CN110989293B - Nanoimprint structure, control method thereof, nanoimprint device and patterning method - Google Patents
Nanoimprint structure, control method thereof, nanoimprint device and patterning method Download PDFInfo
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- CN110989293B CN110989293B CN201911308299.6A CN201911308299A CN110989293B CN 110989293 B CN110989293 B CN 110989293B CN 201911308299 A CN201911308299 A CN 201911308299A CN 110989293 B CN110989293 B CN 110989293B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The invention discloses a nano-imprinting structure, a control method thereof, a nano-imprinting device and a composition method, wherein a bearing structure is arranged on a magnetic connecting rod, a flexible membrane is arranged to be an annular flexible membrane, the annular flexible membrane is sleeved at the position of the magnetic connecting rod with the bearing structure, the imprinting pattern of the annular flexible membrane is driven to move in a second direction by controlling the bearing structure to rotate around the magnetic connecting rod, the imprinting pattern of the annular flexible membrane is driven to move in a first direction by controlling the bearing structure to slide on the magnetic connecting rod, so that the annular flexible membrane is arranged, and the composition of a substrate can be completed by adjusting the area of the imprinting pattern.
Description
Technical Field
The invention relates to the technical field of display, in particular to a nano-imprinting structure, a control method thereof, a nano-imprinting device and a composition method.
Background
The nano-imprinting technology is adopted for composition, the nano-scale size can be formed, so that the display panel can realize high resolution, and the nano-imprinting technology also has the advantages of simple process, ultralow cost, high productivity and the like, is widely applied to the micro-nano manufacturing field of LEDs, semiconductors and the like, and is considered to be one of the next generation photoetching technologies with prospect.
In the existing nanoimprint process, due to the limitation of the size of the hard template, the hard template can only be copied for multiple times, multiple soft templates are copied, the positions of imprinted patterns in each soft template are different, and each soft template performs composition on different positions of the substrate, so that the substrate is patterned by splicing the imprinted patterns in the multiple soft templates. However, in the process of forming the soft template, each soft template needs to copy the pattern on the hard template separately, and it cannot be guaranteed that the grating directions on the hard template copied each time are uniform, which may result in poor quality of the soft template finally copied, and when the substrate is patterned, the uniformity of each pattern of the substrate may be poor, which may affect the display quality.
Therefore, the technical problem to be solved by those skilled in the art is how to improve the patterning uniformity of the substrate by designing the nano-imprinting structure.
Disclosure of Invention
In view of the above, embodiments of the present invention provide a nanoimprint structure, a control method thereof, a nanoimprint apparatus, and a patterning method, so as to improve patterning uniformity of a substrate.
In a first aspect, an embodiment of the present invention provides a nanoimprint structure, including: the magnetic connecting rod is positioned on the fixed magnets respectively and extends along the first direction; further comprising:
a plurality of bearing structures, the bearing structures being sleeved on the magnetic connecting rod, the bearing structures being configured to rotate around the magnetic connecting rod by a preset radian in a preset direction under control and to slide along the magnetic connecting rod by a second preset distance in the first direction under control;
the annular soft membrane plate is sleeved on the two magnetic connecting rods and covers the area where the bearing structure is located, and the imprinted pattern of the annular soft membrane plate is located between the two magnetic connecting rods and located on one side close to the fixed magnet;
the extension length of the stamped graph in the second direction is smaller than the first preset distance, and/or the extension length of the stamped graph in the first direction is smaller than the length of the magnetic connecting rod in the first direction; the first direction is perpendicular to the second direction.
In a possible implementation manner, the nano-imprinting structures provided in the embodiments of the present invention are uniformly distributed in the area covered by the annular soft membrane.
In a possible implementation manner of the nanoimprint structure provided in the embodiment of the present invention, the first predetermined distance is 600mm to 1800 mm.
In a possible implementation manner, in the nano-imprinting structure provided by the embodiment of the invention, the extension length of the imprinting pattern in the second direction is 84mm to 252 mm;
the extension of the embossed pattern in the first direction is 56mm to 168 mm.
