CN110349829A - A kind of horizontal plasma continuous processing system - Google Patents
A kind of horizontal plasma continuous processing system Download PDFInfo
- Publication number
- CN110349829A CN110349829A CN201910744978.1A CN201910744978A CN110349829A CN 110349829 A CN110349829 A CN 110349829A CN 201910744978 A CN201910744978 A CN 201910744978A CN 110349829 A CN110349829 A CN 110349829A
- Authority
- CN
- China
- Prior art keywords
- process cavity
- room
- gas
- specimen chamber
- sample room
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims abstract description 137
- 230000008569 process Effects 0.000 claims abstract description 126
- 238000007664 blowing Methods 0.000 claims abstract description 27
- 238000010438 heat treatment Methods 0.000 claims abstract description 16
- 230000000740 bleeding effect Effects 0.000 claims description 20
- 238000005086 pumping Methods 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 8
- 238000000429 assembly Methods 0.000 claims description 4
- 230000000712 assembly Effects 0.000 claims description 4
- 230000004888 barrier function Effects 0.000 claims description 3
- 208000002925 dental caries Diseases 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 230000002045 lasting effect Effects 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 50
- 230000008676 import Effects 0.000 abstract description 4
- 238000009832 plasma treatment Methods 0.000 abstract description 3
- 230000006641 stabilisation Effects 0.000 abstract description 3
- 238000011105 stabilization Methods 0.000 abstract description 3
- 210000002381 plasma Anatomy 0.000 description 31
- 239000007789 gas Substances 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 230000006872 improvement Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000001360 synchronised effect Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000012802 pre-warming Methods 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 230000004913 activation Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32899—Multiple chambers, e.g. cluster tools
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/09—Treatments involving charged particles
- H05K2203/095—Plasma, e.g. for treating a substrate to improve adhesion with a conductor or for cleaning holes
Abstract
The invention discloses a kind of horizontal continuous plasma process systems, the system includes: a blowing room, one Sample Room, one process cavity, one goes out specimen chamber and a rewinding room, process cavity air pressure is equal to or less than using the Sample Room before and after adjusting process chamber and out specimen chamber air pressure and achievees the purpose that plasma continuous service so that process cavity does not have barometric fluctuation when passing in and out substrate；By the independent delivery roller that three sections or more are arranged in process cavity, the substrate that the idler wheel of import is sent for quickly receiving Sample Room, the idler wheel of outlet is for quickly by board transport to specimen chamber out, it ensure that the processing region feeding speed of middle section core is stablized constant, has accomplished the stabilization to substrate, continuous and continual processing；The processing substrate mode of horizontal continuity makes substrate pass through to continuous tandem heating region in process cavity, and the plasma treatment procedure that every plate base passes through is essentially identical；Thus the difference between plate and plate is reduced to minimum；And for monolithic pole plate, the plasma experience in region in the transmit direction is also identical, therefore the uniformity in single piece plate can also be better than the fixed single substrate in position.
Description
Technical field
The present invention relates to plasmas to the process field of material, is more particularly related to using low pressure plasma
It discharges come at the etching of glue residue in the hole for being generated in PC board fabricating processes and the horizontal continuity of surface cleaning activation
Reason method.
Background technique
Plasma etching technology is widely used in the glue residue removal in printed circuit board manufacture, surface modification and polytetrafluoro
The activation processing of ethylene.The apparatus for processing plasma that current industry generally uses is single-chamber multi-disc processing system, such as patent
The device that US20060163201A is proposed.As shown in Figure 1, the plasma etching system that the patent refers to includes an entirety
Plasma chamber 12, comprising at least a pair of electrode plate 38 being disposed vertically in cavity, (PCB is with all kinds of for processed substrate
Plate) 26 be fixed on frame 29 after, it is whole that frame 29 is pushed into cavity 12.Then substrate 26 be at electrode plate 38 it
Between gap in.After vacuumizing in the cavity and being passed through process gas, generated between electrode plate 38 by plasma electrical source etc.
Gas ions handle the substrate 26 electrode plate 38.It is readily apparent that such system architecture needs manually to carry out pair
Substrate 26 carries out upper and lower plates operation, thus can not be added to equipment in automatic continuous production system.Processing substrate it is uniform
Property depend on equipment plasma uniformity, under the framework of patent US20060163201A, in entire treatment process, base
Plate is fixed on motionless in working chamber, spatial position locating for each plate base, air flow method and electrode pad manufacture assembly
On difference it is different, be difficult to accomplish the consistency of plasma environment locating for same batch substrate, thus treated base
Not only there are biggish differences between plate and plate for plate, but also also have biggish uniform sex differernce on same plate.
