CN111054612A - 框架及框架的表面处理方法 - Google Patents

框架及框架的表面处理方法 Download PDF

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CN111054612A
CN111054612A CN201811210490.2A CN201811210490A CN111054612A CN 111054612 A CN111054612 A CN 111054612A CN 201811210490 A CN201811210490 A CN 201811210490A CN 111054612 A CN111054612 A CN 111054612A
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layer
primer layer
frame
paint
substrate
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姜传华
戴祯仪
肖飞龙
管俊
程宇
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Shenzhen Futaihong Precision Industry Co Ltd
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Priority to TW107140484A priority patent/TW202016356A/zh
Priority to US16/294,553 priority patent/US10926292B2/en
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Abstract

一种框架的表面处理方法，包括以下步骤：提供一基材，所述基材是将金属粉末压铸成型所制成，所述基材表面形成有多个纳米孔洞；于所述基材的一表面形成第一底漆层、第二底漆层、NCVM(Non‑Conductive Curing Coating，真空不导电电镀)底漆层、NCVM镀膜层，进一步地形成中漆和色漆层、面漆层，其中采用NCVM技术代替传统的CNC加工技术，使得缩短制程，减少加工周期，减少原材料用量，从而减少加工成本。

Description

框架及框架的表面处理方法
技术领域
本发明涉及一种框架及框架的表面处理方法。
背景技术
目前超薄手机已经成为主流，原来采用的不锈钢为主框架的方式逐步由铝材整板进行CNC加工所代替，这种由铝材所加工的主框架，具有不易变形、重量轻、容易做表面处理等优点，但因其CNC制程用量多、加工周期长、材料用量多，使得这种工艺产品总生产成本偏高。
发明内容
有鉴于此，有必要提供一种框架及框架的表面处理方法，使得框架制备工艺简单、加工周期短、材料用量少。
提供一种框架，所述框架包括基材及形成于所述基材表面的涂层，所述基材的表面依次形成第一底漆层、第二底漆层、NCVM(Non-Conductive Curing Coating，真空不导电电镀)底漆层与NCVM镀膜层。
进一步地，所述NCVM镀膜层的表面还设置有中漆和色漆层，所述中漆和色漆层的表面还设置有面漆层。
进一步地，所述NCVM镀膜层的表面还设置有中漆和色漆层，所述中漆和色漆层的表面还设置有光镀层，所述光镀层的表面还设置有面漆层。
进一步地，所述基材为铝合金、锌合金、铝镁合金或钛合金，所述基材是将金属粉末压铸成型所制成，所述基材表面形成有多个纳米孔洞。
还提供一种框架的表面处理方法，所述方法包括以下步骤：
提供一基材；
于所述基材的一表面形成第一底漆层；
于所述第一底漆层表面形成第二底漆层；
于所述第二底漆层表面形成NCVM底漆层；及
于所述NCVM底漆层形成NCVM镀膜层。
进一步地，所述NCVM底漆层是采用NCVM技术于所述第二底漆层表面喷涂UV漆，经过800～1000mj/cm2的紫外光照射，烘烤温度为50-60℃，烘烤时间为10-15min，固化以形成所述NCVM底漆层。
进一步地，所述NCVM底漆层的厚度为6-10μm。
进一步地，所述NCVM镀膜层的厚度为50-200nm，材质为铟或锡。
进一步地，还包括步骤：于所述NCVM镀膜层表面形成中漆和色漆层、面漆层。
进一步地，还包括步骤：对中漆和色漆层进行光镀处理，以形成光镀层。
进一步地，还包括步骤：依次于所述NCVM镀膜层表面形成中漆和色漆层、光镀层与面漆层，其中所述光镀层的材料为二氧化硅或二氧化钛。
相比现有技术，本发明提供的框架的表面处理方法中，采用NCVM方法代替传统的CNC加工，制程短，加工周期减少，原材料用量少，从而加工成本减少；并且本发明提供的框架具有一体成型的外观效果，具有金属质感和光泽。
附图说明
图1为本发明一较佳实施例的壳体的剖面示意图。
图2为本发明另一较佳实施例的壳体的剖面示意图。
图3为本发明一框架的表面处理方法的方法流程图。
图4为本发明一框架的表面处理方法的另一方法流程图。
主要元件符号说明
框架 10
基材 101
第一表面 1101
第一底漆层 102
第二底漆层 103
NCVM底漆层 104
NCVM镀膜层 105
中漆和色漆层 106
面漆层 107
光镀层 108
如下具体实施方式将结合上述附图进一步说明本发明。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
需要说明的是，当元件被称为“固定于”另一个元件，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件，它可以是直接连接到另一个元件或者可能同时存在居中元件。当一个元件被认为是“设置于”另一个元件，它可以是直接设置在另一个元件上或者可能同时存在居中元件。
除非另有定义，本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施例的目的，不是旨在于限制本发明。
