CN110978701A - 一种青苔抑制薄膜、多层青苔抑制薄膜及其制备方法 - Google Patents

一种青苔抑制薄膜、多层青苔抑制薄膜及其制备方法 Download PDF

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CN110978701A
CN110978701A CN201911145989.4A CN201911145989A CN110978701A CN 110978701 A CN110978701 A CN 110978701A CN 201911145989 A CN201911145989 A CN 201911145989A CN 110978701 A CN110978701 A CN 110978701A
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Abstract

本发明涉及薄膜及其制备方法，具体为一种青苔抑制薄膜、多层青苔抑制薄膜及其制备方法；包括薄膜本体和光触媒抑制层，光触媒抑制层包括按重量百分比计的抑制剂15％～22％，有机载体55％～65％，光稳定剂10％～15％和抗氧化剂9％～16％；薄膜本体包括薄膜基体60％～75％、光稳定剂12％～20％和抗氧化剂10％～20％；本发明提供的方法，通过光触媒抑制剂能够实现对于薄膜表面青苔的抑制和消除，增加薄膜的透光度，提高作物的生长速度和生长时间。

Description

一种青苔抑制薄膜、多层青苔抑制薄膜及其制备方法
技术领域
本发明涉及薄膜及其制备方法，具体为一种青苔抑制薄膜、多层青苔抑制薄膜及其制备方法。
背景技术
近年来，随着我国农业高新技术的飞速发展和棚室农业的迅速推广，棚室用农膜需求量日益剧增，但一般的单层聚乙烯膜不仅透光率低、保温效果不理想，还容易滋生青苔等微生物，无法杀灭棚膜内的病毒、细菌。为了培育出更加优良的果蔬、花卉，市场上亟需一种保温效果好、生物防治和保温降温等作用为一体的薄膜。
发明内容
为了解决以上的技术问题，本发明提供一种转光膜；
本发明是这样实现的：
一种青苔抑制薄膜，包括薄膜本体和光触媒抑制层，光触媒抑制层包括按重量百分比计的抑制剂15％～22％，有机载体55％～65％，光稳定剂10％～15％和抗氧化剂9％～16％；薄膜本体包括薄膜基体60％～75％、光稳定剂12％～20％和抗氧化剂10％～20％。
进一步的，有机载体包括低密度聚乙烯、线性聚乙烯、高密度聚乙烯、聚丙烯、乙烯-醋酸乙烯共聚物中的一种或几种，薄膜基体包括低密度聚乙烯、线性聚乙烯、中密度聚乙烯、高密度聚乙烯、聚丙烯、乙烯-醋酸乙烯共聚物、聚氯乙烯中的一种或几种与茂金属聚乙烯的混合物
本发明还提供了一种多层青苔抑制薄膜，以下是技术方案：
包括上述薄膜本体和至少一层光触媒抑制层，薄膜本体与光触媒抑制层一面贴合；还包括与薄膜本体另一面贴合的薄膜内层，薄膜内层包括成型薄膜和涂覆层，成型薄膜按重量百分数计的有机载体、光稳定剂12％～20％和抗氧化剂10％～20％。
进一步的，涂覆层包括水性流滴消雾涂覆液。
进一步的，抑制剂包括ZnTiO3、Zn2TiO4及Zn2Ti3O8中之至少一种。
进一步的，光稳定剂包括水杨酸苯酯、水杨酸对叔丁基苯酯、间苯二酚但苯甲酸酯、2，4-二羟基二苯甲酮、2-羟基-4-甲氧基二苯甲酮、双酚A双水杨酸酯、2-羟基-4-甲氧基-二苯甲酮-5-磺酸中的一种或几种。
进一步的，抗氧化剂包括抗氧剂168、抗氧剂1010、抗氧剂1076、抗氧剂2246、抗氧剂300、抗氧剂330、抗氧剂3114、抗氧剂245、2,6-二叔丁基对甲酚、2,4,6-三叔丁基苯酚中的一种或几种。
本发明还提供了一种制备方法，用于制备青苔抑制薄膜，以下是技术方案：
一种多层青苔抑制薄膜制备方法将计量后的上述薄膜本体、光触媒抑制层和成型薄膜进行混合，将混合后的物料进入至多层共挤出机熔融挤出成型，后使用水性流滴消雾涂覆液对内层进行涂覆成型。
进一步的，对挤出成型的薄膜进行吹胀作业形成筒状薄膜或膜泡，对筒状薄膜或膜泡进行冷却后将空气排净，并对薄膜表面进行电晕处理。
进一步的，熔融温度为180～190℃，薄膜吹胀比为1：3～5，所述薄膜牵引比为1：7～15
上述方案的有益效果：
本发明提供的方法，通过光触媒抑制剂能够实现对于薄膜表面青苔的抑制和消除，增加薄膜的透光度，提高作物的生长速度和生长时间。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例中所需要使用的附图作简单地介绍，应当理解，以下附图仅示出了本发明的某些实施例，因此不应被看作是对范围的限定，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他相关的附图。
图1为本发明薄膜结构示意图；
100、外层；200、次外层；300、中层；400、次内层；500、内层。
具体实施方式
