CN110783387A - Display substrate, display device and manufacturing method of display substrate - Google Patents
Display substrate, display device and manufacturing method of display substrate Download PDFInfo
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- CN110783387A CN110783387A CN201911040096.3A CN201911040096A CN110783387A CN 110783387 A CN110783387 A CN 110783387A CN 201911040096 A CN201911040096 A CN 201911040096A CN 110783387 A CN110783387 A CN 110783387A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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Abstract
The invention provides a display substrate, a display device and a manufacturing method of the display substrate; the display substrate comprises a substrate, an electrode layer and a pixel limiting layer, wherein the electrode layer is located between the substrate and the pixel limiting layer, the pixel limiting layer comprises a light transmitting area, a pixel limiting layer pattern of the light transmitting area is arranged around an electrode of the electrode layer, and an area except the pixel limiting layer pattern in the light transmitting area is a hollow area. The technical scheme provided by the invention solves the problem of low light transmittance of the conventional display substrate.
Description
Technical Field
The invention relates to the technical field of communication, in particular to a display substrate, a display device and a manufacturing method of the display substrate.
Background
With the rapid development of technology, the under-screen photosensitive module has become one of the main development trends of the current terminal devices. To ensure the light sensing effect of the light sensing module, the light sensing module under the screen needs the light sensing sensor to receive enough light flux within a limited time. However, the conventional design of the display substrate has a problem of low light transmittance.
Disclosure of Invention
The embodiment of the invention provides a display substrate, a display device and a manufacturing method of the display substrate, and aims to solve the problem that the light transmittance of the existing display substrate is low.
In order to solve the problems, the invention is realized as follows:
in a first aspect, an embodiment of the present invention provides a display substrate, including a substrate, an electrode layer, and a pixel defining layer, where the electrode layer is located between the substrate and the pixel defining layer, the pixel defining layer includes a light transmissive region, a pixel defining layer pattern of the light transmissive region is disposed around an electrode of the electrode layer, and a region of the light transmissive region except for the pixel defining layer pattern is a hollow region.
In a second aspect, embodiments of the present invention further provide a display device, including the display substrate as described in the first aspect.
In a third aspect, an embodiment of the present invention further provides a method for manufacturing a display substrate, where the method is applied to the display substrate in the first aspect, and the method includes the following steps:
providing a substrate base plate;
forming an electrode layer on the substrate;
forming a pixel limiting layer on one side of the electrode layer, which is opposite to the substrate, and forming a light transmitting area in the pixel limiting layer;
the pixel limiting layer pattern of the light transmitting area is arranged around the electrode of the electrode layer, and the area, except the pixel limiting layer pattern, of the light transmitting area is a hollow-out area.
In the display substrate provided by the embodiment of the invention, the pixel limiting layer comprises the light-transmitting area, the light-transmitting area comprises the design of the hollow-out area, and then the light-transmitting area only comprises the pattern of the pixel limiting layer, and when light enters the light-transmitting area, the hollow-out area does not influence the light to pass through, and the light flux cannot be attenuated. Compared with the existing pixel limiting layer without the hollow area design, the pixel limiting layer provided by the embodiment of the invention has better light transmittance, and the light transmittance of the pixel limiting layer can be effectively increased by the hollow area design, so that the light transmittance of the display substrate is increased.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the description of the embodiments of the present invention will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
Fig. 1 is a structural diagram of a display substrate according to an embodiment of the present invention;
fig. 2 is a structural diagram of a light emitting structure in a display substrate according to an embodiment of the present invention;
FIG. 3 is a diagram illustrating a structure of a pixel defining layer in a display substrate according to an embodiment of the present invention;
fig. 4 is a flowchart of a method for manufacturing a display substrate according to an embodiment of the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
An embodiment of the present invention provides a display substrate, referring to fig. 1 to 3, the display substrate includes a substrate 101, an electrode layer 114, and a pixel defining layer 115, the electrode layer 114 is located between the substrate 101 and the pixel defining layer 115, the pixel defining layer 115 includes a light-transmitting region, a pixel defining layer pattern 1151 of the light-transmitting region is disposed around an electrode of the electrode layer 114, and a region of the light-transmitting region except the pixel defining layer pattern 1151 is a hollow-out region 1150.
