CN111123599B

CN111123599B - Light shield with electrochromic function and manufacturing method thereof

Info

Publication number: CN111123599B
Application number: CN202010018660.8A
Authority: CN
Inventors: 杨鑫
Original assignee: Guangdong Oppo Mobile Telecommunications Corp Ltd
Current assignee: Guangdong Oppo Mobile Telecommunications Corp Ltd
Priority date: 2020-01-08
Filing date: 2020-01-08
Publication date: 2023-08-25
Anticipated expiration: 2040-01-08
Also published as: CN111123599A

Abstract

The application provides a light shield with an electrochromic function, which comprises a first base layer, an electrochromic module and a second base layer which are sequentially stacked; the electrochromic module comprises a first substrate, a second substrate, a first conductive layer, a second conductive layer and an electrochromic material layer, wherein the first conductive layer, the second conductive layer and the electrochromic material layer are formed between the first substrate and the second substrate; the first conductive layer is directly formed on one side of the first substrate far away from the first base layer through a coating film, and the second conductive layer is directly formed on one side of the second substrate far away from the second base layer through a coating film. According to the light shield with the electrochromic function, provided by the embodiment of the application, the electrochromic module is arranged between the first base layer and the second base layer, and the conductive layer is directly formed on the substrate of the electrochromic module, so that the defect that the conductive layer cannot be directly formed by high-temperature coating on the first base layer and the second base layer is overcome.

Description

Light shield with electrochromic function and manufacturing method thereof

Technical Field

The application relates to the technical field of peripheral equipment of electronic equipment, in particular to a light shield with an electrochromic function and a manufacturing method thereof.

Background

In recent years, as image processing technology is improved, related products and application technologies of Virtual Reality (VR) or Augmented Reality (AR) are also becoming popular. The AR technology can realize the interaction between reality and virtual, and is well applied to the fields of education and engineering along with the wide application of the AR technology in the field of game and entertainment.

The AR glasses in the related art are generally solutions based on the projection of an opto-mechanical module onto an optical waveguide. However, the contrast ratio and brightness of the optical-mechanical module are not high, and the optical waveguide efficiency of the grating is low, so that the brightness of the incident eye is low, which limits the application of the AR glasses under strong light.

Disclosure of Invention

The embodiment of the application provides a light shield with an electrochromic function, which comprises a first base layer, an electrochromic module and a second base layer which are sequentially stacked; the electrochromic module comprises a first substrate, a second substrate, a first conductive layer, a second conductive layer and an electrochromic material layer, wherein the first conductive layer, the second conductive layer and the electrochromic material layer are formed between the first substrate and the second substrate; the electrochromic material layer is arranged between the first conductive layer and the second conductive layer; the first conductive layer is directly formed on one side of the first substrate far away from the first base layer through a coating film, and the second conductive layer is directly formed on one side of the second substrate far away from the second base layer through a coating film.

Further, the embodiment of the application also provides a manufacturing method of the light shield with electrochromic function, wherein the light shield has electrochromic function, and the manufacturing method comprises the following steps: providing a first substrate and a second substrate; directly forming a first conductive layer on the first substrate through a coating film, and directly forming a second conductive layer on the second substrate through a coating film; forming an electrochromic material layer between the first conductive layer and the second conductive layer; and attaching a first base layer to one side of the first substrate far away from the first conductive layer, and attaching a second base layer to one side of the second substrate far away from the second conductive layer to form the light shield.

According to the light shield with the electrochromic function, provided by the embodiment of the application, the electrochromic module is arranged between the first base layer and the second base layer, and the conductive layer is directly formed on the substrate of the electrochromic module, so that the defect that the conductive layer cannot be directly formed by high-temperature coating on the first base layer and the second base layer is overcome.