In a second aspect, an embodiment of the present invention further provides a method for controlling a nanoimprint structure, including:
and adjusting the bearing structure to rotate around the magnetic connecting rod in a preset direction by a preset radian according to a preset region to be patterned in the substrate to be patterned, and/or adjusting the bearing structure to slide along the magnetic connecting rod in the first direction by a second preset distance.
In a third aspect, an embodiment of the present invention further provides a nanoimprinting apparatus, including the nanoimprinting structure provided in any one of the first aspect, an imprint rod located on a side of the nanoimprinting structure away from the imprint pattern, and a control unit;
the control unit is configured to control the movement of the stamp rod and the bearing structure.
In a fourth aspect, an embodiment of the present invention further provides a substrate patterning method, in which the nanoimprint device provided in the embodiment of the third aspect is used to pattern a substrate to be patterned.
In a possible implementation manner, in the method for patterning a substrate provided in an embodiment of the present invention, patterning a substrate to be patterned by using the nanoimprint device specifically includes:
providing a substrate to be patterned;
coating imprinting glue on the substrate;
adjusting the position of an imprinting pattern in the nano imprinting structure to a first region to be patterned of the substrate;
controlling the imprinting rod to imprint the nano imprinting structure according to a preset path to form a pattern of the imprinting glue;
and patterning the first region to be patterned of the substrate according to the pattern of the stamping glue.
In a possible implementation manner, in the method for patterning a substrate provided in an embodiment of the present invention, the patterning the first region to be patterned on the substrate specifically includes:
in the first region to be patterned, carrying out ashing treatment on the substrate with the pattern of the stamping glue;
and sequentially carrying out dry etching and wet etching on the substrate subjected to the ashing treatment, and forming a pattern of the substrate in the first region to be patterned.
In a possible implementation manner, in the patterning method of the substrate provided in the embodiment of the present invention, after the patterning of the first region to be patterned of the substrate is completed, the method further includes:
coating imprinting glue on the substrate;
adjusting the position of the imprinted pattern on the annular soft film plate to a second region to be patterned of the substrate;
controlling the stamping rod to stamp the nano stamping structure according to a preset path, and forming a pattern of the stamping glue in the second region to be patterned;
and patterning the second region to be patterned of the substrate according to the pattern of the stamping glue.
The invention has the beneficial effects that:
the embodiment of the invention provides a nano-imprinting structure, a control method thereof, a nano-imprinting device and a composition method, wherein the nano-imprinting structure comprises the following components: the magnetic connecting rod is positioned on the fixed magnets respectively and extends along the first direction; further comprising: a plurality of bearing structures, the bearing structures being sleeved on the magnetic connecting rod, the bearing structures being configured to rotate around the magnetic connecting rod by a preset radian in a preset direction under control and to slide along the magnetic connecting rod by a second preset distance in the first direction under control; the annular soft membrane plate is sleeved on the two magnetic connecting rods and covers the area where the bearing structure is located, and the imprinted pattern of the annular soft membrane plate is located between the two magnetic connecting rods and located on one side close to the fixed magnet; the extension length of the stamped graph in the second direction is smaller than the first preset distance, and/or the extension length of the stamped graph in the first direction is smaller than the length of the magnetic connecting rod in the first direction; the first direction is perpendicular to the second direction. Through setting up bearing structure on the magnetism connecting rod, and set up the mantle board into cyclic annular mantle board, establish the position that has bearing structure at the magnetism connecting rod with the mantle board cover, rotate around the magnetism connecting rod through control bearing structure, the impression figure that drives cyclic annular mantle board moves in the second direction, slide on the magnetism connecting rod through control bearing structure, the impression figure that drives cyclic annular mantle board moves in the first direction, thereby set up a cyclic annular mantle board, it is regional to adjust the impression figure, can accomplish the composition of picture to the base plate, the problem of the composition homogeneity that many mantle board concatenations caused has not only been solved, also very big saving manufacturing cost.
Drawings
FIG. 1 is a schematic structural diagram of a related art nanoimprint structure;
FIG. 2 is a schematic structural diagram of a nanoimprint structure provided by an embodiment of the present invention;
FIG. 3 is a schematic cross-sectional view taken along line A1-A2 in FIG. 2;
FIG. 4 is a schematic structural diagram of a magnetic linkage and bearing structure in a nanoimprint structure provided in an embodiment of the present invention;
fig. 5a to 5i are schematic structural diagrams when a substrate is patterned by using the nanoimprint structure provided by the embodiment of the invention.