参阅图1，本发明较佳实施例提供一种框架10，所述框架10可以为手机、平板电脑、照相机等装置的外壳、机械设备的外壳或汽车的装饰件等等。
所述框架10至少包括基材101、第一底漆层102、第二底漆层103、NCVM(Non-Conductive Curing Coating，真空不导电电镀)底漆层104、NCVM镀膜层105。
所述基材101包括第一表面1101，所述第一表面1101可以作为所述框架10的外表面。
所述基材101的材质为铝合金、锌合金、铝镁合金或钛合金。
在本实施例中，所述基材101是采用金属粉末压铸成型技术所制成，所述基材101表面形成有多个纳米孔洞。
所述第一底漆层102形成于所述基材101的第一表面1101，所述第一底漆层102的材质为PU漆，为所述基材101提供良好的附着力，从而克服所述基材101自身表面附着力不佳的问题。
在本实施例中，所述第一底漆层102通过在所述基材101的第一表面1101喷涂底漆而形成。
所述第二底漆层103形成于第一底漆层102的表面，所述第二底漆层103的材质为PU漆，所述第二底漆层103的作用是对基材101表面的缺陷起到遮蔽作用，体现质感。
所述NCVM底漆层104形成于所述第二底漆层103的表面，所述NCVM底漆层104的作用是增强第二底漆层103的附着力。
所述NCVM镀膜层105形成于所述NCVM底漆层104的表面，所述NCVM镀膜层105的材质为铟或锡，所述NCVM镀膜层105的作用是提高镜面高光装饰。
进一步地，所述框架10还包括中漆和色漆层106，所述中漆和色漆层106的作用是呈现框架10的外观颜色，可以根据客户的需求进行定制，可以是黑色、白色、红色等等。
进一步地，所述框架10还包括面漆层107，所述面漆层107起防护作用。
请参阅图2，在另一实施例中，所述框架10还包括光镀层108，所述光镀层108形成于中漆和色漆层106与面漆层107之间。
请参阅图3，本发明实施例还提供一种框架10的制备方法，包括如下步骤：
步骤S10，提供一基材101，所述基材101包括第一表面1101，所述基材101的材质为铝合金、锌合金、铝镁合金或钛合金，在一实施方式中，所述基材101是将金属粉末压铸成型所制成，所述基材101的表面形成有多个纳米孔洞。
步骤S20，对所述基材101进行机械加工，以得到框架10的基本结构。
步骤S30，清洗基材101。一实施例中，利用脱脂剂对所述基材101进行脱脂处理后，再利用纯水清洗所述基材101，以清洁所述基材101表面的灰尘与油渍。
步骤S40，于所述基材101的第一表面1101形成第一底漆层102，所述第一底漆层102的作用是为所述基材101提供良好的附着力，从而克服所述基材101自身表面附着力不佳的问题。
具体地，一实施例中，于所述基材101的第一表面1101喷涂PU漆以形成第一底漆层102，所述PU漆的烘烤温度为75℃，烘烤时间为10min，喷涂的PU漆的厚度为8-12μm。
步骤S50，于所述第一底漆层102的表面形成第二底漆层103，以填充所述基材101的表面形成的多个纳米孔洞，即第二底漆层103对基材101表面的缺陷起遮蔽作用，体现质感。
具体地，一实施例中，于所述第一底漆层102的表面喷涂PU漆以形成第二底漆层103，所述PU漆烘烤温度为80℃，烘烤时间为2h，喷涂的PU漆的厚度为25-30μm。
步骤S60，于所述第二底漆层103表面形成NCVM底漆层104，所述NCVM底漆层104是增强第二底漆层103的附着力。
具体地，一实施例中，采用NCVM方法于所述第二底漆层103表面形成NCVM底漆层104，经过800～1000mj/cm2的紫外光照射，烘烤温度为50-60℃，烘烤时间为10-15min，固化以形成厚度为6-10μm的NCVM底漆层104，所述NCVM底漆层104为PU漆。
步骤S70，于所述NCVM底漆层104表面形成NCVM镀膜层105，所述NCVM镀膜层105的作用是提高镜面高光装饰。
具体地，一实施例中，采用NCVM方法于所述NCVM底漆层104表面形成NCVM镀膜层105，所述NCVM镀膜层105的厚度为50-200nm，所述NCVM镀膜层105的材质为铟或锡。
可以理解，为了提高所述框架10的外观装饰效果，还可以包括步骤S80，于NCVM镀膜层105的表面形成中漆和色漆层106，所述中漆和色漆层106的作用是体现框架10外观颜色，可以根据客户的需求进行定制，可以是黑色、白色、红色等等。
具体地，一实施例中，所述中漆和色漆层106的烘烤温度为65-70℃，烘烤时间为10-15min，厚度为6-10μm。
进一步地，为了对框架10起到防护作用，还可以包括步骤S90，于所述中漆和色漆层106表面形成面漆层107。
具体地，一实施例中，于所述中漆和色漆层106喷涂UV漆经过800-1200mj/cm2的紫外光照射，烘烤温度为60℃，烘烤时间为6min，固化以形成厚度为20-25μm的面漆层107。
当然，为了进一步地提升所述框架10的外观装饰效果，在另一实施方式中，请参阅图4所示，在步骤S80后包括步骤S85与S95，其中，步骤S85为形成光镀层108于中漆和色漆层106的表面，即对中漆和色漆层106进行光镀处理，以形成光镀层108。所述光镀层108的材料可以为二氧化硅、二氧化钛。步骤S95为形成面漆层107于光镀层108表面。
综上所述，依次于所述基材101的第一表面1101形成第一底漆层102、第二底漆层103、NCVM底漆层104、NCVM镀膜层105，进而形成框架10，其中采用NCVM方法代替CNC加工，缩短制程，减少加工周期，减少原材料用量，从而减少加工成本。中漆和色漆层106与面漆层107的添加，使框架10具有一体成型的外观效果。
以上实施例仅用以说明本发明的技术方案而非限制，尽管参照较佳实施例对本发明进行了详细的说明，本领域的普通技术人员应当理解，可以对本发明的技术方案进行修改或等同替换，而不脱离本发明技术方案的精神和实质。

