CN109879607A - The preparation method of the modified hydrophobic automatically cleaning film of ZnO/ZnS nano-chip arrays - Google Patents
The preparation method of the modified hydrophobic automatically cleaning film of ZnO/ZnS nano-chip arrays Download PDFInfo
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- CN109879607A CN109879607A CN201910242117.3A CN201910242117A CN109879607A CN 109879607 A CN109879607 A CN 109879607A CN 201910242117 A CN201910242117 A CN 201910242117A CN 109879607 A CN109879607 A CN 109879607A
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Abstract
A kind of preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays.It include prepare ZnO nano piece reaction solution, by the ito glass cleaned up in configured ZnO nano piece reaction solution hydro-thermal process, obtain ZnO nano chip arrays film；The ZnO nano chip arrays film prepared is put into hydro-thermal process in thioacetyl amine aqueous solution, obtains ZnO/ZnS nano-chip arrays film；The ZnO/ZnS nano-chip arrays film prepared is chemically treated with stearic ethanol solution, and is put into baking oven and dries, finally obtains the hydrophobic automatically cleaning film of ZnO/ZnS nano-chip arrays.The hydrophobic automatically cleaning film of the ZnO/ZnS nano-chip arrays has stronger clean-up performance, reaches 150 ° to the contact angle of water, operating procedure is simple, at low cost.
Description
Technical field
The invention belongs to hydrophobic coating material preparation technical fields, more particularly to a kind of modified ZnO/ZnS nanometer sheet battle array
Arrange the preparation method of hydrophobic automatically cleaning film.
Background technique
Building glass curtain wall is subjected to the pollution from external environment in recent years, mainly have dust, float in atmosphere it is micro-
Little particle, greasy dirt etc., these pollutants are attached to glass curtain wall surface, not only influence the beauty of building, while also will affect glass
The normal usage function of glass curtain wall reduces the service life of glass curtain wall and increases maintenance cost.With the development of society,
People to can play beauty function but also reach self-cleaning effect glass demand it is more more and more urgent.Self-cleaning glass
Appearance meets this demand of people.Self-cleaning glass is divided into two classes: hydrophilic self-cleaning glass and hydrophobic self-cleaning glass.
The super-hydrophobic automatic cleaning effect of natural plant lotus leaf surface provides new theory, institute to develop self-cleaning glass
Meaning super-hydrophobic automatic cleaning effect refers to that when water droplet falls in lotus leaf surface, water droplet can roll in lotus leaf surface and take away its surface
Particle is polluted, lotus leaf surface is made to keep clean.Hydrophobic surface refers to that it is greater than 90 ° of surface with the contact angle of water droplet.Through studying
It was found that this super-hydrophobic automatic cleaning phenomenon is by the coarse micro-nano mastoid process structure of lotus leaf surface and depositing for low-surface-energy wax
Caused by common, wherein micro nano structure is played a crucial role to super-hydrophobicity is formed.Based on this mechanism, preparation
The key of hydrophobic self-cleaning surface has two o'clock: first is that low-surface energy substance is modified in coarse micro-nano surface, second is that in low table
Face energy material surface constructs coarse micro nano structure.
ZnO is one of a kind of wide band gap semiconducter and most important functional material, due to its excellent thermal stability and
Chemical stability, hypotoxicity and optical property, therefore in fields such as nanoelectronics, photocatalytic pollutant degradation, photoelectric devices
It has a wide range of applications.
If ZnS nano particle can be supported on to ZnO nano on piece, to increase the surface roughness of ZnO nano piece, then with having
Machine object stearic acid reduces its surface can, it will be able to successfully prepare the hydrophobic automatically cleaning film of ZnO/ZnS nano-chip arrays.But at present still
Relevant preparation method is not found.
Summary of the invention
To solve the above-mentioned problems, it is hydrophobic certainly that the purpose of the present invention is to provide a kind of modified ZnO/ZnS nano-chip arrays
The preparation method of clean film.
In order to achieve the above object, the preparation of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays provided by the invention
Method includes the following steps carried out in order:
(1) zinc nitrate is proportionally added into deionized water and is stirred evenly, ammonium hydroxide is added extremely during stirring
The pH value of solution is 10, is thus prepared into ZnO nano piece reaction solution；
(2) clean ito glass is put into the above-mentioned ZnO nano piece reaction solution prepared and is carried out hydro-thermal process,
Thus ZnO nano chip arrays film is formed on ito glass surface；
(3) the above-mentioned ito glass for being covered with ZnO nano chip arrays film is put into thioacetyl amine aqueous solution and is carried out at hydro-thermal
Thus reason forms ZnO/ZnS nano-chip arrays film on ito glass surface；
(4) the above-mentioned ito glass for being covered with ZnO/ZnS nano-chip arrays film is carried out at chemistry with stearic ethanol solution
Reason, and be put into baking oven and dried, it is hydrophobic from clear finally to form the ZnO/ZnS nano-chip arrays on ito glass surface
Clean film.
