CN109870114A - Based on the molding strain transducer of photoengraving and its manufacturing method - Google Patents
Based on the molding strain transducer of photoengraving and its manufacturing method Download PDFInfo
- Publication number
- CN109870114A CN109870114A CN201910160403.5A CN201910160403A CN109870114A CN 109870114 A CN109870114 A CN 109870114A CN 201910160403 A CN201910160403 A CN 201910160403A CN 109870114 A CN109870114 A CN 109870114A
- Authority
- CN
- China
- Prior art keywords
- compound
- pdms
- conductive material
- initiator
- strain transducer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
The present invention provides that a kind of hypersensitivity, the processing is simple, at low cost, the molding patterned flexible strain transducer of photoengraving that the service life is long and preparation method thereof.In one aspect, the present invention provides the compound of a kind of photosensitive PDMS and conductive material.In one aspect; the present invention provides a kind of preparation method of strain transducer; it include: that photosensitive PDMS/ conductive material compound a) is formed on substrate; b) compound is irradiated through anti-dazzling screen with ultraviolet light; irradiated portion is formed on the compound and through irradiating part, c) remove through irradiating part, d) electrode is formed on the compound; the electrode is electrically connected with the compound and e) forms flexible cover sheet on the compound.The present invention also provides methods described herein to prepare high-resolution, highly sensitive, in wearable strain transducer purposes.
Description
Technical field
The invention belongs to technical field of sensor manufacture, and in particular to one kind based on the molding strain transducer of photoengraving and
Its manufacturing method.
Background technique
Sensor is a kind of detection device, can experience measured information, and can be by the information experienced by a set pattern
Rule is for conversion into electric signal or the information output of other required forms, to meet transmission, processing, storage, the display, record of information
With control etc. require.Strain transducer is a kind of sensor based on strain produced by measurement object receiving force deformation, can be by machine
Tool deformation is converted into electric signal, such as the variation of sensor resistance, the deformation characteristics for precise measurement object.
The future thrust of strain transducer first is that highly sensitive wearable strain transducer.With intelligent terminal
Universal, wearable electronic shows huge market prospects.Sensor will affect wearable set as one of core component
Standby Functional Design and future development.Flexible wearable electronic sensor has light and portable, electric property excellent and integrated level
The features such as high, becomes one of electric sensor of greatest concern.It is in fields such as intelligent artificial limb, electronic skin, robots
It is significant and have a extensive future.
Flexible strain transducer is a kind of device for precise measurement object deformation, by by measured object in external environment
The change of body strain amount is converted into electricity knots modification, obtains the deformation characteristics of testee.It intelligent artificial limb, biologic medical,
The fields such as robot play vital effect.
Adhere to flexible wearable strain transducer and corresponding sensor-based system on flexible robot and artificial artificial limb, it can
Real-time tracking is carried out with the motion state to robot or artificial limb, its perception to external environment is realized, reaches efficient behaviour
Vertical and control purpose etc..In medical field, since wearable strain transducer has the characteristics that light, thin, flexible, it can be assembled
On clothing perhaps ornaments or even directly can cover or be embedded in human body, for for a long time, non-interruption, monitoring whenever and wherever possible with
Track the indexs such as heart rate, the blood pressure of sufferer.The application of wearable strain transducer not only makes sufferer get rid of coarse bulky medical treatment
Equipment, and by reducing the cost of nursing to being discovered ahead of time with efficiently managing for disease.Realize the most base of artificial tactile
This function perceives environmental stimulus, collects physiology signal, it is desirable that and wearable strain transducer must have high sensitivity,
Good flexibility, it is non-toxic to humans and can manufacture on a large scale.For a long time, the wearable strain of non-interruption detection requirement passes
Sensor has excellent anti-fatigue performance.However, realizing the high-resolution of strain transducer, highly sensitive, quick response, low cost system
Making is still a very big challenge.
Currently reported wearable strain transducer generally has big strain measurement range, and long service life etc. is excellent
Point.However the preparation process of these strain transducers is complicated, it is difficult to pattern.In the prior art, most of patterned strain
Sensor is still realizing its patterning using mold reverse mould, the complicated preparation process of mold and is difficult to quick-replaceable and to pass
The preparation process of sensor tends to be complicated, and is not easy to extensive personalized preparation.
Therefore, it is intended that strain transducer and its manufacture that a kind of manufacturing process is simple, at low cost and with high sensitivity
Method.
Summary of the invention
It is an object of that present invention to provide a kind of hypersensitivity, the processing is simple, photoengraving at low cost, that the service life is long is molding
Patterned flexible strain transducer and preparation method thereof.
In one aspect, the present invention provides the compound of a kind of photosensitive PDMS and conductive material.The compound is electrically conductive.
In an embodiment of compound, photosensitive PDMS/ conductive material compound includes PDMS, initiator and conduction
Material.PDMS includes presoma and curing agent.The presoma and curing agent of the PDMS can be mixed according to the ratio of 15:1-5:1,
It is preferred that being mixed with the ratio of 10:1.In one embodiment, photosensitive PDMS/ conductive material compound is colloidal form, such as
Compound resin colloid.
Initiator includes acyl group phosphorous oxides initiator or Benzophenone class initiator.Illustratively, initiator can be benzene first
Ketone and/or double acylphosphine oxides (BAPO), for example, Benzophenone xylene solution and/or double acylphosphine oxides organic solution.
Conductive material includes nano-silver thread, graphene or carbon nanotube.Illustratively, conductive material can be nano-silver thread
Isopropanol (IPA) solution, graphene solution and/or carbon nano-tube solution.In a specific embodiment, conductive material packet
Include isopropanol (IPA) solution of nano-silver thread, concentration 10-100mg/mL, preferably 20mg/mL.
The compound can be cured compound.The solidification is carried out by any method known in the art, example
Compound is such as placed in 120 DEG C and continues 10 minutes.In one embodiment, the photosensitive PDMS/ conduction material through ultraviolet light
Material compound does not solidify in the curing process, such as in colloidal state.Illustratively, a length of 250~400nm of ultraviolet light wave, preferably
365nm.Illustratively, the energy density of ultraviolet light can be 50-150mW/cm2, irradiation time 5-30 minutes.Preferably, ultraviolet
The energy density of light is 90mW/cm2, irradiation time 10 minutes.
The compound of photosensitive PDMS and conductive material of the invention can be formed through photoengraving for manufacturing strain transducer, example
Such as patterned wearable strain transducer.
Illustratively, PDMS: the weight ratio of conductive material can be 25:1 to 5000:1, including 400:1 to 50:1, such as
250:1 to 100:1.In one embodiment, PDMS: the weight ratio of conductive material can be 0.5g:20mg to 5g:1mg, such as
1g:4mg to 1g:10mg.Illustratively, PDMS: the weight ratio of initiator can be 5:1 to 500:1, including 10:1 to 50:1, example
Such as 20:1.In one embodiment, PDMS: the weight ratio of initiator can be 1g:50mg.Illustratively, PDMS: initiator:
The weight ratio of conductive material can be 500-5000:10-100:1-20, such as 1000:50:4 to 1000:50:10.Implement at one
In mode, PDMS: initiator: the weight ratio of conductive material can be 0.5-5g:10-100mg:1-20mg, such as 1g:50mg:4mg
To 1g:50mg:10mg.