Loading and unloading are required manual intervention for single-chamber multi-piece plasma processing system, and can not be continuous raw with automation
The problem of production is plugged into discloses a kind of horizontal continuous vacuum plasma processor in patent of invention CN204817348U.Such as Fig. 2
Shown, integral device is divided into feed end 4, electrostatic treatment room 5(plasma processing chamber), discharge end 6, and in 4 He of feed end
Two groove bodies 7 and 8 between electrostatic treatment room 5, two groove bodies 9 and 10 between electrostatic treatment room 5 and discharge end 6.Each slot
Body includes independent isolating door, vacuum pump and idler wheel；The indoor production process of patent of invention electrostatic is that plate reaches charging
End 4 is evacuated down to 10Torr, and 5 air pressure of electrostatic treatment room is increased to 10Torr, opens isolating door, and plate enters electrostatic treatment room,
Electrostatic treatment room is evacuated down to operating air pressure, starts to work；Processing terminate is also required to similar process and could go out at electrostatic for plate
Manage chamber body.Which results in the indoor plasmas of electrostatic, and a stable work is unable to maintain that during cavity barometric fluctuation
Make state, work is a kind of discrete beat-type；The operational efficiency and stability of whole equipment are very low.
Summary of the invention
In order to overcome drawbacks described above, the present invention provides a kind of horizontal plasma continuous processing systems, realize continuous
The real continuous processing production that plasma continues working in loading and unloading, process cavity.
The present invention is to solve technical solution used by its technical problem: a kind of horizontal plasma continuous processing
System, the system include: a blowing room, and a Sample Room, a process cavity, one goes out specimen chamber and a rewinding room, blowing
Between room and Sample Room, between Sample Room and process cavity, between process cavity and out specimen chamber, have between specimen chamber and rewinding room out respectively
Being capable of independently operated gas-tight door；
Blowing room, Sample Room, process cavity, specimen chamber and rewinding room have respective independently operated delivery roller system out；
Transmission system in process cavity is also divided into three sections of independently operated delivery roller systems；Respectively first section delivery roller group,
Middle section delivery roller group and latter end delivery roller group can be adjusted arbitrarily by the speed of the delivery roller group in control process cavity
The duration that section plank is handled in process cavity；Each delivery roller group is equipped with sensor,
First section roller group is neighbouring with Sample Room, and the region occupied is more than or equal to the length in a piece of substrate travel.In
Section roller group is core segment, occupies the central area of process cavity and the length of the overwhelming majority.Substrate plasma processing when
Between determined by controlling the speed of middle section idler wheel.Latter end roller group and specimen chamber out are neighbouring, the region occupied be more than or equal to
Length in a piece of substrate travel.For process cavity in the case where no substrate passes in and out, three sections of idler wheels are with the speed of middle section idler wheel
Synchronized operation.When originally on section idler wheel without substrate, the gas-tight door between Sample Room and process cavity is opened, the indoor roller group of sample introduction
It is synchronous with section wheel speeds at the beginning of process cavity, and passed the indoor substrate of sample introduction with the speed of service much higher than process cavity middle section idler wheel
It is defeated at the beginning of process cavity on section idler wheel.When board transport in place after, process cavity just section wheel speeds be restored to it is synchronized with middle section idler wheel,
Substrate is set handle and can be transferred on the idler wheel of middle section with the speed of process requirements.Similarly, have on latter end idler wheel a piece of complete
Substrate when, gas-tight door between specimen chamber and process cavity is opened out, and process cavity latter end idler wheel is synchronous with specimen chamber wheel speeds out, with
Substrate is transmitted to out specimen chamber from process cavity by the speed of service much higher than process cavity middle section idler wheel.When board transport in place after, end
Section idler wheel is restored to the substrate synchronized with middle section idler wheel, preparation reception will come from middle section idler wheel.Pass through point of three sections of idler wheels
Control is opened, substrate is affected not always when the middle section roller area of plasma core is handled, has accomplished plasma
It is the constant speed of processing, stabilization, continuous and uninterrupted.