According to the manufacturing method of the light shield with the electrochromic function, the flexible substrate is arranged in the electrochromic module through light, so that the electrochromic module can be directly attached to the curved surface base layer, and the production and manufacturing efficiency is improved. Meanwhile, the conductive layer can be formed by directly coating a film on the flexible substrate, so that the manufacturing process flow of the light shield is simplified.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for the description of the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present application, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic view of a mask according to some embodiments of the application;

FIG. 2 is a schematic diagram of an electrochromic module of a mask according to some embodiments of the application;

FIG. 3 is a schematic diagram of the structure of an electrochromic material layer in some embodiments of the application;

FIG. 4 is a schematic view of the structure of an electrochromic material layer in other embodiments of the application;

FIG. 5 is a schematic view of the structure of an electrochromic material layer in other embodiments of the application;

FIG. 6 is a schematic view of a mask according to some embodiments of the application;

FIG. 7 is a schematic view of a light shield according to other embodiments of the present application;

FIG. 8 is a schematic view of a light shield according to other embodiments of the present application;

FIG. 9 is a schematic view of a light shield according to other embodiments of the present application;

fig. 10 is a flow chart of a method for manufacturing a light shield according to some embodiments of the application.

Detailed Description

The application is described in further detail below with reference to the drawings and examples. It is specifically noted that the following examples are only for illustrating the present application, but do not limit the scope of the present application. Likewise, the following examples are only some, but not all, of the examples of the present application, and all other examples, which a person of ordinary skill in the art would obtain without making any inventive effort, are within the scope of the present application.

Reference herein to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment may be included in at least one embodiment of the application. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments.

The AR glasses are lightweight and have a tendency of good anti-drop strength as a design scheme thereof, and a transparent resin is generally used as a light shield of the AR glasses. In order to realize electrochromic to form a light shield with adjustable transmittance, the related art proposes to add an electrochromic dimming module to the light shield. This requires forming the transparent electrode directly on the light shield formed of the transparent resin.

However, the applicant has found in the study that the glass transition temperature of the transparent resin is relatively low, typically below 200 ℃. In the process of coating the transparent conductive material, a high temperature process of more than 200 ℃ is generally required to crystallize the thin film in order to achieve higher transmittance and better conductivity. I.e. it is difficult to process the electrochromic cell directly on the resin mask.

In addition, the light shield generally has a certain radian, and the direct processing of the electrochromic unit on the curved surface with the radian is a difficulty that needs to be overcome at present.

In order to solve the problems, the technical proposal of the embodiment of the application has the thought that the electrochromic module is clamped between the base materials of the light shield, and the problem that the high-temperature plating of the transparent conductive film can not be realized by directly processing the electrochromic unit on the transparent resin material of the light shield is solved.

It should be noted that the terms "first" and "second" in the embodiments of the present application are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature.

Further, the embodiment of the application provides a light shield with electrochromic function, which is mainly used for the AR glasses. Referring to fig. 1, fig. 1 is a schematic structural diagram of a light shield 100 with electrochromic function according to some embodiments of the present application, and the light shield 100 generally includes a first base layer 10, an electrochromic module 20 and a second base layer 30 stacked in sequence. In other words, the electrochromic module 20 is disposed between the first substrate 10 and the second substrate 30 to adjust the transmittance of the light shield 100 under the action of the electric field.

Among them, the first base layer 10 and the second base layer 30 may be made of a transparent resin material. The transparent resin material includes, but is not limited to, polyethylene terephthalate, polyimide, polymethyl methacrylate, polystyrene, polycarbonate. The transparent resin material can enable the light shield 100 to have lighter weight and better anti-falling strength, and prolong the service life of the light shield 100.

Of course, in other embodiments, the first and second substrates 10 and 30 may be made of glass.

Further, the electrochromic module 20 is respectively attached to and fixedly connected with the first base layer 10 and the second base layer 30, so that the direct coating of the first base layer 10 and the second base layer 30 can be avoided, and the damage to the first base layer 10 and the second base layer 30 can be avoided.

It will be appreciated that the transparent resin material used for the first and second substrates 10 and 30 has a relatively low glass transition temperature, typically less than 200 ℃. In the process of coating the conductive material, the process temperature is generally required to be higher than 200 ℃ in order to achieve higher transmittance and better conductivity.

In some embodiments of the present application, please refer to fig. 2 in combination, fig. 2 is a schematic structural diagram of an electrochromic module 20 of a light shield 100 according to some embodiments of the present application, the electrochromic module 20 generally includes a first substrate 21, a second substrate 22, and a first conductive layer 23, a second conductive layer 24 and an electrochromic material layer 25 formed between the first substrate 21 and the second substrate 22. Wherein the electrochromic material layer 25 is arranged between the first conductive layer 23 and the second conductive layer 24.