In second aspect, the present invention provides a kind of preparation method of strain transducer, including
A) photosensitive PDMS/ conductive material compound is formed on substrate,
B) compound is irradiated through anti-dazzling screen with ultraviolet light, forms irradiated portion on the compound and through irradiating
Part,
C) it removes through irradiating part,
D) electrode is formed on the compound, the electrode is electrically connected with the compound, and
E) flexible cover sheet is formed on the compound.
In one embodiment, the method includes the steps that separation substrate and compound between step b and e.
In one aspect, the present invention provides a kind of preparation method based on the molding strain transducer of photoengraving, including
A) photosensitive PDMS/ conductive material compound is formed on substrate,
B) compound is irradiated through anti-dazzling screen with ultraviolet light, forms irradiated portion on the compound and through irradiating
Part,
C) it removing and is irradiated part, the irradiated portion forms conductive layer,
D) the first protective layer is formed on the conductive layer,
E) substrate is removed,
F) form a pair of electrodes in the side opposite with first protective layer of the conductive layer, the electrode with it is described
Conductive layer electrical connection,
G) the second protective layer is formed on the conductive layer and electrode.
In an embodiment of method, photosensitive PDMS/ conductive material compound includes PDMS, initiator and conduction material
Material.
In an embodiment of method, it includes by PDMS that photosensitive PDMS/ conductive material compound is formed on substrate
Presoma and curing agent mixing, initiator and conductive material is added, and gained compound is applied to substrate.The PDMS's
Presoma and curing agent can be mixed according to the ratio of 15:1-5:1, preferably be mixed with the ratio of 10:1.In one embodiment,
Photosensitive PDMS/ conductive material compound is colloidal form, such as compound resin colloid.In one embodiment, pass through coating
Gained compound is applied on substrate, the coating includes spin coating.The speed of the spin coating can be 1000-3000rpm, spin coating
Time can be -2 minutes 5 seconds.Preferably, the speed of spin coating can be 2000rpm, and spin-coating time can be 20 seconds.The substrate, such as
Glass, by cleaning optionally before being administered compound.
Initiator includes acyl group phosphorous oxides initiator and/or Benzophenone class initiator.In one embodiment, cause
Agent is selected from least one of acyl group phosphorous oxides initiator and Benzophenone class initiator.Illustratively, initiator can be benzene first
Ketone and/or double acylphosphine oxides (BAPO), for example, Benzophenone xylene solution and/or double acylphosphine oxides organic solution.
Conductive material includes nano-silver thread, graphene or carbon nanotube.In one embodiment, conductive material is selected from and receives
At least one of rice silver wire, graphene and carbon nanotube.Illustratively, conductive material is selected from the isopropanol of nano-silver thread
(IPA) solution, graphene solution and/or carbon nano-tube solution.In a specific embodiment, conductive material includes nano silver
Isopropanol (IPA) solution of line, concentration 10-100mg/mg, preferably 20mg/mg.
In an embodiment of method, PDMS: the weight ratio of nano-silver thread can be 25:1 to 5000:1, including 400:
1 to 50:1, such as 250:1 to 100:1.In one embodiment, PDMS: the weight ratio of nano-silver thread can be 0.5g:20mg
To 5g:1mg, such as 1g:4mg to 1g:10mg.Illustratively, PDMS: the weight ratio of initiator can be 5:1 to 500:1, including
10:1 to 50:1, such as 20:1.In one embodiment, PDMS: the weight ratio of initiator can be 1g:50mg.Illustratively,
PDMS: initiator: the weight ratio of nano-silver thread can be 500-5000:10-100:1-20, such as 1000:50:4 to 1000:50:
10.In one embodiment, PDMS: initiator: the weight ratio of nano-silver thread can be 0.5-5g:10-100mg:1-20mg, example
Such as 1g:50mg:4mg to 1g:50mg:10mg.
In an embodiment of method, irradiating the compound through anti-dazzling screen with ultraviolet light includes setting anti-dazzling screen
With substrate at a distance of about 200-1000 μm above substrate, such as 200 μm, 300 μm, 400 μm, 500 μm, 600 μm, 700 μm, 800 μ
M, 900 μm or 1000 μm, preferably 200-800 μm.Then it is irradiated.Anti-dazzling screen can be the anti-dazzling screen with required pattern, example
Such as film.Ultraviolet light can irradiate any surface of substrate.Preferably, ultraviolet light is through being applied with compound on anti-dazzling screen irradiation substrate
One side.Illustratively, a length of 250~400nm of ultraviolet light wave, preferably 365nm.In a specific embodiment, ultraviolet light
Being set as can make to be exposed to photosensitive PDMS/ conductive material compound therein does not solidify during subsequent cure, such as in
Colloidal state.The energy density of ultraviolet light can be 50-150mW/cm2, irradiation time 5-30 minutes.Preferably, the energy of ultraviolet light is close
Degree is 90mW/cm2, irradiation time 10 minutes.
In an embodiment of method, it is cured to remove the irradiated portion through the compound before irradiation part.
Compound is for example placed in 120 DEG C and continues 10 minutes by the solidification.Any shifting known in the art can be used through irradiation part by removing
Except the method for photosensitive PDMS/ conductive material compound carries out.In a specific embodiment, molten using 2- methyl -4- pentanone
Liquid, which removes, is irradiated part, while optionally carrying out such as sonic oscillation.It removes the irradiated portion after irradiating part and forms solidification
Photosensitive PDMS/ conductive material compound, i.e. conductive layer.
In an embodiment of method, the first protective layer can have flexibility.Forming the first protective layer includes by silicon rubber
Presoma and the curing agent mixing of glue, drying and curing.In a preferred embodiment, the ratio of presoma and curing agent is
1:1.In a preferred embodiment, silicon rubber is EcoflexTM00-30(SMOOTH-ON).In a preferred embodiment
In, solidification temperature is 60 DEG C -120 DEG C.In a preferred embodiment, curing time is 5-30 minutes.
In an embodiment of method, removing substrate includes separating the compound with substrate.Removing substrate can
It is carried out with any means known in the art.Such as the substrate with compound is put into 30wt%KOH aqueous solution and continues such as 3
It is realized over it.
In an embodiment of method, electrode can be formed by coating nano-silver colloid or conductive carbon paste.At one
In embodiment, electrode about 0.2-2mm is thick, such as 1mm.
In an embodiment of method, the second protective layer can have flexibility.Forming the second protective layer includes by silicon rubber
Presoma and the curing agent mixing of glue, drying and curing.In a preferred embodiment, the ratio of presoma and curing agent is
1:1.In a preferred embodiment, silicon rubber is EcoflexTM00-30(SMOOTH-ON).In a preferred embodiment
In, solidification temperature is 60 DEG C -120 DEG C.In a preferred embodiment, curing time is 5-30 minutes.