It should be noted that the light-transmitting region may be a partial region in the pixel defining layer 115, or the entire pixel defining layer 115 may be designed as the light-transmitting region. The light-transmitting area includes a hollow-out area 1150, and the design of the hollow-out area 1150 may refer to removing a portion of the light-transmitting area except for the pixel defining layer pattern 1151, for example, the portion may be removed by etching, and then the light-transmitting area only includes the pixel defining layer pattern 1151, when light is incident to the light-transmitting area, the hollow-out area 1150 may not affect the transmission of the light, and the light may almost pass through the hollow-out area 1150 by 100%. Thus, compared with the conventional pixel defining layer 115 without the hollow area 1150, the light transmittance of the pixel defining layer 115 provided by the embodiment of the invention is better, and the light transmittance of the pixel defining layer 115 can be effectively increased by the design of the hollow area 1150, so that the light transmittance of the display substrate is also increased.
Such design also more is favorable to the display substrates to be applied to and is provided with the display device of sensitization module under the screen, like mobile terminal etc.. The photosensitive module under the screen may be disposed opposite to the light-transmitting region of the pixel defining layer 115 in the display substrate, that is, the orthographic projection of the photosensitive module relative to the display substrate is located in the light-transmitting region. It can be understood that, the hollow-out area 1150 is designed in the light-transmitting area, and the light flux of the light cannot be attenuated by the hollow-out area 1150, so that the light flux requirement of the photosensitive module is met, and the photosensitive function of the photosensitive module is ensured. For example, the sensitization module can be fingerprint identification module or camera module under the screen, and the design in fretwork area 1150 has increased the luminousness of display substrates, just also more is favorable to the unblock of optics fingerprint or the formation of image of camera under the screen.
In the embodiment of the present invention, the electrode layer 114 is an anode layer, and the pixel defining layer pattern 1151 of the light-transmitting region is disposed around the electrode of the anode layer. As shown in fig. 3, assuming that the electrode pattern of the anode layer is square, the pixel defining layer pattern 1151 of the light transmissive region surrounds the square electrode pattern to define pixels disposed on the anode layer electrode, and the region of the light transmissive region except the pixel defining layer pattern 1151 may be etched to form a hollow region 1150, so as to increase the light transmittance of the light transmissive region.
In addition, the display substrate further includes a supporting pillar 116, the supporting pillar 116 is disposed on a side of the pixel defining layer 115 opposite to the substrate 101, the pixel defining layer pattern 1151 of the light transmitting region includes a first pattern and a second pattern, the first pattern is disposed around the electrode of the electrode layer 114, and an orthographic projection of the supporting pillar 116 in the light transmitting region is located in the second pattern. The second pattern is used to provide a supporting effect for the supporting pillar 116, and then the area in the transparent area except the first pattern and the second pattern is the hollow area 1150, so as to ensure that the transparent area has a larger light transmittance.
Alternatively, the first graphic and the second graphic may be adjacently disposed. Referring to fig. 3 in particular, the first pattern 11511 disposed around the electrode of the electrode layer 114 is disposed adjacent to the second pattern 11512 for providing support for the support posts 116, for example, an orthographic projection of the first pattern 11511 on the substrate base 101 may be in contact with or spaced from an orthographic projection of the second pattern 11512 on the substrate base 101.
Or in another implementation, the second pattern may be located in the first pattern, that is, the second pattern is a part of the first pattern, an orthographic projection of the second pattern 11512 on the substrate base plate 101 is overlapped with an orthographic projection of the first pattern 11511 on the substrate base plate 101, and then an orthographic projection of the supporting pillar 116 in the light-transmitting area is located in the first pattern arranged around the electrode of the electrode layer 114. Thus, the supporting posts 116 can be disposed on the pixel defining layer pattern 1151 disposed around the electrode of the electrode layer 114, and the pixel defining layer pattern 1151 of the light-transmitting region is more reasonably utilized, so that the hollow region 1150 can have a larger range, the light transmittance of the light-transmitting region is further increased, and the light transmittance of the display substrate is also increased.