In other words, the electrochromic module 20 generally includes a first substrate 21, a first conductive layer 23, an electrochromic material layer 25, a second conductive layer 24, and a second substrate 22 stacked in this order.

Further, the electrochromic material layer 25 is disposed between the first conductive layer 23 and the second conductive layer 24, and the first conductive layer 23 and the second conductive layer 24 are electrically connected with the electrochromic material layer 25, so that opposite sides of the electrochromic material layer 25 can form an external electric field, thereby enabling the electrochromic material layer 25 to change color.

It can be appreciated that the electrochromic material layer 25 can change the transparency from the high-transmittance state to the low-transmittance state or from the low-transmittance state to the high-transmittance state under the electric field effect of the first conductive layer 23 and the second conductive layer 24, thereby realizing the light shield 100 with adjustable light transmittance.

Further, the first substrate 21 and the second substrate 22 are both made of flexible transparent materials, the first substrate 21 is attached to a side of the first base layer 10 close to the second base layer 30, and the second substrate 22 is attached to a side of the second base layer 30 close to the first base layer 10. It will be appreciated that the first substrate 21 and the second substrate 22 made of flexible materials may satisfy the bonding of the first base layer 10 and the second base layer 30 having a planar or curved shape.

Specifically, the first conductive layer 23 is directly formed on the side of the first substrate 21 away from the first base layer 10 through a plating film, and the second conductive layer 24 is directly formed on the side of the second substrate 22 away from the second base layer 30 through a plating film. The first substrate 21 and the second substrate 22 are made of transparent polyimide material, and the transparent polyimide material can resist high temperature of 220-480 ℃ approximately, so that the requirements of a coating process of the conductive material can be met. Of course, in other embodiments, the first substrate 21 and the second substrate 22 may be flexible substrates such as Polyimide (PI), colorless Polyimide (Colorless Polyimide, CPI), and the like.

Further, the first substrate 21 is attached to the first base layer 10 by OCA optical cement (Optically Clear Adhesive) or optically transparent resin (Optical Clear Resin, OCR), and the second substrate 22 is attached to the second base layer 30 by OCA optical cement or optically transparent resin. The refractive indexes of the transparent resin materials and glass adopted by the first base layer 10 and the second base layer 30, the transparent polyimide materials adopted by the first base 21 and the second base 22, and the OCA optical cement or the optical transparent resin are approximate to each other, and are approximately about 1.5, so that the problems of reflection, dazzling and the like can be avoided, and the light shield 100 has higher transmittance in a high-transmittance state.

In some embodiments of the present application, the first conductive layer 23 and the second conductive layer 24 are made of conductive materials. For example, the first conductive layer 23 and the second conductive layer 24 are made of one or more of indium tin oxide, fluorine-doped tin oxide, aluminum-doped zinc oxide, and transparent metal mesh. In the embodiment of the present application, the first conductive layer 23 and the second conductive layer 24 are preferably made of indium tin oxide. Wherein, the first conductive layer 23 and the second conductive layer 24 are transparent conductive layers made of transparent conductive substances.

It is understood that the first conductive layer 23 and the second conductive layer 24 may also be formed on the first substrate 21 and the second substrate 22 by physical vapor deposition (Physical Vapor Deposition, PVD), respectively. Further, the thicknesses of the first conductive layer 23 and the second conductive layer 24 may be in the range of 100nm to 300nm, specifically 100nm, 120nm, 150nm, 200nm, 280nm, 300nm, etc.

Further, the electrochromic material layer 25 is made of an electrochromic material, which may be an organic polymer (including polyaniline, polythiophene, etc.), an inorganic material (prussian blue, a transition metal oxide such as tungsten trioxide), and an organic small molecule (such as viologen), etc. Where the electrochromic material is an organic polymer or an inorganic material, it may include a color-changing layer, an ion conducting layer, an ion storage layer, etc., and detailed technical features thereof will be understood by those skilled in the art and will not be described in detail herein. Further, when the electrochromic material is an organic small molecule, it may be formed by a vacuum filling process, and the detailed technical features thereof will be understood by those skilled in the art and will not be described in detail herein.

