103915467A (en) * | 2013-01-03 | 2014-07-09 | 三星显示有限公司 | Organic light-emitting display apparatus and method of manufacturing the same |
| JP2015162344A (en) * | 2014-02-27 | 2015-09-07 | パナソニックＩｐマネジメント株式会社 | Method of manufacturing organic electroluminescent light emitting device |
| CN105576149A (en) * | 2016-02-03 | 2016-05-11 | 昆山国显光电有限公司 | Frit contact membrane layer and OLED packaging structure with frit contact membrane layer |
| CN106981585A (en) * | 2017-05-23 | 2017-07-25 | 上海天马微电子有限公司 | Transparent OLED panel and display device |
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