Detailed Description
According to the nano-imprinting technology in the related technology, a hard template is manufactured firstly, then the hard template is subjected to repeated engraving through a soft membrane plate, and an imprinting pattern is formed on the soft template, wherein the hard template manufacturing process is long in time consumption, only one hard template corresponding to the repeated pattern in the substrate is manufactured through the repeated pattern in the substrate, and the patterns on the hard template are repeatedly engraved to different areas through a plurality of soft membrane plates so as to realize composition of different areas of the substrate.
Among them, the related art nano-imprint structure, as shown in fig. 1, includes: the fixed magnet 01 and the magnetic connecting rod 02 fix the soft membrane plate 03 between the fixed magnet 01 and the magnetic connecting rod 02 through the attraction force between the fixed magnet 01 and the magnetic connecting rod 02, the areas where the imprint patterns 04 are located in each soft membrane plate 03 are different, and when different areas of the substrate are subjected to composition, the soft membrane plate 03 corresponding to the areas needs to be replaced so as to realize the composition of the areas.
However, in the process of forming the soft template, each soft template needs to copy the pattern on the hard template separately, and it cannot be guaranteed that the grating directions on the hard template copied each time are uniform, which may result in poor quality of the soft template finally copied, and when the substrate is patterned, the uniformity of each pattern of the substrate may be poor, which may affect the display quality.
Based on the above problems in the related art, embodiments of the present invention provide a nanoimprint structure, a control method thereof, a nanoimprint apparatus, and a patterning method. In order to make the objects, technical solutions and advantages of the present invention clearer, specific embodiments of a nanoimprint structure, a control method thereof, a nanoimprint apparatus, and a patterning method according to embodiments of the present invention are described in detail below with reference to the accompanying drawings. It should be understood that the preferred embodiments described below are only for illustrating and explaining the present invention and are not to be used for limiting the present invention. And the embodiments and features of the embodiments in the present application may be combined with each other without conflict.
Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. The use of "first," "second," and similar terms in the present application do not denote any order, quantity, or importance, but rather the terms are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.
The shapes and sizes of the various elements in the drawings are not to scale and are merely intended to illustrate the invention.
In particular, embodiments of the present invention provide a nanoimprinted structure, as shown in fig. 2 and 3, that includes: the magnetic connecting rod comprises two fixed magnets 1 extending along a first direction, a magnetic connecting rod 2 and a magnetic connecting rod, wherein a first preset distance exists between the fixed magnets 1, and the magnetic connecting rod is respectively positioned on the fixed magnets 1 and extends along the first direction; further comprising:
a plurality of bearing structures 3, the bearing structures 3 are sleeved on the magnetic connecting rod 2, the bearing structures 3 are configured to rotate around the magnetic connecting rod 2 by a preset radian in a preset direction under control, and slide along the magnetic connecting rod 2 by a second preset distance in the first direction under control;
the annular soft membrane plate 4 is sleeved on the two magnetic connecting rods 2 and covers the area where the bearing structure 3 is located, and the stamping pattern 41 of the annular soft membrane plate 4 is located between the two magnetic connecting rods 2 and located on one side close to the fixed magnet 1;
the extension length of the stamped pattern 41 in the second direction is smaller than the first preset distance, and/or the extension length of the stamped pattern 41 in the first direction is smaller than the length of the magnetic connecting rod 2 in the first direction; the first direction is perpendicular to the second direction.
Specifically, in the nano-imprinting structure provided in the embodiment of the present invention, since the region where the imprinting pattern on the annular soft film plate is located does not cover the entire region where the annular soft film plate is located, the imprinting pattern only occupies a portion of the region, and thus, the imprinting pattern needs to be applied many times to pattern a plurality of regions. According to the invention, the bearing structure is arranged on the magnetic connecting rod, the soft membrane plate is arranged to be the annular soft membrane plate, the annular soft membrane plate is sleeved at the position of the magnetic connecting rod with the bearing structure, the bearing structure is controlled to rotate around the magnetic connecting rod to drive the imprinted pattern of the annular soft membrane plate to move in the second direction, the bearing structure is controlled to slide on the magnetic connecting rod to drive the imprinted pattern of the annular soft membrane plate to move in the first direction, so that the annular soft membrane plate is arranged, the area where the imprinted pattern is located is adjusted, the composition of the substrate can be completed, the problem of composition uniformity caused by splicing of a plurality of soft membrane plates is solved, and the production cost is greatly saved.