In the third aspect, the present invention provides the strain transducer of above-mentioned preparation method preparation.
In fourth aspect, the present invention also provides methods described herein to prepare high-resolution, highly sensitive, wearable strain sensing
Purposes in device.
At the 5th aspect, the present invention provides a kind of based on the molding strain transducer of photoengraving comprising:
Conductive layer, the conductive layer are formed by irradiating photosensitive PDMS/ conductive material compound through anti-dazzling screen with ultraviolet light,
A pair of electrodes, the pair of electrode are electrically connected with the both ends of the conductive layer respectively, and
Protective layer is coated on the two sides of the conductive layer.
In an embodiment of strain transducer, photosensitive PDMS/ conductive material compound include PDMS, initiator and
Conductive material.In one embodiment, PDMS: the weight ratio of conductive material can be 25:1 to 5000:1, including 400:1 is extremely
50:1, such as 250:1 to 100:1.In one embodiment, PDMS: the weight ratio of conductive material can be for 0.5g:20mg extremely
5g:1mg, such as 1g:4mg to 1g:10mg.Illustratively, PDMS: the weight ratio of initiator can be 5:1 to 500:1, including 10:
1 to 50:1, such as 20:1.In one embodiment, PDMS: the weight ratio of initiator can be 1g:50mg.Illustratively,
PDMS: initiator: the weight ratio of conductive material can be 500-5000:10-100:1-20, such as 1000:50:4 to 1000:50:
10.In one embodiment, PDMS: initiator: the weight ratio of conductive material can be 0.5-5g:10-100mg:1-20mg, example
Such as 1g:50mg:4mg to 1g:50mg:10mg.
In an embodiment of strain transducer, the conductive layer is formed using substrate, comprising steps of on substrate
Photosensitive PDMS/ conductive material compound is formed, the compound is irradiated through anti-dazzling screen with ultraviolet light, is formed on the compound
Irradiated portion and through irradiate part, remove through irradiate part, and optionally remove substrate.
It includes mixing the presoma of PDMS and curing agent that photosensitive PDMS/ conductive material compound is formed on substrate, is added
Enter initiator and conductive material, and gained compound is applied to substrate.The presoma and curing agent of the PDMS can be according to 15:
The ratio of 1-5:1 mixes, and is preferably mixed with the ratio of 10:1.In one embodiment, photosensitive PDMS/ conductive material compound
It is colloidal form, such as compound resin colloid.In one embodiment, substrate is applied to as applying the compound by obtained by
On, the coating includes spin coating.The speed of the spin coating can be 1000-3000rpm, and spin-coating time can be -2 minutes 5 seconds.It is preferred that
Ground, the speed of spin coating can be 2000rpm, and spin-coating time can be 20 seconds.The substrate, such as glass, optionally be administered it is compound
By cleaning before object.
Initiator includes acyl group phosphorous oxides initiator or Benzophenone class initiator.In one embodiment, initiator
Selected from least one of acyl group phosphorous oxides initiator and Benzophenone class initiator.Illustratively, initiator can be Benzophenone
And/or double acylphosphine oxides (BAPO), such as Benzophenone xylene solution and/or double acylphosphine oxides organic solution.
Conductive material includes nano-silver thread, graphene or carbon nanotube.In one embodiment, conductive material is selected from and receives
At least one of rice silver wire, graphene and carbon nanotube.Illustratively, conductive material can be the isopropanol of nano-silver thread
(IPA) solution, graphene solution and/or carbon nano-tube solution.In a specific embodiment, conductive material includes nano silver
Isopropanol (IPA) solution of line, concentration 10-100mg/mg, preferably 20mg/mg.
Irradiating the compound through anti-dazzling screen with ultraviolet light includes, and anti-dazzling screen is placed in above substrate with substrate at a distance of about
200-1000 μm, such as 200 μm, 300 μm, 400 μm, 500 μm, 600 μm, 700 μm, 800 μm, 900 μm or 1000 μm, preferably
200-800μm.Then it is irradiated.Anti-dazzling screen can be the anti-dazzling screen with required pattern, such as film.Ultraviolet light can irradiate
Any surface of substrate.Preferably, ultraviolet light is through being applied with the one side of compound on anti-dazzling screen irradiation substrate.Illustratively, ultraviolet
Light wave a length of 250~400nm, preferably 365nm.In a specific embodiment, ultraviolet light is set as to make to be exposed to it
In photosensitive PDMS/ conductive material compound do not solidify during subsequent cure, such as in colloidal state.The energy density of ultraviolet light
It can be 50-150mW/cm2, irradiation time 5-30 minutes.Preferably, the energy density of ultraviolet light is 90mW/cm2, irradiation time 10
Minute.
Removing the irradiated portion through the compound before irradiation part can be cured.The solidification for example sets compound
Continue 10 minutes in 120 DEG C.Removing can be compound with any photosensitive PDMS/ conductive material of removal known in the art through irradiation part
The method of object carries out.In a specific embodiment, it is removed using 2- methyl -4- pentanone solution through irradiating part, with former
Choosing carries out such as sonic oscillation.It is compound that removal irradiated portion after irradiating part forms cured photosensitive PDMS/ conductive material
Object, i.e. conductive layer.Cured irradiated portion thickness can be about 50 μm.
Optional removal substrate includes separating the compound with substrate.Any side known in the art can be used by removing substrate
Method carries out.Such as the substrate with compound is put into 30wt%KOH aqueous solution and continues for example to realize over 3 days.
In one embodiment, the pair of electrode is located at the side opposite with the first protective layer of conductive layer, and
The electrode is electrically connected with the both ends of the conductive layer.Herein, a pair of electrodes be electrically connected with the both ends of conductive layer in " two
End " only indicates the relative position of each electrode in a pair of electrodes, it is no intended to limit the absolute position of electrode.As long as each electrode position
Relative position and electrical connection is realized at the two of conductive layer.In an embodiment of strain transducer, a pair of electrodes
It is electrically connected respectively with the both ends of the conductive layer and the contact area of each electrode and conductive layer is less than the one of conductive layer area
Half.Electrode can be formed by coating nano-silver colloid or conductive carbon paste.In one embodiment, electrode about 0.2-2mm is thick, example
Such as 1mm.
In an embodiment of strain transducer, protective layer includes the first protective layer and the second protective layer.Protective layer
There can be flexibility.Forming protective layer includes by the presoma of silicon rubber and curing agent mixing, drying and curing.It is preferred real at one
It applies in mode, the ratio of presoma and curing agent is 1:1.In a preferred embodiment, silicon rubber is EcoflexTM 00-
30(SMOOTH-ON).In a preferred embodiment, solidification temperature is 60 DEG C -120 DEG C.In a preferred embodiment,
Curing time is 5-30 minutes.In one embodiment, the first protective layer is formed before removing substrate, the shape after forming electrode
At the second protective layer.