Substrate is handled by heating region to continuous tandem in process cavity, so that every plate base passed through
Plasma treatment procedure is identical, thus the difference between plate and plate is reduced to minimum.And for monolithic pole plate, it is passing
The plasma experience in the region on defeated direction is also identical, therefore the uniformity in single piece plate can also be better than position and consolidate
Fixed single substrate；
After there is no plank in section delivery roller group at the beginning of the sensor sensing to process cavity of first section delivery roller group, open Sample Room and
Gas-tight door between process cavity, plank are quickly sent to process cavity from Sample Room, are then shut off gas-tight door, in latter end delivery roller group
Sensor sensing to process cavity latter end delivery roller group on pass by after a piece of complete plank, open process cavity and out specimen chamber it
Between gas-tight door, plank is quickly sent to out specimen chamber from process cavity, is then shut off gas-tight door；
Sample Room, process cavity and specimen chamber has independent pumping and inflation system out；After substrate enters Sample Room, Sample Room is taken out
Vacuum, stops pumping after the air pressure of sample introduction chamber pressure arrival process cavity, discharge chamber is filled with nitrogen to atmosphere after gas-tight door closing
Pressure condition opens gas-tight door, by board transport into rewinding room, by the power, gas and pumping speed that adjust every group of electrode zone
Rate can make plank carry out different processing during traveling and reach different processing intent
As a further improvement of the present invention, roller group conveyer system is the first delivery roller group in blowing room；In Sample Room
For the second delivery roller group；Delivery roller group in process cavity is subdivided into three groups of energy independent control, respectively just section transmission rolling
Wheel group, middle section delivery roller group and latter end delivery roller group；It is out third delivery roller group in specimen chamber；It is passed in rewinding room for the 4th
Roller group is sent, includes independently operated gas-tight door between each adjacent cavity, the gas-tight door between blowing room and Sample Room
For the first gas-tight door, the gas-tight door between Sample Room and process cavity is the second gas-tight door, airtight between process cavity and out specimen chamber
Door is third gas-tight door, and the gas-tight door between specimen chamber and rewinding room is the 4th gas-tight door, blowing room and Sample Room and rewinding out
It is normal atmosphere (An), process cavity and Sample Room and work that the condition that gas-tight door between room and out specimen chamber is opened, which is two cavitys,
Specimen chamber air pressure is identical as process cavity air pressure for Sample Room or out for the condition that gas-tight door between skill chamber and out specimen chamber is opened, so that
After gas-tight door is opened, the air pressure in process cavity is not in big ups and downs and influences the stable operation of plasma.
It as a further improvement of the present invention, include upper and lower two infrared radiation heating modules in Sample Room, it can be right
Product carries out quick heat temperature raising, after sample introduction chamber pressure is lower than 1Torr, pre-heating module carry out rapidly pre-warming two-sided to substrate
Heating makes substrate temperature close to the technological temperature of setting.
It as a further improvement of the present invention, include 4 groups of electrode assemblies in the process cavity, every group of electrode assembly includes
Upper and lower two identical pole plate assemblies, 4 groups of electrodes in process cavity are mutually indepedent, possess respective power supply, temperature control, gas supply system
System, certainly, the electrode module quantity of length and the Qi Nei configuration of process cavity can carry out in quantity according to actual process requirements
Increase and decrease, while the position of each electrode group is provided with independent bleeding point,
As a further improvement of the present invention, each electrode group possesses respective plasma exciatiaon power supply, and every group of electrode possesses
Independent air supply system, each air supply system includes 4 groups of MFC, for controlling oxygen, carbon tetrafluoride, argon gas and the inflow of nitrogen,
The position of every group of electrode is both provided with bleeding point, and each bleeding point is controlled the rate of pumping by a butterfly valve, at all electrodes
Bleeding point be finally aggregated into vacuum pump group.
As a further improvement of the present invention, radio-frequency voltage is loaded on the pole plate ontology, be used for and opposite other one
Plasma is formed between piece pole plate, the hot oil for being heated or cooled enters pole plate from entrance, flows uniformly through inside pole plate
It is flowed out afterwards from outlet.Reaction gas is flowed by import, and enters pole plate interior zone by metal tracheae, finally from jet
Mouth sprays, into heating region.
As a further improvement of the present invention, there is baffle N barrier between the electrode group in the process cavity, baffle has water
Flat gap allows delivery roller group and the product transmitted thereon to pass through.The respective gas supply of electrode group is because baffle is deposited
Most just to be siphoned away by vacuum-pumping system before being diffused into neighbouring baffle area.Wherein, it is evacuated the setting of baffle, is made
It obtains after the working gas being filled with from electrode zone can stop near product and be taken away again via the region of product side by bleeding point.
The narrow bleed-off passage that baffle is formed between pumping baffle and electrode increases the gas flow rate in the region, further prevents two
Gas phase counterdiffusion between electrode group.
