CN109956703A - A kind of abrasive material formula for infra-red material processing - Google Patents
A kind of abrasive material formula for infra-red material processing Download PDFInfo
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- CN109956703A CN109956703A CN201910139597.0A CN201910139597A CN109956703A CN 109956703 A CN109956703 A CN 109956703A CN 201910139597 A CN201910139597 A CN 201910139597A CN 109956703 A CN109956703 A CN 109956703A
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- infra
- abrasive
- abrasive material
- red
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Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B26/00—Compositions of mortars, concrete or artificial stone, containing only organic binders, e.g. polymer or resin concrete
- C04B26/02—Macromolecular compounds
- C04B26/10—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C04B26/16—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B26/00—Compositions of mortars, concrete or artificial stone, containing only organic binders, e.g. polymer or resin concrete
- C04B26/30—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Other silicon-containing organic compounds; Boron-organic compounds
- C04B26/32—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Other silicon-containing organic compounds; Boron-organic compounds containing silicon
Abstract
The invention discloses a kind of abrasive material formulas for infra-red material processing, including adhesive, diluent, toughener, reinforcing agent, catalyst, anti-aging agent, additive, solid abrasive, the content of described adhesive is 20%-40%, the content of diluent is 5%-20%, and the content of toughener is 3%-10%, and the content of reinforcing agent is 0.5%-1.5%, the content of catalyst is 0.03%-1%, the content of anti-aging agent is 0.1%-2%, and the content of additive is 2%-7%, and the content of solid abrasive is 55%-85%.Had using abrasive material after the machine-shaping that is heating and curing neither too hard, nor too soft, when processing soft brittleness infra-red material, has many advantages, such as that wear rate is small, high in machining efficiency, workpiece surface quality is good, therefore abrasive material formula of the present invention is with important application value.
Description
Technical field
The invention belongs to abrasive material production field, especially a kind of abrasive material formula for infra-red material processing.
Background technique
In military domain, infrared thermal imaging technique is used widely in weaponry, is mainly used in night prison
Depending on, scout, air defense, patrol and navigation, landing, rescue, the aerial reconnaissance of aircraft etc..In civil field, meet automobile, fire-fighting,
The functional requirements such as the fields night vision such as medicine, astronomy, detection, monitoring, and the process control from manufacturing industry and construction industry, prison
It surveys, the demand of infra-red material is especially huge, and infra-red material secondary industry prospect is extensive.Currently used infra-red material manufacturing process
Including single-point diamond vehicle, accurate die pressing, accurate grinding etc..Using diamond vehicle, material surface flaw is more, and processing efficiency
It is low.Accurate die pressing requires height to mold, and mold is easy to wear, harsh to the temperature in process, pressure requirements, and is only suitable for into
Type small size workpiece.The existing soft brittleness infra-red material of general abrasive machining, such as chalcogenide glass, can make workpiece surface scratch
Excessively, point is larger and more, and Forming Quality is poor or processing efficiency is low, and abrasive wear is big and material removal amount is small.
Summary of the invention
The present invention is directed to existing abrasive material formulation challenges, invents a kind of abrasive material formula for infra-red material, the present invention includes
Following technology contents:
A kind of abrasive material formula for infra-red material processing, including it is adhesive, diluent, toughener, reinforcing agent, catalyst, anti-
Old agent, additive and solid abrasive;The content of described adhesive is 20%-40%, and the content of diluent is 5%-20%, toughener
Content is 3%-10%, and the content of reinforcing agent is 0.5%-1.5%, and the content of catalyst is 0.03%-1%, and the content of anti-aging agent is
0.1%-2%, the content of additive are 2%-7%, and the content of solid abrasive is 55%-85%.
Further, described adhesive is that polyurethanes, organic-silicon-modified polyurethanes or epoxy resin change
The one or more of property polyurethanes.
Further, the diluent is one or more of acetone, butanol or toluene.
Further, the toughener is haloflex, ethylene-vinyl acetate copolymer or styrene-butadiene
One or more of thermoplastic elastomer (TPE).
Further, the reinforcing agent is one or more of DH-1, DH-2, DH-3 or DH-4 reinforcing agent.
Further, the catalyst is di-isopropyl peroxydicarbonate or di-t-butyl peroxide.
Further, the anti-aging agent is in anti-aging agent PPD, antioxidant A, antioxidant 4010 or antioxidant 4010NA
It is one or more of.
Further, the additive is glyceryl tristearate and boron trifluoride complex, wherein three glycerol stearates
The mass ratio of ester and boron trifluoride complex is (0.01-0.05): (3-6).
