CN110133761A - A kind of Meta Materials reflectance coating and preparation method thereof - Google Patents
A kind of Meta Materials reflectance coating and preparation method thereof Download PDFInfo
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- CN110133761A CN110133761A CN201910420627.5A CN201910420627A CN110133761A CN 110133761 A CN110133761 A CN 110133761A CN 201910420627 A CN201910420627 A CN 201910420627A CN 110133761 A CN110133761 A CN 110133761A
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- substrate
- meta materials
- reflectance coating
- resonating member
- plasma membrane
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention discloses a kind of Meta Materials reflectance coatings and preparation method thereof.Pass through the metamaterial layer of the resonating member of " circle symmetrical structure and/or ball symmetrical structure " including periodic distribution, when incident electromagnetic wave being made to impinge perpendicularly on Meta Materials, there can be consistent reflecting effect to different polarization states electromagnetic wave, to solve the Polarization-Sensitive technical problem of reflectance coating in the prior art.
Description
Technical field
The present invention relates to optical technical fields more particularly to a kind of Meta Materials reflectance coating and preparation method thereof.
Background technique
With society development and the improvement of people's living standards, opto-electronic device just gradually to miniaturization, it is multi-functional,
Integrated direction is developed.Currently, ultraviolet reflectance mirror obtains in fields such as ultraviolet photolithographic, astronomical observation, plasma diagnostics
It is widely applied.Currently, traditional reflectance coating there is a problem of Polarization-Sensitive, its application is greatlyed restrict
Summary of the invention
The present invention solves reflectance coating polarization in the prior art by providing a kind of Meta Materials reflectance coating and preparation method thereof
Sensitive technical problem.
The present invention provides a kind of Meta Materials reflectance coatings, comprising: substrate and metamaterial layer；The metamaterial layer includes multiple
Resonating member, the multiple resonating member periodic distribution is over the substrate；Each resonating member is round symmetrical junction
Structure and/or ball symmetrical structure.
Further, the spacing of the adjacent resonating member over the substrate is equal.
Further, the shape of each resonating member is circular ring shape and/or cylinder.
Further, the constituent of the metamaterial layer is plasma species.
Further, the constituent of the metamaterial layer is metal and/or the semiconductor with plasma property.
Further, the material of the substrate is intrinsic material or dielectric material.
The present invention also provides a kind of production methods of Meta Materials reflectance coating, which comprises
Photoresist is coated over the substrate；
Pre-set mask plate is placed on the photoresist；
The photoresist for being placed with mask plate is exposed and is developed, patterned photoresist layer is obtained；
The mask plate is removed；
Plasma membrane is prepared on the surface for being provided with the patterned photoresist layer of the substrate；
The photoresist layer is removed, prepares the metamaterial layer of the Meta Materials reflectance coating, wherein the metamaterial layer
Including multiple resonating members, the multiple resonating member periodic distribution is over the substrate；Each resonating member is
Circle symmetrical structure and/or ball symmetrical structure.
Further, the plasma membrane is metal film.
Further, the surface for being provided with the patterned photoresist layer of the substrate prepare plasma membrane it
Before, further includes:
The substrate and the plasma membrane material are pre-processed.
It is further, described that the substrate and the plasma membrane material are pre-processed, comprising:
The substrate is heated；
The plasma membrane material is preheated.
One or more technical solution provided in the present invention, has at least the following technical effects or advantages:
By include periodic distribution " circle symmetrical structure and/or ball symmetrical structure " resonating member metamaterial layer,
When incident electromagnetic wave being made to impinge perpendicularly on Meta Materials, there can be consistent reflecting effect to different polarization states electromagnetic wave, to solve
It has determined the Polarization-Sensitive technical problem of reflectance coating in the prior art.
Detailed description of the invention
Fig. 1 is the front schematic view of Meta Materials reflectance coating provided in an embodiment of the present invention；
Fig. 2 is the side schematic view of Meta Materials reflectance coating provided in an embodiment of the present invention；
Fig. 3 is the flow chart of the production method of Meta Materials reflectance coating provided in an embodiment of the present invention；
Fig. 4 is the effect picture for implementing the production method of Meta Materials reflectance coating provided in an embodiment of the present invention；
Fig. 5 is the reflectance spectrum and transmission spectrum of Meta Materials reflectance coating provided in an embodiment of the present invention.
