CN111132787B - 具有增强性能的螺孔钻及用于制造螺孔钻的方法 - Google Patents
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- 239000007789 gas Substances 0.000 claims description 11
- 238000004544 sputter deposition Methods 0.000 claims description 10
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- 239000010936 titanium Substances 0.000 claims description 9
- 229910052786 argon Inorganic materials 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 7
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 7
- 238000005516 engineering process Methods 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 abstract description 9
- 239000002184 metal Substances 0.000 abstract description 9
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 6
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Abstract
本发明涉及一种螺孔钻,包括基材和涂层,其中,该涂层被沉积在该基材的包含钻头的至少一部分上,该涂层包括直接沉积在基材上的第一层和沉积在第一层上的第二层,其中,第一层是通过HiPIMS沉积的(Al,Cr)N耐磨层,第二层是减摩层,其中,第二层是利用磁控溅射类型的优选是HiPIMS类型的物理气相沉积(PVD)工艺被沉积的金属碳化物层或含金属碳化物层。
Description
技术领域
本发明涉及具有增强性能的螺孔钻,包括Al-Cr-N耐磨层和沉积在耐磨层上的减摩层,还涉及制造螺孔钻的方法。
背景技术
在文献US9540726B2中提出了通过涂覆至少钻头以改善钻具尤其是螺孔钻和微型钻具的性能。涂层包括至少一个HiPIMS涂层,其被直接施加到钻具基材上且包括至少一个由至少一种氮化物和/或碳化物和/或氧化物构成的层和设置在HiPIMS层上的非晶碳或DLC层。HiPIMS涂层可以是(Al,Cr)N层,并且DLC层可以是含金属的DLC层。US9540726B2所示的钻具可以被用在不锈钢工件的钻孔作业中,但刀具寿命相对短。
发明目的
本发明的目的是提供一种涂覆的螺孔钻和一种制造螺孔钻的方法,其可以在不锈钢工件钻孔作业中显示出与现有技术相比更好的性能和相对长的刀具寿命,尤其与摩擦减轻和冷焊减弱相关的更好性能。
发明说明
本发明的目的通过提供一种螺孔钻来实现,其包括基材和涂层,其中,该涂层被沉积在该基材的包含钻头的至少一部分,该涂层包括直接沉积在基材上的第一层和沉积在第一层上的第二层,其中,第一层是通过HiPIMS沉积的(Al,Cr)N耐磨层,第二层是减摩层,其特征是,
■第二层是利用磁控溅射类型、优选是高功率脉冲磁控溅射(HiPIMS)法类型的物理气相沉积(PVD)工艺沉积的金属碳化物层或含金属碳化物层。
HiPIMS方法也被称为HPPMS方法,因为术语高功率脉冲磁控溅射。
通过溅射,尤其通过HiPIMS制造的涂层显示出比电弧制造涂层好许多的性能,尤其是如果电弧沉积涂层未经过后处理。
HiPIMS提供了制造致密光滑涂层的可能性。像图1所示的AlCrN+WC/C涂层的涂层可以在一轮沉积过程中产生。
优选地,减摩层优选是含碳氮化钛或碳氮化钛或掺杂有碳化钨的类金刚石碳或碳化钨层。
根据本发明的一个优选实施例,金属碳化物层可以是碳化钨层或主要含有(超过50原子%)碳化钨,优选含有超过70原子%的碳化钨、更优选含有超过90原子%的碳化钨。
根据本发明的另一个优选实施例,金属碳化物层可以是碳化钛层或主要含有(超过50原子%)碳化钛,优选含有超过70原子%的碳化钛、更优选选超过90原子%。