The schematic structural diagram of the bearing structure and the magnetic connecting rod is shown in fig. 4, the bearing structure 3 is sleeved on the magnetic connecting rod 2, the bearing structure 3 can slide along the extending direction (i.e. the first direction) of the magnetic connecting rod 2 under the control of the external control structure, and can also rotate clockwise or counterclockwise around the magnetic connecting rod 2, so as to adjust the region where the imprinted pattern on the annular flexible membrane plate is located.
It should be noted that the bearing structure may be a bearing structure in the related art, or may be another structure capable of achieving the above-described function, all of which are within the scope of the present invention, and are not limited herein.
Optionally, in the nanoimprint structure provided by the embodiment of the invention, the bearing structures are uniformly distributed in the area covered by the annular soft membrane plate.
In particular, in the nanoimprint lithography structure provided by the embodiment of the invention, the bearing structures are uniformly distributed in the area covered by the annular soft membrane plate, so that the annular soft membrane plate is ensured to be uniformly stressed when the bearing moves.
Optionally, in the nanoimprint structure provided by the embodiment of the invention, the first preset distance is 600mm to 1800 mm.
Specifically, in the nanoimprint structure provided by the embodiment of the invention, the first preset distance refers to a distance between two fixed magnets, that is, a length of a region of the annular soft membrane plate between the two fixed magnets in the second direction, and the dimension is set according to the size of the patterned substrate. For example, when the size of the substrate to be patterned is 370mm 470mm, the size of the single-layer annular flexible membrane plate may be set to 1200mm 400 mm. Since the adjustment of the region where the imprinted pattern is located in the second direction is determined by the rotation radian of the bearing structure around the magnetic connecting rod, the length of the single-layer annular soft film plate in the second direction needs to be set to be larger than the length of the substrate to be patterned in the second direction, and the specific excess needs to be determined according to the actual use condition, which is not specifically limited herein. In the first direction, the adjustment of the region where the imprinted pattern is located is determined by the sliding distance of the bearing structure on the magnetic connecting rod, so that the width of the annular soft film plate in the first direction can be smaller than the width of the substrate to be patterned in the first direction, and the requirement that the size of the magnetic connecting rod in the first direction is enough to allow the bearing to slide for the required distance is only required to be ensured.
Optionally, in the nano-imprinting structure provided by the embodiment of the present invention, the extension length of the imprinting pattern in the second direction may be 84mm to 252 mm;
the embossed pattern may have an extension length in the first direction of 56mm to 168 mm.
Specifically, in the nano-imprinting structure provided in the embodiment of the present invention, the size of the imprinting pattern is much smaller than the size of the annular flexible membrane plate, for example, 168mm × 112mm, because a partial region of the substrate is patterned, and the specific size of the imprinting pattern is determined according to the size of the region to be patterned on the substrate to be patterned, which is not specifically limited herein.
The following describes a process of patterning a substrate by using the aforementioned nanoimprint structure according to the schematic structural diagrams shown in fig. 5a to 5i, specifically as follows:
as shown in fig. 5a, a substrate to be patterned is provided, wherein the substrate to be patterned comprises: a substrate 21 and a film layer 22 to be patterned on the substrate 21;
as shown in fig. 5b, an imprint paste 23 is coated on the substrate to be patterned; the imprint glue 23 may be coated by spin coating or spot coating, and is selected according to the process requirement, which is not specifically limited herein;
as shown in fig. 5c, adjusting the region where the imprint pattern 41 in the nanoimprint structure is located to the first region a to be patterned of the substrate, patterning the imprint resist 23, and as shown in fig. 5d, forming a pattern of the imprint resist on the imprint resist 23;
as shown in fig. 5e, the film layer 22 to be patterned in the first region a to be patterned is patterned by using the formed pattern of the imprint resist 23, and a corresponding pattern is formed on the film layer 22 to be patterned; the patterning process may include an ashing process, a dry etching process, a wet etching process, etc., and may also include other processes, which are not limited herein.
After the first region to be patterned is patterned, determining the position of a second region to be patterned of the substrate, and patterning the second region to be patterned by using the imprint pattern, specifically:
as shown in fig. 5f, the imprint glue 23 is applied again;
by adjusting the movement of the bearing structure 3, the area of the stamping pattern 41 is moved to the position corresponding to the second area b to be patterned, as shown in fig. 5g, the second area b to be patterned is located at the left side of the first area a to be patterned, and the position change occurs only in the second direction, so that the bearing structure 3 can rotate around the magnetic connecting rod 2 by a preset radian in the clockwise direction, the stamping pattern 41 corresponds to the second area b to be patterned, the stamping glue 23 is patterned, and as shown in fig. 5h, the pattern of the stamping glue 23 is formed in the second area b to be patterned;
as shown in fig. 5h and 5i, the second region b to be patterned of the substrate is patterned by using the pattern of the imprint resist 23 in the second region b to be patterned, and a corresponding pattern is formed in the second region b to be patterned.
The above embodiments are merely exemplary descriptions, and do not limit the position relationship between the first region to be patterned and the second region to be patterned, nor limit the moving direction of the bearing structure, which can be flexibly selected according to the requirements of the actual process, and are not described herein again.
Based on the same inventive concept, the embodiment of the invention also provides a control method of the nano-imprinting structure, which comprises the following steps:
and adjusting the bearing structure to rotate around the magnetic connecting rod in the preset direction by a preset radian according to a preset area to be patterned in the substrate to be patterned, and/or adjusting the bearing structure to slide along the magnetic connecting rod in the first direction by a second preset distance.
Specifically, in the control method of the nanoimprint structure provided by the embodiment of the invention, when the bearing structure drives the annular flexible film plate to move, and when the region where the imprint pattern is located only needs to be adjusted in the first direction, the bearing structure can be only controlled to slide along the magnetic connecting rod in the first direction, and the size of the sliding second preset distance is determined according to the actual region to be patterned; when the area where the imprinted pattern is located only needs to be adjusted in the second direction, the bearing structure can be controlled to rotate around the magnetic connecting rod by a preset radian, and the bearing structure is controlled to rotate clockwise or anticlockwise according to whether the imprinted pattern moves leftwards or rightwards in the second direction; when the area where the imprinted pattern is located needs to be adjusted in both the first direction and the second direction, the bearing structure needs to be controlled to slide along the magnetic connecting rod, and sometimes needs to rotate around the magnetic connecting rod. The specific control on the bearing structure is determined according to the position change of the region to be patterned, and is not specifically limited herein.
Based on the same inventive concept, the embodiment of the invention also provides a nano-imprinting device, which comprises the nano-imprinting structure provided by the embodiment, an imprinting rod positioned on one side of the nano-imprinting structure, which is far away from an imprinting pattern, and a control unit;
the control unit is configured to control the movement of the stamp rod and the bearing structure.
The stamping rod is used for pressing the stamping pattern area to repeatedly stamp the stamping pattern on the stamping glue when the stamping structure patterns the stamping glue, and the movement path of the stamping rod can be determined according to the actual process requirement, and is not particularly limited herein.
Based on the same inventive concept, the embodiment of the invention also provides a substrate patterning method, and the substrate to be patterned is patterned by using the nanoimprint device provided by the embodiment.
Optionally, in the method for patterning a substrate provided in the embodiment of the present invention, patterning a substrate to be patterned by using a nanoimprint device specifically includes:
providing a substrate to be patterned;
coating imprinting glue on the substrate;
adjusting the position of an imprinting pattern in the nano imprinting structure to a first region to be patterned of the substrate;
controlling an imprinting rod to imprint the nano-imprinting structure according to a preset path to form an imprinting glue pattern;
and patterning the first region to be patterned of the substrate according to the pattern of the imprint resist.
Optionally, in the method for patterning a substrate provided in the embodiment of the present invention, patterning a first region to be patterned of the substrate specifically includes:
in a first region to be patterned, carrying out ashing treatment on the substrate with the pattern of the imprinting glue;
and sequentially carrying out dry etching and wet etching on the substrate subjected to the ashing treatment, and forming a pattern of the substrate in the first region to be patterned.