As a further improvement of the present invention, the Sample Room is provided with independent vacuum pump group, vacuum pump group and sample introduction
The position of room connection is provided with solenoid valve, and solenoid valve is used to control the switch of Sample Room input nitrogen；Specimen chamber is provided with independence out
Vacuum pump group, the position that vacuum pump group is connect with specimen chamber out is provided with solenoid valve, and solenoid valve is for controlling out specimen chamber input nitrogen
The switch of gas.
As a further improvement of the present invention, in system operation, blowing room and rewinding room are in normal atmosphere always
Under pressure ring border, Sample Room and out specimen chamber need to change between normal atmosphere (An) numerical value and process cavity air pressure numerical value according to process,
Process cavity is in the operating air pressure of 0.10 ~ 0.30Torr always.Specifically atmospheric pressure value is determined by the process requirements of practical application,
The air pressure in each group electrode module region can be made the same, there can also be difference, no matter which kind of situation, each group electrode module region
Air pressure stablize constant so that plasma continuous service, the treatment process of substrate will not be interrupted.
The beneficial effects of the present invention are: being equal to or less than work using the Sample Room before and after adjusting process chamber and out specimen chamber air pressure
Skill chamber air pressure achievees the purpose that plasma continuous service so that process cavity does not have barometric fluctuation when passing in and out substrate；Pass through
In process cavity, three sections or more of independent delivery roller, the base that the idler wheel of import is sent for quickly receiving Sample Room are set
Plate, the idler wheel of outlet is for ensure that the processing region feeding speed of middle section core is stablized quickly by board transport to specimen chamber is gone out
It is constant, accomplish the stabilization to substrate, continuous and continual processing；The processing substrate mode of horizontal continuity makes substrate in technique
Pass through to intracavitary continuous tandem heating region, the plasma treatment procedure that every plate base passes through is essentially identical；Thus
Difference between plate and plate is reduced to minimum；And for monolithic pole plate, the plasma in region in the transmit direction
Experience is also identical, therefore the uniformity in single piece plate can also be better than the fixed single substrate in position.
Detailed description of the invention
Fig. 1 is the Detailed description of the invention of patent of invention US20060163201A；
Fig. 2 is the Detailed description of the invention of patent of invention CN204817348U；
Fig. 3 is a kind of preferred system architecture schematic diagram of the present invention, is respectively marked in attached drawing as follows: 1, blowing room, 2, Sample Room, 3,
Process cavity, 4, go out specimen chamber, 5, rewinding room, A1,1 delivery roller group of blowing room, A2,2 delivery roller group of Sample Room, A3, process cavity 3
A6, first section delivery roller group, A4,3 middle section delivery roller group of process cavity, A5,3 latter end delivery roller group of process cavity go out the biography of specimen chamber 4
Send roller group, A7,5 delivery roller group of rewinding room, gas-tight door between B1, blowing room 1 and Sample Room 2, B2, Sample Room 2 and technique
B4, gas-tight door between chamber 3, B3, process cavity 3 and gas-tight door between specimen chamber 4 out go out specimen chamber 4 and receive gas-tight door between specimen chamber 5, C,
2 pre-heating module of Sample Room, D, 3 electrode of process cavity；
Fig. 4 is a kind of preferred pole plate assembly construction of the present invention, and respectively mark in attached drawing as follows: H1, hot oil outlet, H2, hot oil enter
Mouthful, J1, gas access, J2, metal tracheae, J3, gas spout, K, pole plate ontology；
Fig. 5 is a kind of preferred each cavity pumping of the present invention, gas supply and power supply architecture schematic diagram, is respectively marked in attached drawing as follows: E1,
E3,2 exhaust pipe solenoid valve of Sample Room, E2,2 loading line solenoid valve of Sample Room go out 4 exhaust pipe solenoid valve of specimen chamber, E4, go out
F3,4 loading line solenoid valve of specimen chamber, F1,2 vacuum pump group of Sample Room, F2,3 vacuum pump group of process cavity go out 4 vacuum pump group of specimen chamber,
G1, first electrode position bleeding point butterfly valve, G2, second electrode position bleeding point butterfly valve, G3, third electrode position bleeding point butterfly valve, G4,
Four electrode position bleeding point butterfly valves, P1, first electrode power supply, P2, second electrode power supply, P3, third electrode supply, P4, the 4th electricity
Pole power supply；
Fig. 6 is the schematic diagram of baffle between a kind of preferred electrode group of the present invention, is respectively marked in attached drawing as follows: A, delivery roller group,
D, electrode, G, butterfly valve, L, bleeding point baffle, M, bleeding point, baffle between N, electrode group.
