CN110195213A - The fabricated construction and method of intracavity magnetron sputtering plating room - Google Patents
The fabricated construction and method of intracavity magnetron sputtering plating room Download PDFInfo
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- CN110195213A CN110195213A CN201910507205.1A CN201910507205A CN110195213A CN 110195213 A CN110195213 A CN 110195213A CN 201910507205 A CN201910507205 A CN 201910507205A CN 110195213 A CN110195213 A CN 110195213A
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- intracavity
- plated film
- magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
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- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides the fabricated construction and method of a kind of intracavity magnetron sputtering plating room, the continuous coating room passed through including inside for plated film tube, the continuous coating room is respectively equipped with the target of fixed sleeving, the magnet of annular and annular from outside to inside, the both ends of the fixed sleeving are equipped with vacuum seal valve, and are equipped with inside and outside bleeding point and gas distribution pipe；There is the target several and axial directions along coating chamber to splice, and adjacent target insulation strip mutually completely cuts off, and several targets are respectively connected with external power supply；The magnet in the form of sheets, stacks gradually in the axial direction of coating chamber, respectively corresponds arrangement with each target.The present invention can be according to the different requirements for needing film plating layer, the target and combinations thereof of design different length is assemblied in the fixed sleeving of corresponding length then according to the composition situation of target, and magnet can also be laminated to corresponding length position according to target length, improve the adaptability of intracavity filming equipment.
Description
Technical field
The present invention relates to a kind of magnetic-controlled sputtering coating equipments, more particularly to a kind of slot type mirror surface thermal-collecting tube magnetron sputtering
Film device belongs to solar energy optical-thermal production equipment field.
Background technique
Currently, focus solar collector is different according to the shape of receiver, be broadly divided into slot type, tower, dish-style with
And composite parabolic formula several types, wherein trench light condensing system is to develop and use a kind of most heat collector classes both at home and abroad at present
The advantages that type is primarily due to it with easy for installation, and structure is simple, and secure and reliable property is high.Solar groove type heat collector exists
Leading position is occupied in solar energy utilization system, it provides heat source for system, and efficiency and cost of investment influence whether entirely to collect
The efficiency and economy of hot systems.
Main element of the solar thermal collector as solar thermal utilization, be widely used value, but compares
Under, solar groove type heat collector has the higher thermal efficiency than traditional solar thermal collector, especially has in hot power field
There is quite mature application technology.
Groove type heat collector be it is a kind of by be photothermal conversion in the way of, pass through the processes such as focusing, reflection and absorption realize light
The conversion that thermal energy can be arrived, makes heat transferring medium reach certain temperature, to meet the heat collector of the needs of different loads.Slot type thermal-arrest
Device belongs to the scope of high temperature heat collector, and heat-exchange working medium can be made to obtain relatively high temperature, can be used heat power generation, seawater it is light
The lives such as change processing, heating engineering, absorption refrigeration and production field.
Due to the wide application prospect of solar energy, solar energy is the main energy sources of current groove type heat collector.Solar energy
Groove type heat collector occupies leading position in solar energy utilization system, it provides heat source, efficiency and cost of investment meeting for system
Influence the efficiency and economy of entire collecting system.Groove type solar heat collector uses glass tube with vacuum structure, i.e. inner tube
Using the metal tube for being coated with high-absorbility coating for selective absorption, heat medium is walked in pipe, is outside glass tube, glass tube with
It is vacuumized between metal tube to inhibit convection current and conductive heat loss.
Wherein groove type paraboloid thermal-collecting tube is the core component of the system, and existing both at home and abroad with the magnetron sputtering deposition sun
Based on energy coating for selective absorption, the length of groove type paraboloid thermal-collecting tube is limited by coating machine, in order to easy to operate, 2000mm
The steel pipe plated film mode of left and right selects vertical plated film, it is contemplated that replacement magnetic control spattering target, the convenience for loading and unloading steel pipe substrate,
The steel pipe plated film mode of 4000mm or so or more selects horizontal.
Existing continuous coating production line is mostly located on the periphery of plated film tube using complicated sputtering equipment, and utilization is star-like
The mode of rotation carries out plated film, this production line not only cumbersome heaviness, and due to target to coated surface distance is remote, magnetic field not
Uniformly, the problem that there is also the plated film uniformitys is low, deposition rate is low.