Specifically, the electrochromic material layer 25 is made of electrochromic material, counter electrode material, and electrolyte mixed or stacked. The electrochromic material layer 25 is disposed between the first conductive layer 23 and the second conductive layer 24, so that the electrochromic material layer 25 can change the transparency from a high-transmittance state to a low-transmittance state or from a low-transmittance state to a high-transmittance state under the action of an electric field of the first conductive layer 23 and the second conductive layer 24, thereby realizing the light shield 100 with adjustable light transmittance. The counter electrode material can be made of one or more of conductive materials such as platinum, carbon, titanium, chromium, zirconium, copper and the like; the electrolyte may be a solid or liquid electrolyte.

Further, referring to fig. 3, the electrochromic material layer 25 generally includes an electrochromic material 251, an electrolyte 252 and a counter electrode material 253 stacked in sequence, in other words, the electrochromic material layer 25 may be a sandwich structure formed by stacking the electrochromic material 251, the electrolyte 252 and the counter electrode material 253 in layers.

Of course, in other embodiments, referring to fig. 4, the electrochromic material layer 25 may be a double-layer structure formed by mixing the electrochromic material 251 with the electrolyte 252 and then stacking the mixed material with the counter electrode material 253. Of course, in another double layer structure, the counter electrode material 253 and the electrolyte 252 are mixed and then stacked with the electrochromic material 251 (not shown).

Of course, in other embodiments, referring to fig. 5, the electrochromic material layer 25 may also be an integrated structure formed by mixing the electrochromic material 251 and the counter electrode material 253 into the electrolyte 252.

It will be appreciated that the specific manner in which the electrochromic material layer 25 is formed is within the purview of one skilled in the art and will not be described in detail herein.

In some embodiments of the present application, referring to fig. 6 and 7 in combination, the first base layer 10 and the second base layer 30 may be disposed in a plane or a curved surface, wherein fig. 6 is a schematic view of a structure in which the first base layer 10 and the second base layer 30 are planar, and fig. 7 is a schematic view of a structure in which the first base layer 10 and the second base layer 30 are curved.

Specifically, when the first base layer 10 and the second base layer 30 are disposed in a plane, the first substrate 21 is attached to the first base layer 10 in a plane, and the second substrate 22 is attached to the second base layer 20 in a plane. As shown in fig. 6, the first substrate 10, the electrochromic module 20 and the second substrate 30 of the light shield 100 are all disposed in a plane, and have good appearance.

Further, when the first base layer 10 and the second base layer 30 are disposed in a curved surface, the first base 21 is attached to the first base layer 10 in a curved surface, and the second base 22 is attached to the second base layer 20 in a curved surface. As shown in fig. 7, the light shield 100 has a first curvature, for example, the end portions of the light shield 100 are in a tilted state on the same side, that is, the end portions of the first base layer 10 and the second base layer 30 are in a curved surface, and at this time, it is difficult to directly process the electrochromic material layer 25 on the curved surface. Therefore, the first substrate 21 and the second substrate 22 of the electrochromic module 20 are made of flexible transparent materials, and the electrochromic material layer 25 is processed on the first substrate 21 and the second substrate 22 to form the light shield 100 with curved surface and adjustable light transmittance.

Specifically, a first conductive layer 23 is formed on a first substrate 21 through a coating film, a second conductive layer 24 is formed on a second substrate 22 through a coating film, then an electrochromic material layer 25 is formed between the first conductive layer 23 and the second conductive layer 24, and finally the first base layer 10 and the second base layer 30 are attached to form the light shield 100 with a curved surface and adjustable light transmittance.

According to the light shield provided by the embodiment of the application, the electrochromic module 20 is arranged between the first base layer 10 and the second base layer 30, the first substrate 21 and the second substrate 22 are arranged in the electrochromic module 20, the first conductive layer 23 is directly formed on the first substrate 21, the second conductive layer 24 is directly formed on the second substrate 22, and the electrochromic material layer 25 is arranged between the first conductive layer 23 and the second conductive layer 24, so that the defect that the first conductive layer 23 and the second conductive layer 24 cannot be directly formed on the first base layer 10 and the second base layer 30 through high-temperature coating is overcome. It can be appreciated that the flexible electrochromic module is manufactured by adopting the first substrate 21 and the second substrate 22 made of flexible materials, and the flexible electrochromic module is arranged between the first base layer 10 and the second base layer 30, so that the defect that the conductive layer cannot be directly formed by high-temperature coating on the first base layer 10 and the second base layer 30 is overcome, and meanwhile, the first substrate 21 and the second substrate 22 made of flexible materials can be suitable for curved surface processing.