Specific embodiment
In order to deepen the understanding of the present invention, below in conjunction with embodiment and attached drawing, the invention will be further described, should
The examples are only for explaining the invention, is not intended to limit the scope of the present invention..
As shown in figure 3, a kind of horizontal plasma continuous processing system, which includes: a blowing room 1, one
Sample Room 2, a process cavity 3, one goes out specimen chamber 4 and a rewinding room 5, between blowing room 1 and Sample Room 2, Sample Room 2 and work
Between skill chamber 3, between process cavity 3 and out specimen chamber 4, have between the 5 of specimen chamber 4 and rewinding room out it is respective can be independently operated airtight
Door；
Blowing room 1, Sample Room 2, process cavity 3, specimen chamber 4 and rewinding room 5 have respective independently operated delivery roller system out；
Transmission system in process cavity 3 is also divided into three sections of independently operated delivery roller systems；Respectively first section delivery roller group
A3, middle section delivery roller group A4 and latter end delivery roller group A5 pass through the speed of delivery roller group A3 ~ A5 in control process cavity 3
Degree, can arbitrarily adjust the duration that plank is handled in process cavity；Each delivery roller group is equipped with sensor,
Sample introduction is opened after no plank on section delivery roller group A3 at the beginning of the sensor sensing to process cavity of first section delivery roller group A3
Gas-tight door B2 between room and process cavity, plank are quickly sent to process cavity 3 from Sample Room 2, are then shut off gas-tight door B2, and latter end passes
After sending a piece of complete plank of passing by the sensor sensing to process cavity latter end delivery roller group A5 on roller group A5, work is opened
Gas-tight door B3 between skill chamber and out specimen chamber, plank are quickly sent to out specimen chamber 4 from process cavity, are then shut off gas-tight door B3；
Sample Room 2, process cavity 3 and specimen chamber 4 has independent pumping and inflation system out；After substrate enters Sample Room 2, Sample Room 2
It is vacuumized, stops pumping after the air pressure of 2 pressure of Sample Room arrival process cavity, discharge chamber 4 is filled with after gas-tight door B3 closing
Nitrogen opens gas-tight door B4 to atmospheric pressure state, by board transport into rewinding room 5, by adjust every group of electrode zone power,
Gas and the speed of exhaust can make plank carry out different processing during traveling and reach different processing intent
Roller group conveyer system is the first delivery roller group A1 in blowing room 1；It is the second delivery roller group A2 in Sample Room 2；
Delivery roller group in process cavity 3 is subdivided into three groups of energy independent control, respectively just section delivery roller group A3, middle section transmission rolling
Wheel group A4 and latter end delivery roller group A5；It is out third delivery roller group A6 in specimen chamber 4；It is the 4th delivery roller in rewinding room 5
A7 is organized, includes independently operated gas-tight door between each adjacent cavity, the gas-tight door between blowing room 1 and Sample Room 2 is
First gas-tight door B1, the gas-tight door between Sample Room 2 and process cavity 3 is the second gas-tight door B2, between process cavity 3 and out specimen chamber 4
Gas-tight door be third gas-tight door B3, out the gas-tight door between specimen chamber 4 and rewinding room 5 be the 4th gas-tight door B4, blowing room 1 and into
It is normal atmosphere (An), technique that the condition that gas-tight door between specimen chamber 2 and rewinding room 5 and out specimen chamber 4 is opened, which is two cavitys,
The condition that gas-tight door between chamber 3 and Sample Room 2 and process cavity 3 and out specimen chamber 4 is opened is Sample Room 2 or 4 air pressure of specimen chamber out
It is identical as process cavity air pressure so that after gas-tight door opening, the air pressure in process cavity is not in big ups and downs and influences etc. from
The stable operation of daughter.
Two infrared radiation heating modules above and below including in Sample Room 2 can carry out quick heat temperature raising to product, when
After 2 pressure of Sample Room is lower than 1Torr, pre-heating module C carry out rapidly pre-warming heating two-sided to substrate makes substrate temperature is close to set
Fixed technological temperature, technological temperature are determined that range is at 40 ~ 100 DEG C by specific technique.
It include 4 groups of electrode assemblies in the process cavity 3, every group of electrode assembly includes that upper and lower two identical pole plates are total
At 4 groups of electrodes in process cavity 3 are mutually indepedent, possess respective power supply, temperature control, air supply system, while the position of each electrode group
It installs and is equipped with independent bleeding point, as shown in figure 5,
Each electrode group possesses respective plasma exciatiaon power supply P1 ~ P4, and every group of electrode possesses independent air supply system, each
Air supply system includes 4 groups of MFC, and for controlling oxygen, carbon tetrafluoride, argon gas and the inflow of nitrogen, the position of every group of electrode is all set
It is equipped with bleeding point, each bleeding point is controlled the rate of pumping by a butterfly valve G1 ~ G4, and the bleeding point at all electrodes finally converges
Always arrive vacuum pump group F2.