Also have a small number of coating film production lines use intracavity sputtering equipment, such as CN201510242400.8 and
The patents such as CN201711066320.7, but these equipment are only suitable for carrying out the plated film tube of specific model the magnetic control plating of special component
Film can not switch rapidly when the ingredient of target plated film changes, and adapt to poor.
Summary of the invention
The present invention provides the fabricated construction and method of a kind of intracavity magnetron sputtering plating room, is to solve existing dress
Set existing above-mentioned technical problem.
To achieve the above object, the technical solution adopted by the present invention is that:
The fabricated construction of a kind of intracavity magnetron sputtering plating room, it is characterised in that: logical for plated film tube including inside
The continuous coating room crossed, the continuous coating room are respectively equipped with the target of fixed sleeving, the magnet of annular and annular from outside to inside,
Wherein:
The both ends of the fixed sleeving are equipped with vacuum seal valve, and are equipped with inside and outside bleeding point and gas distribution pipe；
There is the target several and axial directions along coating chamber to splice, and adjacent target insulation strip mutually completely cuts off, number
A target is respectively connected with external power supply；
The magnet in the form of sheets, stacks gradually in the axial direction of coating chamber, respectively corresponds arrangement with each target.
The fabricated construction of the intracavity magnetron sputtering plating room, in which: be communicated in one end of continuous coating room
Inlet pipe room, the other end are communicated with outlet pipe room, are respectively equipped with vacuum seal valve in the outer end of inlet pipe room and in the outer end of outlet pipe room,
Inlet pipe room, continuous coating room and outlet pipe room is set to seal respectively.
The fabricated construction of the intracavity magnetron sputtering plating room, in which: the magnet is permanent magnet or electromagnet,
Its groove location that fixed sleeving inner wall is embedded according to same pole direction.
The fabricated construction of the intracavity magnetron sputtering plating room, in which: use barrier partitions between adjacent target
It opens, the perforation passed through for plated film tube is offered on baffle.
The fabricated construction of the intracavity magnetron sputtering plating room, in which: the vacuum seal valve is that diaphragm is variable
Valve.
The assembly method of a kind of intracavity magnetron sputtering plating room, wherein include:
Firstly, according to required film layer technique complete target composition design, that is, calculate required target type and respectively
Length；
Later, it is designed according to the composition of target, selects the fixed sleeving of corresponding length, set in the stacking of each fixed sleeving inner wall
Magnet is set, target is fixed on the inside of magnet, fixed sleeving is sequentially spliced, and at the both ends for completing spliced fixed sleeving
Vacuum seal valve is installed, continuous coating room is constituted.
The assembly method of the intracavity magnetron sputtering plating room, in which: inlet pipe room and outlet pipe room are also mounted on company
The both ends of continuous coating chamber, and vacuum seal valve is installed respectively in the outer end of inlet pipe room and in the outer end of outlet pipe room.
Compared with prior art, the invention has the advantages that: can be according to needing the different of film plating layer to require, design
Target of different length and combinations thereof is assemblied in the fixed sleeving of corresponding length then according to the composition situation of target, and magnetic
Iron can also be laminated to corresponding length position according to target length, improve the adaptability of intracavity filming equipment.
Detailed description of the invention
Fig. 1 is the overall structure diagram of intracavity continuous magnetron sputtering filming equipment provided by the invention；
Fig. 2 is the partial cross-sectional view of intracavity continuous magnetron sputtering filming equipment；
Fig. 2A is the encircled portion partial enlarged view of Fig. 2；
Fig. 3 is the sectional side elevation of intracavity continuous magnetron sputtering filming equipment；
Fig. 4-Fig. 8 is that plated film tube and support column interoperation illustrate group picture；
Fig. 9 is diaphragm vario valve sectional side elevation in the open state；
Figure 10 is diaphragm vario valve sectional side elevation in the open state.
Description of symbols: 101- plated film tube；102- inlet pipe room；103- continuous coating room；104- outlet pipe room；105- pumping
Mouthful；106- gas distribution pipe；107- power supply line；108- vacuum seal valve；201- fixed sleeving；202- magnet；203- target；204- gear
Plate；205- insulated enclosure circle；206- transmission bracket；207- counter weight device；301- drive rod；401- motor；402- outer support column；
403- inner support column.
Specific embodiment
Hereinafter reference will be made to the drawings is described in detail by way of example and not limitation some specific embodiments of the present invention.