Further, the solid abrasive is one in diamond, silicon carbide, corundum, silica, boron carbide or boron nitride
Kind is several, and each abrasive grain is less than 30 μm.
It is put in a mold by the abrasive material that above-mentioned formula mixes, forms suitable shape in 100 DEG C of 30min that are heating and curing
Afterwards, abrasive material can keep never degenerating for 3 months in 0 ~ 30 DEG C of dark environment, neither too hard, nor too soft, process soft brittleness infra-red material, abrasive material
Wear rate is small, material surface no marking, and point is small and improves the processing efficiency and quality of soft-brittle material.
The utility model has the advantages that the present invention provides a kind of abrasive material formula for infra-red material processing, the mill prepared with the formula
Material has good processing performance, is obtained by testing test, the wheel grinding chalcogenide glass made of new abrasive material, removal
0.2mm thickness duration foreshortens to 10min by 20min, and efficiency improves 50%;Workpiece surface is observed under 40 power microscopes after processing
Less than scratch, point is small and few;Workpiece surface roughness is within 15nm after processing.Therefore abrasive material formula tool of the present invention
There is important application value.
Specific embodiment
The invention will now be further described with reference to specific embodiments, but examples are merely exemplary, not to this hair
Bright range constitutes any restrictions.It will be understood by those skilled in the art that without departing from the spirit and scope of the invention
Can with the details and forms of the technical scheme of the invention are modified or replaced, but these modification and replacement each fall within it is of the invention
In protection scope.
Embodiment 1
Polyurethanes 25%, acetone 5%, haloflex 3%, DH-1 reinforcing agent 1%, di-t-butyl peroxide 0.5% are prevented old
Agent 4,010,NA1 1%, glyceryl tristearate 0.5%, boron trifluoride complex 3%, diamond 61%.By above-mentioned organic matter and solid
It is placed in proper mold after abrasive material mixing, 80 DEG C of solidification 120min of constant temperature oven no longer change to weight.Abrasive material is viscous after molding
Process chalcogenide glass on abrasive disk, chalcogenide glass surface no marking, surface roughness RMS10nm is observed under 40 power microscopes
Surface is without point.
Embodiment 2
Organic-silicon-modified polyurethanes 25%, acetone 5%, haloflex 3%, DH-1 reinforcing agent 1%, di-t-butyl peroxide
0.5%, antioxidant 4010NA 1 1%, glyceryl tristearate 0.5%, boron trifluoride complex 3%, diamond 61%.Have above-mentioned
Machine object is placed in proper mold after mixing with solid abrasive, and 80 DEG C of solidification 120min of constant temperature oven no longer change to weight.At
Abrasive material, which is sticked on abrasive disk, after type processes chalcogenide glass, and chalcogenide glass surface no marking, surface roughness RMS18nm, 40 show
Micro- microscopic observation surface is without point.
Embodiment 3
Epoxy resin modification polyurethanes 20%, butanol 5%, ethylene-vinyl acetate copolymer 4%, DH-2 reinforcing agent
1.5%, di-t-butyl peroxide 0.5%, antioxidant 4010 PDD 1%, glyceryl tristearate 1%, boron trifluoride complex 3%, gold
Hard rock 50%, silicon carbide 14%.It is placed in proper mold after above-mentioned organic matter is mixed with solid abrasive, 80 DEG C of constant temperature oven solid
Change 120min no longer to change to weight.Abrasive material, which is sticked on abrasive disk, after molding processes chalcogenide glass, chalcogenide glass surface no marking,
Surface roughness RMS10nm, observation surface is without point under 40 power microscopes.
Embodiment 4
Polyurethanes 15%, organic-silicon-modified polyurethanes 5%, toluene 5%, haloflex 3%, DH-1 reinforcing agent
1%, di-t-butyl peroxide 0.6%, antioxidant 4010 0.4%, glyceryl tristearate 1%, boron trifluoride complex 2%, Buddha's warrior attendant
Stone 67%.It is placed in proper mold after above-mentioned organic matter is mixed with solid abrasive, 80 DEG C of solidification 120min of constant temperature oven to weight
Amount no longer changes.Abrasive material, which is sticked on abrasive disk, after molding processes chalcogenide glass, chalcogenide glass surface no marking, surface roughness
RMS16nm, observation surface is without point under 40 power microscopes.
Claims (9)
1. a kind of abrasive material formula for infra-red material processing, which is characterized in that including adhesive, diluent, toughener, increasing
Strong agent, catalyst, anti-aging agent, additive and solid abrasive;The content of described adhesive is 20%-40%, and the content of diluent is
5%-20%, the content of toughener are 3%-10%, and the content of reinforcing agent is 0.5%-1.5%, and the content of catalyst is 0.03%-1%, are prevented
The content of old agent is 0.1%-2%, and the content of additive is 2%-7%, and the content of solid abrasive is 55%-85%.
