CN110379866A - Solar battery based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode - Google Patents

Solar battery based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode Download PDF

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CN110379866A
CN110379866A CN201910568118.7A CN201910568118A CN110379866A CN 110379866 A CN110379866 A CN 110379866A CN 201910568118 A CN201910568118 A CN 201910568118A CN 110379866 A CN110379866 A CN 110379866A
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anode
layer
gan base
varying doping
junction
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CN110379866B (en
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富容国
张嘎
何苗
宁传旺
陈浩
周岗
钱芸生
刘磊
张俊举
张益军
邱亚峰
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Nanjing Tech University
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Nanjing Tech University
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)

Abstract

The present invention provides the solar batteries based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode, including GaAs photocathode, vacuum chamber and anode, the anode uses GaN base material, the anode is followed successively by substrate layer, AlN buffer layer, N-shaped varying doping GaN receiving layer from most surface layer to close to vacuum chamber, and wherein AlN buffer growth is on substrate layer;N-shaped varying doping GaN base receiving layer is grown on AlN buffer layer.The present invention uses N-shaped varying doping GaN base receiving layer, inside the anode formed a built in field, increase electronics inside the anode transport rate, improve electronics capacity gauge, inhibit the noise current of anode material, the higher energy conversion of the vacuum separation formula p-n junction solar battery of realization.