Wherein, 1- substrate, 2- resonating member.
Specific embodiment
The embodiment of the present invention is solved and is reflected in the prior art by providing a kind of Meta Materials reflectance coating and preparation method thereof
The Polarization-Sensitive technical problem of film.
Technical solution in the embodiment of the present invention is to solve the above problems, general thought is as follows:
By include periodic distribution " circle symmetrical structure and/or ball symmetrical structure " resonating member metamaterial layer,
When incident electromagnetic wave being made to impinge perpendicularly on Meta Materials, there can be consistent reflecting effect to different polarization states electromagnetic wave, to solve
It has determined the Polarization-Sensitive technical problem of reflectance coating in the prior art.
Above-mentioned technical proposal in order to better understand, in conjunction with appended figures and specific embodiments to upper
Technical solution is stated to be described in detail.
Referring to Fig. 1 and Fig. 2, Meta Materials reflectance coating provided in an embodiment of the present invention, comprising: substrate 1 and metamaterial layer；Super material
The bed of material includes multiple resonating members 2, and multiple 2 periodic distributions of resonating member are on substrate 1.
Specifically, spacing of the adjacent resonating member 2 on substrate 1 is equal.
When in order to make incident electromagnetic wave impinge perpendicularly on Meta Materials, there can be consistent reflection to different polarization states electromagnetic wave
Effect, each resonating member 2 are round symmetrical structure and/or ball symmetrical structure.That is, can whole resonating members 2
It is circle symmetrical structure for circle symmetrical structure or ball symmetrical structure or a part of resonating member 2, the resonating member 2 of another part is
Ball symmetrical structure.
Specifically, the shape of each resonating member 2 is circular ring shape and/or cylinder.That is, the list that can all resonate
The shape of member 2 is that the shape of circular ring shape or cylinder or a part of resonating member 2 is circular ring shape, the resonance list of another part
The shape of member 2 is cylinder.
In order to excite and enhance the reflecting effect of electromagnetic wave, the constituent of metamaterial layer is plasma species.
Specifically, the constituent of metamaterial layer is metal and/or the semiconductor with plasma property.That is,
Can the constituents of whole metamaterial layers be metal or semiconductor or a part of metamaterial layer with plasma property
Constituent is metal, and the constituent of another part metamaterial layer is the semiconductor with plasma property.Wherein, if utilizing
Metal (such as lead, tin) makes metamaterial layer, then can prepare the Meta Materials of ultraviolet polarization insensitive.
In the present embodiment, the material of substrate 1 is intrinsic material or dielectric material.
Referring to Fig. 3 and Fig. 4, the production method of Meta Materials reflectance coating provided in an embodiment of the present invention, which comprises
Step S310: photoresist is coated on substrate 1；
Specifically, on substrate 1, Rotating with Uniform coats photoresist (positive photoresist).
For substances such as the dusts, oil stain and ion particles that remove 1 surface of substrate, subsequent photoresist is enable uniformly to sprawl
To 1 surface of substrate, first substrate 1 is put into the container equipped with deionized water, cleans 3 minutes, takes out under ultrasonic oscillation
It is dried up afterwards with nitrogen gun；Then it is soaked into the container equipped with methanol, is cleaned 3 minutes also with ultrasonic oscillation, nitrogen gun
Drying；It is put into the container equipped with acetone later, ultrasonic cleaning 3 minutes, nitrogen gun drying；The ultrasonic wave in methanol solution again
Cleaning, is finally cleaned with deionized water, is dried up.
Step S320: pre-set mask plate is placed on a photoresist；
This step is specifically described:
Using electron beam lithography Meta Materials reflectance coating complementary patterns, mask is prepared in conjunction with pattern, and by mask plate horizontal
On a photoresist.
Step S330: the photoresist for being placed with mask plate is exposed and is developed, patterned photoresist layer is obtained；
This step is specifically described:
Forward direction exposure, the substrate 1 with photoresist after exposure is put into developer solution and is developed, and is obtained similar to mask plate
Circular hole.
Step S340: mask plate is removed, and cleans the surface of substrate 1；
Step S350: plasma membrane is prepared on the surface for being provided with patterned photoresist layer of substrate 1；
In the present embodiment, plasma membrane is metal film.