Identical appended drawing reference denotes same or similar part or part in attached drawing.It should be appreciated by those skilled in the art that these
Attached drawing is not necessarily to be depicted true to scale.
As shown in Figure 1, the present invention provides a kind of intracavity continuous magnetron sputtering filming equipment, including hollow chamber and edge
The drive mechanism of the length direction arrangement of the hollow chamber, in which:
As shown in Figure 1, Figure 2, Figure 3 shows, the hollow chamber is by inlet pipe room 102, continuous coating room 103 and outlet pipe room 104
Be sequentially communicated composition, be respectively equipped with vacuum seal valve 108 at the both ends of inlet pipe room 102 and at the both ends of outlet pipe room 104, make into
Pipe room 102, continuous coating room 103 and outlet pipe room 104 can seal respectively；Inlet pipe room 102, continuous coating room 103 and
It is respectively equipped with bleeding point 105 on outlet pipe room 104, assembles insulated enclosure circle 205 at bleeding point 105, makes inlet pipe room 102, continuous plating
Film room 103 and outlet pipe room 104 can vacuumize respectively；The continuous coating room 103 is respectively equipped with fixed sleeving from outside to inside
201, in the target 203 of annular magnet 202 and annular, the center of annular magnet 202 and the target 203 of annular
The central axis for the plated film tube 101 that heart position is preferably driven with drive mechanism coincides；Wherein: magnet 202 can be forever
Magnet or electromagnet, the groove location of fixed sleeving 201 is embedded according to same pole direction, and target 203 is assemblied in magnet
202 inner side, and external power supply is connected to by power supply line 107；Inside and outside cloth is equipped on continuous coating room 103
Tracheae 106 also is provided with insulated enclosure circle 205 in the inner end positions of gas distribution pipe 106；
Referring again to shown in Fig. 2, the continuous coating room 103 can be divided into the sputtering zone of different targets 203, different sputterings
The baffle 204 that available radial is arranged between area separates, and baffle 204 can prevent sputtering from interfering, additionally it is possible to maintain gas field to stablize, prevent
Only gas field disturbs, wherein the distance between baffle 204 and plated film tube 101 should be not more than 5mm, and there are confessions for 204 center of baffle
The perforation that the plated film tube 101 that drive mechanism and drive mechanism are driven passes through；Each sputtering zone can have several along axial spelling
The target 203 connect, the most handy insulation strip of adjacent target 203 mutually completely cut off, and supply power supply (power and target respectively to facilitate
Material length is essentially proportional relation)；Due to the structure using multiple sputtering zones and splice 203 structure of target of form, it can be with
According to coating process, arbitrarily setting each process, the material and length of each position target 203, in general, the length of target 203
It is directly proportional to the deposition thickness for the film layer that plated film tube 101 need to plate；
As shown in Fig. 2, the magnet 202 sheet in a ring, stacks gradually in the axial direction of continuous coating room 103, it is corresponding
In the target 203 of different length, adaptation can be easily formed；
In the preferred embodiment, 103 length of continuous coating room is 0.5-2 times of the length of single plated film tube 101
(1000mm-10000mm), preferably 1 times of (2000-3000mm；4000-8000mm)；And the magnetic strength on 202 surface of magnet
Answering intensity is preferably 3000-5000 Gauss；The outer surface of the plated film tube 101 is preferably 50- at a distance from 203 inner surface of target
250mm, more preferably 80-100mm；And 202 inner surface of magnet is 1-10mm at a distance from 203 outer surface of target, preferably
For 1-3mm；In addition, in order to preferably obstruct sputtering interference and gas field interference, between the adjacent target 203 in same sputtering zone
Also the baffle 204 can be set；
As shown in Figure 1, Figure 2, shown in Fig. 2A, Fig. 3, the drive mechanism includes the biography that rotation is driven by transmission power source (such as motor)
Lever 301, the drive rod 301 penetrate in the hollow chamber, and both ends are respectively from the inlet pipe room 102 and outlet pipe room 104
Middle stretching is equipped with motion thread in the outer surface of drive rod 301, and is arranged on drive rod 301 and is formed with motion thread
The transmission bracket 206 of threaded connection, every plated film tube are nested with by several (at least four) transmission brackets 206 in drive rod 301
On, and lower part merging has several counter weight devices 207 in plated film tube 101, makes plated film tube 101 can not rotation；When drive rod 301 revolves
When rotation is made, transmission bracket 206 drives plated film tube 101 to penetrate the hollow chamber from one end of drive rod 301, then from transmission
The other end of bar 301 is pierced by the hollow chamber, and completes magnetron sputtering plating during passing through hollow chamber.