The strain transducer manufactured using the compound of photosensitive PDMS and conductive material of the invention, has high sensitivity.
The present invention plays the role of protecting device, to improve the service life of device by installing encapsulated layer additional outside compound.This hair
Bright strain transducer or the strain transducer obtained by the method for the invention can significantly improve the spirit of sensor in strain
Sensitivity, and there is good reliability and fatigue resistance.Also, strain transducer preparation process used in the present invention at
This is low, and Patternized technique is simple, can be mass.
In addition to above-mentioned technical effect, other effects of the invention and advantage describe in the following detailed description.
Detailed description of the invention
Fig. 1 be according to an embodiment of the present invention can the molding strain transducer of photoengraving preparation flow figure.
Fig. 2 be according to an embodiment of the present invention can the molding strain transducer of photoengraving photo and its I-V diagram.
Fig. 3 is the stretching sensitivity of the strain transducer of method preparation according to an embodiment of the present invention.
Fig. 4 be according to an embodiment of the present invention method preparation strain transducer under cyclic tension state when
M- electrical response curve.
Symbol description
1 substrate
2 anti-dazzling screens
3 irradiation sources
4 cured conductive layers
5 protective layers
6 electrodes
Specific embodiment
Below in conjunction with preferred embodiment and Detailed description of the invention technical characteristic of the invention, this be intended to illustrate invention without
It is the limitation present invention.Attached drawing is greatly simplified to be used to be illustrated, but is not drawn necessarily to scale.
It is to be appreciated that shown in the drawings is only presently preferred embodiments of the present invention, do not constitute to model of the invention
The limitation enclosed.Those skilled in the art can carry out the present invention on the basis of embodiment shown in the drawings various aobvious and easy
Modification, the modification, equivalence replacement seen, and under the premise of not contradicting, in different embodiments discussed below
Technical characteristic can in any combination, and these all fall within the scope and spirit of the invention.
Conductive layer
Conductive layer of the present invention is the compound of photosensitive PDMS and conductive material.
Photosensitive PDMS/ conductive material compound includes PDMS, initiator and conductive material, and the compound is electrically conductive.
PDMS (dimethyl silicone polymer, polydimethylsiloxane) as a kind of macromolecule, inertia, nontoxic, nonflammable have
Organic silicon compound has optical clear.PDMS is the organic polymer material based on widely used silicon, uses and is included in
Micro sprue system, gap filler, lubricant, contact lenses in bio-microelectromechanical.Dimethyl siloxane when liquid is viscous fluid
Body, is a kind of polyorganosiloxane mixture with different polymerization degree chain structure, and end group and side group are all alkyl (such as first
Base, ethyl, phenyl etc.).Solid dimethyl siloxane be a kind of silica gel, nontoxic, hydrophobic, inert substance, and for non-flammable,
Transparent elastomer.The processing procedure of PDMS is easy, quick, at low cost, translucency is good, biocompatibility is good and because low Young mould
Structure high resiliency etc. caused by measuring.
PDMS includes presoma and curing agent.The presoma and curing agent of the PDMS can be mixed according to the ratio of 15:1-5:1
Conjunction or in which any range or arbitrary proportion.In one embodiment, the presoma of the PDMS and the ratio of curing agent are
Range between 15:1,12:1,11:1,10:1,9:1,8:1,7:1,6:1 or 5:1 or in which any number.
Initiator is that one kind in ultraviolet region (250~400nm) or visible region (400~800nm) has absorbing ability
Molecule.After directly or indirectly absorbing luminous energy, initiator molecule alters jump to excitation from ground state transition to excited singlet between being
Triplet state；After excited singlet or triplet state experience unimolecule or bimolecular chemical action, generation can cause monomer polymerization
Biologically active fragment, these biologically active fragments can be free radical, cation, anion etc..Initiator can be divided into ultraviolet initiator
With visible light initiator.Initiator includes acyl group phosphorous oxides initiator or Benzophenone class initiator.Initiator can be Benzophenone
And/or double acylphosphine oxides (BAPO).
Conductive material includes nano-silver thread, graphene or carbon nanotube.In a specific embodiment, conductive material is nanometer
Silver wire.By adjusting the amount of each ingredient in compound, the electric conductivity of the strain transducer formed by the compound is controlled.Show
Example property, PDMS: the weight ratio of nano-silver thread can be 25:1 to 5000:1, including 400:1 to 50:1, such as 250:1 to 100:
1.In one embodiment, PDMS: the weight ratio of nano-silver thread can be 0.5g:20mg to 5g:1mg, such as 1g:4mg to 1g:
10mg.Illustratively, PDMS: the weight ratio of initiator can be 5:1 to 500:1, including 10:1 to 50:1, such as 20:1.One
In a embodiment, PDMS: the weight ratio of initiator can be 1g:50mg.Illustratively, PDMS: initiator: the weight of nano-silver thread
Amount is than that can be 500-5000:10-100:1-20, such as 1000:50:4 to 1000:50:10.In one embodiment, PDMS:
Initiator: the weight ratio of nano-silver thread can be 0.5-5g:10-100mg:1-20mg, such as 1g:50mg:4mg to 1g:50mg:
10mg。
The compound can be cured compound.The compound of photosensitive PDMS and conductive material of the invention can be through light
Etching molding is for manufacturing strain transducer, such as patterned wearable strain transducer.
Strain transducer
Strain transducer of the present invention includes conductive layer 4, protective layer 5, electrode 6, example as shown in Figure 1.
Above-mentioned conductive layer 4 is formed by photosensitive PDMS/ conductive material compound.For example, conductive layer 4 by with ultraviolet light through hiding
Mating plate irradiates photosensitive PDMS/ conductive material compound and is formed.Specifically, conductive layer 4 can be formed using substrate, comprising steps of
Photosensitive PDMS/ conductive material compound is formed on substrate, the compound is irradiated through anti-dazzling screen with ultraviolet light, in the compound
Upper formation irradiated portion and through irradiate part, irradiated portion solidification move back except through irradiate part, and optionally remove base
Material.
Photosensitive PDMS/ conductive material compound may include PDMS, initiator and conductive material, mix PDMS by adjusting
The amount of middle conductive material can control the electric conductivity of strain transducer.Illustratively, PDMS: the weight ratio of conductive material can be
25:1 to 5000:1, including 400:1 to 50:1, such as 250:1 to 100:1.In one embodiment, PDMS: conductive material
Weight ratio can be 0.5g:20mg to 5g:1mg, such as 1g:4mg to 1g:10mg.Illustratively, PDMS: the weight of initiator
Than that can be 5:1 to 500:1, including 10:1 to 50:1, such as 20:1.In one embodiment, PDMS: the weight ratio of initiator
It can be 1g:50mg.Illustratively, PDMS: initiator: the weight ratio of conductive material can be 500-5000:10-100:1-20, example
Such as 1000:50:4 to 1000:50:10.In one embodiment, PDMS: initiator: the weight ratio of conductive material can be 0.5-
5g:10-100mg:1-20mg, such as 1g:50mg:4mg to 1g:50mg:10mg.