下面将结合附图对本发明的技术方案进行清楚、完整地描述，显然，所描述的实施例是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
在本发明的描述中，需要说明的是，术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。此外，术语“第一”、“第二”、“第三”仅用于描述目的，而不能理解为指示或暗示相对重要性。
一种青苔抑制薄膜，包括薄膜本体和光触媒抑制层，光触媒抑制层包括按重量百分比计的抑制剂15％～22％，有机载体55％～65％，光稳定剂10％～15％和抗氧化剂9％～16％；薄膜本体包括薄膜基体60％～75％、光稳定剂12％～20％和抗氧化剂10％～20％。
一种多层青苔抑制薄膜，包括上述薄膜本体和至少一层光触媒抑制层，薄膜本体与光触媒抑制层一面贴合；还包括与薄膜本体另一面贴合的薄膜内层，薄膜内层包括成型薄膜和涂覆层，成型薄膜按重量百分数计的有机载体、光稳定剂12％～20％和抗氧化剂10％～20％。
一种多层青苔抑制薄膜制备方法，将计量后的上述薄膜本体、光触媒抑制层和成型薄膜进行混合，将混合后的物料进入至多层共挤出机熔融挤出成型，后使用水性流滴消雾涂覆液对内层进行涂覆成型。
实施例一
参阅图1，图1为本发明提供的一种青苔抑制薄膜，如图1所示，
薄膜为五层结构，包括光触媒抑制层即外层以及薄膜本体即内层，在光触媒抑制层与薄膜本体之间设置有次外层、中层以及次内层。
在本实施例中，薄膜本体包括按重量百分比计的薄膜基体75％，光稳定剂12％和抗氧化剂13％，其中薄膜基体为低密度聚乙烯，光稳定剂为水杨酸苯酯，抗氧化剂为抗氧剂168。
在本实施例中，光触媒抑制层主要由按重量百分比计有机载体60％，抑制剂20％，光稳定剂10％，抗氧化剂10％组成；其中有机载体为低密度聚乙烯，抑制剂为ZnTiO3，光稳定剂为水杨酸苯酯，抗氧化剂为抗氧剂168。
按上述配方，经过计量后分别混合均匀，分别加入料斗，进入挤出机，于180℃熔融、挤出、造粒制成功能性母粒；经多层共挤出机于180℃熔融挤出，然后进入环形共挤模头形成五层薄膜挤出，从模头中心的冷却风管吹入压缩空气，将薄膜吹胀成筒状薄膜或膜泡，薄膜的吹胀比1：3。经内部和外部空气冷却，薄膜的冷凝线高度为200mm，然后进入人字夹板将棚膜泡内的空气排净；薄膜的牵引比1：7；然后进行薄膜表面电晕处理使薄膜的润湿张力提高到大于38达因/平方厘米，再用涂覆液进行外层涂覆、加热烘干固化、折叠。
实施例二
薄膜为五层结构，包括光触媒抑制层即外层以及薄膜本体即内层，在光触媒抑制层与薄膜本体之间设置有次外层、中层以及次内层。
在本实施例中，薄膜本体包括按重量百分比计的薄膜基体65％，光稳定剂15％和抗氧化剂20％，其中薄膜基体为线性聚乙烯，光稳定剂为水杨酸对叔丁基苯酯，抗氧化剂为抗氧剂330。
在本实施例中，光触媒抑制层，主要由按重量百分比计有机载体65％，抑制剂18％，光稳定剂12％，抗氧化剂15％组成；其中有机载体为线性聚乙烯，抑制剂为Zn2TiO4，光稳定剂为2，4-二羟基二苯甲酮，抗氧化剂为抗氧剂330。
按上述配方，经过计量后分别混合均匀，分别加入料斗，进入挤出机，于185℃熔融、挤出、造粒制成功能性母粒；经多层共挤出机于185℃熔融挤出，然后进入环形共挤模头形成五层薄膜挤出，从模头中心的冷却风管吹入压缩空气，将薄膜吹胀成筒状薄膜或膜泡，薄膜的吹胀比1：5。经内部和外部空气冷却，薄膜的冷凝线高度为250mm，然后进入人字夹板将棚膜泡内的空气排净；薄膜的牵引比1：9；然后进行薄膜表面电晕处理使薄膜的润湿张力提高到大于38达因/平方厘米，再用涂覆液进行外层涂覆、加热烘干固化、折叠。
实施例三
薄膜为五层结构，包括光触媒抑制层即外层以及薄膜本体即内层，在光触媒抑制层与薄膜本体之间设置有次外层、中层以及次内层。
在本实施例中，薄膜本体包括按重量百分比计的薄膜基体60％，光稳定剂20％和抗氧化剂20％，其中薄膜基体为高密度聚乙烯，光稳定剂为间苯二酚但苯甲酸酯，抗氧化剂为抗氧剂3114。
在本实施例中，光触媒抑制层主要由按重量百分比计有机载体55％，抑制剂22％，光稳定剂14％，抗氧化剂9％组成；其中有机载体为高密度聚乙烯，抑制剂为Zn2Ti3O8，光稳定剂为间苯二酚但苯甲酸酯，抗氧化剂为抗氧剂3114。
按上述配方，经过计量后分别混合均匀，分别加入料斗，进入挤出机，于190℃熔融、挤出、造粒制成功能性母粒；经多层共挤出机于190℃熔融挤出，然后进入环形共挤模头形成五层薄膜挤出，从模头中心的冷却风管吹入压缩空气，将薄膜吹胀成筒状薄膜或膜泡，薄膜的吹胀比1：5。经内部和外部空气冷却，薄膜的冷凝线高度为250mm，然后进入人字夹板将棚膜泡内的空气排净；薄膜的牵引比1：15；然后进行薄膜表面电晕处理使薄膜的润湿张力提高到大于38达因/平方厘米，再用涂覆液进行外层涂覆、加热烘干固化、折叠。
以上所述仅为本发明的优选实施例而已，并不用于限制本发明，对于本领域的技术人员来说，本发明可以有各种更改和变化。凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (6)