In order to support the drive rod 301, and guarantee that plated film tube 101 is placed on drive rod 301 and from drive rod 301
On the movement removed will not influence the support and rotation of drive rod 301, as shown in Fig. 4-Fig. 8, drive rod 301 is from inlet pipe room 102
And the one end stretched out of outlet pipe room 104 be respectively equipped with the inner support column 403 that is spaced apart and outer support column 402 (inner support column with
The top of outer support column can be in U-shape or V-arrangement, can prevent drive rod from deviating or falling), moreover, the both ends of drive rod 301 are each logical
The non-circular transmission shaft grafting for crossing a non-circular recess and a motor 401 makes drive rod by two motors 401 band together
Dynamic rotation；Plated film tube 101 is placed on drive rod 301, is as follows by hollow chamber and the process removed from drive rod 301:
(1) as shown in figure 4, the motor 401 of inlet pipe outside is taken away, and by the outer support column in the outside of inlet pipe room 102
402 take away, and several 206 compartment of terrain of transmission bracket are inserted on the drive rod 301 in 102 outside of inlet pipe room, then will have counterweight
The plated film tube 101 of device 207 is set in several transmission brackets 206；By the rotation of the motor 401 in 104 outside of outlet pipe room
Turn driving drive rod 301 to rotate, plated film tube 101 is made to advance；
(2) when the outer support column 402 that the position of plated film tube 101 does not influence 102 outside of inlet pipe room is installed, by inlet pipe room
The outer support column 402 in 102 outsides installs, and the motor in 102 outside of inlet pipe room and drive rod 301 are formed and connected, and relies on two
The synchronous rotary driving drive rod 301 of a motor 401 rotates, and moves on plated film tube 101；
(3) as shown in figure 5, the inner support column 403 in 102 outside of inlet pipe room is taken away, make it that plated film tube 101 not interfered to enter
In hollow chamber；
(4) as shown in fig. 6, plated film tube 101 enters in hollow chamber, multilayer film is successively plated；
(5) as shown in fig. 7, the inner support column 403 in 104 outside of outlet pipe room is taken away, it is made not interfere plated film tube 101 in
It is mobile outside plenum chamber；
(6) as shown in figure 8, when the inner support column 403 that the position of plated film tube 101 does not influence 104 outside of outlet pipe room is installed,
The inner support column 403 in the outside of outlet pipe room 104 is installed, the outer support column 402 in 104 outside of outlet pipe room is taken away, and by outlet pipe
The motor 401 in 104 outside of room is taken away, and rotates by the rotation driving drive rod 301 of the motor 401 in 102 outside of inlet pipe room, makes to plate
Membrane tube moves on, until taking out (also removing transmission bracket 207) from the end of drive rod 301；
In this way, completing the magnetron sputtering plating work an of plated film tube, certainly, above-described embodiment is in order to state feelings
Condition, only depicts a plated film tube in figure, and in fact, plated film tube should be placed on drive rod successively one by one, with
And removed from drive rod successively, detailed process is the simple superposition of the process of above-mentioned single plated film tube, is refused herein
It repeats.
In addition, if the diameter of plated film tube be more than the drive rod diameter to a certain degree, can make to be assemblied in transmission bracket
On plated film tube center of gravity be lower than drive rod centre of gyration certain amplitude, can make plated film tube by itself gravity holding do not send out
It is born from and turns, then it can also uneasy assembly weight structure.
Fig. 9, Figure 10 are please referred to again, and vacuum seal valve used in the present invention is a kind of light similar to camera aperture structure
Late vario valve, mechanical structure is in CN102138034B " iris-shaped variable valve " and CN207049355U " manual airtight valve
It is documented in door ", it will not be described here, and its control mode, can be used and manually controls, can also increase motor and be formed automatically
Control, this is conventional technical means, and also it will not go into details herein；It is that diaphragm vario valve is in the open state shown in Fig. 9, plated film at this time
Pipe can pass therethrough, and be that diaphragm vario valve is in close state shown in Figure 10, be fitted tightly on the periphery of drive rod, shape
At airtight effect；In order to avoid the motion thread on the outside of drive rod influences airtight effect, the motion thread corresponds to the light
The focal length position of cable vario valve can be not provided with screw thread, as long as the reach in transmission bracket is greater than the focal length,
Transmission bracket is nor affected on across the focal length.
