CN110438465B - Metal matrix surface abrasion-resistant protective coating and preparation method and application thereof - Google Patents

Metal matrix surface abrasion-resistant protective coating and preparation method and application thereof Download PDF

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CN110438465B
CN110438465B CN201910747312.1A CN201910747312A CN110438465B CN 110438465 B CN110438465 B CN 110438465B CN 201910747312 A CN201910747312 A CN 201910747312A CN 110438465 B CN110438465 B CN 110438465B
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layer
dlc
protective coating
abrasion
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CN110438465A (en
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汪爱英
刘林林
孙丽丽
郭鹏
李�昊
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Ningbo Institute of Material Technology and Engineering of CAS
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0084—Producing gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

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Abstract

The invention discloses an anti-abrasion protective coating on the surface of a metal matrix and a preparation method and application thereof. The coating comprises a Ti transition layer and TiC which are sequentially formed on the surface of a metal matrix by adopting a linear ion source composite direct current magnetron sputtering technologyxGradient layer, first DLC layer, TiCx/Ti/TiCxAlternating layers of/DLC and top layer, said TiCx/Ti/TiCxLaminated with/DLC alternating layers of TiCx/Ti/TiCxSandwich layers and second DLC layers alternately stacked, the TiCx/Ti/TiCxThe sandwich layer comprises two TiCsxLayer and set in the two TiCsxA Ti layer between the layers, said top layer comprising a third DLC layer, said TiCxThe value range of the medium X is 0.8-1.3. The anti-abrasion protective coating provided by the invention adopts a structure of 'alternating multilayer + interface gradient + top layer thickening', so that the coating has good comprehensive mechanical properties and excellent corrosion resistance and abrasion resistance. Meanwhile, the anti-abrasion protective coating can still keep good antifriction and lubricating effects for a certain time after being worn out, and shows high abrasion failure tolerance.

Description

Metal matrix surface abrasion-resistant protective coating and preparation method and application thereof
Technical Field
The invention belongs to the technical field of surface treatment of mechanical parts, particularly relates to an anti-abrasion protective coating on the surface of a metal matrix, and a preparation method and application thereof, and particularly relates to an anti-abrasion protective coating with long service life and high damage tolerance on the surfaces of a sea water pump impeller and a friction pair part, and a preparation method and application thereof.
Background
China increasingly strengthens exploration, development and utilization of ocean resources. As a new technology that has been developed to adapt to ocean development, a seawater hydraulic transmission technology that uses seawater as a working fluid has been gradually applied to many ocean engineering fields such as marine rescue and salvage, ocean resource investigation, ocean oil and gas exploitation, etc. due to its many advantages of high safety, small compression coefficient, low use and maintenance cost, greenness, no pollution, etc.
As a core power element of a seawater hydraulic transmission system, the development and the development of a high-performance seawater pump are key points for promoting the development of a seawater hydraulic transmission technology. Meanwhile, the seawater pump runs in a seawater environment with poor lubricity due to various moving friction pairs such as a plunger-cylinder hole, a sliding shoe-swash plate, a valve plate-floating plate and the like, and the friction pairs are easy to lose effectiveness due to corrosion, abrasion and the like under the high-speed and heavy-load running conditions, so that the working efficiency and the service life of the seawater pump are seriously influenced. Through analyzing the failure mode and the failure mechanism of the sea water pump, the corrosion of the material and the friction and wear characteristics of the material at the key friction pair are found to be key factors influencing the reliability of the sea water pump.
In order to solve the problems of corrosion and wear failure of related parts of the seawater pump, two main methods are to select new wear-resistant and corrosion-resistant materials and carry out surface protection treatment on the existing materials. In the aspect of selecting a new wear-resistant and corrosion-resistant material, patent CN101519749A discloses a cast iron material with 18-20 wt% of nickel, 8-10 wt% of copper, 5-6 wt% of chromium, 4-5 wt% of titanium and the balance of iron, and after a seawater pump impeller cast by the cast material is placed in a seawater infiltration well containing fine sand particles to continuously work for 2000 hours, the surface corrosion wear amount of the seawater pump impeller is less than 1/10 of the corrosion wear amount of the existing cast iron impeller, and the corrosion resistance and wear resistance are obviously enhanced. In addition, patent CN101476078A proposes a manufacturing method of a large seawater pump shaft with good thermoplasticity and high finished product recovery rate, and the selected 00Cr25Ni7Mo3WCuN super duplex stainless steel has excellent seawater and halogen medium corrosion resistance.