Description

Solar battery based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode
Technical field
It is specially a kind of based on vacuum separation formula p-n junction N-shaped GaN base sun the invention belongs to technical field of solar batteries Pole solar battery.
Background technique
Photovoltaic power generation utilizes the light quantum effect of the short-wave photons of solar radiation, and the electronics in photon excitation material is realized The conversion of photoelectricity.2010, J.W.Schwede of Stanford Univ USA et al. proposed " photon enhancing thermionic emission (PETE) " solar battery technology, overcome traditional photovoltaic power generation technology with temperature rise and efficiency decline the shortcomings that, realize Energy conversion at relatively high temperatures.PETE solar cell device is absorbed using cathode and anode separate structure by cathode Solar radiation launching electronics, electronics form electric current after being received by anode, complete photoelectric conversion.The PETE battery being directed at present is ground The photoelectric conversion efficiency for being concentrated mainly on photocathode is studied carefully, for the study limitation in terms of anode in phosphorus doping diamond.And phosphorus Doped diamond anode there are manufacturing process it is complicated, charge collection efficiency is lower the disadvantages of, using the sun of phosphorus doping diamond The energy conversion efficiency of energy battery is not high.
Summary of the invention
It is an object of the invention to propose a kind of solar energy based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode Battery, to improve the energy conversion efficiency of solar battery.
Realize the technical solution of the object of the invention are as follows: one kind is based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode Solar battery, including GaAs photocathode, vacuum chamber and anode, which is characterized in that the anode uses GaN base material, The anode is followed successively by substrate layer, AlN buffer layer, N-shaped varying doping GaN receiving layer from most surface layer to close to vacuum chamber.
Preferably, the substrate layer is Sapphire Substrate.
Preferably, the AlN buffer growth is on substrate layer, with a thickness of 50-75nm.
Preferably, the N-shaped varying doping GaN base receiving layer is grown on AlN buffer layer in the way of MOCVD, with a thickness of 200-300nm, doping concentration range are 1 × 1018-1×1019cm3, doping concentration from close to AlN buffer layer to most surface reduce.
Preferably, the N-shaped varying doping GaN base receiving layer includes 4 layers from close to AlN buffer layer to most surface, first layer With a thickness of 50-75nm, doping concentration 1 × 1019cm-3;For the second layer with a thickness of 50-75nm, doping concentration is 5 × 1018cm-3;Third For layer with a thickness of 50-75nm, doping concentration is 2.5 × 1018cm-3;4th layer with a thickness of 50-75nm, doping concentration is 1 × 1018cm-3
Preferably, the N-shaped varying doping GaN base is received layer surface and is handled using ultrahigh vacuum activation technology.
Compared with prior art, the present invention N-shaped GaN base material 1) of the invention is had the advantage that, using heavily doped acrobatics Art makes fermi level against conduction band bottom;2) N-shaped GaN base anode construction of the invention is based on semiconductor material doping techniques and surpasses High vacuum surface activation technology realizes low electron affinity N-shaped varying doping GaN base anode construction, obtains low work function, high electricity The GaN base anode construction of sub- transport efficiency, high charge collection efficiency realizes higher solar battery energy conversion efficiency;3) N-shaped GaN base material preparation process proposed by the present invention is simple, is effectively reduced anode work function number, realize PETE solar battery compared with High energy conversion efficiency;4) present invention uses varying doping technology, forms built in field inside the anode, improves electronics in sun Extremely internal transport efficiency, the noise current for inhibiting N-shaped GaN base material.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of N-shaped varying doping GaN base anode.
Fig. 2 is the energy conversion efficiency schematic diagram under different anode material work functions.
Specific embodiment
As shown in Figure 1, it is a kind of based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode solar battery, including GaAs photocathode, vacuum chamber and anode, the anode use GaN base material, and the anode is from most surface layer to close to vacuum chamber It is followed successively by substrate layer 1, AlN buffer layer 2, N-shaped varying doping GaN receiving layer 3.
It is connected between GaAs photocathode and GaN anode using cylindrical ceramic chamber, place is sealed by indium closure material Reason forms a vacuum cavity between GaAs photoelectricity and GaN anode, to constitute a vacuum separation formula p-n junction solar energy Battery.
The substrate layer 1 is Sapphire Substrate, and AlN buffer layer 2 is grown in the upper of Sapphire Substrate in the way of MOCVD On surface, with a thickness of 50-75nm.
The N-shaped varying doping GaN base receiving layer 3 is grown on AlN buffer layer 2 in the way of MOCVD, with a thickness of 200- 300nm, doping concentration range are 1 × 1018-1×1019cm3, doping concentration is from close AlN buffer layer 2 to most surface reduction.
In certain embodiments, the N-shaped varying doping GaN base receiving layer 3 includes 4 from close to AlN buffer layer 2 to most surface Layer, first layer is with a thickness of 50-75nm, doping concentration 1 × 1019cm-3;The second layer with a thickness of 50-75nm, doping concentration is 5 × 1018cm-3;For third layer with a thickness of 50-75nm, doping concentration is 2.5 × 1018cm-3;4th layer, with a thickness of 50-75nm, is adulterated dense Degree is 1 × 1018cm-3
Using ultrahigh vacuum activation technology, activation processing is carried out to 3 surface of N-shaped varying doping GaN receiving layer, obtains low electronics The N-shaped GaN base receiving layer 3 of affinity.
Due to the difference of the doping concentration of GaN base material, one is formed inside the anode by the built in field in outer direction, The carrier that the built in field is conducive to improve anode interior transports rate, enhances the charge collection efficiency of anode, inhibits N-shaped The noise current of GaN base material.
It is handled by surface activation and obtains low electron affinity GaN base anode, work function also declines therewith, solar-electricity Pond output voltage becomes larger, and improves the energy conversion efficiency of solar battery.
As shown in Fig. 2, a kind of be based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode solar battery, different sun Energy conversion efficiency schematic diagram under the conditions of the work function of pole, as anode work function number reduces, energy conversion efficiency is higher.This hair The N-shaped varying doping GaN base anode material of bright proposition obtains the N-shaped GaN of low electron affinity after ultravacuum activation technology Base receiving layer reduces the work function of anode material, improves the energy conversion efficiency of solar battery.
Embodiment
One kind be based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode solar battery, including GaAs photocathode, Vacuum chamber and anode, the anode use GaN base material, and the anode is followed successively by substrate layer 1, AlN buffer layer 2, n from outside to inside Type varying doping GaN receiving layer 3.The substrate layer 1 is Sapphire Substrate, and AlN buffer layer 2 is grown in indigo plant in the way of MOCVD On the upper surface of jewel substrate, with a thickness of 50nm, it is slow that the N-shaped varying doping GaN receiving layer 3 is grown in AlN in the way of MOCAD It rushes 2 on layer, with a thickness of 200nm, the N-shaped varying doping GaN base receiving layer 3 includes 4 layers, and first layer adulterates dense with a thickness of 50nm Degree 1 × 1019cm-3;For the second layer with a thickness of 50nm, doping concentration is 5 × 1018cm-3;Third layer is with a thickness of 50nm, doping concentration 2.5×1018cm-3;4th layer with a thickness of 50nm, doping concentration is 1 × 1018cm-3