In step (1), the amount ratio of the zinc nitrate and deionized water is 1~5g:30~50ml.
In step (2), the hydro-thermal process temperature is 70 DEG C~90 DEG C, and the processing time is 4h.
In step (3), the concentration of the thioacetyl amine aqueous solution is 0.1~0.3mol/L, and hydro-thermal process temperature is
90 DEG C, the processing time is 6~7h.
In step (4), the concentration of the stearic ethanol solution is 0.1~0.3mol/L, chemical process time
For 6~12h, drying temperature is 80 DEG C, and drying time is 10~15min.
The preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays provided by the invention has following beneficial to effect
Fruit: being supported on ZnO nano on piece for ZnS nano particle, to increase the surface roughness of ZnO nano piece, in conjunction with low-surface-energy object
The modification of matter, reduce ZnO/ZnS nano-chip arrays film surface surface can, coarse surface and stearic acid chemical modification are total to
Same-action can make the hydrophobic automatically cleaning film of ZnO/ZnS nano-chip arrays of preparation have good hydrophobicity, self-cleaning performance, and
It is not easy to fall off from glass.After contact angle tester is tested, 150 ° are reached to the contact angle of water.In addition, used in preparation method
Equipment, simple process and low cost.
Detailed description of the invention
Fig. 1 is the hydrophobic automatically cleaning film of ZnO/ZnS nano-chip arrays provided by the invention through contact angle tester test result
Schematic diagram.
Specific embodiment
The present invention will be described in detail below with reference to specific embodiments:
Embodiment one:
The preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays provided in this embodiment include in order into
Capable the following steps:
(1) 1.1g zinc nitrate is added in 50ml deionized water and is stirred evenly, 2ml ammonia is added during stirring
Water, the pH value of solution is 10 at this time, is thus prepared into the ZnO nano piece reaction solution of 0.1mol/L concentration；
(2) by clean ito glass be put into the above-mentioned ZnO nano piece reaction solution prepared and 90 DEG C at a temperature of
Hydro-thermal process 4h is carried out, thus forms ZnO nano chip arrays film on ito glass surface；
(3) by the above-mentioned ito glass for being covered with ZnO nano chip arrays film be put into concentration be 0.1mol/L thioacetamide it is molten
In liquid and in 90 DEG C of at a temperature of progress hydro-thermal process 7h, ZnO/ZnS nano-chip arrays film thus is formed on ito glass surface；
(4) the stearic second for being 0.1mol/L with concentration by the above-mentioned ito glass for being covered with ZnO/ZnS nano-chip arrays film
Alcoholic solution carries out chemical treatment 6h, and is put into 80 DEG C of baking oven and carries out drying 15min, finally forms institute on ito glass surface
The hydrophobic automatically cleaning film of the ZnO/ZnS nano-chip arrays stated.
Embodiment two:
The preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays provided in this embodiment include in order into
Capable the following steps:
(1) 3g zinc nitrate is added in 50ml deionized water and is stirred evenly, 2ml ammonia is added during stirring
Water, the pH value of solution is 10 at this time, is thus prepared into the ZnO nano piece reaction solution of 0.3mol/L concentration；
(2) by clean ito glass be put into the above-mentioned ZnO nano piece reaction solution prepared and 90 DEG C at a temperature of
Hydro-thermal process 4h is carried out, thus forms ZnO nano chip arrays film on ito glass surface；
(3) by the above-mentioned ito glass for being covered with ZnO nano chip arrays film be put into concentration be 0.2mol/L thioacetamide it is molten
In liquid and in 90 DEG C of at a temperature of progress hydro-thermal process 7h, ZnO/ZnS nano-chip arrays film thus is formed on ito glass surface；
(4) the stearic second for being 0.2mol/L with concentration by the above-mentioned ito glass for being covered with ZnO/ZnS nano-chip arrays film
Alcoholic solution carries out chemical treatment 9h, and is put into 80 DEG C of baking oven and carries out drying 10min, finally forms institute on ito glass surface
The hydrophobic automatically cleaning film of the ZnO/ZnS nano-chip arrays stated.