In addition, the first and second substrates 21 and 22 are made of flexible materials, which facilitates the processing of the light shield 100 having a curved surface.

In some embodiments of the present application, referring to fig. 8, the light shielding cover 100 generally further includes a sealing member 50, wherein the sealing member 50 surrounds the outer peripheral edges of the first base layer 10 and the second base layer 30 away from the electrochromic module 20 to prevent the lateral invasion of water and oxygen, which affects the use effect and the service life of the light shielding cover 100.

Specifically, the seal member 50 may be provided in a ring shape, and the cross section of the inner ring may be in a regular shape such as a circle, triangle, rectangle, pentagon, hexagon, octagon, or other irregular shapes. The embodiment of the present application will be described by taking the shape of the seal 50 as an annular shape.

Further, the seal 50 may be a plastic frame. Accordingly, the plastic frame may be glued to the first base layer 10 and the second base layer 30. The plastic frame may also be glued to the first substrate 21 and the second substrate 22. Of course, in other embodiments, the sealing member 50 may be a glass frame, and the glass frame may be glued to the first substrate 21 and the second substrate 22.

In some embodiments of the present application, referring to fig. 9, the sealing member 50 may generally include a first adhesive frame 51 and a second adhesive frame 52, wherein the first adhesive frame 51 is disposed around the outer periphery of the electrochromic module 20. The second adhesive frame 52 is disposed between the first base layer 10 and the second base layer 30, and is disposed around a side of the first adhesive frame 51 away from the electrochromic module 20.

Specifically, the first rubber frame 51 is disposed around the outer periphery of the electrochromic module 20, and the first rubber frame 51 may be disposed in a ring shape, and an inner ring of the first rubber frame is tightly attached to the outer periphery of the electrochromic module 20. In other words, the first frame 51 may be glued to the first substrate 21 and the second substrate 22. That is, the inner ring of the first glue frame 51 is fixedly connected with the first substrate 21 and the second substrate 22 at the same time, so as to encapsulate the electrochromic module 20, avoid the lateral invasion of water and oxygen, and improve the reliability of the electrochromic module 20.

Further, the second rubber frame 52 is disposed between the first base layer 10 and the second base layer 30, the second rubber frame 52 may be disposed in a ring shape, and an inner ring of the second rubber frame is disposed around a side of the first rubber frame 51 away from the electrochromic module 20. In other words, the inner ring of the second adhesive frame 52 is tightly attached to the side of the first adhesive frame 51 away from the electrochromic module 20, and is fixedly connected or glued to the side. Further, the second plastic frame 52 is sandwiched between the first base layer 10 and the second base layer 30, and is glued and sealed with the first base layer 10 and the second base layer 30 respectively, so as to further encapsulate the light-shielding cover 100, prevent lateral intrusion of water and oxygen, and improve the reliability and service life of the light-shielding cover 100.

According to the light shield provided by the embodiment of the application, the first base layer and the second base layer are made of the blocky transparent resin, so that the light shield has good water and oxygen resistance. Therefore, the mask surface does not require a special water-oxygen barrier treatment. However, in order to prevent lateral intrusion of water oxygen, by providing the first and second glue frame packages, lateral intrusion of water oxygen can be effectively prevented.

The embodiment of the application also provides a manufacturing method of the light shield, and the light shield can be the light shield in the previous embodiment, and has an electrochromic function. Specifically, referring to fig. 10, fig. 10 is a flow chart of a method for manufacturing a light shield according to some embodiments of the application, the method generally includes the following steps:

s101, providing a first substrate and a second substrate;

the first substrate and the second substrate are made of flexible transparent materials, and the first substrate and the second substrate made of flexible materials can meet the requirement of planar or curved surface lamination. Specifically, the first substrate and the second substrate may be flexible substrates such as Polyimide (PI) and colorless Polyimide (Colorless Polyimide, CPI). In the embodiment of the application, the first substrate and the second substrate are made of transparent polyimide materials, and the transparent polyimide materials can resist the high temperature of 220-480 ℃ approximately and can meet the requirements of the subsequent conductive material coating process.