Claims (10)

1.一种框架，包括基材及形成于所述基材表面的涂层，其特征在于：所述基材的表面依次形成第一底漆层、第二底漆层、真空不导电电镀底漆层与真空不导电电镀镀膜层。
2.根据权利要求1所述的框架，其特征在于，所述真空不导电电镀镀膜层的表面还设置有中漆和色漆层，所述中漆和色漆层的表面还设置有面漆层。
3.根据权利要求1所述的框架，其特征在于，所述真空不导电电镀镀膜层的表面还设置有中漆和色漆层，所述中漆和色漆层的表面还设置有光镀层，所述光镀层的表面还设置有面漆层。
4.根据权利要求1所述的框架，其特征在于，所述基材为铝合金、锌合金、铝镁合金或钛合金，所述基材是将金属粉末压铸成型所制成，所述基材表面形成有多个纳米孔洞。
5.一种框架的表面处理方法，其特征在于，包括步骤：
提供一基材；
于所述基材的一表面形成第一底漆层；
于所述第一底漆层表面形成第二底漆层；
于所述第二底漆层表面形成真空不导电电镀底漆层；及
于所述真空不导电电镀底漆层形成真空不导电电镀镀膜层。
6.根据权利要求5所述的框架的表面处理方法，其特征在于，所述真空不导电电镀底漆层是采用真空不导电电镀技术于所述第二底漆层表面喷涂UV漆，经过800～1000mj/cm2的紫外光照射，烘烤温度为50-60℃，烘烤时间为10-15min，固化以形成所述真空不导电电镀底漆层。
7.根据权利要求6所述的框架的表面处理方法，其特征在于，所述真空不导电电镀底漆层的厚度为6-10μm。
8.根据权利要求7所述的框架的表面处理方法，其特征在于，所述真空不导电电镀镀膜层的厚度为50-200nm，材质为铟或锡。
9.根据权利要求8述的框架的表面处理方法，其特征在于，还包括步骤：依次于所述真空不导电电镀镀膜层表面形成中漆和色漆层与面漆层。
10.根据权利要求9所述的框架的表面处理方法，其特征在于，还包括步骤：依次于所述真空不导电电镀镀膜层表面形成中漆和色漆层、光镀层与面漆层，其中所述光镀层的材料为二氧化硅或二氧化钛。
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