The working method for introducing intracavity continuous magnetron sputtering filming equipment of the invention is as follows:
Firstly, being designed according to the composition that required film layer technique completes target 203:
Such as: plated film tube needs the film layer that deposits from inside to outside successively are as follows: 90 nanometers of infrared reflecting layers (silver layer), 70 nanometers
High-selenium corn layer (+50% molybdenum of+30% titanium of 20% titanium oxynitrides), (+5% aluminium+25% of 70% aluminum oxynitride is or not 50 nanometers of low absorption layers
Become rusty steel) and 80 nanometers of anti-reflection layers (aluminum oxide).According to the thickness of film layer and the sputter rate of deposition rate, target
To calculate the length of required corresponding target: successively are as follows: silver-colored target 90cm；Titanium target and molybdenum target mixing match (1:1) total length
120cm；Aluminium target and stainless target mixing match (3:1) total length 120cm；Aluminium target 160cm.
Replacement, fine tuning film layer composition, thickness can be reached by replacing different targets, adjusting the parameters such as target length, power
The effect of the techniques such as degree, consistency, to adjust the performances such as the absorptivity of film layer, emissivity, weatherability.
Later, it is designed according to the composition of target 203, completes continuous coating room 103 and assemble；
Further, inlet pipe room 102, outlet pipe room 104 and vacuum seal valve 108 are mounted on the two of continuous coating room 103
End；
Then, drive rod 301, transmission bracket 206 are installed, plated film tube 101 is placed in transmission bracket 206, it will
Counter weight device 207 is placed in 101 both ends of plated film tube, connects transmission power source；
Transmission power source rotation, drives drive rod 301 to rotate, plated film tube 101 is due to self gravity and counterweight, not with drive rod
301 rotate and rotate, and transmission bracket 207 moves ahead with the rotation of drive rod 301, and plated film tube 101 is driven to move ahead；
The vacuum seal valve 108 of 102 front end of inlet pipe room is opened, and the vacuum seal valve 108 of 102 rear end of inlet pipe room is closed, and is passed
The rotation of lever 301 drives plated film tube 101 to enter inlet pipe room 102, after plated film tube 101 is completely into inlet pipe room 102, inlet pipe room
The vacuum seal valve 108 of 102 front ends is closed, and inlet pipe room 102 forms sealing state, is vacuumized to inlet pipe room 102, when vacuum degree reaches
When to 1.0E-2Pa, pouring argon gas, (inlet pipe room 102, outlet pipe room 104 are respectively arranged with vent valve, are being not marked in figure out, for filling
Enter argon gas and/or dry gas), when vacuum degree reaches 1.0E1Pa, argon gas is closed, when being evacuated down to 1.0E-2Pa again, punching
Enter argon gas, vacuum degree is made to go back up to 4.0E-1Pa, opens (104 front end of outlet pipe room of vacuum seal valve 108 of 102 rear end of inlet pipe room
Vacuum seal valve be also switched off), according to setting speed, drive rod 301 is rotated, and plated film tube 101 is driven to enter continuous coating room 103
(continuous coating room 103 is vacuumized before booting, to " base vacuum (5.0E-3Pa) " after argon is filled with by gas distribution pipe and qi-emitting hole
Gas reaches " film coating environment vacuum pressure (4.0E-1Pa) ", and during practical continuous coating, pressure is constant, and argon gas is not open close
It crosses qi-emitting hole to enter in continuous coating room, continuous coating room is discharged further through bleeding point, form the constant dynamic equilibrium of pressure)；
The space rate that plated film tube 101 is run is 1.0m/min, when plated film tube 101 enters silver-colored target sputtering zone,
Silver target sputtering is opened, the deposition of infrared reflecting layer is carried out；When plated film tube 101 enters splashing for titanium target and molybdenum target mixing match target
When penetrating region, titanium target and molybdenum target sputtering are opened, the deposition of high-selenium corn layer is carried out；When plated film tube 101 enters aluminium target and stainless steel
When the sputter area of target mixing match target, aluminium target and the sputtering of stainless steel target are opened, the deposition of low absorption layer is carried out；Work as plated film tube
101 when entering the sputter area of aluminium target, opens the sputtering of aluminium target, carries out the deposition of anti-reflection layer；When plated film tube 101 leaves accordingly