The presoma of PDMS and curing agent are mixed, initiator and conductive material is added, and gained compound is applied to
Substrate.The presoma and curing agent of the PDMS can be according to the mixing of the ratio of 15:1-5:1 or in which any range or any ratio
Example.In one embodiment, the ratio of the presoma of the PDMS and curing agent be 15:1,12:1,11:1,10:1,9:1,
Range between 8:1,7:1,6:1 or 5:1 or in which any number.Initiator includes acyl group phosphorous oxides initiator or benzene first
Ketone initiator.In a specific embodiment, initiator can be Benzophenone and/or double acylphosphine oxides (BAPO).Specific real
It applies in mode, the initiator of addition is the xylene solution of Benzophenone.Conductive material includes nano-silver thread, graphene or carbon nanometer
Pipe.In a specific embodiment, the conductive material of addition can be isopropanol (IPA) solution of nano-silver thread, which is
10-100mg/mg or in which any range or any number, preferably 20mg/mg.Photosensitive PDMS/ conductive material compound can be with
It is colloidal form, such as compound resin colloid.
Then it is applied on substrate as applying such as spin coating compound by obtained by.The speed of the spin coating can be 1000-
3000rpm or in which any range or any number.Spin-coating time can be -2 minutes 5 seconds or in which any range or arbitrary number
Value.
The shape of above-mentioned conductive layer 4 is not particularly limited, and can be strip, " I " fonts, but can also be according to being wanted
The needs of the sensor of manufacture and various shape is made.In present embodiment, the structure of strain transducer, makes for ease of description
" I " fonts conductive layer 4 is formed with " I " fonts film, as shown in Figure 1, 2.Conductive layer thickness can be about 1mm.
Irradiating the compound through anti-dazzling screen with ultraviolet light includes, and anti-dazzling screen is placed in above substrate and is coated with the one of compound
Face or the non-one side for being coated with compound, with substrate at a distance of about 200-1000 μm, such as 200 μm, 300 μm, 400 μm, 500 μm, 600
μm, 700 μm, 800 μm, 900 μm or 1000 μm, preferably 200-800 μm.Then it is irradiated.Anti-dazzling screen can be for required figure
The anti-dazzling screen of case, such as film.Ultraviolet light can irradiate any surface of substrate.For example, ultraviolet light is through on anti-dazzling screen irradiation substrate
It is applied with the one side of compound.Illustratively, a length of 250~400nm of ultraviolet light wave, preferably 365nm.As long as ultraviolet light makes
Photosensitive PDMS/ conductive material compound therein is exposed to not solidify during subsequent cure.For example, the energy of ultraviolet light
Metric density can be 90mW/cm2, irradiation time 10 minutes.
It is cured to remove the irradiated portion through the compound before irradiation part.The solidification is for example, by dry real
It is existing, such as be placed in 120 DEG C of baking ovens and continue 10 minutes.Removing can be photosensitive with any removal known in the art through irradiation part
The method of PDMS/ conductive material compound carries out, for example, substrate is put into 2- methyl -4- pentanone solution, then optionally carries out
Such as sonic oscillation.It removes the irradiated portion after irradiating part and forms cured photosensitive PDMS/ conductive material compound, that is, lead
Electric layer.
Optional removal substrate includes separating the compound with substrate.Any side known in the art can be used by removing substrate
Method carries out, such as the substrate with compound is put into 30wt%KOH aqueous solution and continues such as 3 days.
Above-mentioned electrode 6 is electrically connected with conductive layer 4.Illustratively show electrode 6 is located at the both ends of conductive layer in Fig. 1.It is above-mentioned
Then electrode can be dried and be formed by the way that conducting paste to be coated on the conductive layer 3.In a preferred embodiment party
In formula, above-mentioned conducting paste includes at least one of Nano silver grain, carbon nano-particles, carbon fiber or graphene.Further
It is preferred that above-mentioned conducting paste is conductive carbon paste or nano-silver colloid.Electrode, which can be thickness, can be the conductive carbon paste of about 1mm.
Protective layer 5 is made of and is wrapped up flexible material on conductive layer 4 and electrode 6, for protecting conductive layer and electrode.One
In a preferred embodiment, above-mentioned protective layer 5 is formed by platinum catalysis silicon rubber Ecoflex.Protective layer 5 is to conductive layer 4 and electricity
Pole 6 is packaged protection, also acts as the effect of protection device, is conducive to the service life for improving strain transducer.
The preparation method of strain transducer
In following explanations, when not having declaration condition, those skilled in the art can press from angle of the invention
Routine test easily provides the manufacture that the condition implements strain transducer of the invention.In disclosed embodiment,
For expected purpose, the available any factor substitute equivalent with it of any element used in embodiment, including this civilization
Element disclosed in really.
It is illustrated in conjunction with manufacturing method of the Fig. 1 and Fig. 2 to strain transducer of the invention.Fig. 1 is patterning of the present invention
The preparation flow figure of wearable strain transducer.
Step 1 prepares photosensitive PDMS substrate solution
PDMS substrate solution includes PDMS and initiator.By the presoma of PDMS and curing agent according to the ratio of such as 10:1
Mixing is added initiator, obtains photosensitive PDMS substrate solution.The ratio of the presoma of PDMS and curing agent can for 15:1,12:1,
Range between 11:1,10:1,9:1,8:1,7:1,6:1 or 5:1 or in which any number.Initiator can be Benzophenone.By benzene
Ketone dissolution of crystals obtains initiator Benzophenone solution in xylene solvent, and concentration can be 500mg/mL.
(initiator is 100 μ L Benzophenone xylene solutions, and wherein 50mg is the quality of Benzophenone in the solution, nano silver
Line is also 200-500 μ L nano-silver thread aqueous isopropanol when being added, and wherein 4-10mg is nano-silver thread in quality wherein)
Step 2 forms photosensitive PDMS/ conductive material compound
Conductive material is added in photosensitive dimethyl silicone polymer substrate solution, it is compound to form photosensitive PDMS/ conductive material
Object.It can for example be vibrated 5 minutes during being somebody's turn to do.Conductive material includes nano-silver thread, graphene or carbon nanotube.Conductive material can be with
It is isopropanol (IPA) solution of nano-silver thread, concentration 20mg/mL.Conductive material can be the aqueous solution of carbon nanotube, concentration
It can be 10mg/mL.In one embodiment, photosensitive PDMS/ conductive material compound is the form of compound resin colloid.