Embodiment three:
The preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays provided in this embodiment include in order into
Capable the following steps:
(1) 5g zinc nitrate is added in 50ml deionized water and is stirred evenly, 5ml ammonia is added during stirring
Water, the pH value of solution is 10 at this time, is thus prepared into the ZnO nano piece reaction solution of 0.6mol/L concentration；
(2) by clean ito glass be put into the above-mentioned ZnO nano piece reaction solution prepared and 90 DEG C at a temperature of
Hydro-thermal process 4h is carried out, thus forms ZnO nano chip arrays film on ito glass surface；
(3) by the above-mentioned ito glass for being covered with ZnO nano chip arrays film be put into concentration be 0.3mol/L thioacetamide it is molten
In liquid and in 90 DEG C of at a temperature of progress hydro-thermal process 7h, ZnO/ZnS nano-chip arrays film thus is formed on ito glass surface；
(4) the stearic second for being 0.3mol/L with concentration by the above-mentioned ito glass for being covered with ZnO/ZnS nano-chip arrays film
Alcoholic solution carries out chemical treatment 12h, and is put into 80 DEG C of baking oven and carries out drying 10min, finally forms institute on ito glass surface
The hydrophobic automatically cleaning film of the ZnO/ZnS nano-chip arrays stated.
In order to verify effect of the invention, the present inventor is hydrophobic by ZnO/ZnS nano-chip arrays prepared in the above embodiments
Automatically cleaning film is tested using contact angle tester, as shown in Figure 1, test result is 150 ° of contact angle to water.
The foregoing is only a preferred embodiment of the present invention, but scope of protection of the present invention is not limited thereto,
Anyone skilled in the art in the technical scope disclosed by the present invention, to the modification of the invention made, is equal
Replacement and improvement etc., should all be included in the protection scope of the present invention.Technical scope of the invention is not limited to
Content on bright book should determine protection scope with the range of CLAIM OF BENEFIT.
Claims (5)
1. a kind of preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays, it is characterised in that: the preparation side
Method includes the following steps carried out in order:
(1) zinc nitrate is proportionally added into deionized water and is stirred evenly, ammonium hydroxide is added during stirring to solution
PH value be 10, be thus prepared into ZnO nano piece reaction solution；
(2) clean ito glass is put into the above-mentioned ZnO nano piece reaction solution prepared and carries out hydro-thermal process, thus
ZnO nano chip arrays film is formed on ito glass surface；
(3) the above-mentioned ito glass for being covered with ZnO nano chip arrays film is put into thioacetyl amine aqueous solution and is carried out hydro-thermal process,
Thus ZnO/ZnS nano-chip arrays film is formed on ito glass surface；
(4) the above-mentioned ito glass for being covered with ZnO/ZnS nano-chip arrays film is chemically treated with stearic ethanol solution,
And be put into baking oven and dried, the hydrophobic automatically cleaning of ZnO/ZnS nano-chip arrays is finally formed on ito glass surface
Film.
2. the preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays according to claim 1, feature exist
In: in step (1), the amount ratio of the zinc nitrate and deionized water is 1~5g:30~50ml.
3. the preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays according to claim 1, feature exist
In: in step (2), the hydro-thermal process temperature is 70 DEG C~90 DEG C, and the processing time is 4h.
4. the preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays according to claim 1, feature exist
In: in step (3), the concentration of the thioacetyl amine aqueous solution is 0.1~0.3mol/L, and hydro-thermal process temperature is 90 DEG C,
The processing time is 6~7h.
5. the preparation method of the hydrophobic automatically cleaning film of modified ZnO/ZnS nano-chip arrays according to claim 1, feature exist
In: in step (4), the concentration of the stearic ethanol solution is 0.1~0.3mol/L, chemical process time is 6~
12h, drying temperature are 80 DEG C, and drying time is 10~15min.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110592587A (en) * | 2019-09-02 | 2019-12-20 | 太原科技大学 | Preparation method of metal substrate super-hydrophobic film layer |
| CN110606502A (en) * | 2019-10-16 | 2019-12-24 | 江苏巨珩新材料科技有限公司 | Preparation method of self-cleaning surface with photocatalysis synergistic effect |
| CN113215627A (en) * | 2021-05-10 | 2021-08-06 | 中国石油大学(华东) | Method for preparing super-hydrophobic zinc sulfide coating on surface of stainless steel |
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| CN110592587A (en) * | 2019-09-02 | 2019-12-20 | 太原科技大学 | Preparation method of metal substrate super-hydrophobic film layer |
| CN110606502A (en) * | 2019-10-16 | 2019-12-24 | 江苏巨珩新材料科技有限公司 | Preparation method of self-cleaning surface with photocatalysis synergistic effect |
| CN113215627A (en) * | 2021-05-10 | 2021-08-06 | 中国石油大学(华东) | Method for preparing super-hydrophobic zinc sulfide coating on surface of stainless steel |
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Application publication date: 20190614 |