Region when, corresponding target closes sputtering；
The vacuum seal valve 108 of 102 rear end of inlet pipe room is closed, and the vacuum seal valve 108 of 104 front end of outlet pipe room is opened, plating
Membrane tube 101 enters in outlet pipe room 104, and the inner cavity vacuum degree of outlet pipe room 104 is 4.0E-1Pa at this time, and gas is argon gas, works as plated film
After pipe 101 is completely into outlet pipe room 104, the vacuum seal valve 108 of 104 front end of outlet pipe room is closed, and outlet pipe room 104 forms seal shape
State is filled with dry air, arrives 0.1MPa, after identical as external atmospheric pressure, opens 104 rear end vacuum seal valve 108 of outlet pipe room,
The rotation of drive rod 301 drives the plated film tube 101 for completing plated film to transmit out outlet pipe room 104；(at this point, continuous coating room 103 stops taking out
Vacuum opens vent valve or argon gas, dry gas is filled in entire coating wire room by qi-emitting hole；)
After plated film tube 101 transmits out outlet pipe room 104,104 rear end vacuum seal valve 108 of outlet pipe room is closed, 104 shape of outlet pipe room
At sealing state, outlet pipe room 104 is vacuumized, when vacuum degree reaches 1.0E-2Pa, pours argon gas, when vacuum degree reaches
When 1.0E1Pa, closes argon gas and pour argon gas when being evacuated down to 1.0E-2Pa again, vacuum degree is made to go back up to 4.0E-1Pa, etc.
Enter to next plated film tube 101.
In the above specific embodiment:
The diameter of the plated film tube is(such as: ), whereinDiameter matches plated film length of tube is 2000-3000mm, Diameter matches plated film length of tube is 4000-8000mm；
The bleeding point spacing of the inlet pipe room and outlet pipe room and the ratio of coating chamber diameter are 5:1-100:1；
The drive rod rotation leads to plated film tube linear running speed are as follows: 0-2m/min, it is preferred that speed 0.9-
1.3m/min。
The groove type paraboloid thermal-collecting tube magnetron sputtering plating target matching is successively are as follows: high conductivity metal (silver/copper)
Target；
The vacuum orifice connects pumped vacuum systems: mechanical pump+molecular pump.
Final vacuum≤1E-3Pa of the inlet/outlet pipe room, continuous coating room presses winning rate :≤0.5Pa/h；
The vacuum chamber interior walls and indoor part surface roughness are up to 0.8；
The gas distribution pipe can enter two kinds of gases simultaneously, can also individually enter a kind of gas, gas distribution tube spacing and
The ratio of coating chamber diameter is 1:1-10:1.
Apparatus and method for provided by the invention has the advantage that compared with existing continuous coating line
1. target utilization improves
In coating process, all sputtering materials of target are all deposited on plated film tube, in above-mentioned case, are deposited between plated film tube
In gap, in order to ensure that the uniformity of film deposition, sputter area are greater than the deposition region 10% of plated film tube.And intracavity connects
Continuous magnetic-controlled sputtering coating equipment is in sputtering process, and sputter area is identical with the deposition region of steel pipe, and target as sputter comes out
Utilization rate reach 99% or more (plated film tube continuous production, intermediate gapless situation under).
2. deposition rate is promoted
Annular magnet inside the line of magnetic induction density be greater than external magnetic induction density, the free electron service life enhancing, compared with
It can reach higher deposition rate under low voltage, target utilization improves, and the utilization rate sputtered reaches 99% or more, identical
Time theca interna deposition thickness increases, and deposition rate is promoted.
3. even film layer
Annular magnet inside the line of magnetic induction the uniformity than the external line of magnetic induction in above-mentioned case the uniformity more
It is good, it can lead to that own electron density is uniform, and plasma density is uniform, to realize that target as sputter rate uniformity is more preferable, plate
In membrane process, film deposition is uniform, ensures the quality of film layer.
Plated film tube, almost without rotation, undisturbed, is not influenced during the plated film of inner cavity by machine error, and other
The fixed plated film scheme of mode, the positioning of plated film tube both ends or single-ended positioning, to realize film layer on plated film tube axial direction
Even deposition, plated film tube needs high speed rotation, and during rotation, error caused by being mechanically fixed leads to plated film tube centre-of gravity shift, shakes
It is dynamic, gas field disturbance, deposit uniformity decline.