According to the present invention, it can control the conduction of strain transducer by adjusting the amount of conductive material in the photosensitive PDMS of incorporation
Performance.Illustratively, PDMS: the weight ratio of nano-silver thread can be 25:1 to 5000:1, including 400:1 to 50:1, such as 250:1
To 100:1.In one embodiment, PDMS: the weight ratio of nano-silver thread can be 0.5g:20mg to 5g:1mg, such as 1g:
4mg to 1g:10mg.Illustratively, PDMS: the weight ratio of initiator can be 5:1 to 500:1, including 10:1 to 50:1, such as
20:1.In one embodiment, PDMS: the weight ratio of initiator can be 1g:50mg.Illustratively, it PDMS: initiator: receives
The weight ratio of rice silver wire can be 500-5000:10-100:1-20, such as 1000:50:4 to 1000:50:10.In an embodiment party
In formula, PDMS: initiator: the weight ratio of nano-silver thread can be 0.5-5g:10-100mg:1-20mg, such as 1g:50mg:4mg is extremely
1g:50mg:10mg。
Optional step three cleans substrate.
It is clean by substrate, such as glass.The cleaning can be carried out for example, by cleaning solution.It is embodied at one
In mode, the cleaning can be carried out by sonic oscillation 1-10 minutes in cleaning solution.Such as sheet glass is put into glass cleaning
Sonic oscillation 1-10 minutes in liquid, after being rinsed with deionized water, be put into acetone sonic oscillation 1-10 minutes again, after spend from
Sub- water is rinsed well, is finally blown off with nitrogen.To the clean level of glass without specific requirement, as long as surface is viscous i.e. without organic matter
It can.
Step 4 applies photosensitive PDMS/ conductive material compound to substrate, then irradiates substrate through anti-dazzling screen with ultraviolet light
Prepared photosensitive PDMS/ conductive material compound is applied on clean substrate.The application includes spin coating.
Anti-dazzling screen is placed in above substrate be coated with compound or it is non-be coated with compound while, with substrate at a distance of about 200-1000
μm, such as 200 μm, 300 μm, 400 μm, 500 μm, 600 μm, 700 μm, 800 μm, 900 μm or 1000 μm, preferably 200-800 μm.
The speed of the spin coating can be 1000-3000rpm or in which any range or any number.In a specific embodiment, spin coating
Speed be range about between 1000rpm, 1500rpm, 2000rpm, 2500rpm or 3000rpm or in which any number.
Spin-coating time can be -2 minutes 5 seconds or in which any range or any number.In a specific embodiment, the time of spin coating is 5
Second, 10 seconds, 20 seconds, 30 seconds, 40 seconds, 50 seconds, 1 minute or the range between 2 minutes or in which any number.Preferably, described
The speed of spin coating can be 2000rpm, and spin-coating time can be 20 seconds.
Substrate is irradiated through anti-dazzling screen (such as film) with ultraviolet light.Ultraviolet light can irradiate any surface of substrate.Preferably,
Ultraviolet light is through being applied with the one side of compound on anti-dazzling screen irradiation substrate.There can be required pattern on anti-dazzling screen.Illustratively, institute
State a length of 250~400nm of ultraviolet light wave, preferably 365nm.Ultraviolet light, which is set as can making to be exposed to photosensitive PDMS/ therein, leads
Electric material compound does not solidify during subsequent cure, such as in colloidal state.The energy density of ultraviolet light can be 50-150mW/
cm2Or in which any range or any number, irradiation time are 5-30 minutes or in which any range or any number.It is preferred that
Ground, the energy density of ultraviolet light can be 90mW/cm2, irradiation time 10 minutes.
Step 5 solidifies and removes through irradiating part
Solidify photosensitive PDMS/ conductive material compound irradiated portion.Any known method solidification in this field can be used
The compound irradiated portion.In one embodiment, compound is continued to the solidification of realization in 10 minutes at 120 DEG C.Then
Irradiated portions are removed using any known method in this field.In one embodiment, it removes and may include through irradiation part
Compound is put into the solution that can dissolve the compound through irradiating, for example analytically pure 2- methyl -4- pentanone of the solution
Solution or toluene solution.Compound in solution can be through sonic oscillation, such as 20 seconds.Removing is patterned after irradiating part
Photosensitive PDMS/ conductive material composite solids.
Step 6 forms the first protective layer
Protective layer is formed on the substrate for patterning photosensitive PDMS/ conductive material compound, for protecting patterning
Photosensitive PDMS/ conductive material compound.The protective layer can have flexibility, such as EcoflexTM.Specifically, will
EcoflexTMPresoma and curing agent according to such as 1:1 ratio mix, be then spun on substrate with such as 500rpm, so
After solidify.Solidification temperature can be 60 DEG C -120 DEG C.Curing time can be 5-30 minutes.For example, 60 DEG C solidify 30 minutes or 120
DEG C solidification 5 minutes.
Step 6 removes substrate
Any methods known in the art can be used to remove substrate.For example, will be with the photosensitive PDMS/ conduction material of patterning
The substrate of material compound is put into separation solution and separates substrate and the compound.The separation solution can be molten for highly basic
Liquid, such as be put into 30wt%KOH aqueous solution 3 days.For another example, can by compound coated on before substrate compound with and base
Then PVA dissolution is come separation substrate and the compound after compound solidification by material inter-coat PVAC polyvinylalcohol film.
Step 7 forms electrode
Electrode is formed in the side with photosensitive PDMS/ conductive material compound, the electrode is led with the photosensitive PDMS/
The electrical connection of electric material compound.In one embodiment, electrode is formed in the side opposite with the first protective layer of conductive layer,
And electrode is electrically connected with the both ends of conductive layer.In one embodiment, pass through the both ends applying conductive thickener in conductive layer
And it dries and forms electrode.The coating method, coating thickness and drying means of conducting paste are not particularly limited, as long as energy
It forms electrode and is electrically connected with conductive layer.Conducting paste includes to be selected from Nano silver grain, carbon nano-particles, carbon fiber, stone
At least one conductive filler of black alkene.The preferred nano-silver colloid of conducting paste or conductive carbon paste.In a preferred embodiment,
Electrode is about 0.2-2mm thickness, such as the conductive carbon paste of 1mm thickness.
Step 8 forms the second protective layer
Protective layer is formed in the side with photosensitive PDMS/ conductive material compound, patterns photosensitive PDMS/ for protecting
Conductive material compound.The protective layer can have flexibility, such as EcoflexTM.Specifically, by the forerunner of EcoflexTM
Body and curing agent are mixed according to the ratio of such as 1:1, are then spun on substrate with such as 500rpm, are then solidified.Solidification temperature
Degree can be 60 DEG C -120 DEG C.Curing time can be 5-30 minutes.For example, 60 DEG C solidify 5 minutes for solidification 30 minutes or 120 DEG C.
The sensitivity of the strain transducer as made from the above method is expressed from the next:
Wherein, GF represents sensitivity, R0Initial resistance value is represented, R indicates resistance value when applying strain, and Δ R is represented
Resistance change, ε represent strain value；
Fig. 3 is the performance curve of strain transducer of the present invention.The strain transducer of the preparation according to embodiments of the present invention,
When strain is less than about 7%, sensitivity 0.61；When strain greater than about 7%, sensitivity 12.74.It is surveyed by performance
As can be seen that strain transducer of the invention has high sensitivity, strain investigative range is 10% for examination.