2. a kind of abrasive material formula for infra-red material processing according to claim 1, which is characterized in that described adhesive
For the one or more of polyurethanes, organic-silicon-modified polyurethanes or epoxy resin modification polyurethanes.
3. a kind of abrasive material formula for infra-red material processing according to claim 1, which is characterized in that the diluent
For one or more of acetone, butanol or toluene.
4. a kind of abrasive material formula for infra-red material processing according to claim 1, which is characterized in that the toughener
For one or more of haloflex, ethylene-vinyl acetate copolymer or styrene butadiene thermoplasticelastomer.
5. a kind of abrasive material formula for infra-red material processing according to claim 1, which is characterized in that the reinforcing agent
For one or more of DH-1, DH-2, DH-3 or DH-4 reinforcing agent.
6. a kind of abrasive material formula for infra-red material processing according to claim 1, which is characterized in that the catalyst
For di-isopropyl peroxydicarbonate or di-t-butyl peroxide.
7. a kind of abrasive material formula for infra-red material processing according to claim 1, which is characterized in that the anti-aging agent
For one or more of anti-aging agent PPD, antioxidant A, antioxidant 4010 or antioxidant 4010NA.
8. a kind of abrasive material formula for infra-red material processing according to claim 1, which is characterized in that the additive
For glyceryl tristearate and boron trifluoride complex, wherein the mass ratio of glyceryl tristearate and boron trifluoride complex is
(0.01-0.05):(3-6)。
9. a kind of abrasive material formula for infra-red material processing according to claim 1, which is characterized in that the solid mill
Material is one or more of diamond, silicon carbide, corundum, silica, boron carbide or boron nitride, and each abrasive grain is less than 30 μ
m。
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CN201910139597.0A CN109956703A (en) | 2019-02-26 | 2019-02-26 | A kind of abrasive material formula for infra-red material processing |
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Citations (7)
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CN101817172A (en) * | 2010-04-12 | 2010-09-01 | 南京航空航天大学 | Grinding and polishing pad for cured grinding material based on thermal initiation curing and preparation method thereof |
CN102245352A (en) * | 2008-12-30 | 2011-11-16 | 圣戈班磨料磨具有限公司 | Bonded abrasive tool and method of forming |
CN104227575A (en) * | 2014-09-15 | 2014-12-24 | 陕西德赛新材料科技有限公司 | Grinding unit implantation-based flexible grinding tool preparation method |
CN108070357A (en) * | 2016-11-12 | 2018-05-25 | 黄志萍 | A kind of abrasive material formula finely polished for glass and semiconductor |
CN108481217A (en) * | 2018-03-26 | 2018-09-04 | 河北思瑞恩新材料科技有限公司 | A kind of pyramid type solid grinding tool and preparation method for metallic mobile phone center of polishing |
CN108747852A (en) * | 2018-05-31 | 2018-11-06 | 芜湖昌菱金刚石工具有限公司 | A kind of diamond abrasive tool and preparation method thereof |
CN109366347A (en) * | 2018-12-03 | 2019-02-22 | 赵辉华 | A kind of grinding pad and preparation method thereof suitable for hard brittle material precise finiss |
-
2019
- 2019-02-26 CN CN201910139597.0A patent/CN109956703A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102245352A (en) * | 2008-12-30 | 2011-11-16 | 圣戈班磨料磨具有限公司 | Bonded abrasive tool and method of forming |
CN101817172A (en) * | 2010-04-12 | 2010-09-01 | 南京航空航天大学 | Grinding and polishing pad for cured grinding material based on thermal initiation curing and preparation method thereof |
CN104227575A (en) * | 2014-09-15 | 2014-12-24 | 陕西德赛新材料科技有限公司 | Grinding unit implantation-based flexible grinding tool preparation method |
CN108070357A (en) * | 2016-11-12 | 2018-05-25 | 黄志萍 | A kind of abrasive material formula finely polished for glass and semiconductor |
CN108481217A (en) * | 2018-03-26 | 2018-09-04 | 河北思瑞恩新材料科技有限公司 | A kind of pyramid type solid grinding tool and preparation method for metallic mobile phone center of polishing |
CN108747852A (en) * | 2018-05-31 | 2018-11-06 | 芜湖昌菱金刚石工具有限公司 | A kind of diamond abrasive tool and preparation method thereof |
CN109366347A (en) * | 2018-12-03 | 2019-02-22 | 赵辉华 | A kind of grinding pad and preparation method thereof suitable for hard brittle material precise finiss |
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