1.一种青苔抑制薄膜，其特征在于，包括薄膜本体和光触媒抑制层，所述光触媒抑制层包括按重量百分比计的抑制剂15％～22％，有机载体55％～65％，光稳定剂10％～15％和抗氧化剂9％～16％；所述薄膜本体包括薄膜基体60％～75％、光稳定剂12％～20％和抗氧化剂10％～20％；所述有机载体包括低密度聚乙烯、线性聚乙烯、高密度聚乙烯、聚丙烯、乙烯-醋酸乙烯共聚物中的一种或几种，所述薄膜基体包括低密度聚乙烯、线性聚乙烯、中密度聚乙烯、高密度聚乙烯、聚丙烯、乙烯-醋酸乙烯共聚物、聚氯乙烯中的一种或几种与茂金属聚乙烯的混合物；
所述光稳定剂包括水杨酸苯酯、水杨酸对叔丁基苯酯、间苯二酚但苯甲酸酯、2，4-二羟基二苯甲酮、2-羟基-4-甲氧基二苯甲酮、双酚A双水杨酸酯、2-羟基-4-甲氧基-二苯甲酮-5-磺酸中的一种或几种；
所述抗氧化剂包括抗氧剂168、抗氧剂1010、抗氧剂1076、抗氧剂2246、抗氧剂300中的一种或几种
所述抑制剂包括ZnTiO3、Zn2TiO4及Zn2Ti3O8中之至少一种。
2.根据权利要求1所述的多层青苔抑制薄膜，其特征在于，所述薄膜本体和至少一层光触媒抑制层，所述薄膜本体与所述光触媒抑制层一面贴合；还包括与薄膜本体另一面贴合的薄膜内层，所述薄膜内层包括成型薄膜和涂覆层，所述成型薄膜按重量百分数计的有机载体、光稳定剂12％～20％和抗氧化剂10％～20％。
3.根据权利要求2所所述的多层青苔抑制薄膜，其特征在于，所述涂覆层包括水性流滴消雾涂覆液。
4.一种多层青苔抑制薄膜制备方法，其特征在于，将计量后的权利要求1所述的薄膜本体、光触媒抑制层和成型薄膜进行混合，将混合后的物料进入至多层共挤出机熔融挤出成型，后使用水性流滴消雾涂覆液对内层进行涂覆成型。
5.根据权利要求4所述的多层青苔抑制薄膜制备方法，其特征在于，对所述挤出成型的薄膜进行吹胀作业形成筒状薄膜或膜泡，对所述筒状薄膜或膜泡进行冷却后将空气排净，并对薄膜表面进行电晕处理。
6.根据权利要求5所述的多层青苔抑制薄膜制备方法，其特征在于，所述熔融温度为180～190℃，所述薄膜吹胀比为1：3～5，所述薄膜牵引比为1：7～15。
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