The surface protection treatment can impart excellent surface characteristics to parts without changing the parts and the forming processability, and is an effective technical means for providing the parts with service performance and service life. Patent CN104847685A proposes to solve the corrosion problem of seawater pump, which is to coat a chromium oxide ceramic material layer on the iron-based alloy impeller, and to coat silicon carbide and silicon oxide ceramic material layers on the inner and outer surfaces of the aluminum alloy pump body. In addition, patent CN108251833A provides a method for preparing the surface of a nuclear power seawater pump shaft by using an ultrahigh-speed laser cladding technology, and by adopting the method, a cobalt-based corrosion-resistant wear-resistant coating which is good in flatness, 0.10-0.45 mm in thickness and free of defects can be quickly and accurately prepared on the surface of the nuclear power seawater pump shaft. Although the surface coating can obviously improve the corrosion resistance and wear resistance of parts of the sea water pump, the preparation process usually experiences high temperature, the mechanical properties of the parts are easily reduced, the prepared coating is large in thickness and rough in surface, the parts with high assembly precision requirements and small fit clearance need to be subjected to reserved processing amount or later polishing, and the manufacturing cost is greatly increased.
Disclosure of Invention
The invention mainly aims to provide an anti-abrasion protective coating with long service life and high damage tolerance on the surface of a metal substrate, and a preparation method and application thereof, so as to overcome the defects of the prior art.
In order to achieve the purpose, the technical scheme adopted by the invention comprises the following steps:
the embodiment of the invention provides an anti-abrasion protective coating on the surface of a metal matrix, which comprises a Ti transition layer and TiC which are sequentially formed on the surface of the metal matrixxGradient layer, first DLC layer, TiCx/Ti/TiCxAlternating layer stacks and top layers of/DLC, wherein the TiCx/Ti/TiCxLaminated with/DLC alternating layers of TiCx/Ti/TiCxSandwich layers and second DLC layers alternately stacked, the TiCx/Ti/TiCxThe sandwich layer comprises two TiCsxLayer and set in the two TiCsxA Ti layer between the layers, said top layer comprising a third DLC layer, said TiCxThe value range of the medium X is 0.8-1.3.
The embodiment of the invention also provides a preparation method of the anti-abrasion protective coating, which comprises the following steps:
s1, pretreating the surface of a metal matrix;
s2, depositing a Ti transition layer and TiC on the surface of the metal matrix in sequence by adopting a direct-current magnetron sputtering technologyxGradient layer, then adopting linear ion source technique in TiCxDepositing a first DLC layer on the surface of the gradient layer;
s3, TiC is deposited on the surface of the first DLC layer by adopting a direct-current magnetron sputtering technologyx/Ti/TiCxA sandwich layer, and depositing a second DLC layer by linear ion source technique to form TiCx/Ti/TiCxThe sandwich layer and the second DLC layer are alternately laminated to form TiCx/Ti/TiCxa/DLC alternating layer;
s4, adopting linear ion source technology to TiCx/Ti/TiCxAnd depositing a third DLC layer on the/DLC alternating layer to form the anti-abrasion protective coating.
The embodiment of the invention also provides application of the anti-abrasion protective coating on the surface of the metal matrix in the field of surface protection of moving parts of a sea water pump.
Compared with the prior art, the invention has the advantages that:
(1) the coating adopts an alternate deposition multilayer structure, which is beneficial to reducing the internal stress of the film (the residual stress is-1.2 to-1.6 GPa), improving the film-substrate bonding strength (the bonding strength with a stainless steel substrate is 10 to 15N), simultaneously inhibiting the generation of penetrating defects, prolonging the diffusion path of a corrosive medium and improving the corrosion resistance of the coating (the self-corrosion current density in 3.5 wt% NaCl solution is as low as 3 to 5 multiplied by 10-10A·cm-2More than one order of magnitude lower than that of a stainless steel substrate);
(2)Ti-TiCxthe gradient structure of the DLC is beneficial to improving the interface adaptation degree and the bonding strength of the coating, and endows the coating with excellent overall mechanical properties (nano hardness is 11-16 GPa, elastic modulus is 139-157 GPa, and fracture toughness is 1.4-1.6 MPa.m)1/2)；
(3) The thickened DLC layer of the top layer is beneficial to improving the mechanical strength of the coating and endows the coating with long-life antifriction lubricating capability (under the load of 5N in 3.5 wt% NaCl solution and 6mm of Al2O3Coefficient of friction when ceramic ball is matched with pair<0.10, life time>36.5 h). Therefore, the prepared multilayer coating has excellent mechanical properties, presents high corrosion and abrasion resistance in a seawater environment, and shows great application potential in the field of surface protection of moving parts of seawater pumps.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic cross-sectional structure of a coating according to the present invention;
FIG. 2 is a cross-sectional SEM photograph of the coating prepared in example 1;
FIG. 3 is a graph showing the change in polarization resistance of the coating prepared in example 1 after immersion in 3.5 wt% NaCl at normal temperature for 63 days;
FIG. 4 is a plot of the change in OCP and COF for the coatings prepared in example 1 tested for abrasion at 5N loading in 3.5 wt% NaCl for 36.5 h;
FIG. 5 is an SEM photograph of the wear scar surface of the coating prepared in example 2 after 12h of wear testing under a 5N load in 3.5 wt% NaCl;
FIG. 6 is a plot of the change in OCP and COF for the coating prepared in example 2 tested for 12h abrasion at 20N loading in 3.5 wt% NaCl;
FIG. 7 is a SEM photograph of the surface of a wear scar after 12 hours of wear testing of the Ti/DLC coating prepared in comparative example 1 under a 5N load in 3.5 wt% NaCl;
FIG. 8 is TiC prepared in comparative example 2xSEM photograph of the surface of a grinding scar of a DLC coating after 12h of grinding test under a load of 5N in 3.5 wt% NaCl.