Optionally, in the method for patterning a substrate provided in the embodiment of the present invention, after patterning a first region to be patterned of the substrate is completed, the method further includes:
coating imprinting glue on the substrate;
adjusting the position of the imprinted pattern on the annular soft membrane plate to a second region to be patterned of the substrate;
controlling the imprinting rod to imprint the nano imprinting structure according to a preset path, and forming a pattern of imprinting glue in a second region to be patterned;
and patterning the second region to be patterned of the substrate according to the pattern of the imprinting glue.
Specifically, the patterning method of the substrate provided by the embodiment of the present invention has been described in detail in the embodiment of the nanoimprint structure, and can be implemented by referring to this embodiment, which is not described herein again.
The control method of the nanoimprint structure, the nanoimprint device, and the patterning method of the substrate provided by the embodiment of the invention all have the advantages of the nanoimprint structure provided by the embodiment, and the principle and the specific implementation mode of the nanoimprint structure are the same as those of the nanoimprint structure provided by the embodiment.
The embodiment of the invention provides a nano-imprinting structure, a control method thereof, a nano-imprinting device and a composition method, wherein the nano-imprinting structure comprises the following components: the magnetic connecting rod is positioned on the fixed magnets respectively and extends along the first direction; further comprising: a plurality of bearing structures, the bearing structures being sleeved on the magnetic connecting rod, the bearing structures being configured to rotate around the magnetic connecting rod by a preset radian in a preset direction under control and to slide along the magnetic connecting rod by a second preset distance in the first direction under control; the annular soft membrane plate is sleeved on the two magnetic connecting rods and covers the area where the bearing structure is located, and the imprinted pattern of the annular soft membrane plate is located between the two magnetic connecting rods and located on one side close to the fixed magnet; the extension length of the stamped graph in the second direction is smaller than the first preset distance, and/or the extension length of the stamped graph in the first direction is smaller than the length of the magnetic connecting rod in the first direction; the first direction is perpendicular to the second direction. Through setting up bearing structure on the magnetism connecting rod, and set up the mantle board into cyclic annular mantle board, establish the position that has bearing structure at the magnetism connecting rod with the mantle board cover, rotate around the magnetism connecting rod through control bearing structure, the impression figure that drives cyclic annular mantle board moves in the second direction, slide on the magnetism connecting rod through control bearing structure, the impression figure that drives cyclic annular mantle board moves in the first direction, thereby set up a cyclic annular mantle board, it is regional to adjust the impression figure, can accomplish the composition of picture to the base plate, the problem of the composition homogeneity that many mantle board concatenations caused has not only been solved, also very big saving manufacturing cost.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (10)
1. A nanoimprinted structure, comprising: the magnetic connecting rod is positioned on the fixed magnets respectively and extends along the first direction; further comprising:
a plurality of bearing structures, the bearing structures being sleeved on the magnetic connecting rod, the bearing structures being configured to rotate around the magnetic connecting rod by a preset radian in a preset direction under control and to slide along the magnetic connecting rod by a second preset distance in the first direction under control;
the annular soft membrane plate is sleeved on the two magnetic connecting rods and covers the area where the bearing structure is located, and the imprinted pattern of the annular soft membrane plate is located between the two magnetic connecting rods and located on one side close to the fixed magnet;
the extension length of the stamped graph in the second direction is smaller than the first preset distance, and/or the extension length of the stamped graph in the first direction is smaller than the length of the magnetic connecting rod in the first direction; the first direction is perpendicular to the second direction.
2. The nanoimprinted structure of claim 1, wherein the bearing structures are evenly distributed within the area covered by the annular soft membrane.
3. The nanoimprinted structure of claim 1, wherein the first predetermined distance is between 600mm and 1800 mm.
4. The nanoimprinted structure of claim 1, wherein the imprinted pattern extends for a length in the second direction that is between 84mm and 252 mm;
the extension of the embossed pattern in the first direction is 56mm to 168 mm.