It should be noted that, in some embodiments, the light-transmitting region designed with the hollow region 1150 may be a partial region in the pixel defining layer 115, the light-transmitting region may be a first light-transmitting region, and a region other than the first light-transmitting region in the pixel defining layer 115 is a second light-transmitting region, so that the second light-transmitting region does not include the hollow region 1150. Alternatively, the supporting pillars 116 may be disposed on a side of the second transparent region opposite to the substrate 101, and then an orthographic projection of the supporting pillars 116 with respect to the pixel defining layer 115 is located in the second transparent region, and the orthographic projection of the supporting pillars 116 does not exist in the first transparent region designed with the hollow-out region 1150. Thus, the pixel defining layer pattern 1151 of the first light-transmitting region only needs to surround the electrode of the electrode layer 114, so as to ensure that the hollow-out region 1150 has a larger range, and further ensure that the light-transmitting region has a larger light transmittance.
Optionally, the display substrate provided in the embodiment of the present invention may be an AMOLED (Active-matrix organic light Emitting Diode) display substrate, a PMOLE (passive organic light Emitting Diode), or a QLED (Quantum Dot Emitting Diode). The display substrate mainly comprises a substrate, a thin film transistor and a light-emitting structure; the thin film transistor mainly includes a gate electrode layer (GE), a source/drain electrode metal layer (SD), and the like.
In an embodiment of the invention, referring to fig. 1 specifically, the substrate 101 may refer to a first substrate, and the display substrate may further include a first buffer layer (PB1)102, a second substrate (PI2)103, a second buffer layer (PB2)104, a protection layer 105, a first gate insulating layer (GI1)106, an active layer (Poly)107, a first gate layer (GE1)109, a second gate insulating layer (GI2)108, a second gate layer (GE2)111, an intermediate Insulating Layer (ILD)110, a source/drain metal layer (SD)112, an organic Planarization Layer (PLN)113, an Anode layer (Anode), a Pixel Definition Layer (PDL)115, and a support layer (PS)116, which are sequentially disposed. Wherein the electrode layer 114 is an anode layer.
It can be understood that the light emitting structure in the display substrate mainly includes a first electrode layer, a second electrode layer, and a light emitting unit between the first electrode layer and the second electrode layer. On the basis of the display substrate provided in fig. 1, a cathode layer and a light emitting unit disposed between the anode layer and the cathode layer may be further included. As shown in fig. 2, when the display substrate is an AMOLED, a Hole Injection Layer (HIL)121, a Hole Transport Layer (HTL)122, an emission layer (EML)123, an Electron Transport Layer (ETL)124, and an Electron Injection Layer (EIL)125 may be sequentially disposed between the Anode layer (Anode) and the Cathode layer (Cathode) 117. It should be noted that, the specific positional relationship of the above structural layers in the display substrate may refer to the prior art, and is not described herein again.
An embodiment of the present invention further provides a display device, including the display substrate described in the above embodiment. The display device comprises all technical characteristics of the display substrate, can achieve the same technical effect, and is not repeated herein for avoiding repetition.
The display device may be a cell phone, a tablet computer, an e-book reader, an MP3 player, an MP4 player, a digital camera, a laptop portable computer, a car computer, a desktop computer, a smart tv, a wearable device, etc.
In the embodiment of the invention, the display device further comprises a photosensitive module, the photosensitive module is positioned on one side of the substrate in the display substrate, which is back to the pixel limiting layer, and the orthographic projection of the photosensitive module relative to the display substrate is positioned in the light-transmitting area. That is to say, the sensitization module is sensitization module under the screen, and light need pass display substrate and just can be received by sensitization module. As above, the light transmission area includes the design in fretwork district, and then the luminousness in light transmission area is higher, and the sensitization mould just sets up to the light transmission area on pixel limited layer, has just also ensured that the sensitization module can receive great luminous flux to ensure the sensitization function of sensitization module.