优选地,第二层是WC/C类型的含碳化钨层。
本发明的目的通过提供制造螺孔钻的方法来实现。
优选地,第二层是WC/C类型的含碳化钨层并且通过WC靶在含氩气和含碳气体最好是乙炔气的气氛中溅射来沉积。
优选地,HiPIMS技术被用于溅射WC靶。
优选地,第二层是含碳化钛层且通过Ti靶或TiC靶在含氩气和含碳气体最好是乙炔气的气氛中溅射来沉积。
优选地,HiPIMS技术被用于溅射Ti靶或TiC靶。
附图说明
图1示出用于本发明的螺孔钻的涂层。
图2示出相比于现有技术的本发明益处。
具体实施方式
图1在上部示出了根据本发明的螺孔钻1的照片。螺孔钻1包括基材2和涂层3。涂层3被沉积在基材2的包含螺孔钻1的钻头的至少一部分上。
涂层3包括第一层4。第一层4被直接沉积在基材2上。涂层3包括第二层5。第二层5被沉积在第一层4上。
第一层4是(Al,Cr)N的耐磨层。第一层4通过HiPIMS被沉积。第二层5是减摩层。第二层5是金属碳化物层或含金属碳化物层。它也可以优选地由含碳氮化钛或碳氮化钛或掺杂有钨的类金刚石碳或碳化钨层构成。第二层5利用优选是磁控溅射类型、优选是HiPIMS类型的物理气相沉积(PVD)工艺来沉积。
这可以在图2中被看到,其在曲线图中示出了不同的涂层和/或沉积方法的相对刀具寿命。基准刀具的刀具寿命被定义为100%。在图2中,基准刀具已被沉积上TiN。AlCrN涂层显示出与基准相同的100%的刀具寿命。已被电弧沉积和后处理以减小粗糙度的AlCrN+TiN涂层显示出相比于基准的160%的刀具寿命。可以看到显著的刀具寿命延长。已经通过电弧沉积所沉积的AlCrN+WC/C涂层显示出相比于基准的3%的刀具寿命。通过HiPIMS沉积所沉积的AlCrN+WC/C涂层显示出相比于基准的710%的刀具寿命。
AlCrN+TiN涂层(电弧沉积+后处理以减小粗糙度)显示出相比于基准的显著刀具寿命延长。
光滑涂层表面具有优点。
通过溅射,尤其是通过HiPIMS制成的涂层示出与电弧制造的涂层相比好许多的性能,尤其是如果电弧沉积的涂层未经过后处理。
HiPIMS提供了可制造致密光滑的涂层的可能性。涂层例如如图1所示的AlCrN+WC/C涂层可以在一轮沉积过程中制成。
■AlCrN+Ti(CN)涂层显示出刀具寿命延长。这实际上是应用的主题。
优选地,第一层4通过Cr靶利用HiPIMS技术在氮气反应气氛(含氩气和氮气或只含氮气)中溅射来沉积。
根据本发明的一个优选实施例,第二层5是WC/C(WC+C)类型的含碳化钨层,其可以通过WC靶在含氩气和含碳气体优选是乙炔气的气氛中(即优选在含氩气和乙炔气的气氛中)溅射来沉积。根据此优选实施例的一个变型,代替传统的溅射技术,HiPIMS技术被用于溅射WC靶。
根据本发明的另一个优选实施例,第二层5是含碳化钛层,其可以通过Ti靶或TiC靶在含氩气和含碳气体优选是乙炔气的气氛中(即优选在含氩气和乙炔气的气氛中)的溅射来沉积。根据此优选实施例的一个变型,代替传统溅射技术地,HiPIMS技术被用于溅射Ti靶或TiC靶。
Claims (4)
1.一种螺孔钻(1),包括基材(2)和涂层(3),其中,该涂层(3)被沉积在该基材(2)的包括钻头的至少一部分上,该涂层(3)包括直接沉积在该基材(2)上的第一层(4)和沉积在该第一层(4)上的第二层(5),其中,该第一层(4)是通过HiPIMS沉积的(Al,Cr)N的耐磨层,该第二层(5)是减摩层,其特征是,
该第二层(5)是利用HiPIMS类型的物理气相沉积工艺沉积的碳化钛层或碳化钨层。
2.一种用于制造螺孔钻(1)的方法,该螺孔钻(1)包括基材(2)和涂层(3),该方法包括:该涂层(3)被沉积在该基材(2)的包含钻头的至少一部分上,该涂层(3)包含第一层(4)和第二层(5),
通过HiPIMS将该第一层(4)直接沉积在该基材(2)上;
并且将该第二层(5)利用HiPIMS类型的物理气相沉积工艺沉积在该第一层(4)之上;
其中,该第一层(4)是(AlCr)N的耐磨层,
其中,该第二层(5)是减摩层,该第二层(5)是碳化钛层或碳化钨层。
3.根据权利要求2所述的制造螺孔钻(1)的方法,其特征是,该第二层(5)是碳化钛层并且通过Ti靶或TiC靶在含氩气和含碳气体的气氛中溅射来沉积。
4.根据权利要求3所述的制造螺孔钻(1)的方法,其特征是,HiPIMS技术被用于溅射该Ti靶或TiC靶。
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