4. it is convenient to operate
Compared to the roller shape mode of star-like operation or the rows of linear running, all extremely inconvenient assembly or disassembly
Plated film tube needs heavy-duty machinery to transport back and forth.And intracavity continuous magnetron sputtering filming equipment only needs for plated film tube to be assembled to
On drive rod, extremely aspect.
5. sputtering technology is more easier to control
In sputtering process, the stability of sputtering equipment is high, and it is small to influence the variation of the factors such as gas field, the magnetic field of sputtering, sputters
Technology controlling and process in journey is just more easier, sputtering yield, sputter rate, film layer proportion, because of metal subnumber amount, the works such as sputtering voltage
Skill is more easier to stablize, and film quality and stability are with regard to more preferable.
6. process modification adjustment is more convenient
Common coating machine and coating wire are when changing technique, by target material, quantity, sputtering yield, technique duration
Deng limitation, cannot at will modify film layer technique, and the target of intracavity continuous magnetron sputtering filming equipment is assembled target,
Quantity, length, material of target etc. can be arbitrarily adjusted according to the technological requirements, the technique for carrying out any adjustment depositional coating.
7. not by plated film tube length limitation
Intracavity continuous magnetron sputtering filming equipment can increase the length of continuous coating room, other filming equipments are because of target
Plated film tube length limited caused by the reasons such as material, assembly；Plated film tube lengthens, so that it may reduce the docking of slot type light field system
Point reduces security risk, increases the photothermal conversion efficiency of entire light field to reduce heat waste, increase to obtain heat area.
Described above to be merely exemplary for the purpose of the present invention, and not restrictive, those of ordinary skill in the art understand,
Without departing from the spirit and scope defined by the claims, can many modifications may be made, variation or equivalent, but will all fall
Enter within protection scope of the present invention.
Claims (7)
1. a kind of fabricated construction of intracavity magnetron sputtering plating room, it is characterised in that: pass through including inside for plated film tube
Continuous coating room, the continuous coating room be respectively equipped with from outside to inside fixed sleeving, annular magnet and annular target,
In:
The both ends of the fixed sleeving are equipped with vacuum seal valve, and are equipped with inside and outside bleeding point and gas distribution pipe；
There is the target several and axial directions along coating chamber to splice, and adjacent target insulation strip mutually completely cuts off, several targets
Material is respectively connected with external power supply；
The magnet in the form of sheets, stacks gradually in the axial direction of coating chamber, respectively corresponds arrangement with each target.
2. the fabricated construction of intracavity magnetron sputtering plating according to claim 1 room, it is characterised in that: continuously plating
One end of film room is communicated with inlet pipe room, and the other end is communicated with outlet pipe room, the outer end in inlet pipe room and the outer end in outlet pipe room point
Not She You vacuum seal valve, so that inlet pipe room, continuous coating room and outlet pipe room is sealed respectively.
3. the fabricated construction of intracavity magnetron sputtering plating according to claim 1 room, it is characterised in that: the magnet
It is permanent magnet or electromagnet, the groove location of fixed sleeving inner wall is embedded according to same pole direction.
4. the fabricated construction of intracavity magnetron sputtering plating according to claim 1 room, it is characterised in that: adjacent target
It is opened between material with barrier partitions, the perforation passed through for plated film tube is offered on baffle.
5. the fabricated construction of intracavity magnetron sputtering plating according to claim 1 room, it is characterised in that: the vacuum
Sealing valve is diaphragm vario valve.
6. a kind of assembly method of intracavity magnetron sputtering plating room characterized by comprising
Firstly, designing according to the composition that required film layer technique completes target, that is, calculate the type and respective length of required target；
Later, it is designed according to the composition of target, selects the fixed sleeving of corresponding length, be stacked magnetic in each fixed sleeving inner wall
Target is fixed on the inside of magnet, fixed sleeving is sequentially spliced by iron, and installs at the both ends for completing spliced fixed sleeving
Vacuum seal valve constitutes continuous coating room.
7. the assembly method of intracavity magnetron sputtering plating according to claim 6 room, it is characterised in that: also by inlet pipe room
It is mounted on the both ends of continuous coating room with outlet pipe room, and is installed respectively very in the outer end of inlet pipe room and in the outer end of outlet pipe room
Empty sealing valve.
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