Detailed Description
In view of the shortcomings of the prior art, the present inventors have long studied and practiced in great numbers to provide the technical solutions of the present invention, and further explain the technical solutions, the implementation processes and principles thereof as follows.
One aspect of the embodiment of the invention provides an anti-abrasion protective coating on the surface of a metal substrate, which comprises a Ti transition layer and TiC which are sequentially formed on the surface of the metal substratexGradient layer, first DLC layer, TiCx/Ti/TiCxAlternating layer stacks and top layers of/DLC, wherein the TiCx/Ti/TiCxLaminated with/DLC alternating layers of TiCx/Ti/TiCxSandwich layers and second DLC layers alternately stacked, the TiCx/Ti/TiCxThe sandwich layer comprises two TiCsxLayer and set in the two TiCsxOne Ti layer between the layers, said top layer comprising a third DLC layer TiCx。
Further, the TiCx/Ti/TiCxthe/DLC alternating layer stack comprises 4-7 alternating layer periodic layers, wherein each alternating layer periodic layer comprises a TiCx/Ti/TiCxA sandwich layer and a DLC layer.
Further, the TiCxThe layer is a gradient layer between the TiC layer and the DLC layer.
Furthermore, the thickness of the abrasion-resistant protective coating is 1.5-2.8 μm.
Furthermore, the thickness of the third DLC layer is 200-300 nm.
Further, the substrate comprises a stainless steel substrate; preferably, the substrate comprises 316L stainless steel and/or S32750 stainless steel.
An aspect of an embodiment of the present invention further provides a preparation method of the anti-abrasion protective coating, including:
s1, pretreating the surface of a metal matrix;
s2, depositing a Ti transition layer and TiC on the surface of the metal matrix in sequence by adopting a direct-current magnetron sputtering technologyxGradient layer, then adopting linear ion source technique in TiCxDepositing a first DLC layer on the surface of the gradient layer;
s3, TiC is deposited on the surface of the first DLC layer by adopting a direct-current magnetron sputtering technologyx/Ti/TiCxA sandwich layer, and depositing a second DLC layer by linear ion source technique to form TiCx/Ti/TiCxThe sandwich layer and the second DLC layer are alternately laminated to form TiCx/Ti/TiCxa/DLC alternating layer;
s4, adopting linear ion source technology to TiCx/Ti/TiCxDepositing a third DLC layer on the/DLC alternating layer to form the anti-abrasion layerAnd (4) protective coating.
In some more specific embodiments, the preparation method comprises:
(1) pretreating the surface of a substrate: sequentially polishing the metal matrix by using SiC metallographic abrasive paper of 120# to 3000#, and then using Al with the particle size of 0.2 to 0.3 mu m2O3Polishing the metal substrate by using the grinding paste for 10-15 min;
ultrasonically cleaning the polished metal substrate for 5-15 min by using acetone, ethanol and deionized water in sequence, and drying by cold air;
placing the metal substrate in a film deposition vacuum chamber, and vacuumizing to 2.0 × 10-5And (3) Torr, heating the chamber to 120-150 ℃, introducing argon with the gas flow of 30-36 sccm into the vacuum chamber, opening a linear ion source and a pulse bias to perform bias etching cleaning on the substrate for 30-45 min, wherein the current of the linear ion source and the pulse bias are 0.20-0.25A and-200-250V respectively.
(2) Sequentially depositing a Ti transition layer and TiC on the surface of a metal matrix by adopting a direct-current magnetron sputtering technologyxGradient layer, then adopting linear ion source technique in TiCxDepositing a first DLC layer on the surface of the gradient layer;
preferably, the conditions for depositing the Ti transition layer include: ti target, argon flow of 48-52 sccm, acetylene flow of 0sccm, deposition time of 9-10 min, direct current magnetron sputtering source current and pulse bias of 3.0A and-150 to-200V respectively; deposition of TiCxThe conditions of the gradient layer include: the Ti target, the argon flow is 48-52 sccm, the acetylene flow is 4.8-5.2 sccm, the deposition time is 9-10 min, and the current and the pulse bias of the direct-current magnetron sputtering source are respectively 3.0A and-150 to-200V; the conditions for depositing the first DLC layer include: the flow rate of acetylene is 36-40 sccm, the deposition time is 12-18 min, and the current of the linear ion source and the pulse bias are respectively 0.2A and-150 to-200V.