5. A method of controlling a nanoimprinted structure as defined in any one of claims 1-4, comprising:
and adjusting the bearing structure to rotate around the magnetic connecting rod in a preset direction by a preset radian according to a preset region to be patterned in the substrate to be patterned, and/or adjusting the bearing structure to slide along the magnetic connecting rod in the first direction by a second preset distance.
6. A nanoimprinting apparatus comprising the nanoimprinting structure defined in any one of claims 1 through 4, an imprint post located on a side of the nanoimprinting structure facing away from the imprint patterns, and a control unit;
the control unit is configured to control the movement of the stamp rod and the bearing structure.
7. A method of patterning a substrate, characterized in that the nanoimprint device of claim 6 is used to pattern a substrate to be patterned.
8. The method of claim 7, wherein patterning the substrate to be patterned by using the nanoimprint device specifically comprises:
providing a substrate to be patterned;
coating imprinting glue on the substrate;
adjusting the position of an imprinting pattern in the nano imprinting structure to a first region to be patterned of the substrate;
controlling the imprinting rod to imprint the nano imprinting structure according to a preset path to form a pattern of the imprinting glue;
and patterning the first region to be patterned of the substrate according to the pattern of the stamping glue.
9. The method of patterning a substrate according to claim 8, wherein patterning the first region of the substrate to be patterned specifically comprises:
in the first region to be patterned, carrying out ashing treatment on the substrate with the pattern of the stamping glue;
and sequentially carrying out dry etching and wet etching on the substrate subjected to the ashing treatment, and forming a pattern of the substrate in the first region to be patterned.
10. The method of patterning a substrate according to claim 8, wherein after patterning the first region to be patterned of the substrate is completed, the method further comprises:
coating imprinting glue on the substrate;
adjusting the position of the imprinted pattern on the annular soft film plate to a second region to be patterned of the substrate;
controlling the stamping rod to stamp the nano stamping structure according to a preset path, and forming a pattern of the stamping glue in the second region to be patterned;
and patterning the second region to be patterned of the substrate according to the pattern of the stamping glue.
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050075580A (en) * | 2004-01-16 | 2005-07-21 | 엘지전자 주식회사 | Fabricating method of larger area stamp with nano imprint lithography |
| KR20070083425A (en) * | 2006-02-21 | 2007-08-24 | 앱티콘 인코퍼레이티드 | Method for forming structured film as molded by tape die |
| JP2008126543A (en) * | 2006-11-21 | 2008-06-05 | Asahi Kasei Corp | Transfer device and transfer process |
| KR20110089552A (en) * | 2010-02-01 | 2011-08-09 | 주식회사 송산 | Micro-imprinting apparatus and method of patterned sheet |
| CN103926789A (en) * | 2014-02-07 | 2014-07-16 | 南方科技大学 | Nano-imprinting template, system thereof and imprinting method |
| CN104303104A (en) * | 2012-02-22 | 2015-01-21 | 佳能纳米技术公司 | Large area imprint lithography |
| CN109388019A (en) * | 2017-08-11 | 2019-02-26 | 三星电子株式会社 | Film frame, display base plate manufacture system and display substrate manufacturing method |
-
2019
- 2019-12-18 CN CN201911308299.6A patent/CN110989293B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050075580A (en) * | 2004-01-16 | 2005-07-21 | 엘지전자 주식회사 | Fabricating method of larger area stamp with nano imprint lithography |
| KR20070083425A (en) * | 2006-02-21 | 2007-08-24 | 앱티콘 인코퍼레이티드 | Method for forming structured film as molded by tape die |
| JP2008126543A (en) * | 2006-11-21 | 2008-06-05 | Asahi Kasei Corp | Transfer device and transfer process |
| KR20110089552A (en) * | 2010-02-01 | 2011-08-09 | 주식회사 송산 | Micro-imprinting apparatus and method of patterned sheet |
| CN104303104A (en) * | 2012-02-22 | 2015-01-21 | 佳能纳米技术公司 | Large area imprint lithography |
| CN103926789A (en) * | 2014-02-07 | 2014-07-16 | 南方科技大学 | Nano-imprinting template, system thereof and imprinting method |
| CN109388019A (en) * | 2017-08-11 | 2019-02-26 | 三星电子株式会社 | Film frame, display base plate manufacture system and display substrate manufacturing method |
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