S102, directly forming a first conductive layer on a first substrate through a coating film, and directly forming a second conductive layer on a second substrate through a coating film;

specifically, the first conductive layer is directly formed on the first substrate through a coating film, and the second conductive layer is directly formed on the second substrate through a coating film. The first conductive layer and the second conductive layer are transparent conductive layers made of transparent conductive materials. For example, the first and second conductive layers may be made of one or more of indium tin oxide, fluorine doped tin oxide, aluminum doped zinc oxide, and transparent metal mesh.

Of course, in other embodiments, the first conductive layer and the second conductive layer may be formed on the first substrate and the second substrate respectively by physical vapor deposition.

S103, forming an electrochromic material layer between the first conductive layer and the second conductive layer;

wherein the electrochromic material layer is made of electrochromic material. Specifically, the electrochromic material layer is made of a mixture or stack of electrochromic material, counter electrode material and electrolyte, and its specific structure is as described in the previous embodiments, which is not described in detail in the embodiments of the present application.

S104, attaching a first base layer on one side of the first substrate far away from the first conductive layer, and attaching a second base layer on one side of the second substrate far away from the second conductive layer to form a light shield.

It is understood that the first base layer and the second base layer may be disposed in a plane or a curved surface, and disposed on the outer sides of the first substrate and the second substrate, respectively, so as to form protection for the first substrate and the second substrate.

Specifically, when the first base layer and the second base layer are in curved surface arrangement, the first base layer is pasted on the first base layer in a curved surface mode through OCA optical cement or optical transparent resin, and the second base layer is pasted on the second base layer in a curved surface mode through OCA optical cement or optical transparent resin.

It should be noted that the manufacturing method provided in the embodiment of the present application may be used to manufacture the light shield as described in the foregoing embodiment. Specifically, the light shield generally comprises a first base layer, an electrochromic module and a second base layer. The electrochromic module is arranged between the first base layer and the second base layer, and the electrochromic module is respectively attached to the first base layer and the second base layer through OCA optical cement or optical transparent resin.

Further, the electrochromic module includes a first substrate, a first conductive layer, an electrochromic material layer, a second conductive layer and a second substrate, which are sequentially stacked, and the structure and materials of the layers are as described in the foregoing embodiments, which are not described in detail herein.

Further, in step S104, attaching the first base layer to the side of the first substrate away from the first conductive layer, and before attaching the second base layer to the side of the second substrate away from the second conductive layer, the method may further include: the outer peripheries of the first substrate and the second substrate are glued with a first glue frame, namely, the inner ring of the first glue frame is fixedly connected with the first substrate and the second substrate at the same time, so that the electrochromic module is packaged, lateral invasion of water and oxygen is avoided, and the use reliability of the electrochromic module is improved;

in step S104, attaching the first base layer to the side of the first substrate away from the first conductive layer, and attaching the second base layer to the side of the second substrate away from the second conductive layer may further include: and a second rubber frame is arranged between the first base layer and the second base layer, and the inner ring of the second rubber frame is arranged on one side, far away from the electrochromic module, of the first rubber frame in a surrounding manner. Further, the second glue frame is clamped between the first base layer and the second base layer and is glued and sealed with the first base layer and the second base layer respectively, so that the light shield is further packaged, lateral invasion of water and oxygen is prevented, and the use reliability and the service life of the light shield are improved.

The embodiment of the application provides a manufacturing method of a light shield with an electrochromic function, wherein a flexible substrate is arranged in an electrochromic module through light, so that the electrochromic module can be directly attached to a curved surface base layer, and the production and manufacturing efficiency is improved. Meanwhile, the conductive layer can be formed by directly coating a film on the flexible substrate, so that the manufacturing process flow of the light shield is simplified.

It should be noted that the terms "comprising" and "having," as well as any variations thereof, are intended to cover a non-exclusive inclusion. For example, a process, method, system, article, or apparatus that comprises a list of steps or elements is not limited to only those listed steps or elements but may alternatively include other steps or elements not listed or inherent to such process, method, article, or apparatus.