Claims (6)

1. a kind of solar battery based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode, including GaAs photocathode, Vacuum chamber and anode, which is characterized in that the anode use GaN base material, the anode from most surface layer to close to vacuum chamber according to Secondary is substrate layer (1), AlN buffer layer (2), N-shaped varying doping GaN receiving layer (3).
2. the solar battery according to claim 1 based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode, It is characterized in that, the substrate layer (1) is Sapphire Substrate.
3. the solar battery according to claim 1 based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode, It is characterized in that, the AlN buffer layer (2) is grown on substrate layer (1), with a thickness of 50-75nm.
4. the solar battery according to claim 1 based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode, It being characterized in that, the N-shaped varying doping GaN base receiving layer (3) is grown on AlN buffer layer (2) in the way of MOCVD, with a thickness of 200-300nm, doping concentration range are 1 × 1018-1×1019cm3, doping concentration subtracts from close to AlN buffer layer (2) to most surface It is small.
5. the solar battery according to claim 4 based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode, It is characterized in that, the N-shaped varying doping GaN base receiving layer (3) includes 4 layers from close to AlN buffer layer (2) to most surface, first layer With a thickness of 50-75nm, doping concentration 1 × 1019cm-3;For the second layer with a thickness of 50-75nm, doping concentration is 5 × 1019cm-3;Third For layer with a thickness of 50-75nm, doping concentration is 2.5 × 1018cm-3;4th layer with a thickness of 50-75nm, doping concentration is 1 × 1018cm-3
6. the solar battery according to claim 1 based on vacuum separation formula p-n junction N-shaped varying doping GaN base anode, It is characterized in that, the N-shaped varying doping GaN base receiving layer (3) surface is handled using ultrahigh vacuum activation technology.
CN201910568118.7A 2019-06-27 2019-06-27 Solar cell based on vacuum separation type p-n junction n-type variable doping GaN-based anode Active CN110379866B (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020182307A1 (en) * 1999-02-18 2002-12-05 City University Of Hong Kong Organic electroluminescent devices with organic layers deposited at elevated substrate temperatures
CN101866976A (en) * 2010-05-21 2010-10-20 重庆大学 Transmission-type GaN ultraviolet photocathode based on varied-doping structure and manufacturing method
CN102064206A (en) * 2010-11-30 2011-05-18 南京理工大学 Multi-component gradient-doping GaN UV (Ultraviolet) light cathode material structure and manufacture method thereof
CN107507873A (en) * 2017-08-04 2017-12-22 南京理工大学 A kind of vacuous solar energy electrooptical device
CN108630510A (en) * 2018-05-21 2018-10-09 南京理工大学 Varying doping GaN nano wire array photoelectric cathode and preparation method thereof
CN109166878A (en) * 2018-09-29 2019-01-08 华南理工大学 Nano-pore LED array chip and preparation method thereof with anti-reflection passivation layer

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020182307A1 (en) * 1999-02-18 2002-12-05 City University Of Hong Kong Organic electroluminescent devices with organic layers deposited at elevated substrate temperatures
CN101866976A (en) * 2010-05-21 2010-10-20 重庆大学 Transmission-type GaN ultraviolet photocathode based on varied-doping structure and manufacturing method
CN102064206A (en) * 2010-11-30 2011-05-18 南京理工大学 Multi-component gradient-doping GaN UV (Ultraviolet) light cathode material structure and manufacture method thereof
CN107507873A (en) * 2017-08-04 2017-12-22 南京理工大学 A kind of vacuous solar energy electrooptical device
CN108630510A (en) * 2018-05-21 2018-10-09 南京理工大学 Varying doping GaN nano wire array photoelectric cathode and preparation method thereof
CN109166878A (en) * 2018-09-29 2019-01-08 华南理工大学 Nano-pore LED array chip and preparation method thereof with anti-reflection passivation layer

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