Optionally, the sensitization module can be fingerprint identification module or camera module, and the design of fretwork district just also more is favorable to the unblock of optics fingerprint or the formation of image of camera under the screen in the printing opacity district to promote the smooth and easy nature that sensitization module function realized.
The embodiment of the invention also provides a manufacturing method of the display substrate, which is applied to the display substrate. Referring to fig. 4, the method for manufacturing the display substrate includes the following steps:
Alternatively, the substrate may be a flexible substrate, a transparent substrate, or the like.
In the embodiment of the present invention, the buffer layer may include a first substrate board (PI1) and a second substrate board (PI2), a first buffer layer (PB1) may be further formed between the first substrate board and the second substrate board, and a second buffer layer (PB2) may be formed on a side of the second substrate board facing away from the first buffer layer. The substrate and the buffer layer used in the present embodiment may refer to related technologies, and are not limited herein.
In this embodiment, the electrode layer is an anode layer.
Between the anode layer and the substrate, a passivation layer, a first gate insulating layer (GI1), a first gate layer (GE1), a second gate insulating layer (GI2), a second gate layer (GE2), an interlayer Insulating Layer (ILD), a source/drain metal layer (SD), an organic Planarization Layer (PLN), and the like may be further formed. In this embodiment, the preparation of the electrode layer, the positional relationship between the structural layers, and the preparation method may refer to related technologies, which are not further limited herein.
The pixel limiting layer pattern of the light transmitting area is arranged around the electrode of the electrode layer, and the area of the light transmitting area except the pixel limiting layer pattern is a hollow-out area.
The light-transmitting region may be a partial region of the pixel defining layer, or the entire pixel defining layer may be the light-transmitting region. The light-transmitting area comprises a hollowed-out area, the hollowed-out area can be formed by etching an area except a pixel limiting layer graph in the light-transmitting area so as to be removed, the hollowed-out area cannot cause any influence on incidence of light, after the light passes through the hollowed-out area, the luminous flux cannot be attenuated, the light transmittance of the light-transmitting area is increased, and the light transmittance of the display substrate is increased.
In this embodiment, the pixel defining layer pattern of the light-transmitting region is disposed around the electrode of the electrode layer. In one implementation, the whole layer of the pixel defining layer is a light-transmitting area; after the electrode layer is formed, the electrode position of the electrode layer is determined, a pixel defining layer pattern surrounding the electrode may be formed on the periphery of each electrode of the electrode layer, and a pixel defining layer is formed, wherein a region outside the pixel defining layer pattern, that is, a hollow region, is not formed in the pixel defining layer.
For a specific structure of the display substrate prepared in this embodiment, reference may be made to the description in the foregoing display substrate embodiment, and details are not repeated here.
Optionally, after the step 403, the method may further include:
forming a supporting column on one side of the pixel defining layer, which faces away from the substrate base plate; wherein the orthographic projection of the support column in the light-transmitting area is positioned in the pixel definition layer pattern.
Like this, also make the support column that is located printing opacity district back to substrate base one side can be set up on the pixel that encircles the electrode layer's electrode setting limits layer figure, more rationally utilized the pixel of printing opacity district to limit layer figure, also just also make the fretwork district can have bigger scope, further increased the luminousness in printing opacity district, just also increased the luminousness of display substrate.
Alternatively, in some embodiments, the light-transmitting region designed with the hollow-out region may be a partial region in the pixel defining layer, the light-transmitting region may be a first light-transmitting region, and a region of the pixel defining layer other than the first light-transmitting region is a second light-transmitting region, so that the second light-transmitting region does not include the hollow-out region. Alternatively, the supporting pillars may be disposed on a side of the second light-transmitting region opposite to the substrate, and then an orthographic projection of the supporting pillars with respect to the pixel defining layer is located in the second light-transmitting region, and an orthographic projection of the supporting pillars does not exist in the first light-transmitting region designed with the hollow-out region. Like this, also make the pixel of first printing opacity district inject layer figure only need encircle the electrode setting of electrode layer can to ensure that the fretwork district has great scope, and then just also ensured that the printing opacity district can have great luminousness.
In this embodiment, the electrode layer is an anode layer, and a cathode layer may be further formed on a side of the pixel defining layer opposite to the substrate; a Hole Injection Layer (HIL), a Hole Transport Layer (HTL), an emission layer (EML), an Electron Transport Layer (ETL), an Electron Injection Layer (EIL), etc. formed in sequence are further included between the anode layer and the cathode layer, and a specific preparation method may refer to the related art and is not further limited herein.
The display substrate of this embodiment preparation, through the printing opacity district that the layer formed including the fretwork district at pixel limited layer for the fretwork district can not lead to the fact the hindrance to light, just can not lead to the fact the decay to luminous flux yet, and then has increased the luminousness in printing opacity district, more helps the display substrate to use in the display device who is provided with sensitization module under the screen, in order to satisfy the demand that sensitization module was to luminous flux under the screen.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (9)
1. The display substrate is characterized by comprising a substrate base plate, an electrode layer and a pixel limiting layer, wherein the electrode layer is located between the substrate base plate and the pixel limiting layer, the pixel limiting layer comprises a light transmitting area, a pixel limiting layer pattern of the light transmitting area is arranged around an electrode of the electrode layer, and an area except the pixel limiting layer pattern in the light transmitting area is a hollow area.
2. The display substrate according to claim 1, further comprising a supporting pillar disposed on a side of the pixel defining layer opposite to the substrate, wherein the pixel defining layer pattern of the light transmissive region includes a first pattern and a second pattern, the first pattern is disposed around the electrode of the electrode layer, and an orthogonal projection of the supporting pillar in the light transmissive region is located in the second pattern.
3. The display substrate of claim 2, wherein the second graphic is located within the first graphic.
4. The display substrate of claim 1, wherein the electrode layer is an anode layer.
5. A display device comprising the display substrate according to any one of claims 1 to 4.
6. The display device according to claim 5, further comprising a photosensitive module located on a side of the substrate facing away from the pixel defining layer, wherein an orthographic projection of the photosensitive module on the display substrate is located in the light-transmissive region.
7. The display device according to claim 6, wherein the photosensitive module is a camera module or a fingerprint recognition module.
8. A method for manufacturing a display substrate, applied to the display substrate according to any one of claims 1 to 4, the method comprising the steps of:
providing a substrate base plate;
forming an electrode layer on the substrate;
forming a pixel limiting layer on one side of the electrode layer, which is opposite to the substrate, and forming a light transmitting area in the pixel limiting layer;
the pixel limiting layer pattern of the light transmitting area is arranged around the electrode of the electrode layer, and the area of the light transmitting area except the pixel limiting layer pattern is a hollow-out area.
9. The method of claim 8, further comprising:
forming a supporting column on one side of the pixel defining layer, which faces away from the substrate base plate; wherein the orthographic projection of the support column in the light-transmitting area is positioned in the pixel definition layer pattern.
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| CN201911040096.3A CN110783387A (en) | 2019-10-29 | 2019-10-29 | Display substrate, display device and manufacturing method of display substrate |
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| CN201911040096.3A CN110783387A (en) | 2019-10-29 | 2019-10-29 | Display substrate, display device and manufacturing method of display substrate |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111834417A (en) * | 2020-05-12 | 2020-10-27 | 昆山国显光电有限公司 | Display panel and display device |
| WO2022052204A1 (en) * | 2020-09-10 | 2022-03-17 | 京东方科技集团股份有限公司 | Display substrate and manufacturing method therefor, and display panel |
| WO2023010902A1 (en) * | 2021-08-02 | 2023-02-09 | 合肥维信诺科技有限公司 | Display panel and display device |
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| KR20180005588A (en) * | 2016-07-06 | 2018-01-16 | 삼성전자주식회사 | Fingerprint Sensor, Fingerprint Sensor Package and Fingerprint Sensing System using light sources of display panel |
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| WO2023010902A1 (en) * | 2021-08-02 | 2023-02-09 | 合肥维信诺科技有限公司 | Display panel and display device |
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Application publication date: 20200211 |