The foregoing description is only a partial embodiment of the present application, and is not intended to limit the scope of the present application, and all equivalent devices or equivalent processes using the descriptions and the drawings of the present application or directly or indirectly applied to other related technical fields are included in the scope of the present application.

Claims

1. The shading cover with the electrochromic function is characterized by comprising a first base layer, an electrochromic module, a second base layer and a sealing piece, wherein the first base layer, the electrochromic module and the second base layer are sequentially arranged in a stacked mode, and the sealing piece is arranged between the first base layer and the second base layer and surrounds the outer periphery of the electrochromic module; wherein, the liquid crystal display device comprises a liquid crystal display device,

the electrochromic module comprises a first substrate, a second substrate, a first conductive layer, a second conductive layer and an electrochromic material layer, wherein the first conductive layer, the second conductive layer and the electrochromic material layer are formed between the first substrate and the second substrate; the electrochromic material layer is arranged between the first conductive layer and the second conductive layer;

the first conductive layer is directly formed on one side of the first substrate far away from the first base layer through a coating film, and the second conductive layer is directly formed on one side of the second substrate far away from the second base layer through a coating film; the temperature of the coating is higher than 200 ℃, the glass transition temperature of the materials of the first base layer and the second base layer is lower than 200 ℃, the temperature tolerance of the materials of the first base layer and the second base layer is 220-480 ℃ so as to resist the temperature of the coating, and the first base layer and the second base layer are made of transparent polyimide materials.

2. The mask of claim 1, wherein the first substrate is attached to a side of the first substrate adjacent to the second substrate, and the second substrate is attached to a side of the second substrate adjacent to the first substrate.

3. The mask of claim 2, wherein the first substrate is attached to the first base layer by OCA optical cement or optically clear resin, and the second substrate is attached to the second base layer by OCA optical cement or optically clear resin.

4. The mask of claim 3, wherein the first base layer and the second base layer are curved, the first base layer is curved and attached to the first base layer, and the second base layer is curved and attached to the second base layer.

5. The mask of claim 1, wherein the first and second base layers are made of a transparent resin material including polyethylene terephthalate, polyimide, polymethyl methacrylate, polystyrene, polycarbonate.

6. The mask of claim 1 wherein the first and second base layers are made of glass.

7. The mask of claim 1, wherein the first and second conductive layers are made of one or more of indium tin oxide, fluorine doped tin oxide, aluminum doped zinc oxide, transparent metal mesh.

8. The mask of claim 1, wherein the electrochromic material layer is made of electrochromic material, counter electrode material and electrolyte mixed or stacked.

9. The light shield of claim 1 wherein the seal comprises a first glue frame and a second glue frame, the first glue frame surrounding an outer perimeter of the electrochromic module; the second rubber frame is arranged between the first base layer and the second base layer, and surrounds one side, far away from the electrochromic module, of the first rubber frame.

10. A method for manufacturing a light shield, wherein the light shield has an electrochromic function, the method comprising:

providing a first substrate and a second substrate;

directly forming a first conductive layer on the first substrate through a coating film, and directly forming a second conductive layer on the second substrate through a coating film; the temperature of the coating film is more than 200 ℃;

forming an electrochromic material layer between the first conductive layer and the second conductive layer to form an electrochromic module;

attaching a first base layer to one side of the first substrate far away from the first conductive layer, and attaching a second base layer to one side of the second substrate far away from the second conductive layer;

providing a seal between the first and second substrates to form the light shield, the seal surrounding an outer periphery of the electrochromic module; the glass transition temperature of the materials of the first base layer and the second base layer is lower than 200 ℃, the temperature resistant to the materials of the first base layer and the second base layer is 220-480 ℃ so as to resist the temperature of the coating film, and the first base layer and the second base layer are made of transparent polyimide materials.

11. The method according to claim 10, wherein the first base layer and the second base layer are disposed in a curved surface, the first base layer is attached to the first base layer in a curved surface by OCA optical cement or optically transparent resin, and the second base layer is attached to the second base layer in a curved surface by OCA optical cement or optically transparent resin.