As shown in figure 4, loading radio-frequency voltage on the pole plate ontology K, it to be used for the shape between opposite other a piece of pole plate
At plasma, the hot oil for being heated or cooled enters pole plate from entrance H2, from outlet H1 after flowing uniformly through inside pole plate
Outflow.Reaction gas is flowed by import J1, and enters pole plate interior zone by metal tracheae J2, finally from puff prot J3
It sprays, into heating region.
As shown in fig. 6, there is baffle N barrier between electrode group in the process cavity 3, baffle N has horizontal gap, permits
Perhaps delivery roller group and the product transmitted thereon pass through.Presence of the respective gas supply of electrode group because of baffle N, the overwhelming majority
It is just siphoned away by vacuum-pumping system before being diffused into neighbouring baffle area.Wherein, it is evacuated the setting of baffle L, so that from electrode district
The working gas that domain is filled with is taken away via the region of product side by bleeding point again after capable of stopping near product.It is evacuated baffle L
The narrow bleed-off passage that baffle N is formed between electrode increases the gas flow rate in the region, further prevents two electrode groups
Between gas phase counterdiffusion.
The Sample Room 2 is provided with independent vacuum pump group F1, and the position that vacuum pump group F1 is connect with Sample Room 2 is provided with
Solenoid valve E1, solenoid valve E2 are used to control the switch that Sample Room 2 inputs nitrogen；Specimen chamber 4 is provided with independent vacuum pump group F3 out,
Vacuum pump group F3 is provided with solenoid valve E3 with the position that specimen chamber 4 is connect out, and solenoid valve E4 is used to control out specimen chamber 4 and inputs nitrogen
Switch.
In system operation, blowing room 1 and rewinding room 5 are in always under normal atmosphere (An) environment, Sample Room 2 and out sample
Room 4 needs to change between normal atmosphere (An) numerical value and process cavity air pressure numerical value according to process, and process cavity 3 is in 0.10 always ~
Under the operating air pressure of 0.30Torr, specific atmospheric pressure value is determined by the process requirements of practical application, can make each group electrode mould
The air pressure in block region is the same, can also there is difference, no matter which kind of situation, the air pressure in each group electrode module region be stablize it is constant
, so that plasma continuous service, the treatment process of substrate will not be interrupted.
The course of work of this system is as follows:
One, blowing room 1 is atmospheric environment, and the manually or mechanically mode that can carry out puts plate；
Two, after the sensor sensing in blowing room 1 is put into substrate, gas-tight door B1 is opened, board transport is entered into Sample Room 2,
It is then shut off gas-tight door B1；
Three, after substrate enters Sample Room 2, Sample Room 2 is vacuumized, and after pressure is lower than 1Torr, pre-heating module C is to base
The two-sided carry out rapidly pre-warming heating of plate makes substrate temperature close to technological temperature, stops after the air pressure of 2 pressure of Sample Room arrival process cavity
Only it is evacuated；
Four, gas-tight door is opened after no substrate on the sensor sensing in process cavity 3 to process cavity 3 just section delivery roller group A3
B2, substrate are quickly sent to process cavity 3 from Sample Room 2, are then shut off gas-tight door B2, and Sample Room 2 is filled with nitrogen and is restored to atmosphere
Pressure condition；
It five, include 4 groups of electrode D in process cavity 3, every group of pole plate includes respective power supply, gas is supplied and heating system,
Each group pole plate is allowed individually to control respective parameter.By applying radio-frequency voltage on pole plate, so that the gas point between pole plate
Son, which is excited to ionize, generates plasma, carries out surface treatment and de-smear to substrate.Pass through the transmission rolling in control process cavity 3
The speed of wheel group A3 ~ A5 can arbitrarily adjust the duration that substrate is handled in process cavity.By the function for adjusting every group of electrode zone
Rate, gas and the speed of exhaust can make substrate carry out different processing during traveling and reach different processing intents；
Six, it passes by the sensor sensing in process cavity 3 to 3 latter end delivery roller group A5 of process cavity after a piece of complete substrate,
Gas-tight door B3 is opened, substrate is quickly sent to out specimen chamber 4 from process cavity 3, is then shut off gas-tight door B3；
Seven, length is large enough to hold multi-piece substrate in process cavity 3, substrate can be made continuously to input from Sample Room 2, from sample out
Room 4 exports, and the plasma in process cavity 3 does not interrupt, and reaches continuous processing purpose；
Eight, discharge chamber 4 is filled with nitrogen to atmospheric pressure state, opens gas-tight door B4 after gas-tight door B3 closing, by board transport into
Rewinding room 5 is plugged into the automation equipment of follow-up process from 5 science and technology of rewinding room.