This step is specifically described:
By the 1 vapor deposition metal film of substrate after development, it is coated in metal film on substrate 1.
Wherein, by the 1 vapor deposition metal film of substrate after development, comprising:
By the substrate 1 after development in high vacuum vapor deposition metal film.
The production method of Meta Materials reflectance coating provided in an embodiment of the present invention is further described, in setting for substrate 1
Be equipped with patterned photoresist layer surface prepare plasma membrane before, further includes:
Substrate 1 and plasma membrane material are pre-processed.
Specifically, the substrate 1 after development is heated, to remove moisture removal and enhancing film-substrate cohesion, and inhales surface
Attached desorbing gas.Plasma membrane material is preheated, and is made when subsequent high temperature heats, and Coating Materials can more
Substrate surface is deposited evenly.
Step S360: photoresist layer is removed, and prepares the metamaterial layer of Meta Materials reflectance coating, wherein metamaterial layer packet
Multiple resonating members 2 are included, for multiple 2 periodic distributions of resonating member on substrate 1, each resonating member 2 is round symmetrical structure
And/or ball symmetrical structure.
Specifically, the photoresist remained on surface of substrate 1 after vapor deposition is cleaned up, and dried up.
This step is specifically described:
The photoresist remained on surface of substrate 1 is cleaned up with negtive photoresist cleaning solution, then is dried up with nitrogen gun, can be obtained institute
The Meta Materials reflectance coating needed.Wherein, the material of substrate 1 is silicon.
Below by a specific embodiment, the present invention is described in more detail:
Referring to Fig. 1 and Fig. 2, Meta Materials reflectance coating provided in an embodiment of the present invention is by metal Meta Materials substance and 1 liang of substrate
Part forms.Wherein, metal Meta Materials substance is the cylindrical body (resonating member 2 that cylindrical body is Meta Materials) by period profile
It constitutes.Specifically, cylindrical body is made of golden (Au) element, the diameter d=60nm of cylindrical body, with a thickness of tm=80nm.X/Y axis
Direction unit cycle length is respectively pxAnd py, it is set as px=py=160nm.Substrate 1 is constructed using Si semiconductor material, lining
Bottom 1 with a thickness of ts=100nm.
Working principle: electromagnetic wave is incident on Meta Materials reflectance coating along perpendicular to the face XOY, resonates in Meta Materials intense electromagnetic
Under the action of generate high reflection.Incident electromagnetic wave forward entrance reflectance coating, i.e., incident electric fields are in XOY plane.Due to Meta Materials
The symmetry of resonating member 2, the perception to any direction incident electric fields (polarization state electric magnetic wave) be it is the same, therefore, thus real
A kind of uncorrelated (insensitive) the Meta Materials reflectance coating of polarization is showed.
The reflectance spectrum and transmission spectrum of above-mentioned Meta Materials reflectance coating are obtained by software emulation, as shown in Figure 5.Due to super material
The electromagentic resonance of material, the Meta Materials reflectance coating are particularly evident to ELECTROMAGNETIC REFLECTION in 275nm-300nm wave-length coverage, and reflectivity connects
Nearly 70%.
[technical effect]
1, by include periodic distribution " circle symmetrical structure and/or ball symmetrical structure " resonating member 2 Meta Materials
Layer, when incident electromagnetic wave being made to impinge perpendicularly on Meta Materials, can there is consistent reflecting effect to different polarization states electromagnetic wave, thus
Solves the Polarization-Sensitive technical problem of reflectance coating in the prior art.
2, the embodiment of the present invention utilizes the electromagentic resonance characteristic of Meta Materials, can solve the problems, such as the superposition interference of spectrum level,
Especially the spectrum level of ultraviolet band is superimposed problem, while it is right during spectrum unscrambling also to can avoid the middle-and-high-ranking secondary diffraction maximum of grating
The appearance for the problems such as rudimentary diffraction maximum is interfered.The embodiment of the present invention makes full use of the electromagentic resonance characteristic of Meta Materials, reasonably sets
The shape of metamaterial structure unit is counted, causes temperature to rise caused work so as to which the RESONANCE ABSORPTION accumulation of heat of electromagnetic wave is effectively relieved
Make wild effect.In addition, in conjunction with the flexible modulation mechanism of Meta Materials resonance characteristics, can a variety of control methods of integrated application (such as
Adjust structure and the shape etc. of metamaterial unit) it can freely regulate and control the reflection characteristic of Meta Materials reflectance coating, to reduce technique mistake
The rigors of material and the difficulty of production in journey.
3, the constituent of Meta Materials is plasma species, so as to excite and enhance the reflecting effect of electromagnetic wave.
4, in production method provided in an embodiment of the present invention, to after development substrate 1 and plasma membrane material carry out
Pretreatment, not only can be improved the reliability of subsequent technique, but also can also enhance stability when optical device work.
The purpose of the embodiment of the present invention is that in order to solve the interference of diffraction overlay existing for existing conventional mirror, production requires
Height, poor work stability, performance difference and it is Polarization-Sensitive the problems such as and propose the super material of electromagnetism polarization insensitive of ultraviolet band a kind of
Expect reflectance coating and preparation method thereof.Ultraviolet metal Meta Materials reflectance coating provided in an embodiment of the present invention can be applied to incoming electromagnetic
The case where wave wavelength is ultraviolet band.The embodiment of the present invention has important application value in corresponding field of optical systems.
Although preferred embodiments of the present invention have been described, it is created once a person skilled in the art knows basic
Property concept, then additional changes and modifications may be made to these embodiments.So it includes excellent that the following claims are intended to be interpreted as
It selects embodiment and falls into all change and modification of the scope of the invention.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
Mind and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to include these modifications and variations.
Claims (10)
1. a kind of Meta Materials reflectance coating characterized by comprising substrate and metamaterial layer；The metamaterial layer includes multiple total
Shake unit, and the multiple resonating member periodic distribution is over the substrate；Each resonating member is round symmetrical structure
And/or ball symmetrical structure.
2. Meta Materials reflectance coating as described in claim 1, which is characterized in that the adjacent resonating member is over the substrate
Spacing be equal.
3. Meta Materials reflectance coating as described in claim 1, which is characterized in that the shape of each resonating member is circular ring shape
And/or it is cylindrical.
4. Meta Materials reflectance coating as described in claim 1, which is characterized in that the constituent of the metamaterial layer is plasma
Substance.
5. Meta Materials reflectance coating as claimed in claim 4, which is characterized in that the constituent of the metamaterial layer is metal
And/or the semiconductor with plasma property.
6. Meta Materials reflectance coating according to any one of claims 1 to 5, which is characterized in that the material of the substrate is intrinsic
Semiconductor material or dielectric material.
7. a kind of production method of Meta Materials reflectance coating, which is characterized in that the described method includes:
Photoresist is coated over the substrate；
Pre-set mask plate is placed on the photoresist；
The photoresist for being placed with mask plate is exposed and is developed, patterned photoresist layer is obtained；
The mask plate is removed；
Plasma membrane is prepared on the surface for being provided with the patterned photoresist layer of the substrate；
The photoresist layer is removed, the metamaterial layer of the Meta Materials reflectance coating is prepared, wherein the metamaterial layer includes
Multiple resonating members, the multiple resonating member periodic distribution is over the substrate；Each resonating member is circle pair
Claim structure and/or ball symmetrical structure.
8. the method for claim 7, which is characterized in that the plasma membrane is metal film.
9. the method for claim 7, which is characterized in that the substrate is provided with the patterned photoresist layer
Surface prepare plasma membrane before, further includes:
The substrate and the plasma membrane material are pre-processed.
10. method as claimed in claim 9, which is characterized in that it is described to the substrate and the plasma membrane material into
Row pretreatment, comprising:
The substrate is heated；
The plasma membrane material is preheated.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910420627.5A CN110133761A (en) | 2019-05-20 | 2019-05-20 | A kind of Meta Materials reflectance coating and preparation method thereof |
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| CN201910420627.5A CN110133761A (en) | 2019-05-20 | 2019-05-20 | A kind of Meta Materials reflectance coating and preparation method thereof |
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| CN110133761A true CN110133761A (en) | 2019-08-16 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111490355A (en) * | 2020-03-23 | 2020-08-04 | 西安交通大学 | Terahertz chiral metamaterial wave absorber with flexible substrate and manufacturing method |
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