Fig. 4 is when m- electrical response curve of the sensor prepared by the present invention under cyclic tension state.Utilize Mark-
10 loop test function, stretching-reply period of repetitive strain sensor complete 10000 testing fatigue experiments.It can see
Out, the strain transducer of the preparation has good reliability and fatigue resistance, service life according to embodiments of the present invention
It is long.
The manufacturing method of strain transducer according to the present invention, by using to the photosensitive compound object light of PDMS/ conductive material
The type of being carved into can form conductive layer, and be further formed electrode and protective layer on the electrically conductive.The manufacturing method is by adjusting incorporation
In photosensitive PDMS the amount of conductive material can control the electric conductivity of strain transducer, simple process, it is at low cost, of large quantities can advise
Mould production.The strain transducer obtained by the manufacturing method can significantly improve the sensitivity of sensor, and have in strain
There are good reliability and fatigue resistance.
Embodiment
Embodiment 1- prepares patterned strain transducer
The presoma of PDMS and curing agent are mixed according to the ratio of 10:1, the Benzophenone that concentration is 500mg/mL is added
Xylene solution.The aqueous isopropanol for the nano-silver thread that concentration is 20mg/mL is added, vibrates 5 minutes, forms photosensitive PDMS/ and receive
Rice silver wire compound.PDMS: Benzophenone: the weight ratio of nano-silver thread is 1g:50mg:4mg to 1g:50mg:10mg.
With reference to Fig. 1, prepared photosensitive PDMS/ nano-silver thread compound resin colloid is spun on the speed of 2000rpm
On the sheet glass (1) for cleaning up and (being cleaned using the win185 cleaning agent of the environmental protection Science and Technology Ltd. on mountain), then set
In ultra-violet curing device, part light is sheltered from I-shaped (bone type) film (2), film (2) is apart from sheet glass (1)
800 μm of distance irradiates compound resin colloid using the ultraviolet lamp (3) that wavelength is 365nm；Sheet glass is then put into 120 DEG C
In baking oven, isothermal curing 10 minutes, the photosensitive PDMS/ nano silver that is to say film (2) shield portions at (exposure) is not irradiated
Line compound resin is solidified into I-shaped (4) in figure one, through remaining colloid at irradiation, can be rinsed out with 2- methyl -4- pentanone；
Ecoflex (5) is spun on sheet glass with 500rpm again, is put into 5 minutes in 120 DEG C of baking ovens and solidifies；Then sheet glass is put
Enter and peel off sheet glass in KOH solution, obtains a double-layer structure, one layer of solidification compound resin, one layer of Ecoflex；It again will be conductive
Carbon paste is coated on compound resin (4) both ends as electrode (6)；Finally, Ecoflex (6) are coated on conductive resin compound (4) table
Face is as protective layer.
Embodiment 2- sensitivity and strain investigative range
Digital force gauge (M5 series) the electronic tensile compression test platform (ESM303) of cooperation produced using MARK-10 company, the U.S.
The loop test for stretching-loosening is carried out to strain transducer obtained in embodiment 1, Applied Electrochemistry work station collects its telecommunications
Number amount of changing with time.The sensitivity table of strain transducer is shown as the change rate of resistance and the ratio for applying strain, it may be assumed that
Wherein, GF represents sensitivity, R0Initial resistance value is represented, R indicates resistance value when applying strain, and Δ R is represented
Resistance change, ε represent strain value.
Strain-sensitivity curve of test is shown in Fig. 3.
The strain transducer of the preparation according to embodiments of the present invention, when strain is less than about 7%, sensitivity is
0.61；When strain greater than about 7%, sensitivity 12.74.By performance test as can be seen that strain sensing of the invention
Device has high sensitivity, and strain investigative range is 10%.
The test of embodiment 3- cyclic tension
Cyclic tension test is carried out to the strain transducer of embodiment 1, measures the reliability of strain transducer.It is specific and
Speech, using the loop test function of Mark-10, stretching-reply period of repetitive strain sensor completes 10000 fatigues and surveys
Examination experiment.Test results are shown in figure 4.
The result shows that sensor is after 10000 stretching cyclic tests, the variation tendency and width of resistance change rate
Value is held essentially constant.It follows that strain transducer has good reliability and fatigue resistance, long service life.
Finally, it is to be understood that the explanation of above embodiment and embodiment is to illustrate in all respects, limit is not constituted
System, can carry out various improvement in the range without departing substantially from spirit of the invention.The scope of the present invention is by claims come table
Show, rather than indicated by above embodiment or embodiment.Furthermore the scope of the present invention includes with claims etc.
Being had altered in the same meaning and range.
Industrial utilizability
The manufacturing approach craft of strain transducer of the invention is simple, it is at low cost, can be mass, pass through and adjust laser function
Rate and sweep time can control the electric conductivity of the conductive layer generated in flexible substrate.It is answered by what the manufacturing method obtained
Become sensor in strain, the sensitivity of sensor can be significantly improved, and there is good reliability and fatigue resistance,
Have wide practical use in fields such as intelligent artificial limb, artificial skin, biologic medical, flexible robots.
Claims (10)
1. a kind of preparation method based on the molding strain transducer of photoengraving, including
A) photosensitive PDMS/ conductive material compound is formed on substrate,
B) compound is irradiated through anti-dazzling screen with ultraviolet light, forms irradiated portion on the compound and through irradiation portion
Point,
C) removal is described is irradiated part, and the irradiated portion forms conductive layer,
D) the first protective layer is formed on the conductive layer,
E) substrate is removed,
F) a pair of electrodes, the electrode and the conduction are formed in the side opposite with first protective layer of the conductive layer
Layer electrical connection,
G) the second protective layer is formed on the conductive layer and electrode.
2. the method for claim 1, wherein the photosensitive PDMS/ conductive material compound include PDMS, initiator and
Conductive material.
3. method according to claim 2, wherein PDMS: the weight ratio of conductive material is 25:1 to 5000:1.
4. method according to claim 2, wherein the initiator is selected from acyl group phosphorous oxides initiator and Benzophenone class is drawn
Send out at least one of agent.
5. method according to claim 2, wherein the conductive material is in nano-silver thread, graphene and carbon nanotube
At least one.
6. method according to claim 1 or 2, wherein the energy density of ultraviolet light is 50-150mW/cm2, irradiation time is
5-30 minutes.
7. the strain transducer prepared by method as claimed in claim 1 or 2.
8. one kind is based on the molding strain transducer of photoengraving comprising:
Conductive layer, the conductive layer are formed by irradiating photosensitive PDMS/ conductive material compound through anti-dazzling screen with ultraviolet light,
A pair of electrodes, the pair of electrode are electrically connected with the both ends of the conductive layer respectively, and
Protective layer is coated on the two sides of the conductive layer.
9. strain transducer as claimed in claim 8, wherein photosensitive PDMS/ conductive material compound includes PDMS, initiator
And conductive material, PDMS: the weight ratio of conductive material is 25:1 to 5000:1, and the initiator causes selected from acyl group phosphorous oxides
At least one of agent and Benzophenone class initiator, the conductive material is in nano-silver thread, graphene and carbon nanotube
It is at least one.