Claims (8)
1. a kind of horizontal plasma continuous processing system, which is characterized in that the system includes: a blowing room 1, one into
Specimen chamber 2, a process cavity 3, one goes out specimen chamber 4 and a rewinding room 5, between blowing room 1 and Sample Room 2, Sample Room 2 and technique
Between chamber 3, between process cavity 3 and out specimen chamber 4, have between specimen chamber 4 and rewinding room 5 out it is respective can be independently operated airtight
Door；
Blowing room 1, Sample Room 2, process cavity 3, specimen chamber 4 and rewinding room 5 have respective independently operated delivery roller system out；
Transmission system in process cavity 3 is also divided into three sections of independently operated delivery roller systems；
Sample Room 2, process cavity 3 and specimen chamber 4 has independent pumping and an inflation system out, the lasting work of process cavity when realizing input and output material
Make.
2. a kind of horizontal plasma continuous processing system according to claim 1, it is characterised in that: roller group transmission
System is the first delivery roller group A1 in blowing room 1；It is the second delivery roller group A2 in Sample Room 2；Transmission in process cavity 3
Roller group is subdivided into three groups of energy independent control, and respectively just section delivery roller group A3, middle section delivery roller group A4 and latter end pass
Send roller group A5；It is out third delivery roller group A6 in specimen chamber 4；It is the 4th delivery roller group A7 in rewinding room 5, it is each adjacent
It include independently operated gas-tight door between cavity, the gas-tight door between blowing room 1 and Sample Room 2 is the first gas-tight door B1, into
Gas-tight door between specimen chamber 2 and process cavity 3 is the second gas-tight door B2, and the gas-tight door between process cavity 3 and out specimen chamber 4 is third gas
Close door B3, the gas-tight door between specimen chamber 4 and rewinding room 5 is the 4th gas-tight door B4, blowing room 1 and Sample Room 2 and rewinding room 5 out
The condition that gas-tight door between specimen chamber 4 is opened out be two cavitys be normal atmosphere (An), process cavity 3 and Sample Room 2 and
4 air pressure of specimen chamber is identical as process cavity air pressure for Sample Room 2 or out for the condition that gas-tight door between process cavity 3 and out specimen chamber 4 is opened
Or it is slightly lower.
3. a kind of horizontal plasma continuous processing system according to claim 1, it is characterised in that: in Sample Room 2
Two infrared radiation heating modules above and below including can carry out quick heat temperature raising to product.
4. a kind of horizontal plasma continuous processing system according to claim 1, it is characterised in that: the process cavity
It include 4 groups or 4 groups or more of electrode assembly in 3, every group of electrode assembly includes upper and lower two identical pole plate assemblies, process cavity
Every group of electrode in 3 is mutually indepedent, possesses respective power supply, temperature control, air supply system, while the position of each electrode group is provided with
Independent bleeding point.
5. a kind of horizontal plasma continuous processing system according to claim 4, it is characterised in that: each electrode group
Possess respective plasma exciatiaon power supply, each electrode group possesses independent air supply system, and each air supply system includes multiple groups
Gas mass flow controller, for controlling the inflow of different operating gas；The position of every group of electrode is both provided with bleeding point, often
A bleeding point is controlled the rate of pumping by a butterfly valve, and the bleeding point at all electrodes is finally aggregated into the gas supply of process cavity 3
System.
6. a kind of horizontal plasma continuous processing system according to claim 4, it is characterised in that: each pole plate sheet
It is loaded on body K and forms plasma between radio-frequency voltage and opposite other a piece of pole plate；Liquid for being heated or cooled is situated between
Matter enters pole plate, flows out after flowing uniformly through inside pole plate.
7. a kind of horizontal plasma continuous processing system according to claim 4, it is characterised in that: the process cavity
There is baffle N barrier between electrode group in 3, there is baffle N horizontal permission delivery roller group and the product transmitted thereon to pass through
Gap.