(3) TiC is deposited on the surface of the first DLC layer by adopting a direct current magnetron sputtering technologyx/Ti/TiCxA sandwich layer, and depositing a second DLC layer by linear ion source technique to form TiCx/Ti/TiCxThe sandwich layer and the second DLC layer are alternately laminated to form TiCx/Ti/TiCxAlternating layers of/DLC.
Preferably, TiC is depositedx/Ti/TiCxTiC in Sandwich layerxThe conditions of the layers include: the Ti target, the argon flow is 48-52 sccm, the acetylene flow is 4.8-5.2 sccm, the deposition time is 6-9 min, and the current and the pulse bias of the direct-current magnetron sputtering source are respectively 3.0A and-150 to-200V; deposition of TiCx/Ti/TiCxThe conditions of the Ti layer in the sandwich layer include: ti target, argon flow of 48-52 sccm, acetylene flow of 0sccm, deposition time of 6-9 min, direct current magnetron sputtering source current and pulse bias of 3.0A and-150 to-200V respectively; the conditions for depositing the second DLC layer include: the flow rate of acetylene is 36-40 sccm, the deposition time is 12-18 min, and the current of the linear ion source and the pulse bias are respectively 0.2A and-150 to-200V.
Preferably TiC deposited by DC magnetron sputtering techniquex/Ti/TiCxThe sandwich layer and the DLC layer deposited by the linear ion source technology are alternately stacked for 4-7 periods.
(4) TiC using linear ion source techniquex/Ti/TiCxAnd depositing a third DLC layer on the/DLC alternating layer to form the anti-abrasion protective coating.
Preferably, the conditions for depositing the third DLC layer include: the flow rate of acetylene is 36-40 sccm, the deposition time is 24-36 min, and the current of the linear ion source and the pulse bias are respectively 0.2A and-150 to-200V.
One aspect of the embodiment of the invention also provides a use of the anti-abrasion protective coating on the surface of the metal substrate in abrasion resistance of moving parts of a sea water pump.
The technical solution of the present invention is further explained by the following embodiments. It is easily understood by those skilled in the art that the examples are only for the understanding of the present invention and should not be construed as the specific limitations of the present invention.
Example 1:
in this example, the base material was AISI 316L austenitic stainless steel, and the structure of the coating was as shown in fig. 1, wherein the total thickness of the coating was 1.6 μm.
The preparation steps of the coating on the surface of 316L are as follows:
step 1: use ofSequentially polishing 316L matrix by using SiC metallographic abrasive paper of No. 120-3000 # and then using Al with the particle size of 0.2-0.3 mu m2O3Carrying out metallographic polishing on the stainless steel substrate for 15min by using the grinding paste;
step 2: placing the polished 316L stainless steel substrate in acetone, ethanol and deionized water in sequence, carrying out ultrasonic cleaning for 10min, and then blowing by cold air for standby;
and step 3: putting a 316L stainless steel substrate into a film deposition vacuum chamber, and successively adopting a mechanical pump and a turbo-molecular pump to pump the vacuum to 2.0 multiplied by 10-5Opening a heater after the Torr, setting the heating temperature to be 150 ℃, introducing high-purity argon with the flow of 36sccm into the vacuum chamber after the temperature is reached, opening the linear ion source and the pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-200V, and carrying out bias etching cleaning on the 316L stainless steel substrate for 30 min;
and 4, step 4: high purity argon gas with a flow of 50sccm and high purity acetylene with a flow of 5sccm are introduced (acetylene is only used for depositing TiC)xIntroducing during lamination), opening a direct current magnetron sputtering source and pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct current magnetron sputtering source to be 3.0A and-150V, and sputtering the surface of a stainless steel substrate for 9min +9min by adopting a direct current magnetron sputtering technology to prepare a Ti transition layer and TiCxA gradient layer; then high-purity acetylene with the flow rate of 38sccm is introduced, a linear ion source and a pulse bias voltage are opened, the current and the pulse bias voltage of the linear ion source are respectively set to be 0.2A and-150V, and the linear ion source technology is adopted to perform TiCxDepositing the gradient layer for 12min to prepare a first DLC layer;
and 5: high purity argon gas with a flow of 50sccm and high purity acetylene with a flow of 5sccm are introduced (acetylene is only used for depositing TiC)xIntroducing during layer deposition), opening a direct current magnetron sputtering source and pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct current magnetron sputtering source to be 3.0A and-150V, and sputtering on the DLC layer for 6min +6min +6min by adopting a direct current magnetron sputtering technology to prepare TiCx/Ti/TiCxA layer;
step 6: depositing a second DLC layer, and preparing the first DLC layer under the same preparation conditions as the step 4;
and 7: repeating the step 5 three times and the step 6 two times;
and 8: introducing high-purity acetylene with the flow of 38sccm, opening a linear ion source and a pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-150V, and adopting the linear ion source technology to perform TiCx/Ti/TiCxDepositing the layer for 24min to prepare a third DLC top layer;
as shown in the SEM photograph of FIG. 2, the prepared coating is TiCx/Ti/TiCxThe layers and the DLC layers have an alternate multilayer structure, the coating is compact, complete and free from obvious defects, the coating is tightly combined with a stainless steel substrate, and the total thickness of the coating is 1.57 mu m. As shown in FIG. 3, the immersion test in 3.5 wt% NaCl solution at room temperature for 63 days showed the polarization resistance (R) of the prepared coatingp) After soaking, the water content is still maintained at 3.0 × 107Ω·cm2More than an order of magnitude higher than the base of 316L stainless steel, showing excellent long-term corrosion protection against 316L stainless steel. As shown in FIG. 4, under a 5N load in 3.5 wt% NaCl solution with 6mm phi of Al2O3When the ceramic ball is subjected to a linear reciprocating friction and wear test (5 mm of stroke and 2Hz of frequency), the prepared coating always keeps the friction coefficient in the test process of the duration of 36.5h (the sliding distance 2628m)<0.10, there was only slight abrasion damage to the coated surface, showing long life abrasion protection against 316L stainless steel in a seawater environment.
Example 2:
in the embodiment, the matrix material is UNS S32750(SAF 2507) super duplex stainless steel, and the coating is TiCx/Ti/TiCxThe multilayer structure of layers and DLC layers is periodically and alternately stacked, wherein the surface of S32750 is a Ti transition layer, and the total thickness of the coating is 2.3 mu m.
The preparation steps of the coating on the surface of the S32750 are as follows:
step 1: sequentially polishing the S32750 matrix by using SiC metallographic abrasive paper of 120# to 3000# and then using Al with the particle size of 0.2 to 0.3 mu m2O3Polishing the matrix with the grinding paste for 12 min;
step 2: placing the polished S32750 matrix in acetone, ethanol and deionized water in sequence, performing ultrasonic cleaning for 10min, and then drying by cold air for later use;
and step 3: the S32750 radicalThe body is arranged in a film deposition vacuum chamber and is pumped to 2.0 multiplied by 10 by adopting a mechanical pump and a turbo molecular pump in sequence-5Turning on a heater after the Torr, setting the heating temperature to be 150 ℃, introducing high-purity argon with the flow of 30sccm into the vacuum chamber after the temperature is reached, turning on the linear ion source and the pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-200V, and carrying out bias etching cleaning on the S32750 substrate for 45 min;
and 4, step 4: introducing high-purity argon with the flow rate of 48sccm and high-purity acetylene with the flow rate of 4.8sccm (the acetylene is only used for depositing TiC)xIntroducing during lamination), opening a direct current magnetron sputtering source and a pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct current magnetron sputtering source to be 3.0A and-150V, and sputtering the surface of the substrate for 10min +10min by adopting a direct current magnetron sputtering technology to prepare a Ti transition layer and TiCxA gradient layer; then high-purity acetylene with the flow rate of 38sccm is introduced, a linear ion source and a pulse bias voltage are opened, the current and the pulse bias voltage of the linear ion source are respectively set to be 0.2A and-150V, and the linear ion source technology is adopted to perform TiCxDepositing the gradient layer for 18min to prepare a first DLC layer;
and 5: introducing high-purity argon with the flow rate of 48sccm and high-purity acetylene with the flow rate of 4.8sccm (the acetylene is only used for depositing TiC)xIntroducing during layer deposition), opening a direct current magnetron sputtering source and pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct current magnetron sputtering source to be 3.0A and-150V, and sputtering the DLC layer for 9min +9min +9min by adopting a direct current magnetron sputtering technology to prepare TiCx/Ti/TiCxA layer;
step 6: depositing a second DLC layer, and preparing the first DLC layer under the same preparation conditions as the step 4;
and 7: repeating the step 5 three times and the step 6 two times;
and 8: introducing high-purity acetylene with the flow of 38sccm, opening a linear ion source and a pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-150V, and adopting the linear ion source technology to perform TiCx/Ti/TiCxDepositing the third DLC top layer on the layer for 36min to prepare a thickened third DLC top layer;
the test results of electrochemical impedance spectrum and potentiodynamic polarization curve in 3.5 wt% NaCl show that the prepared coating has polarization resistance and self-corrosion electricityThe flow density was 7.2X 10, respectively7Ω·cm2And 3.5X 10-10A·cm-2Obviously improves the electrochemical corrosion resistance of the S32750 matrix. With 6mm phi Al under a 5N load in 3.5 wt% NaCl solution2O3When the ceramic ball is subjected to a linear reciprocating friction and wear test (5 mm of stroke and 2Hz of frequency), the prepared coating always keeps the friction coefficient in the test process of 12h (864 m of sliding distance)<0.08, only a slight trace of polishing wear was present on the coating surface (FIG. 5), showing excellent abrasion protection against S32750SS in a seawater environment. Furthermore, as shown in fig. 6, in the abrasion test at 20N load for 12h, the prepared coating, although worn through (the maximum depth of the wear scar is greater than the overall thickness of the coating), still has a friction coefficient below 0.15 (significantly lower than 0.31 of S32750 matrix) for a certain period of time, i.e. the coating still maintains a certain antifriction lubricating effect, shows good tolerance to failure, which is of great importance to avoid catastrophic abrasion failure of the coating.
Example 3
In this example, the base material was UNS S32750 super duplex stainless steel, and the coating was TiCx/Ti/TiCxThe multilayer structure of layers and DLC layers is periodically and alternately stacked, wherein the surface of S32750 is a Ti metal transition layer, and the total thickness of the coating is 2.8 mu m.
The preparation steps of the coating on the surface of the S32750 are as follows:
step 1: the same procedure as in step 1 of example 2;
step 2: the same procedure as in step 2 of example 2;
and step 3: placing S32750 matrix in a vacuum chamber for film deposition, and sequentially vacuumizing to 2.0 × 10 by using a mechanical pump and a turbomolecular pump-5Turning on a heater after the Torr, setting the heating temperature to be 120 ℃, introducing high-purity argon with the flow of 36sccm into the vacuum chamber after the temperature reaches, turning on the linear ion source and the pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.25A and-250V, and carrying out bias etching cleaning on the S32750 substrate for 35 min;
and 4, step 4: high purity argon gas with a flow of 50sccm and high purity acetylene with a flow of 5sccm are introduced (acetylene is only used for depositing TiC)xIntroducing during lamination), opening a direct current magnetron sputtering source and a pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct current magnetron sputtering source to be 3.0A and-200V, and sputtering the surface of the substrate for 9min +9min by adopting a direct current magnetron sputtering technology to prepare a Ti transition layer and TiCxA gradient layer; then introducing high-purity acetylene with the flow of 36sccm, opening a linear ion source and a pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-200V, and adopting the linear ion source technology to TiCxDepositing the gradient layer for 12min to prepare a first DLC layer;
and 5: high purity argon gas with a flow of 50sccm and high purity acetylene with a flow of 5sccm are introduced (acetylene is only used for depositing TiC)xIntroducing during layer deposition), opening a direct current magnetron sputtering source and pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct current magnetron sputtering source to be 3.0A and-200V, and sputtering on the DLC layer for 6min +6min +6min by adopting a direct current magnetron sputtering technology to prepare TiCx/Ti/TiCxA layer;
step 6: depositing a second DLC layer, and preparing the first DLC layer under the same preparation conditions as the step 4;
and 7: repeating step 5 five times and step 6 four times;
and 8: introducing high-purity acetylene with the flow of 36sccm, opening a linear ion source and a pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-200V, and adopting the linear ion source technology to perform TiCx/Ti/TiCxA third DLC top layer was prepared by deposition on top of the layer for 24 min.
Electrochemical test results in 3.5 wt% NaCl solution showed that the prepared coating has electrochemical corrosion resistance comparable to that of the coating in example 2, and also shows good corrosion protection for S32750 substrates. In an abrasion test of 24 hours under 5N load in 3.5 wt% NaCl solution, the coating always keeps good antifriction lubricating performance, only local abrasion damage traces appear on the surface, and the coating still keeps integral integrity; in an abrasion test at 20N load for 12h, the coating maintained good antifriction lubrication over a period of time after wear-through as the coating in example 2, showing good tolerance to abrasion failure.
Comparative example 1
This example is a comparative example to example 2.
In this example, the substrate is S32750 super duplex stainless steel. The coating is a multilayer structure formed by periodically and alternately laminating Ti layers and DLC layers, wherein the surface of S32750 is a Ti metal transition layer, and the total thickness of the coating is 2.3 mu m.
The preparation steps of the coating on the surface of the S32750 are as follows:
step 1: the same procedure as in step 1 of example 2;
step 2: the same procedure as in step 2 of example 2;
and step 3: the same procedure as in step 3 of example 2;
and 4, step 4: introducing high-purity argon with the flow of 48sccm, opening a direct-current magnetron sputtering source and a pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct-current magnetron sputtering source to be 3.0A and-150V, and sputtering the surface of the substrate for 20min by adopting a direct-current magnetron sputtering technology to prepare a Ti layer;
and 5: introducing high-purity acetylene with the flow of 38sccm, opening a linear ion source and a pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-150V, and depositing for 18min on the Ti layer by adopting a linear ion source technology to prepare a DLC layer;
step 6: introducing high-purity argon with the flow of 48sccm, opening a direct-current magnetron sputtering source and a pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct-current magnetron sputtering source to be 3.0A and-150V, and sputtering the surface of the substrate for 27min by adopting a direct-current magnetron sputtering technology to prepare a Ti layer;
and 7: repeating the step 5 and the step 6 for three times;
and 8: and introducing high-purity acetylene with the flow of 38sccm, opening a linear ion source and a pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-150V, and depositing for 36min on the Ti layer by adopting a linear ion source technology to prepare the thickened DLC top layer.
The nano-indentation test result shows that the nano-hardness of the prepared coating is 7.2GPa, the elastic modulus is 129.6GPa, and the nano-hardness and the elastic modulus are both obviously lower than those of TiC prepared in the embodiment 2x/Ti/TiCxA DLC multilayer coating; in an abrasion test at 5N load in 3.5 wt% NaCl solution for a period of 12h, the coatings prepared, although always maintaining good antifriction lubricating properties (COF)<0.08) but the surface had undergone significant plastic deformation and spalling, as shown in fig. 7.
Comparative example 2
This example is a comparative example to example 2.
In this example, the substrate is S32750 super duplex stainless steel. The coating is TiCxMultilayer structure with layers and DLC layers alternately laminated periodically, wherein S32750 surface is TiCxThe transition layer, the coating top is the antifriction wearing layer of thickened DLC, and the coating total thickness is 2.3 mu m.
The preparation steps of the coating on the surface of the S32750 are as follows:
step 1: the same procedure as in step 1 of example 2;
step 2: the same procedure as in step 2 of example 2;
and step 3: the same procedure as in step 3 of example 2;
and 4, step 4: introducing high-purity argon with the flow rate of 48sccm and high-purity acetylene with the flow rate of 4.8sccm, opening the direct-current magnetron sputtering source and the pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct-current magnetron sputtering source to be 3.0A and-150V, and sputtering the surface of the substrate for 20min by adopting a direct-current magnetron sputtering technology to prepare TiCxA layer;
and 5: introducing high-purity acetylene with the flow of 38sccm, opening a linear ion source and a pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-150V, and adopting the linear ion source technology to perform TiCxDepositing the DLC layer for 18 min;
step 6: introducing high-purity argon with the flow rate of 48sccm and high-purity acetylene with the flow rate of 4.8sccm, opening a direct-current magnetron sputtering source and a pulse bias voltage, respectively setting the current and the pulse bias voltage of the direct-current magnetron sputtering source to be 3.0A and-150V, and sputtering on the surface of the substrate for 27min by adopting a direct-current magnetron sputtering technology to prepare TiCxA layer;
and 7: repeating the step 5 and the step 6 for three times;
and 8: introducing high-purity acetylene with the flow of 38sccm, opening a linear ion source and a pulse bias voltage, respectively setting the current of the linear ion source and the pulse bias voltage to be 0.2A and-150V, and adopting the linear ion source technology to perform TiCxPreparation of thickened D by deposition on layer for 36minA top layer of LC.
The nano-indentation test result shows that the nano-hardness of the prepared coating is 15.3GPa, the elastic modulus is 151.1GPa, and the nano-hardness is slightly higher than that of the coating prepared in the embodiment 2; the scratch test result shows that the bonding strength of the prepared coating and the S32750 is 4.8N, which is obviously lower than that of the coating prepared in the example 2; in addition, fracture toughness (K) measured by microscopic Vickers indentation methodIC) The results show K for the coatings preparedICIs 1.22MPa · m1/2Lower than the multilayer coating prepared in example 2; in an abrasion test in 3.5% by weight NaCl solution at a load of 5N for a period of 12 hours, the coating produced was the same as in comparative example 1, although good antifriction lubricating properties (COF) were always maintained<0.08) but also showed significant signs of spalling at the surface as shown in figure 8.
Further, the present inventors have also conducted experiments with other materials and conditions and the like listed in the present specification with reference to the manner of examples 1 to 3, and obtained the same results.
It should be understood that the above-mentioned embodiments are merely illustrative of the technical concepts and features of the present invention, which are intended to enable those skilled in the art to understand the contents of the present invention and implement the present invention, and therefore, the protection scope of the present invention is not limited thereby. All equivalent changes and modifications made according to the spirit of the present invention should be covered within the protection scope of the present invention.

Claims (13)

1. An anti-abrasion protective coating on the surface of a metal matrix is characterized by comprising a Ti transition layer and TiC which are sequentially formed on the surface of the metal matrixxGradient layer, first DLC layer, TiCx/Ti/TiCxAlternating layer stacks and top layers of/DLC, wherein the TiCx/Ti/TiCxLaminated with/DLC alternating layers of TiCx/Ti/TiCxSandwich layers and second DLC layers alternately stacked, the TiCx/Ti/TiCxThe sandwich layer comprises two TiCsxLayer and set in the two TiCsxA Ti layer between the layers, said top layer comprising a third DLC layer, said TiCxThe value range of the medium X is 0.8-1.3.
2. The anti-abrasion protective coating according to claim 1, wherein said TiC isx/Ti/TiCxthe/DLC alternating layer stack comprises 4-7 alternating layer periodic layers, wherein each alternating layer periodic layer comprises a TiCx/Ti/TiCxA sandwich layer and a DLC layer.
3. The anti-abrasion protective coating layer according to claim 1, wherein the thickness of the anti-abrasion protective coating layer is 1.5-2.8 μm.
4. The anti-abrasion protective coating according to claim 1, wherein said Ti transition layer, TiCxGradient layer, first DLC layer, TiCx/Ti/TiCxThe thickness ratio of the DLC layer to the second DLC layer to the third DLC layer is 1 (1-1.2): 0.8-1.2): 1.6-2.4): 0.8-1.2): 2.0-3.0.
5. The abrasion-resistant protective coating according to claim 1, wherein the thickness of the third DLC layer is 200 to 300 nm.
6. The anti-abrasion protective coating according to claim 1, wherein said metal matrix comprises a stainless steel matrix.
7. The anti-abrasion protective coating according to claim 6, wherein the metal matrix is selected from any one or a combination of two of 316L stainless steel, S32750 stainless steel.
8. The process for the preparation of the anti-abrasion protective coating according to any of claims 1 to 7, characterized in that it comprises:
s1, preprocessing the surface of the metal matrix;
s2, depositing Ti transition layer and TiC on the surface of the metal matrix in sequence by adopting the direct current magnetron sputtering technologyxGradient layer, then adopting linear ion source technique in TiCxDepositing a first DLC layer on the surface of the gradient layer;
s3, depositing TiC on the surface of the first DLC layer by adopting a direct-current magnetron sputtering technologyx/Ti/TiCxA sandwich layer, and depositing a second DLC layer by linear ion source technique to form TiCx/Ti/TiCxThe sandwich layer and the second DLC layer are alternately laminated to form TiCx/Ti/TiCxa/DLC alternating layer;
s4, applying linear ion source technique to TiCx/Ti/TiCxAnd depositing a third DLC layer on the/DLC alternating layer to form the anti-abrasion protective coating.
9. The method for preparing the anti-abrasion protective coating according to claim 8, wherein the step S1 specifically comprises:
sequentially polishing the metal matrix by using 120# to 3000# SiC metallographic abrasive paper, and then using Al with the particle size of 0.2 to 0.3 mu m2O3Polishing the metal substrate by using the grinding paste for 10-15 min;
ultrasonically cleaning the polished metal substrate for 5-15 min by using acetone, ethanol and deionized water in sequence, and drying by cold air;
placing the metal substrate in a film deposition vacuum chamber, and vacuumizing to 2.0 × 10-5And (3) Torr, heating the chamber to 120-150 ℃, introducing argon with the gas flow of 30-36 sccm into the vacuum chamber, opening a linear ion source and a pulse bias voltage to perform bias etching cleaning on the substrate for 30-45 min, wherein the current of the linear ion source and the pulse bias voltage are 0.20-0.25A and-200 to-250V respectively.
10. The method for preparing an anti-abrasion protective coating according to claim 8, wherein the conditions for depositing the Ti transition layer in the step S2 include: the Ti target has the argon flow of 48-52 sccm, the acetylene flow of 0sccm, the deposition time of 9-10 min, and the current and the pulse bias of the direct-current magnetron sputtering source of 3.0A and-150 to-200V respectively; deposition of TiCxThe conditions of the gradient layer include: the Ti target has the argon flow of 48-52 sccm, the acetylene flow of 4.8-5.2 sccm, the deposition time of 9-10 min, and the current and the pulse bias of the direct-current magnetron sputtering source of 3.0A and-150 to-200V respectively; the conditions for depositing the first DLC layer include: second stepThe alkyne flow is 36-40 sccm, the deposition time is 12-18 min, and the linear ion source current and the pulse bias voltage are respectively 0.2A and-150 to-200V.
11. The method for preparing an anti-abrasion protective coating according to claim 8, wherein TiC is deposited in step S3x/Ti/TiCxTiC in Sandwich layerxThe conditions of the layers include: the Ti target has the argon flow of 48-52 sccm, the acetylene flow of 4.8-5.2 sccm, the deposition time of 6-9 min, and the current and the pulse bias of the direct-current magnetron sputtering source of 3.0A and-150 to-200V respectively; deposition of TiCx/Ti/TiCxThe conditions of the Ti layer in the sandwich layer include: the Ti target has the argon flow of 48-52 sccm, the acetylene flow of 0sccm, the deposition time of 6-9 min, and the current and the pulse bias of the direct-current magnetron sputtering source of 3.0A and-150 to-200V respectively; the conditions for depositing the second DLC layer include: the flow rate of acetylene is 36-40 sccm, the deposition time is 12-18 min, and the current of the linear ion source and the pulse bias are respectively 0.2A and-150 to-200V.
12. The method for producing an anti-abrasion protective coating according to claim 8, wherein the conditions for depositing the third DLC layer in step S4 include: the flow rate of acetylene is 36-40 sccm, the deposition time is 24-36 min, and the current of the linear ion source and the pulse bias are respectively 0.2A and-150 to-200V.
13. Use of an anti-abrasion protective coating on the surface of a metal substrate as defined in any one of claims 1 to 7 in the field of surface protection of moving parts of sea water pumps.
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