10. strain transducer as claimed in claim 8 or 9, wherein the energy density of ultraviolet light is 50-150mW/cm2, irradiation
Time is 5-30 minutes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910160403.5A CN109870114A (en) | 2019-03-04 | 2019-03-04 | Based on the molding strain transducer of photoengraving and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910160403.5A CN109870114A (en) | 2019-03-04 | 2019-03-04 | Based on the molding strain transducer of photoengraving and its manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109870114A true CN109870114A (en) | 2019-06-11 |
Family
ID=66919737
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910160403.5A Pending CN109870114A (en) | 2019-03-04 | 2019-03-04 | Based on the molding strain transducer of photoengraving and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109870114A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022003326A1 (en) * | 2020-06-29 | 2022-01-06 | Jamie Williams | Cover for a prosthetic body part or portion thereof |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6906303B1 (en) * | 2001-09-20 | 2005-06-14 | Litel Instruments | Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| CN101082523A (en) * | 2007-06-27 | 2007-12-05 | 中国科学院上海微***与信息技术研究所 | Method for making flexibility temperature sensor |
| CN101832759A (en) * | 2010-04-06 | 2010-09-15 | 清华大学 | Method for making micro-nano-scale speckle |
| CN102553506A (en) * | 2010-12-30 | 2012-07-11 | 国家纳米技术与工程研究院 | Method for directly forming pattern on polydimethylsiloxane (PDMS) through photoetching |
| CN102749157A (en) * | 2012-07-27 | 2012-10-24 | 江苏物联网研究发展中心 | Flexible multi-parameter sensor and manufacture method thereof |
| CN103720463A (en) * | 2013-12-31 | 2014-04-16 | 上海交通大学 | Intelligent pressure guide wire based on flexible MEMS sensors and manufacturing method of sensors |
| CN104262967A (en) * | 2014-09-16 | 2015-01-07 | 苏州能斯达电子科技有限公司 | Sensitive material used in pressure sensor and preparation method thereof |
| CN106568539A (en) * | 2016-10-20 | 2017-04-19 | 上海交通大学 | Polymer substrate-based monolithic integrated temperature and humidity flexible sensor and preparation method |
-
2019
- 2019-03-04 CN CN201910160403.5A patent/CN109870114A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6906303B1 (en) * | 2001-09-20 | 2005-06-14 | Litel Instruments | Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| CN101082523A (en) * | 2007-06-27 | 2007-12-05 | 中国科学院上海微***与信息技术研究所 | Method for making flexibility temperature sensor |
| CN101832759A (en) * | 2010-04-06 | 2010-09-15 | 清华大学 | Method for making micro-nano-scale speckle |
| CN102553506A (en) * | 2010-12-30 | 2012-07-11 | 国家纳米技术与工程研究院 | Method for directly forming pattern on polydimethylsiloxane (PDMS) through photoetching |
| CN102749157A (en) * | 2012-07-27 | 2012-10-24 | 江苏物联网研究发展中心 | Flexible multi-parameter sensor and manufacture method thereof |
| CN103720463A (en) * | 2013-12-31 | 2014-04-16 | 上海交通大学 | Intelligent pressure guide wire based on flexible MEMS sensors and manufacturing method of sensors |
| CN104262967A (en) * | 2014-09-16 | 2015-01-07 | 苏州能斯达电子科技有限公司 | Sensitive material used in pressure sensor and preparation method thereof |
| CN106568539A (en) * | 2016-10-20 | 2017-04-19 | 上海交通大学 | Polymer substrate-based monolithic integrated temperature and humidity flexible sensor and preparation method |
Non-Patent Citations (4)
| Title |
|---|
| MARCO BARINK: "Flexible electronics: Prediction of substrate deformation during different steps of the lithography process", 《MICROELECTRONIC ENGINEERING》 * |
| 张正勇: "一种柔性三维力触觉传感器阵列的实现方法", 《传感技术学报》 * |
| 王良泽: "基于压阻效应的柔性三维力触觉传感器的研究", 《万方数据库》 * |
| 钱小工: "半导体柔性加工中的设备和工艺技术", 《半导体技术》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022003326A1 (en) * | 2020-06-29 | 2022-01-06 | Jamie Williams | Cover for a prosthetic body part or portion thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Liu et al. | Bioinspired, superhydrophobic, and paper-based strain sensors for wearable and underwater applications | |
| Cai et al. | Soft elastomers with programmable stiffness as strain-isolating substrates for stretchable electronics | |
| Wang et al. | Highly stretchable, sensitive, and transparent strain sensors with a controllable in-plane mesh structure | |
| CN108318161A (en) | Wearable pressure sensor and its manufacturing method | |
| Liu et al. | Ultrasonically patterning silver nanowire–acrylate composite for highly sensitive and transparent strain sensors based on parallel cracks | |
| Wang et al. | A highly conductive, self-recoverable, and strong eutectogel of a deep eutectic solvent with polymer crystalline domain regulation | |
| Zhang et al. | Compressible and stretchable magnetoelectric sensors based on liquid metals for highly sensitive, self-powered respiratory monitoring | |
| CN108917582A (en) | Strain transducer and its manufacturing method | |
| CN109099832A (en) | Strain transducer and its manufacturing method | |
| Wang et al. | Bionic fish-scale surface structures fabricated via air/water interface for flexible and ultrasensitive pressure sensors | |
| Zhou et al. | All-nanofiber network structure for ultrasensitive piezoresistive pressure sensors | |
| Jiang et al. | A flexible and ultra-highly sensitive tactile sensor through a parallel circuit by a magnetic aligned conductive composite | |
| Wang et al. | Multifunctional biosensors made with self-healable silk fibroin imitating skin | |
| CN109445248B (en) | Method for imprinting metal nanowires by using capillary action and application | |
| CN112924060B (en) | Flexible pressure sensor and preparation method thereof | |
| CN109357796A (en) | Wearable pressure sensor and its manufacturing method | |
| CN108707996B (en) | Preparation method of flexible conductive fiber based on chitosan/carbon nano tube/silver nanowire | |
| CN112525065A (en) | Micro-crack flexible resistance change mechanical sensor based on mixed resistance entanglement network and preparation method thereof | |
| Jeong et al. | All-organic, solution-processed, extremely conformal, mechanically biocompatible, and breathable epidermal electrodes | |
| Song et al. | Highly sensitive flexible temperature sensor made using PEDOT: PSS/PANI | |
| Zhou et al. | Liquid metal-doped conductive hydrogel for construction of multifunctional sensors | |
| CN109900198A (en) | A kind of preparation method of the transparent strain sensing devices of ultra-thin high resiliency | |
| CN109870114A (en) | Based on the molding strain transducer of photoengraving and its manufacturing method | |
| Che et al. | Ag nanowire-based stretchable electrodes and wearable sensor arrays | |
| Tai et al. | Submillimeter-scaled PEDOT: PSS/PPy piezoresistive pressure sensor array and its applications in biomedicine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190611 |