8. a kind of horizontal plasma continuous processing system according to claim 1, it is characterised in that: system was run
Cheng Zhong, blowing room 1 and rewinding room 5 are in always under normal atmosphere (An) environment, and Sample Room 2 and out specimen chamber 4 are needed according to process
It is changed between normal atmosphere (An) numerical value and process cavity air pressure numerical value, process cavity 3 is in the operating air pressure of 0.10 ~ 0.30Torr always
Under.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910744978.1A CN110349829B (en) | 2019-08-13 | 2019-08-13 | Horizontal plasma continuous treatment system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910744978.1A CN110349829B (en) | 2019-08-13 | 2019-08-13 | Horizontal plasma continuous treatment system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110349829A true CN110349829A (en) | 2019-10-18 |
| CN110349829B CN110349829B (en) | 2024-02-23 |
Family
ID=68184890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910744978.1A Active CN110349829B (en) | 2019-08-13 | 2019-08-13 | Horizontal plasma continuous treatment system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110349829B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI729886B (en) * | 2020-07-21 | 2021-06-01 | 群翊工業股份有限公司 | Continuous vacuum heating equipment |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1875454A (en) * | 2003-10-28 | 2006-12-06 | 诺信公司 | Plasma processing system and plasma treatment process |
| US20060289409A1 (en) * | 2005-05-23 | 2006-12-28 | Dae-Kyu Choi | Plasma source with discharge inducing bridge and plasma processing system using the same |
| CN104167381A (en) * | 2014-07-11 | 2014-11-26 | 湖南红太阳光电科技有限公司 | Continuous vacuum ultraviolet light ozone surface cleaning and oxidation modification equipment and using method thereof |
| CN210223943U (en) * | 2019-08-13 | 2020-03-31 | 扬州国兴技术有限公司 | Horizontal plasma continuous processing system |
-
2019
- 2019-08-13 CN CN201910744978.1A patent/CN110349829B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1875454A (en) * | 2003-10-28 | 2006-12-06 | 诺信公司 | Plasma processing system and plasma treatment process |
| US20060289409A1 (en) * | 2005-05-23 | 2006-12-28 | Dae-Kyu Choi | Plasma source with discharge inducing bridge and plasma processing system using the same |
| CN104167381A (en) * | 2014-07-11 | 2014-11-26 | 湖南红太阳光电科技有限公司 | Continuous vacuum ultraviolet light ozone surface cleaning and oxidation modification equipment and using method thereof |
| CN210223943U (en) * | 2019-08-13 | 2020-03-31 | 扬州国兴技术有限公司 | Horizontal plasma continuous processing system |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI729886B (en) * | 2020-07-21 | 2021-06-01 | 群翊工業股份有限公司 | Continuous vacuum heating equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110349829B (en) | 2024-02-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7972444B2 (en) | Workpiece support with fluid zones for temperature control | |
| EP2118334A1 (en) | Vacuum coating apparatus | |
| CN101497990B (en) | Sputtering film-plating apparatus | |
| US20130015054A1 (en) | Method of controlling lithium uniformity | |
| US11512386B2 (en) | Film formation device for cutting tool provided with coating film, and film formation method for cutting tool provided with coating film | |
| CN110349829A (en) | A kind of horizontal plasma continuous processing system | |
| TW201346064A (en) | Static deposition profile modulation for linear plasma source | |
| CN103122448A (en) | Vertical Heat Treatment Furnace Structure | |
| JP5119830B2 (en) | Plasma device | |
| TWI692797B (en) | Plasma treatment device | |
| CN202166807U (en) | Pre-solidifying equipment for directional film | |
| CN102586759B (en) | Gas delivery system and semiconductor processing equipment applying same | |
| CN210223943U (en) | Horizontal plasma continuous processing system | |
| TW201319298A (en) | Vacuum coating apparatus | |
| WO2019179327A1 (en) | Dry etching apparatus | |
| US8118982B2 (en) | Gas flow set-up for multiple, interacting reactive sputter sources | |
| CN212560432U (en) | Multi-path air-inlet multi-stage rectification air path system of vacuum coating equipment | |
| TW201327618A (en) | Vacuum coating apparatus | |
| CN213124388U (en) | Equipment for controlling wafer curvature | |
| CN209412302U (en) | A kind of vacuum coating system of the compound PVD of vertical PECVD | |
| KR20190138670A (en) | Deposition apparatus and deposition method | |
| CN220012796U (en) | Film feeding chamber device of film plating equipment | |
| TWI399456B (en) | Apparatus for conductive film coating and method for processing substrates therein | |
| JP2015185494A (en) | Plasma treatment apparatus and plasma treatment method | |
| CN212800161U (en) | Thinning equipment for glass production |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |